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WO2003046661A1 - Films optiques imprimes, a sechage par uv - Google Patents

Films optiques imprimes, a sechage par uv Download PDF

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Publication number
WO2003046661A1
WO2003046661A1 PCT/GB2002/005322 GB0205322W WO03046661A1 WO 2003046661 A1 WO2003046661 A1 WO 2003046661A1 GB 0205322 W GB0205322 W GB 0205322W WO 03046661 A1 WO03046661 A1 WO 03046661A1
Authority
WO
WIPO (PCT)
Prior art keywords
monomer
silicone
light
substrate
polymerisation
Prior art date
Application number
PCT/GB2002/005322
Other languages
English (en)
Inventor
Rifat Iqbal
Dosten Baluch
Original Assignee
Durand Technology Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Durand Technology Limited filed Critical Durand Technology Limited
Priority to GB0412568A priority Critical patent/GB2398074A/en
Priority to AU2002343096A priority patent/AU2002343096A1/en
Publication of WO2003046661A1 publication Critical patent/WO2003046661A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024—Hologram nature or properties
    • G03H1/0244—Surface relief holograms

Definitions

  • THIS INVENTION relates to optical recording materials and to methods of forming optical devices such as difiusers and holograms and security encoding from such materials.
  • the present specification discloses, inter alia, various systems or mixtures comprising organic and pre-polymer components which are of such a character so as to enable stencil or inkjet printing such that when the printed deposit is exposed to some form of electromagnetic radiation, at least some components of the system undergo polymerisation in the areas so exposed, whereby an end product is obtainable, (after any necessary processing steps), which comprises a solid transparent, or at least light-transmitting, sheet or layer having refractive index variations and/or having variations in the layer thickness, i.e. having surface relief features.
  • Such systems are useful, for example as holographic recording materials, or in the production of microlens arrays, or light- diffusing or de-pixelating screens or in security applications such as printing on currency notes, certificates, credit cards, bank cards or other secure documents.
  • a monomer or monomers capable of undergoing free-radical-initiated polymerisation a photo-initiator capable of generating free radicals on exposure to radiation of pedetermined wavelengths and a polymeric matrix or binder.
  • a photo-initiator capable of generating free radicals on exposure to radiation of pedetermined wavelengths
  • a polymeric matrix or binder examples of such known systems or mixtures are disclosed in for example U.S. Patents Nos. 5470662, 4963471, 4942112, 3658526. It is among the objects of the present invention to provide an improved photopolymerisable system or mixture suitable for stencil or inkjet printing, for example, useful for the formation of security encoding films.
  • a photopolymerisable system capable of polymerisation to form a solid, light-transmitting material having volume ref active index variations and/or surface relief features dependent on the exposure of the system to polymerising radiation, wherein the system includes a silicone acrylic compound or compounds.
  • the system may additionally include a compatible polymer, e.g. polymers or copolymers with similar groups to the silicone prepolymer.
  • Compatible polymers which may be used include PVA, polysiloxane polymers or acrylic type polymers such as PMMA.
  • the system may also include thixotropic agents or thickeners to impart to the system rheological properties suitable for stencil printing or inkjet printing, i.e.such that the system or mixture may be used as a printing fluid or "ink” in stencil printing or in an inkjet printer.
  • a diffuser, hologram or other light-modifying structure formed by polymerisation of a system in accordance with the previously noted aspects of the invention.
  • a photopolymer blend capable of deposition onto a substrate (such as fabric, paper, plastics, metal or wood) to form text, drawings or shapes by the methods of stencil printing or inkjet printing and capable of polymerisation to form a solid, light transmitting material having volume refractive index variations or surface relief features by the exposure of the deposits of the blend to 'electromagnetic or other radiation
  • the blend includes a monomer, prepolymer, macromonomer or co-monomer comprising silicone groups, that is to say groups with a
  • a method of making a light-diffusing material comprising providing a photopolymerisable system capable of polymerisation to form a solid, light-transmitting material having volume refractive index variations and/or surface relief features dependent on the exposure of the system to polymerising radiation, and which method comprises exposing a layer provided by said system to polymerising radiation through an optical aperture screen to polymerise the- material and subsequently polymerising any of the material still unpolymerised
  • a method of making a light-diffusing material comprising providing a photopolymerisable system capable of polymerisation to form a solid, light-transmitting material having volume refractive index variations and/or surface relief features dependent on the exposure of the system to polymerising radiation, and which method comprises exposing a layer provided by said system to polymerising radiation without any intervening mask and without other means of producing small scale variation of light intensity with position in the layer.
  • said system includes a silicone acrylate or similar compound or compounds.
  • the polymerising radiation is preferably parallel (collimated) or substantially parallel radiation.
  • the density of the dye may also vary with distance from one surface of such layer, i.e. may vary along a perpendicular to the plane of the layer.
