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WO2006008747A3 - On-chip inductor - Google Patents

On-chip inductor Download PDF

Info

Publication number
WO2006008747A3
WO2006008747A3 PCT/IL2005/000781 IL2005000781W WO2006008747A3 WO 2006008747 A3 WO2006008747 A3 WO 2006008747A3 IL 2005000781 W IL2005000781 W IL 2005000781W WO 2006008747 A3 WO2006008747 A3 WO 2006008747A3
Authority
WO
WIPO (PCT)
Prior art keywords
inductor
values
nano
well
permeability
Prior art date
Application number
PCT/IL2005/000781
Other languages
French (fr)
Other versions
WO2006008747A2 (en
Inventor
Amikam Nemirovsky
Original Assignee
Bluebird Optical Mems Ltd
Amikam Nemirovsky
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bluebird Optical Mems Ltd, Amikam Nemirovsky filed Critical Bluebird Optical Mems Ltd
Publication of WO2006008747A2 publication Critical patent/WO2006008747A2/en
Publication of WO2006008747A3 publication Critical patent/WO2006008747A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00—Fixed inductances of the signal type
    • H01F17/0006—Printed inductances
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/13—Amorphous metallic alloys, e.g. glassy metals
    • H01F10/138—Amorphous metallic alloys, e.g. glassy metals containing nanocrystallites, e.g. obtained by annealing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/041—Printed circuit coils
    • H01F41/046—Printed circuit coils structurally combined with ferromagnetic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5227—Inductive arrangements or effects of, or between, wiring layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00—Fixed inductances of the signal type
    • H01F17/04—Fixed inductances of the signal type with magnetic core
    • H01F17/06—Fixed inductances of the signal type with magnetic core with core substantially closed in itself, e.g. toroid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00—Fixed inductances of the signal type
    • H01F17/0006—Printed inductances
    • H01F2017/008—Electric or magnetic shielding of printed inductances
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)

Abstract

An inductor and a respective method of manufacturing for achieving very small integrated on-chip inductors, having high quality factor (Q) values, as well as simple and a single-level geometry. The proposed method is based on completely coating a conductor strip with an electrically highly resistive soft ferromagnetic material having a high permeability. Such a material may be a nano-crystaline material containing Fe-Co-X-N, where X may be, for example, any one of Ta, Cu, Ta-Si, Cu-Si, or Si. Depending on the inductor's linear dimension, coating permeability, electrical resistivity and thickness, Q values of well-over fifty at frequencies of over one giga-Hertz, and inductance values of several tens of nano-Henry per millimeter length of inductor, are achieved.
PCT/IL2005/000781 2004-07-22 2005-07-21 On-chip inductor WO2006008747A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US59059104P 2004-07-22 2004-07-22
US60/590,591 2004-07-22

Publications (2)

Publication Number Publication Date
WO2006008747A2 WO2006008747A2 (en) 2006-01-26
WO2006008747A3 true WO2006008747A3 (en) 2006-03-16

Family

ID=35785609

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IL2005/000781 WO2006008747A2 (en) 2004-07-22 2005-07-21 On-chip inductor

Country Status (1)

Country Link
WO (1) WO2006008747A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2937501B1 (en) 2008-10-28 2010-12-24 Pac Vending DEVICE FOR PRESERVING, COOKING AND AUTOMATICALLY DISPENSING PASTA PRODUCTS, IN PARTICULAR BREADED PRODUCTS
US9934176B2 (en) * 2014-12-24 2018-04-03 Intel Corporation Transceiver multiplexing over USB type-C interconnects
WO2021112991A1 (en) * 2019-12-06 2021-06-10 Lam Research Corporation Substrate supports with integrated rf filters

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5227659A (en) * 1990-06-08 1993-07-13 Trustees Of Boston University Integrated circuit inductor
US20020005565A1 (en) * 1999-02-03 2002-01-17 Micron Technology, Inc. Inductor with magnetic material layers
US20020177013A1 (en) * 2000-09-11 2002-11-28 Masayoshi Hiramoto Magnetoresistive element, method for manufacturing the same, and method for forming a compound magnetic thin film
US20040103522A1 (en) * 1999-02-26 2004-06-03 Micron Technology, Inc. Open pattern inductor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5227659A (en) * 1990-06-08 1993-07-13 Trustees Of Boston University Integrated circuit inductor
US20020005565A1 (en) * 1999-02-03 2002-01-17 Micron Technology, Inc. Inductor with magnetic material layers
US20040103522A1 (en) * 1999-02-26 2004-06-03 Micron Technology, Inc. Open pattern inductor
US20020177013A1 (en) * 2000-09-11 2002-11-28 Masayoshi Hiramoto Magnetoresistive element, method for manufacturing the same, and method for forming a compound magnetic thin film

Also Published As

Publication number Publication date
WO2006008747A2 (en) 2006-01-26

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