WO2003034490A3 - Semiconductor structure with one or more through-holes - Google Patents
Semiconductor structure with one or more through-holes Download PDFInfo
- Publication number
- WO2003034490A3 WO2003034490A3 PCT/EP2002/011605 EP0211605W WO03034490A3 WO 2003034490 A3 WO2003034490 A3 WO 2003034490A3 EP 0211605 W EP0211605 W EP 0211605W WO 03034490 A3 WO03034490 A3 WO 03034490A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- holes
- semiconductor structure
- seal
- feed
- disclosed
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000001465 metallisation Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4219—Mechanical fixtures for holding or positioning the elements relative to each other in the couplings; Alignment methods for the elements, e.g. measuring or observing methods especially used therefor
- G02B6/4236—Fixing or mounting methods of the aligned elements
- G02B6/4245—Mounting of the opto-electronic elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4274—Electrical aspects
- G02B6/4279—Radio frequency signal propagation aspects of the electrical connection, high frequency adaptations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76898—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics formed through a semiconductor substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/50—Encapsulations or containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Element Separation (AREA)
- Optical Integrated Circuits (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Weting (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT02787490T ATE464656T1 (en) | 2001-10-17 | 2002-10-15 | SEMICONDUCTOR STRUCTURE WITH ONE OR MORE THROUGH HOLES |
JP2003537117A JP4546087B2 (en) | 2001-10-17 | 2002-10-15 | Semiconductor structure with one or more through holes, method for providing the semiconductor structure, and optoelectronic assembly structure including the semiconductor structure |
DE60236007T DE60236007D1 (en) | 2001-10-17 | 2002-10-15 | SEMICONDUCTOR STRUCTURE WITH ONE OR MORE CONTINUOUS HOLES |
AU2002351771A AU2002351771A1 (en) | 2001-10-17 | 2002-10-15 | Semiconductor structure with one or more through-holes |
EP02787490A EP1436837B1 (en) | 2001-10-17 | 2002-10-15 | Semiconductor structure with one or more through-holes |
HK05107072A HK1074913A1 (en) | 2001-10-17 | 2005-08-16 | Semiconductor structure with one or more through-holes |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32969901P | 2001-10-17 | 2001-10-17 | |
US60/329,699 | 2001-10-17 | ||
US10/264,440 | 2002-10-04 | ||
US10/264,440 US6818464B2 (en) | 2001-10-17 | 2002-10-04 | Double-sided etching technique for providing a semiconductor structure with through-holes, and a feed-through metalization process for sealing the through-holes |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003034490A2 WO2003034490A2 (en) | 2003-04-24 |
WO2003034490A3 true WO2003034490A3 (en) | 2004-04-01 |
Family
ID=26950546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2002/011605 WO2003034490A2 (en) | 2001-10-17 | 2002-10-15 | Semiconductor structure with one or more through-holes |
Country Status (9)
Country | Link |
---|---|
US (3) | US6818464B2 (en) |
EP (1) | EP1436837B1 (en) |
JP (1) | JP4546087B2 (en) |
CN (1) | CN100377333C (en) |
AT (1) | ATE464656T1 (en) |
AU (1) | AU2002351771A1 (en) |
DE (1) | DE60236007D1 (en) |
HK (1) | HK1074913A1 (en) |
WO (1) | WO2003034490A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8993450B2 (en) | 2003-09-15 | 2015-03-31 | Nuvotronics, Llc | Device package and methods for the fabrication and testing thereof |
