WO2003067672A3 - Procedes de fabrication de supraconducteurs et reacteurs utilises a cet effet - Google Patents
Procedes de fabrication de supraconducteurs et reacteurs utilises a cet effet Download PDFInfo
- Publication number
- WO2003067672A3 WO2003067672A3 PCT/US2002/024101 US0224101W WO03067672A3 WO 2003067672 A3 WO2003067672 A3 WO 2003067672A3 US 0224101 W US0224101 W US 0224101W WO 03067672 A3 WO03067672 A3 WO 03067672A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- methods
- reactors
- superconductor layers
- forming
- forming superconductor
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 239000002887 superconductor Substances 0.000 title abstract 3
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 abstract 1
- 229910001632 barium fluoride Inorganic materials 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000376 reactant Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
- C30B29/225—Complex oxides based on rare earth copper oxides, e.g. high T-superconductors
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/45—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on copper oxide or solid solutions thereof with other oxides
- C04B35/4504—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on copper oxide or solid solutions thereof with other oxides containing rare earth oxides
- C04B35/4508—Type 1-2-3
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B7/00—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B7/00—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
- C30B7/005—Epitaxial layer growth
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0548—Processes for depositing or forming copper oxide superconductor layers by deposition and subsequent treatment, e.g. oxidation of pre-deposited material
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3205—Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
- C04B2235/3215—Barium oxides or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3224—Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
- C04B2235/3225—Yttrium oxide or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/44—Metal salt constituents or additives chosen for the nature of the anions, e.g. hydrides or acetylacetonate
- C04B2235/444—Halide containing anions, e.g. bromide, iodate, chlorite
- C04B2235/445—Fluoride containing anions, e.g. fluosilicate
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/78—Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
- C04B2235/787—Oriented grains
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49014—Superconductor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Mechanical Engineering (AREA)
- Structural Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Physical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE60218697T DE60218697T2 (de) | 2001-07-31 | 2002-07-30 | Verfahren und reaktoren zur herstellung von supraleiterschichten |
KR1020047001533A KR100719612B1 (ko) | 2001-07-31 | 2002-07-30 | 초전도체 형성 방법 및 반응기 |
EP02805695A EP1419538B1 (fr) | 2001-07-31 | 2002-07-30 | Procedes de fabrication de supraconducteurs et reacteurs utilises a cet effet |
JP2003566911A JP2005516882A (ja) | 2001-07-31 | 2002-07-30 | 超電導体の作製方法及び反応装置 |
AU2002365423A AU2002365423A1 (en) | 2001-07-31 | 2002-07-30 | Methods and reactors for forming superconductor layers |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US30895701P | 2001-07-31 | 2001-07-31 | |
US60/308,957 | 2001-07-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003067672A2 WO2003067672A2 (fr) | 2003-08-14 |
WO2003067672A3 true WO2003067672A3 (fr) | 2004-03-18 |
