WO2003025689A3 - Commande de processus a grande echelle par identification de facteurs d'entrainement - Google Patents
Commande de processus a grande echelle par identification de facteurs d'entrainement Download PDFInfo
- Publication number
- WO2003025689A3 WO2003025689A3 PCT/US2002/029206 US0229206W WO03025689A3 WO 2003025689 A3 WO2003025689 A3 WO 2003025689A3 US 0229206 W US0229206 W US 0229206W WO 03025689 A3 WO03025689 A3 WO 03025689A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- process control
- factor identification
- large scale
- driving factor
- nonlinear regression
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
- G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
- G05B13/0265—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion
- G05B13/027—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion using neural networks only
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B17/00—Systems involving the use of models or simulators of said systems
- G05B17/02—Systems involving the use of models or simulators of said systems electric
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/4188—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by CIM planning or realisation
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41885—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by modeling, simulation of the manufacturing system
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32015—Optimize, process management, optimize production line
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32193—Ann, neural base quality management
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32335—Use of ann, neural network
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32343—Derive control behaviour, decisions from simulation, behaviour modelling
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32352—Modular modeling, decompose large system in smaller systems to simulate
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/42—Servomotor, servo controller kind till VSS
- G05B2219/42001—Statistical process control spc
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Landscapes
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Artificial Intelligence (AREA)
- Manufacturing & Machinery (AREA)
- Quality & Reliability (AREA)
- General Engineering & Computer Science (AREA)
- Evolutionary Computation (AREA)
- Health & Medical Sciences (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Medical Informatics (AREA)
- Software Systems (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32240301P | 2001-09-14 | 2001-09-14 | |
US60/322,403 | 2001-09-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003025689A2 WO2003025689A2 (fr) | 2003-03-27 |
WO2003025689A3 true WO2003025689A3 (fr) | 2003-10-16 |
Family
ID=23254728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/029206 WO2003025689A2 (fr) | 2001-09-14 | 2002-09-13 | Commande de processus a grande echelle par identification de facteurs d'entrainement |
Country Status (2)
Country | Link |
---|---|
US (1) | US6904328B2 (fr) |
WO (1) | WO2003025689A2 (fr) |
Families Citing this family (40)
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US20130189801A1 (en) * | 1998-11-06 | 2013-07-25 | Semcon Tech, Llc | Advanced finishing control |
US6986698B1 (en) | 1999-04-01 | 2006-01-17 | Beaver Creek Concepts Inc | Wafer refining |
US7008300B1 (en) | 2000-10-10 | 2006-03-07 | Beaver Creek Concepts Inc | Advanced wafer refining |
US7575501B1 (en) | 1999-04-01 | 2009-08-18 | Beaver Creek Concepts Inc | Advanced workpiece finishing |
US7572169B1 (en) | 1998-11-06 | 2009-08-11 | Beaver Creek Concepts Inc | Advanced finishing control |
US7220164B1 (en) | 2003-12-08 | 2007-05-22 | Beaver Creek Concepts Inc | Advanced finishing control |
US6739947B1 (en) | 1998-11-06 | 2004-05-25 | Beaver Creek Concepts Inc | In situ friction detector method and apparatus |
US7878882B2 (en) * | 1999-04-01 | 2011-02-01 | Charles J. Molnar | Advanced workpiece finishing |
