+

WO2005036619A1 - Dispositif optique d'eclairage, et dispositif et procede d'exposition - Google Patents

Dispositif optique d'eclairage, et dispositif et procede d'exposition Download PDF

Info

Publication number
WO2005036619A1
WO2005036619A1 PCT/JP2004/014323 JP2004014323W WO2005036619A1 WO 2005036619 A1 WO2005036619 A1 WO 2005036619A1 JP 2004014323 W JP2004014323 W JP 2004014323W WO 2005036619 A1 WO2005036619 A1 WO 2005036619A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
light beam
illumination
conversion element
polarization
Prior art date
Application number
PCT/JP2004/014323
Other languages
English (en)
Japanese (ja)
Inventor
Mitsunori Toyoda
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2005514555A priority Critical patent/JPWO2005036619A1/ja
Publication of WO2005036619A1 publication Critical patent/WO2005036619A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides

Definitions

  • Illumination optical device Illumination optical device, exposure apparatus, and exposure method
  • the present invention relates to an illumination optical device, an exposure device, and an exposure method, and more particularly, to an exposure device for manufacturing a micro device such as a semiconductor device, an imaging device, a liquid crystal display device, and a thin-film magnetic head by a lithography process.
  • a micro device such as a semiconductor device, an imaging device, a liquid crystal display device, and a thin-film magnetic head by a lithography process.
  • a secondary light source (generally, a predetermined light intensity distribution on an illumination pupil plane) is used as a substantial surface light source that also has a light source power, an emitted light flux power, and an optical light source power.
  • the luminous flux of the secondary light source enters the condenser lens after being restricted via the aperture stop located near the rear focal plane of the fly-eye lens.
  • the light beam condensed by the condenser lens illuminates the mask on which a predetermined pattern is formed in a superimposed manner.
  • the light transmitted through the mask pattern forms an image on the wafer via the projection optical system.
  • the mask pattern is projected and exposed (transferred) on the wafer.
  • the pattern formed on the mask is highly integrated, and it is essential to obtain a uniform illuminance distribution on the wafer in order to accurately transfer this fine pattern onto the wafer.
  • ⁇ value aperture stop diameter ⁇ pupil diameter of the projection optical system.
  • ⁇ value numerical aperture on the exit side of the illumination optical system ⁇ numerical aperture on the incident side of the projection optical system. Attention has also been focused on a technology that forms an annular or quadrupolar secondary light source on the rear focal plane of the fly-eye lens to improve the depth of focus and resolution of the projection optical system.
  • the present invention has been made in view of the above-described problems. For example, when mounted on an exposure apparatus, an illumination condition suitable for a mask pattern in which two types of patterns having different characteristics coexist is set to a light amount.
  • An object is to provide an illumination optical device that can be realized while suppressing loss. Further, the present invention uses an illumination optical device capable of realizing illumination conditions suitable for a mask pattern in which, for example, two types of patterns having different characteristics are mixed, by using an appropriate optical mask realized in accordance with the pattern characteristics of the mask.
  • An object of the present invention is to provide an exposure apparatus and an exposure method capable of performing good exposure under a variety of illumination conditions.
  • an illumination optical device that illuminates a surface to be irradiated based on a light beam from a light source unit.
  • a first light beam conversion element that is arranged in the light path of the light beam from the light source unit and converts the light beam into a light beam having a first cross-sectional shape
  • a second luminous flux conversion element disposed in the optical path of the luminous flux from the light source unit, for converting the luminous flux into a luminous flux having a second cross-sectional shape
  • the luminous flux having the first cross-sectional shape is arranged in the optical path between the luminous flux having the first cross-sectional shape from the first luminous flux conversion element and the luminous flux having the second cross-sectional shape from the second luminous flux converting element.
  • a condensing optical system that guides a light beam having the second cross-sectional shape to a second area different from the first area on the illumination pupil plane, while guiding the light flux to the first area on the illumination pupil plane of the illumination optical device;
  • a polarization state changer arranged in an optical path between a light source unit and the illumination pupil plane to change the polarization state of the light flux reaching the first area and the polarization state of the light flux reaching the second area independently.
  • an illumination optical device for illuminating a surface to be illuminated
  • an illumination optical device including a polarization state control means for independently controlling.
  • an illumination optical device for illuminating an irradiated surface
  • a first light beam conversion element for converting a light beam from the light source unit into a light beam having a first cross-sectional shape corresponding to a first region on the illumination pupil plane;
  • a second light beam conversion element for converting a light beam from the light source unit into a light beam having a second cross-sectional shape corresponding to a second region on the illumination pupil plane;
  • a beam splitter for splitting a light beam from the light source unit and guiding the light beam to the first light beam conversion element and the second light beam conversion element, respectively;
  • Intensity changing means for changing the ratio of the intensity of light reaching the first region via the first light beam conversion device and the intensity of light reaching the second region via the second light beam conversion device.
  • an illumination optical device characterized by comprising:
  • an illumination optical device for illuminating a surface to be irradiated
  • a first light beam conversion element for converting a light beam from the light source unit into a light beam having a first cross-sectional shape corresponding to a first region on the illumination pupil plane;
  • a second light beam conversion element for converting a light beam from the light source unit into a light beam having a second cross-sectional shape corresponding to a second region on the illumination pupil plane;
  • An illumination optical device wherein the first light beam conversion element and the second light beam conversion element are configured to be exchangeable with respect to an illumination light path.
  • an illumination optical apparatus for illuminating a surface to be illuminated based on a light flux of a light source unit
  • a polarization fluctuation eliminating unit disposed between the light source unit and the irradiated surface to prevent a change in the polarization state of a light beam from the light source unit;
  • the polarization fluctuation eliminating means includes: a polarization beam splitter that divides a light beam from the light source unit according to a polarization state; a polarization adjustment member that aligns the polarization state of the light beam divided by the polarization beam splitter; And a light beam combining optical system for combining the light beams split by the beam splitter.
  • an illumination optical apparatus for illuminating a mask.
  • An exposure device comprising: exposing a pattern of the mask onto a photosensitive substrate.
  • the polarization state of the first region and the polarization state of the second region on the illumination pupil plane are obtained by the action of two or more light beam conversion elements, the condensing optical system, and the polarization state changing means. State can be controlled independently.
  • the light reaching the first area on the illumination pupil plane is formed by the action of the polarizing beam splitter, the two or more light beam converting elements, and the polarization state adjusting means for adjusting the polarization state of the light incident on the polarizing beam splitter. It is possible to change the ratio between the intensity of the light and the intensity of the light reaching the second region.
  • the illumination optical device of the present invention when the illumination optical device of the present invention is mounted on an exposure apparatus, it is possible to realize illumination conditions suitable for a mask pattern in which two types of patterns having different characteristics are mixed while suppressing loss of light amount. it can. Further, in the exposure apparatus and the exposure method using the illumination optical device of the present invention, it is possible to realize illumination conditions suitable for a mask pattern in which two types of patterns having different characteristics are mixed. Good exposure can be performed under appropriate lighting conditions realized by the above, and thus a good device can be manufactured with high throughput.
  • the polarization states of the vertically or horizontally polarized light and the 45 or 135 degree polarized light can be separately adjusted. Exposure can be performed while favorably correcting polarization state collapse caused by an optical path bending mirror disposed in an optical path or a projection optical path.
  • FIG. 1 is a diagram schematically showing a configuration of an exposure apparatus provided with an illumination optical device according to a first embodiment of the present invention.
  • FIG. 2 is a diagram showing an annular tripolar secondary light source formed on an illumination pupil plane in the first embodiment.
  • FIG. 3 is a diagram showing a pentapole secondary light source and a deformed annular shape formed on an illumination pupil plane in the first embodiment.
  • ⁇ 4 ⁇ is a view schematically showing a configuration of a main part of an exposure apparatus provided with an illumination optical device according to a second embodiment of the present invention.
  • FIG. 5 is a diagram schematically showing a main configuration of an exposure apparatus including an illumination optical device according to a modification of the first embodiment.
  • FIG. 6 is a diagram schematically showing a main configuration of an exposure apparatus including an illumination optical device according to a modification of the second embodiment.
  • FIG. 7 is a diagram schematically showing a main configuration of an exposure apparatus including an illumination optical device according to a modification of the first or second embodiment.
  • FIG. 8 is a diagram schematically showing a configuration of a main part of an exposure apparatus provided with an illumination optical device according to a modification shown in FIG. 7.
  • FIG. 9 is a view showing an octupole secondary light source formed on an illumination pupil plane in the modification shown in FIG. 7.
