WO2004083755A1

WO2004083755A1 - Large-sized substrate multistage type heating device

Info

Publication number: WO2004083755A1
Application number: PCT/JP2004/000515
Authority: WO
Inventors: Makoto Fujiyoshi
Original assignee: Hirata Corporation
Priority date: 2003-03-19
Filing date: 2004-01-21
Publication date: 2004-09-30
Also published as: TW200419124A; TWI311634B; JP3910206B2; JPWO2004083755A1

Abstract

A plurality of rectangular panel heaters (4-1, 4-2...4-n) of a both-surface heating type internally having heating units are disposed in multistage with a predetermined vertical spacing, the space between adjacent vertical panel heaters serving as drying chambers (7-1, 7-2...7-(n-1)) for heating and drying large-sized substrates (6). The rectangular large-sized substrates (6) are supported each by a plurality of support pins (9) at a plurality of places on the substrate surface and held at a predetermined height in the drying chamber, and an upward hot air current is formed, surrounding the peripheries of the plurality of drying chambers formed in vertical multistage. According to this large-sized substrate multistage type heating device (1), the construction is simple, the processing efficiency is superior, costs including production cost and operation cost can be reduced, and the high drying quality of the large-sized substrates can be retained.

Description

Description Multi-stage heating equipment for large substrates

The invention of the present application relates to a multi-stage heating apparatus for large substrates used for heating and drying large substrates such as a liquid crystal display panel (LCD) and a plasma display panel (PDP). The present invention relates to a multi-stage calorie heating device for large substrates that reduces costs and other costs. Background art

In the manufacture of large substrates such as liquid crystal display panels (LCDs) and plasma display panels (PDPs), removal of water after substrate cleaning and removal of solvents and other components contained in the components of the chemical solution applied to the substrate For removal, a heating and drying process is indispensable. In order to simultaneously perform the heating / drying process performed on a large-sized substrate on a plurality of large-sized substrates, a multi-stage heating device may be used.

In this multi-stage heating apparatus, a plurality of large substrates to be dried are arranged in multiple stages in the vertical direction, and in accordance with this, a plurality of shelf heaters are arranged in multiple stages, and large substrates in each stage are arranged. The heating / drying process is performed simultaneously by heating at each stage in each stage, and the exhaust system for generated steam and solvent vapor is shared. Since such a multi-stage heating device can greatly reduce the installation area, it is suitable for simultaneously heating and drying a large number of large substrates. In the multi-stage heating furnace for large substrates introduced in Japanese Patent Application Laid-Open Publication No. 2001-3117872, a far infrared ray is radiated from both sides of a shelf located at each stage. It consists of a two-sided heating type panel heater (radiator plate), which is arranged at a constant pitch in the vertical direction, and the space between adjacent upper and lower shelves is a drying room. In this way, the use of a double-sided heating shelf allows the ceiling to be thinner and the installation height to be greatly reduced, thereby achieving a significant space saving. The heating elements buried in each shelf are divided into a plurality of zones in the depth direction of the device, and the heating temperature of the heating elements in each zone can be set arbitrarily. As a result, the surface heating temperature of the large substrate to be heated is made uniform.

In addition, on each side wall of the furnace body, a side panel for auxiliary heating consisting of a far infrared ray panel is installed to face the inside of the furnace. Not only is the upper and lower surfaces heated by the shelf, but also the peripheral edge is heated by the side, so the entire large substrate can be heated, and the accuracy of the surface heating temperature is further improved. It is devised to increase.

Furthermore, in this multi-stage heating furnace, a gas passage is formed inside each shelf of the heater, and air flowing through the gas passage is blown out from a hole opened on the lower surface of the shelf heater. With the steam and solvent vapors in the drying chamber, they are collected by the down-flow method in the furnace body surrounding the drying chamber, and are sucked and exhausted from there through the exhaust holes provided in the side wall of the furnace body. However, a high degree of cleanliness in the furnace atmosphere is maintained.

