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WO2003038479A3 - Structures and methods for reducing aberration in optical systems - Google Patents

Structures and methods for reducing aberration in optical systems Download PDF

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Publication number
WO2003038479A3
WO2003038479A3 PCT/US2002/034828 US0234828W WO03038479A3 WO 2003038479 A3 WO2003038479 A3 WO 2003038479A3 US 0234828 W US0234828 W US 0234828W WO 03038479 A3 WO03038479 A3 WO 03038479A3
Authority
WO
WIPO (PCT)
Prior art keywords
structures
methods
retardance
optical systems
optical
Prior art date
Application number
PCT/US2002/034828
Other languages
French (fr)
Other versions
WO2003038479A2 (en
Inventor
James Mcguire Jr
Original Assignee
Optical Res Associates
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/178,935 external-priority patent/US6844972B2/en
Priority claimed from US10/178,601 external-priority patent/US7453641B2/en
Priority claimed from US10/178,937 external-priority patent/US6995908B2/en
Priority claimed from US10/178,621 external-priority patent/US6970232B2/en
Application filed by Optical Res Associates filed Critical Optical Res Associates
Priority to EP02795578A priority Critical patent/EP1451619A4/en
Priority to AU2002360329A priority patent/AU2002360329A1/en
Priority to JP2003540693A priority patent/JP2005508018A/en
Publication of WO2003038479A2 publication Critical patent/WO2003038479A2/en
Publication of WO2003038479A3 publication Critical patent/WO2003038479A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Polarising Elements (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

An optical system includes multiple cubic crystalline optical element (162) and one or more polarization rotator (180) in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to reduce the effects of intrinsic birefringence and produce a system with reduced retardance. The optical system may be a refractive or catadioptric system having a high numerical aperture and using light with a wavelength at or below 248 nanometers. The net retardance of the system is less than the sum of the retardance contributions of the respective optical elements.
PCT/US2002/034828 2001-10-30 2002-10-30 Structures and methods for reducing aberration in optical systems WO2003038479A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP02795578A EP1451619A4 (en) 2001-10-30 2002-10-30 Structures and methods for reducing aberration in optical systems
AU2002360329A AU2002360329A1 (en) 2001-10-30 2002-10-30 Structures and methods for reducing aberration in optical systems
JP2003540693A JP2005508018A (en) 2001-10-30 2002-10-30 Structure and method for reducing aberrations in optical systems

Applications Claiming Priority (18)

Application Number Priority Date Filing Date Title
US33509301P 2001-10-30 2001-10-30
US60/335,093 2001-10-30
US33218301P 2001-11-21 2001-11-21
US60/332,183 2001-11-21
US36380802P 2002-03-12 2002-03-12
US60/363,808 2002-03-12
US36791102P 2002-03-26 2002-03-26
US60/367,911 2002-03-26
US38542702P 2002-05-31 2002-05-31
US60/385,427 2002-05-31
US10/178,935 US6844972B2 (en) 2001-10-30 2002-06-20 Reducing aberration in optical systems comprising cubic crystalline optical elements
US10/178,937 2002-06-20
US10/178,601 2002-06-20
US10/178,621 2002-06-20
US10/178,935 2002-06-20
US10/178,601 US7453641B2 (en) 2001-10-30 2002-06-20 Structures and methods for reducing aberration in optical systems
US10/178,937 US6995908B2 (en) 2001-10-30 2002-06-20 Methods for reducing aberration in optical systems
US10/178,621 US6970232B2 (en) 2001-10-30 2002-06-20 Structures and methods for reducing aberration in integrated circuit fabrication systems

Publications (2)

Publication Number Publication Date
WO2003038479A2 WO2003038479A2 (en) 2003-05-08
WO2003038479A3 true WO2003038479A3 (en) 2004-01-29

Family

ID=27578632

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/034828 WO2003038479A2 (en) 2001-10-30 2002-10-30 Structures and methods for reducing aberration in optical systems

Country Status (4)