US8353738B2 (en) * | 1998-11-06 | 2013-01-15 | Semcon Tech, Llc | Advanced finishing control |
US7131890B1 (en) | 1998-11-06 | 2006-11-07 | Beaver Creek Concepts, Inc. | In situ finishing control |
US7037172B1 (en) | 1999-04-01 | 2006-05-02 | Beaver Creek Concepts Inc | Advanced wafer planarizing |
US7377836B1 (en) | 2000-10-10 | 2008-05-27 | Beaver Creek Concepts Inc | Versatile wafer refining |
US7110525B1 (en) | 2001-06-25 | 2006-09-19 | Toby Heller | Agent training sensitive call routing system |
US7058917B1 (en) * | 2002-06-04 | 2006-06-06 | Cadence Design Systems, Inc. | Method and apparatus for specifying a cost function that represents the estimated distance between an external state and a set of states in a space |
US9818136B1 (en) | 2003-02-05 | 2017-11-14 | Steven M. Hoffberg | System and method for determining contingent relevance |
GB0320670D0 (en) | 2003-09-04 | 2003-10-01 | Curvaceous Software Ltd | Multi-variable operations |
KR100618822B1 (ko) * | 2004-03-13 | 2006-08-31 | 삼성전자주식회사 | 변수 소거법을 이용하는 전력 분배 네트워크 시뮬레이션방법 |
US7272817B1 (en) | 2004-04-15 | 2007-09-18 | Bank Of America Corporation | Method and apparatus for modeling a business process to facilitate evaluation of driving metrics |
US7291285B2 (en) * | 2005-05-10 | 2007-11-06 | International Business Machines Corporation | Method and system for line-dimension control of an etch process |
GB0509898D0 (en) * | 2005-05-14 | 2005-06-22 | Rolls Royce Plc | Analysis method |
EP1746475A1 (fr) * | 2005-07-19 | 2007-01-24 | MTU Aero Engines GmbH | Procédé pour la génération des chaines de traitement |
US7761172B2 (en) * | 2006-03-21 | 2010-07-20 | Exxonmobil Research And Engineering Company | Application of abnormal event detection (AED) technology to polymers |
US8041440B2 (en) * | 2006-07-13 | 2011-10-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and system for providing a selection of golden tools for better defect density and product yield |
US7571109B2 (en) | 2006-07-14 | 2009-08-04 | Fawls Robert A | System and method for assessing operational process risk and quality by calculating operational value at risk |
US7991499B2 (en) * | 2006-12-27 | 2011-08-02 | Molnar Charles J | Advanced finishing control |
GB0711256D0 (en) * | 2007-06-12 | 2007-07-18 | Rolls Royce Plc | Engine health monitoring |
US8357286B1 (en) | 2007-10-29 | 2013-01-22 | Semcon Tech, Llc | Versatile workpiece refining |
CN102237294B (zh) * | 2010-04-21 | 2013-11-27 | 中国科学院微电子研究所 | 一种源漏区、接触孔及其形成方法 |
US8862250B2 (en) | 2010-05-07 | 2014-10-14 | Exxonmobil Research And Engineering Company | Integrated expert system for identifying abnormal events in an industrial plant |
US9659266B2 (en) | 2011-07-14 | 2017-05-23 | International Business Machines Corporation | Enterprise intelligence (‘EI’) management in an EI framework |
US9646278B2 (en) | 2011-07-14 | 2017-05-09 | International Business Machines Corporation | Decomposing a process model in an enterprise intelligence (‘EI’) framework |
US9639815B2 (en) * | 2011-07-14 | 2017-05-02 | International Business Machines Corporation | Managing processes in an enterprise intelligence (‘EI’) assembly of an EI framework |
US8930008B2 (en) * | 2012-01-26 | 2015-01-06 | Sakti3, Inc. | Methodology for design of a manufacturing facility for fabrication of solid state hybrid thin film energy storage and conversion devices |
EP3167529A4 (fr) * | 2014-05-16 | 2018-01-03 | HST Solar Farms, Inc. | Systèmes et procédés permettant une ingénierie de réseau photovoltaïque solaire |
CN103984331B (zh) * | 2014-05-30 | 2016-08-17 | 西安交通大学 | 一种复杂产品装配质量的误差敏感性分析与控制方法 |
US10930535B2 (en) | 2016-12-02 | 2021-02-23 | Applied Materials, Inc. | RFID part authentication and tracking of processing components |
US11256244B2 (en) | 2018-02-05 | 2022-02-22 | Inventus Holdings, Llc | Adaptive alarm and dispatch system using incremental regressive model development |
US11194825B2 (en) * | 2018-09-23 | 2021-12-07 | Microsoft Technology Licensing, Llc. | Distributed sequential pattern data mining framework |
