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WO2003023910A3 - High rep-rate laser with improved electrodes - Google Patents

High rep-rate laser with improved electrodes Download PDF

Info

Publication number
WO2003023910A3
WO2003023910A3 PCT/US2002/028463 US0228463W WO03023910A3 WO 2003023910 A3 WO2003023910 A3 WO 2003023910A3 US 0228463 W US0228463 W US 0228463W WO 03023910 A3 WO03023910 A3 WO 03023910A3
Authority
WO
WIPO (PCT)
Prior art keywords
anode
discharge
laser
electrode
erosion rate
Prior art date
Application number
PCT/US2002/028463
Other languages
French (fr)
Other versions
WO2003023910A2 (en
Inventor
Richard G Morton
Timothy S Dyer
Thomas D Steiger
Richard C Ujazdowski
Tom A Watson
Bryan Moosman
Alex P Ivaschenko
Walter D Gillespie
Curtis L Rettig
Original Assignee
Cymer Inc
Richard G Morton
Timothy S Dyer
Thomas D Steiger
Richard C Ujazdowski
Tom A Watson
Bryan Moosman
Alex P Ivaschenko
Walter D Gillespie
Curtis L Rettig
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/953,026 external-priority patent/US6711202B2/en
Priority claimed from US10/081,589 external-priority patent/US20020154670A1/en
Priority claimed from US10/104,502 external-priority patent/US6690706B2/en
Application filed by Cymer Inc, Richard G Morton, Timothy S Dyer, Thomas D Steiger, Richard C Ujazdowski, Tom A Watson, Bryan Moosman, Alex P Ivaschenko, Walter D Gillespie, Curtis L Rettig filed Critical Cymer Inc
Priority to AU2002324905A priority Critical patent/AU2002324905A1/en
Priority to KR1020047003801A priority patent/KR100940782B1/en
Priority to JP2003527843A priority patent/JP3971382B2/en
Priority to EP02759577A priority patent/EP1436866A4/en
Publication of WO2003023910A2 publication Critical patent/WO2003023910A2/en
Publication of WO2003023910A3 publication Critical patent/WO2003023910A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

The present invention provides a gas discharge laser having at least one long-life elongated electrode for producing at least 12 billion high voltage electric discharges in a fluorine containing laser gas. In a preferred embodiment at least one of the elctrodes is comprised of a first material having a relatively low anode erosion rate and a second anode material having a relatively higher anode erosion rate. The first anode material (42) is positioned at a desired anode discharge region of the electrode. The second anode material (40) is located adjacent to the first anode material (42) along at least two long sides of the first material (42). During operation of the laser erosion occurs on both materials but the higher erosion rate of the second material (40) assures that any tendency of the discharge to spread onto the second material (40) will quickly erode away the second material (40) enough to stop the spread of the discharge. In a preferred embodiment the anode is as described above and the cathode is also a two-material electrode with the first material at the discharge region being C26000 brass and the second material being C36000 brass. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.
PCT/US2002/028463 2001-09-13 2002-09-06 High rep-rate laser with improved electrodes WO2003023910A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2002324905A AU2002324905A1 (en) 2001-09-13 2002-09-06 High rep-rate laser with improved electrodes
KR1020047003801A KR100940782B1 (en) 2001-09-13 2002-09-06 High Repetition Rate Laser with Enhanced Electrode
JP2003527843A JP3971382B2 (en) 2001-09-13 2002-09-06 High repetition rate laser with improved electrode
EP02759577A EP1436866A4 (en) 2001-09-13 2002-09-06 High rep-rate laser with improved electrodes

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US09/953,026 2001-09-13
US09/953,026 US6711202B2 (en) 2000-06-09 2001-09-13 Discharge laser with porous insulating layer covering anode discharge surface
US10/081,589 2002-02-21
US10/081,589 US20020154670A1 (en) 2000-06-09 2002-02-21 Electric discharge laser with two-material electrodes
US10/104,502 2002-03-22
US10/104,502 US6690706B2 (en) 2000-06-09 2002-03-22 High rep-rate laser with improved electrodes