  • FIG. 10 is a flowchart of a method for obtaining a semiconductor device as a micro device.
  • FIG. 11 is a flowchart of a method for obtaining a liquid crystal display element as a micro device.
  • FIG. 1 is a view schematically showing a configuration of an exposure apparatus provided with an illumination optical device according to a first embodiment of the present invention.
  • the Z axis is along the normal direction of the wafer W as the photosensitive substrate
  • the Y axis is in the plane of the wafer W
  • the Y axis is in the direction parallel to the plane of FIG.
  • the exposure apparatus includes a light source 1 for supplying exposure light (illumination light).
  • a light source 1 for supplying exposure light (illumination light).
  • the light source 1 for example, a KrF excimer laser light source that supplies light having a wavelength of 248 nm or an ArF excimer laser light source that supplies light having a wavelength of 193 nm can be used.
  • the almost parallel light flux emitted from the light source 1 along the Z direction is reflected by the folding mirror in the Y direction. After being deflected to the first prism assembly 2 and the second prism assembly 3, the light enters the beam matching unit 4.
  • the first prism assembly 2 is integrally formed by a wedge-shaped first quartz prism 2a and a wedge-shaped first quartz prism 2b having a shape complementary to the first quartz prism 2a. Have been.
  • the second prism assembly 3 is integrally formed by a wedge-shaped second quartz prism 3a and a wedge-shaped second quartz prism 3b having a shape complementary to the second quartz prism 3a. I have.
  • the first prism assembly 2 and the second prism assembly 3 are each configured to be rotatable about an optical axis AX. The operation of the first prism assembly 2 and the second prism assembly 3 will be described later.
  • the beam matching unit 4 includes a beam shaping unit for shaping the parallel beam supplied from the light source 1 into a parallel beam having a predetermined sectional shape, and an optical axis AX of the parallel beam supplied from the light source 1 Beam angle adjusting means for adjusting the angle with respect to the laser beam, beam parallel moving means for parallel moving the parallel beam supplied from the light source 1 with respect to the optical axis AX, and the like. That is, the beam matching unit 4 converts the incident light beam into a light beam having a cross section of an appropriate size and shape, guides the light beam to the polarization beam splitter 5 at the subsequent stage, and changes the position and angle of the light beam incident on the polarization beam splitter 5. It has a function to actively correct the degree fluctuation.
  • the prism type polarizing beam splitter 5 subsequent to the beam matching unit 4 is provided with a right-angle prism 6 as reflecting means.
  • the right-angle prism 6 is positioned so as to reflect the reflected light from the polarizing beam splitter 5 and to guide the reflected light along the optical path parallel to the optical path of the transmitted light of the polarizing beam splitter 5. Therefore, of the light incident on the polarization beam splitter 15, the S-polarized light reflected on the polarization splitting surface is reflected on the reflection surface of the right-angle prism 6 and then incident on the first diffractive optical element 7. On the other hand, of the light incident on the polarization beam splitter 5, the P-polarized light transmitted through the polarization splitting surface is incident on the second diffractive optical element 8.
  • a diffractive optical element is formed by forming a step having a pitch of about the wavelength of exposure light (illumination light) on a substrate, and has an action of diffracting an incident beam to a desired angle.
  • the first diffractive optical element 7 receives a parallel light beam having a rectangular cross section. In this case, it has the function of forming a circular light intensity distribution in the far field (or Fraunhofer diffraction region).
  • the second diffractive optical element 8 has a function of forming a dipole-like light intensity distribution spaced along the X direction in the far field when a parallel light beam having a rectangular cross section is incident. .
  • the first diffractive optical element 7 and the second diffractive optical element 8 are configured to be detachable from the illumination optical path, and can be exchanged for other first and second diffractive optical elements having different characteristics. Is configured.
  • the light beam passing through the first diffractive optical element 7 and the second diffractive optical element 8 passes through a zoom lens 9 to a microlens array (or fly-eye lens) 10 having an incident surface located near the rear focal plane. Each is incident. That is, the zoom lens 9 arranges the first diffractive optical element 7 and the second diffractive optical element 8 and the entrance surface of the microlens array 10 substantially in a Fourier transform relationship.
  • the microlens array 10 is an optical element composed of a large number of microlenses having a positive refractive power arranged vertically and horizontally and densely.
  • a microlens array is formed by, for example, performing etching on a parallel flat plate to form a group of microlenses.
  • each micro lens constituting the micro lens array is smaller than each lens element constituting the fly-eye lens.
  • the microlens array has a large number of microlenses (microrefractive surfaces) formed integrally without being isolated from each other.
  • a microlens array is a wavefront splitting optical integrator similar to a fly-eye lens in that lens elements having positive refracting power are arranged vertically and horizontally.
  • the light beam passing through the first diffractive optical element 7 is transmitted to the rear focal plane of the zoom lens 9 (and thus to the incident surface of the microlens array 10), for example, in a circular shape centered on the optical axis AX.
  • the territory is formed.
  • the luminous flux passing through the second diffractive optical element 8 is spaced at the rear focal plane of the zoom lens 9 (and, consequently, at the entrance plane of the microlens array 10), for example, along the optical axis AX in the X direction. It forms a dipole illumination field in the X direction that also has two separate circular illumination field forces.
  • the light beam incident on the microlens array 10 is two-dimensionally split, and the rear focal plane of the microlens array 10 has an illumination formed by the incident light beam, as shown in FIG. Field and
  • a secondary light source having the same light intensity distribution that is, a circular surface light source 3 la centered on the optical axis AX, and two circular light sources spaced apart along the X direction around the optical axis AX
  • a three-pole secondary light source (31a, 31b) in the X direction consisting of a substantial surface light source of 3 lb is formed.
  • the luminous flux from the secondary light source in the X direction formed on the rear focal plane (illumination pupil plane) of the microlens array 10 is subjected to the condensing operation of the condenser optical system 11 and then is subjected to mask brightening.
  • the lamp 12 is illuminated in a superimposed manner.
  • a rectangular illumination field corresponding to the shape and the focal length of each microlens constituting the microlens array 10 is formed on the mask blind 12 as the illumination field stop.
  • the light flux passing through the rectangular opening (light transmitting portion) of the mask blind 12 irradiates the mask M on which a predetermined pattern is formed in a superimposed manner after receiving the light-condensing action of the imaging optical system 13.
  • the imaging optical system 13 forms an image of the rectangular opening of the mask blind 12 on the mask M.
  • the light flux transmitted through the pattern of the mask M forms an image of the mask pattern on the wafer W as a photosensitive substrate via the projection optical system PL.
  • each exposure area of the wafer W The pattern of the mask M is sequentially exposed.
  • the focal length of the zoom lens 9 changes, the entire secondary light source is similarly enlarged or reduced.
  • the second diffractive optical element 8 is a diffractive optical element for dipole illumination in the X direction that forms a dipole secondary light source spaced along the X direction about the optical axis AX.
  • the element is configured.
  • a second diffractive optical element 8a (not shown) for Z-direction dipole illumination is set in the illumination optical path, so that the Z-direction tripole illumination can be performed. It can be performed.
  • the second diffractive optical element 8a for dipole illumination in the Z direction has a function of forming a dipole-like light intensity distribution spaced along the Z direction in the far field when a parallel light beam enters. .
  • the light beam passing through the second diffractive optical element 8a forms a dipole-shaped illumination field on the incident surface of the microlens array 10, for example, spaced along the optical axis AX in the Z direction.
  • the rear focal plane of the microlens array 10 has a substantially circular light source 31a centered on the optical axis AX and a Z-axis centered on the optical axis AX. direction , And a secondary light source (31a, 31c) having three poles in the Z direction is formed, which is composed of two substantially circular surface light sources 31c spaced apart from each other.
  • the second diffractive optical element 8b for quadrupole illumination has a function of forming a quadrupolar light intensity distribution in the far field when a parallel light beam enters. Therefore, the light beam passing through the second diffractive optical element 8b forms, for example, a quadrupole illumination field centered on the optical axis AX on the incident surface of the microlens array 10. As a result, as shown in FIG.
  • the rear focal plane of the microphone-aperture lens array 10 has a substantially circular circular surface light source 31a centered on the optical axis AX, and a circular centered light source 31a
  • a five-pole secondary light source (31a, 31d) consisting of four circular substantially surface light sources 31d arranged at the vertices of a square or rectangle having one side along the X direction is formed. Is done.
  • modified annular illumination can be performed.
  • the second diffractive optical element 8c for annular illumination has a function of forming an annular (annular) light intensity distribution in the far field when a parallel light beam enters. Therefore, the light beam passing through the second diffractive optical element 8c forms, for example, an annular illumination field around the optical axis AX on the incident surface of the micro lens array 10.
  • the rear focal plane of the microlens array 10 has a substantially circular surface light source 31a centered on the optical axis AX and a circular surface light source 31a centered on the optical axis AX.
  • a deformed annular secondary light source (31a, 31e) including the annular annular surface light source 31e is formed.
  • a second diffractive optical element 8 for dipole illumination in the X direction a second diffractive optical element 8a for dipole illumination in the Z direction, a second diffractive optical element 8b for quadrupole illumination, and an annular illumination