Families Citing this family (116)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7345316B2 (en) * | 2000-10-25 | 2008-03-18 | Shipley Company, L.L.C. | Wafer level packaging for optoelectronic devices |
US6932519B2 (en) | 2000-11-16 | 2005-08-23 | Shipley Company, L.L.C. | Optical device package |
US6827503B2 (en) * | 2000-12-01 | 2004-12-07 | Shipley Company, L.L.C. | Optical device package having a configured frame |
US6883977B2 (en) * | 2000-12-14 | 2005-04-26 | Shipley Company, L.L.C. | Optical device package for flip-chip mounting |
US7078671B1 (en) * | 2001-08-06 | 2006-07-18 | Shipley Company, L.L.C. | Silicon optical microbench devices and wafer-level testing thereof |
US6818464B2 (en) * | 2001-10-17 | 2004-11-16 | Hymite A/S | Double-sided etching technique for providing a semiconductor structure with through-holes, and a feed-through metalization process for sealing the through-holes |
US7343535B2 (en) * | 2002-02-06 | 2008-03-11 | Avago Technologies General Ip Dte Ltd | Embedded testing capability for integrated serializer/deserializers |
US6969204B2 (en) * | 2002-11-26 | 2005-11-29 | Hymite A/S | Optical package with an integrated lens and optical assemblies incorporating the package |
JP4220229B2 (en) * | 2002-12-16 | 2009-02-04 | 大日本印刷株式会社 | Mask blank for charged particle beam exposure and method for manufacturing mask for charged particle beam exposure |
JP2004273438A (en) * | 2003-02-17 | 2004-09-30 | Pioneer Electronic Corp | Etching mask |
WO2004087541A2 (en) * | 2003-04-04 | 2004-10-14 | Mobile Concepts, Inc. | Pallet and conveyor system for loading onto transport |
US7432788B2 (en) | 2003-06-27 | 2008-10-07 | Memscap, Inc. | Microelectromechanical magnetic switches having rotors that rotate into a recess in a substrate |
US20050063431A1 (en) * | 2003-09-19 | 2005-03-24 | Gallup Kendra J. | Integrated optics and electronics |
US6953990B2 (en) * | 2003-09-19 | 2005-10-11 | Agilent Technologies, Inc. | Wafer-level packaging of optoelectronic devices |
US6982437B2 (en) * | 2003-09-19 | 2006-01-03 | Agilent Technologies, Inc. | Surface emitting laser package having integrated optical element and alignment post |
US7520679B2 (en) * | 2003-09-19 | 2009-04-21 | Avago Technologies Fiber Ip (Singapore) Pte. Ltd. | Optical device package with turning mirror and alignment post |
US20050063648A1 (en) * | 2003-09-19 | 2005-03-24 | Wilson Robert Edward | Alignment post for optical subassemblies made with cylindrical rods, tubes, spheres, or similar features |
US6930367B2 (en) * | 2003-10-31 | 2005-08-16 | Robert Bosch Gmbh | Anti-stiction technique for thin film and wafer-bonded encapsulated microelectromechanical systems |
US8084866B2 (en) | 2003-12-10 | 2011-12-27 | Micron Technology, Inc. | Microelectronic devices and methods for filling vias in microelectronic devices |
US7091124B2 (en) | 2003-11-13 | 2006-08-15 | Micron Technology, Inc. | Methods for forming vias in microelectronic devices, and methods for packaging microelectronic devices |
US7223629B2 (en) * | 2003-12-11 | 2007-05-29 | Intel Corporation | Method and apparatus for manufacturing a transistor-outline (TO) can having a ceramic header |
DE102004006698A1 (en) | 2004-02-11 | 2005-09-01 | Robert Bosch Gmbh | Micromechanical sensor |
US20050213995A1 (en) * | 2004-03-26 | 2005-09-29 | Myunghee Lee | Low power and low jitter optical receiver for fiber optic communication link |
US7681306B2 (en) * | 2004-04-28 | 2010-03-23 | Hymite A/S | Method of forming an assembly to house one or more micro components |
US20050247894A1 (en) | 2004-05-05 | 2005-11-10 | Watkins Charles M | Systems and methods for forming apertures in microfeature workpieces |
US20050269688A1 (en) * | 2004-06-03 | 2005-12-08 | Lior Shiv | Microelectromechanical systems (MEMS) devices integrated in a hermetically sealed package |
