WO2004067585A1 - ポリアルケニルエーテル化合物 - Google Patents
ポリアルケニルエーテル化合物 Download PDFInfo
- Publication number
- WO2004067585A1 WO2004067585A1 PCT/JP2004/000735 JP2004000735W WO2004067585A1 WO 2004067585 A1 WO2004067585 A1 WO 2004067585A1 JP 2004000735 W JP2004000735 W JP 2004000735W WO 2004067585 A1 WO2004067585 A1 WO 2004067585A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substituted
- unsubstituted
- acid
- polyalkenyl ether
- ether
- Prior art date
Links
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 title claims abstract description 232
- -1 ether compound Chemical class 0.000 title claims abstract description 153
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 40
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 17
- 239000002253 acid Substances 0.000 claims description 54
- 239000000203 mixture Substances 0.000 claims description 42
- 150000001875 compounds Chemical class 0.000 claims description 38
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 33
- 125000003118 aryl group Chemical group 0.000 claims description 31
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 23
- 125000003700 epoxy group Chemical group 0.000 claims description 19
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 18
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 14
- 125000002947 alkylene group Chemical group 0.000 claims description 12
- 125000000524 functional group Chemical group 0.000 claims description 11
- 239000003505 polymerization initiator Substances 0.000 claims description 10
- 125000005968 oxazolinyl group Chemical group 0.000 claims description 9
- 125000003277 amino group Chemical group 0.000 claims description 7
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 6
- 125000000732 arylene group Chemical group 0.000 claims description 4
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 3
- 125000002993 cycloalkylene group Chemical group 0.000 claims description 3
- 125000004429 atom Chemical group 0.000 claims description 2
- 238000006467 substitution reaction Methods 0.000 claims description 2
- 150000003498 tellurium compounds Chemical class 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 4
- 239000001257 hydrogen Substances 0.000 abstract description 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 4
- 125000005346 substituted cycloalkyl group Chemical group 0.000 abstract description 4
- 125000003107 substituted aryl group Chemical group 0.000 abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 36
- 238000012360 testing method Methods 0.000 description 29
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 28
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 28
- 238000006243 chemical reaction Methods 0.000 description 25
- 239000002994 raw material Substances 0.000 description 25
- 238000000034 method Methods 0.000 description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 22
- 239000008199 coating composition Substances 0.000 description 22
- 239000003973 paint Substances 0.000 description 22
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- 229920000642 polymer Polymers 0.000 description 21
- 239000000178 monomer Substances 0.000 description 20
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- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 18
- 239000002904 solvent Substances 0.000 description 18
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 17
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- 238000004519 manufacturing process Methods 0.000 description 15
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 12
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 11
- 125000004432 carbon atom Chemical group C* 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000002841 Lewis acid Substances 0.000 description 10
- 150000001241 acetals Chemical group 0.000 description 10
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 10
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- 239000000155 melt Substances 0.000 description 10
- 229920000728 polyester Polymers 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 9
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- 235000014113 dietary fatty acids Nutrition 0.000 description 9
- 150000002170 ethers Chemical class 0.000 description 9
- 239000000194 fatty acid Substances 0.000 description 9
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- 150000004665 fatty acids Chemical class 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 9
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- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 8
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 8
- 238000001723 curing Methods 0.000 description 8
- 229940052303 ethers for general anesthesia Drugs 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 7
- 239000012948 isocyanate Substances 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 239000007870 radical polymerization initiator Substances 0.000 description 7
- 229910000679 solder Inorganic materials 0.000 description 7
- PBLZLIFKVPJDCO-UHFFFAOYSA-N 12-aminododecanoic acid Chemical compound NCCCCCCCCCCCC(O)=O PBLZLIFKVPJDCO-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 239000002879 Lewis base Substances 0.000 description 6
- 241001465754 Metazoa Species 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 6
- 239000010775 animal oil Substances 0.000 description 6
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 6
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 6
- 150000002513 isocyanates Chemical class 0.000 description 6
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 6
- 150000007527 lewis bases Chemical class 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 239000012778 molding material Substances 0.000 description 6
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- 235000015112 vegetable and seed oil Nutrition 0.000 description 6
- 239000008158 vegetable oil Substances 0.000 description 6
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 5
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 5
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 125000005442 diisocyanate group Chemical group 0.000 description 5
- 239000003999 initiator Substances 0.000 description 5
- 229910001507 metal halide Inorganic materials 0.000 description 5
- 229920005862 polyol Polymers 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
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- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
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- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
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- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
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- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 4
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- 125000005843 halogen group Chemical group 0.000 description 4
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 4
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- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 4
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- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 3
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- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 3
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- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 3
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- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
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- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 2
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 description 2
- HAVHPQLVZUALTL-UHFFFAOYSA-N 1-ethenoxypropan-2-ol Chemical compound CC(O)COC=C HAVHPQLVZUALTL-UHFFFAOYSA-N 0.000 description 2
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- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
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- OFUAIAKLWWIPTC-UHFFFAOYSA-L magnesium;naphthalene-2-carboxylate Chemical compound [Mg+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 OFUAIAKLWWIPTC-UHFFFAOYSA-L 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- SGGOJYZMTYGPCH-UHFFFAOYSA-L manganese(2+);naphthalene-2-carboxylate Chemical compound [Mn+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 SGGOJYZMTYGPCH-UHFFFAOYSA-L 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- VNKYTQGIUYNRMY-UHFFFAOYSA-N methoxypropane Chemical compound CCCOC VNKYTQGIUYNRMY-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- BDRTVPCFKSUHCJ-UHFFFAOYSA-N molecular hydrogen;potassium Chemical compound [K].[H][H] BDRTVPCFKSUHCJ-UHFFFAOYSA-N 0.000 description 1
- CURJNMSGPBXOGK-UHFFFAOYSA-N n',n'-di(propan-2-yl)ethane-1,2-diamine Chemical compound CC(C)N(C(C)C)CCN CURJNMSGPBXOGK-UHFFFAOYSA-N 0.000 description 1
- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 description 1
- SCZVXVGZMZRGRU-UHFFFAOYSA-N n'-ethylethane-1,2-diamine Chemical compound CCNCCN SCZVXVGZMZRGRU-UHFFFAOYSA-N 0.000 description 1
- QHJABUZHRJTCAR-UHFFFAOYSA-N n'-methylpropane-1,3-diamine Chemical compound CNCCCN QHJABUZHRJTCAR-UHFFFAOYSA-N 0.000 description 1
- KGHYGBGIWLNFAV-UHFFFAOYSA-N n,n'-ditert-butylethane-1,2-diamine Chemical compound CC(C)(C)NCCNC(C)(C)C KGHYGBGIWLNFAV-UHFFFAOYSA-N 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- NRAPDZRPWHOPKB-UHFFFAOYSA-N n-propan-2-yl-n-propylpropan-1-amine Chemical compound CCCN(C(C)C)CCC NRAPDZRPWHOPKB-UHFFFAOYSA-N 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical class [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 125000004998 naphthylethyl group Chemical group C1(=CC=CC2=CC=CC=C12)CC* 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 235000019198 oils Nutrition 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 125000000160 oxazolidinyl group Chemical group 0.000 description 1
- 150000002918 oxazolines Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- MTMMGZCTRGFZAH-UHFFFAOYSA-N pent-1-ene-1,5-diol Chemical compound OCCCC=CO MTMMGZCTRGFZAH-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- DLRJIFUOBPOJNS-UHFFFAOYSA-N phenetole Chemical compound CCOC1=CC=CC=C1 DLRJIFUOBPOJNS-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- HXITXNWTGFUOAU-UHFFFAOYSA-N phenylboronic acid Chemical compound OB(O)C1=CC=CC=C1 HXITXNWTGFUOAU-UHFFFAOYSA-N 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- HDMGAZBPFLDBCX-UHFFFAOYSA-M potassium;sulfooxy sulfate Chemical compound [K+].OS(=O)(=O)OOS([O-])(=O)=O HDMGAZBPFLDBCX-UHFFFAOYSA-M 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- XWIHRGFIPXWGEF-UHFFFAOYSA-N propafenone hydrochloride Chemical compound Cl.CCCNCC(O)COC1=CC=CC=C1C(=O)CCC1=CC=CC=C1 XWIHRGFIPXWGEF-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- MAHQPELWLUTHNP-UHFFFAOYSA-N propoxycyclohexane Chemical compound CCCOC1CCCCC1 MAHQPELWLUTHNP-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- WSFQLUVWDKCYSW-UHFFFAOYSA-M sodium;2-hydroxy-3-morpholin-4-ylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(O)CN1CCOCC1 WSFQLUVWDKCYSW-UHFFFAOYSA-M 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 125000005717 substituted cycloalkylene group Chemical group 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 150000003470 sulfuric acid monoesters Chemical class 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000003784 tall oil Substances 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- RAOIDOHSFRTOEL-UHFFFAOYSA-N tetrahydrothiophene Chemical compound C1CCSC1 RAOIDOHSFRTOEL-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- KSBAEPSJVUENNK-UHFFFAOYSA-L tin(ii) 2-ethylhexanoate Chemical compound [Sn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O KSBAEPSJVUENNK-UHFFFAOYSA-L 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 150000005219 trimethyl ethers Chemical class 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229940098697 zinc laurate Drugs 0.000 description 1
- GPYYEEJOMCKTPR-UHFFFAOYSA-L zinc;dodecanoate Chemical compound [Zn+2].CCCCCCCCCCCC([O-])=O.CCCCCCCCCCCC([O-])=O GPYYEEJOMCKTPR-UHFFFAOYSA-L 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
Definitions
- the present invention relates to a paint, a coating agent, an ink, an adhesive, a film, a fiber, a photo resist, a solder resist, a semiconductor encapsulating material, a laminate, a molding material, a sealing agent,
- the present invention relates to a polyalkenyl ether compound useful for molding materials and the like.
