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WO2003036361A1 - Projection optical system and exposure apparatus having the projection optical system - Google Patents

Projection optical system and exposure apparatus having the projection optical system Download PDF

Info

Publication number
WO2003036361A1
WO2003036361A1 PCT/JP2002/010454 JP0210454W WO03036361A1 WO 2003036361 A1 WO2003036361 A1 WO 2003036361A1 JP 0210454 W JP0210454 W JP 0210454W WO 03036361 A1 WO03036361 A1 WO 03036361A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical system
projection optical
transparent
crystal
transparent members
Prior art date
Application number
PCT/JP2002/010454
Other languages
French (fr)
Japanese (ja)
Inventor
Yasuhiro Omura
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2003538800A priority Critical patent/JPWO2003036361A1/en
Publication of WO2003036361A1 publication Critical patent/WO2003036361A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A projection optical system having good optical performance without being substantially affected by birefringence even though an optical material having an intrinsic birefringence is used. The projection optical system forms the image on a first surface (R) on a second surface (W). Out of the transparent members constituting the projection optical system, 90% or more of the transparent members are made of crystals of cubic system. Out of all the transparent members, 70% or more of them satisfy the condition Pn/En<0.7 where Pn is the diameter of the light beam coming from a point on the first surface and falling on each surface of each crystal transparent member and En is the effective diameter of each crystal transparent member, and the 70% or more of the transparent members are so arranged that the optical axis of each transparent member substantially agrees with the crystal axis [100].
PCT/JP2002/010454 2001-10-19 2002-10-08 Projection optical system and exposure apparatus having the projection optical system WO2003036361A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003538800A JPWO2003036361A1 (en) 2001-10-19 2002-10-08 Projection optical system and exposure apparatus provided with the projection optical system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001-321463 2001-10-19
JP2001321463 2001-10-19

Publications (1)

Publication Number Publication Date
WO2003036361A1 true WO2003036361A1 (en) 2003-05-01

Family

ID=19138675

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/010454 WO2003036361A1 (en) 2001-10-19 2002-10-08 Projection optical system and exposure apparatus having the projection optical system

Country Status (3)

Country Link
JP (1) JPWO2003036361A1 (en)
TW (1) TW559885B (en)
WO (1) WO2003036361A1 (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004025349A1 (en) * 2002-09-09 2004-03-25 Carl Zeiss Smt Ag Catadioptric projection lens and method for compensating the intrinsic birefringence in a lens of this type
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US7006304B2 (en) 2001-05-22 2006-02-28 Carl Zeiss Smt Ag Catadioptric reduction lens
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US7239450B2 (en) 2004-11-22 2007-07-03 Carl Zeiss Smt Ag Method of determining lens materials for a projection exposure apparatus
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
USRE40743E1 (en) 2000-02-05 2009-06-16 Carl Zeiss Smt Ag Projection exposure system having a reflective reticle
US7697198B2 (en) 2004-10-15 2010-04-13 Carl Zeiss Smt Ag Catadioptric projection objective
EP2189848A2 (en) 2004-07-14 2010-05-26 Carl Zeiss SMT AG Catadioptric projection objective
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7848016B2 (en) 2006-05-05 2010-12-07 Carl Zeiss Smt Ag High-NA projection objective
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
JP2012185503A (en) * 2009-08-13 2012-09-27 Carl Zeiss Smt Gmbh Catadioptric projection objective system
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US9772478B2 (en) 2004-01-14 2017-09-26 Carl Zeiss Smt Gmbh Catadioptric projection objective with parallel, offset optical axes

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772393A (en) * 1993-09-06 1995-03-17 Nikon Corp Reflection, reduction and projection optical system
JPH1121197A (en) * 1997-07-02 1999-01-26 Canon Inc Seed crystal for crystal growth and fluoride crystal
EP0942297A2 (en) * 1998-03-12 1999-09-15 Nikon Corporation Optical element made from fluoride single crystal and method of manufacturing the optical element
JP2000128696A (en) * 1998-10-16 2000-05-09 Nikon Corp Fluoride single crystal-made raw material for making optical element and production of the same raw material
EP1063684A1 (en) * 1999-01-06 2000-12-27 Nikon Corporation Projection optical system, method for producing the same, and projection exposure apparatus using the same
EP1114802A1 (en) * 1999-04-21 2001-07-11 Nikon Corporation Quartz glass member, production method therefor, and projection aligner using it
EP1115019A2 (en) * 1999-12-29 2001-07-11 Carl Zeiss Projection exposure lens with aspheric elements

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772393A (en) * 1993-09-06 1995-03-17 Nikon Corp Reflection, reduction and projection optical system
JPH1121197A (en) * 1997-07-02 1999-01-26 Canon Inc Seed crystal for crystal growth and fluoride crystal
EP0942297A2 (en) * 1998-03-12 1999-09-15 Nikon Corporation Optical element made from fluoride single crystal and method of manufacturing the optical element
JP2000128696A (en) * 1998-10-16 2000-05-09 Nikon Corp Fluoride single crystal-made raw material for making optical element and production of the same raw material
EP1063684A1 (en) * 1999-01-06 2000-12-27 Nikon Corporation Projection optical system, method for producing the same, and projection exposure apparatus using the same
EP1114802A1 (en) * 1999-04-21 2001-07-11 Nikon Corporation Quartz glass member, production method therefor, and projection aligner using it
EP1115019A2 (en) * 1999-12-29 2001-07-11 Carl Zeiss Projection exposure lens with aspheric elements

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US7426082B2 (en) 1999-12-29 2008-09-16 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
USRE40743E1 (en) 2000-02-05 2009-06-16 Carl Zeiss Smt Ag Projection exposure system having a reflective reticle
US7006304B2 (en) 2001-05-22 2006-02-28 Carl Zeiss Smt Ag Catadioptric reduction lens
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US7382540B2 (en) 2002-03-01 2008-06-03 Carl Zeiss Smt Ag Refractive projection objective
WO2004025349A1 (en) * 2002-09-09 2004-03-25 Carl Zeiss Smt Ag Catadioptric projection lens and method for compensating the intrinsic birefringence in a lens of this type
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US9772478B2 (en) 2004-01-14 2017-09-26 Carl Zeiss Smt Gmbh Catadioptric projection objective with parallel, offset optical axes
US9726979B2 (en) 2004-05-17 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9134618B2 (en) 2004-05-17 2015-09-15 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
EP2189848A2 (en) 2004-07-14 2010-05-26 Carl Zeiss SMT AG Catadioptric projection objective
US7697198B2 (en) 2004-10-15 2010-04-13 Carl Zeiss Smt Ag Catadioptric projection objective
US7239450B2 (en) 2004-11-22 2007-07-03 Carl Zeiss Smt Ag Method of determining lens materials for a projection exposure apparatus
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7965453B2 (en) 2006-03-28 2011-06-21 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus including the same
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US7848016B2 (en) 2006-05-05 2010-12-07 Carl Zeiss Smt Ag High-NA projection objective
US8873137B2 (en) 2009-08-13 2014-10-28 Carl Zeiss Smt Gmbh Catadioptric projection objective
JP2012185503A (en) * 2009-08-13 2012-09-27 Carl Zeiss Smt Gmbh Catadioptric projection objective system
US9279969B2 (en) 2009-08-13 2016-03-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US9726870B2 (en) 2009-08-13 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US10042146B2 (en) 2009-08-13 2018-08-07 Carl Zeiss Smt Gmbh Catadioptric projection objective

Also Published As

Publication number Publication date
TW559885B (en) 2003-11-01
JPWO2003036361A1 (en) 2005-02-17

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