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WO2005054950A3 - Method for creating a control command for a mask writing device - Google Patents

Method for creating a control command for a mask writing device Download PDF

Info

Publication number
WO2005054950A3
WO2005054950A3 PCT/DE2004/002673 DE2004002673W WO2005054950A3 WO 2005054950 A3 WO2005054950 A3 WO 2005054950A3 DE 2004002673 W DE2004002673 W DE 2004002673W WO 2005054950 A3 WO2005054950 A3 WO 2005054950A3
Authority
WO
WIPO (PCT)
Prior art keywords
hierarchic
creating
control command
writing device
plane
Prior art date
Application number
PCT/DE2004/002673
Other languages
German (de)
French (fr)
Other versions
WO2005054950A2 (en
Inventor
Gerd Dietrich Herbert Ballhorn
Original Assignee
Infineon Technologies Ag
Gerd Dietrich Herbert Ballhorn
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag, Gerd Dietrich Herbert Ballhorn filed Critical Infineon Technologies Ag
Publication of WO2005054950A2 publication Critical patent/WO2005054950A2/en
Publication of WO2005054950A3 publication Critical patent/WO2005054950A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H01J37/3026—Patterning strategy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31761—Patterning strategy

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)

Abstract

Several circuit layouts are broken down according to planes in order to extract a respective circuit model (A-F) for imaging on a photo mask. According to said fracturing process, the circuit models are outputted in a hierarchical data format such that a step for calculation of a common mask layout with an integrated circuit model (A'),i.e. a smashing process, can be carried out in a hierarchic manner, i.e. hierarchic plane by hierarchic plane. Output occurs once again in a hierarchic data format. The calculation time for said smashing is reduced significantly.
PCT/DE2004/002673 2003-12-05 2004-12-06 Method for creating a control command for a mask writing device WO2005054950A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10356966A DE10356966A1 (en) 2003-12-05 2003-12-05 Method of creating a control statement for a mask writer
DE10356966.9 2003-12-05

Publications (2)

Publication Number Publication Date
WO2005054950A2 WO2005054950A2 (en) 2005-06-16
WO2005054950A3 true WO2005054950A3 (en) 2005-11-17

Family

ID=34638412

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2004/002673 WO2005054950A2 (en) 2003-12-05 2004-12-06 Method for creating a control command for a mask writing device

Country Status (2)

Country Link
DE (1) DE10356966A1 (en)
WO (1) WO2005054950A2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020157068A1 (en) * 2001-02-09 2002-10-24 Mentor Graphics, An Oregon Corporation Data management method for reticle/mask writing

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6087052A (en) * 1997-10-01 2000-07-11 Fujitsu Limited Charged particle beam exposure method utilizing subfield proximity corrections

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020157068A1 (en) * 2001-02-09 2002-10-24 Mentor Graphics, An Oregon Corporation Data management method for reticle/mask writing

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
BALLHORN G: "Slashing turn around time by introducing distributed computing [photomask data preparation]", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING SPIE-INT. SOC. OPT. ENG USA, vol. 4562, 2002, pages 183 - 193, XP002341100, ISSN: 0277-786X *
DEPESA P ET AL: "Further developments in distributed hierarchical processing", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING SPIE-INT. SOC. OPT. ENG USA, vol. 4889, 2002, pages 853 - 860, XP002341098, ISSN: 0277-786X *
SCHULZE S F ET AL: "GDS-based mask data preparation flow - data volume containment by hierarchical data processing", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING SPIE-INT. SOC. OPT. ENG USA, vol. 4889, 2002, pages 104 - 114, XP002341099, ISSN: 0277-786X *
TSUJIMOTO E ET AL: "Application of automatic parallel fracturing system on hierarchical and large data structure", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING SPIE-INT. SOC. OPT. ENG USA, vol. 4562, 2002, pages 704 - 713, XP002341101, ISSN: 0277-786X *

Also Published As

Publication number Publication date
WO2005054950A2 (en) 2005-06-16
DE10356966A1 (en) 2005-12-22

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