WO1999036159A1 - Procede et systeme de separation et de recuperation de gaz de composes perfluores - Google Patents
Procede et systeme de separation et de recuperation de gaz de composes perfluores Download PDFInfo
- Publication number
- WO1999036159A1 WO1999036159A1 PCT/EP1998/002272 EP9802272W WO9936159A1 WO 1999036159 A1 WO1999036159 A1 WO 1999036159A1 EP 9802272 W EP9802272 W EP 9802272W WO 9936159 A1 WO9936159 A1 WO 9936159A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- membrane
- gas
- permeate
- gas mixture
- stream
- Prior art date
Links
- 239000007789 gas Substances 0.000 title claims abstract description 277
- 238000000034 method Methods 0.000 title claims abstract description 146
- 230000008569 process Effects 0.000 title claims abstract description 131
- 238000000926 separation method Methods 0.000 title claims description 47
- 238000011084 recovery Methods 0.000 title claims description 23
- 239000012528 membrane Substances 0.000 claims abstract description 337
- 239000012466 permeate Substances 0.000 claims abstract description 192
- 239000000203 mixture Substances 0.000 claims abstract description 128
- 239000012159 carrier gas Substances 0.000 claims abstract description 47
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 66
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 51
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims description 45
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 claims description 41
- 229910052757 nitrogen Inorganic materials 0.000 claims description 33
- 238000004519 manufacturing process Methods 0.000 claims description 31
- 239000004065 semiconductor Substances 0.000 claims description 31
- 229920000642 polymer Polymers 0.000 claims description 28
- 239000012510 hollow fiber Substances 0.000 claims description 21
- 238000001179 sorption measurement Methods 0.000 claims description 19
- 238000009833 condensation Methods 0.000 claims description 16
- 230000005494 condensation Effects 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 238000000354 decomposition reaction Methods 0.000 claims description 13
- 230000006835 compression Effects 0.000 claims description 12
- 238000007906 compression Methods 0.000 claims description 12
- -1 perfluoro compound Chemical class 0.000 claims description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 11
- 239000004642 Polyimide Substances 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 229920001721 polyimide Polymers 0.000 claims description 9
- 238000003860 storage Methods 0.000 claims description 9
- 229910052786 argon Inorganic materials 0.000 claims description 8
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 229920006393 polyether sulfone Polymers 0.000 claims description 8
- 230000003197 catalytic effect Effects 0.000 claims description 7
- 238000005201 scrubbing Methods 0.000 claims description 7
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 7
- 238000011144 upstream manufacturing Methods 0.000 claims description 7
- 239000004952 Polyamide Substances 0.000 claims description 6
- 239000004695 Polyether sulfone Substances 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 6
- 229920002647 polyamide Polymers 0.000 claims description 6
- 229920000728 polyester Polymers 0.000 claims description 6
- 229910021536 Zeolite Inorganic materials 0.000 claims description 5
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 5
- 229920001643 poly(ether ketone) Polymers 0.000 claims description 5
- 229920002492 poly(sulfone) Polymers 0.000 claims description 5
- 229920005597 polymer membrane Polymers 0.000 claims description 5
- 239000010457 zeolite Substances 0.000 claims description 5
- 230000035699 permeability Effects 0.000 claims description 4
- 238000004064 recycling Methods 0.000 claims description 4
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 4
- 239000004962 Polyamide-imide Substances 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 229920002301 cellulose acetate Polymers 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 3
- 229920002312 polyamide-imide Polymers 0.000 claims description 3
- 229920000515 polycarbonate Polymers 0.000 claims description 3
- 239000004417 polycarbonate Substances 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 3
- 239000003463 adsorbent Substances 0.000 claims description 2
- 230000001747 exhibiting effect Effects 0.000 claims description 2
- 239000002699 waste material Substances 0.000 claims description 2
- 238000004891 communication Methods 0.000 claims 12
- 239000004721 Polyphenylene oxide Substances 0.000 claims 4
- 229920006380 polyphenylene oxide Polymers 0.000 claims 4
- 229920005649 polyetherethersulfone Polymers 0.000 claims 2
- 238000003421 catalytic decomposition reaction Methods 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 239000012809 cooling fluid Substances 0.000 claims 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 claims 1
- 229920006926 PFC Polymers 0.000 description 105
- 241000894007 species Species 0.000 description 33
- 239000007788 liquid Substances 0.000 description 30