As described above, this multi-stage heating furnace for large substrates has various ideas in terms of reducing installation space, making the surface heating temperature of large substrates uniform and improving the accuracy, and maintaining the cleanness of the furnace atmosphere. It can improve the drying quality of large substrates. However, the multi-stage heating furnace for large substrates has a complicated structure and a down-blow method is used for the exhaust system, so that the manufacturing cost and operating cost are increasing. In addition, since the large substrate is supported in each drying chamber by a pair of left and right support jigs, the substrate may be unevenly heated. Disclosure of the invention

The invention of the present application solves the above-described problems of the conventional multi-stage heating apparatus for large substrates, and has a simple structure, excellent processing efficiency, and can maintain higher drying quality of large substrates. It is an object of the present invention to provide a multi-stage heating apparatus for a large-sized substrate, which can reduce costs such as manufacturing cost and operation cost.

According to the invention of the present application, such a problem is caused by a large rectangular substrate to be dried. In a multi-stage heating device for large substrates used for drying by arranging a plurality of sheets in a multi-stage shape, a plurality of double-sided heating-type rectangular panel heaters having a heating element therein, and a predetermined number in a vertical direction. The space between the upper and lower panels adjacent to each other is arranged as a drying chamber for heating and drying the large-sized substrate, and the large-sized substrate is provided at a plurality of appropriate positions on the plate surface. Each of the supporting pins is supported by a corresponding one of the supporting chambers, and is held at a predetermined height position in the drying chamber. A plurality of the drying chambers formed in multiple stages in the vertical direction are surrounded by the rising hot air flow. The problem is solved by a multi-stage heating device for large substrates, which is characterized in that:

According to the multi-stage heating apparatus for large substrates, in a plurality of drying chambers formed in multiple stages in the vertical direction, a large substrate is supported at a plurality of appropriate places on the plate surface by a plurality of support pins, respectively. And the adjacent upper and lower panels are simultaneously radiated and heated by the evening, and the drying chamber is formed around a plurality of drying chambers formed in multiple stages in the vertical direction. Since the temperature is maintained by the rising hot air flow, a large number of large substrates can be quickly and efficiently heated and dried.

Moreover, the large substrate is uniformly heated by the support using the plurality of support pins, and the steam and solvent vapor generated in the drying chamber are sucked and exhausted by the rising hot air flow, so that the drying chamber is high. Since the cleanness and the high-temperature atmosphere are maintained, large-sized substrates with high drying quality with less drying unevenness can be obtained. .

In addition, since this rising hot air flow can use a naturally formed air flow, there is no need to install a side panel heater for keeping the inside of the drying room warm, and also, it is not necessary to install steam, There is no need to take special structural measures such as forming a special airflow passage for forcibly exhausting solvent vapors, etc., making it possible to simplify the structure of panel heaters and furnace walls, etc. Costs and operating costs can be reduced. These provide a multi-stage heating device for large substrates that has a simple structure, is excellent in processing efficiency, can maintain high drying quality of large substrates, and can reduce manufacturing and operation costs. can do.

In a preferred embodiment, in this multi-stage heating apparatus for large substrates, four corners of the panel heater are supported by columns, and a plurality of panel heaters Are arranged at predetermined intervals in the direction

The column supporting one corner is fixed, and the column supporting the remaining corners of the four corners of the panel can be moved horizontally to allow thermal expansion and contraction of the panel. To be done.

As a result, the heat generated by the panel heater prevents the panel heater from warping, denting, or expanding and contracting due to the heat itself, thereby preventing thermal deformation of the panel heater. It is possible to prevent drying unevenness from occurring, and to maintain higher drying quality of a large-sized substrate. Further, it is possible to prevent an adverse effect on the support member of the device.

In another preferred embodiment, in the multi-stage heating apparatus for a large substrate, the heat generating body is embedded near the periphery of the panel heater along the periphery. As a result, the heat of the panel heater is easily dissipated to the outside, and the vicinity of the periphery of the panel heater, where the heat is easily carried away by the hot air flowing around each drying chamber, is reduced to other parts. In comparison, since the built-in heating element heats up more aggressively, the heat generation temperature distribution is uniformed as a whole, and large substrates can be uniformly heated and dried. Higher drying quality of the substrate can be maintained. In addition, since the panel heater is not entirely heated and only the area near the periphery is heated uniformly, it is possible to reduce the number of equipment such as heating equipment and control equipment. Can be.