  • the number and arrangement of the surface light sources formed apart from the optical axis AX a second diffractive optical element 8c, the number and arrangement of the surface light sources formed apart from the optical axis AX , And the shape and size of each surface light source can be changed.
  • the first diffractive optical element 7 forms a relatively small circular substantially surface light source around the optical axis AX to perform circular illumination with a relatively small ⁇ value.
  • a diffractive optical element for small ⁇ illumination instead of the first diffractive optical element 7 for small ⁇ illumination, a first diffractive optical element having other characteristics is used in the illumination optical path. By setting to the middle, the shape and size of the relatively small surface light source centered on the optical axis AX can be changed.
  • the light that reaches the surface light source (31a) formed around the optical axis AX is S-polarized light, and each of the surface light sources (31b-31e) formed away from the optical axis AX.
  • the light reaching) is P-polarized.
  • the first diffractive optical element 7 is arranged in the optical path between the polarizing beam splitter 5 and the zoom lens 9
  • the second diffractive optical element 8 is arranged in the optical path between the right-angle prism 6 and the zoom lens 9.
  • the light reaching the surface light source formed around the optical axis AX becomes P-polarized light
  • the light reaching each surface light source formed away from the optical axis AX becomes S-polarized light.
  • the first diffractive optical element 7 converts the light beam from the light source 1 into a light beam having the first cross-sectional shape corresponding to the first region on the illumination pupil plane, specifically, the region including the optical axis. It constitutes a first light beam conversion element for conversion.
  • the second diffractive optical element 8 converts the light beam from the light source 1 into a second area on the illumination pupil plane, more specifically, a second sectional shape corresponding to an annular or multiple pole area away from the optical axis. And a second light beam conversion element for converting the light beam into a second light beam.
  • the polarizing beam splitter 5 splits the light beam from the light source 1 to a first diffractive optical element 7 as a first light beam converting element and a second diffractive optical element 8 as a second light beam converting element, respectively. It constitutes a beam splitter for guiding.
  • the vertex direction of the first quartz prism 2a and the vertex direction of the first quartz prism 2b are set in opposite directions, and the deflective action of the first quartz prism 2a is reduced by the first quartz prism 2b. It is configured to compensate (correct).
  • the vertex direction of the second quartz prism 3a and the vertex direction of the second quartz prism 3b are set in opposite directions, and the eccentric effect of the second quartz prism 3a is reduced by the second quartz prism. 3b is configured to compensate (correct).
  • the light source 1 When a KrF excimer laser light source or an ArF excimer laser light source is used as the light source 1, substantially linearly polarized light supplied from the light source 1 is incident on the first prism assembly 2.
  • the first prism assembly 2 is rotated about the optical axis AX while the second prism assembly 3 is fixed. Accordingly, the intensity ratio between the P-polarized light component and the S-polarized light component included in the light emitted from the second prism assembly 3 can be continuously changed.
  • the crystal optical axis of the first crystal prism 2a and the crystal optical axis of the second crystal prism 3a form an angle of 45 degrees.
  • the light emitted from the second prism assembly 3 can be converted into substantially unpolarized light regardless of the polarization state of the light incident on the first prism assembly 2.
  • the first quartz prism 2a and the second prism assembly 3 constitute a polarization state adjusting means for adjusting the polarization state of the light incident on the polarization beam splitter 5.
  • the S-polarized light component reflected by the polarization beam splitter 5 and the polarization beam splitter 5 are separated.
  • the intensity ratio with the transmitted P-polarized component changes.
  • the intensity of light reaching the surface light source (31a) formed so as to include the optical axis AX on the illumination pupil plane via the first diffractive optical element 7 and the illumination via the second diffractive optical element 8 The ratio with the intensity of light reaching the surface light source (31b-31e) formed on the pupil plane away from the optical axis AX changes.
  • the polarization state adjusting means (2, 3) and the polarization beam splitter 5 are connected to the optical axis AX as the first region via the first diffractive optical element 7 as the first light beam conversion element. And reaches the surface light source (31b-31e) distant from the optical axis AX as the second area via the second diffractive optical element 8 as the second light flux conversion element. It constitutes intensity changing means for changing the ratio with the light intensity.
  • the surface light source (31a) including the optical axis AX is formed on the illumination pupil plane via the first diffractive optical element 7 as the first light beam conversion element.
  • a surface light source (31b-31e) distant from the optical axis AX is formed on the illumination pupil plane via the second diffractive optical element 8 as a two-beam conversion element. Therefore, for example, a pattern suitable for small ⁇ illumination using the first diffractive optical element 7 and a pattern suitable for dipole illumination, quadrupole illumination, or annular illumination using the second diffractive optical element 8 are mixed. Lighting conditions suitable for such mask patterns, that is, appropriate lighting conditions necessary to faithfully transfer a mask pattern in which two types of patterns with different characteristics are mixed, while suppressing loss of light. it can.
  • the first diffractive optical element is actuated by the action of the intensity changing means (2, 3, 5).
  • the intensity of light reaching the surface light source (31a) formed so as to include the optical axis AX on the illumination pupil plane via the element 7 and the optical axis AX on the illumination pupil plane via the second diffractive optical element 8 It is possible to change the ratio with the intensity of light reaching the surface light source (31b-31e) formed away from the light source. Therefore, the ratio of the light intensity in small ⁇ illumination using the first diffractive optical element 7 to the light intensity in dipole illumination, quadrupole illumination, or annular illumination using the second diffractive optical element 8 is appropriately changed. In this way, it is possible to realize various illumination conditions with respect to light intensity.
  • the first diffractive optical element 7 as the first light beam converting element and the second diffractive optical element 8 as the second light beam converting element are configured to be interchangeable with respect to the illumination light path. Have been. Therefore, it is possible to switch between X-direction tripole illumination, ⁇ -direction tripole illumination, pentapole illumination, and modified annular illumination, and to determine the number and arrangement of surface light sources formed away from the optical axis ⁇ ⁇ ⁇ , and By changing the shape and size of each surface light source, and by changing the shape and size of a relatively small surface light source centered on the optical axis ⁇ , there is a wide variety of secondary light source forms. Lighting conditions can be realized.
  • FIG. 4 is a diagram schematically showing a main configuration of an exposure apparatus provided with an illumination optical device according to a second embodiment of the present invention.
  • the second embodiment has a configuration similar to that of the first embodiment.
  • a 1Z2 wavelength plate 14 is provided in the optical path between the right-angle prism 6 and the first diffractive optical element 7, and the optical path between the polarization beam splitter 5 and the second diffractive optical element 8 is provided.
  • the difference from the first embodiment is that a 1Z2 wavelength plate 15 is provided therein, and a prism assembly 16 is provided in the optical path between the first diffractive optical element 7 and the zoom lens 9. Therefore, in FIG.
  • the 1Z2 wavelength plate 14 in which the crystal optical axis is rotatable around the optical axis AX is arranged.
  • a 1Z2 wavelength plate 15 having a crystal optical axis rotatable around an optical axis AX is arranged.
  • a wedge-shaped A prism assembly 16 integrally formed of a quartz prism 16a of this type and a wedge-shaped quartz prism 16b having a shape complementary to the quartz prism 16a is arranged.
  • the prism assembly 16 is configured to be rotatable about the optical axis AX.
  • the apex direction of the quartz prism 16a and the apex direction of the quartz prism 16b are set to be opposite, and the quartz prism 16b compensates (corrects) the deflection effect of the quartz prism 16a.
  • the quartz prism 16b compensates (corrects) the deflection effect of the quartz prism 16a.
  • the prism assembly 16 by setting the direction of the crystal optic axis of the quartz prism 16a at an angle of 45 degrees with respect to the plane of polarization of the incident linearly polarized light, the light emitted from the prism assembly 16 is substantially reduced. It is converted to light in a non-polarized state.
  • the direction of the crystal optic axis of the quartz prism 16a is set at an angle of 0 or 90 degrees with respect to the plane of polarization of the incident linearly polarized light, the plane of polarization of the incident linearly polarized light will remain unchanged. Passes through assembly 16.
  • the 1Z2 wavelength plate 14 is provided between the right-angle prism 6 and the first diffractive optical element 7 and thus between the polarizing beam splitter 5 and the first diffractive optical element 7 as the first light beam converting element.
  • the first phase plate is arranged in the optical path between the first and second polarizers to change the direction of the plane of polarization of the incident linearly polarized light (ie, S-polarized light).
  • the 1Z2 wavelength plate 15 is disposed in the optical path between the polarizing beam splitter 5 and the second diffractive optical element 8 as the second light beam converting element, and polarizes incident linearly polarized light (ie, P-polarized light). It constitutes a second phase plate for changing the direction of the plane.
  • the prism assembly 16 is disposed in the optical path between the first diffractive optical element 7 and the zoom lens 9 and, consequently, in the optical path between the 1Z2 wavelength plate 14 as the first phase plate and the zoom lens 9. And a depolarizing element for converting incident linearly polarized light into unpolarized light.