- Performance dimensional stability, solubility, tackiness, adhesion, adhesion, antistatic properties, the results of a pressure cooker test, which is a required property of electronic circuit boards, weather resistance, water resistance, alkali resistance, Any of the properties such as moisture resistance, transparency, heat aging resistance, and dyeing properties are insufficient.
- polyether oligomer synthesized by esterifying and denaturing an oligomer having a hydroxyl group at a terminal.
- Polygen-based resins have excellent water resistance, but they have poor compatibility with other materials due to their very hydrophobic skeleton, resulting in an uneven structure during curing and film formation, and lack of transparency. There is a problem of yellowing due to the remaining double bond in the side chain. Disclosure of the invention
- the objectives of the present invention are flexibility, compatibility with low-polarity resins, uniformity of composition, mechanical strength, impact resistance, dimensional stability, solubility, tackiness, adhesion, adhesion, and antistatic properties.
- a polyalkenyl ether compound having excellent weather resistance, water resistance, moisture resistance, transparency, heat aging resistance, dyeing property, etc. is provided. It is in.
- the present invention provides the following (1) to (14).
- R 1 is a substituted or unsubstituted lower alkyl, a substituted or unsubstituted cycloalkyl. alkyl, substituted or are properly even Ariru or substituted unsubstituted represent Ararukiru of Hi ⁇ conversion, R 2, R 3 s R 2 a, R 3 a and R 4 are the same or are different and are a hydrogen atom Represents a substituted or unsubstituted lower alkyl, a substituted or unsubstituted cycloalkyl, a substituted or unsubstituted aryl or a substituted or unsubstituted aralkyl, provided that a plurality of II 1 , R 2 , R 3 and R 4 may be the same or different.
- a polyalkenyl ether compound comprising a structural unit represented by the formula:
- A represents a substituted or unsubstituted cycloalkylene or a substituted or unsubstituted arylene
- Q 1 and Q 2 are the same or different and represent a single bond or a substituted or unsubstituted lower alkylene.
- a 1 represents a substituted or unsubstituted cycloalkane triyl or a substituted or unsubstituted aromatic ring triyl
- Q 3 , Q 4 and Q 5 are the same or different. Is different, represents a single bond or a substituted or unsubstituted lower alkylene
- m represents 1 or 2.
- n, R 1 N R 2 , R 3 , R 4, and R 5 may be the same or different.
- a carboxyl group A polyalkenyl ether compound obtained by reacting a compound having a functional group.
- R 1 D represents a hydrogen atom, a substituted or unsubstituted lower alkyl, a substituted or unsubstituted cycloalkyl, a substituted or unsubstituted aryl or a substituted or unsubstituted aralkyl; Or unsubstituted lower alkylene or —Q 1 —A—Q 2 — (wherein A, 1 and Q 2 are each Is synonymous). However, a plurality of R 1 R 2 , R 3 and R 4 may be the same or different.] A polyalkenyl ether compound comprising a structural unit represented by the formula: '
- n R 1 R 2, R 3, R 2 a, 1 3 & Oyopi 11 4, it it the
- R 2 1, R 2 2 Contact Beauty R 2 3 are the same or different and each represents a hydrogen 'atom, substituted or unsubstituted lower alkyl, also the properly substituted unsubstituted consequent opening alkyl, Represents a substituted or unsubstituted aryl or a substituted or unsubstituted aralkyl, wherein R 2 Q is a substituted or unsubstituted lower alkylene or —Q i—A—Q 2 — (wherein , A, Q 1 , and Q 2 are as defined above). However, a plurality of RR 2 , R 3 and R 4 may be the same or different.]
- a polyalkenyl ether compound comprising a structural unit represented by the formula:
- R 1 s R 2 , R 3 , R 2a , R 3a and R 4 have the same meanings as described above, respectively, and R 3 °, R 31 and R 32 are the same or different.
- R 3 °, R 31 and R 32 are the same or different.
- a plurality of RR 2 , R 3 and R 4 may be the same or different.
- a composition comprising the polyalkenyl ether compound according to (7) or (10), and a polymerization initiator that generates a radical upon irradiation with light or heating.
- a composition comprising the polyalkenyl ether compound according to (8) or (9), and a polymerization initiator that generates an acid upon heating or irradiation with light.
- examples of the lower alkyl include straight or branched ones having 1 to 8 carbon atoms, and specific examples thereof include methyl, ethyl, propyl, isopropyl, Butyl, sec-butyl, tert-butyl, isobutyl, pentyl, isopentyl, neopentyl, hexyl, heptyl, octyl and the like.
- Examples of the lower alkylene and the lower alkyl triphenyl include those obtained by removing one and two hydrogen atoms from the above-mentioned lower alkyl.
- Examples of cycloalkyl include those having 3 to 10 carbon atoms, and specific examples thereof include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl, cyclodecyl and the like. can give.
- Examples of the cycloalkylene and cycloalkane 1, lyyl include those obtained by removing one and two hydrogen atoms from the aforementioned cycloalkyl.
- the aryl and the aryl portion of the aralkyl include, for example, carbon number
- substituents include a hydroxy, a lower alkyl, a lower alkoxy, a lower alkoxycarbonyl, a lower alkanol, a cinnamoyloxy, an aroyloxy, a halogen atom and the like.
- the number of substitution is not particularly limited, but is preferably 1 to 3.
- examples of the alkyl portion of lower alkyl, lower alkoxy, lower alkoxycarbonyl and lower alkanol include the same as those exemplified for the above-mentioned lower alkyl, and the aryl portion of aroyloxy includes the above aryl. And the same as those exemplified in the above.
- examples of the halogen atom include fluorine, chlorine, bromine, iodine and astatine atoms.
- polyalkenyl ether compound represented by the general formula (II) (hereinafter sometimes referred to as polyalkenyl ether-II) will be described.
- Polyalkenyl ethers II can be prepared, for example, by subjecting the corresponding alkenyl ether monomer to a known method in the presence of a polyfunctional initiator and a Lewis acid [for example, Mitsuo Sawamoto, edited by The Society of Polymer Science, Japan; 2. Synthesis and reaction of macromolecules (1), pp. 242 to 276, Kyoritsu Shuppan (19995), etc. It can be obtained by using an acetal polymer as a raw material and converting it into a polymer having a carboxyl group at the end.
- a polyfunctional initiator and a Lewis acid for example, Mitsuo Sawamoto, edited by The Society of Polymer Science, Japan; 2. Synthesis and reaction of macromolecules (1), pp. 242 to 276, Kyoritsu Shuppan (19995), etc. It can be obtained by using an acetal polymer as a raw material and converting it into a polymer having a carboxyl group at the end.
- alkenyl ether monomer examples include, for example, methyl vinyl ether, ethyl vinyl ether, isopropyl vinyl ether, n-butyl vinyl ether, isobutyl vinyl ether, 2-vinyloxyethyl penzoate, and 2-acetoxethyl vinyl ether.