PL3705963T3 (pl) * | 2019-03-08 | 2022-11-07 | Abb Schweiz Ag | Sposób inżynierii automatyzacji opartej na intencjach |
US10861562B1 (en) | 2019-06-24 | 2020-12-08 | SK Hynix Inc. | Deep learning based regression framework for read thresholds in a NAND flash memory |
Citations (5)
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---|---|---|---|---|
US5467883A (en) * | 1992-12-14 | 1995-11-21 | At&T Corp. | Active neural network control of wafer attributes in a plasma etch process |
US5559690A (en) * | 1992-06-10 | 1996-09-24 | Pavilion Technologies, Inc. | Residual activation neural network |
US5654903A (en) * | 1995-11-07 | 1997-08-05 | Lucent Technologies Inc. | Method and apparatus for real time monitoring of wafer attributes in a plasma etch process |
US6268226B1 (en) * | 1999-06-30 | 2001-07-31 | International Business Machines Corporation | Reactive ion etch loading measurement technique |
WO2001057605A1 (fr) * | 2000-02-03 | 2001-08-09 | Pronetix Ltd. | Determination des optimaux de points de consigne de machines et de processus |
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US5740033A (en) | 1992-10-13 | 1998-04-14 | The Dow Chemical Company | Model predictive controller |
US6249712B1 (en) * | 1995-09-26 | 2001-06-19 | William J. N-O. Boiquaye | Adaptive control process and system |
DE19637917C2 (de) | 1996-09-17 | 1998-12-10 | Siemens Ag | Verfahren und Einrichtung zum Entwurf oder zur Steuerung des Prozeßablaufs einer Anlage der Grundstoffindustrie |
US6532454B1 (en) * | 1998-09-24 | 2003-03-11 | Paul J. Werbos | Stable adaptive control using critic designs |
US6442515B1 (en) * | 1998-10-26 | 2002-08-27 | Invensys Systems, Inc. | Process model generation independent of application mode |
US6445963B1 (en) * | 1999-10-04 | 2002-09-03 | Fisher Rosemount Systems, Inc. | Integrated advanced control blocks in process control systems |
-
2002
- 2002-09-13 WO PCT/US2002/029206 patent/WO2003025689A2/fr not_active Application Discontinuation
- 2002-09-13 US US10/244,154 patent/US6904328B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US5559690A (en) * | 1992-06-10 | 1996-09-24 | Pavilion Technologies, Inc. | Residual activation neural network |
US5467883A (en) * | 1992-12-14 | 1995-11-21 | At&T Corp. | Active neural network control of wafer attributes in a plasma etch process |
US5654903A (en) * | 1995-11-07 | 1997-08-05 | Lucent Technologies Inc. | Method and apparatus for real time monitoring of wafer attributes in a plasma etch process |
US6268226B1 (en) * | 1999-06-30 | 2001-07-31 | International Business Machines Corporation | Reactive ion etch loading measurement technique |
WO2001057605A1 (fr) * | 2000-02-03 | 2001-08-09 | Pronetix Ltd. | Determination des optimaux de points de consigne de machines et de processus |
Non-Patent Citations (4)
Title |
---|
CARD J P ET AL: "DYNAMIC NEURAL CONTROL FOR A PLASMA ETCH PROCESS", IEEE TRANSACTIONS ON NEURAL NETWORKS, IEEE INC, NEW YORK, US, VOL. 8, NR. 4, PAGE(S) 883-901, ISSN: 1045-9227, XP000656477 * |
KIM T S ET AL: "INTELLIGENT CONTROL OF VIA FORMATION BY PHOTOSENSITIVE BCB FOR MCM-L/D APPLICATIONS", IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, IEEE INC, NEW YORK, US, VOL. 12, NR. 4, PAGE(S) 503-515, ISSN: 0894-6507, XP000928154 * |
RIETMAN E A ET AL: "A SYSTEM MODEL FOR FEEDBACK CONTROL AND ANALYSIS OF YIELD: A MULTISTEP PROCESS MODEL OF EFFECTIVE GATE LENGTH, POLY LINE WIDTH, AND IV PARAMETERS", IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, IEEE INC, NEW YORK, US, VOL. 14, NR. 1, PAGE(S) 32-47, ISSN: 0894-6507, XP001081265 * |
RIETMAN E A: "NEURAL NETWORKS IN PLASMA PROCESSING", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, VOL. 14, NR. 1, PAGE(S) 504-510, ISSN: 0734-211X, XP000558395 * |
Also Published As
Publication number | Publication date |
---|---|
US20030093762A1 (en) | 2003-05-15 |
WO2003025689A2 (fr) | 2003-03-27 |
US6904328B2 (en) | 2005-06-07 |
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