Further, in another preferred embodiment, a temperature sensor is buried in the vicinity of any one corner of the panel heater in the large-sized f-fuse multistage heating device. As a result, the temperature near any one corner of the rectangular panel can be measured by the temperature sensor buried in it, and the heating element usually has the same heating value in its length direction. As described above, the temperature near any one corner of the rectangular panel can be measured as described above, and the temperature near the remaining three corners of the rectangular panel can be estimated. If the heating temperature of the panel heater is controlled based on this temperature, in a steady state, the entire surface of the panel heater is maintained at a predetermined uniform temperature, so that a large substrate can be used. A uniform heating and drying process can be performed, and the heating element is located near and along the periphery of the panel heater. In combination with the embedded heater, it is possible to simplify the control of the heat generation temperature of the panel heater. BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 is an overall schematic perspective view of a furnace wall of a multistage heating apparatus for large substrates according to an embodiment of the present invention, as seen through.

FIG. 2 is a cross-sectional view of a drying chamber portion of the multi-stage heating apparatus for large substrates.

FIG. 3 is a cross-sectional view taken along the line II-II of FIG.

FIG. 4 is a partially enlarged view of FIG.

FIG. 5 is a partially enlarged view of FIG. 1 and is a view for explaining the flow of airflow. FIG. 6 is a plan view of a panel heater used in the multi-stage heating apparatus for the large substrate.

FIG. 7 is a side view of the panel heater.

FIG. 8 is an enlarged view of a portion where the temperature sensor 1 of FIG. 6 is embedded.

FIG. 9 is a side view of FIG.

FIG. 10 is a plan view of a sub-plate placed on the panel heater, showing a state where the sub-plate is pulled out of the drying chamber.

FIG. 11 is a plan view of a positioning mechanism on one side of the sub-plate.

FIG. 12 is a cross-sectional view of the positioning mechanism on the other side of the sub-plate, and is a cross-sectional view taken along line XII-XII of FIG. BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, an embodiment of the present invention will be described.

The multi-stage heating apparatus for a large substrate according to the present embodiment is mainly used for heating and drying a large substrate such as a liquid crystal display panel (LCD) or a plasma display panel (PDP). In the process of manufacturing such a large substrate, the large substrate is usually heated to remove water after cleaning the substrate or to remove a solvent or the like contained in a chemical component applied to the substrate. It is essential to perform a drying treatment. The multi-stage heating device arranges a plurality of such large substrates in multiple stages and simultaneously heats and dries them. It is suitable for quickly heating and drying a large number of large substrates while saving energy. Next, the structure of the multi-stage heating device for a large substrate in the present embodiment will be described.

. As shown in FIG. 1, a multi-stage heating apparatus 1 for a large substrate according to the present embodiment includes a plurality of (n) rectangular plates in plan view on a gantry 3 at a furnace bottom surrounded by a furnace wall 2. Panel light 4-1, 4-2 '. '4-n are supported at the four corners thereof by columns 5, and are arranged in multiple stages at predetermined intervals in the vertical direction. Then, between the upper and lower panel heaters adjacent to each other, that is, between the panel heater 4-1 and the panel heater 4-2, and between the panel heater 4-2 and the panel heater 4-1. Each space between the panel heater 4-(n-1) and the panel heater 4-n heats the substrate 6 to be dried. Drying chambers 7-1 and 7-2 for drying · · · 7-(n-1) The substrate 6 has a rectangular shape in a plan view, a large side of 1.0 to 2.0 m on a side, and a thickness of about l mm to several mm. Even though the panel window is 4-m (m = l, 2 · · · n) is also rectangular in plan view in accordance with the shape of the substrate 6, the area is larger than the area of the substrate 6.