- R 9 is as defined above, R 1 QQ represents a substituted or unsubstituted lower alkyl or a substituted or unsubstituted cycloalkyl, and P is 2 Or Z and Z represents lower alkanoyloxy, lower alkoxy, hydroxy or halogen atom), a compound represented by the general formula (X)
- R 51 is a hydrogen atom, substituted or unsubstituted lower alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aryl or substituted. represents unsubstituted Ararukiru, R 5 2, R 5 3 and R 5 4 is the same or different, rather also substituted unsubstituted lower alkyl, rather also substituted unsubstituted a cycloalkyl, and substituted Or an unsubstituted aryl or substituted or unsubstituted aralkyl).
- a substituted or unsubstituted aryl group is used.
- Low grade Alkyl, substituted or unsubstituted cycloalkyl, lower alkoxy, and halogen are the same as defined above, and the alkyl moiety of lower alkanoyloxy is the same as those exemplified above for lower alkyl. Some of them are listed.
- examples of the polyfunctional initiator include an organic acid, an inorganic acid, and an alcohol adduct of polyfunctional alkenyl ether.
- examples of the polyfunctional alkenyl ether include ethylene glycol divinyl ether, propylene glycol divinyl ether, 1,4-butanediol divinyl ether, 1,6-hexanediol divinyl ether, and 1,9-nonane.
- Diol divinyl ether diethylene glycol divinyl ether, glycerin trivinyl ether, trimethyl ether, propane trivinyl ether, and pen; n resitol tol tetra vinyl ether, bisbuenol F divinyl ether, bisphenol A divinyl ether, 1 , 3,5-Tris (2-hydroxyxetyl) trivinyl ether cyanuric acid, vinyl ether of phenolic resin or novolak resin.
- Examples of the organic acid added to the polyfunctional alkenyl ether include, for example, formic acid, acetic acid, propionic acid, and butanoic acid.
- Examples of the inorganic acid added to the polyfunctional alkenyl ether include hydrochloric acid and bromide.
- Examples of alcohols added to hydrofunctional acid, hydroiodic acid, and the like to polyfunctional alkenyl ethers include, for example, methanol, ethanol, (iso) propyl alcohol, and the like.
- the polyalkenyl ether-II in which Y in the general formula (II) is the general formula (III) can be prepared by using the compound represented by the general formula (I) as a polyfunctional initiator.
- the polyalkenyl ether I I in which Y in the general formula (II) is the general formula (IV) can be obtained by using the compound represented by the general formula (X) as a polyfunctional initiator. But it can.
- the Lewis acid is not particularly limited, for example, rather preferably metal halides, BC 1 3, BF 3, BF 3 ⁇ 0 (CH 2 CH a) 2,
- a halogen atom is substituted by lower alkyl, lower alkoxy, phenoxy, etc. may be used as the Lewis acid.
- lower alkyl and lower alkoxy are as defined above.
- the amount of the Lewis acid to be used is not particularly limited, but is preferably 0.001 to 3.0 mol per 1 mol of the alkenyl ether monomer.
- a Lewis base may be added as necessary. Specific examples thereof include ethyl acetate, ethyl chloroacetate, getyl carbonate, dioxane, tetrahydrofuran, getyl ether, tetrahydrothiophene, and 2,6-dimethylviridine.
- the amount of the Lewis base to be used is not particularly limited, but is preferably 0.01 to 100 mol per 1 mol of the alkenyl ether monomer.
- the polymerization reaction may be performed in the presence of a solvent.
- the solvent is not particularly limited as long as it is inert to the reaction. Examples thereof include aromatic hydrocarbons such as benzene and toluene, halogenated hydrocarbons such as methyl chloride, methylene chloride, 1,2-dichloroethane, and the like. Examples thereof include nitro compounds such as nitromethane and nitrone, saturated hydrocarbons such as hexane, heptane, octane, and nonane, and a mixed solvent thereof.
- the amount of the solvent used is not particularly limited, but is preferably 0.5 to 100 times the amount of the alkenyl ether monomer.
- the temperature of the polymerization reaction is not particularly limited, but is preferably from 180 to 100 ° C, more preferably from 5 to 100 ° C.
- the time of the polymerization reaction is not particularly limited, it is 0.5 to 24 hours. Is preferred.
- Conversion of a polymer having a terminal end to a polymer having a terminal carboxyl group can be carried out, for example, by a known method [T etrahedron, 43, 825 (19987), J. Org. Chem., 51, 567 (19986), Japanese Patent Application Laid-Open No. 2001-11009, etc.] converts terminal acetal to formyl group by hydrolysis. However, it can be carried out by oxidizing the formed terminal formyl group to convert it into a carboxyl group. In addition, according to a known method [Angew. Chem. In 7 .Ed., 38, 2.267 (1999)], the terminal acyl group is converted to a carboxy group. Can be converted in one step. '
- a method of converting the terminal acetal into a formyl group a method of heating and stirring in a mixed solvent of acetic acid and water is preferable.
- the conversion of the terminal acetal or terminal formyl group to a carboxyl group may be performed, for example, by oxidizing a polymer having a terminal acetal or formyl group in the presence of a compound selected from the group consisting of peroxo acids, salts thereof, and mixtures thereof. Can be done in a way.
- a compound selected from the group consisting of peroxo acids, salts thereof, and mixtures thereof potassium hydrogen monopersulfate or a mixture containing the same is preferable.
- the amount of the peroxoacid, its salt or a mixture thereof is not particularly limited, but is preferably 1 to 10 mol, more preferably 1 to 2 mol, as active oxygen equivalent per mol of acetal. Is more preferred.
- the oxidation reaction may be performed in the presence of a solvent.
- the solvent is not particularly limited as long as it is inert to the reaction.
- the solvent include water, alcohols, ethers, aromatic hydrocarbons such as benzene and toluene, and halogens such as methyl chloride, methylene chloride and 1,2-dichloroethane.
- Nitro compounds such as dani hydrocarbons, nitromethane, and nitrone; saturated hydrocarbons such as hexane, heptane, octane, and nonane; and a mixed solvent thereof.
- the temperature of the oxidation reaction is not particularly limited, but is preferably from 180 to 100 ° C, and more preferably from 130 to 100 ° C.
- the time of the oxidation reaction is not particularly limited, but is preferably 0.1 to 24 hours.
- the number average molecular weight of the obtained polyalkenyl ether-II is preferably Is 200 to 100,000, more preferably 500 to 500,000. A number average molecular weight of 200 or more is preferred in terms of flexibility, rubber elasticity, mechanical strength, and the like, and a number average molecular weight of 100 or less is preferred in terms of operability and the like.
- polyalkenyl ether compound of the present invention containing a structural unit represented by the general formula (I) (hereinafter, also referred to as polyalkenyl ether_1) will be described. '
- the polyalkenyl ether-I of the present invention can be obtained, for example, by reacting a polyalkenyl ether-II with a compound having a functional group capable of reacting with a carboxyl group.
- Resin or polyalkenyl ether a a polyalkenyl ether compound obtained by reacting polyalkenyl ether-II with a compound having a hydroxy group (hereinafter, referred to as polyester resin or polyalkenyl ether b) ), A polyalkenyl ether-II obtained by reacting a polyalkenyl ether-II with a compound having an epoxy group (hereinafter sometimes referred to as a polyalkenyl ether c), and a polyalkenyl ether-II.
- polyalkenyl ether d a compound having an oxazolinyl group
- polyalkenyl ether d a polyalkenyl ether compound obtained Ri by the response
- Ageruko a. -Further a polyalkenyl ether compound containing a structural unit represented by the general formula (V) [hereinafter, also referred to as a polyalkenyl ether-based ester (meth) acrylate or polyalkenyl ether e].
- a polyalkenyl ether compound containing a structural unit represented by the following general formula (VI) (hereinafter sometimes referred to as a polyalkenyl ester alkenyl ether or a polyalkenyl ether f);
- a polyalkenyl ether compound containing a structural unit represented by the following formula (hereinafter referred to as a polyalkenyl ether-based epoxy resin or polyalkenyl ether
- a polyalkenyl ether compound containing a structural unit represented by the above general formula (VIIe) [hereinafter referred to as a polyalkenyl ether-based epoxy (meth) acrylate or polyalkenyl ether h]. [Sometimes called].
- the polyalkenyl ether-I of the present invention may be either a thermoplastic resin or a cross-linked resin, and may be a base resin (eg, an epoxy resin, an oxazoline resin) using the raw material polyalkenyl ether-II as a cross-linking agent or the like. And can be obtained by reacting
- the polyalkenyl ether-I of the present invention may be used by adding a pigment such as titanium oxide, carbon black or zinc powder, if necessary.