  • the 1Z2 wavelength plate 14 and the prism assembly 16 cooperate to form an optical axis AX on the illumination pupil plane via the first diffraction optical element 7.
  • the polarization state of light reaching the surface light source (31a) can be set to linearly polarized light or non-polarized light having a polarization plane in an arbitrary direction. Further, by the action of the 1Z2 wavelength plate 15, the polarization state of light reaching the surface light source (31b-31e) formed apart from the optical axis AX on the illumination pupil plane via the second diffractive optical element 8 can be changed arbitrarily. Can be set to linearly polarized light having a polarization plane in the direction of.
  • the polarizing beam splitter 5, the 1Z2 wavelength plate 14, the 1Z2 wavelength plate 15, and the prism assembly 16 form the first region via the first diffractive optical element 7 as the first light beam conversion element.
  • the light reaching the surface light source (31a) including all the optical axes AX and the surface light source (31b-31e) separated from the optical axis AX as the second region via the second diffractive optical element 8 as the second light beam conversion element ) Constitutes a polarization state changing means for changing the polarization state of at least one of the light beams reaching the first and second light beams.
  • the polarization state changing means (5, 14, 15, 16), the first diffractive optical element 7, and the second diffractive optical element 8 form an optical axis AX as a first area on the illumination pupil plane.
  • Polarization state control means for independently controlling the polarization state of the surface light source (31a) including the surface light source (31a) and the polarization state of the surface light source (31b-31e) remote from the optical axis AX as the second area on the illumination pupil plane. Is composed.
  • the polarization state of the surface light source formed apart from the optical axis AX and the polarization state of the surface light source including the optical axis AX are independent of each other. It is possible to realize a variety of illumination conditions with respect to the polarization state of the secondary light source by appropriately changing.
  • the 1Z2 wavelength plate 14 as the first phase plate is disposed in the optical path between the rectangular prism 6 and the first diffractive optical element 7.
  • the present invention is not limited to this.
  • the 1Z2 wave plate 14 can be arranged in the optical path between the first diffractive optical element 7 and the zoom lens 9.
  • the 1Z2 wavelength plate 15 as the second phase plate is disposed in the optical path between the polarization beam splitter 5 and the first diffractive optical element 8.
  • the present invention is not limited to this.
  • the 1Z2 wavelength plate 15 can be arranged in the optical path between the second diffractive optical element 8 and the zoom lens 9.
  • the prism assembly 16 as a depolarizing element is arranged in the optical path between the first diffractive optical element 7 and the zoom lens 9.
  • the prism assembly 16 can be arranged in the optical path between the 1Z2 wavelength plate 14 as the first phase plate and the first diffractive optical element 7 without being limited to this.
  • the prism assembly 16 is arranged in the optical path between the second diffractive optical element 8 and the zoom lens 9 or in the optical path between the 1Z2 wavelength plate 15 as the second phase plate and the second diffractive optical element 8. You can also.
  • a prism assembly as a depolarizing element can be arranged on both sides of the optical path between the lens 9 and the prism 9.
  • FIG. 5 is a diagram schematically showing a configuration of a main part of an exposure apparatus including an illumination optical device according to a modification of the first embodiment. 5 is different from the first embodiment in the optical path between the power polarizing beam splitter 5 and the first diffractive optical element 7 having a configuration similar to that of the first embodiment.
  • FIG. 6 a modification of FIG. 6 will be described, focusing on differences from the first embodiment.
  • the reflection surface of the right-angle prism 6 is an amplitude division surface (typically a half mirror), and a pair of mirrors 17a and 17b are provided to detour light transmitted through the amplitude division surface.
  • An optical path is formed, and light guided along the bypass optical path is re-entered on the amplitude division plane so as to substantially match light reflected on the amplitude division plane.
  • FIG. 6 is a diagram schematically showing a main configuration of an exposure apparatus including an illumination optical device according to a modification of the second embodiment.
  • the modification of FIG. 6 is similar to that of the second embodiment except that the 1Z2 wave plate 14 is provided in the optical path between the right-angle prism 6 and the first diffractive optical element 7, and the 1Z2
  • This embodiment is different from the second embodiment in that the arrangement of the wave plate 15 and the prism assembly 16 is omitted.
  • a modification of FIG. 6 will be described, focusing on differences from the second embodiment.
  • the S-polarized light reflected by the polarization beam splitter 5 is incident on the 1Z2 wavelength plate 14 via the right-angle prism 6.
  • the light converted to P-polarized light via the 1Z2 wavelength plate 14 reaches the incident surface of the microphone lens array 10 in the P-polarized state via the first diffractive optical element 7 and the zoom lens 9.
  • the P-polarized light transmitted through the polarizing beam splitter 5 reaches the incident surface of the microlens array 10 in the P-polarized state via the second diffractive optical element 8 and the zoom lens 9.
  • the incident light is divided by the polarization beam splitter 5 in the polarization direction, and the reflected light of the polarization beam splitter 5 is used by using the 1Z2 wavelength plate 14 as a phase member.
  • the polarization beam splitter 5 After matching the polarization state to the polarization state of the transmitted light of the polarization beam splitter 5, the polarization beam splitter 5 passes through a zoom lens 9 (or a condenser lens) as an optical path combining optical system. The reflected light and transmitted light of one splitter 5 are combined.
  • the polarization state of the light incident on the polarization beam splitter 5 is changed by the influence of the light transmitting member that is disposed in the optical path upstream of the polarization beam splitter 5 and is formed of birefringent fluorite. Even if it fluctuates over time, the polarization state of the light combined via the zoom lens 9 can always be kept constant.
  • a wave plate (phase member) is used as a member for changing the direction of the plane of polarization of the linearly polarized light that enters.
  • an optical rotator not limited to a wave plate may be used.
  • the optical rotator for example, an optical rotator formed of quartz can be used.
  • a polarizer disclosed in Japanese Patent Application Publication No. 2003-35822 and US Patent Publication No. 2002Z176166A corresponding thereto may be applied instead of the 1Z2 wavelength plate 15.
  • the polarization state of light reaching the surface light source (31b-31e) formed apart from the optical axis AX on the illumination pupil plane via the second diffractive optical element 8 is changed to a circumference around the optical axis AX. It can be set to polarized light with a plane of polarization in the direction (tangential polarized light). It is preferable that the tangential polarizer is provided so as to be able to remove the illumination optical path force.
  • U.S. Patent Publication No. 2002Z176166A is incorporated herein by reference.
  • the polarization state of the illumination light to the mask M changes with time in various aspects.
  • the optical member disposed closer to the mask M than the polarizing beam splitter 5 only the optical member without changing the polarization state of light is disposed, that is, for example, a light transmitting member formed of fluorite. Is not preferably arranged.
  • two light beam conversion elements are used, but the number of light beam conversion elements is not limited to two. When three or more light beam conversion elements are used, the light beam from the light source section may be split into three or more branches.
  • FIGS. 7 to 9 show modified examples in which an off-axis catadioptric optical system having an optical path bending mirror for deflecting an optical path is applied as a catadioptric projection optical system.
  • FIG. 7A shows a first intermediate image of an object as an off-axis catadioptric optical system having a field region or a projection region (image forming region) in a region off the optical axis.
  • FIG. 3 is a diagram schematically illustrating a part of an exposure apparatus including a projection optical system PL including a refraction-type third imaging optical system G3 that forms a third image on the image surface as a final image (a tertiary image). is there.
  • FIG. 7 (a) shows the illumination optical device from the microlens array 10 as an optical integrator to the imaging optical system 13 for imaging the image of the mask blind 12. The illumination optical device of the modification shown in FIG.
  • the optical axis of the illumination optical device and the optical axis of the projection optical system PL are coaxial. The point that the optical axis of the illumination optical device is located almost at the center of the field of view of the projection optical system PL.
  • FIG. 7B shows a catadioptric first imaging optical system (Gl, G2) that forms a first intermediate image of an object as an off-axis catadioptric optical system.
  • Gl catadioptric first imaging optical system
  • a part of an exposure apparatus including a projection optical system PL including a refraction type second imaging optical system G3 for forming a final image (secondary image) as an intermediate image on an image plane.
  • FIG. 7 (b) the configuration other than the projection optical system PL is the same as that in FIG. 7 (a), so that the description is omitted here.
  • the off-axis catadioptric projection optical system shown in FIG. 7A is disclosed, for example, in US Patent Publication No. 2003ZOO 11755 and International Publication WO2004Z019128, and FIG.
  • the off-axis catadioptric projection optical system shown in b) is disclosed in, for example, US Pat. No. 5,805,334 and US Pat. No. 2002Z0039175.
  • US Patent Publication No. 2003Z0011755, International Publication WO2004Z019128, US Patent No. 5805334, and US Patent Publication No. 2002Z0039175 are incorporated by reference.
  • a polarization image in particular, a linearly polarized light (a circle centered on the optical axis) which becomes S-polarized with respect to the image plane.
  • V-polarized light (vibrates in the image plane in the X direction in the figure) Linearly polarized light with a plane) or H-polarized light (a straight line with a vibration plane in the Y direction Polarization degree) and the degree of polarization of ⁇ 45 degree polarization ( ⁇ on the image plane, and linear polarization with a vibration plane in the ⁇ 45 degree direction to the X direction in the figure) or 135 degree polarization ( ⁇ on the image plane). Therefore, the degree of polarization degree of linearly polarized light having a vibration plane in ⁇ 135 degrees with respect to the X direction in the drawing may be different from each other.
