+

WO2002043133A1 - Alignment method for chip mounter - Google Patents

Alignment method for chip mounter Download PDF

Info

Publication number
WO2002043133A1
WO2002043133A1 PCT/JP2000/008199 JP0008199W WO0243133A1 WO 2002043133 A1 WO2002043133 A1 WO 2002043133A1 JP 0008199 W JP0008199 W JP 0008199W WO 0243133 A1 WO0243133 A1 WO 0243133A1
Authority
WO
WIPO (PCT)
Prior art keywords
head
recognition
control
substrate holding
holding stage
Prior art date
Application number
PCT/JP2000/008199
Other languages
French (fr)
Japanese (ja)
Inventor
Akira Yamauchi
Yoshiyuki Arai
Original Assignee
Toray Engineering Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2000069007A priority Critical patent/JP2001217596A/en
Application filed by Toray Engineering Co., Ltd. filed Critical Toray Engineering Co., Ltd.
Priority to PCT/JP2000/008199 priority patent/WO2002043133A1/en
Priority to KR10-2003-7006520A priority patent/KR20030055301A/en
Publication of WO2002043133A1 publication Critical patent/WO2002043133A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/04Mounting of components, e.g. of leadless components
    • H05K13/0404Pick-and-place heads or apparatus, e.g. with jaws
    • H05K13/0413Pick-and-place heads or apparatus, e.g. with jaws with orientation of the component while holding it; Drive mechanisms for gripping tools, e.g. lifting, lowering or turning of gripping tools
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/08Monitoring manufacture of assemblages
    • H05K13/081Integration of optical monitoring devices in assembly lines; Processes using optical monitoring devices specially adapted for controlling devices or machines in assembly lines
    • H05K13/0815Controlling of component placement on the substrate during or after manufacturing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54473Marks applied to semiconductor devices or parts for use after dicing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Definitions