  • the method comprises, in a first stage, exposing a layer provided by said system to polymerising radiation through an optical aperture screen to polymerise the material and subsequently, in a second stage, polymerising any of the material still unpolymerised, for example by blanket exposure to polymerising radiation.
  • a method of providing printed text, legends, shapes, drawings or pictures on a substrate in a light diffusing, hologram or other light modifying material comprising printing, for example stencil printing or inkjet printing, a liquid photopolymer blend onto said substrate and exposing the printed photopolymer blend to electromagnetic or other radiation to bring about polymerisation.
  • the system comprises:-
  • At least one thixotropic agent and/or at least one thickener (such as Rheocin or Thixin) capable of imparting thixotropic properties, tack and slump characteristics for stencil printing or inkjet printing, and
  • a dye for example blue, red or green
  • a dye for example blue, red or green
  • component (b) which may be used include :-
  • Genomer 4302 (Aliphatic Polyester Triurethane Triacrylate, hazardous component being urethane acrylate 100%) RI - 1.509
  • Photomer 4810 F (Ester of acrylic acid and isoCIO alcohol) or Isodecyl (IDA)
  • Genomer 4269/M22 aliphatic diranctional urethane acrylate diluted in Genomer
  • TMPTA Trimethylopropane triacrylate
  • polyester or polyether acrylates which may impart flexibility to the polymerised material.
  • N-vinyl pyrrolidinone N-vinyl pyrrolidinone
  • the system may additionally include a compatible polymer, e.g. polymers or copolymers with similar groups to the silicone prepolymer.
  • a compatible polymer e.g. polymers or copolymers with similar groups to the silicone prepolymer.
  • Compatible polymers or binders which may be used include PVA, polysiloxane polymers or acrylic-type polymers such as PMMA.
  • the formulation may include:- BINDERS PVA MW 12800 PVA MW 10-15000 PMMA MW 3300 - 996000
  • the system may additionally include a thixotropic and/or thickening agents such as rheocin and or thixcin.
  • the system may additionally include solvent or dispersed dyes in red, blue and/or green such as:
  • Solvent Red 19 (Sudan Red 7B), Solvent Red 23 (Sudan III), Solvent Red 24 Sudan IV), Solvent Red 26 (Oil Red EGN), Solvent Red 27 (Oil RedO), Solvent Red 41 (Basic Fuchin), Solvent Red 43 (Eosin Y, free acid), Solvent Red 45 (Ethyl Eosin), Solvent Red 49 (Rhodamine B base), Solvent Red 72 (4',5'- Dibromofluorescein), Solvent Blue 14 (Oil Blue N), Solvent Blue 35 (Sudan Blue II), Solvent Blue 38 (Luxol® Fast Blue MBSN), Solvent Blue 59 (Atlasol Blue 2N, l,4-bis(emylammo)-9,10-anthraquinone), Solvent Green 1 (Malachite Green base), Solvent Green 3, Solvent Green 7 (8-hydroxy-l,3,6-pyrenetrisulfonic acid, trisodium salt), Solvent Green 11 (Luxol® Brilliant
  • silicone acrylate and monomer blends i.e. silicone acrylate and monomer blends; silicone acrylate or silicone methacrylate alone; silicone/acrylate monomer blends
  • various other components such as flexibilisers, binders, other monomers, stabilisers, defoamers, thixotropic agents, thickening agents, dyes, antioxidants, photoinitiators and amine synergists.
  • Poly(ethylene glycol)methyl ether (average Mn ca. 5,000,T m 52°)
  • Photomer 481 OF (Ester of acrylic acid and isoCIO alcohol) or Isodecyl (IDA)
  • Irgacure 184 (1-hydroxycyclohexylphenylketone)
  • Irgacure 369 (2-beri2yl-2-(dimethylamino)-4'-mo ⁇ holino-butyrophenone)
  • Speedcure ITX (a mixture of * 2-isopropylthioxanthanone and 4- isopropylthioxanthanone - a Type II initiator which requires an amine synergist)
  • Actilane 800 is a silicone difunctional acrylate product from Akros Chemicals Ltd., Manchester; Daracure 1173 is 2-hydroxy-2- methyl- 1 -phenyl- 1-propanone; NVP is N-vinyl pyrrolidinone; PVA is poly(vinyl acetate) MW 12,800; TMPTA is trimethylolpropane triacrylate; POEA is 2-phenoxyethyl acrylate; Rahn 99-662 is a silicone acrylate a product from RAHN AG, Switzerland.
  • the Actilane 800 and Rahn 99-622 materials referred to are examples of materials referred to generally as silicone acrylates, and are also known as acrylate terminated poly (dimethylsiloxanes) (PDMS). Silicone acrylates useful in the context of the invention may also include aliphatic, phenyl, other aromatic or cyclic groups, or vinyl groups in addition to or as an alternative to methyl groups.
  • silicone copolymers such as silicone methylacrylates or silicone acrylamide and silicone epoxy pre-polymers may be used instead of the silicone acrylate prepolymers referred to herein.
  • a light-diffusing screen for use as a rear projection screen or a depixelating screen, is made by a technique similar to that disclosed in European Patent No. 0294122 or European Patent No. 0530269, and in which 'technique, a layer of photopolymerisable material is applied to an optical mask featuring a plurality of light-transmitting apertures or windows in an opaque background or a plurality of opaque spots or patches in a light-transmitting background, these apertures or patches being on a microscopic scale (typically about 2 microns, and up to about 10 microns maximum dimension).
  • optical diffusers using masks substantially of the kind disclosed in EP-0801767.
  • the mask took the form of a photographic negative or transparency in the conventional form of a glass plate bearing on one side a gelatine layer incorporating opaque silver grains.
  • the photopolymerisable mixture or system was coated directly onto the gelatine side of the prepared mask.
  • optical diffusers are manufactured by a process which is similar but in which no mask is used, the photopolymerisable mixture or system being coated directly onto a plain, transparent sheet or film.
  • masks were prepared by being cleaned in acetone or chloroform or a 5% solution of "Decon Neutracon” in acetone or a 5% solution of "Decon Neutracon” in distilled water. After such cleaning, the mask was dried, then a 1% solution of Glassclad 18 (a proprietary release agent) in distilled water was applied for 10 to 20 seconds to the gelatine side of the mask, whereafter the mask was air-dried for 24 hours.