  • the light beam from the light source unit is divided into four branches, and four light beam conversion elements are used.
  • Each light beam conversion element converts the light beam into V polarized light, H polarized light, ⁇ 45 degree polarized light, and ⁇ 135 degree polarized light.
  • a corresponding light beam is generated, and the degree of polarization of each light beam may be adjusted so as to be S-polarized with respect to the image plane even after passing through the optical path bending mirror.
  • FIG. 8 (a) is a perspective view of a four-part polarization state changing unit
  • FIG. 8 (b) is a first YZ sectional view
  • FIG. 8 (c) is an XY sectional view
  • FIG. d) is a second YZ sectional view.
  • the polarization state changing means shown in FIG. 8 is, for example, the polarization state changing means (5-6) of the embodiment shown in FIG. 1 or the polarization state changing means (5, 14-16) of the embodiment shown in FIG. ),
  • the description of the light path on the light source side of the polarization state changing means and the description of the light path on the light condensing optical system side of the light flux conversion element will be omitted.
  • the polarization state changing means includes a first polarization beam splitter 17, a second polarization beam splitter 19a, a third polarization beam splitter 19b, a first rectangular prism 20a, The second right-angle prism 20b, the third right-angle prism 23, the 1Z2 wavelength plate 18a as the first phase plate, the 1Z2 wavelength plate 18b as the second phase plate, the 1/2 wavelength plate 21a as the third phase plate, and the fourth A 1Z2 wavelength plate 22a as a phase plate, a 1/2 wavelength plate 21b as a fifth phase plate, and a 1Z2 wavelength plate 22b as a sixth phase plate are provided.
  • the 1Z2 wave plates 18a, 18b, 21a, 21b, 22a, 22b are each rotatable around the Y axis in the figure.
  • FIG. 8A the illustration of the first to fourth diffractive optical elements 24a to 25b as the first to fourth light beam conversion elements is omitted.
  • the light from the polarization state adjusting means (not shown) (the first and second prism assemblies 2 and 3 in FIG. 1) is polarized and separated by the first polarization beam splitter 17, and the first polarization beam is split.
  • P-polarized light transmitted through the beam splitter 17 (with respect to the polarization separation surface of the polarization beam splitter 17).
  • P-polarized light linearly polarized light having a vibration plane in the X direction
  • the light transmitted through the polarization splitting surface is emitted from the second polarization beam splitter 19a and travels to the 1Z2 wavelength plate 21a as the third phase plate.
  • the light reflected on the polarization splitting surface of the second polarization beam splitter 19a travels to the 1Z2 wavelength plate 22a as the fourth phase plate via the first right-angle prism 20a.
  • the light amount ratio of the light split into two at the polarization splitting surface of the second polarization beam splitter 19a is appropriately determined by the rotation angle of the 1Z2 wavelength plate 18a as the first phase plate around the optical axis (Y axis). Value is set to
  • the S-polarized light reflected by the first polarizing beam splitter 17 (S-polarized light with respect to the polarization splitting plane of the polarizing beam splitter 17: linearly polarized light having a vibration plane in the Z direction) is the third orthogonal light.
  • S-polarized light with respect to the polarization splitting plane of the polarizing beam splitter 17: linearly polarized light having a vibration plane in the Z direction) is the third orthogonal light.
  • the prism 23 After being reflected by the prism 23, it is incident on a third polarizing beam splitter 19b via a 1Z2 wavelength plate 18b as a second phase plate.
  • the light transmitted through the polarization splitting surface is emitted by the third polarization beam splitter 19b and travels to the 1Z2 wavelength plate 21b as the fifth phase plate. .
  • the light reflected on the polarization splitting surface of the third polarizing beam splitter 19b travels to the sixth phase plate 1Z2 wavelength plate 22b via the second right-angle prism 20b.
  • the light intensity ratio of the light split into two at the polarization splitting surface of the third polarization beam splitter 19b is determined by the rotation angle of the 1Z2 wavelength plate 18b as the second phase plate around the optical axis (Y axis). Value is set to
  • FIG. 9 is a diagram for explaining the light intensity distribution on the illumination pupil plane formed on the rear focal plane of the microlens array 10 as an optical integrator. As shown in FIG. 9, in this modification, octupole illumination is performed as multipole illumination.
  • the light beam from the second diffractive optical element 25a as the second light beam converting element is A light source 31g is formed, a light beam from a third diffractive optical element 24b as a third light beam conversion element forms a surface light source 31h, and a light beam from a fourth diffractive optical element 25b as a fourth light beam conversion element is used as a surface light source 31i. Is formed.
  • the polarization direction of light reaching each of the surface light sources 31f-31i is indicated by an arrow. V polarization is used for the surface light source 31f, H polarization is used for the surface light source 31g, and ⁇ 45 degrees for the surface light source 31h.
  • the directional polarization is ⁇ 135 degrees directional polarization in the surface light source 31i. Then, by appropriately setting the rotation angles of the 1Z2 wavelength plates 21a-22b as the third-sixth phase plates shown in FIG. 8 around the optical axis (Y-axis), the first-fourth light flux conversion is performed.
  • the polarization directions incident on the first to fourth diffractive optical elements 24a to 25b as elements can be set independently, and the polarization directions of the light beams from the respective surface light sources 31f-3 can be set independently. Can be.
  • each of the surface light sources 31f-3 It is also possible to independently adjust the degree of polarization of the luminous flux from the light, and thus the state of polarization.
  • the prism assembly 16 shown in FIG. 4 may be detachably provided in the optical path near the first to fourth diffractive optical elements 24a to 25b.
  • the mask (reticle) is illuminated by the illumination optical device (illumination step), and the transfer pattern formed on the mask is projected onto the photosensitive substrate using the projection optical system.
  • exposing exposure step
  • a micro device semiconductor element, imaging element, liquid crystal display element, thin film magnetic head, etc.
  • an example of a method for obtaining a semiconductor device as a micro device by forming a predetermined circuit pattern on a wafer or the like as a photosensitive substrate using the exposure apparatus of the above-described embodiment will be described. This will be described with reference to FIG.
  • a metal film is deposited on one lot of wafers.
  • a photoresist is applied on the metal film on the one lot wafer.
  • an image of the pattern on the mask is sequentially exposed and transferred to each shot area on the wafer of the lot through the projection optical system.
  • the photoresist on the one lot of wafers is developed, and in step 305, etching is performed on the one lot of wafers using the resist pattern as a mask, thereby forming a pattern on the mask. Corresponding circuit pattern forces are formed in each shot area on each wafer.
  • a device such as a semiconductor element is formed.
  • a semiconductor device manufacturing method a semiconductor device having an extremely fine circuit pattern can be obtained with high throughput.
  • a predetermined pattern is formed on a plate (glass substrate).
  • a liquid crystal display element By forming (a circuit pattern, an electrode pattern, etc.), a liquid crystal display element as a micro device can be obtained.
  • a so-called photolithography step of transferring and exposing a mask pattern onto a photosensitive substrate (a glass substrate coated with a resist) using the exposure apparatus of the above-described embodiment is executed.
  • a predetermined pattern including a large number of electrodes and the like is formed on the photosensitive substrate.
  • the exposed substrate goes through each process such as a developing process, an etching process, and a resist stripping process, so that a predetermined pattern is formed on the substrate, and the process proceeds to the next color filter forming process 402.
  • a large number of sets of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix, or R, G,
  • a color filter is formed by arranging a plurality of sets of filters of three stripes B in the horizontal scanning line direction.
  • a cell assembling step 403 is performed.
  • a liquid crystal panel liquid crystal cell
  • a liquid crystal is injected between the substrate having the predetermined pattern obtained in the pattern forming step 401 and the color filter obtained in the color filter forming step 402, Manufacture panels (liquid crystal cells). Thereafter, in a module assembling step 404, components such as an electric circuit and a backlight for performing a display operation of the assembled liquid crystal panel (liquid crystal cell) are attached to complete a liquid crystal display element. According to the above-described method for manufacturing a liquid crystal display element, a liquid crystal display element having an extremely fine circuit pattern can be obtained with a high throughput.
  • KrF excimer laser light or ArF excimer laser light is used as exposure light.
  • the present invention is not limited to this.
  • the present invention can also be applied to an F laser light source that supplies laser light having a wavelength of 157 nm.
  • the present invention has been described by taking a projection exposure apparatus having an illumination optical apparatus as an example.
  • the present invention is applied to a general illumination optical apparatus for illuminating an irradiated surface other than a mask. It is clear that can be applied.
  • a method of filling the optical path between the projection optical system and the photosensitive substrate with a medium (typically, a liquid) having a refractive index larger than 1.1 that is, a so-called immersion method
  • a method of filling the liquid in the optical path between the projection optical system and the photosensitive substrate a method of locally filling the liquid as disclosed in International Publication No.
  • a method of forming a liquid tank and holding the substrate in the liquid tank can be adopted.
  • International Publication No. WO 99Z49504 is incorporated by reference.
  • the liquid it is preferable to use a liquid that has transparency to exposure light and a refractive index as high as possible, and a liquid that is stable to the photoresist applied to the substrate surface.
  • a liquid that can transmit F laser light such as a fluorine-based perfluoropolyether (PFPE), can be used as the liquid! ,.
  • PFPE fluorine-based perfluoropolyether