  • the present invention relates to an alignment method in a chip mounting apparatus for mounting a chip on a substrate.
  • chip mounting is performed by precisely positioning a chip held by a head and a mounting position of a substrate supported by a substrate holding stage arranged below the chip. Lower the head when mounting.
  • the positional deviation amount of both recognition marks is set within the target accuracy range. It is difficult.
  • An object of the present invention is to provide an alignment method in a chip mounting apparatus capable of performing high-precision alignment in a short time in view of such a drawback. Disclosure of the invention
  • the inventors of the present invention have conducted intensive studies in order to solve the conventional disadvantages.Firstly, after completing the control for setting the rotation error within the set range, the present inventors have performed only the parallel movement control without performing the rotation control. As a result, the present inventors have found that a decrease in alignment accuracy does not occur, and have arrived at the present invention.
  • one of the alignment methods in the chip mounting apparatus includes a recognition mark provided on a chip held by the head and a substrate holding stage arranged below the head.
  • the head and the substrate holding unit are configured to recognize the recognition mark provided on the supporting substrate by the recognition unit, and to correct the positional deviation amount of the two recognition marks so as to be within the target accuracy range.
  • An array in a chip mounting device configured to be able to perform parallel movement control and rotation control of only one of the stages In the mounting method, first, at least the rotation control is performed so that the rotation direction error between the two recognition marks is within a set range, and then, after the completion thereof, only the parallel movement control is performed. I do.
  • the chip mounting apparatus is configured to be capable of controlling the parallel movement and rotation of the head, but it is difficult for the substrate holding stage, or conversely, the parallel movement of the substrate holding stage.
  • a chip mounting device that is configured to perform control and rotation control, but it is difficult for the head to perform the rotation control, first, at least the rotation control is performed so that the rotation direction error is within a set range. Then, after the completion, the alignment is performed by performing only the parallel movement control, so that the error caused by the deflection of the rotation axis does not occur during the parallel movement control, and the high-precision adjustment is performed. This makes it possible to perform the counting in a short time (that is, to reduce the number of times the alignment is repeated, thereby reducing the tact time of the apparatus).
  • another one of the alignment methods in the chip mounting apparatus is a recognition mark provided on a chip held by the head and a board disposed below the head.
  • the recognition head and the recognition mark provided on the substrate supported by the holding stage are recognized by the recognition unit, and the head and the head are corrected so that the positional deviation amount of both the recognition marks is corrected to be within the target accuracy range.
  • the rotation direction error of the two recognition marks may be set within a set range. First, at least the rotation control is performed, and then, after the rotation control is completed, only the parallel movement control is performed.
  • a rotation direction error is set within a set range. At least the rotation The control is performed, and then, after the completion of the control, the alignment is performed by performing only the parallel movement control. Therefore, the error caused by the deflection of the rotation axis does not occur during the parallel movement control.
  • high-precision alignment can be performed in a short time (that is, the number of times the alignment is repeated is reduced to reduce the tact time of the device).
  • the rotation control and translation control of the head and the rotation control and translation control of the substrate holding stage are performed to perform alignment, or the rotation control of both the head and the substrate holding stage is performed.
  • the parallel movement control of either the head or the substrate holding stage is performed to perform the alignment, or the rotation control of either the head or the substrate holding stage is performed.
  • Alignment is performed by performing translation control of both the head and the substrate holding stage, or rotation control and translation control of only one of the head and the substrate holding stage are performed.
  • rotation control of one of the head and the substrate holding stage for example, the head).
  • Other plate holding stage for example, it is possible to Arai e n t performs translation control of the substrate holding stage>.
  • Fig. 1 shows the recognition mark provided on the chip held by the head and the recognition mark provided on the substrate supported by the substrate holding stage, which are recognized by a two-field recognition means. It is a perspective view showing a figure.
  • FIG. 2 is an enlarged perspective view of a tool part of the head.
  • FIG. 1 shows a chip mounting apparatus.
  • This mounting apparatus includes an upper head 1, a lower substrate holding stage 2, and a two-view recognition means 3 that can move between the head 1 and the substrate holding stage 2.
  • the substrate holding stage 2 is mounted on a movable table 4 (hereinafter, this movable table is referred to as a stage-side movable table) capable of controlling translation and rotation.
  • the movable table 4 on the stage side includes a translation table 4b and a rotary table 4a mounted on the translation table 4b.
  • the substrate holding stage 2 is mounted on the rotary table 4a.
  • the substrate holding stage 2 can be translated in the X and Y directions in a horizontal plane by driving control of the movable table 4, and can be rotated around a vertical axis (Z direction) (0 direction). Further, a substrate 5 provided with a pair of recognition marks 6 is held at a predetermined position of the substrate holding stage 2 by vacuum suction.
  • the head 1 is a force mounted on the lifting table 8.
  • the lifting table 8 is driven by a servo motor 13 mounted on the upper frame 7 to control a pair of mounted on the upper frame 7. It is mounted so that it can move in the Z-axis direction (vertical direction) and move up and down.
  • the upper end of the upper frame 7 is connected to a movable table (hereinafter, referred to as “X”, “X” direction) and rotation (“0” direction) control mounted on the upper device frame (not shown).
  • This movable table is called the movable table on the head side.
  • the movable table on the head (not shown) is Similarly to the movable table 4 on the side, it is composed of a translation table and a rotary table, and the translation table located on the upper side is attached to the above-mentioned apparatus frame while the translation table is mounted on the apparatus frame.
  • the upper end of upper frame 7 is mounted on the rotary table located on the side.
  • the head 1 is composed of a block 9 mounted on the lifting table S and a tool 10 mounted on the lower end of the block 9.
  • Tool 10 is
  • a chip 12 with a built-in evening (not shown) and a pair of recognition marks 11 as shown in FIG. 2 is held by vacuum suction.
  • the pitch between the pair of recognition marks 6 provided on the substrate 5 and that of the chip 11 are provided at the same pitch (L).
  • the pitch (L) of these recognition marks 6 or 11 is set to a size that fits within each field of the two-field recognition means 3.
  • the two-view recognition means 3 is mounted on a translation table 15a of a movable table 15 capable of translation control and elevation control.
  • the movable table 15 is configured by attaching a parallel movement table 15a to a lifting table (not shown).
  • the two-field-of-view recognition means 3 can be moved from the retracted position to a position below the head 1 by the drive control of the movable table 15 and, conversely, moved from the retracted position to the retracted position. Can be done.
  • the height of the recognition means 3 for the two visual fields is adjusted to a predetermined height by controlling the elevation of the movable table 15. Therefore, according to this mounting apparatus, a pair of recognition marks 11 provided on the chip 12 held by the head 1 by suction and the board 5 provided by the board holding stage 2 by suction are provided.
  • the two recognition marks 6 are recognized by the two visual field recognition means 3 and can be aligned as follows.
  • the movable table 15 is driven to move the two-view recognition means 3 from the retracted position between the head 1 and the substrate holding stage 2, and the two-view recognition means 3 uses the two recognition marks 6, 1. Attempt to recognize (image) 1. At this time, if the head 1 and the substrate holding stage 2 are moved to a position where it is difficult to recognize all the upper and lower recognition marks 6 and 11, the movable side of the head (not shown) Alignment execution position by controlling the translation and / or rotation of the table and the movable table 4 on the stage or stage side, that is, recognizing all of the upper and lower parts within the visual field range of the two visual field recognizing means 3. Position marks 6 and 1 1.
  • the recognition of the recognition marks 6 and 11 by the two-view recognition means 3 can be performed by simultaneously recognizing all the recognition marks 6 and 11 or by recognizing the pair of recognition marks 6 provided on the substrate 5 and the chip 1 2 May be any of the individual recognition that separately performs the recognition of the pair of recognition marks 11 provided in. Note that, in this state, the substrate 5 on the substrate holding stage 2 is only roughly positioned with respect to the chip 12 held by the head 1 by suction. Then, the drive control of the movable table 4 on the stage side is performed so as to correct the position of the two recognition marks 6 and 11 based on the amount of misalignment and to make the correction as close as possible to the target accuracy range. Is performed.
  • drive control is performed so as to be as close as possible to the target range because the positional deviation between the two recognition marks 6 and 11 is large. This is because it is difficult to keep it within the range.
  • the translation control and the rotation control are performed in parallel.
  • a second alignment is performed through the same process as described above, and this alignment also causes the amount of displacement between the two recognition marks 6 and 11 to fall within the target accuracy range. If it is not possible, Then, the following alignments are performed one after another. At this time, if the rotation error in the previous alignment is within the set range, only the translation control is performed without performing the rotation control.
  • the setting range of the above rotation error is determined, for example, as follows.
  • the repetition accuracy of the translation table 4b is ⁇ 1 ⁇ m
  • the resolution of the rotary table 4a is 13.600 degrees
  • the runout error of the rotary axis is 5 rn.
  • the pitch L of the recognition marks 6 and 11 is 10 mm and the target accuracy is ⁇ 2.
  • the alignment can be performed without being affected by the run-out error of the rotary axis of the movable table 4 on the stage side (run-out error of the 0-axis center), and the number of repeats of the alignment can be reduced. As a result, the tact time can be shortened, and the alignment can be performed with high accuracy.
  • the recognition means 3 is moved from the position where the recognition marks 6 and 11 are recognized to the retracted position.
  • the alignment method is not limited thereto. That is, instead of this, the rotation control and the parallel movement control of only the head 1 may be performed to perform the same alignment.
  • the rotation control and the parallel movement control of only the head 1 may be performed to perform the same alignment.
  • the other of the head 1 and the substrate holding stage 2 for example, the substrate holding stage 2
  • the rotation control and the parallel movement control of both the head 1 and the substrate holding stage 2 may be performed to perform the same alignment.
  • the rotation control of both the head 1 and the substrate holding stage 2 is performed, and the parallel movement control of one of the head 1 and the substrate holding stage 2 is performed. May be included.
  • the above-described chip mounting apparatus is configured to perform the parallel movement control and the rotation control of both the head 1 and the substrate holding stage 2.
  • the head 1 is mounted on the movable table (the movable table on the head side) capable of controlling the parallel movement and the rotation
  • the substrate holding stage 2 is controlled by the parallel movement and the rotation.
  • it is mounted on a movable table that can be controlled (the movable table 4 on the stage side).
  • the parallel movement control and the rotation control are performed in parallel until the rotation error of the two recognition marks 6 and 11 falls within the set range, and after the rotation error enters the set range, although only the parallel movement control is performed, only the rotation control may be performed until the rotation error falls within the set range.
  • the chip mounting apparatus is not limited to the one configured as in the above embodiment, but may be any one of the head 1 and the substrate holding stage 2. It may be configured such that only one of the translation control and the rotation control can be performed.
  • the head 1 is mounted on a movable table on the head side capable of controlling translation and rotation, but the substrate holding stage 2 is not mounted (fixed) as such, or The substrate holding stage 2 is mounted on the movable table on the stage side where parallel movement control and tillage control can be performed, but the head 1 is not mounted as such. ).
  • the chip mounting device refers to a mounting device for mounting a chip, a bonding device for bonding the chip, or the like, and includes a heating type, a non-heating type, a pressure type, and a non-pressure type.
  • a chip refers to a semiconductor chip, an IC chip, an optical element, a wafer, or the like, a mounting object to be mounted or bonded to a substrate regardless of its type and size.
  • the substrate is, for example, a resin substrate, a glass substrate, a film substrate, or the like, and is an object on which the chip is mounted or bonded.
  • the two-view recognition means has two optical axes, for example, a recognition camera such as a CCD camera, an infrared camera, an X-ray camera, a sensor, or the like. Anything that can recognize (or image) the object.
  • the head may be equipped with or without a heater, and the holding of the chip and / or the substrate may be performed by means other than vacuum suction. It may be holding.
  • the recognition marks provided on the chip and the substrate for example, only marks for specific purposes such as holes, grooves, printed marks, etc., their types and sizes, calibration, alignment, etc. Instead, any form may be used as long as it is suitable as a recognition mark. It should be noted that not only a pair but also a different form, for example, a single or two or more may be provided.
  • the recognition means for recognizing the recognition mark 6 provided on the substrate and the recognition mark 11 provided on the chip is not limited to the recognition means 3 for the two visual fields provided in an integrated form.
  • the axis and the lower optical axis may be provided in a form independent of each other (a form divided into two units) so that each of them can operate freely. Any camera, infrared camera, X-ray camera, sensor, etc. can be used as long as it can recognize (or image) the recognition mark.
  • the rotary table which is a moving means of the substrate holding stage
  • the rotary table may not be provided at the top, that is, may be provided below the translation table. The one installed at the top is used.
  • the alignment method in the chip mounting apparatus according to the present invention can perform high-precision alignment in a short time. Useful as a method.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Operations Research (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Supply And Installment Of Electrical Components (AREA)
  • Wire Bonding (AREA)

Abstract

A method for precise alignment while in a short tact time by a small number of alignments for a chip mounter is disclosed. A recognition mark (11) made on a chip (12) held by a head (1) and a recognition mark (6) made on a substrate (5) supported by a substrate supporting stage (2) are recognized by a recognition means (3) having two visual fields, and the positional difference between both of the recognition marks (6, 11) is corrected to lie within a range of target accuracy by parallel movement control and rotation control of a rotatable table (4). To reduce the error in rotation method within a specified range, at least the rotation control is first performed, and after the control, the parallel movement control alone is performed.