Country Link
EP (1) EP1451619A4 (en)
JP (1) JP2005508018A (en)
AU (1) AU2002360329A1 (en)
WO (1) WO2003038479A2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7145720B2 (en) 2001-05-15 2006-12-05 Carl Zeiss Smt Ag Objective with fluoride crystal lenses
US7239447B2 (en) 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10123725A1 (en) 2001-05-15 2002-11-21 Zeiss Carl Objective for microlithographic projection, includes lens element with axis perpendicular to specified fluoride crystal plane
JP3639807B2 (en) 2001-06-27 2005-04-20 キヤノン株式会社 Optical element and manufacturing method
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
DE10328938A1 (en) * 2003-06-27 2005-01-20 Carl Zeiss Smt Ag Correction device for compensation of disturbances of the polarization distribution and projection objective for microlithography
US8605257B2 (en) * 2004-06-04 2013-12-10 Carl Zeiss Smt Gmbh Projection system with compensation of intensity variations and compensation element therefor
DE102005030839A1 (en) * 2005-07-01 2007-01-11 Carl Zeiss Smt Ag Projection exposure system with a plurality of projection lenses
DE102007055063A1 (en) * 2007-11-16 2009-05-28 Carl Zeiss Smt Ag Illumination device of a microlithographic projection exposure apparatus
DE102007055567A1 (en) 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optical system

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3758201A (en) * 1971-07-15 1973-09-11 American Optical Corp Optical system for improved eye refraction
US4239329A (en) * 1978-08-04 1980-12-16 Nippon Telegraph And Telephone Public Corporation Optical nonreciprocal device
US4534649A (en) * 1981-10-30 1985-08-13 Downs Michael J Surface profile interferometer
US4576479A (en) * 1982-05-17 1986-03-18 Downs Michael J Apparatus and method for investigation of a surface
US5033830A (en) * 1989-10-04 1991-07-23 At&T Bell Laboratories Polarization independent optical isolator
US5537260A (en) * 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
US6252712B1 (en) * 1998-02-20 2001-06-26 Carl-Zeiss-Stiftung Optical system with polarization compensator

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3052152A (en) * 1959-03-27 1962-09-04 American Optical Corp Optical compensating system
US4918395A (en) * 1988-11-21 1990-04-17 Spectra-Physics Multipass laser amplifier with at least one expanded pass
JP3083957B2 (en) * 1994-06-16 2000-09-04 株式会社ニコン Fluorite for optical lithography
JP4014716B2 (en) * 1997-06-24 2007-11-28 オリンパス株式会社 Optical system having polarization compensation optical system
JP3239881B2 (en) * 1998-11-16 2001-12-17 キヤノン株式会社 Optical system and projection device using the same
JP2000164489A (en) * 1998-11-26 2000-06-16 Nikon Corp Scanning projection aligner
JP2001210497A (en) * 2000-01-26 2001-08-03 Mitsubishi Electric Corp Accelerator
JP2001228401A (en) * 2000-02-16 2001-08-24 Canon Inc Projection optical system, projection aligner by this projection optical system and method for manufacturing device
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3758201A (en) * 1971-07-15 1973-09-11 American Optical Corp Optical system for improved eye refraction
US4239329A (en) * 1978-08-04 1980-12-16 Nippon Telegraph And Telephone Public Corporation Optical nonreciprocal device
US4534649A (en) * 1981-10-30 1985-08-13 Downs Michael J Surface profile interferometer
US4576479A (en) * 1982-05-17 1986-03-18 Downs Michael J Apparatus and method for investigation of a surface
US5033830A (en) * 1989-10-04 1991-07-23 At&T Bell Laboratories Polarization independent optical isolator
US5537260A (en) * 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
US6252712B1 (en) * 1998-02-20 2001-06-26 Carl-Zeiss-Stiftung Optical system with polarization compensator

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1451619A4 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7145720B2 (en) 2001-05-15 2006-12-05 Carl Zeiss Smt Ag Objective with fluoride crystal lenses
US7239447B2 (en) 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
US7382536B2 (en) 2001-05-15 2008-06-03 Carl Zeiss Smt Ag Objective with fluoride crystal lenses

Also Published As

Publication number Publication date
AU2002360329A1 (en) 2003-05-12
EP1451619A2 (en) 2004-09-01
JP2005508018A (en) 2005-03-24
EP1451619A4 (en) 2007-10-03
WO2003038479A2 (en) 2003-05-08

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