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 25
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 18
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 238000009835 boiling Methods 0.000 description 13
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 12
- 229910018503 SF6 Inorganic materials 0.000 description 11
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 10
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 9
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical class [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 8
- WRQGPGZATPOHHX-UHFFFAOYSA-N ethyl 2-oxohexanoate Chemical compound CCCCC(=O)C(=O)OCC WRQGPGZATPOHHX-UHFFFAOYSA-N 0.000 description 8
- 229930195733 hydrocarbon Natural products 0.000 description 8
- 150000002430 hydrocarbons Chemical class 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 238000002485 combustion reaction Methods 0.000 description 6
- 239000002131 composite material Substances 0.000 description 6
- 230000006378 damage Effects 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 238000010926 purge Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000001307 helium Substances 0.000 description 5
- 229910052734 helium Inorganic materials 0.000 description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 5
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 4
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 4
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 229910015900 BF3 Inorganic materials 0.000 description 3
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000005345 coagulation Methods 0.000 description 3
- 230000015271 coagulation Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000011070 membrane recovery Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- GQPLMRYTRLFLPF-UHFFFAOYSA-N nitrous oxide Inorganic materials [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 3
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 3
- 229960000909 sulfur hexafluoride Drugs 0.000 description 3
- 238000013022 venting Methods 0.000 description 3
- XKTYXVDYIKIYJP-UHFFFAOYSA-N 3h-dioxole Chemical compound C1OOC=C1 XKTYXVDYIKIYJP-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 229910004014 SiF4 Inorganic materials 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 229920006125 amorphous polymer Polymers 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 229910000070 arsenic hydride Inorganic materials 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000004678 hydrides Chemical class 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000003345 natural gas Substances 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000009987 spinning Methods 0.000 description 2
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000002912 waste gas Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- MWRNXFLKMVJUFL-UHFFFAOYSA-N $l^{2}-germane Chemical class [GeH2] MWRNXFLKMVJUFL-UHFFFAOYSA-N 0.000 description 1
- IXRBJOUYPQNPBC-UYIBTEFRSA-N (2R,3R,3aS,6S,6aR)-6-(2-amino-3-bromoquinolin-7-yl)oxy-2-(4-methylpyrrolo[2,3-d]pyrimidin-7-yl)-2,3,4,5,6,6a-hexahydrocyclopenta[b]furan-3,3a-diol Chemical compound NC1=NC2=CC(=CC=C2C=C1Br)O[C@H]1CC[C@]2([C@@H]1O[C@H]([C@@H]2O)N1C=CC2=C1N=CN=C2C)O IXRBJOUYPQNPBC-UYIBTEFRSA-N 0.000 description 1
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 description 1
- SYNPRNNJJLRHTI-UHFFFAOYSA-N 2-(hydroxymethyl)butane-1,4-diol Chemical compound OCCC(CO)CO SYNPRNNJJLRHTI-UHFFFAOYSA-N 0.000 description 1
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 241000233805 Phoenix Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- IYRWEQXVUNLMAY-UHFFFAOYSA-N carbonyl fluoride Chemical compound FC(F)=O IYRWEQXVUNLMAY-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 230000000877 morphologic effect Effects 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 238000001745 non-dispersive infrared spectroscopy Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229920005548 perfluoropolymer Polymers 0.000 description 1
- 229960004065 perflutren Drugs 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 230000000153 supplemental effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- XRXPBLNWIMLYNO-UHFFFAOYSA-J tetrafluorotungsten Chemical compound F[W](F)(F)F XRXPBLNWIMLYNO-UHFFFAOYSA-J 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- NGKVXLAPSYULSX-UHFFFAOYSA-N tungsten(vi) oxytetrafluoride Chemical compound F.F.F.F.[W]=O NGKVXLAPSYULSX-UHFFFAOYSA-N 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D53/229—Integrated processes (Diffusion and at least one other process, e.g. adsorption, absorption)
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D53/225—Multiple stage diffusion
Definitions
- the invention relates to gas separation processes
- the invention relates to concentrating low concentration gas
- mixtures comprising perfluorocompound gases such as those
- gases are used either pure or diluted, for example with air
- the effluent gases or gas mixtures are preferably
- a resistance heater may also be generated using a resistance heater.