Description

明 細 書 チップ実装装置におけるァライ メ ン ト方法 技術分野  Description Alignment method for chip mounting equipment
本発明は、 基板にチップを実装するチップ実装装置におけるァライ メ ン ト方法に関するものである。 背景技術  The present invention relates to an alignment method in a chip mounting apparatus for mounting a chip on a substrate. Background art
従来、 周知のよ う に、 チップ実装は、 ヘッ ドが保持しているチッ プと 、 その下方に配されている基板保持ステージに支持されている基板の実 装位匱とを精密に位置決めせしめた状態においてヘッ ドを降下させて実 装する。  Conventionally, as is well known, chip mounting is performed by precisely positioning a chip held by a head and a mounting position of a substrate supported by a substrate holding stage arranged below the chip. Lower the head when mounting.
その為、 かかる実装に先立って、 基板保持ステージをァライメ ン ト実 行位置へ移動せしめた状態、 すなわち, チップと基板とを粗位置決めし た状態において, 例えば、 チップ及び基板に設けられている所定の認識 マーク を二視野の認識手段で認識し、 両認識マーク の位置ずれ量を目標 精度範囲内にせしめるように基板保持ステージを所定に駆動制御する こ とによってチップと基板との精密位置合わせを行っている。  Therefore, prior to such mounting, in a state where the substrate holding stage is moved to the alignment execution position, that is, in a state in which the chip and the substrate are roughly positioned, for example, a predetermined position provided on the chip and the substrate is provided. Recognition marks are recognized by two field of view recognition means, and the precise positioning of the chip and the substrate is controlled by controlling the driving of the substrate holding stage so that the amount of displacement between the two recognition marks is within the target accuracy range. Is going.
なお、 その際、 そのように粗位僵決めした状態においては、 両認識マ —クの位置ずれ量が大きいので、 1 回のァライメ ン トでは、 かかる,位置 ずれ量を目標精度範囲内にせしめることが困難である。  In this case, in such a state where the coarse deviation is determined, since the positional deviation amount of both recognition marks is large, in one alignment, the positional deviation amount is set within the target accuracy range. It is difficult.
そこで、 複数回のァライメ ン トが余儀なく されていると共にその際、 基板保持ステージが装着されている可動テーブル、 或いは、 へッ ドが装 着されている可動テーブル、 又は、 両可動テーブルを駆動し、 . X軸方向 、 Y軸方向又は X Y両軸方向へ移動 (以下、 単に Γ平行移動」 という) させる と共に所定角度に回転させてァライメ ン 卜、 すなわち、 平行移動 と回転とをほぼ同時並行的 (以下、 単に 「並行的」 という) に行ってァ ライ メ ン ト している。 Therefore, multiple alignments are inevitable, and at this time, the movable table on which the substrate holding stage is mounted, the movable table on which the head is mounted, or both movable tables are driven. ,. Move in X-axis direction, Y-axis direction or XY-axis direction (hereinafter, simply referred to as “parallel movement”) At the same time, the rotation is performed at a predetermined angle, and the alignment is performed, that is, the translation and the rotation are performed almost simultaneously in parallel (hereinafter, simply referred to as “parallel”).
しかし、 前記の平行移動と回転とを並行的に行うァライ メン トによる と、 前回のァライ メン トによって平行移動誤差が設定範囲内になってい ても、 次に回転制御を実施すると、 回転軸心の振れ ( 0軸心の振れ) が 発生する為に、 前記の平行移動誤差が、 再び目標精度範囲を外れてしま い、 軸心の振れ誤差以下の精度を出すことができないという欠点を有し ていた。 また、 目標精度を達成すべく ァライ メ ン トを繰り返す回数が漸 增する為に、 タク トタイムが長くなるといった欠点を有した。  However, according to the alignment in which the parallel movement and the rotation are performed in parallel, even if the translation error is within the set range due to the previous alignment, when the rotation control is performed next, the rotation axis center is changed. Because of the occurrence of a run-out (run-out of the 0-axis), the above-mentioned translation error falls outside the target accuracy range again, and it is impossible to obtain an accuracy less than the run-out error of the axis. I was In addition, the number of times the alignment is repeated to achieve the target accuracy is gradually increased, which has the disadvantage of increasing the tact time.
本発明は、 このような欠点に鑑み、 高精度のァライ メ ン トを短時間 行う こ とができるチップ実装装置におけるァライメ ン ト方法を提供する こ とを目的と している。 発明の開示  An object of the present invention is to provide an alignment method in a chip mounting apparatus capable of performing high-precision alignment in a short time in view of such a drawback. Disclosure of the invention
本発明者らは、 従来の欠点を解消すべく鋭意検討の結果、 先ず、 回転 誤差を設定範囲内にする制御を完了させた後に、 回転制御を行わずに平 行移動制御のみを行う こ とによ り、 位置合わせ精度の低下が招来しない こ とを見出し、 本発明に想到したものである。  The inventors of the present invention have conducted intensive studies in order to solve the conventional disadvantages.First, after completing the control for setting the rotation error within the set range, the present inventors have performed only the parallel movement control without performing the rotation control. As a result, the present inventors have found that a decrease in alignment accuracy does not occur, and have arrived at the present invention.
すなわち、 本発明に係るチップ実装装置におけるァライ メン ト方法の 一つは、 へッ ドが保持しているチップに設けられた認識マークと前記へ ッ ドの下方に配されている基板保持ステージが支持している基板に設け られた認識マーク とを認識手段で認識し、 かつ、 両認識マークの位置ず れ量を補正して目標精度範囲内にせしめるよう に、 前記へッ ド及び前記 基板保持ステージの内のどち らか一方のみの平行移動制御及び回転制御 を行う ことができるように構成されたチッ プ実装装置におけるァライ メ ン ト方法において、 前記両認識マークの回転方向誤差を設定範囲内にせ しめるように、 先ず、 少なく とも前記回転制御を行い、 次いで、 それの 完了後、 前記平行移動制御のみを行う ことを特徴とする。 That is, one of the alignment methods in the chip mounting apparatus according to the present invention includes a recognition mark provided on a chip held by the head and a substrate holding stage arranged below the head. The head and the substrate holding unit are configured to recognize the recognition mark provided on the supporting substrate by the recognition unit, and to correct the positional deviation amount of the two recognition marks so as to be within the target accuracy range. An array in a chip mounting device configured to be able to perform parallel movement control and rotation control of only one of the stages In the mounting method, first, at least the rotation control is performed so that the rotation direction error between the two recognition marks is within a set range, and then, after the completion thereof, only the parallel movement control is performed. I do.
この発明によれば、 へッ ドの平行移動制御及び回転制御を行えるよう に構成されているが基板保持ステージのそれが困難なチッ プ実装装置、 又はこれと反対に、 基板保持ステージの平行移動制御及び回転制御を行 えるよう に構成されているがヘッ ドのそれが困難なチップ実装装置にお いて、 回転方向誤差を設定範囲内にせしめるよう に、 先ず、 少なく とも 前記回転制御を行い、 次いで、 それの完了後、 前記平行移動制御のみを 行ってァライ メ ン ト しているので, 前記平行移動制御のときに回転軸心 の振れに起因 した誤差が発生しなくなり、 高精度のァメイ メ ン ト を短時 間に行う (すなわち、 ァライ メ ン 卜の繰り返し回数を減ら して装置のタ ク 卜タイムを低減する) ことができる。  According to the present invention, the chip mounting apparatus is configured to be capable of controlling the parallel movement and rotation of the head, but it is difficult for the substrate holding stage, or conversely, the parallel movement of the substrate holding stage. In a chip mounting device that is configured to perform control and rotation control, but it is difficult for the head to perform the rotation control, first, at least the rotation control is performed so that the rotation direction error is within a set range. Then, after the completion, the alignment is performed by performing only the parallel movement control, so that the error caused by the deflection of the rotation axis does not occur during the parallel movement control, and the high-precision adjustment is performed. This makes it possible to perform the counting in a short time (that is, to reduce the number of times the alignment is repeated, thereby reducing the tact time of the apparatus).
また、 本発明に係るチップ実装装置におけるァライ メ ン ト方法の他の 一つは、 へッ ドが保持しているチップに設けられた認識マーク と前記へ ッ ドの下方に配されている基板保持ステージが支持している基板に設け られた認識マーク とを認識手段で認識し、 かつ、 両認識マークの位置ず れ量を補正して目標精度範囲内にせしめるよう に、 前記へッ ド及び前記 基板保持ステージの両方の平行移動制御及び回転制御を行う ことができ るよう に構成されたチップ実装装置におけるァライ メ ン ト方法において 、 前記両認識マークの回転方向誤差を設定範囲内にせしめるよう に、 先 ず、 少なく とも前記回転制御を行い、 次いで、 それの完了後、 前記平行 移動制御のみを行う ことを特徴とする。  Further, another one of the alignment methods in the chip mounting apparatus according to the present invention is a recognition mark provided on a chip held by the head and a board disposed below the head. The recognition head and the recognition mark provided on the substrate supported by the holding stage are recognized by the recognition unit, and the head and the head are corrected so that the positional deviation amount of both the recognition marks is corrected to be within the target accuracy range. In an alignment method for a chip mounting apparatus configured to be able to perform both parallel movement control and rotation control of the substrate holding stage, the rotation direction error of the two recognition marks may be set within a set range. First, at least the rotation control is performed, and then, after the rotation control is completed, only the parallel movement control is performed.