Family
ID=27734196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2002/024101 WO2003067672A2 (fr) | 2001-07-31 | 2002-07-30 | Procedes de fabrication de supraconducteurs et reacteurs utilises a cet effet |
Country Status (8)
Country | Link |
---|---|
US (1) | US6797313B2 (fr) |
EP (1) | EP1419538B1 (fr) |
JP (2) | JP2005516882A (fr) |
KR (1) | KR100719612B1 (fr) |
CN (1) | CN100367525C (fr) |
AU (1) | AU2002365423A1 (fr) |
DE (1) | DE60218697T2 (fr) |
WO (1) | WO2003067672A2 (fr) |
Families Citing this family (48)
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---|---|---|---|---|
AU2001253922A1 (en) * | 2000-08-07 | 2002-07-24 | Igc-Superpower, Llc | Fabrication of high current coated high temperature superconducting tapes |
US20030130129A1 (en) * | 2001-07-13 | 2003-07-10 | Massachusetts Institute Of Technology | Vacuum processing for fabrication of superconducting films fabricated by metal-organic processing |
JP3725085B2 (ja) * | 2002-03-05 | 2005-12-07 | 株式会社東芝 | 超電導層及びその製造方法 |
US20060063680A1 (en) * | 2002-07-26 | 2006-03-23 | Metal Oxide Technologies, Inc. | System and method for joining superconductivity tape |
US20040016401A1 (en) * | 2002-07-26 | 2004-01-29 | Metal Oxide Technologies, Inc. | Method and apparatus for forming superconductor material on a tape substrate |
US8124170B1 (en) * | 2004-01-23 | 2012-02-28 | Metal Oxide Technologies, Inc | Method for forming superconductor material on a tape substrate |
US20050065035A1 (en) * | 2003-06-10 | 2005-03-24 | Rupich Martin W. | Superconductor methods and reactors |
US7531205B2 (en) * | 2003-06-23 | 2009-05-12 | Superpower, Inc. | High throughput ion beam assisted deposition (IBAD) |
ITTO20030693A1 (it) * | 2003-09-11 | 2005-03-12 | Edison Termoelettrica Spa | Metodo per formare strati con tessitura biassiale su substrati |
US8227019B2 (en) * | 2003-12-15 | 2012-07-24 | Superpower Inc. | High-throughput ex-situ method for rare-earth-barium-copper-oxide (REBCO) film growth |
US20050159298A1 (en) * | 2004-01-16 | 2005-07-21 | American Superconductor Corporation | Oxide films with nanodot flux pinning centers |
US7261776B2 (en) * | 2004-03-30 | 2007-08-28 | American Superconductor Corporation | Deposition of buffer layers on textured metal surfaces |
US20050223984A1 (en) * | 2004-04-08 | 2005-10-13 | Hee-Gyoun Lee | Chemical vapor deposition (CVD) apparatus usable in the manufacture of superconducting conductors |
US7338683B2 (en) * | 2004-05-10 | 2008-03-04 | Superpower, Inc. | Superconductor fabrication processes |
US7582328B2 (en) * | 2004-08-20 | 2009-09-01 | American Superconductor Corporation | Dropwise deposition of a patterned oxide superconductor |
US7496390B2 (en) * | 2004-08-20 | 2009-02-24 | American Superconductor Corporation | Low ac loss filamentary coated superconductors |
US7463915B2 (en) * | 2004-08-20 | 2008-12-09 | American Superconductor Corporation | Stacked filamentary coated superconductors |
US7622424B2 (en) * | 2004-10-01 | 2009-11-24 | American Superconductor Corporation | Thick superconductor films with improved performance |
US7816303B2 (en) * | 2004-10-01 | 2010-10-19 | American Superconductor Corporation | Architecture for high temperature superconductor wire |
US7622426B2 (en) * | 2004-10-07 | 2009-11-24 | Brookhaven Science Associates, Llc | Methods of controlling hydrogen fluoride pressure during chemical fabrication processes |
JP4401992B2 (ja) * | 2005-03-25 | 2010-01-20 | 財団法人国際超電導産業技術研究センター | テープ状酸化物超電導線の製造方法及びその製造装置 |