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne un dispositif optique d'éclairage qui génère, lorsqu'il est monté, par exemple, sur un dispositif d'exposition, un état d'éclairage qui convient pour un motif de masquage dans lequel deux types de motifs présentant des caractéristiques différentes sont mélangées. Le dispositif optique d'éclairage présente un premier élément de conversion de flux lumineux (7), qui sert à convertir un flux lumineux provenant d'une source de lumière (1) en un flux lumineux présentant une première forme de section transversale, correspondant à une première région d'une surface de pupille d'éclairage, un second élément de conversion de flux lumineux (8), qui sert à convertir le flux lumineux provenant d'une source de lumière en un flux lumineux présentant une seconde forme de section transversale, correspondant à une seconde région de la surface de pupille d'éclairage, un diviseur de faisceau (5), qui sert à diviser le flux lumineux provenant de la source lumineuse et à guider chaque flux lumineux résultant de la division vers le premier élément de conversion de flux lumineux et vers le second élément de conversion de flux lumineux, ainsi que des moyens de changement d'intensité (2, 3, 5), qui servent au changement du rapport entre l'intensité de la lumière atteignant la première région en passant par le premier élément de conversion de flux lumineux et l'intensité de la lumière atteignant la seconde région en passant par le second élément de conversion de flux lumineux.
PCT/JP2004/014323 2003-10-09 2004-09-30 Dispositif optique d'eclairage, et dispositif et procede d'exposition WO2005036619A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005514555A JPWO2005036619A1 (ja) 2003-10-09 2004-09-30 照明光学装置、露光装置および露光方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003350399 2003-10-09
JP2003-350399 2003-10-09