この発明によれば、 へッ ド及び基板保持ステージの両方の平行移動制 御及び回転制御を行えるよう に構成されたチップ実装装置において、 回 転方向誤差を設定範囲内にせしめるよう に、 先ず、 少なく とも前記回転 制御を行い、 次いで、 それの完了後, 前記平行移動制御のみを行ってァ ライ メ ン トするものであるので、 前記平行移動制御のときに回転軸心の 振れに起因した誤差が発生しなく なり, 高精度のァメイ メ ン トを短時間 に行う (すなわち、 ァライ メ ン トの緣り返し回数を減ら して装置のタク トタイムを低減する) こ とができる。 According to the present invention, in a chip mounting apparatus configured to perform parallel movement control and rotation control of both a head and a substrate holding stage, first, a rotation direction error is set within a set range. At least the rotation The control is performed, and then, after the completion of the control, the alignment is performed by performing only the parallel movement control. Therefore, the error caused by the deflection of the rotation axis does not occur during the parallel movement control. Thus, high-precision alignment can be performed in a short time (that is, the number of times the alignment is repeated is reduced to reduce the tact time of the device).
なお、 後者の発明においては、 次のようなァライメ ン トの実施態様が ある。  In the latter invention, there are the following embodiments of the alignment.
例えば、 へッ ドの回転制御及び平行移動制御と基板保持ステージの回 転制御及び平行移動制御とを行ってァライ メ ン ト したり 、 あるいは、 へ ッ ド及び基板保持ステージの両方の回転制御を行う と共にヘッ ド及び基 板保持ステージの内のどち らか一方の平行移動制御を行ってァライメ ン ト したり、 あるいは、 ヘッ ド及び基板保持ステージの内のどち らか一方 の回転制御を行う と共にヘッ ド及び基板保持ステージの両方の平行移動 制御を行ってァライメ ン ト した り、 あるいは、 ヘッ ド及び基板保持ステ ージの内のどち らか一方のみの回転制御及び平行移動制御を行ってァラ ィ メ ン ト したり 、 あるいは、 ヘッ ド及び基板保持ステージの内のどち ら か一方 (例えば、 ヘッ ド) の回転制御を行う と共にヘッ ド及び基板保持 ステージの他方 (例えば、 基板保持ステージ〉 の平行移動制御を行って ァライ メ ン トすることができる。 図面の簡単な説明  For example, the rotation control and translation control of the head and the rotation control and translation control of the substrate holding stage are performed to perform alignment, or the rotation control of both the head and the substrate holding stage is performed. At the same time, the parallel movement control of either the head or the substrate holding stage is performed to perform the alignment, or the rotation control of either the head or the substrate holding stage is performed. Alignment is performed by performing translation control of both the head and the substrate holding stage, or rotation control and translation control of only one of the head and the substrate holding stage are performed. Or rotation control of one of the head and the substrate holding stage (for example, the head). Other plate holding stage (for example, it is possible to Arai e n t performs translation control of the substrate holding stage>. BRIEF DESCRIPTION OF DRAWINGS
第 1 図は、 へッ ドが保持しているチップに設けられている認識マーク と基板保持ステージに支持されている基板に設けられている認識マーク とを二視野の認識手段で認識している姿を示す斜視図である。  Fig. 1 shows the recognition mark provided on the chip held by the head and the recognition mark provided on the substrate supported by the substrate holding stage, which are recognized by a two-field recognition means. It is a perspective view showing a figure.
第 2 図は、 ヘッ ドのツール部の拡大斜視図である。 発明を実施するための最良の形態 FIG. 2 is an enlarged perspective view of a tool part of the head. BEST MODE FOR CARRYING OUT THE INVENTION
第 1 図において、 チップ実装装置が示されている。 この実装装置は、 上方のヘッ ド 1 と, 下方の基板保持ステージ 2 と, 前記ヘッ ド 1 と基板 保持ステージ 2 との間へ移動し得る二視野の認識手段 3 とを備えている 。 基板保持ステージ 2 は、 平行移動制御及び回転制御が可能な可動テ一 ブル 4 (以下, この可動テーブルをステージ側の可動テーブルという。 ) に装着されている。  FIG. 1 shows a chip mounting apparatus. This mounting apparatus includes an upper head 1, a lower substrate holding stage 2, and a two-view recognition means 3 that can move between the head 1 and the substrate holding stage 2. The substrate holding stage 2 is mounted on a movable table 4 (hereinafter, this movable table is referred to as a stage-side movable table) capable of controlling translation and rotation.
なお、 ステージ側の可動テーブル 4は、 平行移動テーブル 4 b と、 こ の平行移動テーブル 4 b上に装着された回転テーブル 4 a とを備えてい る。 そして、 かかる回転テーブル 4 a上に基板保持ステージ 2が装着さ れている。  The movable table 4 on the stage side includes a translation table 4b and a rotary table 4a mounted on the translation table 4b. The substrate holding stage 2 is mounted on the rotary table 4a.
その為、 基板保持ステージ 2 は、 可動テーブル 4の駆動制御によって 水平面内において X , Y方向に平行移動され得ると共に、 鉑直軸 ( Z方 向) 周 り ( 0方向) に回転され得る。 また、 基板保持ステージ 2 の所定 位置に、 一対の認識マーク 6が設けられた基板 5が真空吸着せしめられ て支持される。  Therefore, the substrate holding stage 2 can be translated in the X and Y directions in a horizontal plane by driving control of the movable table 4, and can be rotated around a vertical axis (Z direction) (0 direction). Further, a substrate 5 provided with a pair of recognition marks 6 is held at a predetermined position of the substrate holding stage 2 by vacuum suction.
一方、 ヘッ ド 1 は、 昇降テーブル 8 に装着されている力 この昇降テ 一ブル 8 は、 上部フレーム 7 に装着されているサーポモータ 1 3 の駆動 制御によって, 上部フ レーム 7 に装着されている一対のレール 1 4で案 内されて Z軸方向 (鉛直方向) へ移動 (上下動) レ得るように装着され ている。  On the other hand, the head 1 is a force mounted on the lifting table 8. The lifting table 8 is driven by a servo motor 13 mounted on the upper frame 7 to control a pair of mounted on the upper frame 7. It is mounted so that it can move in the Z-axis direction (vertical direction) and move up and down.
また、 上部フ レーム 7 の上端は、 図示されていない上方の装置フ レー ムに装着されている平行 ( X , Y方向) 移動制御及び回転 ( 0方向) 制 御が可能な可動テーブル (以下、 この可動テーブルをヘッ ド側の可動テ 一ブルという。) に装着されている。  The upper end of the upper frame 7 is connected to a movable table (hereinafter, referred to as “X”, “X” direction) and rotation (“0” direction) control mounted on the upper device frame (not shown). This movable table is called the movable table on the head side.)
なお、 図示されていないへッ ド側の可動テーブルは、 上述のステージ 側の可動テーブル 4 と同様に、 平行移動テ一ブルと回転テーブルとで構 成され、 かつ、 上側に位置されている平行移動テ一ブルが上記装置フ レ ームに装着されていると共に下側に位置されている回転テーブルに上部 フ レーム 7 の上端が装着されている。 The movable table on the head (not shown) is Similarly to the movable table 4 on the side, it is composed of a translation table and a rotary table, and the translation table located on the upper side is attached to the above-mentioned apparatus frame while the translation table is mounted on the apparatus frame. The upper end of upper frame 7 is mounted on the rotary table located on the side.
また、 ヘッ ド 1 は、 昇降テーブル S に装着されたブロ ック 9 と, これ の下端に装着されたツール 1 0 とで構成されている。 ツール 1 0 は、 ヒ The head 1 is composed of a block 9 mounted on the lifting table S and a tool 10 mounted on the lower end of the block 9. Tool 10 is
—夕 (図示されていない) を内蔵していると共に、 第 2 図において示さ れているように、 一対の認識マーク 1 1 が設けられているチップ 1 2 を 真空吸着によ り保持する。 —A chip 12 with a built-in evening (not shown) and a pair of recognition marks 11 as shown in FIG. 2 is held by vacuum suction.
なお、 基板 5 に設けられている一対の認識マーク 6 同士のピッチと、 チップ 1 1 のそれとは、 同一ピッチ ( L ) に設けられている。 これらの 認識マーク 6又は 1 1 のピッチ ( L ) は、 二視野の認識手段 3 の各視野 内に収まる大きさ に設けられている。  The pitch between the pair of recognition marks 6 provided on the substrate 5 and that of the chip 11 are provided at the same pitch (L). The pitch (L) of these recognition marks 6 or 11 is set to a size that fits within each field of the two-field recognition means 3.
また、 二視野の認識手段 3 は、 平行移動制御及び昇降制御が可能な可 動テーブル 1 5の平行移動テーブル 1 5 a に装着されている。 なお、 こ の可動テーブル 1 5 は、 図示されていない昇降テーブルに平行移動テー ブル 1 5 a を装着して構成されている。  The two-view recognition means 3 is mounted on a translation table 15a of a movable table 15 capable of translation control and elevation control. The movable table 15 is configured by attaching a parallel movement table 15a to a lifting table (not shown).