US7763343B2 (en) * | 2005-03-31 | 2010-07-27 | American Superconductor Corporation | Mesh-type stabilizer for filamentary coated superconductors |
EP1925040B1 (fr) * | 2005-07-29 | 2015-10-21 | American Superconductor Corporation | Fils supraconducteurs à haute température, et bobines constituées de ces fils |
US20070044832A1 (en) * | 2005-08-25 | 2007-03-01 | Fritzemeier Leslie G | Photovoltaic template |
JP4716324B2 (ja) * | 2005-12-26 | 2011-07-06 | 古河電気工業株式会社 | 超電導体用基材およびその製造方法 |
US7674751B2 (en) * | 2006-01-10 | 2010-03-09 | American Superconductor Corporation | Fabrication of sealed high temperature superconductor wires |
JP4690246B2 (ja) * | 2006-05-19 | 2011-06-01 | 住友電気工業株式会社 | 超電導薄膜材料およびその製造方法 |
WO2008118127A1 (fr) * | 2006-07-21 | 2008-10-02 | American Superconductor Corporation | Épissure de faible résistance pour des fils supraconducteurs à haute température |
US7902120B2 (en) * | 2006-07-24 | 2011-03-08 | American Superconductor Corporation | High temperature superconductors having planar magnetic flux pinning centers and methods for making the same |
DE102007007567B4 (de) | 2007-02-15 | 2009-07-30 | Zenergy Power Gmbh | Verfahren zum Herstellen eines HTSL-Bandes |
US7893006B2 (en) * | 2007-03-23 | 2011-02-22 | American Superconductor Corporation | Systems and methods for solution-based deposition of metallic cap layers for high temperature superconductor wires |
US8195260B2 (en) | 2008-07-23 | 2012-06-05 | American Superconductor Corporation | Two-sided splice for high temperature superconductor laminated wires |
US8415187B2 (en) * | 2009-01-28 | 2013-04-09 | Solexant Corporation | Large-grain crystalline thin-film structures and devices and methods for forming the same |
US8530845B2 (en) * | 2009-02-04 | 2013-09-10 | Trustees Of Boston University | Synthesis of advanced scintillators via vapor deposition techniques |
WO2010124059A2 (fr) * | 2009-04-24 | 2010-10-28 | Wakonda Technologies, Inc. | Structures photovoltaïques à film mince cristallins et procédés pour leur formation |
JP5096422B2 (ja) | 2009-07-10 | 2012-12-12 | 住友電気工業株式会社 | 基板および超電導線材の製造方法 |
CN102884594B (zh) * | 2010-02-05 | 2016-06-08 | 株式会社瑞蓝 | 形成陶瓷线的方法、形成陶瓷线的系统、以及采用其的超导体线 |
JP5661509B2 (ja) * | 2010-03-02 | 2015-01-28 | 住友金属鉱山株式会社 | 積層体およびその製造方法、並びにそれを用いた機能素子 |
US8428671B2 (en) | 2010-03-31 | 2013-04-23 | American Superconductor Corporation | Thick oxide film by single coating |
EP2410586B1 (fr) * | 2010-07-19 | 2012-09-26 | Bruker HTS GmbH | Procédé de production d'un conducteur revêtu HTS et conducteur revêtu HTS avec pertes réduites |
DE102010031741B4 (de) * | 2010-07-21 | 2012-09-20 | Siemens Aktiengesellschaft | Verfahren und Anordnung zur Herstellung von supraleitenden Schichten auf Substraten |
JP5688804B2 (ja) * | 2011-04-27 | 2015-03-25 | 住友電気工業株式会社 | 酸化物超電導薄膜層形成用の中間層、酸化物超電導薄膜層および酸化物超電導薄膜線材 |
GB2498565B (en) * | 2012-01-20 | 2014-09-17 | Siemens Plc | Methods for forming joints between magnesium diboride conductors |
US8703651B2 (en) | 2012-07-06 | 2014-04-22 | Dale Richard Harshman | Layered ionic superconductor |
CN108796474B (zh) * | 2018-06-15 | 2020-05-12 | 电子科技大学 | 一种基于溶液法同质外延MgO薄膜的制备方法 |
US11426818B2 (en) | 2018-08-10 | 2022-08-30 | The Research Foundation for the State University | Additive manufacturing processes and additively manufactured products |
JP7278111B2 (ja) * | 2019-03-08 | 2023-05-19 | 株式会社Screenホールディングス | 熱処理方法および熱処理装置 |
CN113774348B (zh) * | 2021-09-22 | 2023-06-02 | 季华实验室 | 一种具有非晶氧化钒薄膜的高温超导体及其制备方法和高温超导线圈 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS63241823A (ja) * | 1987-03-27 | 1988-10-07 | Nissin Electric Co Ltd | 超電導薄膜の製造方法 |
