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WO2003105208A1 - Dispositif de nettoyage et de séchage - Google Patents

Dispositif de nettoyage et de séchage Download PDF

Info

Publication number
WO2003105208A1
WO2003105208A1 PCT/JP2003/007314 JP0307314W WO03105208A1 WO 2003105208 A1 WO2003105208 A1 WO 2003105208A1 JP 0307314 W JP0307314 W JP 0307314W WO 03105208 A1 WO03105208 A1 WO 03105208A1
Authority
WO
WIPO (PCT)
Prior art keywords
washing
cleaning
rotating drum
drying
rotating
Prior art date
Application number
PCT/JP2003/007314
Other languages
English (en)
Japanese (ja)
Inventor
野辺　進太郎
今川　進
Original Assignee
株式会社ダン・タクマ
株式会社稲本製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社ダン・タクマ, 株式会社稲本製作所 filed Critical 株式会社ダン・タクマ
Publication of WO2003105208A1 publication Critical patent/WO2003105208A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/045—Cleaning involving contact with liquid using perforated containers, e.g. baskets, or racks immersed and agitated in a liquid bath

Definitions

  • the present invention relates to a cleaning / drying apparatus for cleaning a storage tray for storing semiconductors and mechanical parts such as electric components with a cleaning liquid, and drying by taking in drying air.
  • a shelf for storing electronic parts and precision machine parts for storing and transporting these parts and the like A tray for manufacturing a semiconductor device and a cassette for storing semiconductor wafers (hereinafter referred to as a “storage container, etc.”) adhere to particles. If they are contaminated by water, they are washed, dried and reused.
  • a rotating drum is installed in the washing tank, and one or more detachable baskets accommodating a plurality of component storage containers and the like are installed in the rotating drum, or the rotating drum is installed. It is characterized in that parts storage containers and the like are stored directly in the inside, washing is performed while rotating the rotating drum, and then the rotating drum is rotated at a high speed to drain, dewater, and dry. Washing, draining, dehydrating, and drying are performed in the same tank so that the entire apparatus is compacted, and draining, dehydrating, and drying are performed by centrifugal force.
  • a rotating drum is installed in the washing tank, and one or more detachable baskets containing a plurality of component storage containers are installed in the rotating drum.
  • the invention is characterized in that, after draining and dewatering, in order to shorten the drying time, drying is performed by blowing hot air.
  • a rotating drum is installed in the pre-cleaning tank, and one or more removable baskets containing a plurality of component storage containers are installed in the rotating drum, and the rotating drum is installed. gWashing while rotating the rotating drum, draining and dewatering by rotating the rotating drum at high speed, then transferring to a drying device equipped with a rotating drum and spraying hot air to dry
  • the equipment and the drying equipment are installed separately and side by side.
  • a rotating drum is installed in a cleaning tank, and a plurality of component housing containers are installed in the rotating drum in order to be able to wash and dry the component housing container of any shape and size. It is characterized in that a fixed frame that can be divided into one or a plurality of baskets of any shape and any size that can be attached and detached and that houses any of them is provided.
  • a rotating drum is installed in a cleaning tank, and one or a plurality of semiconductor wafer cassettes can be stored in the rotating drum. After the semiconductor wafer cassette is washed while rotating the rotating drum, the rotating drum is rotated. It is characterized in that it is drained, dehydrated and dried by rotating at a high speed. The high-speed rotation for the dewatering, dehydration and drying is set to 350 to 800 RPM.
  • the present invention is characterized by comprising at least two stages of a cleaning step of performing a primary cleaning followed by a secondary cleaning (rinse cleaning) as a final cleaning.
  • a cleaning step of performing a primary cleaning followed by a secondary cleaning (rinse cleaning) as a final cleaning.
  • I do Use pure water or an aqueous detergent solution or alkaline water as the cleaning solution for the primary cleaning, and use ultrapure water for the secondary cleaning.
  • the present invention is characterized in that the cleaning liquid is stored in the lower portion of the rotary drum for cleaning as primary cleaning in order to save the cleaning water, and the cleaning water is evenly distributed to the parts storage container and the like.
  • the cleaning is performed by spraying a cleaning liquid from a substantially central portion of the rotating drum.