その為、 二視野の認識手段 3 は、 可動テーブル 1 5 の駆動制 ,御によつ て、 退避位置からヘッ ド 1 の下方位置へ移動され得ると共に、 反対にそ こから前記退避位置へ移動され得る。 その際, 二視野の認識手睽 3 の高 さは、 可動テーブル 1 5 の昇降制御によって所定高さに調整される。 よって、 この実装装置によると, ヘッ ド 1 が吸着保持しているチップ 1 2 に設けられている一対の認識マーク 1 1 と、 基板保持ステージ 2 が 吸着保持している基板 5.に設けられている一対の認識マーク 6 とをニ視 野の認識手段 3で認識して次のよう にしてァライ メ ン トすることができ る。 先ず、 可動テーブル 1 5が駆動されて二視野の認識手段 3が退避位置 からヘッ ド 1 と基板保持ステージ 2 との間に移動され、 そして、 二視野 の認識手段 3 で両認識マーク 6 , 1 1 を認識 (撮像) しょう と試みる。 その際、 上下の全ての認識マーク 6 , 1 1 を認識するこ とが困難な位 置にヘッ ド 1及び基板保持ステージ 2が移動されている場合には、 図示 されていないヘッ ド側の可動テーブル及びノ又はステージ側の可動テ一 ブル 4 の平行移動制御及び 又は回転制御を行ってァライ メ ン ト実行位 置、 すなわち、 二視野の認識手段 3の視野範困内に上下の全ての認識マ ーク 6 , 1 1 を位置せしめる。 Therefore, the two-field-of-view recognition means 3 can be moved from the retracted position to a position below the head 1 by the drive control of the movable table 15 and, conversely, moved from the retracted position to the retracted position. Can be done. At this time, the height of the recognition means 3 for the two visual fields is adjusted to a predetermined height by controlling the elevation of the movable table 15. Therefore, according to this mounting apparatus, a pair of recognition marks 11 provided on the chip 12 held by the head 1 by suction and the board 5 provided by the board holding stage 2 by suction are provided. The two recognition marks 6 are recognized by the two visual field recognition means 3 and can be aligned as follows. First, the movable table 15 is driven to move the two-view recognition means 3 from the retracted position between the head 1 and the substrate holding stage 2, and the two-view recognition means 3 uses the two recognition marks 6, 1. Attempt to recognize (image) 1. At this time, if the head 1 and the substrate holding stage 2 are moved to a position where it is difficult to recognize all the upper and lower recognition marks 6 and 11, the movable side of the head (not shown) Alignment execution position by controlling the translation and / or rotation of the table and the movable table 4 on the stage or stage side, that is, recognizing all of the upper and lower parts within the visual field range of the two visual field recognizing means 3. Position marks 6 and 1 1.
なお、 二視野の認識手段 3 による認識マーク 6 , 1 1 の認識は、 全て の認識マーク 6 , 1 1 の同時認識、 又は基板 5 に設けられている一対の 認識マーク 6 の認識とチップ 1 2 に設けられている一対の認識マーク 1 1 の認識とを別個に行う個別認識のいずれであってもよい。 なお、 この 状態においては、 へッ ド 1 が吸着保持しているチップ 1 2 に対して基板 保持ステージ 2上の基板 5 は、 粗位置決めせしめられたのにすぎない。 そして、 引き統いて、 認識された両認識マーク 6 , 1 1 同士の位置ず れ量に基づいて、 それを補正して可能な限り 目標精度範囲に近づけるよ うにステージ側の可動テーブル 4の駆動制御が行われる。  The recognition of the recognition marks 6 and 11 by the two-view recognition means 3 can be performed by simultaneously recognizing all the recognition marks 6 and 11 or by recognizing the pair of recognition marks 6 provided on the substrate 5 and the chip 1 2 May be any of the individual recognition that separately performs the recognition of the pair of recognition marks 11 provided in. Note that, in this state, the substrate 5 on the substrate holding stage 2 is only roughly positioned with respect to the chip 12 held by the head 1 by suction. Then, the drive control of the movable table 4 on the stage side is performed so as to correct the position of the two recognition marks 6 and 11 based on the amount of misalignment and to make the correction as close as possible to the target accuracy range. Is performed.
このよう に、 可能な限り 目標範囲に近づけるよう に駆動制御している のは、 両認識マーク 6 , 1 1 同士の位置ずれ量が大きい為に、 1 回のァ ライ メ ン トでは、 目標精度範囲内にせしめるのが困難であるからである 。 なお、 この最初のァライ メ ン トにおいては、 平行移動制御と回転制御 とが並行的に行われる。  In this way, drive control is performed so as to be as close as possible to the target range because the positional deviation between the two recognition marks 6 and 11 is large. This is because it is difficult to keep it within the range. In this first alignment, the translation control and the rotation control are performed in parallel.
更に引き続いて, 上述と同様の工程を経て 2回目のァライメ ン 卜が行 われるが、 このァライ メ ン トによっても、 両認識マ一ク 6 , 1 1 の位置 ずれ量を目標精度範囲内にせしめることができない場合においては、 更 に、 次のァライ メ ン トを次々 と行う。 その際、 前回のァライ メ ン ト にお ける回転誤差が設定範囲内のときには、 回転制御を行わずに平行移動制 御のみを行う。 Subsequently, a second alignment is performed through the same process as described above, and this alignment also causes the amount of displacement between the two recognition marks 6 and 11 to fall within the target accuracy range. If it is not possible, Then, the following alignments are performed one after another. At this time, if the rotation error in the previous alignment is within the set range, only the translation control is performed without performing the rotation control.
つま り、 回転制御を行う と、 回転軸心の振れによ り精度が出ないとい う ことである。 上記の回転誤差の設定範囲は, 例えば次のよ う にして定 められる。 例えば、 可動テーブル 4 に関し、 平行移動テーブル 4 bの繰 り返し精度が ± 1 β m、 回転テーブル 4 aの分解能が 1 3 6 0 0度、 回転軸心の振れ誤差が 5 rnであると共に、 認識マーク 6 , 1 1 のピツ チ Lが 1 0 mmで、 かつ, 目標精度を ± 2 . とする。 この場合、 目標精度 ± 2 . 5 /x mから平行移動テーブルの繰り返し精度 ± l ^ mを 減算した値である ± 1 . 5 m以内、 すなわち、 認識マークのピッチ L が 1 0 mmで、 ずれが 1 . 5 mの時の角度 ( ø ) を回転誤差の設定範 囲とする。 前回のァライ メ ン 卜における回転誤差が前記設定範囲内であ るときには、 回転制御が完了 したと見なして、 次のァライ メ ン トでは平 行移動制御のみを行うよ う にすればよい。  In other words, if rotation control is performed, accuracy will not be obtained due to the runout of the rotation axis. The setting range of the above rotation error is determined, for example, as follows. For example, regarding the movable table 4, the repetition accuracy of the translation table 4b is ± 1 β m, the resolution of the rotary table 4a is 13.600 degrees, and the runout error of the rotary axis is 5 rn. The pitch L of the recognition marks 6 and 11 is 10 mm and the target accuracy is ± 2. In this case, within ± 1.5 m which is the value obtained by subtracting the repetition accuracy ± l ^ m of the translation table from the target accuracy ± 2.5 / xm, that is, the pitch L of the recognition mark is 10 mm and the deviation is The angle (ø) at 1.5 m is the rotation error setting range. When the rotation error in the previous alignment is within the set range, it is considered that the rotation control has been completed, and only the parallel movement control may be performed in the next alignment.
よって、 ステージ側の可動テーブル 4の回転軸心の振れ誤差 ( 0軸心 の振れ誤差〉 の影響を受けずにァライ メ ン トする こ とができるから、 ァ ライ メ ン トの繰り返し回数を減らすことができてタク トタイムの短縮化 を図る ことができると共に高精度にァライメ ン 卜するこ とができる。 なお、 上述のよう にァライ メ ン ト後、 目標精度範囲に入っておれば、 二視野の認識手段 3 は、 認識マーク 6 , 1 1 を認識する位置から退避位 置へ移動される。  Therefore, the alignment can be performed without being affected by the run-out error of the rotary axis of the movable table 4 on the stage side (run-out error of the 0-axis center), and the number of repeats of the alignment can be reduced. As a result, the tact time can be shortened, and the alignment can be performed with high accuracy. The recognition means 3 is moved from the position where the recognition marks 6 and 11 are recognized to the retracted position.
以上、 基板保持ステージ 2 のみの回転制御及び平行移動制御を行って ァライ メン トする例について述べたが、 ァライ メン ト手法はこれのみに 限定されない。 すなわち、 それに代えて、 ヘッ ド 1 のみの回転制御及び 平行移動制御を行って同様にァライ メ ン ト してもよい。 また、 ヘッ ド 1 及び基板保持ステージ 2 の内のどちらか一方 (例えば 、 ヘッ ド 1 ) の回転制御を行う と共に、 ヘッ ド 1 及び基板保持ステージ 2 の内の他方 (例えば、 基板保持ステージ 2 ) の平行移動制御を行って 同様にァライ メ ン ト してもよい。 As described above, the example of performing the alignment by performing the rotation control and the parallel movement control of only the substrate holding stage 2 has been described. However, the alignment method is not limited thereto. That is, instead of this, the rotation control and the parallel movement control of only the head 1 may be performed to perform the same alignment. In addition to controlling rotation of one of the head 1 and the substrate holding stage 2 (for example, the head 1), the other of the head 1 and the substrate holding stage 2 (for example, the substrate holding stage 2) It is also possible to perform the parallel movement control described above and perform the same alignment.