US7045827B2 (en) * | 2004-06-24 | 2006-05-16 | Gallup Kendra J | Lids for wafer-scale optoelectronic packages |
US7232754B2 (en) | 2004-06-29 | 2007-06-19 | Micron Technology, Inc. | Microelectronic devices and methods for forming interconnects in microelectronic devices |
KR100594716B1 (en) * | 2004-07-27 | 2006-06-30 | 삼성전자주식회사 | Cap wafer having a cavity, a semiconductor chip using the same, and a method of manufacturing the same |
TWI255503B (en) * | 2004-07-30 | 2006-05-21 | Touch Micro System Tech | Method of double-sided etching |
CN100454144C (en) * | 2004-08-05 | 2009-01-21 | 探微科技股份有限公司 | Method for double-sided etching of wafers |
US7425499B2 (en) | 2004-08-24 | 2008-09-16 | Micron Technology, Inc. | Methods for forming interconnects in vias and microelectronic workpieces including such interconnects |
US7083425B2 (en) | 2004-08-27 | 2006-08-01 | Micron Technology, Inc. | Slanted vias for electrical circuits on circuit boards and other substrates |
US7300857B2 (en) | 2004-09-02 | 2007-11-27 | Micron Technology, Inc. | Through-wafer interconnects for photoimager and memory wafers |
US7683393B2 (en) * | 2004-12-07 | 2010-03-23 | Ngk Spark Plug Co., Ltd. | Wiring substrate for mounting light emitting element |
EP1839172A2 (en) * | 2004-12-08 | 2007-10-03 | B-Obvious Ltd. | Bidirectional data transfer optimization and content control for networks |
US7271482B2 (en) | 2004-12-30 | 2007-09-18 | Micron Technology, Inc. | Methods for forming interconnects in microelectronic workpieces and microelectronic workpieces formed using such methods |
US7553695B2 (en) * | 2005-03-17 | 2009-06-30 | Hymite A/S | Method of fabricating a package for a micro component |
US7495462B2 (en) * | 2005-03-24 | 2009-02-24 | Memsic, Inc. | Method of wafer-level packaging using low-aspect ratio through-wafer holes |
US7262622B2 (en) * | 2005-03-24 | 2007-08-28 | Memsic, Inc. | Wafer-level package for integrated circuits |
US7449355B2 (en) * | 2005-04-27 | 2008-11-11 | Robert Bosch Gmbh | Anti-stiction technique for electromechanical systems and electromechanical device employing same |
US7795134B2 (en) | 2005-06-28 | 2010-09-14 | Micron Technology, Inc. | Conductive interconnect structures and formation methods using supercritical fluids |
US20070004079A1 (en) * | 2005-06-30 | 2007-01-04 | Geefay Frank S | Method for making contact through via contact to an offset contactor inside a cap for the wafer level packaging of FBAR chips |
US7161283B1 (en) * | 2005-06-30 | 2007-01-09 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Method for placing metal contacts underneath FBAR resonators |
US7569926B2 (en) * | 2005-08-26 | 2009-08-04 | Innovative Micro Technology | Wafer level hermetic bond using metal alloy with raised feature |
US20070048887A1 (en) * | 2005-08-26 | 2007-03-01 | Innovative Micro Technology | Wafer level hermetic bond using metal alloy |
US8736081B2 (en) | 2005-08-26 | 2014-05-27 | Innovative Micro Technology | Wafer level hermetic bond using metal alloy with keeper layer |
US7960208B2 (en) * | 2005-08-26 | 2011-06-14 | Innovative Micro Technology | Wafer level hermetic bond using metal alloy with raised feature |
US7528691B2 (en) * | 2005-08-26 | 2009-05-05 | Innovative Micro Technology | Dual substrate electrostatic MEMS switch with hermetic seal and method of manufacture |
US7582969B2 (en) * | 2005-08-26 | 2009-09-01 | Innovative Micro Technology | Hermetic interconnect structure and method of manufacture |
US7233048B2 (en) * | 2005-08-26 | 2007-06-19 | Innovative Micro Technology | MEMS device trench plating process and apparatus for through hole vias |