  • the cleaning liquid jet nozzle for jetting the cleaning liquid is characterized in that the rotary shaft of the rotary drum is a hollow shaft, and the hollow rotary shaft is also used as a nozzle for jetting the cleaning liquid.
  • the rotating drum when cleaning the component storage container and the like, the rotating drum is rotated at a low speed. After that, when draining and dewatering, washing is performed by changing the rotation speed of the rotating drum in at least two stages of high-speed rotation, and then draining and dewatering is performed. 50 RPM, and during draining and dewatering, 350-800 RPM.
  • a rotation position detecting device is provided on the rotating drum to facilitate loading and unloading of the basket into and from the washing tank of the washing and drying device, and when the rotating drum is stopped after washing and drying, the rotation of the rotating drum is constantly stopped.
  • Fins or brushes are provided on the outer surface of the rotating drum to clean the inner wall of the washing tank, and the cleaning sludge attached to the inner wall of the washing tank is wiped off by rotation of the rotating drum. It is characterized by having functions.
  • a rotating drum is installed in a drying device tank, and a component storage container or the like to be dried is installed in the rotating drum.
  • Hot air is supplied into the drying tank through the HEPA filter 14 provided above the nozzle, or the nozzle is provided on the rotating shaft of the rotary drum by replacing the filter with the filter provided above, It is characterized in that a hot air is blown out to this nozzle shaft.
  • a line filter 15 is provided upstream of the nozzle shaft.
  • the part storage container is placed on a belt conveyor and pure water is sprayed in several stages from the jet nozzle. It is characterized by storing a plurality of parts storage containers and the like in a dedicated basket, spray cleaning the cleaning liquid or immersion cleaning in a cleaning tank using ultrasonic waves or hot water, and then performing centrifugal dewatering and drying. According to this washing and drying method, the area occupied by the drying area can be reduced, and the drying efficiency can be increased and the throughput can be increased by centrifugal drying. - g It is characterized by drying by hot air after centrifugal dehydration and drying. Drying efficiency can be further improved. BRIEF DESCRIPTION OF THE FIGURES
  • FIG. 1 is a view showing the inside of a washing tank of the washing and drying apparatus of the present invention
  • FIG. 2 is a view showing an embodiment of the first washing and drying apparatus of the present invention
  • FIG. FIG. 4 is a view showing an embodiment of a second washing / drying apparatus of the present invention
  • FIG. 4 is a view showing an embodiment of a drying apparatus of the present invention
  • FIG. 6 is a diagram showing an embodiment of the washing / drying device of FIG. 3
  • FIG. 6 is a diagram showing an embodiment of the fourth washing / drying device of the present invention
  • FIG. 7 is a diagram of FIG.
  • FIG. 8 is a view of the centrifugal dewatering and drying apparatus as viewed from the arrow
  • FIG. 8 is a view showing the configuration of a conventional first washing and drying apparatus
  • FIG. 9 is a view of a conventional second washing and drying apparatus.
  • FIG. 3 is a diagram illustrating a configuration. BEST MODE FOR CARRYING OUT THE INVENTION
  • FIG. 1 is a diagram showing a concept of an embodiment of the present invention.
  • a basket holding a plurality of component storage containers 7 is installed and fixed along the periphery on a rotating drum 1 in a washing tank (not shown). While rotating the rotating drum 1 in the washing tank, a process of rapidly supplying pure water into the washing tank, storing a certain amount of water, and performing rotary washing is adopted.
  • a fixed frame that can be divided into one or more baskets of any shape and size that can be detached and housed in a rotating drum and that house a plurality of component storage containers 7 etc. shall be provided.
  • cleaning liquid 3 is stored in the bottom of the rotary drum 1 and slowly rotated in the direction of the arrow, so that the component storage containers 7 are sequentially immersed in the cleaning liquid 3 for cleaning.
  • cleaning solution 3 Use pure water, water-based detergent, or alkaline water.
  • the pure water storage circulation tank consists of a pure water circulation pump, a filtration filter, and a water storage tank. If pure water is stagnated, it tends to decay. Therefore, a system that always bypasses and filters when not in use.
  • a basket 2 holding a plurality of component storage containers 7 on a rotating drum 1 is carried in and installed along the circumferential direction as shown in FIG.
  • the cleaning liquid injection nozzle 10 is fixed to the cleaning tank 5 and is disposed so as to be located substantially at the center of rotation of the rotating drum 1.