また、 ヘッ ド 1 及び基板保持ステージ 2 の両方の回転制御及び平行移 動制御を行って同様にァライ メ ン 卜してもよい。  In addition, the rotation control and the parallel movement control of both the head 1 and the substrate holding stage 2 may be performed to perform the same alignment.
また、 へッ ド 1 及び基板保持ステージ 2の両方の回転制御を行う と共 に、 へッ ド 1及び基板保持ステージ 2 の内のどち らか一方の平行移動制 御を行って同様にァライ メ ン ト してもよい。  In addition, the rotation control of both the head 1 and the substrate holding stage 2 is performed, and the parallel movement control of one of the head 1 and the substrate holding stage 2 is performed. May be included.
また、 ヘッ ド 1 及び基板保持ステージ 2 の内のどち らか一方の回転制 御を行う と共に、 へッ ド 1 及び基板保持ステージ 2 の両方の平行移動制 御を行って同様にァライメン 卜 してもよい。  In addition, while controlling the rotation of one of the head 1 and the substrate holding stage 2, the parallel movement control of both the head 1 and the substrate holding stage 2 is performed and the alignment is similarly performed. Is also good.
このよう に、 各種態様にァライ メ ン トすることができる。 これは、 上 述のチップ実装装置が、 へッ ド 1 及び基板保持ステージ 2 の両方の平行 移動制御及び回転制御を行えるように構成されているからである。 · すなわち、 上述のよう に、 ヘッ ド 1 を、 平行移動制御及び回転制御が 可能な可動テーブル (ヘッ ド側の可動テーブル) に装着していると共に 、 基板保持ステージ 2 を、 平行移動制御及び回転制御が可能な可動テー プル (ステージ側の可動テーブル 4 ) に装着しているからである。 上述した実施例では、 両認識マーク 6 , 1 1 の回転誤差が設定範囲内 に入るまでは、 平行移動制御と回転制御とを並行的に行い、 回転誤差が 設定範囲内に入った後は、 平行移動制御のみを行うよう に したが、 これ に代えて、 回転誤差が設定範囲内に入るまでは回転制御のみを行う よ う にしてもよい。  In this way, various aspects can be aligned. This is because the above-described chip mounting apparatus is configured to perform the parallel movement control and the rotation control of both the head 1 and the substrate holding stage 2. · That is, as described above, the head 1 is mounted on the movable table (the movable table on the head side) capable of controlling the parallel movement and the rotation, and the substrate holding stage 2 is controlled by the parallel movement and the rotation. This is because it is mounted on a movable table that can be controlled (the movable table 4 on the stage side). In the above-described embodiment, the parallel movement control and the rotation control are performed in parallel until the rotation error of the two recognition marks 6 and 11 falls within the set range, and after the rotation error enters the set range, Although only the parallel movement control is performed, only the rotation control may be performed until the rotation error falls within the set range.
なお、 本発明においては, チップ実装装置は、 上記実施例のよう に構 成されたものに限定されず、 へッ ド 1 及び基板保持ステージ 2 の内のど ち らか一方のみの平行移動制御及び回転制御を行う ことができるように 構成されたものであってもよい。 Note that, in the present invention, the chip mounting apparatus is not limited to the one configured as in the above embodiment, but may be any one of the head 1 and the substrate holding stage 2. It may be configured such that only one of the translation control and the rotation control can be performed.
例えば、 ヘッ ド 1 を、 平行移動制御及び回転制御が可能なヘッ ド側の 可動テーブルに装着しているが、 基板保持ステージ 2 をそのよう に装着 していない (固定している) もの、 或いは、 基板保持ステージ 2 を、 平 行移動制御及び回耘制御が可能なステージ側の可動テーブルに装着して いるがへッ ド 1 をそのように装着していない (昇降のみ可能に装着して いる) ものであつてもよい。  For example, the head 1 is mounted on a movable table on the head side capable of controlling translation and rotation, but the substrate holding stage 2 is not mounted (fixed) as such, or The substrate holding stage 2 is mounted on the movable table on the stage side where parallel movement control and tillage control can be performed, but the head 1 is not mounted as such. ).
このようなチップ実装装置においても、 回転方向誤,差を設定範囲内に せしめるように、 先ず、 回転制御を行い、 次いで、 それの完了後、 平行 移動制御を行ってァライ メ ン トすることができ、 従って、 ァライ メ ン ト の繰り返し回数を減らすことができてタク トタイムの短縮化を図る こ と ができると共に髙精度にァライメ ン トすることができる効果を奏し得る ァライ メ ン ト方法を得ることができる。  Even in such a chip mounting device, it is necessary to perform rotation control first so that the rotation direction error and difference are within the set range, and then, after completing the rotation control, perform parallel movement control and perform alignment. Therefore, the number of repetitions of the alignment can be reduced, so that the takt time can be shortened, and an alignment method can be obtained which has an effect of being able to perform the alignment with high accuracy. be able to.
なお、 本発明において、 チップ実装装置とは、 チップを搭載するマウ ン ト装置やチップを接合するボンディ ング装置等のこ とであって、 加熱 式、 非加熱式、 加圧式、 非加圧式のいずれも包含する広い概念の装置を いう。  In the present invention, the chip mounting device refers to a mounting device for mounting a chip, a bonding device for bonding the chip, or the like, and includes a heating type, a non-heating type, a pressure type, and a non-pressure type. A device with a broad concept that encompasses both.
また、 チップとは、 半導体チッ プ、 I Cチップ、 光素子、 ウェハ等, その種類や大きさ等に関係なく 、 基板に対して搭載又は接合させよう と する実装対象物をいう。  Also, a chip refers to a semiconductor chip, an IC chip, an optical element, a wafer, or the like, a mounting object to be mounted or bonded to a substrate regardless of its type and size.
また、 基板とは、 例えば, 樹脂基板、 ガラス基板、 フ ィ ルム基板等の こ とであって、 上記チップが搭載又は接合せしめられる方の対象物をい ラ。  The substrate is, for example, a resin substrate, a glass substrate, a film substrate, or the like, and is an object on which the chip is mounted or bonded.
また、 二視野の認識手段とは、 2本の光軸を有するものであって、 例 えば、 C C Dカメ ラ、 赤外線カメ ラ、 X線カメラ、 センサ等、 認識マ一 クを認識 (又は撮像) し得るもであれぱいかなるものであってもよい。 また、 ヘッ ドは、 ヒー夕を備えているもの若しく はそれを備えていな いもののいずれであってもよく、 かつ, チップ及び/または基板の保持 についても、 真空吸着以外の他の手段による保持であってもよい。 また、 チップ及び基板に設けられる認識マークについても、 例えば、 孔、 溝、 印刷マーク等、 その種類、 大きさや、 キャ リ ブレーショ ン、 ァ ライ メ メ ン ト等の特定の目的の為のマークだけでなく 、 認識マーク と し て好適であればいかなる形態のものであってもよい。 なお、 対になった ものだけでなく 、 それと異なる形態、 例えば、 単数に設けたり或るいは 2個以上に設けたり してもよ'い。 The two-view recognition means has two optical axes, for example, a recognition camera such as a CCD camera, an infrared camera, an X-ray camera, a sensor, or the like. Anything that can recognize (or image) the object. In addition, the head may be equipped with or without a heater, and the holding of the chip and / or the substrate may be performed by means other than vacuum suction. It may be holding. Also, regarding the recognition marks provided on the chip and the substrate, for example, only marks for specific purposes such as holes, grooves, printed marks, etc., their types and sizes, calibration, alignment, etc. Instead, any form may be used as long as it is suitable as a recognition mark. It should be noted that not only a pair but also a different form, for example, a single or two or more may be provided.
また、 基板に設けられている認識マーク 6及びチップに設けられてい る認識マーク 1 1 を認識する認識手段は、 一体の形態に設けられたニ視 野の認識手段 3 に限定されず、 上光軸、 下光軸各々が自在に動作できる よう に互いに独立した形態 (二つのユニッ トに分けられた形態) に設け られたものであってもよ く 、 かつ、 これらについても、 例えば、 C C D カ メラ、 赤外線カ メラ、 X線カメ ラ、 センサ等、 認識マークを認識 (又 は撮像) し得るもであればいかなるものであってもよい。  Further, the recognition means for recognizing the recognition mark 6 provided on the substrate and the recognition mark 11 provided on the chip is not limited to the recognition means 3 for the two visual fields provided in an integrated form. The axis and the lower optical axis may be provided in a form independent of each other (a form divided into two units) so that each of them can operate freely. Any camera, infrared camera, X-ray camera, sensor, etc. can be used as long as it can recognize (or image) the recognition mark.
また、 基板保持ステージの移動手段である可動テーブルについても、 回転テーブルが最上段に設置されていない、 すなわち、 平行移動テープ ルの下に設置されているものであってもよいが、 一般には、 最上段に設 置したものが用いられる。 産業上の利用可能性  In addition, as for the movable table which is a moving means of the substrate holding stage, the rotary table may not be provided at the top, that is, may be provided below the translation table. The one installed at the top is used. Industrial applicability
以上のよ うに、 本発明に係るチップ実装装置におけるァライ メ ン ト方 法は、 高精度のァライ メ ン トを短時間に行う ことができるので、 基板に I Cチップなどを実装するときのァライメ ン方法と して有用である。  As described above, the alignment method in the chip mounting apparatus according to the present invention can perform high-precision alignment in a short time. Useful as a method.

