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WO2002018100A3 - Procede et appareil permettant de mesurer un etat de polissage - Google Patents

Procede et appareil permettant de mesurer un etat de polissage Download PDF

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Publication number
WO2002018100A3
WO2002018100A3 PCT/IB2001/001532 IB0101532W WO0218100A3 WO 2002018100 A3 WO2002018100 A3 WO 2002018100A3 IB 0101532 W IB0101532 W IB 0101532W WO 0218100 A3 WO0218100 A3 WO 0218100A3
Authority
WO
WIPO (PCT)
Prior art keywords
wafer
measuring
polishing condition
picture
measurement site
Prior art date
Application number
PCT/IB2001/001532
Other languages
English (en)
Other versions
WO2002018100A2 (fr
Inventor
David Haggart
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Priority to EP01956736A priority Critical patent/EP1315598A2/fr
Priority to JP2002523057A priority patent/JP2004507900A/ja
Priority to KR10-2003-7002903A priority patent/KR20030024920A/ko
Publication of WO2002018100A2 publication Critical patent/WO2002018100A2/fr
Publication of WO2002018100A3 publication Critical patent/WO2002018100A3/fr

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • B24B37/013Devices or means for detecting lapping completion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)

Abstract

L'invention concerne un procédé permettant de déterminer l'état d'une surface, tel que l'épaisseur ou la réflectivité, de n'importe quelle zone sur une plaquette (16) pendant un polissage chimico-mécanique (PCM). Ce procédé consiste, dans un premier temps, à choisir une zone d'un site de mesure sur la surface de la plaquette; puis, à capturer une image (22) de la surface se trouvant dans la limite du site de mesure, par exemple, à travers une fenêtre (14); puis, à analyser ladite image. Ce procédé permet d'obtenir un critère d'évaluation précis et une épaisseur finale précise d'une couche spécifique sur la plaquette.
PCT/IB2001/001532 2000-08-31 2001-08-27 Procede et appareil permettant de mesurer un etat de polissage WO2002018100A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP01956736A EP1315598A2 (fr) 2000-08-31 2001-08-27 Procede et appareil permettant de mesurer un etat de polissage
JP2002523057A JP2004507900A (ja) 2000-08-31 2001-08-27 研磨状態を測定するための方法と装置
KR10-2003-7002903A KR20030024920A (ko) 2000-08-31 2001-08-27 폴리싱 상태를 측정하기 위한 방법 및 장치

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65289800A 2000-08-31 2000-08-31
US09/652,898 2000-08-31

Publications (2)

Publication Number Publication Date
WO2002018100A2 WO2002018100A2 (fr) 2002-03-07
WO2002018100A3 true WO2002018100A3 (fr) 2002-05-16

Family

ID=24618652

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2001/001532 WO2002018100A2 (fr) 2000-08-31 2001-08-27 Procede et appareil permettant de mesurer un etat de polissage

Country Status (5)

Country Link
EP (1) EP1315598A2 (fr)
JP (1) JP2004507900A (fr)
KR (1) KR20030024920A (fr)
TW (1) TW534854B (fr)
WO (1) WO2002018100A2 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1302522C (zh) * 2002-05-15 2007-02-28 旺宏电子股份有限公司 一种化学机械抛光装置的终点侦测系统
JP4464642B2 (ja) 2003-09-10 2010-05-19 株式会社荏原製作所 研磨状態監視装置、研磨状態監視方法、研磨装置及び研磨方法
US8547538B2 (en) * 2011-04-21 2013-10-01 Applied Materials, Inc. Construction of reference spectra with variations in environmental effects
JP2013122956A (ja) * 2011-12-09 2013-06-20 Disco Abrasive Syst Ltd 加工装置
KR102715402B1 (ko) 2019-01-28 2024-10-11 보레알리스 아게 중합체 조성물의 제조 방법
US20230026751A1 (en) * 2019-12-03 2023-01-26 Ebara Corporation Polishing apparatus and polishing method
JP7648403B2 (ja) * 2021-02-19 2025-03-18 株式会社岡本工作機械製作所 研削方法及び研削装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11198033A (ja) * 1997-10-31 1999-07-27 Canon Inc 研磨装置及び研磨方法
WO1999064205A1 (fr) * 1998-06-08 1999-12-16 Speedfam-Ipec Corporation Procede et appareil de detection de point d'extremite lors d'un polissage chimico-mecanique
JP2000033561A (ja) * 1998-07-21 2000-02-02 Dainippon Screen Mfg Co Ltd 終点検出装置、終点検出方法
US6102775A (en) * 1997-04-18 2000-08-15 Nikon Corporation Film inspection method
US6142855A (en) * 1997-10-31 2000-11-07 Canon Kabushiki Kaisha Polishing apparatus and polishing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6102775A (en) * 1997-04-18 2000-08-15 Nikon Corporation Film inspection method
JPH11198033A (ja) * 1997-10-31 1999-07-27 Canon Inc 研磨装置及び研磨方法
US6142855A (en) * 1997-10-31 2000-11-07 Canon Kabushiki Kaisha Polishing apparatus and polishing method
WO1999064205A1 (fr) * 1998-06-08 1999-12-16 Speedfam-Ipec Corporation Procede et appareil de detection de point d'extremite lors d'un polissage chimico-mecanique
JP2000033561A (ja) * 1998-07-21 2000-02-02 Dainippon Screen Mfg Co Ltd 終点検出装置、終点検出方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 05 14 September 2000 (2000-09-14) *

Also Published As

Publication number Publication date
WO2002018100A2 (fr) 2002-03-07
JP2004507900A (ja) 2004-03-11
EP1315598A2 (fr) 2003-06-04
TW534854B (en) 2003-06-01
KR20030024920A (ko) 2003-03-26

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