- a pigment such as titanium oxide, carbon black or zinc powder
- the pigment is added to the polyalkenyl ether I of the present invention, and the pigment is dispersed for 0.1 to 5 hours with a paint shearer or the like.
- the polyalkenyl ether I of the present invention may be used by diluting it with a solvent, if necessary.
- a solvent include aliphatic hydrocarbons, aromatic hydrocarbons, halogenated hydrocarbons, ethers, ketones, etc., and preferably, tetradecane, dodecane, diphenyl, naphthylene, Examples include dichlorobenzene, chloronaphthylene, dihexyl ether, anisol, ethoxybenzene, 2,4-dichloromethoxybenzene, diphenyl ether, cyclohexyl ketone, and acetophenone.
- the polyalkenyl ether I of the present invention may contain a dispersing agent, a wetting agent, a sedimentation It can also be used in combination with an anti-fouling agent, anti-separation agent, anti-skinning agent, anti-static agent, fungicide, fire-retardant, antioxidant, ultraviolet absorber, hindered amine light stabilizer (HALS), etc. .
- Polyalkenyl ether-I is flexible, compatible with low polar resins, uniform composition, impact resistance, mechanical strength, dimensional stability, solubility, tackiness, adhesion, adhesion, and charging
- anti-pressing and anti-press cooker test which is a necessary property of electronic circuit boards, it has excellent weather resistance, water resistance, moisture resistance, transparency, heat aging resistance, dyeing property, etc., paints and coating agents , Ink, adhesive, film, fiber, photo resist, solder resist, semiconductor It is useful for applications such as body sealing materials, laminates, molding materials, sealing agents, and molding materials.
- the polyalkenyl ether a can be produced by a known method (for example, Nikkan Kogyo Shimbun, Polyamide resin, July 1955, Japanese Patent Publication No. 2-1333837). Cut off. For example, a catalyst and, if necessary, a terminal capping agent are added to a mixture of a compound having an amino group or an isocyanate group, a polyalkylenyl ether-II and, if necessary, other carboxylic acid components. After synthesizing the nylon salt, a prepolymer is synthesized at a temperature of 50 to 280 ° C with a degree of humen, and melt polymerization, solid phase polymerization, polymerization using a melt extruder, and the like are performed. Obtainable.
- the compound having an amino group is not particularly limited, and examples thereof include ethylenediamine, 1,2-diaminopropane, 1,3-diaminopropane, and methylaminopropylamine.
- 3-di (4-piperidyl) diamine such as propane, imino bispro Ruami emissions, are exemplified Application Benefits Amin such as methyl Lee Mi Roh Bisupuro Piruami down, Jiami down, Application Benefits Amin bifunctional or more ports Riami emission is favored arbitrariness such.
- an oligomer or a polymer having an amino group such as polyvinylamine can also be used. These can be used alone or in combination of two or more.
- Compounds having an isocyanate group include, for example, diphenylene diisocyanate, 2,4-tolylene diisocyanate, 2,6—tolylene diisocyanate, and p-phenine diisocyanate
- diphenylene diisocyanate 2,4-tolylene diisocyanate, 2,6—tolylene diisocyanate
- p-phenine diisocyanate To m 2,4—naphthalene zonate, 1,5—naphne renzanite, p—xylylene zonate, aromatic diisoganate, isophorone zonate, 4,4, Aliphatic diisocyanates, such as diisocyanate dicyclohexane, 4, 4 and diisocyanate dicyclohexylmethyl, aliphatic diisocyanates, such as hexamethylene diisocyanate, tetramethylene diisocyanate, etc. And these can be used alone or as a mixture of two or more.
- the ratio of the number of moles of the carboxyl group to the number of moles of the amino group or the isocyanate group in the raw material is preferably 99.5: 0.5 to 1:99. 25 to 5: 95 is more preferable, and 60: 40 to 40: 60 is more preferable.
- Examples of the other carboxylic acid component include those having 3 to 22 carbon atoms. Specific examples include malonic acid, dimethylmalonic acid, succinic acid, glutaric acid, adipic acid, and 2 Monomethyladipic acid, 1, Limethyladipic acid, Pimelic acid, 2,2-Dimethylglutaric acid, 3,3—Jetylsuccinic acid, Azelaic acid, Sebacic acid, Suberic acid, 2,4—Jetylglutamate Aliphatic dicarboxylic acids such as carboxylic acid, 1,3-cyclopentanedicarboxylic acid, 1,4-cycloaliphatic dicarboxylic acid such as hexanedicarboxylic acid, isofluric acid, 2,6-naphthylene 2,7-naphthylene dicarboxylic acid, 1,4-naphthylene dicarboxylic acid, 1,4-phenylenedioxydiacetic acid, 1,3-phenylenedioxyd
- the catalyst examples include phenylboric acid, substituted boric acid such as 3,5-bis (trifluoromethyl) phenylboronic acid, phosphoric acid, phosphorous acid, hypophosphorous acid, and salts thereof.
- esters specifically Metal salts such as aluminum, sodium, magnesium, vanadium, calcium, zinc, cobalt, manganese, tin, tungsten, germanium, titanium, antimony and the like, ammonium salts, ethyl ester, isopropyl ester, butyl ester, hexyl Esters such as esters, isodecyl ester, octadecyl ester, decyl ester, stearyl ester, phenyl ester and the like can be mentioned.
- the catalyst is preferably used in an amount of 0.0001 to 5% by weight based on the raw material of the polyalkenyl ether a.
- a solvent may be used, if necessary.
- aromatic hydrocarbons such as benzene, toluene, xylene, cresol and mesitylene are preferable.
- the amount used is 0.5 to 100 times (weight) based on all raw materials of the polyamide resin.
- the solvents are used alone or in combination of two or more.
- the number average molecular weight of the polyalkenyl ether a is from 1,000 to
- Polyalkenyl ether a is, if necessary, a stabilizer such as a copper compound, a coloring agent, an ultraviolet absorber, a light stabilizer, an antioxidant, an antistatic agent, a flame retardant, a glass fiber, a plasticizer, and a lubricant. And the like can be added during or after the polycondensation reaction.
- a stabilizer such as a copper compound, a coloring agent, an ultraviolet absorber, a light stabilizer, an antioxidant, an antistatic agent, a flame retardant, a glass fiber, a plasticizer, and a lubricant. And the like can be added during or after the polycondensation reaction.
- Polyalkenyl ether a can be molded by injection molding, blow molding, extrusion molding, compression molding, stretching, vacuum molding, or the like, or can be processed into a solution using a solvent.
- the polyalkenyl ether b can be prepared by a known method [for example,
- polybasic acid examples include a compound having two or more carboxyl groups per molecule or a precursor thereof (eg, acid anhydride). Specific examples thereof include succinic acid, glutaric acid, and adipine. Acid, sebacic acid, fumaric acid, maleic acid, maleic anhydride, isophthalic acid, phthalic anhydride, tetrahydrofluoric anhydride, hexahydrofluoric anhydride, hydrofluoric acid, anhydrous Examples thereof include pyrometic acid and trimellitic anhydride, and preferably, hydrofluoric acid, isofluoric acid, or trimellitic anhydride is used. These are used alone or in combination of two or more.
- polyols examples include ethylene glycol, propylene glycol, 1,4-butanediol, 1,5-pentenediol, 1,6-hexanediol, neopentyl glycol, hydroquinone, and dimethylolpropionic acid.
- polyester polyols obtained by reacting these with polybasic acids, polytetramethylene ether glycol, polyethylene glycol, 'polypropylene glycol, etc.
- examples thereof include polyether polyols and acrylic polyols. These may be used alone or in combination of two or more.
- animal and vegetable oil fatty acids include soybean oil fatty acids, safflower oil fatty acids, tall oil fatty acids, linseed oil fatty acids, dehydrated castor oil fatty acids, and tung oil fatty acids.
- Animal and vegetable oils include, for example, soybean oil, safflower oil, linseed oil, dehydrated castor oil, tung oil and the like.
- the polybasic acid is used in an amount of preferably 10 to 80% by weight, more preferably 25 to 60% by weight, based on the total amount of the raw material.
- the polyalkenyl ether I I is preferably
- the polyols are used preferably in an amount of 10 to 80% by weight, more preferably 25 to 60% by weight, based on the total amount of the raw materials. If animal or vegetable oil fatty acids or animal or vegetable oils are used, the amount used is based on the total amount of raw materials.