CN1013812B (zh) * | 1987-05-31 | 1991-09-04 | 西安交通大学 | 用高能量激光合成Y-Ba-Cu-O超导体的方法 |
DE59002238D1 (de) * | 1989-03-15 | 1993-09-16 | Asea Brown Boveri | Verfahren zur herstellung einer kristallorientierten oberflaechenschicht aus einem keramischen hochtemperatur-supraleiter. |
JP2822447B2 (ja) * | 1989-05-19 | 1998-11-11 | 住友電気工業株式会社 | 酸化物超電導線材の製造方法および装置 |
JP2923372B2 (ja) * | 1991-03-27 | 1999-07-26 | 財団法人国際超電導産業技術研究センター | 酸化物超電導体膜の製造方法 |
EP0584410A1 (fr) * | 1991-07-05 | 1994-03-02 | Conductus, Inc. | Structures électroniques supraconductrices et procédé pour leur fabrication |
US6451450B1 (en) * | 1995-04-10 | 2002-09-17 | Ut-Battelle, Llc | Method of depositing a protective layer over a biaxially textured alloy substrate and composition therefrom |
US5972847A (en) * | 1998-01-28 | 1999-10-26 | Lockheed Martin Energy | Method for making high-critical-current-density YBa2 Cu3 O7 superconducting layers on metallic substrates |
US6231666B1 (en) * | 1999-07-20 | 2001-05-15 | Sandia Corporation | Process for forming epitaxial perovskite thin film layers using halide precursors |
AU1186901A (en) * | 1999-07-23 | 2001-02-13 | American Superconductor Corporation | Coated conductors with reduced a.c. loss |
EP1198848A1 (fr) * | 1999-07-23 | 2002-04-24 | American Superconductor Corporation | Precurseur de film epais a conducteur revetu |
-
2002
- 2002-07-30 US US10/208,134 patent/US6797313B2/en not_active Expired - Lifetime
- 2002-07-30 JP JP2003566911A patent/JP2005516882A/ja active Pending
- 2002-07-30 EP EP02805695A patent/EP1419538B1/fr not_active Expired - Lifetime
- 2002-07-30 AU AU2002365423A patent/AU2002365423A1/en not_active Abandoned
- 2002-07-30 CN CNB028151879A patent/CN100367525C/zh not_active Expired - Fee Related
- 2002-07-30 KR KR1020047001533A patent/KR100719612B1/ko not_active Expired - Lifetime
- 2002-07-30 WO PCT/US2002/024101 patent/WO2003067672A2/fr active IP Right Grant
- 2002-07-30 DE DE60218697T patent/DE60218697T2/de not_active Expired - Lifetime
-
2006
- 2006-05-17 JP JP2006138050A patent/JP2006228754A/ja active Pending
Non-Patent Citations (3)
Title |
---|
AZOULAY J: "Low-temperature solid-state reaction of in situ growth of YBa/sub 2/Cu/sub 3/O/sub 7- delta / thin films by resistive evaporation", JOURNAL OF APPLIED PHYSICS, 1 DEC. 1992, USA, vol. 72, no. 11, pages 5341 - 5343, XP002252962, ISSN: 0021-8979 * |
MANKIEWICH P M ET AL: "High critical-current density Ba/sub 2/YCu/sub 3/O/sub 7/ thin films produced by coevaporation of Y, Cu, and BaF/sub 2/", HIGH-TEMPERATURE SUPERCONDUCTORS SYMPOSIUM, BOSTON, MA, USA, 30 NOV.-4 DEC. 1987, 1988, Pittsburgh, PA, USA, Mater. Res. Soc, USA, pages 119 - 125, XP009016335, ISBN: 0-931837-67-7 * |
WANG X K ET AL: "ORIENTED THIN FILMS OF YBACU(F)O WITH HIGH TC AND JC PREPARED BY ELECTRON BEAM MULTILAYER EVAPORATION", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 54, no. 16, 17 April 1989 (1989-04-17), pages 1573 - 1575, XP000034631, ISSN: 0003-6951 * |
Also Published As
Publication number | Publication date |
---|---|
CN1539172A (zh) | 2004-10-20 |
CN100367525C (zh) | 2008-02-06 |
JP2006228754A (ja) | 2006-08-31 |
DE60218697T2 (de) | 2007-11-08 |
US6797313B2 (en) | 2004-09-28 |
DE60218697D1 (de) | 2007-04-19 |
US20030127051A1 (en) | 2003-07-10 |
WO2003067672A2 (fr) | 2003-08-14 |
JP2005516882A (ja) | 2005-06-09 |
EP1419538B1 (fr) | 2007-03-07 |
AU2002365423A8 (en) | 2003-09-02 |
AU2002365423A1 (en) | 2003-09-02 |
KR100719612B1 (ko) | 2007-05-17 |
EP1419538A2 (fr) | 2004-05-19 |
KR20040043173A (ko) | 2004-05-22 |
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