- Oxygen is usually needed to drive the decomposition
- This abatement system also uses a gas flame
- any adsorption system is very sensitive to moisture
- polymers such as poly dimethyl siloxane or certain particular polymers such as a substituted polyacethylene to
- chlorofluorocarbons from, for example, air.
- gaseous stream which can be used with a feed flow
- the "carrier gases" of the effluent gas mixture such as air, nitrogen, oxygen, argon and/or helium
- One aspect of the invention relates to a process to
- SEL is greater than 1.0.
- D p is the mobility selectivity of a
- D c is the mobility selectivity of a carrier
- concentrated gas mixture comprising essentially at least one
- Preferred membranes are glassy polymeric membranes
- glassy polymeric membranes most useful do not
- a layer can comprise a layer, including a posttreatment layer as
- the invention also relates
- the invention comprises the steps of
- pretreated gas mixture to at least one size selective
- etching processes including oxide, metal and
- harmful by-products i.e. harmful components which may alter
- any pyrophoric- species including silicon hydrides
- systems of the invention be sealed and oil-free.
- One preferred aspect of the invention relates to a
- PFCs gas mixture is concentrated again, for example, with a
- inventions include provision of a vacuum pump, heat
- PFC gas mixture may be compressed, at least partially
- the invention includes concentrating the PFC gas mixture
- membrane unit being capable of use as a sweep gas of the
- a further aspect of the invention is the
- Another aspect of the invention is a semiconductor
- At least one reactor chamber adapted to receive
- the membrane being preferentially
- membrane unit further having a permeate vent conduit and a
- non-permeate conduit the latter adapted to direct at least
- pretreatment and/or post-treatment means such as dry or wet, (or both) scrubbers, thermal decomposers,
- permeate conduit (preferably between the first or plurality
- valves in liquid form for future use. Also preferred are valves
- sensors can be any type of immediately preceding one.
- sensors can be any type of immediately preceding one.
- sensors can be any type of immediately preceding one.
- samples may be taken periodically
- This information is preferably
- the sweep gas may either be controlled
- present invention includes the recycle of the permeate
- membrane units in this case, the carrier gas and other
- the carrier gases may be any suitable carrier gases.
- An additional recycle membrane may be provided, functioning to separate carrier
- non-permeate streams is post-treated to remove non-
- Post-treatment methods may include
- Another aspect of the invention is a method of recovery
- gas cabinets or more gas cabinets, tube trailers, clean rooms, or the
- FIG. 1 is a graph illustrating the efficacy of
- FIG. 2 represents a schematic drawing of one process
- FIG. 3 is a detailed view of a portion of the process
- FIGS. 4, 4a, 5, 6 and 7 illustrate different
- FIG. 8 illustrates PFC concentration on the permeate
- the membrane for different flowrates of the feed stream
- FIG. 9 illustrates PFC concentration on the permeate
- FIG. 10 illustrates PFC concentration on the recovery
- FIG. 11 illustrates PFC concentration on the recovery.
- FIGS. 12a-12a illustrate schematically a prior art gas
- FIG. 13 illustrates schematically a gas cabinet
- FIG. 14 illustrates multiple gas cabinets venting into
- the non-permeate stream may either be
- fluorinated hydrocarbons such as CF 4 , C 2 F 6 , C 3 F 8 , C 4 F 10 , and
- PFCs also include BF 3 , COF 2 , F 2 , HF,
- SiF 4 , WF 6 , W0F 4 as long as they are not harmful for size
- chlorofluorocarbons or compounds comprising two hydrogen
- Glassy polymers are one
- first-order screening means to identify suitable polymers.
- invention exhibits : fD fs
- test case the minimum value shown (e.g., -12) .
- the minimum value shown e.g., -12
- glassy membranes such as
- polymer membranes made preferably from polyimides
- polyamides polyamide- imides, polyesters, polycarbonates,
- polysulfones polyethersulfone, polyetherketone, alkyl
- aromatic polyimides aromatic polyamides, polyamidesimides ,
- Asymmetric membranes are prepared by the precipitation
- membranes are typified by a dense separating layer supported
- membranes are polyimide asymmetric gas separation membranes
- Such zeolite coated or filled membranes may be useful
- one side of the gas separation membrane is contacted with a
- permeation rate through the membrane is a property of the
- Composite gas separation membranes typically have a
- the separating layer and the substrate are usually different
- Composite membrane structures can be prepared by laminating
- composite gas separation membranes may be any suitable material.
