WO2003032351A3 - Procede et dispositif pour l'alignement d'une colonne de faisceau de particules chargees - Google Patents
Procede et dispositif pour l'alignement d'une colonne de faisceau de particules chargees Download PDFInfo
- Publication number
- WO2003032351A3 WO2003032351A3 PCT/IB2002/005792 IB0205792W WO03032351A3 WO 2003032351 A3 WO2003032351 A3 WO 2003032351A3 IB 0205792 W IB0205792 W IB 0205792W WO 03032351 A3 WO03032351 A3 WO 03032351A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- aligning
- charged particle
- particle beam
- beam column
- stigmator
- Prior art date
Links
- 239000002245 particle Substances 0.000 title abstract 2
- 201000009310 astigmatism Diseases 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/263—Contrast, resolution or power of penetration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1532—Astigmatism
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/21—Focus adjustment
- H01J2237/216—Automatic focusing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/22—Treatment of data
- H01J2237/221—Image processing
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003535224A JP3959063B2 (ja) | 2001-10-10 | 2002-10-04 | 荷電粒子ビームカラムのアライメント方法および装置 |
AU2002358245A AU2002358245A1 (en) | 2001-10-10 | 2002-10-04 | Method and device for aligning a charged particle beam column |
US10/492,257 US7335893B2 (en) | 2001-10-10 | 2002-10-04 | Method and device for aligning a charged particle beam column |
US11/689,870 US7385205B2 (en) | 2001-10-10 | 2007-03-22 | Method and device for aligning a charged particle beam column |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32845201P | 2001-10-10 | 2001-10-10 | |
US60/328,452 | 2001-10-10 | ||
EP02016839A EP1302971B1 (fr) | 2001-10-10 | 2002-07-29 | Procédé et dispositif pour la génération automatique d'images adapté pour l'alignement d'une colonne à faisceau de particules chargées |
EP02016839.9 | 2002-07-29 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/689,870 Division US7385205B2 (en) | 2001-10-10 | 2007-03-22 | Method and device for aligning a charged particle beam column |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003032351A2 WO2003032351A2 (fr) | 2003-04-17 |
WO2003032351A3 true WO2003032351A3 (fr) | 2003-10-02 |
Family
ID=26077582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB2002/005792 WO2003032351A2 (fr) | 2001-10-10 | 2002-10-04 | Procede et dispositif pour l'alignement d'une colonne de faisceau de particules chargees |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3959063B2 (fr) |
CN (1) | CN100341106C (fr) |
AU (1) | AU2002358245A1 (fr) |
WO (1) | WO2003032351A2 (fr) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4652830B2 (ja) * | 2005-01-26 | 2011-03-16 | キヤノン株式会社 | 収差調整方法、デバイス製造方法及び荷電粒子線露光装置 |
JP4708854B2 (ja) | 2005-05-13 | 2011-06-22 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
EP1783811A3 (fr) | 2005-11-02 | 2008-02-27 | FEI Company | Correcteur pour la correction d'aberrations chromatiques dans un appareil optique à particules |
JP4538472B2 (ja) * | 2007-03-15 | 2010-09-08 | 株式会社日立ハイテクノロジーズ | 画像形成方法、及び電子顕微鏡 |
EP2091062A1 (fr) | 2008-02-13 | 2009-08-19 | FEI Company | TEM avec correcteur d'aberrations et lame de phase |
EP2131385A1 (fr) | 2008-06-05 | 2009-12-09 | FEI Company | Plaque de phase hybride |
EP2166557A1 (fr) | 2008-09-22 | 2010-03-24 | FEI Company | Procédé de correction de distorsions dans un appareil optique corpusculaire |
EP2197018A1 (fr) | 2008-12-12 | 2010-06-16 | FEI Company | Procédé pour déterminer les distorsions dans un appareil optique corpusculaire |
EP2325862A1 (fr) | 2009-11-18 | 2011-05-25 | Fei Company | Correcteur pour aberrations axiales d'une lentille à particules chargées |