- the ratio of the number of moles of hydroxyl groups to the number of moles of carboxyl groups in the raw material is preferably 0.8: 1.0 to 1.5: 1.0, and 0.9: 1. .0-; 1.3: 1.0 is more preferable.
- the reaction temperature of the esterification is preferably 120 to 300 ° C, more preferably 150 to 230. C.
- the number average molecular weight of the polyalkenyl ether b is from 500 to
- Polyalkenyl ether b is used for paints, coating agents, adhesives, etc., and in the case of polyesters containing unsaturated bonds, unsaturated monomers such as styrene and acryl monomers are mixed. Later, it can be used as an unsaturated polyester.
- Polyalkenyl ether b can be prepared by adding a solvent, if necessary, to form a varnish, then adding an amino resin or a polysocyanate compound as a cross-linking agent, and mixing uniformly. It can also be used as a paint.
- amino resins for example, urea resins, melamine resins, guanamine resins, etc., obtained by reacting urea, melamin ', guanamine, etc. with formaldehyde, etc. These compounds are alkyl etherified with alcohols having 1 to 6 carbon atoms to give compounds and the like.
- methoxylated methylol-lumeramine, methoxylated methylol urea, methoxylated methylol N, N-ethylen urea, methoxymethylol dicyandiamide, methoxylated methylol benzoguanamid And butoxylated methylol melamin, etc. preferably, methoxylated methylol melanin or butoxylated methylol melamin, and usually Sumimar M—50 W Commercial products such as [Sumitomo Chemical Co., Ltd.] are used.
- the amount of the amino resin used is not particularly limited, but is preferably 5 to 60 parts by weight based on 100 parts by weight of the polyalkenyl ether b.
- the amount is 5 parts by weight or more, the cured product is excellent in water resistance, alkali resistance and the like, and when the amount is 60 parts by weight or less, the cured product does not easily become brittle.
- Polyisocyanate compounds include, for example, diphenylmethane succinate, 2,4-trilene succinate, 2,6—trilene Aromas such as diisocyanate, p-phenine range isocyanate, m-phenine range isocyanate, 2,4-naphthalene range isocyanate, 1,5—naphthylene range isocyanate, p-xylylene range isocyanate, etc.
- the amount of the polyisocyanate compound used is not particularly limited, but the preferred amount is 0.01 to 100 equivalents to the content of the hydroxyl group in the polyester resin.
- Polyalkenyl ether b may be used as required, depending on its purpose and application, etc., as required, dispersants, wetting agents, anti-settling agents, anti-segregation agents, anti-skinning agents, anti-static agents, fungicides, fire retardants Etc. can also be used together.
- the coating method includes conventional brush coating, spray coating, and the like, and a wide range of curing methods from room temperature drying to heat drying can be selected.
- the object to be coated include metal, wood, plastic, inorganic material, concrete, and asphalt.
- Polyalkenyl ether b is excellent in transparency, impact resistance, water resistance, oil resistance, weather resistance, heat resistance and the like.
- Polyalkenyl ether b-1 thermoplastic polyester
- the polyalkenyl ether b-1 include a saturated condensation polymer of glycol and a dicarboxylic acid containing polyalkenyl ether-II or a derivative thereof.
- dicarboxylic acids other than polyalkenyl ethers include aromatic dicarboxylic acids having 8 to 14 carbon atoms, and examples of glycols include neopentyl glycol and cyclohexyl.
- polyalkenyl ether-II is used in an amount of 2 mol% or more of the total dicarboxylic acid component.
- Preferred basic skeletons of polyalkenyl ether b-1 include polyethylene terephthalate, poly (1,4-butylene) terephthalate, and 1,4-cyclohexylene dimethylene terephthalate / isophthalate.
- Aromatic dicarboxylic acids [eg terephthalic acid, isophthalic acid, dibenzoic acid, naphthalenedicarboxylic acid, 4,4-diphenylenedicarboxylic acid, bis (p-carboxyphenyl) methane acid, ethylenebis (P- Benzoic acid), 1,4-tetramethylenebis (p-oxybenzoic acid), ethylenebis (p-oxybenzoic acid), 1,3-trimethylenebis (p-oxybenzoic acid)] and glycols [for example, ethylene glycol, 1,3-trimethylene glycol, 1,4-tetramethylene glycol, 1,6-hexamethylene glycol, 1, 3-propylene glycol, 1,8-octamethylene glycol, 1,10-decamethylene glycol, etc.].
- glycols for example, ethylene glycol, 1,3-trimethylene glycol, 1,4-tetramethylene glycol, 1,6-hexamethylene glycol, 1, 3-propylene glyco
- Polyalkenyl ether b-2 is, for example, an aliphatic diol having 2 to 12 carbon atoms, and a flexible material having a molecular weight of 500 to 6,000.
- Raw material for synthesis of polyalkenyl ether b-2 In the above, the polyalkenyl ether-II is used in an amount of at least 10 mol% in all the flexible components.
- aliphatic diol having 2 to 12 carbon atoms there can be mentioned those known as raw materials for polyester elastomers.
- examples thereof include ethylene glycol, propylene glycol, trimethylene glycol, and 1,4-butane.
- Tandiol, 1,6-hexanehexanediol, 1,4-cyclohexanediol, 1,4-cyclohexanedimethanol, etc. preferably 1,4-butanediol or ethylene glycol, more preferably 1,4-butane Diols.
- These aliphatic diols can be used alone or in combination of two or more.
- aromatic dicarboxylic acid examples include terephthalic acid, isofluric acid, phthalic acid, 2,6-naphthic acid, and the like, and terephthalic acid or 2,6-naphthic acid is more preferable. Or terephthalic acid.
- aromatic dicarboxylic acids can be used alone or in combination of two or more.
- aliphatic or alicyclic dicarboxylic acids such as adipic acid may be used alone or as a mixture of two or more thereof as a raw material.
- a trifunctional or higher polyhydric carboxylic acid such as trimellitic acid or a trifunctional or higher polyhydric alcohol may be used as a raw material.
- the flexible components include poly'tetramethylene ether glycol, polypropylene glycol, polyethylene glycol, and acid anhydrides at the ends of the hydroxyl groups of the glycol. Examples include substances converted into carboxyl groups.
- Polyalkenyl ether c can be obtained by reacting polyalkenyl ether I II with a compound having an epoxy group.
- the compound having an epoxy group is not particularly limited, and examples thereof include a known epoxy resin and a vinyl polymer having an epoxy group. '
- epoxy resins have two or more epoxy groups in one molecule If it is, there is no particular limitation. Specific examples include bisphenol A type epoxy resin, bisphenol: F type epoxy resin, cresol novolak type epoxy resin, bishydroxybiphenyl type epoxy resin, linear aliphatic epoxy resin, and resin. Examples include a cyclic epoxy resin, a heterocyclic epoxy resin, a halogenated epoxy resin, and an epoxy resin having a spiro ring.
- Examples of the vinyl polymer having an epoxy group include: (1) a method in which a vinyl monomer having an epoxy group is copolymerized with one or more other vinyl monomers that can be copolymerized; It can be produced by a method in which an epoxy group is introduced by modifying a vinyl copolymer not containing.
- a copolymer obtained by copolymerizing a vinyl monomer having an epoxy group with one or more other vinyl monomers that can be copolymerized may be replaced with another polymer, if necessary. It may have a low molecular weight or the like.
- a simple and preferred method is to copolymerize a vinyl monomer having an epoxy group with one or more other vinyl monomers capable of copolymerization.
- Examples of the vinyl monomer having an epoxy group include glycidyl (meth) acrylic acid and glycidyl of (methyl) acrylic acid such as /?-Methylglycidyl (methyl) acrylate. Esters, aryl glycidyl ethers such as aryl glycidyl ether and aryl (methyl glycidyl) ether, and alicyclic vinyl monomers having an epoxy group such as 3,4-epoxycyclohexyl (meth) acrylate. And the like.
- the other vinyl monomer is not particularly limited as long as it can be copolymerized with a vinyl monomer having an epoxy group.
- examples thereof include methyl (methyl) acrylate and ethyl (meth) acrylate.
- (Meth) acrylic acid esters such as acrylate, butyl (meth) acrylate, cyclohexyl (meth) acrylate, and pendyl (meth) acrylate; Droxicetil
- (Meth) acrylates having a hydroxyl group such as (meth) acrylate, and (meth) acrylates having various hydroxyl groups, to which £ -force prolactone has been added.
- the compounds having an epoxy group can be used alone or in combination of two or more.