Claims

請 求 の 範 囲 The scope of the claims
1 . へッ ドが保持しているチッ プに設けられた認識マーク と前記へッ ドの下方に配されている基板保持ステージが支持している基板に設けら れた認識マーク とを認識手段で認識し、 かつ、 両認識マークの位置ずれ 量を補正して目標精度範囲内にせしめるように、 前記ヘッ ド及び前記基 板保持ステージの内のどち らか一方のみの平行移動制御及び回転制御を 行う ことができるように構成されたチップ実装装置におけるァラィ メ ン ト方法において、 前記両認識マークの回転方向誤差を設定範囲内にせし めるよう に、 先ず, 少なく とも前記回転制御を行い、 次いで, それの完 了後、 前記平行移動制御のみを行う ことを特徴とするチップ実装装置に おけるァライメント方法。 1. Recognition means for recognizing a mark provided on a chip held by the head and a recognition mark provided on a substrate supported by a substrate holding stage provided below the head. And the translation control and the rotation control of only one of the head and the substrate holding stage so that the position difference between the two recognition marks is corrected to be within the target accuracy range. In an alignment method in a chip mounting apparatus configured to perform the rotation control, first, at least the rotation control is performed so that a rotation direction error between the two recognition marks is set within a set range. Then, after completing the above, only the parallel movement control is performed.
2 . へッ ドが保持しているチップに設けられた認識マーク と前記へッ ドの下方に配されている基板保持ステージが支持している基板に設けら れた認識マ一ク とを認識手段で認識し、 かつ, 両認識マークの位置ずれ 量を補正して目標精度範囲内にせしめるように、 前記へッ ド及び前記基 板保持ステージの両方の平行移動制御及び回転制御を行う ことができる よう に構成されたチップ実装装置におけるァライ メン ト方法において、 前記両認識マークの回転方向誤差を設定範囲内にせしめるよう に、 先ず 、 少なく とも前記回転制御を行い、 次いで、 それの完了後、 前記平行移 動制御のみを行う ことを特徴とするチップ実装装置におけるァラィメ ン ト方法。 2. Recognize the recognition mark provided on the chip held by the head and the recognition mark provided on the substrate supported by the substrate holding stage provided below the head. Means for performing parallel translation control and rotation control of both the head and the substrate holding stage so that the recognition is performed by means and the positional deviation amount between the two recognition marks is corrected so as to be within the target accuracy range. In the alignment method for the chip mounting apparatus configured to be able to perform the above, first, at least the rotation control is performed so that the rotation direction error between the two recognition marks is within a set range, and then, after the completion thereof, An alignment method in a chip mounting apparatus, wherein only the parallel movement control is performed.
3 . 請求項 2 に記載の方法において、 前記両認識マークの回転方向誤 差を設定範囲内にせしめるように、 先ず、 ヘッ ド及び基板保持ステージ の両方の少なく とも回転制御を行い、 次いで、 それの完了後、 ヘッ ド及 び基板保持ステージの内のどち らか一方の平行移動制御のみを行う こ と を特徴とするチップ実装装置におけるァライ メ ン ト方法。 3. The method according to claim 2, wherein the head and the substrate holding stage are first set so that the rotation direction error between the two recognition marks is within a set range. The alignment control in the chip mounting apparatus is characterized in that at least rotation control of both is performed, and after that, only parallel movement control of one of the head and the substrate holding stage is performed. Method.
4 . 請求項 2 に記載の方法において、 前記両認識マークの回転方向誤 差を設定範囲内にせしめるよう に、 先ず、 ヘッ ド及び基板保持ステージ の内のどち らか一方の少なく とも回転制御を行い、 次いで、 それの完了 後、 へッ ド及び基板保持ステージの両方の平行移動制御のみを行う こ と を特徵とするチップ実装装置におけるァライ メ ン ト方法。 4. In the method according to claim 2, first, at least one of the head and the substrate holding stage is rotationally controlled so that the rotational direction error between the two recognition marks is within a set range. An alignment method in a chip mounting apparatus, which performs only parallel movement control of both the head and the substrate holding stage after the completion of the operation.
5 . 請求項 2 に記載の方法において、 前記両認識マークの回転方向誤 差を設定範囲内にせしめるように、 先ず、 ヘッ ド及び基板保持ステージ の内のどち らか一方の少なく とも回転制御を行い、 次いで、 それの完了 後、 前記一方の平行移動制御のみを行う ことを特徴とするチッ プ実装装 置におけるァライ メ ン ト方法。 5. The method according to claim 2, wherein at least one of the head and the substrate holding stage is controlled to rotate so that the rotation direction error between the two recognition marks falls within a set range. And then, after the completion thereof, performing only the one of the parallel movement controls.
6 . 請求項 2 に記載の方法において、 前記両認識マークの回転方向誤 差を設定範囲内にせしめるように、 先ず、 ヘッ ド及び基板保持ステージ の内のどち らか一方の少なく とも回転制御を行い、 次いで、 それの完了 後、 へッ ド及び基板保持ステージの内の他方の平行移動制御のみを行う こ とを特徴とするチップ実装装置におけるァライ メ ン ト方法。 6. The method according to claim 2, wherein at least one of the head and the substrate holding stage is controlled to rotate so that the rotation direction error between the two recognition marks falls within a set range. And then, after the completion thereof, performing only parallel movement control of the other of the head and the substrate holding stage.
7 . 請求項 1 〜 6 のいずれかに記載の方法において、 前記認識手段が 二視野の認識手段であることを特徴とするチップ実装装置におけるァラ ィ メ ン ト方法。 7. The method according to any one of claims 1 to 6, wherein the recognition means is a two-view recognition means.
8 . 請求項 1 ~ 7 のいずれかに記載の方法において、 ヘッ ドがヒータ を備えているものであることを特徵とするチップ実装装置におけるァラ ィ メ ン ト方法。 8. The method according to any one of claims 1 to 7, wherein the head is provided with a heater.
9 . 請求項 1 ~ 8 のいずれかに記載の方法において、 ヘッ ドがチップ を真空吸着保持し得るものである こ とを特徴とするチッ プ実装装置にお けるァライ メ ン ト方法。 9. The alignment method in a chip mounting apparatus according to claim 1, wherein the head is capable of holding a chip by vacuum suction.
4 Four
PCT/JP2000/008199 1999-03-15 2000-11-21 Alignment method for chip mounter WO2002043133A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000069007A JP2001217596A (en) 1999-03-15 2000-03-13 Alignment method of chip mounting device
PCT/JP2000/008199 WO2002043133A1 (en) 1999-03-15 2000-11-21 Alignment method for chip mounter
KR10-2003-7006520A KR20030055301A (en) 2000-11-21 2000-11-21 Alignment method for chip mounter