The column 5 may be a single rod penetrating through each step, but in the present embodiment, divided columns divided for each stage are used, and these divided columns are stacked. As a result, the pillar 5 is formed. These divided pillars are located between the gantry 3 and the lowermost panel panel, between adjacent upper and lower panel panels, the uppermost panel panel 4-n, and a ceiling plate 13 described later. These four corners are vertically spaced from each other at these four corners, and are assembled three-dimensionally. The lower end of the pillar 5 arranged at any one of the four corners is buried in a gantry 3 made of steel or the like (see part A in FIG. 1) and fixed, while supporting the remaining three corners. The supporting strut 5 is horizontally movable around the fixed strut so as to allow a thermal expansion and contraction of 41 m per day.

The panel heater 4-m is constructed by sandwiching and embedding a heating element 11 between two upper and lower plates made of aluminum material as shown in Figs. As shown by the thick arrows in Fig. 4, radiant heat is radiated from both upper and lower surfaces, and the drying chambers below and above it are shown as thick arrows in Fig. 4. 1) Simultaneously heat the substrates 6 set to 7 m. However, on the upper surface of the panel heater 4-m, a sub-plate 8-m, which will be described later, is placed. In practice, radiant heat is emitted through this sub-plate 8-m, and the upper part is dried. The substrate 6 set in the chamber 7-m is heated. However, this sub-plate 8-m is not essential in the present embodiment.

The heating element 11 is a resistance heating element, has a uniform heating value per unit length, and is embedded along the periphery of the panel heater near the periphery of 41 m. The form of the heating element 11 is not limited to the resistance heating element, and a heating medium of gas or liquid may be used.

The substrate 6 is not placed directly on the panel heaters 1-4, 4-2 · · · 4- (n-1), but is shown in Figs. 1, 2 and 4. The sub-plates 8-1, 8-2, -8- (n-1) made of aluminum with good thermal conductivity are placed on these panels all the time. The sub-plates 8—m (m = l, 2 ··· (n-1)) are each provided with a plurality of support pins 9 that are respectively planted, and a plurality of sub-plates including a central portion and a peripheral portion of the substrate 6 are provided. The proper position is supported (see Fig. 2 and Fig. 10), and each panel heater is separated from the upper surface of 4m by 8m and the upper surface of 8m by a predetermined length. 7-2 · · · Set at the center of the 7- (n-1) in the vertical direction.

Therefore, the base plate 6 set in the drying room 7—m (m = l, 2 ··· (n−1)) consists of the adjacent upper and lower panel heaters (m + l), 4-m Among them, from the lower panel heater 41 m, radiant heat radiated by the substrate 8-m placed above it receiving heat from the panel heater 4-m by heat conduction, and From the upper panel heater 41-1 (m + 1), both surfaces are heated simultaneously by the radiant heat radiated by itself.

However, the space below the bottom panel heater 4-1 is not actually used as a drying room, and the stainless steel plate 12 is laid on the surface of the gantry 3. The radiant heat radiated from the lower surface of 1 is reflected, and the space here has a high temperature environment similar to that of the drying room 7-m. The lowermost drying room 7-1 and the middle drying room 7- m (Km <(n-1)) to prevent a temperature gradient from occurring. Similarly, the space above the top panel panel 4n It is not used as a drying room, and a ceiling plate 13 with stainless steel plate attached is stretched, and a sub-plate 8-n placed on the top panel heater 41-n The radiant heat is reflected and the space here has a high-temperature environment similar to that of the drying room 7—m. The drying room 7— (n-1) at the top and the drying room 7—m in the middle (Km <(n-1)) to prevent a temperature gradient from occurring. Hereinafter, these high temperature environment spaces are referred to as lower auxiliary drying room 7 L and upper auxiliary drying room 7 U.