US7863187B2 (en) | 2005-09-01 | 2011-01-04 | Micron Technology, Inc. | Microfeature workpieces and methods for forming interconnects in microfeature workpieces |
US7262134B2 (en) | 2005-09-01 | 2007-08-28 | Micron Technology, Inc. | Microfeature workpieces and methods for forming interconnects in microfeature workpieces |
US7622377B2 (en) | 2005-09-01 | 2009-11-24 | Micron Technology, Inc. | Microfeature workpiece substrates having through-substrate vias, and associated methods of formation |
US8786165B2 (en) * | 2005-09-16 | 2014-07-22 | Tsmc Solid State Lighting Ltd. | QFN/SON compatible package with SMT land pads |
DE602005021796D1 (en) * | 2005-11-16 | 2010-07-22 | St Microelectronics Srl | Manufacturing process for deep through vias in a semiconductor device |
KR101177885B1 (en) * | 2006-01-16 | 2012-08-28 | 삼성전자주식회사 | Wafer level packaging cap and fablication method thereof |
US8044412B2 (en) | 2006-01-20 | 2011-10-25 | Taiwan Semiconductor Manufacturing Company, Ltd | Package for a light emitting element |
US20070170528A1 (en) | 2006-01-20 | 2007-07-26 | Aaron Partridge | Wafer encapsulated microelectromechanical structure and method of manufacturing same |
US7528422B2 (en) * | 2006-01-20 | 2009-05-05 | Hymite A/S | Package for a light emitting element with integrated electrostatic discharge protection |
US7749899B2 (en) | 2006-06-01 | 2010-07-06 | Micron Technology, Inc. | Microelectronic workpieces and methods and systems for forming interconnects in microelectronic workpieces |
JP2008010659A (en) * | 2006-06-29 | 2008-01-17 | Disco Abrasive Syst Ltd | Via hole processing method |
US7629249B2 (en) | 2006-08-28 | 2009-12-08 | Micron Technology, Inc. | Microfeature workpieces having conductive interconnect structures formed by chemically reactive processes, and associated systems and methods |
US7902643B2 (en) | 2006-08-31 | 2011-03-08 | Micron Technology, Inc. | Microfeature workpieces having interconnects and conductive backplanes, and associated systems and methods |
US7786014B2 (en) * | 2006-09-22 | 2010-08-31 | Ipdia | Electronic device and method for making the same |
US7531445B2 (en) | 2006-09-26 | 2009-05-12 | Hymite A/S | Formation of through-wafer electrical interconnections and other structures using a thin dielectric membrane |
KR100831405B1 (en) * | 2006-10-02 | 2008-05-21 | (주) 파이오닉스 | Wafer Bonding Packaging Method |
JP4919984B2 (en) * | 2007-02-25 | 2012-04-18 | サムスン エレクトロニクス カンパニー リミテッド | Electronic device package and method for forming the same |
EP2186128B1 (en) * | 2007-08-10 | 2013-11-20 | Agency For Science, Technology And Research (A*star) | Nano-interconnects for atomic and molecular scale circuits |
SG150410A1 (en) | 2007-08-31 | 2009-03-30 | Micron Technology Inc | Partitioned through-layer via and associated systems and methods |
US7884015B2 (en) | 2007-12-06 | 2011-02-08 | Micron Technology, Inc. | Methods for forming interconnects in microelectronic workpieces and microelectronic workpieces formed using such methods |
US20090181500A1 (en) * | 2008-01-15 | 2009-07-16 | Jochen Kuhmann | Fabrication of Compact Semiconductor Packages |
US20090273002A1 (en) * | 2008-05-05 | 2009-11-05 | Wen-Chih Chiou | LED Package Structure and Fabrication Method |
US7939449B2 (en) * | 2008-06-03 | 2011-05-10 | Micron Technology, Inc. | Methods of forming hybrid conductive vias including small dimension active surface ends and larger dimension back side ends |
US7851818B2 (en) * | 2008-06-27 | 2010-12-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Fabrication of compact opto-electronic component packages |
DE102008033395B3 (en) * | 2008-07-16 | 2010-02-04 | Austriamicrosystems Ag | Method for producing a semiconductor component and semiconductor component |
