WO1999057949A1 - Couche intermediaire pour ameliorer la resistance au pelage de feuilles de cuivre - Google Patents
Couche intermediaire pour ameliorer la resistance au pelage de feuilles de cuivre Download PDFInfo
- Publication number
- WO1999057949A1 WO1999057949A1 PCT/US1999/009551 US9909551W WO9957949A1 WO 1999057949 A1 WO1999057949 A1 WO 1999057949A1 US 9909551 W US9909551 W US 9909551W WO 9957949 A1 WO9957949 A1 WO 9957949A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- laminate
- peel strength
- copper foil
- organic resin
- copper
- Prior art date
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 48
- 239000011889 copper foil Substances 0.000 title claims abstract description 41
- 229920005989 resin Polymers 0.000 claims abstract description 47
- 239000011347 resin Substances 0.000 claims abstract description 47
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000013034 phenoxy resin Substances 0.000 claims abstract description 9
- 229920006287 phenoxy resin Polymers 0.000 claims abstract description 9
- 239000003822 epoxy resin Substances 0.000 claims abstract description 8
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 8
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000004593 Epoxy Substances 0.000 claims description 5
- 238000010030 laminating Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 239000011152 fibreglass Substances 0.000 claims description 3
- 230000009477 glass transition Effects 0.000 abstract description 4
- 239000002648 laminated material Substances 0.000 abstract description 3
- 150000001875 compounds Chemical class 0.000 abstract description 2
- 239000011888 foil Substances 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 238000003475 lamination Methods 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000003750 conditioning effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 230000008646 thermal stress Effects 0.000 description 4
- 229920003319 Araldite® Polymers 0.000 description 3
- 101100260020 Caenorhabditis elegans mls-1 gene Proteins 0.000 description 2
- 230000003466 anti-cipated effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000010561 standard procedure Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 101100451301 Caenorhabditis elegans mls-2 gene Proteins 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000003339 best practice Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0358—Resin coated copper [RCC]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0759—Forming a polymer layer by liquid coating, e.g. a non-metallic protective coating or an organic bonding layer
Definitions
- the circuitry board has a low dielectric constant (Dk) and a high glass transition temperature (Tg) .
- Dk dielectric constant
- Tg glass transition temperature
- Peel strength refers to the strength of adhesion of coated copper layers to a circuit board substrate and high peel strength is generally desirable. Peel strength may be even more severely reduced when low or very low profile copper foils are employed.
- low or very low profile copper foils are critical to the success of circuit board laminates for use in very dense circuit ⁇ esigns.
- One form of adhesive that is sometimes used to and in bonding of resin to foil is to first coat the foil with a layer of uncured liquid resin itself which is intended to assist an integrating the foil to the laminate. Often such upper foils are coated with silane, which is believed to aid adhesion.
- U.S. Patents 5,525,433 and 5,629,433 describe some multifunctional epoxy compounds which can be used to attach foils to a laminate pre-preg.
- the present invention is a method of manufacturing a copper-clad laminate having enhanced peel strength comprising the step of applying an organic resin coating selected from the group consisting of high molecular weight epoxy or phenoxy resins or combinations thereof to a surface of a copper foil and laminating the copper foil to a low Dk laminate.
- the present invention is also a copper-clad laminate made by applying an organic resin coating to a surface of a copper foil and laminating the copper foil to a laminate, the organic resin selected from the group consisting of epoxy or phenoxy resins or combinations thereof. It is an object of the present invention to provide a copper-clad laminate having a low dielectric constant, a high glass transition temperature, and a peel strength that meets industry standards . Other objects, advantages, and features of the present invention will become apparent after review of the specification and drawings.
- Fig. 1 is a plot of peel values (pli) of copper-clad laminate after thermal stress conditioning as a function of the number average molecular weight (Mn) of the organic resin coating applied to the copper foil prior to lamination.
- the present invention is a method of manufacturing a low Dk, high Tg copper-clad laminate having enhanced peel strength comprising the step of applying a high molecular weight organic resin coating to a surface of the copper foil prior to lamination.
- the present invention is also directed to the laminate materials and circuit boards made using this method.
- the organic resin coating for use within the present invention is preferably an uncured epoxy or phenoxy resin, or combinations thereof, having an average molecular weight greater than 4500. It has been found that high molecular weight epoxy and phenoxy compounds provided greater peel strength for low Dk and high Tg boards than other adhesives of lower molecular weight .
- enhanced peel strength it is meant that the peel strength after thermal stress conditioning exceeds the peel strength of a control laminate in which lamination occurs without applying an organic resin coating to a surface of the copper foil prior to lamination.