  • the rotating drum 1 After closing the tank lid 6, the rotating drum 1 is rotated by the rotating shaft 4 in the direction of the arrow.
  • primary cleaning is performed by immersing regenerated pure water in the cleaning liquid 3 stored in the lower part of the cleaning tank, or by regenerating pure water from the injection nozzle 10 using the shower 9 for about 4 minutes. Perform cleaning. For example, used pure water is recycled as pure water through a filter. In the primary cleaning, the cleaning liquid may be replaced with regenerated pure water, or an aqueous detergent or alkaline ionized water may be used together with the purified water.
  • the parts storage container 7 of the basket 2 is rotated by the rotating drum 1 over the entire inside of the washing tank 5, so that the spraying of the washing liquid becomes uniform, and the washing effect is further increased by the rotating water flow.
  • a switching valve (not shown) is used to switch from regeneration pure water or detergent to ultrapure water, and the shower 9 is used to perform secondary cleaning with ultrapure water for about 2 minutes.
  • the required supply of pure water is about 15 liters / min.
  • the rotation speed of the rotating drum 1 is set to 10 to 50 RPM in these washings.
  • the cleaning liquid shower 9 from the injection nozzle 10 is stopped, and the rotation of the rotating drum 1 is stopped.
  • the ⁇ inversion number is set at 350 to 800 RPM, and the water is drained, dehydrated and dried for 3 minutes by centrifugal force. In this way, when cleaning the component storage container and the like, the rotary drum is rotated at a low speed, and then, when performing 7 ⁇ dewatering, the rotating speed of the rotary drum is changed to at least two stages of high-speed rotation for cleaning, draining and dewatering. .
  • a mechanism is provided to provide a fin or brush 11 made of rubber or resin on the outer peripheral wall or side surface of the rotary drum 1 to wipe off cleaning sludge adhering to the inner wall in the cleaning tank.
  • a rotary injection nozzle (for cleaning liquid) 8 having a hollow rotary shaft is used instead of the injection nozzle 10 shown in FIG.
  • a cleaning liquid shower 9 is sprayed from a rotary spray nozzle (for cleaning liquid) 8 toward a parts container 7.
  • draining and dewatering can be performed more efficiently in a short time than draining and dehydrating by blowing high-pressure air with a blower that has been generally used.
  • the entire device can be made compact without the need for a long draining / drying / drying area.
  • the required cleaning time for these parts storage containers 7 is 0.5 minutes, primary cleaning 4 minutes, secondary cleaning 2 minutes, draining 3 minutes, unloading 0.5 minutes for parts storage containers 7 It is.
  • the present invention provides for drainage dewatering by rotation, and thus via a filter.
  • the g dry warm air Air one was is obtained by realizing a clean dry.
  • the reason why the cleaning device 1A and the drying device 1C are separated and independent is to perform a series of cleaning and drying steps by increasing the thermal efficiency so that the cleaning liquid does not take heat energy from the drying device 1C.
  • a rotating position detecting device is provided on the rotating drum 1 so that the rotating drum 1 is always stopped at a fixed position when the rotating drum 1 is stopped, so that the basket 2 containing the component storage containers 7 can be easily loaded and unloaded. I did it.
  • a cleaning and drying apparatus having a body shape will be specifically described.
  • a plurality of baskets 2 containing parts storage containers 7 are installed in the direction around the rotating drum 1. As shown in FIG. 1, they are arranged and installed as in the case of the above-mentioned separate type of the washing device and the drying device. In addition, the washing process by washing with a washing solution and the washing by dewatering, dehydration and drying are the same as those of the separate type.
  • a plurality of semiconductor wafer cassettes are placed in a dedicated basket and set on the rotating drum 1, or the semiconductor wafer cassettes are directly placed on the rotating drum 1. Put it in g and fix it.
  • the rotating drum 1 is rotated, and the semiconductor wafer cassette is sequentially immersed in the cleaning liquid 3 stored in the lower portion of the cleaning tank.
  • the cleaning liquid shower 9 is sprayed from the rotary spray nozzle 8 toward the semiconductor wafer cassette for about 4 minutes.
  • ultrapure water is rotated by a switching valve (not shown) from the spray nozzle 8 as an ultrapure water shower 9, and the secondary washing of the semiconductor wafer cassette and ⁇ (finish washing) are performed for about 2 minutes.
  • the rotating drum 1 is rotated at a rotation speed of 10 to 50 RPM.