US20100084752A1 (en) * | 2008-10-08 | 2010-04-08 | Honeywell International Inc. | Systems and methods for implementing a wafer level hermetic interface chip |
JP5246103B2 (en) * | 2008-10-16 | 2013-07-24 | 大日本印刷株式会社 | Method for manufacturing through electrode substrate |
SE534510C2 (en) * | 2008-11-19 | 2011-09-13 | Silex Microsystems Ab | Functional encapsulation |
US8240203B2 (en) * | 2008-12-11 | 2012-08-14 | Honeywell International Inc. | MEMS devices and methods with controlled die bonding areas |
US7842613B1 (en) | 2009-01-07 | 2010-11-30 | Integrated Device Technology, Inc. | Methods of forming microelectronic packaging substrates having through-substrate vias therein |
US20100176507A1 (en) * | 2009-01-14 | 2010-07-15 | Hymite A/S | Semiconductor-based submount with electrically conductive feed-throughs |
US8309973B2 (en) * | 2009-02-12 | 2012-11-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Silicon-based sub-mount for an opto-electronic device |
US8729591B2 (en) | 2009-02-13 | 2014-05-20 | Tsmc Solid State Lighting Ltd. | Opto-electronic device package with a semiconductor-based sub-mount having SMD metal contacts |
US7838878B2 (en) * | 2009-03-24 | 2010-11-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor-based sub-mounts for optoelectronic devices with conductive paths to facilitate testing and binning |
JP5330115B2 (en) * | 2009-06-17 | 2013-10-30 | 浜松ホトニクス株式会社 | Multilayer wiring board |
US20100320595A1 (en) * | 2009-06-22 | 2010-12-23 | Honeywell International Inc. | Hybrid hermetic interface chip |
US20110042803A1 (en) * | 2009-08-24 | 2011-02-24 | Chen-Fu Chu | Method For Fabricating A Through Interconnect On A Semiconductor Substrate |
CN102079503B (en) * | 2009-11-26 | 2012-08-29 | 中芯国际集成电路制造(上海)有限公司 | Etching method of silicon substrate forming MEMS (Micro Electro Mechanical System) device |
KR101276333B1 (en) * | 2009-11-30 | 2013-06-18 | 한국전자통신연구원 | 3d interconnection structure and manufacturing method thereof |
WO2011109442A2 (en) * | 2010-03-02 | 2011-09-09 | Oliver Steven D | Led packaging with integrated optics and methods of manufacturing the same |
CN102403413B (en) * | 2010-09-19 | 2013-09-18 | 常州普美电子科技有限公司 | LED (Light-Emitting Diode) heat dissipation base plate, LED packaging structure, and manufacturing method of LED heat dissipation base plate and LED packaging structure |
DE102010056572B4 (en) | 2010-12-30 | 2018-12-27 | Snaptrack, Inc. | Electronic component and method for producing the electronic component |
DE102010056562B4 (en) * | 2010-12-30 | 2018-10-11 | Snaptrack, Inc. | Electroacoustic component and method for producing the electroacoustic component |
US8654541B2 (en) | 2011-03-24 | 2014-02-18 | Toyota Motor Engineering & Manufacturing North America, Inc. | Three-dimensional power electronics packages |
JP5598420B2 (en) * | 2011-05-24 | 2014-10-01 | 株式会社デンソー | Manufacturing method of electronic device |
FR2976402A1 (en) * | 2011-06-07 | 2012-12-14 | St Microelectronics Sa | Electrical interconnection structure for integrated circuit placed in e.g. ball grid array, utilized in electronic system, has second-type electric connection connecting first-type electric connection to area leveled with reception zone |
US8324082B1 (en) | 2011-09-15 | 2012-12-04 | SemiLEDs Optoelectronics Co., Ltd. | Method for fabricating conductive substrates for electronic and optoelectronic devices |
KR20140012445A (en) * | 2012-07-20 | 2014-02-03 | 삼성전자주식회사 | Nitride based semiconductor device and method for manufacturing the same |
US9162878B2 (en) | 2012-08-30 | 2015-10-20 | Innovative Micro Technology | Wafer level hermetic bond using metal alloy with raised feature and wetting layer |