- the peel strength is enhanced at least about 100% greater than the peel strength of a comparable laminate lacking the organic resin coating on the copper film. Determining the peel strength of a laminate by standard methods is well within the ability of one of ordinary skill in the art.
- peel strength is affected by numerous factors, including the dielectric constant (Dk) and glass transition temperature (Tg) of the laminate, the profile of the copper foil, the number average molecular weight (Mn) of the organic resin coating on the copper foil, and the thickness of the organic resin coating applied.
- Dk dielectric constant
- Tg glass transition temperature
- Mn number average molecular weight
- Fig 1 the number average molecular weight of the organic resin coating on the copper foil
- peel strength For a particular laminate and foil, there exists a direct linear relationship between peel strength and Mn of the organic resin employed (Fig 1) .
- a laminate product having a low Dk and a high Tg e.g., AlliedSignal Laminate Systems product FR408
- a very low profile copper foil e.g. AlliedSignal Oak-Mitsui 1 oz .
- a laminate having a low Dk and a high Tg it is meant a laminate having a Dk of less than about 4.5 and a Tg of greater than about 170°C.
- the Dk value of the fiberglass and the impregnating resin are different and thus the Dk depends on the resin content of the laminate.
- Low Dk laminates generally have Dk values between 2.5 and 4.5 and preferably between 3.0 and 4.0. These values may be measured using a Hewlett Packard Materials/Impedance Analyzer, Model 4291A, operating at 100 MH Z .
- the peel strength increases with the treatment thickness of the organic resin applied to the copper foil prior to lamination.
- the minimum treatment thickness required to achieve a particular peel strength may vary depending on the laminate, the copper foil, and the organic resin.
- the preferred range of thickness of this organic resin is between .05 mils and .50 mils, with the most preferred being .08 to .16 mils. However, it is well within the ability of one of ordinary skill in the art to determine the minimum treatment thickness required for a particular selection of starting materials.
- the copper-clad laminates described in the examples were prepared by applying the organic resin to the copper foil prior to lamination, it is anticipated that the organic resin could be applied to the laminate prior to lamination of the copper foil. It is also specifically envisioned that copper foils can be pre-treated with the organic resin and stored until needed for lamination. What is important is simply the use of the organic resin to bind the copper foil to the laminate material.
- the examples below describe a method for manufacturing a copper clad laminate having a high peel strength using commercial epoxy or phenoxy products obtained from Phenoxy Specialties or Ciba-Geigy as the organic resin. It is expected that any epoxy or phenoxy resin could be employed in the practice of the present invention, provided that the resin has a sufficiently high number average molecular number. It is reasonably anticipated that any polymer that has a sufficiently high molecular weight and which is reactive toward epoxy resins or epoxy curatives could be used in the practice of the present invention.
- a copper-clad laminate was made by laminating, 2 plies of 7628- (41% resin content) (.014 inches) and AlliedSignal Oak-Mitsui 1 oz . MLS (reverse-treated, coated, very low profile) copper foil
- a plot of Mn versus peel strength for these resins shows a positive linear relationship between the Mn of the organic resin and peel strength (Fig. 1) .
- the plot indicates that when employing the FR408 laminate product or an equivalent and a standard HTE-1 oz . foil, the resin must have a Mn of at least about 4500 to meet the MIL-S-13949 specification of 8.0 pli.
- PKHS-40 phenoxy resin solution was diluted to various levels of solids content and brush applied to produce different dry film thickness levels on the copper foil substrate (CircuitFoils standard profile NTTW-HTE-l/2 oz . ) to evaluate the effect of treatment thickness on peel strength of copper- clad FR408 laminates.
- the treatment thickness was determined using a Veeco MP-900 B-Backscatter thickness measuring unit. The results indicate a minimum thickness requirement at or about 0.1 mils in order to obtain significant improvement in peel strength (Table 3) .
- the preferred range is 0.5 -.5 mils, thus minimizing any increase in thickness caused by the adhesive while supplying adequate strength, with the most preferred thickness being .08 to .16 mils.
- the best practice to date for manufacturing the treated foil product on a large scale consists of reverse roll coating foils as supplied from the foil manufacturer.