Publications (1)

Publication Number Publication Date
WO2005036619A1 true WO2005036619A1 (fr) 2005-04-21

Family

ID=34431048

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2004/014323 WO2005036619A1 (fr) 2003-10-09 2004-09-30 Dispositif optique d'eclairage, et dispositif et procede d'exposition

Country Status (2)

Country Link
JP (1) JPWO2005036619A1 (fr)
WO (1) WO2005036619A1 (fr)

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007058240A1 (fr) 2005-11-16 2007-05-24 Nikon Corporation Procédé de traitement de substrat, procede de fabrication de photomasque, photomasque et dispositif de fabrication de dispositif
EP1953805A1 (fr) * 2005-11-10 2008-08-06 Nikon Corporation Systeme d eclairage optique, systeme d exposition et procede d exposition
WO2009050966A1 (fr) * 2007-10-16 2009-04-23 Nikon Corporation Système optique de transmission de lumière, système optique d'éclairage, appareil d'exposition, et procédé de fabrication de dispositif
JP2009099629A (ja) * 2007-10-12 2009-05-07 Nikon Corp 照明光学装置、露光方法及び装置、並びに電子デバイスの製造方法
JP2009212487A (ja) * 2008-03-05 2009-09-17 Nanya Technology Corp 入射光の電力比を制御するためのフィードバック制御システム及びフィードバック方法
WO2009128293A1 (fr) * 2008-04-14 2009-10-22 株式会社ニコン Unité de modulation de la lumière spatiale, système d’éclairage optique, appareil d’exposition et procédé de fabrication
JPWO2008007632A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
EP2200070A1 (fr) * 2007-10-12 2010-06-23 Nikon Corporation Appareil optique d'éclairage, et procédé et appareil d'exposition
JP2011040646A (ja) * 2009-08-17 2011-02-24 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法
JP2011040618A (ja) * 2009-08-12 2011-02-24 Nikon Corp 回折光学素子、照明光学系、露光装置、デバイスの製造方法、及び回折光学素子の設計方法
US8339578B2 (en) 2004-01-27 2012-12-25 Nikon Corporation Optical system, exposure system, and exposure method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US8446579B2 (en) 2008-05-28 2013-05-21 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US8462317B2 (en) 2007-10-16 2013-06-11 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8520291B2 (en) 2007-10-16 2013-08-27 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8861084B2 (en) 2004-01-16 2014-10-14 Carl Zeiss Smt Ag Polarization-modulating optical element
US9097981B2 (en) 2007-10-12 2015-08-04 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9140992B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction
US9581911B2 (en) 2004-01-16 2017-02-28 Carl Zeiss Smt Gmbh Polarization-modulating optical element
WO2023117611A1 (fr) * 2021-12-23 2023-06-29 Asml Netherlands B.V. Systèmes et procédés de génération de multiples points d'éclairage à partir d'une seule source d'éclairage

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653120A (ja) * 1992-07-27 1994-02-25 Nikon Corp 照明光学装置
JPH06204121A (ja) * 1992-12-28 1994-07-22 Canon Inc 照明装置及びそれを用いた投影露光装置
JPH07283121A (ja) * 1994-04-15 1995-10-27 Fujitsu Ltd 露光装置
JP2000114157A (ja) * 1998-09-29 2000-04-21 Nikon Corp 照明装置及び該照明装置を備える投影露光装置
JP2002359176A (ja) * 2001-05-31 2002-12-13 Canon Inc 照明装置、照明制御方法、露光装置、デバイス製造方法及びデバイス
JP2003090978A (ja) * 2001-09-17 2003-03-28 Canon Inc 照明装置、露光装置及びデバイス製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653120A (ja) * 1992-07-27 1994-02-25 Nikon Corp 照明光学装置
JPH06204121A (ja) * 1992-12-28 1994-07-22 Canon Inc 照明装置及びそれを用いた投影露光装置
JPH07283121A (ja) * 1994-04-15 1995-10-27 Fujitsu Ltd 露光装置
JP2000114157A (ja) * 1998-09-29 2000-04-21 Nikon Corp 照明装置及び該照明装置を備える投影露光装置
JP2002359176A (ja) * 2001-05-31 2002-12-13 Canon Inc 照明装置、照明制御方法、露光装置、デバイス製造方法及びデバイス
JP2003090978A (ja) * 2001-09-17 2003-03-28 Canon Inc 照明装置、露光装置及びデバイス製造方法