EP2900319B8 (en) * | 2012-09-28 | 2017-08-30 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Implantable devices |
US20150262902A1 (en) | 2014-03-12 | 2015-09-17 | Invensas Corporation | Integrated circuits protected by substrates with cavities, and methods of manufacture |
US9481572B2 (en) * | 2014-07-17 | 2016-11-01 | Texas Instruments Incorporated | Optical electronic device and method of fabrication |
US10056310B2 (en) * | 2016-09-26 | 2018-08-21 | International Business Machines Corporation | Electrolytic seal |
US10002844B1 (en) | 2016-12-21 | 2018-06-19 | Invensas Bonding Technologies, Inc. | Bonded structures |
JP7030825B2 (en) | 2017-02-09 | 2022-03-07 | インヴェンサス ボンディング テクノロジーズ インコーポレイテッド | Joined structure |
US10508030B2 (en) | 2017-03-21 | 2019-12-17 | Invensas Bonding Technologies, Inc. | Seal for microelectronic assembly |
US10242967B2 (en) * | 2017-05-16 | 2019-03-26 | Raytheon Company | Die encapsulation in oxide bonded wafer stack |
US11105770B2 (en) | 2017-09-14 | 2021-08-31 | International Business Machines Corporation | Nanopore and DNA sensor employing nanopore |
US10319654B1 (en) | 2017-12-01 | 2019-06-11 | Cubic Corporation | Integrated chip scale packages |
US10923408B2 (en) | 2017-12-22 | 2021-02-16 | Invensas Bonding Technologies, Inc. | Cavity packages |
US11380597B2 (en) | 2017-12-22 | 2022-07-05 | Invensas Bonding Technologies, Inc. | Bonded structures |
US10395940B1 (en) | 2018-03-13 | 2019-08-27 | Toyota Motor Engineering & Manufacturing North America, Inc. | Method of etching microelectronic mechanical system features in a silicon wafer |
US11004757B2 (en) | 2018-05-14 | 2021-05-11 | Invensas Bonding Technologies, Inc. | Bonded structures |
US11398415B2 (en) * | 2018-09-19 | 2022-07-26 | Intel Corporation | Stacked through-silicon vias for multi-device packages |
KR20230037857A (en) * | 2021-09-10 | 2023-03-17 | 삼성전기주식회사 | Bulk acoustic resonator package |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0430593A2 (en) * | 1989-11-22 | 1991-06-05 | Xerox Corporation | Method of cutting a silicon wafer by orientation dependent etching |
US6036872A (en) * | 1998-03-31 | 2000-03-14 | Honeywell Inc. | Method for making a wafer-pair having sealed chambers |
EP1061578A1 (en) * | 1998-12-16 | 2000-12-20 | Seiko Epson Corporation | Semiconductor chip, semiconductor device, circuit board and electronic equipment and production methods for them |
WO2001024228A2 (en) * | 1999-09-27 | 2001-04-05 | Input Output, Inc. | Temporary bridge for micro machined structures |
Family Cites Families (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55166941A (en) * | 1979-06-13 | 1980-12-26 | Nec Corp | Semiconductor device |
US4903120A (en) | 1985-11-22 | 1990-02-20 | Texas Instruments Incorporated | Chip carrier with interconnects on lid |
US4775573A (en) * | 1987-04-03 | 1988-10-04 | West-Tronics, Inc. | Multilayer PC board using polymer thick films |
US4897711A (en) | 1988-03-03 | 1990-01-30 | American Telephone And Telegraph Company | Subassembly for optoelectronic devices |
US4904036A (en) | 1988-03-03 | 1990-02-27 | American Telephone And Telegraph Company, At&T Bell Laboratories | Subassemblies for optoelectronic hybrid integrated circuits |
DE3909186A1 (en) * | 1989-03-21 | 1990-09-27 | Endress Hauser Gmbh Co | ELECTRICALLY CONDUCTIVE PROCESS AND METHOD FOR THEIR PRODUCTION |
US5023881A (en) | 1990-06-19 | 1991-06-11 | At&T Bell Laboratories | Photonics module and alignment method |
US5068203A (en) | 1990-09-04 | 1991-11-26 | Delco Electronics Corporation | Method for forming thin silicon membrane or beam |
JP2976642B2 (en) | 1991-11-07 | 1999-11-10 | 日本電気株式会社 | Optical coupling circuit |