The set in the drying chamber 7-1, 7-2 · · · 7-(n-1) of the substrate 6 is not only supported by a plurality of support pins 9 at a plurality of appropriate places, but also by As shown in FIG. 4 and FIG. 10, each of the four corners is positioned by two positioning pins 10 arranged so as to sandwich two orthogonal sides thereof, whereby the sub-corner is positioned. Plate 8—m (m = l, 2 · · · (n-1)) Positioned accurately at a specified height above the horizontal plane at a specified height from the top surface. Such setting of the counter 6 is automatically performed by a robot (not shown). The positioning pins 10 are implanted in the movable piece 22 so that the positions thereof can be adjusted according to the size of the substrate 6. The movable piece 22 can change the screwing position on the upper surface of the substrate 8-m within a predetermined range.

As shown in FIG. 2, the sub-plate 8-m has a rectangular shape in a plan view substantially similar to the panel heater 4-m, and is slightly narrower than the panel heater 4-m. Then, the sub-plate 8-m can be conveniently placed on the top of the 4-m sub-panel or removed from it for maintenance. A pair of handles 14 are attached to a side edge of the maintenance work side, which is on the front side in the direction, and a side edge of the non-maintenance work side, which is on the front side in the inserting / removing direction of the sub-plate 8 m. FIG. 10 shows a state in which the sub-plate 8-m is taken out from above 41-41 m of Panerhi.

On the maintenance side, the sub-plate 8-m is positioned so that it is positioned at a predetermined position when it is placed on the upper surface of the panel heater 41m. As shown in Fig. 1, positioning members 15 and 16 are fixed to the left and right corners of the sub-plate 8-m, respectively. The corresponding part of the panel plate 41-41 m at the corresponding position (near the left and right corners of the panel plate 41-m 41-m on the front side of the sub-plate 8-m insertion direction) so as to engage with the materials 15 and 16 The positioning members 17 and 18 are fixed respectively.

The positioning member 15 has a rounded upper end on the left side in FIG. 11 and is fitted into the V-shaped groove at the lower end of the positioning member 17 in FIG. These two positioning members 15 and 17 are engaged with each other. The positioning member 16 has a rounded upper right end in FIG. 11 and abuts against the lower flat surface of the positioning member 18 in FIG. , 18 comrades engage. In this engagement state, the corners of the positioning members 15 and 16 are screwed to the panel heater 4-m by the lip pins 19, respectively, and the sub-plate 8-m is connected to the panel heater 4-m. Fixed to m. In this way, the displacement and rotation of the sub-plate 8-m on the horizontal plane are prevented. On the non-maintenance side of the sub-plate 8-m, as shown in FIGS. 2 and 12, along the side edge of the sub-plate 8-m, a pair of left and right holding plates 20 and a central portion are provided. The holding plate 21 is fixed to the upper surface of the panel heater 4-m. These holding plates (holding members) 20 and 21 receive the side edges of the sub-plate 8—m in the inward recess between them and the panel plate 4—1 m, and the sub plate 8— This side edge of m is prevented from warping or denting due to heat and causing thermal deformation.

Next, the exhaust structure of water vapor, solvent vapor, and the like generated in each of the drying chambers 7-1, 7-2, 7- (n-1) will be described.

As shown in FIG. 1, an outside air intake 27 is formed at a suitable position below the furnace wall 2 of the multi-stage heating apparatus 1, and an exhaust port 28 is formed at the ceiling thereof. Is formed. Therefore, the outside air taken in from the outside air intake 27 is the lower auxiliary drying room 7 L, the drying rooms 7-1, 7-2, 7- (n-1), and the upper auxiliary drying room 7U. It is heated by the heat of the internal hot air and the structure surrounding these chambers, resulting in an ascending hot air flow (see arrows B in Figs. 4 and 5). Then, heat is properly removed from each of these chambers and structures, and various gases (water vapor, solvent vapor, etc.) and particles generated inside the device are sucked into the device and taken in. From 8 leak. This rising hot air flow is due to natural convection caused by the outside air being heated exclusively inside the device, so that the pump power consumption is small.

On the other hand, as shown in Fig. 1 or Fig. 5, the surrounding wall of each panel 4-1, 4-2 4 4-n The double-walled structures 23-1, 23-2 ', 23'-n are fixed with fixing members such as bolts. Further, a double wall structure 24 for forming a rising hot airflow having a substantially similar structure is fixed to the peripheral wall of the ceiling plate 13 around the four circumferences thereof by a fixing tool such as a bolt. The double-walled structure 24 may be slightly shorter in width (height) than the double-walled structures 23-1, 23-2, -23-n.