- the ratio of the number of moles of carboxyl groups to the number of moles of epoxy groups in the raw material is preferably 99.5: 0.5 to 1:99, and is preferably 75:25 to 5:95. More preferably, the ratio is 60:40 to 40:60.
- the reaction temperature is not particularly limited, but is preferably 0 to 300 ° C.
- one or more known catalysts used for the reaction between the epoxy group and the carboxylic acid may be used.
- the catalyst include phosphonium salts, quaternary ammonium salts, p-toluenesulfonic acid, and the like.
- the number average molecular weight of the polyalkenyl ether c is preferably from 1,000 to 200,000, more preferably from 1,500 to 10,000.
- Polyalkenyl ether d can be obtained by reacting polyalkenyl ether III with a compound having an oxazolinyl group.
- Compounds having an oxazolinyl group include, for example, 1,2-bis (2
- the ratio of the number of moles of carboxyl groups to the number of moles of oxazolinyl groups in the raw material is preferably 99.5: 0.5 to 1:99, and 75:25 to 25:75. Is more preferable, and the ratio is more preferably 60:40 to 40:60.
- the reaction temperature is preferably from 0 to 300 ° C.
- the polyalkenyl ether e contains a structural unit represented by the general formula (V), and contains a polyalkenyl ether-II or an ester or acid chloride thereof and a (meth) acrylate having a corresponding hydroxyl group. It can be obtained by reacting with a rate.
- (meth) acrylates having a hydroxyl group include, for example, 2—hydroxyxethyl (meth) acrylate, 2—hydroxyl mouth (meth) acrylate, and 2—hydroxy.
- ester of the polyalkenyl ether-II an ester with a linear or branched aliphatic or alicyclic alcohol having 1 to 8 carbon atoms is preferable.
- the polyalkenyl ether e can also be produced by ester exchange of the ester of polyalkenyl ether-II with a (meth) acrylate having a hydroxyl group, in which case the reaction temperature is between 80 and 2 The temperature is preferably 100 ° C., and if necessary, a Lewis acid catalyst such as a tinate or tin compound may be added.
- Polyalkenyl ethers are prepared by reacting the acid chloride of II with a (meth) acrylate having a hydroxyl group.
- Tel e can also be produced, in which case the reaction temperature is between 120 and 100. C is preferable, and an alkali such as caustic soda may be used as a catalyst if necessary.
- the ratio of the number of moles of the (meth) acrylate having a hydroxyl group in the raw material to the number of moles of the polyalkenyl ether-II or its ester or acid chloride is from 0.5: 1 to 1: 1. 0: 1 is preferred.
- the polyalkenyl ether e is mixed with a polymerization initiator (light or thermal radical polymerization initiator) that generates radicals by light irradiation or heating to form a polyalkenyl ether e with light or heat.
- a polymerization initiator light or thermal radical polymerization initiator
- a composition containing a thermal radical polymerization initiator (hereinafter sometimes referred to as composition A) is obtained, but the order of addition of these components, the method of mixing, and the like are particularly limited when preparing composition A. It is not done.
- the number average molecular weight of the polyalkenyl ether e when used in the composition A is preferably from 200 to 100,000, more preferably from 500 to
- thermal radical polymerization initiator for example, 2,2, -azobisisobu Thyronitrile, 2,2, -azobis-1-2-methylbutyronitrile, 2,2, -azobis_2,4-dimethylnorrelonitrile, 1,1,1-azobis-1 1-cyclohexanecarbonitrile , Dimethyl-1,2'-azobisisobutyrate, 4,4, -azobis-14-cyanovaleric acid, 2,2'-azobis (2-amidinopropene) dihydrochloride, 2-tert-butylazozo 2 -cyano Azo compounds such as pronon, 2,2'-azobis (2-methylpropionamide) dihydrate, 2,2, -azobis (2,4,4-trimethylpentane), tert-butyl par Oxyneodecanoate, tert-butylperoxypinolate, 7-er-71-butyl-propyloxy 2 -ethylhexanoate, ter 71-but
- Diasyl peroxides such as benzoyl peroxide, hydroperoxides such as cumene hydroperoxide, methylethylketone peroxide, potassium persulfate, 1, -1-bis (tert-butylpropyloxy) 1,3,3,5-Trimethylcyclohexane, dialkyl peroxides, peroxide dicarbonates, hydrogen peroxide and the like.
- the content of the thermal radical polymerization initiator is preferably 0.1 to 100 parts by weight of polyalkenyl ether, e. 2 to 20 parts by weight, more preferably 1 to 1 parts by weight. 0 parts by weight.
- photo-radical polymerization initiators include benzoins such as ben, in, and benzoin methyl ether, benzophenone, methyl benzophenone, 4,4,4-cyclopentabenzophenone, Benzophenones such as 4,1-bis (getylamino) benzophenone, etc., acetophenone, 2,2-dimethoxy-12-phenylacetophenone, 2,2-methoxyphenone Ruthetophenone, 1—hydroxycyclohexylphenylketone, N, N-dimethylaminoacetophenone, 2-methyl-1- (4- (methylthio) phenyl) —2-morpholinopropane 1—Acetophenones such as on, 2—Methylanthraquinone, 2—Ethylanthraki Anthraquinones, such as nonan, 1 alk t!
- Mouth anthraquinone 2—amylanthraquinone, 2-7 minoanthraquinone, 2,4—dimethylthioxatone, 2,4 Thioxanthones, such as 1-ethylthioxanthone, 2-chlorothioxanthone, 2,4-diisopropylpropyloxy, santon, 2-isopropylthioxanthone, acetophenone dimethyl ketal, and benzyl Ketones such as dimethyl ketal.
- the content of the photoradical polymerization initiator is preferably 0.2 to 20 parts by weight, more preferably 1 to 10 parts by weight, based on 100 parts by weight of the polyalkenyl ether e. .
- the content of the photo-radical polymerization initiator is 0.2 parts by weight or more, the curability is excellent, and when the content is 20 parts by weight or less, the cured product has excellent physical or chemical properties.
- composition A is heated to 80 to 200 ° C. (when a thermal radical polymerization initiator is contained) or irradiated with light such as laser light (containing a photoradical polymerization initiator). Case) This cures.
- Polyalkenyl ether e is suitable for applications such as coating agents, photo resists, and solder resists.
- the polyalkenyl ether f contains a structural unit represented by the general formula (VI), and uses polyalkenyl ether-II or its ester or acid chloride, and an alkenyl ether having a corresponding hydroxyl group. Thus, it can be synthesized by the same method as for polyalkenyl ether e.
- alkenyl ethers having a hydroxyl group include, for example, 2—hydroxypropyl vinyl ether, 2—hydroxypropyl vinyl ether, 4—hydroxybutyl vinyl ether, 2—hydroxybutyl vinyl ether, and 3— Examples thereof include hydroxybutyl vinyl ether, 2-hydroxy-2-methylpropyl vinyl ether, 5-hydroxypentylvinyl ether, 6-hydroxyhexyl vinyl ether and cyclohexanedimethanol monovinyl ether.
- the polyalkenyl ether f is cured by mixing with a polymerization initiator (heat or photoacid generator) that generates an acid upon heating or irradiation with light.
- a polymerization initiator heat or photoacid generator
- composition B a polymerization initiator that generates an acid upon heating or irradiation with light.
- thermal acid generator examples include a compound obtained by neutralizing Blensted acid or Lewis acid with a Lewis base, or Lewis acid and Brenstead acid, or Lewis acid and Brenstead salt Examples include complex compounds, sulfonic esters, phosphoric esters, and ionic compounds.
- Brenstead acid which constitutes the thermal acid generator, is a substance that shows acidity by dissociating protoic acid, and is preferably sulfuric acid, sulfonic acid, phosphoric acid, boric acid, carboxylic acid, or a derivative thereof. .
- Specific examples thereof include, for example, sulfuric acid, sulfuric acid monoester, phosphoric acid, phosphoric acid mono- or diester, polyphosphoric acid ester, boric acid mono- or diester, sulfonic acid, carboxylic acid, halogenocarboxylic acid Acid or the like, preferably C1-C50 alkylbenzenesulfonic acid such as dodecylbenzenesulfonic acid or the like, or mono- or dihalogenocarboxylic acid or phosphoric acid of C1-C50 such as chloroacetic acid or dichloroacetic acid Examples thereof include alkyl monophosphates or diesters having 1 to 50 carbon atoms, such as monomethyl and dimethyl phosphate. These blended acids can be used alone or in combination of two or more.
- Lewis acid constituting the thermal acid generator is a compound having an electron-accepting property, and particularly preferred are metal halides and organometallic compounds. Specific examples thereof include boron trifluoride and trifluoride.