CA2128534C (en) | 1992-01-28 | 2003-01-07 | Anthony David Welbourn | Alignment of integrated optical components |
JP3239274B2 (en) * | 1992-02-26 | 2001-12-17 | 富士通株式会社 | Method of manufacturing inkjet head |
US5308442A (en) | 1993-01-25 | 1994-05-03 | Hewlett-Packard Company | Anisotropically etched ink fill slots in silicon |
US5454161A (en) | 1993-04-29 | 1995-10-03 | Fujitsu Limited | Through hole interconnect substrate fabrication process |
US5401913A (en) * | 1993-06-08 | 1995-03-28 | Minnesota Mining And Manufacturing Company | Electrical interconnections between adjacent circuit board layers of a multi-layer circuit board |
JP2692625B2 (en) * | 1994-12-08 | 1997-12-17 | 日本電気株式会社 | Semiconductor substrate manufacturing method |
JP3343875B2 (en) | 1995-06-30 | 2002-11-11 | キヤノン株式会社 | Method of manufacturing inkjet head |
JP3193863B2 (en) * | 1996-01-31 | 2001-07-30 | ホーヤ株式会社 | Transfer mask manufacturing method |
IT1283224B1 (en) | 1996-03-11 | 1998-04-16 | Pirelli Cavi Spa | APPARATUS AND METHOD OF PROTECTION FOR OPTICAL FIBER DEVICES |
JPH09266266A (en) * | 1996-03-28 | 1997-10-07 | Mitsubishi Electric Corp | Semiconductor device, manufacturing method thereof and cap of the semiconductor device |
US5703394A (en) | 1996-06-10 | 1997-12-30 | Motorola | Integrated electro-optical package |
US5891354A (en) | 1996-07-26 | 1999-04-06 | Fujitsu Limited | Methods of etching through wafers and substrates with a composite etch stop layer |
JP3724110B2 (en) * | 1997-04-24 | 2005-12-07 | 三菱電機株式会社 | Manufacturing method of semiconductor device |
JP3039463B2 (en) * | 1997-07-29 | 2000-05-08 | 日本電気株式会社 | Semiconductor device and manufacturing method thereof |
US6300686B1 (en) * | 1997-10-02 | 2001-10-09 | Matsushita Electric Industrial Co., Ltd. | Semiconductor chip bonded to a thermal conductive sheet having a filled through hole for electrical connection |
EP0926723B1 (en) * | 1997-11-26 | 2007-01-17 | STMicroelectronics S.r.l. | Process for forming front-back through contacts in micro-integrated electronic devices |
US6117794A (en) | 1998-01-16 | 2000-09-12 | Lucent Technologies, Inc. | Method for improved metal oxide bonding of optical elements |
US6072815A (en) | 1998-02-27 | 2000-06-06 | Litton Systems, Inc. | Microlaser submount assembly and associates packaging method |
KR100280622B1 (en) | 1998-04-02 | 2001-03-02 | 윤종용 | Contact Forming Method of Semiconductor Device |
US6303986B1 (en) | 1998-07-29 | 2001-10-16 | Silicon Light Machines | Method of and apparatus for sealing an hermetic lid to a semiconductor die |
KR20070086862A (en) | 1998-09-03 | 2007-08-27 | 이비덴 가부시키가이샤 | Multilayer printed wiring board and its manufacturing method |
US6588949B1 (en) | 1998-12-30 | 2003-07-08 | Honeywell Inc. | Method and apparatus for hermetically sealing photonic devices |
US6221769B1 (en) | 1999-03-05 | 2001-04-24 | International Business Machines Corporation | Method for integrated circuit power and electrical connections via through-wafer interconnects |
US6291779B1 (en) | 1999-06-30 | 2001-09-18 | International Business Machines Corporation | Fine pitch circuitization with filled plated through holes |
JP3595817B2 (en) * | 1999-09-20 | 2004-12-02 | 株式会社トッパンNecサーキットソリューションズ | Optical module mounting method and mounting structure |
JP2001127208A (en) * | 1999-10-29 | 2001-05-11 | Matsushita Electric Works Ltd | Semiconductor chip packaging structure and manufacturing method thereof |
US6653572B2 (en) | 2001-02-07 | 2003-11-25 | The Furukawa Electric Co., Ltd. | Multilayer circuit board |
US6577427B1 (en) * | 2001-02-20 | 2003-06-10 | Nayna Networks, Inc. | Process for manufacturing mirror devices using semiconductor technology |