- composite gas separation membranes may be any suitable material.
- membranes may also be prepared by co-extrusion of multiple
- the membrane can be post-treated with, or coated by, or
- the hollow-fiber spinning process depends on many variables
- the fiber onto the takeup roll, and the like may be preferable to modify the membrane morphology to enhance the
- Typical PFCs for semiconductor processes are the
- the membrane WF 6 , HF, F 2 , NH 3 , Cl 2 , HBr, HCl, 0 3 , and any
- post-treatment a method for treating a subject.
- post-treatment a method for treating a subject.
- the scrubber means to remove components potentially
- gaseous hydrides may be removed according to the methods disclosed in U.S. Patents 4,743,435, 4,784,837;
- a wet scrubber is, for example, disclosed in the
- vacuum means are retained on the non-permeate side of the membrane) , or a combination. To create this lowered
- compressors are sealed and oil-free, such as the compressors
- membrane unit of a series of membrane units preferably
- a coolant such as, for example, ambient liquid water or liquid nitrogen, if the temperature
- the non-permeate stream is controlled at a set-point value
- monitoring and control may be incorporated, for better
- membrane varies from about -10°C to about 100°C, preferably
- non-permeate stream is to pass a portion of the non-permeate
- the hollow fiber membrane that is, on the permeate side of
- stream of a first membrane stage N can be used as feed
- stage N stage N, stage N+l and stage N+2, etc. This means that the
- stage such as N+l or stage N+2.
- perfluorocompounds can be used such as distillation,
- condensation process can be used such as the one known under
- the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC mixture after the PFC
- concentration comprises species whose boiling points are
- C 2 F 6 has a normal
- NF 3 has a normal boiling point of -129 °C.
- condensation is made between the various components
- CF 4 may be separated using molecular sieves (such as
- FIG. 1 illustrates the efficacy of a burner to destroy
- combustion at 900°C may remove all PFCs but C 2 F ⁇ and CF 4 , which may then be separated and
- FIG. 2 in a semiconductor
- manufacturing process 1 (which semiconductor process may be
- gases and any other gases 24 (such as chemically reactive
- gas mixture is preferably passed through filter 5a, and then
- the compressed gas mixture is
- TEOS tetraethoxysilane
- halogen halides
- Gas stream 25 is sent
- carrier gas comprises helium, and also argon, it may be
- a separation unit for example a condensation unit
- a heat exchanger receives
- liquid nitrogen LN 2 in line 15 condenses the high boiling
- condensation of various products is controlled) which are recovered as a liquid on line 12 and sent to, for example,
- fractions are either recovered in 21 for further treatment
- the gaseous fraction from condenser 10 is sent through
- non-adsorbed species one or several
- the membrane for example SiH 4 ,WF 6 , and the like
- the membrane for example SiH 4 ,WF 6 , and the like
- FIG. 3 is a detailed partial view of FIG. 2 of a
- a pressure regulator 46 which may or may not be
- FIG. 4 represents a simplified schematic diagram of one
- Feed gas 90 from a semiconductor manufacturing process is
- First stage (N) membrane Ml creates a permeate stream 94 comprised primarily of carrier and process gases
- a back pressure regulator 97 provides a pressure drop across
- Non-permeate stream 96 then enters a second
- a second back pressure regulator 99 is provided to the M2 membrane.
- streams 94 and 100 may be combined and either
- valve 104 and conduit 106 which allow
- vacuum means 102 is illustrated on the recycled gas stream.
- Vacuum pump 102 if present, allows recycled gas stream 100
- vacuum means 102 itmay be utilized with or
- FIG. 4a represents the embodiment of Fig. 4, where the
- FIG. 5 illustrates a system and process substantially
- conduit 110 and vacuum pump 112 are optionally provided.
- the recycle gases in conduit 108 are comprised
- a heated gas such as nitrogen, helium, argon or the
- Such heated gas preferably above 60°C to 70°C.
- any PFC species such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas. This may be any PFC species, such as C2F6, in the heated gas.