Each of these double-walled structures 23-1, 23-2 ·-23-li 24 has an inner folded plate located on the inside, as better illustrated in FIGS. 4 and 5. The inner bent plate 25 and the outer bent plate 26 are separated by a space S in the horizontal direction between the inner bent plate 25 and the outer bent plate 26 located outside. And are arranged in parallel and assembled. The upper end extends to the vertical center of each of the openings of the drying chambers 7-1, 7-2, 7- (n-1) and the upper auxiliary drying chamber 7U. .

The inner bent plate 25 is made of aluminum material, its inner and outer surfaces are processed to be black, and the upper part thereof is bent inward. The outer bent plate 26 is made of stainless steel, the inner surface thereof is processed to be black, the upper portion is bent inward, and the lower portion is located below the inner bent plate 25. It is bent outward so as to be away from the portion, and has a shape extending slightly below the lower portion of the inner bent plate 25. The black processing of the inside and outside surfaces of the inside bent plate 25 and the black processing of the inside surface of the outside bent plate 26 are performed by coating these surfaces with kneaded black paint in Teflon (registered trademark). It is done by.

Due to this shape of the inner and outer bent plates 25, 26, the lower part of the double-walled structure 23-m (m2 1, 2, It opens in a downward divergent shape to take in the airflow widely, and the middle part becomes a straight airflow channel directed upward, and the upper part directs this airflow slightly inward, Above each perimeter opening of drying chamber 7—m (m = l, 2 · · (n-1)) and upper auxiliary drying chamber 7U So that it can be drained towards the part.

Η) and 24 are configured as described above, and as described above, the lower auxiliary drying chamber ΊL and the drying chamber 7-1 are provided inside the multi-stage heating device 1. , 7—2

7-(n-1), Upper auxiliary drying chamber Surrounding each of the 7 U chambers, an ascending hot air flow is generated, so these double-walled structures 23-m, 24 When the air conditioner is placed one above the other, most of the rising hot air flow inside the device will flow through the internal flow path of each double-walled structure 23-m, 24 (Fig. 4, Fig. 5 see arrow C). The hot air flowing upward in the lower double-walled structure 23-m is directed toward the upper portion of the peripheral opening of the drying chamber 7-m once at its outlet, while being directed slightly inward. The double-walled structure is pushed back by the hot airflow in the drying chamber 7-m and pulled by the hot airflow rising in the upper double-walled structure 23-(m + 1). It is sucked into 2 3— (m + 1). In this way, a plurality of drying chambers 7-1, 7-2, 7- (n-1) and the upper auxiliary drying chamber 7U formed in multiple stages in the vertical direction are connected to each other, and the rising hot air flow is formed. Thus, an air curtain is formed. Water vapor, solvent vapor, etc., filling each drying chamber 7-m are sucked by this rising hot air flow (see arrow D in Figs. 4 and 5), taken in, and exhausted from the exhaust port 28. You. During this time, the heat retention effect of the black processing of each surface of the inner and outer bent plates 25 and 26 allows the airflow flowing through the flow path between them to be better kept warm, and flows into each drying chamber 7-m. Since the incoming airflow is also kept warm, the substrate 6 in each drying chamber 7-m can maintain a stable temperature distribution without being affected by the outside air. The above-mentioned flow of hot air flow is the air force due to the rising air flow, and is formed so as to surround the panel heaters 4-m arranged in multiple stages, so that the temperature of each drying chamber 7-m is more stable Let me do it.