- Metal halides such as stannic, trialkylboron, trialkylaluminum, dialkylaluminum halide, monoalkylaluminum halide, tetraalkyltin, aluminum acetylacetonate, iron acetyl acetate Zirconium acetyl acetate, dibutyltin acetyl acetate, dibutyltin dilaurate, dioctyltin S Termate, magnesium naphthenate, calcium naphthenate, manganese naph
- the Lewis base used to neutralize blended and lewis acids is an electron-donating compound, such as ammonia, triethylamine, pyridin, and the like.
- the thermal acid generator can be used alone or in combination of two or more kinds, and the compounding amount thereof is 0.01 to 10 parts by weight per 1 part by weight of the total solid content. Preferably, the amount is 0.02 to 5 parts by weight. ,.
- Composition B containing a thermal acid generator is cured by heating at 50 to 200 ° C. for 2 minutes to 10 hours.
- Examples of the photoacid generator include various compounds such as hondium salt compounds, sulfone compounds, sulfonic acid ester compounds, diazosulfone compounds, disulfonylmethane compounds, sulfonimide compounds, nitrobendyl compounds, and naphthoquinonediazide compounds. Can be used.
- sodium salt compound examples include iodonium salt, sulfonium salt, phosphonium salt, diazonium salt, ammonium salt, pyridinium salt and the like.
- ⁇ is a bis
- Toluenesulfonate diphenodornidine drifluoromethane.
- sulfone compound examples include? Ketos rufone, —-sulfonyl sulfone, and these diazo compounds.
- Specific examples of the sulfone compound include phenacylphenylsulfone, mesitylphenacylsulfone, bis (phenylsulfonyl) methane, and 4-tris (phenacyl) sulfone.
- sulfonic acid ester compound examples include an alkyl sulfonic acid ester, a nitroalkyl sulfonic acid ester, an aryl sulfonic acid ester, and imino sulfonate.
- sulfonic acid ester compounds include penzoin silicate, pyrogallol tris (trifluorosulfonate), pyrogallol methane sulfonic acid triester, and nitrobenilou 9, 1 0 —Jetxian thracene _ 2 —Sulfonate, 1-methylol benzoin octane sulfonate, 1-methylol benzoin trifluoromethane sulfonate, 1-methylol benzoin dodecyl sulfonate, etc. it can.
- sulfonimide compounds include N — (trifluoromethylsulfonyloxy) succinimide, N — (trifluoromethylsulfonyloxy) phthalimid, and N — (trifluoromethyl) Sulfonylox) diphenyl maleimide, N — (trifluoromethylsulfonylox) bicyclo [2.2.1] hept-5-en-1,2,3-dicarboxy Mido, N- (trifluoromethylsulfonyloxy) -17-oxabicyclo [2.2.1] hept-15-ene-1,2,3-dicarboxymid, N- (trifluromethyl) 1,2-butoxy-5,6-dioxy-1,2,3-dicarboxymide, N _ (trifluoromethylsulfonyloxy) naphthylimide, N— (Camphorsulfonyloxy) succinimide, N_ (Camphorsulfonyloxy
- the photoacid generators can be used alone or in combination of two or more.
- the compounding amount thereof is preferably 0.01 to 50% by weight per 100 parts by weight of the total solid content. Parts, more preferably 0.5 to 30 parts by weight, even more preferably 0.5 to 25 parts by weight.
- Composition B containing a photoacid generator is usually cured by irradiation with light such as laser light.
- the polyalkenyl ether f is suitable for uses such as a coating agent, a photo resist, and a solder resist.
- the polyalkenyl ether g contains a structural unit represented by the general formula (VII), and is formed by a known method using polyalkenyl ether-II and epichlorohydrin (3-chloro-11,2-epoxypropane). It can be obtained by using a method [edited by Hiroshi Kakiuchi, New Epoxy Resin, pp. 58-63, Shokodo (1989)].
- the ratio of the number of moles of epichlorohydrin in the raw material to the number of moles of polyalkenyl ether II is preferably 0.01: 1 to 100: 1, and ⁇ . It is more preferable that the ratio is up to 10: 1. .
- the polyalkenyl ether g is cured using a polyamine-based curing agent, a polycarboxylic acid (anhydride) -based curing agent, a phenol resin-based curing agent, a cascade polymerization catalyst, a quaternary ammonium salt, or the like, similarly to known epoxy resins. Things can be done.
- the polyalkenyl ether g can be made into a curable composition by mixing with a polymerization initiator that generates an acid by heating or light irradiation.
- the production, curing, and the like of the curable composition can be performed by setting the same conditions as in the case of the polyalkenyl ether f.
- the polyalkenyl ether g is suitable for applications such as coating materials, photo resists, and solder resists.
- the polyalkenyl ether h contains a structural unit represented by the general formula (VIII), and can be obtained by reacting polyalkenyl ether-II with the corresponding glycidyl (meth) acrylate. .
- the reaction temperature is preferably ⁇ 0 to 200 ° C.
- a catalyst such as tertiary amine or quaternary ammonium salt may be added.
- the ratio of the number of moles of glycidyl (meth) acrylate to the number of moles of polyalkenyl ether-II in the raw material is preferably 0.5: 1 to 10: 1.
- the polyalkenyl ether h can be made into a curable composition by mixing with a polymerization initiator ′ that generates a radical by light irradiation or heating.
- the production, curing, and the like of the curable composition can be performed by setting the same conditions as in the case of the polyalkenyl ether e.
- Polyalkenyl ether h is suitable for applications such as, for example, coating materials, photoresists and solder resists.
- T-1 460 g was obtained.
- the acid value of this polymer was 37.8 mg KOH / g, and the peroxide concentration was less than 0.1 mmolZg.
- the number average molecular weight Mn of this polymer was 2,900, and the molecular weight distribution Mw / Mn was 1.60.
- the average molecular weight (in terms of polystyrene) of the polymer was measured by gel permeation chromatography (GPC) under the following conditions.
- the obtained poly (vinyl ether) having acetal at both ends (1.18 mmol / g of acetal) was added to 100 g of ethanol, 980 g of water, 630 g of water, and oxone ( 540 g of potassium hydrogen hydrogen persulfate (Dup0n, manufactured by Nanasha) was added. 25 of this solution. The mixture was stirred at C for 3.5 hours. After the completion of the reaction, the reaction solution was washed with water, and the solvent was distilled off to obtain 830 g of a poly (vinyl vinyl ether) having a carboxyl group at both terminals (hereinafter, sometimes abbreviated as T-12).
- T-12 a poly (vinyl vinyl ether) having a carboxyl group at both terminals
- Table 1 summarizes the characteristic values of T-1 obtained in Reference Example 1 and T-12 obtained in Reference Example 2.
- the melt viscosity of the obtained polyamide resin was 50 Pa ⁇ s.
- the melt viscosity was measured by the following method.
- Melt viscosity was measured using a Shimadzu flow tester CFT-500 at a measurement temperature of 250 ° C, a die of 0.5 mm (diameter) xl. O mm (long), and a load of 10 kg. I went in.
- T-218 g, 12-aminododecanoic acid 240, hexamethylene diamine 16 g and ion-exchanged water 600 ml obtained in Reference Example 2 were charged into an eggplant flask. The mixture was heated and dissolved in a water bath set at 60 ° C. After cooling to room temperature, 1 L of tetrahydrofuran was added, the mixture was stirred and allowed to stand, and the supernatant tetrahydrofuran layer was removed. This step was repeated 10 times. The remaining aqueous layer is heated at 50 ° C and concentrated under reduced pressure, and the residue is dried in vacuo at 50 ° C to obtain T-12 and 12-aminododecanoic acid. A mixed salt of xamethylenediamine was obtained. The yield of salt obtained is
- the obtained amount was 406 g and the yield was 95%.
- Hexamethylenediamine mixed salt of T-12 and 12-aminododecanoic acid obtained above, 152 g, ilganox 109 (0.5 g, an antioxidant manufactured by Ciba-Geigy) and 0.5 g 0.1 g of acid was charged into an eggplant-shaped flask, and dispersed in a mixed solution of m-cresol 10 ml dissolved in mesitylene 1500 ml. Thereafter, the mixture was refluxed at 180 ° C. for 8 hours under a nitrogen stream. Product water was removed with a Dean-Stark tube.