- heating the tubing by any means such as a heating
- the membrane (s) may be heated, alone or with simultaneous
- tubing system is used to heat the PFC gas mixture, can be to circulate as heating gas the permeate gas which is recovered
- carrier gas such as nitrogen, argon or the like
- FIGS. 6 and 7 illustrate two other possible embodiments
- FIG. 6 several identical or different
- the gas exhausts from 60...61
- permeate 65 may be vented and a non-permeate 66 and 66a
- permeate stream 66c may be routed to one or more membrane units M 2 , M 3 , ...M N , thus improving the purity of the PFCs.
- a sweep gas stream 66b may be employed to sweep
- Membrane units M 2 , M 3 and M N also serve as the permeate side of Ml.
- Membrane units M 2 , M 3 and M N also serve as the permeate side of Ml.
- one process may be a metal
- oxide etch another might be an oxide etch, and yet another
- controller 200 which in this case accepts a
- the flow measurement device Ml using a set point PFC concentration in the non-permeate stream 66.
- the flow measurement device
- membrane units Ml, M2 , M3 , and MN as desired.
- FIG. 7 is a parallel processing embodiment wherein each
- Each feed stream 74...75 is fed to a membrane system M 1 ...M N
- permeate gases are vented together at 78 while each non-
- permeate 79, 80 is recycled, preferably to its corresponding
- FIG. 8 illustrates at 20°C, two different flowrates of
- FIG. 8 clearly illustrates for low pressure
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Treating Waste Gases (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU74311/98A AU7431198A (en) | 1998-01-16 | 1998-04-16 | Process and system for separation and recovery of perfluorocompound gases |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10007021A JP2999168B2 (ja) | 1997-01-16 | 1998-01-16 | ペルフルオロ化合物ガスの分離および回収のための改良された方法および装置 |
JP8/7021 | 1998-01-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1999036159A1 true WO1999036159A1 (fr) | 1999-07-22 |
Family
ID=11654395
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP1998/002272 WO1999036159A1 (fr) | 1998-01-16 | 1998-04-16 | Procede et systeme de separation et de recuperation de gaz de composes perfluores |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU7431198A (fr) |
WO (1) | WO1999036159A1 (fr) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1065459A3 (fr) * | 1999-06-28 | 2001-01-17 | Praxair Technology, Inc. | Récupération de PFC par condensation |
WO2010144523A1 (fr) * | 2009-06-10 | 2010-12-16 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Procédé et système pour récupérer du gaz à l'aide d'une membrane et d'une quantité réglable de pérméat recyclé combinée à une charge d'alimentation |
US8357228B2 (en) | 2007-10-12 | 2013-01-22 | Taiyo Nippon Sanso Corporation | Gas purification method |
WO2021094709A1 (fr) * | 2019-11-13 | 2021-05-20 | Edwards Limited | Récupération de gaz inerte à partir d'outil de fabrication de semi-conducteurs |
WO2022023725A1 (fr) * | 2020-07-28 | 2022-02-03 | Edwards Limited | Système de récupération de gaz noble |
US12285715B2 (en) | 2020-07-28 | 2025-04-29 | Edwards Limited | Noble gas recovery system |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5089135A (en) * | 1988-01-20 | 1992-02-18 | Mitsubishi Rayon Co., Ltd. | Carbon based porous hollow fiber membrane and method for producing same |
EP0649676A1 (fr) * | 1993-10-20 | 1995-04-26 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Posttraitement de membranes pour la séparation de gaz avec fluoropolymère |
EP0754487A1 (fr) * | 1995-07-17 | 1997-01-22 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Procédé et dispositif pour séparer et récupérer des composés perfluoriques gazeux |
-
1998
- 1998-04-16 WO PCT/EP1998/002272 patent/WO1999036159A1/fr active Application Filing
- 1998-04-16 AU AU74311/98A patent/AU7431198A/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5089135A (en) * | 1988-01-20 | 1992-02-18 | Mitsubishi Rayon Co., Ltd. | Carbon based porous hollow fiber membrane and method for producing same |
EP0649676A1 (fr) * | 1993-10-20 | 1995-04-26 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Posttraitement de membranes pour la séparation de gaz avec fluoropolymère |