In the process in which steam, solvent vapor, etc., filling the 7-m of each drying chamber are taken into the rising hot air flow (air force—ten) and exhausted, each side of the inner and outer bent plates 25, 26 Due to the heat retention effect of the black processing, the airflow flowing through the flow path between them is better kept warm, so that solidification of water vapor, solvent vapor and the like can be prevented. Furthermore, the action of Teflon contained in the black processing applied to the inner and outer bent plates 25 and 26 prevents the adhesion of water vapor, solvent vapor, and various particles to these plate surfaces. It is. As a result, a smooth flow of the rising hot air flow can be formed. As shown in Fig. 1, each of the double wall structures 23-1 and 23-2-23-n for forming the rising hot air flow has a door of the multi-stage heating device 1 as shown in Fig. 1. (Not shown) on the side where panel heaters 4-1, 1, 4-2 · · · 4-n are left

Notches 29 are formed at two locations on the left and right over a predetermined length. These notches 29 are provided so that a robot hand (not shown) can place the substrate 6 and enter and exit each drying chamber 7-m (m = 1, 2 ··· (n-1)). It is provided.

As shown in Figs. 8 and 9, each panel heater 4-m (m = l, 2 ■ n) has a temperature near any one of its corners as shown in Figs. Sensor 30 is buried. As described above, the heating element 11 of the panel heater 4-m is embedded near and along the periphery of the panel heater 4-m, and generates heat uniformly. The temperature in the vicinity of any one corner is measured by the temperature sensor 30 to control the heat generation temperature. A thermo switch 31 is buried in the vicinity of the temperature sensor 30 to prevent an excessive rise in temperature of 4 m per day.

Since the multi-stage heating apparatus 1 for a large substrate according to the present embodiment is configured as described above, a robot hand (not shown) moves the counter 6 to each drying chamber 7-m (m = Is 2 (n-1)), set on a plurality of support pins 9, and keep each panel at 4-m (m = l, 2 Substrate 6 in chamber 7 — m has radiant heat radiated from subplate 8 — m placed above panel heater 4 m below and panel heater 41 m above it (m + 1). As a result, both sides are heated at the same time and dried quickly. Water vapor and solvent vapor generated during the heating-drying process flow to the opening around the drying chamber 7-m, and rise up the flow path in the double-walled structure 23-m. It is sucked in by the hot air flow, taken in, and exhausted from the drying chamber 7-m.

The ascending hot airflow thus taking in water vapor, solvent vapor, etc., sequentially passes through the upper double-walled structure 23-(m + 1), 23-(m + 2) 24. While taking in the water vapor and solvent vapor in the room there, each drying room 7-m, upper part auxiliary An air curtain surrounding the drying chamber 7 U is formed, and the air is exhausted from the exhaust port 28 together with the other rising hot air flow. The multi-stage heating apparatus 1 for a large substrate according to the present embodiment is configured as described above, so that the following effects can be obtained.

In a plurality of drying chambers 7-1, 7-2, which are formed in multiple stages in the vertical direction, a large substrate 6 is placed in a plurality of appropriate places on the plate surface by a plurality of support pins 9 in 7- (n-1). It is held at a predetermined height within the drying room 7—m (m = l, 2 ■ ·· (n-1)), and the upper and lower panels are adjacent to each other. ) s 4-m simultaneously radiant heating, and the inside of the drying chamber 7-m is kept warm by the rising hot airflow formed around the multiple drying chambers 7-m formed in multiple stages in the vertical direction. Therefore, a large number of large substrates 6 can be heated and dried quickly and efficiently.

In addition, the large substrate 6 is uniformly heated by the support using the plurality of support pins 9, and the steam, solvent vapor, etc. generated in the drying chamber 7-m are sucked and exhausted by the rising hot air flow. However, since the inside of each drying chamber 7-m is maintained at a high degree of cleanliness and a high temperature atmosphere, it is possible to obtain a large-sized substrate 6 having high drying quality with less uneven drying. In addition, since the rising hot air flow can utilize a naturally formed air flow, there is no need to install a side panel heater for keeping the inside of the drying chamber 7-m, and the drying room 7 — No special structural measures such as the formation of a special air flow path for forced exhaust of water vapor, solvent vapor, etc. in the m are required. Panel heaters 41 m (m = l, 2 ■ · · n) ゃ Since the structure of the furnace wall 3 and the like can be simplified, the production cost and operation cost can be reduced.