Cited By (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9146474B2 (en) 2003-04-09 2015-09-29 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9164393B2 (en) 2003-04-09 2015-10-20 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas
US8675177B2 (en) 2003-04-09 2014-03-18 Nikon Corporation Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
US9244359B2 (en) 2003-10-28 2016-01-26 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9146476B2 (en) 2003-10-28 2015-09-29 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423697B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9140992B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9140993B2 (en) 2003-10-28 2015-09-22 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9164209B2 (en) 2003-11-20 2015-10-20 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power having different thicknesses to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9316772B2 (en) 2004-01-16 2016-04-19 Carl Zeiss Smt Gmbh Producing polarization-modulating optical element for microlithography system
US9581911B2 (en) 2004-01-16 2017-02-28 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US8861084B2 (en) 2004-01-16 2014-10-14 Carl Zeiss Smt Ag Polarization-modulating optical element
US8351021B2 (en) 2004-01-27 2013-01-08 Nikon Corporation Optical system, exposure system, and exposure method
US8436983B2 (en) 2004-01-27 2013-05-07 Nikon Corporation Optical system, exposure system, and exposure method
US8339578B2 (en) 2004-01-27 2012-12-25 Nikon Corporation Optical system, exposure system, and exposure method
US9423694B2 (en) 2004-02-06 2016-08-23 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9140990B2 (en) 2004-02-06 2015-09-22 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9429848B2 (en) 2004-02-06 2016-08-30 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
EP1953805A4 (fr) * 2005-11-10 2010-03-31 Nikon Corp Systeme d eclairage optique, systeme d exposition et procede d exposition
EP1953805A1 (fr) * 2005-11-10 2008-08-06 Nikon Corporation Systeme d eclairage optique, systeme d exposition et procede d exposition
JP5067162B2 (ja) * 2005-11-10 2012-11-07 株式会社ニコン 照明光学装置、露光装置、および露光方法
JP2012182479A (ja) * 2005-11-10 2012-09-20 Nikon Corp 照明光学装置、露光装置、および露光方法
WO2007058240A1 (fr) 2005-11-16 2007-05-24 Nikon Corporation Procédé de traitement de substrat, procede de fabrication de photomasque, photomasque et dispositif de fabrication de dispositif
JPWO2008007632A1 (ja) * 2006-07-12 2009-12-10 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US9057963B2 (en) 2007-09-14 2015-06-16 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US9366970B2 (en) 2007-09-14 2016-06-14 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
EP2200070A1 (fr) * 2007-10-12 2010-06-23 Nikon Corporation Appareil optique d'éclairage, et procédé et appareil d'exposition
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
JP2009099629A (ja) * 2007-10-12 2009-05-07 Nikon Corp 照明光学装置、露光方法及び装置、並びに電子デバイスの製造方法
EP2200070A4 (fr) * 2007-10-12 2012-11-21 Nikon Corp Appareil optique d'éclairage, et procédé et appareil d'exposition
US9097981B2 (en) 2007-10-12 2015-08-04 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
JP5459482B2 (ja) * 2007-10-16 2014-04-02 株式会社ニコン 送光光学系、照明光学系、露光装置、およびデバイス製造方法
US8508717B2 (en) 2007-10-16 2013-08-13 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8462317B2 (en) 2007-10-16 2013-06-11 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
WO2009050966A1 (fr) * 2007-10-16 2009-04-23 Nikon Corporation Système optique de transmission de lumière, système optique d'éclairage, appareil d'exposition, et procédé de fabrication de dispositif
US8520291B2 (en) 2007-10-16 2013-08-27 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US9057877B2 (en) 2007-10-24 2015-06-16 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2009212487A (ja) * 2008-03-05 2009-09-17 Nanya Technology Corp 入射光の電力比を制御するためのフィードバック制御システム及びフィードバック方法
WO2009128293A1 (fr) * 2008-04-14 2009-10-22 株式会社ニコン Unité de modulation de la lumière spatiale, système d’éclairage optique, appareil d’exposition et procédé de fabrication
US8456624B2 (en) 2008-05-28 2013-06-04 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
US8446579B2 (en) 2008-05-28 2013-05-21 Nikon Corporation Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
JP2011040618A (ja) * 2009-08-12 2011-02-24 Nikon Corp 回折光学素子、照明光学系、露光装置、デバイスの製造方法、及び回折光学素子の設計方法
JP2011040646A (ja) * 2009-08-17 2011-02-24 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法
WO2023117611A1 (fr) * 2021-12-23 2023-06-29 Asml Netherlands B.V. Systèmes et procédés de génération de multiples points d'éclairage à partir d'une seule source d'éclairage
TWI858470B (zh) * 2021-12-23 2024-10-11 荷蘭商Ａｓｍｌ荷蘭公司 用於從單照明源產生多個照明位點之系統及方法

Also Published As

Publication number Publication date
JPWO2005036619A1 (ja) 2007-11-22

Similar Documents

Publication Publication Date Title
WO2005036619A1 (fr) Dispositif optique d'eclairage, et dispositif et procede d'exposition
EP2273305B1 (fr) Unité optique, appareil d'éclairage optique, appareil d'exposition, et procédé de fabrication du dispositif
TWI612338B (zh) 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
US9195069B2 (en) Illumination optical apparatus, exposure apparatus, and device manufacturing method
KR20060129409A (ko) 광학계, 노광 장치 및 노광 방법
JP4470095B2 (ja) 照明光学装置、露光装置および露光方法
JP2006196715A (ja) 光束変換素子、照明光学装置、露光装置、および露光方法
US8223318B2 (en) Illuminating optical apparatus, exposure apparatus and device manufacturing method
KR20130083897A (ko) 조명 광학계, 노광 장치 및 디바이스 제조 방법
JP4952801B2 (ja) 照明光学系、露光装置および露光方法
JP4952800B2 (ja) 照明光学系、露光装置および露光方法
JP2014116612A (ja) 照明光学装置、露光装置および露光方法
JP5644921B2 (ja) 照明光学装置
JP2006039076A (ja) 偏光解消素子、照明光学装置、照明光学装置の調整方法、露光装置及びマイクロデバイスの製造方法
JP2015172749A (ja) 照明光学装置、露光装置および露光方法
JP6330830B2 (ja) 照明光学装置、露光装置および露光方法
JP2019023732A (ja) 照明光学系、露光装置およびデバイス製造方法
JP2011254086A (ja) 照明光学装置、露光装置および露光方法
JP6493445B2 (ja) 照明光学装置、露光装置および露光方法
JP2012156536A (ja) 照明光学装置、露光装置および露光方法
JP2008021767A (ja) 照明光学装置、露光装置、およびデバイス製造方法

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2005514555

Country of ref document: JP

122 Ep: pct application non-entry in european phase
点击 这是indexloc提供的php浏览器服务，不要输入任何密码和下载