EP0754487A1 (fr) * | 1995-07-17 | 1997-01-22 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Procédé et dispositif pour séparer et récupérer des composés perfluoriques gazeux |
Non-Patent Citations (1)
Title |
---|
W. J. KOROS ET AL.: "Controlled permeability polymer membranes", ANNU. REV. MATER. SCI., no. 22, 1992, pages 47 - 89, XP002078858 * |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1065459A3 (fr) * | 1999-06-28 | 2001-01-17 | Praxair Technology, Inc. | Récupération de PFC par condensation |
US6257018B1 (en) | 1999-06-28 | 2001-07-10 | Praxair Technology, Inc. | PFC recovery using condensation |
US8357228B2 (en) | 2007-10-12 | 2013-01-22 | Taiyo Nippon Sanso Corporation | Gas purification method |
WO2010144523A1 (fr) * | 2009-06-10 | 2010-12-16 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Procédé et système pour récupérer du gaz à l'aide d'une membrane et d'une quantité réglable de pérméat recyclé combinée à une charge d'alimentation |
CN102458612A (zh) * | 2009-06-10 | 2012-05-16 | 乔治洛德方法研究和开发液化空气有限公司 | 用于再循环至供给气的渗透量可调整的基于膜的气体回收系统和方法 |
US8444749B2 (en) | 2009-06-10 | 2013-05-21 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method and system for membrane-based gas recovery |
CN102458612B (zh) * | 2009-06-10 | 2014-08-13 | 乔治洛德方法研究和开发液化空气有限公司 | 用于再循环至供给气的渗透量可调整的基于膜的气体回收系统和方法 |
WO2021094709A1 (fr) * | 2019-11-13 | 2021-05-20 | Edwards Limited | Récupération de gaz inerte à partir d'outil de fabrication de semi-conducteurs |
WO2022023725A1 (fr) * | 2020-07-28 | 2022-02-03 | Edwards Limited | Système de récupération de gaz noble |
US12285715B2 (en) | 2020-07-28 | 2025-04-29 | Edwards Limited | Noble gas recovery system |
Also Published As
Publication number | Publication date |
---|---|
AU7431198A (en) | 1999-08-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5858065A (en) | Process and system for separation and recovery of perfluorocompound gases | |
US5785741A (en) | Process and system for separation and recovery of perfluorocompound gases | |
US5919285A (en) | Process and system for separation and recovery of perfluorocompound gases | |
US5759237A (en) | Process and system for selective abatement of reactive gases and recovery of perfluorocompound gases | |
US5976222A (en) | Recovery of perfluorinated compounds from the exhaust of semiconductor fabs using membrane and adsorption in series | |
US5779763A (en) | Process for recovering semiconductor industry cleaning compounds | |
US6187077B1 (en) | Separation of CF4 and C2F6 from a perfluorocompound mixture | |
US5843208A (en) | Process for recovering sulfur hexafluoride | |
WO1999036159A1 (fr) | Procede et systeme de separation et de recuperation de gaz de composes perfluores | |
US7332017B2 (en) | Method and apparatus for separation of moisture from fluids | |
WO2001024913A1 (fr) | Procede et appareil permettant de separer de l'hexafluorure de soufre d'un flux gazeux a teneur en tetrafluorure de carbone et en air | |
IL135653A (en) | Semiconductor production system and recovery of at least one perfluorocompound gas from a gas mixture flowing from such a system | |
WO1998032521A1 (fr) | Recuperation de composes perfluores et membranes a tamis moleculaire mettant en oeuvre des gaz hydrofluorocarbones | |
JP2000325732A (ja) | 真空ポンプ希釈剤をリサイクルしつつ半導体製造工程から出る排ガスからフッ素化化学薬品を分離回収する方法 | |
Wijmans et al. | Recovery of perfluoroethane from chemical vapor deposition operations in the semiconductor industry | |
RU2052277C1 (ru) | Способ отделения паров низкокипящих органических жидкостей от исходной смеси воздуха с 5 - 30 об.% паров этих жидкостей | |
JP2000334249A (ja) | 膜と吸着を連続して用いる半導体製造における排ガスからのフッ素化合物の分離方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AL AM AT AU AZ BA BB BG BR BY CA CH CN CU CZ DE DK EE ES FI GB GE GH GM GW HU ID IL IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT UA UG US UZ VN YU ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GH GM KE LS MW SD SZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
NENP | Non-entry into the national phase |
Ref country code: KR Ref country code: CA |
|
REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |
|
122 | Ep: pct application non-entry in european phase |