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WO2003012549A3 - Lithograph mit bewegtem zylinderlinsensystem - Google Patents

Lithograph mit bewegtem zylinderlinsensystem Download PDF

Info

Publication number
WO2003012549A3
WO2003012549A3 PCT/EP2002/008372 EP0208372W WO03012549A3 WO 2003012549 A3 WO2003012549 A3 WO 2003012549A3 EP 0208372 W EP0208372 W EP 0208372W WO 03012549 A3 WO03012549 A3 WO 03012549A3
Authority
WO
WIPO (PCT)
Prior art keywords
movement
lithograph
lens
write beam
lens system
Prior art date
Application number
PCT/EP2002/008372
Other languages
English (en)
French (fr)
Other versions
WO2003012549A2 (de
Inventor
Steffen Noehte
Christoph Dietrich
Robert Thomann
Stefan Stadler
Joern Leiber
Original Assignee
Tesa Scribos Gmbh
Steffen Noehte
Christoph Dietrich
Robert Thomann
Stefan Stadler
Joern Leiber
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tesa Scribos Gmbh, Steffen Noehte, Christoph Dietrich, Robert Thomann, Stefan Stadler, Joern Leiber filed Critical Tesa Scribos Gmbh
Priority to GB0403047A priority Critical patent/GB2395799B/en
Priority to DE10293414T priority patent/DE10293414B4/de
Priority to US10/485,009 priority patent/US20040257629A1/en
Publication of WO2003012549A2 publication Critical patent/WO2003012549A2/de
Publication of WO2003012549A3 publication Critical patent/WO2003012549A3/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0891—Processes or apparatus adapted to convert digital holographic data into a hologram
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0478—Serial printer, i.e. point oriented processing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)

Abstract

Die Erfindung betrifft einen Lithographen zum Herstellen digitaler Hologramme in einem Speichermedium (13) mit einer Quelle zur Erzeugung eines Schreibstrahls (2), mit einer bewegten Linse (4) zum Fokussieren des Schreibstrahls (2), mit Mitteln zum Bewegen der bewegten Linse (4) entlang einer Bewegungsrichtung (6) und mit einem Mittel zum Verfahren des Schreibstrahls (2) relativ zu dem Speichermedium (13) senkrecht zu der Bewegungsrichtung (6). Das technische Problem, einen Lithographen bereitzustellen, bei dem Störungen der Bewegung einer Linse senkrecht zu deren Bewegungsrichtung keinen Einfluss auf die Qualität des Hologramms haben, wird dadurch gelöst, dass die bewegte Linse 4 nur im wesentlichen in einer ersten Richtung Brechkraft aufweist, die parallel zu der Bewegungsrichtung (6) ist, dass eine stationäre Linse (9) vorgesehen ist und dass die stationäre Linse (9) nur im wesentlichen in einer zweiten Richtung (5) Brechkraft aufweist, wobei die zweite Richtung (5) senkrecht zu der ersten Richtung und zu dem Schreibstrahl (2) steht.
PCT/EP2002/008372 2001-07-27 2002-07-26 Lithograph mit bewegtem zylinderlinsensystem WO2003012549A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB0403047A GB2395799B (en) 2001-07-27 2002-07-26 Lithograph having a moving cylindrical lens system
DE10293414T DE10293414B4 (de) 2001-07-27 2002-07-26 Lithograph mit bewegtem Zylinderlinsensystem
US10/485,009 US20040257629A1 (en) 2001-07-27 2002-07-26 Lithograph comprising a moving cylindrical lens system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10136569.1 2001-07-27
DE10136569 2001-07-27

Publications (2)

Publication Number Publication Date
WO2003012549A2 WO2003012549A2 (de) 2003-02-13
WO2003012549A3 true WO2003012549A3 (de) 2003-10-09

Family

ID=7693264

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/008372 WO2003012549A2 (de) 2001-07-27 2002-07-26 Lithograph mit bewegtem zylinderlinsensystem

Country Status (4)

Country Link
US (1) US20040257629A1 (de)
DE (1) DE10293414B4 (de)
GB (1) GB2395799B (de)
WO (1) WO2003012549A2 (de)