  • the ultrapure water shower 9 is stopped, the rotation speed of the rotary drum 1 is increased to about 400 RPM, and draining, dehydration and drying are performed. After draining and dewatering for about 3 minutes, the rotation speed is maintained at about 400 RPM, and an air shower is sprayed from the rotary injection nozzle through the line filter 15 to achieve clean drying.
  • the parts storage container is placed on a belt conveyor and pure water is sprayed in several stages from a jet nozzle, or when immersion cleaning using a cleaning tank is adopted, one or more parts may be used.
  • the storage container is stored in a special basket, spray cleaning of the cleaning liquid or immersion cleaning in a cleaning tank using ultrasonic waves or hot water, and then centrifugal removal [7] drying. According to this washing and drying method, the area occupied by the drying area can be reduced as compared with the conventional method, and the drying efficiency can be increased and the throughput can be increased by centrifugal drying.
  • drying with warm air After centrifugal dehydration and drying, drying with warm air is performed. The drying efficiency can be further increased.
  • the storage containers are placed on the belt conveyor 101 as shown in Fig. 5, and pure water is sprayed from the jet nozzle in several stages, that is, primary cleaning with regenerated pure water Spray cleaning 102 consisting of secondary cleaning (finish cleaning) with ultrapure water is performed. Also, instead of spray cleaning 102, as shown in FIG. 1 ()
  • the ultrasonic washing tank is immersed in the washing tank (1) 105 and the washing tank (2) 106 for washing, and further washed in the rinsing tank 107.
  • the storage container or the like washed by any of the above two types of washing methods is automatically centrifugally dehydrated and dried by the centrifugal drying device 18 by the basket carrier 17.
  • the drying time is shortened, and as a result, the washing / drying processing per unit time can be improved.
  • the area occupied by the drying device can be significantly reduced, and the area occupied by the floor as a whole of the washing and drying device can be significantly reduced.
  • Fig. 7 is a plan view of the centrifugal dryer 18 in Figs. 5 and 6, as viewed from the arrow.
  • the entire apparatus can be compacted, the area occupied by the floor of the washing and drying apparatus can be significantly reduced, and the centrifugal force can be reduced. Drainage dehydration is performed at high speed to perform dewatering dehydration drying. Also, after dewatering, the drying time can be reduced because hot air is blown to dry.
  • a rotating drum is installed in the washing tank, and a basket of any shape and size, which contains a plurality of parts storage containers etc. in the rotating drum, is divided into one or more parts. It should be possible to wash and dry parts storage containers of such shapes and sizes. u It consists of at least two stages of cleaning, which is a secondary cleaning (rinse cleaning) as a final cleaning after the primary cleaning. Also, pure water or aqueous detergent solution or Al-Lion water is used as the cleaning liquid for the primary cleaning. The use of water and ultrapure water as secondary cleaning increases the cleaning efficiency and reduces the consumption of pure water.
  • the washing liquid is stored in the lower part of the rotating drum in the washing tank for washing, so that washing water can be saved as primary washing, and washing can be performed by spraying the washing liquid from almost the center of rotation in the rotating drum. Therefore, the washing water can be evenly distributed to the parts storage container and the like.
  • the rotating drum is rotated at a low speed when washing the parts storage container, etc., and then, when draining and dewatering, the rotating speed of the rotating drum is changed at least in two stages of high-speed rotation. Washing, draining and dewatering can be performed immediately.
  • a rotating position detector is provided on the rotating drum, and when the rotating drum is stopped after washing and drying, the rotating drum is always stopped at a fixed rotation stop position.
  • a fin or a brush is provided on the outer surface of the rotating drum, and the washing sludge attached to the inner wall of the washing tank is removed by rotating the rotating drum, so that the inner wall of the washing tank can be automatically cleaned.
  • the hot air supplied to the drying unit is supplied through a HEPA filter or a line filter, so that clean drying can be performed.
  • Centrifugal dewatering and drying can reduce the occupied area on the floor even in the case of spray cleaning of cleaning liquid or immersion cleaning equipment using a cleaning tank with ultrasonic waves or warm water. Drying can be performed, increasing the washing and drying capacity.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