  • a plain glass plate or tile was used instead of a developed photographic plate, the plain glass plate being prepared by cleariing in acetone.
  • a laser cut stainless steel stencil was placed on a plastic tile or mylar sheet or paper and secured with appropriate pressure.
  • a stirred polymerisable formulation of appropriate rheology as characterised by rheological studies was placed on the stencil and rolled across the stencil by using a rubber or stainless steel squeegee.
  • the stencil was lifted off the substrate and the tile, sheet or paper was placed in a ultra-violet light exposure apparatus under a source of ultra-violet light for a standard period, (e.g. two minutes).
  • a standard period e.g. two minutes
  • the tile or plate was then turned turned over and similarly exposed for a further period to provide a "blanket" exposure.
  • the polymerisation of the systems in accordance with the invention is in general inhibited by contact with oxygen, it is necessary to exclude oxygen, either by providing a covering layer of impermeable material such as plastics film or by a blanket of inert gas, during exposure.
  • a photopolymerisable system of appropriate rheology is loaded onto a drop-on-demand or continuous jet printer and dots of the photopolymer system are printed onto paper or plastic and cured in ultra-violet light for a standard period (e.g. two minutes) in an inert atmosphere.
  • optical density of the mask was typically 1.6.
  • Optical density is defined in accordance with the following equation:-
  • transmittance is the proportion of the light striking the mask which is allowed to pass through it and OD is the optical density.
  • An optical density of 1.6 allows about 3% of the light to pass through.
  • Table 1 sets out, for each of a plurality of trials, the respective formulation in accordance with the invention, (the components of each formulation or system being set out under the heading “Forrnulation”), the portions of the respective components, (these being set out in the column headed “Parts” in the same sequence as set out in the column “Formulation”), the optical density of each mask being set out in the column headed "Mask” and the characteristics of the resulting diffuser being summarised in the column headed "Comments”.
  • the characters in the brackets in the first column are codes identifying the particular system of formulation concerned. These codes are used to identify the respective formulations in the discussion below.
  • the indications "SURFACE RELIEF” and “VOLUME EFFECT” indicate respectively that the light-diffusive effect appeared to be entirely or almost entirely due to surface relief produced in accordance with the mask pattern, and that at least a significant part of the light-diffusing effect appeared to be due to refractive index variations within the bulk of the photopolymer layer. Whether the light-diffusing effect was due to surface relief or to refractive index variations in the volume of the photopolymer layer was assessed by application of an index matching fluid such as propan-2-ol to the free surface of the photopolymer. If such application of propan-2-ol removed the light-diffusive effect, the diffusion was considered to be due to surface relief, whereas if it did not, the diffusion was considered to be due to refractive index variations in the volume of the material.
  • an index matching fluid such as propan-2-ol
  • the photopolymerisation of some of the systems in accordance with the present invention is believed to be somewhat complex, in that it is believed that significant copolymerisation with the monomeric components (such as the NVP, POEA or TMPTA, etc. (also illustrated in Figure 11)), takes place and quite possibly a degree of crosslinking between the monomers (TMPTA, etc., ) and the silicone acrylate and even between these and the PVA (where present).
  • the monomeric components such as the NVP, POEA or TMPTA, etc. (also illustrated in Figure 11)
  • photopolymerisation of the silicone acrylate and monomer commences in the immediate area exposed to ultra-violet light, followed by migration, by diffusion, of monomer and silicone prepolymer from the imexposed regions into the exposed regions, accompanied by further polymerisation, including co-polymerisation, and even a degree of cross-linking, in the exposed regions, leaving a deficit of prepolymer and monomer in the unexposed areas.
  • the PVA incorporated in some of the formulations indicated is added in order to increase the viscosity of the system, to assist in handling and processing of the coated masks, and to improve the mechanical properties of the end product, by improving flexibility etc., the PVA being effectively dissolved in the monomer and polymer. It is believed however, that during the UV curing described, some (beneficial) chemistry involving the PVA may also take place, including bonding or cross-linking with the monomer and/or with the functional groups of the silicone acrylate.
  • the alternatives to PVA noted herein by way of further compatible polymers likewise serve to increase viscosity of the uncured system and to improve flexibility in the end product.
  • the Actilane 800 material and the Rahn 99-622 material referred to above, (and the Rahn 00-225 material referred to below), are prepolymers or macromonomers comprising molecules of significant molecular weight comprising a plurality of acrylic and siloxane groups, the molecules typically comprising an inorganic silicone backbone with pendant methyl groups. These materials, in the presence of free radicals, are able to undergo still further polymerisation. More particularly, these materials may comprise solutions of said prepolymers or macromonomers in further compatible monomers.
  • the NVP, TMPTA and POEA referred to are ethylenically unsaturated monomers capable of polymerisation in the presence of free radicals.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Forklifts And Lifting Vehicles (AREA)