- reaction solution was heated at 200 ° C. for 4 hours while distilling off the solvent, and further heated at 270 ° C. for 5 hours under reduced pressure of 666 Pa. After heating, remove the product before it cools and solidifies to obtain 84 g of the desired polyamide resin.
- the obtained polyamide resin was a light brown solid and had a melt viscosity of 32 Pa ⁇ s. Melt viscosity was measured in the same manner as in Example 1.
- a polytetramethylene ether glycol having a number-average molecular weight of 200 ° at both ends, polytetramethylene ether glycol, 300 g, 60 g of succinic anhydride and 5 ml of pyridine was dissolved in toluene and stirred at 100 ° C for 5 hours. I fluttered. After distilling off the toluene, the resultant was purified by thin-film distillation to obtain polytetramethylene ether glycol having carboxyl groups at both ends (hereinafter sometimes referred to as PTG-COOH).
- the melt viscosity of the obtained polyamide resin was 53 Pa's. Melt viscosity was measured in the same manner as in Example 1.
- Test Example 1 Water resistance of polyamide resin (change in melt viscosity)
- Example 1 The polyamide resin obtained in Example 1 was hot-pressed at 250 ° C. to produce a film having a thickness of 200 m.
- the melt viscosity of this film was 49 Pa ⁇ s. Melt viscosity was measured in the same manner as in Example 1.
- the polyamide resins obtained in Examples 1 and 2 exhibited excellent water resistance.
- Test Example 2 Properties of epoxy clear coating composition
- the epoxy clear coating composition (E-1) obtained in Example 3 was applied to a zinc phosphate treated plate (manufactured by Nippon Test Panel Co., Ltd.) using an applicator to obtain a dry film thickness of 5 O ⁇ m. It was applied, left at room temperature for 10 minutes, and baked at 150 ° C. for 20 minutes. Then, it was left overnight in a constant temperature room at 23 ° C to prepare a test panel for paint evaluation.
- the epoxy clear coating composition (E-2) obtained in Example 4 and the epoxy clear coating composition (E-3) obtained in Comparative Example 2 were coated in the same manner as above. Test panels for evaluation were fabricated. Using these three paint evaluation test panels, the epoxy-based clear coating composition was evaluated by the following evaluation method.
- Pencil hardness It was carried out according to the handwriting method of JIS K540 (paint general test method).
- Adhesion Performed in accordance with the Goban test method of JI, SK540 (paint general test method).
- test piece was immersed in warm water at 40 ° C. for 120 hours and the appearance was visually observed in accordance with JIS K540 (General Paint Test Method).
- Alkali resistance The test piece was immersed in a saturated aqueous solution of calcium hydroxide for 72 hours at 25 ° C in accordance with JIS K 540.0 (paint general test method), and the appearance was visually observed.
- Table 13 shows the evaluation results.
- the coatings obtained from the epoxy clear coating compositions obtained in Examples 3 and 4 have excellent appearance (compatibility and uniformity), pencil hardness, adhesion, impact resistance, water resistance and It showed alkali resistance.
- the appearance (compatibility and uniformity), adhesion, and impact resistance were superior to the coating films obtained from the comparative coating compositions.
- Example 5 Production of oxazoline-based clear coating composition
- Epocross K-200 (manufactured by Nippon Shokubai Co., Ltd., solid content: 40%, oxazoline equivalent weight: 550) 20 g of ethylene glycol monobutyl ether was added to 20 g, and then obtained in Reference Example 1. T_112.1 g was added to obtain an oxazoline-based clear coating composition (0X-1).
- Epocloth K-200 (manufactured by Nippon Shokubai Co., Ltd., solid content 40%, oxazoline equivalent weight 5550) 20 g of ethylene glycol monobutyl ether was added, and then obtained in Reference Example 2. Was added to obtain an oxazoline-based coating composition ( ⁇ X-2).
- Epocloth K-200 (Nippon Shokubai Co., Ltd., solid content 4%, oxazoline equivalent weight 5550) 20 g of ethylene glycol monobutyl ether 5 g was added, and then polybutadiene dibasic acid ( Nippon Soda Co., Ltd. C— When 100,000 and a carboxylic acid equivalent of about 900) 13.lg were added, a large amount of foreign matter was generated, and an oxazoline-based clear coating composition could not be obtained.
- Test Example 3 Characteristics of oxazoline-based clear coating composition
- the oxazoline-based clear coating composition (0X-1) obtained in Example 5 was applied to a zinc phosphate-treated version (manufactured by Japan Test Panel Co., Ltd.) at a thickness of 3 mm by dry coating at Apriquet Alliance. After being left at room temperature for 10 minutes, forced drying was performed at 80 ° C. for 30 minutes. Then, it was left overnight in a constant temperature room at 23 ° C to prepare a test panel for paint evaluation.
- Example 6 a test panel for coating evaluation was prepared in the same manner as described above. Using these two types of paint evaluation test panels, the epoxy clear coating composition was evaluated by the evaluation method performed in Test Example 2. Table 4 shows the evaluation results.
- the coating film obtained from the oxazoline-based clear coating composition obtained in Examples 5 and 6 has excellent appearance (compatibility and uniformity), pencil hardness, adhesion, impact resistance, and water resistance. It showed high resistance to stress.
- Test Example 2 was conducted using these two types of paint evaluation test panels.
- the polyester resin was evaluated according to the evaluation method described above. Table 5 shows the evaluation results. ,
- the coating films obtained from the polyester resins obtained in Examples 7 and 8 exhibited excellent appearance (compatibility and uniformity), pencil hardness, adhesion, impact resistance, water resistance and alkali resistance. . ,
- Example 9 Production of polyester vinyl ester ester acrylate Into a flask equipped with a cooling tube, 600 g of the T—129.0. 100 g of 100% sulfuric acid was prepared and reacted under reflux for 4 hours. The reaction mixture was neutralized with saturated aqueous sodium hydrogen carbonate and extracted with ethyl acetate.
- Test Example 5 Properties of Poly (vinyl ether) Ester Acrylate
- the polyvinyl ether-based polyester acrylate obtained in Example 9 was dissolved in tetrahydrofuran at a solid content of 60%, and then the obtained poly (polyether acrylate) was obtained.
- 100 parts by weight of polyester acrylate in the ester acrylate solution 2.0 parts by weight of IRGAC UR E 184 (manufactured by Ciba Specialty Chemicals), 0.5 parts by weight of IRGAC UR E 819 (manufactured by Ciba Specialty Chemicals) And 0.3 parts by weight of IR GAN OX 103 (antioxidant, manufactured by Ciba Specialty Chemicals).
- IRGAC UR E 184 manufactured by Ciba Specialty Chemicals
- IRGAC UR E 819 manufactured by Ciba Specialty Chemicals
- IR GAN OX 103 antioxidant, manufactured by Ciba Specialty Chemicals
- the resulting mixture was then applied to a glass plate using a 0.27 mm apriquet overnight. After vacuum drying overnight at 60 ° C open, it was dried overnight at 23 ° C / humidity '50%. Thereafter, the obtained dried mixture was irradiated with ultraviolet rays until it was cured under the following conditions.
- Curing device UV curing device manufactured by iGraphics, Inc.
- Lamp Metal halide lamp (optical path length 25 cm) and high pressure mercury lamp (optical path length 25 cm) Intensity: 80 W / cm
- Example 9 The polyethyl vinyl ether ester acrylate obtained in Example 9 gave a cured film having excellent mechanical strength and elongation.
- a polyalkenyl ether compound having excellent weather resistance, water resistance, moisture resistance, transparency, heat aging resistance, dyeability, and the like is provided as a result of the pre-shark resistance test, which is a necessary property of an electronic circuit board.
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JPS511592A (ja) * | 1974-03-19 | 1976-01-08 | Aquitaine Total Organico | |
WO1996033154A1 (fr) * | 1995-04-20 | 1996-10-24 | Idemitsu Kosan Co., Ltd. | Procede de production de composes d'ether |
JP2003335816A (ja) * | 2002-05-22 | 2003-11-28 | Kyowa Yuka Co Ltd | 末端にカルボキシル基を有するビニルエーテルポリマーの製造方法 |
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JPS511592A (ja) * | 1974-03-19 | 1976-01-08 | Aquitaine Total Organico | |
WO1996033154A1 (fr) * | 1995-04-20 | 1996-10-24 | Idemitsu Kosan Co., Ltd. | Procede de production de composes d'ether |
JP2003335816A (ja) * | 2002-05-22 | 2003-11-28 | Kyowa Yuka Co Ltd | 末端にカルボキシル基を有するビニルエーテルポリマーの製造方法 |
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