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP6789799 1999-03-15
JP33419799 1999-11-25
JP2000069007A JP2001217596A (en) 1999-03-15 2000-03-13 Alignment method of chip mounting device
PCT/JP2000/008199 WO2002043133A1 (en) 1999-03-15 2000-11-21 Alignment method for chip mounter

Publications (1)

Publication Number Publication Date
WO2002043133A1 true WO2002043133A1 (en) 2002-05-30

Family

ID=27455288

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2000/008199 WO2002043133A1 (en) 1999-03-15 2000-11-21 Alignment method for chip mounter

Country Status (2)

Country Link
JP (1) JP2001217596A (en)
WO (1) WO2002043133A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030092914A (en) * 2002-05-31 2003-12-06 삼성전자주식회사 Device and mark alignment method for flip chip bonder comprising up and down mark
US20150380380A1 (en) * 2013-12-03 2015-12-31 Kulicke And Soffa Industries, Inc. Systems and methods for determining and adjusting a level of parallelism related to bonding of semiconductor elements

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2003041478A1 (en) * 2001-11-05 2005-03-03 東レエンジニアリング株式会社 Mounting apparatus and mounting method
JP4856026B2 (en) * 2002-04-04 2012-01-18 東レエンジニアリング株式会社 Alignment method and mounting method using the method
CN100394577C (en) * 2002-04-04 2008-06-11 东丽工程株式会社 Alignment method and mounting method using the alignment method
KR100683414B1 (en) * 2005-09-15 2007-02-20 삼성전자주식회사 Component Mounting Device
JP2007227965A (en) * 2007-04-25 2007-09-06 Athlete Fa Kk Bonding method
KR100913579B1 (en) 2007-05-14 2009-08-26 주식회사 에스에프에이 Bonding device for driving circuit board and its method
CN113396646B (en) 2019-01-04 2023-06-13 捷普有限公司 Apparatus, system and method for providing a circuit board carrier for a pick and place system

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07245500A (en) * 1994-03-07 1995-09-19 Matsushita Electric Ind Co Ltd Device and method for mounting electronic component
JPH10125728A (en) * 1996-10-23 1998-05-15 Casio Comput Co Ltd Bonding method
JPH10150059A (en) * 1996-11-15 1998-06-02 Hitachi Ltd Die bonding method and apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07245500A (en) * 1994-03-07 1995-09-19 Matsushita Electric Ind Co Ltd Device and method for mounting electronic component
JPH10125728A (en) * 1996-10-23 1998-05-15 Casio Comput Co Ltd Bonding method
JPH10150059A (en) * 1996-11-15 1998-06-02 Hitachi Ltd Die bonding method and apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030092914A (en) * 2002-05-31 2003-12-06 삼성전자주식회사 Device and mark alignment method for flip chip bonder comprising up and down mark
US20150380380A1 (en) * 2013-12-03 2015-12-31 Kulicke And Soffa Industries, Inc. Systems and methods for determining and adjusting a level of parallelism related to bonding of semiconductor elements
US9425163B2 (en) * 2013-12-03 2016-08-23 Kulicke And Soffa Industries, Inc. Systems and methods for determining and adjusting a level of parallelism related to bonding of semiconductor elements

Also Published As

Publication number Publication date
JP2001217596A (en) 2001-08-10

Similar Documents

Publication Publication Date Title
WO2001067839A1 (en) Chip-mounting device and method of alignment thereof
CN104999776A (en) System and method for aligning silk-screen printing
WO2002043133A1 (en) Alignment method for chip mounter
JP2019102771A (en) Electronic component mounting device and electronic component mounting method
JP5077936B2 (en) Mounting apparatus and mounting method
WO2002041384A1 (en) Chip mounting device and method of calibrating the device
JP4937482B2 (en) Chip mounting apparatus and alignment method in the apparatus
JP2008043910A (en) Droplet coating apparatus and method
CN204749477U (en) Screen printing aims at system
JP3937162B2 (en) Component mounting apparatus and component mounting method
US20030089206A1 (en) Method of aligning a workpiece in a cutting machine
JP3962906B2 (en) Component mounting apparatus and component mounting method
JP2003098533A (en) Apparatus and method for bonding substrates
JP4615024B2 (en) Table positioning controller
CN119008454A (en) Bonding device
JP2005229006A (en) Individual aligning method and apparatus thereof
JPH0964085A (en) Bonding method
JP7209680B2 (en) Die bond head device with die holder motion table
JP2003001175A (en) Painting device, painting method and method for manufacturing display device
JP4562254B2 (en) Chip mounting apparatus and calibration method therefor
JP2844409B2 (en) Semiconductor positioning method
JP2000269242A (en) Chip-bonding device and calibration method thereof
JP2000332033A (en) Chip-mounting device and method for calibrating the same
JP4713287B2 (en) Electronic component mounting apparatus and mounting method
TWI875418B (en) Bonding device and bonding method

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): CA KR US

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 1020037006520

Country of ref document: KR

WWP Wipo information: published in national office

Ref document number: 1020037006520

Country of ref document: KR

122 Ep: pct application non-entry in european phase
点击 这是indexloc提供的php浏览器服务,不要输入任何密码和下载