Abstract

L'invention concerne un mélange ou un système photopolymère pouvant être déposé sur un substrat (de type tissu, papier, plastique, métal ou bois) afin de former un texte, des dessins ou des formes selon un procédé d'impression de type impression au pochoir ou impression par jet d'encre, et pouvant être polymérisé afin de former un matériau de transmission optique, solide, qui présente des variations volumiques d'indice de réfraction ou des caractéristiques de relief de surface par exposition des dépôts dudit mélange à des rayonnements électromagnétiques ou autres. Ledit mélange comprend un monomère, un prépolymère, un macromonomère ou un co-monomère comportant des groupes silicone, et au moins un composant du système présente une insaturation éthylénique de façon que le système peut subir une polymérisation radicalaire. Ledit mélange ou association peut également contenir diverses combinaisons d'agents thixotropes, et/ou d'épaississants et/ou de colorants ou de pigments.
PCT/GB2002/005322 2001-11-27 2002-11-27 Films optiques imprimes, a sechage par uv WO2003046661A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB0412568A GB2398074A (en) 2001-11-27 2002-11-27 Printed uv cured optical films
AU2002343096A AU2002343096A1 (en) 2001-11-27 2002-11-27 Printed uv cured optical films

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0128381A GB0128381D0 (en) 2001-11-27 2001-11-27 Printed UV cured light management films
GB0128381.1 2001-11-27

Publications (1)

Publication Number Publication Date
WO2003046661A1 true WO2003046661A1 (fr) 2003-06-05

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PCT/GB2002/005322 WO2003046661A1 (fr) 2001-11-27 2002-11-27 Films optiques imprimes, a sechage par uv

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AU (1) AU2002343096A1 (fr)
CA (1) CA2412712A1 (fr)
GB (2) GB0128381D0 (fr)
WO (1) WO2003046661A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004060983A1 (fr) * 2002-12-31 2004-07-22 3M Innovative Properties Company Procede de modification de surface d'un substrat polymerique
WO2005124460A1 (fr) * 2004-06-15 2005-12-29 Andreas Heeschen Compositions photopolymerisables sans liant
US8603730B2 (en) 2004-06-22 2013-12-10 Xetos Ag Photopolymerisable composition
EP2890749B1 (fr) 2012-08-31 2018-05-16 Armstrong World Industries, Inc. Revêtements durables durcissables par uv