EP2511936B1 (fr) | 2011-04-13 | 2013-10-02 | Fei Company | Correction d'astigmatisme sans distorsion d'un TEM |
DE102012102608B4 (de) * | 2012-03-27 | 2016-07-21 | Aixacct Systems Gmbh | Verfahren zur Ermittlung von Strahlparametern eines Ladungsträgerstrahls, Messeinrichtung sowie Ladungsträgerstrahlvorrichtung |
CN103456590B (zh) * | 2012-05-31 | 2016-08-24 | 睿励科学仪器(上海)有限公司 | 扫描电镜中具有多级机械对准机构的对准装置及其方法 |
US9589762B2 (en) * | 2012-06-01 | 2017-03-07 | Siemens Aktiengesellschaft | Deflection plate and deflection device for deflecting charged particles |
EP3016130A1 (fr) * | 2014-10-28 | 2016-05-04 | Fei Company | Trajet de balayage composite dans un microscope à particules chargées |
CN108463869B (zh) * | 2016-01-29 | 2020-04-24 | 株式会社日立高新技术 | 带电粒子束装置及其光轴调整方法 |
US10790114B2 (en) * | 2017-06-29 | 2020-09-29 | Kla-Tencor Corporation | Scanning electron microscope objective lens calibration using X-Y voltages iteratively determined from images obtained using said voltages |
JP6863208B2 (ja) * | 2017-09-29 | 2021-04-21 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法 |
EP3651182A1 (fr) * | 2018-11-12 | 2020-05-13 | FEI Company | Microscope à particules chargées servant à l'examen d'un échantillon et procédé de détermination d'une aberration dudit microscope à particules chargées |
US10923318B2 (en) * | 2018-12-20 | 2021-02-16 | Fei Company | Optical alignment correction using convolutional neural network evaluation of a beam image |
DE102019204575B3 (de) * | 2019-04-01 | 2020-08-06 | Carl Zeiss Smt Gmbh | Verfahren, Vorrichtung und Computerprogramm zum Bestimmen einer Wellenfront eines massebehafteten Teilchenstrahls |
JP7413105B2 (ja) * | 2019-09-25 | 2024-01-15 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
JP7391735B2 (ja) * | 2019-09-25 | 2023-12-05 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
US11361951B2 (en) * | 2019-10-03 | 2022-06-14 | Kla Corporation | System and method for photomultiplier tube image correction |
US12237142B2 (en) | 2022-06-16 | 2025-02-25 | Fei Company | Methods for determining the virtual source location of a liquid metal ion source |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4162403A (en) * | 1978-07-26 | 1979-07-24 | Advanced Metals Research Corp. | Method and means for compensating for charge carrier beam astigmatism |
US4451737A (en) * | 1981-06-24 | 1984-05-29 | Hitachi, Ltd. | Electron beam control device for electron microscopes |
US5627373A (en) * | 1996-06-17 | 1997-05-06 | Hewlett-Packard Company | Automatic electron beam alignment and astigmatism correction in scanning electron microscope |
-
2002
- 2002-10-04 JP JP2003535224A patent/JP3959063B2/ja not_active Expired - Fee Related
- 2002-10-04 AU AU2002358245A patent/AU2002358245A1/en not_active Abandoned
- 2002-10-04 WO PCT/IB2002/005792 patent/WO2003032351A2/fr active Search and Examination
- 2002-10-04 CN CNB028229541A patent/CN100341106C/zh not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4162403A (en) * | 1978-07-26 | 1979-07-24 | Advanced Metals Research Corp. | Method and means for compensating for charge carrier beam astigmatism |
US4451737A (en) * | 1981-06-24 | 1984-05-29 | Hitachi, Ltd. | Electron beam control device for electron microscopes |
US5627373A (en) * | 1996-06-17 | 1997-05-06 | Hewlett-Packard Company | Automatic electron beam alignment and astigmatism correction in scanning electron microscope |
Also Published As
Publication number | Publication date |
---|---|
JP3959063B2 (ja) | 2007-08-15 |
CN1589490A (zh) | 2005-03-02 |
WO2003032351A2 (fr) | 2003-04-17 |
JP2005505899A (ja) | 2005-02-24 |
CN100341106C (zh) | 2007-10-03 |
AU2002358245A1 (en) | 2003-04-22 |
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