Publications (2)

Publication Number Publication Date
WO2003023910A2 WO2003023910A2 (en) 2003-03-20
WO2003023910A3 true WO2003023910A3 (en) 2003-05-30

Family

ID=27374022

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/028463 WO2003023910A2 (en) 2001-09-13 2002-09-06 High rep-rate laser with improved electrodes

Country Status (4)

Country Link
EP (1) EP1436866A4 (en)
JP (1) JP3971382B2 (en)
KR (1) KR100940782B1 (en)
WO (1) WO2003023910A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7230965B2 (en) * 2001-02-01 2007-06-12 Cymer, Inc. Anodes for fluorine gas discharge lasers
US7095774B2 (en) * 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
US7301980B2 (en) * 2002-03-22 2007-11-27 Cymer, Inc. Halogen gas discharge laser electrodes
EP2259390A1 (en) * 2003-07-29 2010-12-08 Cymer, Inc. Gas discharge laser electrode
JP4579002B2 (en) * 2005-02-21 2010-11-10 株式会社小松製作所 Pulse oscillation type discharge excitation laser equipment
US7542502B2 (en) * 2005-09-27 2009-06-02 Cymer, Inc. Thermal-expansion tolerant, preionizer electrode for a gas discharge laser
WO2015125286A1 (en) * 2014-02-21 2015-08-27 ギガフォトン株式会社 Laser chamber
US11127582B2 (en) 2018-01-11 2021-09-21 Cymer, Llc Electrode for a discharge chamber
CN112210775B (en) * 2020-10-09 2022-12-02 中国科学院微电子研究所 Part coating preparation device, part coating preparation method, and terminal device

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5187716A (en) * 1990-07-06 1993-02-16 Mitsubishi Denki Kabushiki Kaisha Excimer laser device
US5247534A (en) * 1991-04-23 1993-09-21 Lambda Physik Forschungsgesellschaft Mbh Pulsed gas-discharge laser
US5359620A (en) * 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5586134A (en) * 1992-11-13 1996-12-17 Cymer Laser Technologies Excimer laser
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer
US5897847A (en) * 1991-03-06 1999-04-27 American Air Liquide Method for extending the gas lifetime of excimer lasers

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6348874A (en) * 1986-08-19 1988-03-01 Matsushita Electric Ind Co Ltd Laser apparatus
DE4401892C2 (en) * 1994-01-24 1999-06-02 Lambda Physik Forschung Electrode for a gas discharge laser and method for forming an electrode for a gas discharge laser
US6330261B1 (en) * 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
JPH1168196A (en) * 1997-08-26 1999-03-09 Nissin Electric Co Ltd Gas laser device
US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes
US6654403B2 (en) * 2000-06-09 2003-11-25 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser
US6711202B2 (en) * 2000-06-09 2004-03-23 Cymer, Inc. Discharge laser with porous insulating layer covering anode discharge surface

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5187716A (en) * 1990-07-06 1993-02-16 Mitsubishi Denki Kabushiki Kaisha Excimer laser device
US5897847A (en) * 1991-03-06 1999-04-27 American Air Liquide Method for extending the gas lifetime of excimer lasers
US5247534A (en) * 1991-04-23 1993-09-21 Lambda Physik Forschungsgesellschaft Mbh Pulsed gas-discharge laser
US5359620A (en) * 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5586134A (en) * 1992-11-13 1996-12-17 Cymer Laser Technologies Excimer laser
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1436866A4 *

Also Published As

Publication number Publication date
KR20040031790A (en) 2004-04-13
WO2003023910A2 (en) 2003-03-20
JP3971382B2 (en) 2007-09-05
EP1436866A2 (en) 2004-07-14
KR100940782B1 (en) 2010-02-11
JP2005503027A (en) 2005-01-27
EP1436866A4 (en) 2009-10-28

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