US6818464B2 (en) | 2001-10-17 | 2004-11-16 | Hymite A/S | Double-sided etching technique for providing a semiconductor structure with through-holes, and a feed-through metalization process for sealing the through-holes |
US6660564B2 (en) | 2002-01-25 | 2003-12-09 | Sony Corporation | Wafer-level through-wafer packaging process for MEMS and MEMS package produced thereby |
CN103010139B (en) * | 2011-09-28 | 2015-03-25 | 陈宗贤 | Safety pre-warning device for driving the door to prevent rear car collision |
-
2002
- 2002-10-04 US US10/264,440 patent/US6818464B2/en not_active Expired - Lifetime
- 2002-10-15 AT AT02787490T patent/ATE464656T1/en not_active IP Right Cessation
- 2002-10-15 CN CNB028252926A patent/CN100377333C/en not_active Expired - Lifetime
- 2002-10-15 WO PCT/EP2002/011605 patent/WO2003034490A2/en active Application Filing
- 2002-10-15 DE DE60236007T patent/DE60236007D1/en not_active Expired - Lifetime
- 2002-10-15 JP JP2003537117A patent/JP4546087B2/en not_active Expired - Lifetime
- 2002-10-15 EP EP02787490A patent/EP1436837B1/en not_active Expired - Lifetime
- 2002-10-15 AU AU2002351771A patent/AU2002351771A1/en not_active Abandoned
-
2004
- 2004-07-20 US US10/894,989 patent/US7057274B2/en not_active Expired - Lifetime
- 2004-10-05 US US10/958,524 patent/US7081412B2/en not_active Expired - Lifetime
-
2005
- 2005-08-16 HK HK05107072A patent/HK1074913A1/en not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0430593A2 (en) * | 1989-11-22 | 1991-06-05 | Xerox Corporation | Method of cutting a silicon wafer by orientation dependent etching |
US6036872A (en) * | 1998-03-31 | 2000-03-14 | Honeywell Inc. | Method for making a wafer-pair having sealed chambers |
EP1061578A1 (en) * | 1998-12-16 | 2000-12-20 | Seiko Epson Corporation | Semiconductor chip, semiconductor device, circuit board and electronic equipment and production methods for them |
WO2001024228A2 (en) * | 1999-09-27 | 2001-04-05 | Input Output, Inc. | Temporary bridge for micro machined structures |
Non-Patent Citations (2)
Title |
---|
LINDER S ET AL: "Fabrication technology for wafer through-hole interconnections and three-dimensional stacks of chips and wafers", MICRO ELECTRO MECHANICAL SYSTEMS, 1994, MEMS '94, PROCEEDINGS, IEEE WORKSHOP ON OISO, JAPAN 25-28 JAN. 1994, NEW YORK, NY, USA,IEEE, 25 January 1994 (1994-01-25), pages 349 - 354, XP010207732, ISBN: 0-7803-1833-1 * |
MITA Y ET AL: "Embedded-mask-methods for mm-scale multi-layer vertical/slanted Si structures", PROCEEDINGS IEEE THIRTEENTH ANNUAL INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, 23 January 2000 (2000-01-23) - 27 January 2000 (2000-01-27), Miyazaki, Japan, pages 300 - 305, XP010377143 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8993450B2 (en) | 2003-09-15 | 2015-03-31 | Nuvotronics, Llc | Device package and methods for the fabrication and testing thereof |
US9410799B2 (en) | 2003-09-15 | 2016-08-09 | Nuvotronics, Inc. | Device package and methods for the fabrication and testing thereof |
Also Published As
Publication number | Publication date |
---|---|
JP2005506701A (en) | 2005-03-03 |
DE60236007D1 (en) | 2010-05-27 |
WO2003034490A2 (en) | 2003-04-24 |
US20040266038A1 (en) | 2004-12-30 |
US6818464B2 (en) | 2004-11-16 |
ATE464656T1 (en) | 2010-04-15 |
EP1436837A2 (en) | 2004-07-14 |
US20030071283A1 (en) | 2003-04-17 |
CN1605126A (en) | 2005-04-06 |
EP1436837B1 (en) | 2010-04-14 |
US7057274B2 (en) | 2006-06-06 |
CN100377333C (en) | 2008-03-26 |
US7081412B2 (en) | 2006-07-25 |
HK1074913A1 (en) | 2005-11-25 |
US20050059204A1 (en) | 2005-03-17 |
JP4546087B2 (en) | 2010-09-15 |
AU2002351771A1 (en) | 2003-04-28 |
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