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JP4199003B2 (ja) * 2001-04-12 2008-12-17 テーザ スクリボス ゲゼルシャフト ミット ベシュレンクテル ハフツング １次元トリガマスクを有するリソグラフ及び記憶媒体にデジタルホログラムを生成する方法
EP2523052A1 (de) 2006-02-22 2012-11-14 tesa scribos GmbH Speichermedium mit einem computergenerierten Reflektionshologramm auf einer unebenen Fläche
DE102006037216B4 (de) * 2006-04-04 2017-07-13 Tesa Scribos Gmbh Verfahren zur Herstellung einer Punkteverteilung in einem Speichermedium sowie ein Speichermedium
WO2007116000A2 (de) 2006-04-04 2007-10-18 Tesa Scribos Gmbh Vorrichtung und verfahren zur mikrostrukturierung eines speichermediums sowie speichermedium mit einem mikrostrukturierten bereich
DE102006032538A1 (de) 2006-04-04 2007-10-11 Tesa Scribos Gmbh Speichermedium mit einem Sicherheitsmerkmal sowie Verfahren zur Herstellung eines Speichermediums mit einem Sicherheitsmerkmal
DE102006025335A1 (de) * 2006-05-31 2007-12-06 Tesa Scribos Gmbh Etikett mit einem Sicherheitsmerkmal und Behälter mit einem Etikett
DE102006032234A1 (de) 2006-07-12 2008-01-17 Tesa Scribos Gmbh Verfahren zum Aufbringen eines Sicherheitsmerkmals auf ein Sicherheitsdokument sowie Sicherheitsdokument mit einem Sicherheitsmerkmal
DE102007004857A1 (de) 2007-01-31 2008-08-07 Tesa Scribos Gmbh Datenträger und Etikett sowie deren Herstellung
DE102007006119A1 (de) 2007-02-02 2008-08-14 Tesa Scribos Gmbh Datenspeicher
DE102007006120A1 (de) 2007-02-02 2008-08-07 Tesa Scribos Gmbh Speichermedium mit einer optisch veränderbaren Speicherschicht
WO2008153674A1 (en) 2007-06-09 2008-12-18 Boris Kobrin Method and apparatus for anisotropic etching
US8518633B2 (en) 2008-01-22 2013-08-27 Rolith Inc. Large area nanopatterning method and apparatus
US8192920B2 (en) 2008-04-26 2012-06-05 Rolith Inc. Lithography method
TWI427431B (zh) * 2008-09-22 2014-02-21 Asml Netherlands Bv 微影裝置、可程式化圖案化器件及微影方法
US20110210480A1 (en) * 2008-11-18 2011-09-01 Rolith, Inc Nanostructures with anti-counterefeiting features and methods of fabricating the same
DE102009040112B4 (de) 2009-09-04 2021-03-04 Tesa Scribos Gmbh Etikettenbahn mit einer Mehrzahl von Etiketten
TWI448830B (zh) 2010-02-09 2014-08-11 Asml Netherlands Bv 微影裝置及元件製造方法
US9235140B2 (en) 2010-02-23 2016-01-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2011104172A1 (en) 2010-02-25 2011-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5738981B2 (ja) 2010-04-12 2015-06-24 エーエスエムエル ネザーランズ ビー．ブイ． 基板ハンドリング装置、リソグラフィ装置、ツール、及びデバイス製造方法
RU2544280C2 (ru) 2010-08-23 2015-03-20 Ролит, Инк. Маска для ближнепольной литографии и ее изготовление
KR101501967B1 (ko) 2010-12-08 2015-03-12 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
NL2008329A (en) 2011-03-29 2012-10-02 Asml Netherlands Bv Lithographic apparatus, method for measuring radiation beam spot position, device manufacturing method, and radiation detector system for a lithographic apparatus.
CN103597404B (zh) 2011-04-08 2017-04-26 Asml荷兰有限公司 光刻设备、可编程图案形成装置以及光刻方法
WO2012143188A1 (en) 2011-04-21 2012-10-26 Asml Netherlands B.V. Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method
NL2009213A (en) 2011-08-18 2013-02-19 Asml Netherlands Bv Lithograpic apparatus and device manufacturing method.
NL2009342A (en) 2011-10-31 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US9696636B2 (en) 2011-11-29 2017-07-04 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program
WO2013079316A2 (en) 2011-11-29 2013-06-06 Asml Netherlands B.V. Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method
US9341960B2 (en) 2011-12-05 2016-05-17 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9488921B2 (en) 2011-12-06 2016-11-08 Asml Netherlands B.V. Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program
NL2009902A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2009979A (en) 2012-01-12 2013-07-15 Asml Netherlands Bv A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program.
US9568831B2 (en) 2012-01-17 2017-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN104115068B (zh) 2012-02-23 2017-04-05 Asml荷兰有限公司 装置、光刻设备、用于引导辐射的方法以及装置制造方法
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WO2002079881A2 (de) * 2001-03-30 2002-10-10 Tesa Scribos Gmbh Lithographischer apparat mit bewegter linse zum herstellen digitaler hologramme
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Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
WO1991001517A1 (en) * 1989-07-18 1991-02-07 Massachusetts Institute Of Technology Improving holographic lithography
WO2002079881A2 (de) * 2001-03-30 2002-10-10 Tesa Scribos Gmbh Lithographischer apparat mit bewegter linse zum herstellen digitaler hologramme
WO2002084404A1 (de) * 2001-04-12 2002-10-24 Tesa Scribos Gmbh Lithograph mit eindimensionaler triggermaske und verfahren zum herstellen digitaler hologramme in einem speichermedium

Also Published As

Publication number Publication date
US20040257629A1 (en) 2004-12-23
WO2003012549A2 (de) 2003-02-13
GB0403047D0 (en) 2004-03-17
DE10293414D2 (de) 2004-08-19
GB2395799B (en) 2005-06-15
DE10293414B4 (de) 2007-03-01
GB2395799A (en) 2004-06-02

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