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3658526A (en) * 1969-08-25 1972-04-25 Du Pont Hologram recording in photopolymerizable layers
US4842968A (en) * 1984-12-14 1989-06-27 Sony Corporation Hologram recording medium
EP0407771A2 (fr) * 1989-07-14 1991-01-16 E.I. Du Pont De Nemours And Company Compositions photopolymérisables et éléments pour holographie par la formation d'images d'indice de réfraction
WO1997013183A1 (fr) * 1995-10-06 1997-04-10 Polaroid Corporation Support et procede holographique
JPH09318803A (ja) * 1996-05-27 1997-12-12 Sumitomo Rubber Ind Ltd 液晶カラーフィルタの製造方法
US5702846A (en) * 1994-10-03 1997-12-30 Nippon Paint Co. Ltd. Photosensitive composition for volume hologram recording
US5861444A (en) * 1992-11-09 1999-01-19 Fujitsu Limited Refractive index imaging material
EP1154323A1 (fr) * 1999-11-12 2001-11-14 Nippon Sheet Glass Co., Ltd. Composition photosensible, element a guide d'onde optique et procede de production dudit element
WO2001086647A2 (fr) * 2000-05-10 2001-11-15 California Institute Of Technology Variation du contraste de phase d'une matiere refringente photo-induite
WO2002039183A1 (fr) * 2000-11-10 2002-05-16 Durand Technology Limited Materiaux d'enregistrement optique
WO2002086623A1 (fr) * 2001-04-20 2002-10-31 Durand Technology Limited Materiaux d'enregistrement optique

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3658526A (en) * 1969-08-25 1972-04-25 Du Pont Hologram recording in photopolymerizable layers
US4842968A (en) * 1984-12-14 1989-06-27 Sony Corporation Hologram recording medium
EP0407771A2 (fr) * 1989-07-14 1991-01-16 E.I. Du Pont De Nemours And Company Compositions photopolymérisables et éléments pour holographie par la formation d'images d'indice de réfraction
US5861444A (en) * 1992-11-09 1999-01-19 Fujitsu Limited Refractive index imaging material
US5702846A (en) * 1994-10-03 1997-12-30 Nippon Paint Co. Ltd. Photosensitive composition for volume hologram recording
WO1997013183A1 (fr) * 1995-10-06 1997-04-10 Polaroid Corporation Support et procede holographique
JPH09318803A (ja) * 1996-05-27 1997-12-12 Sumitomo Rubber Ind Ltd 液晶カラーフィルタの製造方法
EP1154323A1 (fr) * 1999-11-12 2001-11-14 Nippon Sheet Glass Co., Ltd. Composition photosensible, element a guide d'onde optique et procede de production dudit element
WO2001086647A2 (fr) * 2000-05-10 2001-11-15 California Institute Of Technology Variation du contraste de phase d'une matiere refringente photo-induite
WO2002039183A1 (fr) * 2000-11-10 2002-05-16 Durand Technology Limited Materiaux d'enregistrement optique
WO2002039184A1 (fr) * 2000-11-10 2002-05-16 Durand Technology Limited Materiaux d'enregistrement optique
WO2002039185A1 (fr) * 2000-11-10 2002-05-16 Durand Technology Limited Matieres optiques d'enregistrement
WO2002086623A1 (fr) * 2001-04-20 2002-10-31 Durand Technology Limited Materiaux d'enregistrement optique

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section PQ Week 199809, Derwent World Patents Index; Class P81, AN 1998-091121, XP002238163 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004060983A1 (fr) * 2002-12-31 2004-07-22 3M Innovative Properties Company Procede de modification de surface d'un substrat polymerique
WO2005124460A1 (fr) * 2004-06-15 2005-12-29 Andreas Heeschen Compositions photopolymerisables sans liant
US8603730B2 (en) 2004-06-22 2013-12-10 Xetos Ag Photopolymerisable composition
EP2890749B1 (fr) 2012-08-31 2018-05-16 Armstrong World Industries, Inc. Revêtements durables durcissables par uv

Also Published As

Publication number Publication date
CA2412712A1 (fr) 2003-05-27
GB2398074A (en) 2004-08-11
GB0128381D0 (en) 2002-01-16
GB0412568D0 (en) 2004-07-07
AU2002343096A1 (en) 2003-06-10

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JP2001226420A (ja) 重合性組成物

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