As a result, the multi-stage heating apparatus for large substrates 1 has a simple structure, is excellent in processing efficiency, can maintain high drying quality of the large substrates 6, and can reduce manufacturing costs, operating costs, and other costs 1 Can be provided.

In addition, the large panel heater 4-m has a large thermal expansion and a large effect on the support members of the device, but the column 5 supporting one of the four corners of the panel heater 4-m is fixed. The panel heater supports the remaining corners of the four 1 m corners Struts 5, around the struts 5 are fixed, is movable in the horizontal direction, since it is adapted to allow for thermal expansion and contraction of the panel heater 4-m, the panel heater 4 one _m The heat generated prevents the panel heater 4-m from warping, denting, or expanding and contracting due to the heat of the panel heater 4-m itself, thereby preventing the large substrate 6 to be dried from becoming uneven in drying. Thus, the drying quality of the large-sized substrate 6 can be further maintained. In addition, adverse effects on the support member of the device can be prevented.

Furthermore, since the heating element 11 is embedded near the periphery of the panel heater 41 m along the periphery, the heat of the panel heater 4-m is easily radiated to the outside, and the heat is The area near the periphery of the panel is easy to be carried away by the hot air flow (air force) that rises continuously around the 7-m area of each drying room. Since the heating elements 11 are more positively heated, if the entire panel heater is 41 m, the heat generation temperature distribution is uniform, and the large substrate 6 can be uniformly heated and dried. Higher drying quality of the large substrate 6 can be maintained. Also, since the panel heater is not heated over the entire surface but only heated around the periphery uniformly, equipment such as heating equipment and control equipment can be reduced. Can be reduced.

In addition, since a temperature sensor 130 is buried near an arbitrary corner of the panel panel, the temperature near an arbitrary corner of the rectangular panel heater is buried there. The temperature of the heating element 11 is generally the same as the heating element 11 in the length direction. Therefore, as described above, the rectangular panel heater 4—m By measuring the temperature near any one corner of the panel, it is possible to estimate the temperature near the remaining three corners of the rectangular panel panel 4-m. Based on this temperature, the panel panel If the heating temperature of m is controlled, the panel heater 4-m can be uniformly heated and dried on the large substrate 6 because the entire surface of the panel heater 4-m is maintained at a predetermined uniform temperature in a steady state. , Heating element 1 1 In the vicinity of the peripheral edge of the coater 4-m, it can with or mutually 俟 embedded along the peripheral edge, it is possible to simplify the heating temperature control Paneruhi evening one 4-m. In addition, various effects can be obtained. The invention of the present application is not limited to the above embodiment, and various modifications can be made without departing from the gist of the invention.

Claims

The scope of the claims

1. A multi-stage heating device for a large substrate used for drying a plurality of large rectangular substrates to be dried in a multi-stage manner,

A plurality of double-sided heating rectangular panels each having a heating element inside are arranged in multiple stages at predetermined intervals upward and downward,

The space between the upper and lower panel heaters adjacent to each other is a drying chamber for heating and drying the large substrate,

The large-sized substrate is supported at a plurality of appropriate positions on the plate surface by a plurality of support pins, and is held at a predetermined height position in the drying chamber.

An ascending hot air flow is formed around a plurality of the drying chambers formed in multiple stages in the vertical direction.

A multi-stage heating device for large substrates, characterized by the following.

2. Four corners of the panel heater are supported by columns, and a plurality of the panel heaters are arranged in multiple stages at predetermined intervals in a vertical direction,

A support for supporting one of the four corners of the panel heater is fixed, and a support for supporting the remaining one of the four corners of the panel heater is horizontally movable. The panel heater is adapted to allow thermal expansion and contraction.

2. The multi-stage heating device for a large-sized substrate according to claim 1, wherein:

3. The multi-stage heating device for a large substrate according to claim 1, wherein the heating element is embedded near and along the periphery of the panel heater.

4. The multi-stage heating apparatus for a large substrate according to claim 3, wherein a temperature sensor is buried near an arbitrary corner of the panel heater.