L'invention concerne un dispositif de nettoyage et de séchage servant à nettoyer et sécher dans un bref délai une cassette destinée à recevoir une plaquette de semi-conducteur ou un conteneur en résine destiné à recevoir des pièces électroniques et des pièces d'usinage de précision lorsqu'elles sont transportées et stockées. Le dispositif est compact et possède une zone d'installation sensiblement réduite par rapport aux dispositifs classiques. Un tambour rotatif (1) est installé dans une cuve de nettoyage et une ou plusieurs nacelles détachables (2) qui reçoivent des conteneurs de pièces (7), etc. sont installées dans le tambour rotatif (1). Le nettoyage se produit lorsque le tambour rotatif (1) tourne. Après quoi, pour vider l'eau et réaliser le séchage, on fait tourner le tambour rotatif (1) à une vitesse élevée, puis on procède à un séchage à air chaud.
PCT/JP2003/007314 2002-06-11 2003-06-10 Dispositif de nettoyage et de séchage WO2003105208A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2002206251 2002-06-11
JP2002-206251 2002-06-11
JP2002-307682 2002-09-13
JP2002307682A JP2004066212A (ja) 2002-06-11 2002-09-13 洗浄乾燥装置

Publications (1)

Publication Number Publication Date
WO2003105208A1 true WO2003105208A1 (fr) 2003-12-18

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ID=29738487

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2003/007314 WO2003105208A1 (fr) 2002-06-11 2003-06-10 Dispositif de nettoyage et de séchage

Country Status (2)

Country Link
JP (1) JP2004066212A (fr)
WO (1) WO2003105208A1 (fr)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7967150B2 (en) 2005-07-25 2011-06-28 Echigoseika Co., Ltd Centrifugation dewatering apparatus
CN102274837A (zh) * 2011-08-09 2011-12-14 铜陵市晶威特电子有限责任公司 片状小零件清洗装置
US9097460B2 (en) 2013-04-30 2015-08-04 Semi-Staal A/S Container drying device
CN106140721A (zh) * 2016-08-01 2016-11-23 江苏胜达科技有限公司 翻转式拉丝模具清洗装置
CN108941121A (zh) * 2018-06-25 2018-12-07 郑州郑先医药科技有限公司 一种化工产品技术研发用可进行清洗的器皿存放装置
CN110197804A (zh) * 2019-07-02 2019-09-03 中建材衢州金格兰石英有限公司 一种晶圆干燥装置
CN111632930A (zh) * 2020-06-11 2020-09-08 重庆康铖智汇机械制造有限公司 一种机械零件清洗烘干装置
CN111632938A (zh) * 2020-06-01 2020-09-08 田魏华 一种五件加工用零件清洗装置
CN113245275A (zh) * 2021-05-12 2021-08-13 四川雅吉芯电子科技有限公司 一种外延片清洗装置
CN118463540A (zh) * 2024-07-10 2024-08-09 华林科纳(江苏)半导体设备有限公司 一种半导体生产用自动湿法清洗装置

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JP5389478B2 (ja) * 2009-03-06 2014-01-15 オリンパス株式会社 洗浄乾燥方法及び洗浄乾燥装置
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JPH06159940A (ja) * 1992-11-20 1994-06-07 Olympus Optical Co Ltd 乾燥機
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JP2000317411A (ja) * 1999-05-12 2000-11-21 Dan Sangyo Kk 洗浄乾燥装置及び洗浄乾燥方法
JP2001217218A (ja) * 2000-01-31 2001-08-10 Toho Kasei Kk ウェハ処理装置及び方法

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Publication number Priority date Publication date Assignee Title
JPS6079727A (ja) * 1983-10-07 1985-05-07 Hitachi Ltd 洗浄乾燥装置
WO1993026035A1 (fr) * 1992-06-15 1993-12-23 Semitool, Inc. Appareil de nettoyage par centrifugation de supports de tranches
JPH06159940A (ja) * 1992-11-20 1994-06-07 Olympus Optical Co Ltd 乾燥機
EP0949661A2 (fr) * 1998-03-31 1999-10-13 Nec Corporation Station de nettoyage/séchage et ligne de production pour dispositifs semiconducteurs
JP2000317411A (ja) * 1999-05-12 2000-11-21 Dan Sangyo Kk 洗浄乾燥装置及び洗浄乾燥方法
JP2001217218A (ja) * 2000-01-31 2001-08-10 Toho Kasei Kk ウェハ処理装置及び方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7967150B2 (en) 2005-07-25 2011-06-28 Echigoseika Co., Ltd Centrifugation dewatering apparatus
CN102274837A (zh) * 2011-08-09 2011-12-14 铜陵市晶威特电子有限责任公司 片状小零件清洗装置
US9097460B2 (en) 2013-04-30 2015-08-04 Semi-Staal A/S Container drying device
CN106140721A (zh) * 2016-08-01 2016-11-23 江苏胜达科技有限公司 翻转式拉丝模具清洗装置
CN108941121A (zh) * 2018-06-25 2018-12-07 郑州郑先医药科技有限公司 一种化工产品技术研发用可进行清洗的器皿存放装置
CN110197804A (zh) * 2019-07-02 2019-09-03 中建材衢州金格兰石英有限公司 一种晶圆干燥装置
CN111632938A (zh) * 2020-06-01 2020-09-08 田魏华 一种五件加工用零件清洗装置
CN111632930A (zh) * 2020-06-11 2020-09-08 重庆康铖智汇机械制造有限公司 一种机械零件清洗烘干装置
CN113245275A (zh) * 2021-05-12 2021-08-13 四川雅吉芯电子科技有限公司 一种外延片清洗装置
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