- any process method of coating may be employed as long as the resultant coating thickness is in the desired range.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP99920252A EP1004227A1 (fr) | 1998-05-01 | 1999-04-29 | Couche intermediaire pour ameliorer la resistance au pelage de feuilles de cuivre |
CA002298684A CA2298684A1 (fr) | 1998-05-01 | 1999-04-29 | Couche intermediaire pour ameliorer la resistance au pelage de feuilles de cuivre |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7124498A | 1998-05-01 | 1998-05-01 | |
US09/071,244 | 1998-05-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1999057949A1 true WO1999057949A1 (fr) | 1999-11-11 |
Family
ID=22100156
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1999/009551 WO1999057949A1 (fr) | 1998-05-01 | 1999-04-29 | Couche intermediaire pour ameliorer la resistance au pelage de feuilles de cuivre |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1004227A1 (fr) |
CA (1) | CA2298684A1 (fr) |
TW (1) | TW486430B (fr) |
WO (1) | WO1999057949A1 (fr) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6395378B2 (en) | 2000-01-14 | 2002-05-28 | Telefonaktiebolaget Lm Ericsson | PCB and method for making PCB with thin copper layer |
US6811917B2 (en) | 2000-08-14 | 2004-11-02 | World Properties, Inc. | Thermosetting composition for electrochemical cell components and methods of making thereof |
US7138203B2 (en) | 2001-01-19 | 2006-11-21 | World Properties, Inc. | Apparatus and method of manufacture of electrochemical cell components |
US8257820B2 (en) | 2006-08-08 | 2012-09-04 | World Properties, Inc. | Circuit materials with improved bond, method of manufacture thereof, and articles formed therefrom |
US8431222B2 (en) | 2006-08-08 | 2013-04-30 | World Properties, Inc. | Circuit materials with improved bond, method of manufacture thereof, and articles formed therefrom |
US8632874B2 (en) | 2006-08-08 | 2014-01-21 | Rogers Corporation | Dielectric materials, methods of forming subassemblies therefrom, and the subassemblies formed therewith |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3873637A (en) * | 1973-02-23 | 1975-03-25 | Sony Corp | Adhesive composition containing phenoxy and epoxy resins and a cross-linking agent therefor |
EP0227002A1 (fr) * | 1985-12-20 | 1987-07-01 | Advanced Interconnection Technology, Inc. | Adhésifs activables par la chaleur pour circuits imprimés |
US5486655A (en) * | 1992-08-17 | 1996-01-23 | Hitachi Chemical Co., Ltd. | Multiple wire adhesive on a multiple wire wiring board |
-
1999
- 1999-04-29 WO PCT/US1999/009551 patent/WO1999057949A1/fr not_active Application Discontinuation
- 1999-04-29 CA CA002298684A patent/CA2298684A1/fr not_active Abandoned
- 1999-04-29 EP EP99920252A patent/EP1004227A1/fr not_active Withdrawn
- 1999-05-10 TW TW88107038A patent/TW486430B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3873637A (en) * | 1973-02-23 | 1975-03-25 | Sony Corp | Adhesive composition containing phenoxy and epoxy resins and a cross-linking agent therefor |
EP0227002A1 (fr) * | 1985-12-20 | 1987-07-01 | Advanced Interconnection Technology, Inc. | Adhésifs activables par la chaleur pour circuits imprimés |
US5486655A (en) * | 1992-08-17 | 1996-01-23 | Hitachi Chemical Co., Ltd. | Multiple wire adhesive on a multiple wire wiring board |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6395378B2 (en) | 2000-01-14 | 2002-05-28 | Telefonaktiebolaget Lm Ericsson | PCB and method for making PCB with thin copper layer |
US6811917B2 (en) | 2000-08-14 | 2004-11-02 | World Properties, Inc. | Thermosetting composition for electrochemical cell components and methods of making thereof |
US7138203B2 (en) | 2001-01-19 | 2006-11-21 | World Properties, Inc. | Apparatus and method of manufacture of electrochemical cell components |
US8257820B2 (en) | 2006-08-08 | 2012-09-04 | World Properties, Inc. | Circuit materials with improved bond, method of manufacture thereof, and articles formed therefrom |
US8431222B2 (en) | 2006-08-08 | 2013-04-30 | World Properties, Inc. | Circuit materials with improved bond, method of manufacture thereof, and articles formed therefrom |
US8632874B2 (en) | 2006-08-08 | 2014-01-21 | Rogers Corporation | Dielectric materials, methods of forming subassemblies therefrom, and the subassemblies formed therewith |
DE112007001861B4 (de) | 2006-08-08 | 2022-08-11 | World Properties, Inc. | Schaltungsmaterial mit verbesserter Bindung, Verfahren zu dessen Herstellung und mehrschichtige Schaltung |
US8519273B2 (en) | 2008-04-10 | 2013-08-27 | Sankar Paul | Circuit materials with improved bond, method of manufacture thereof, and articles formed therefrom |
Also Published As
Publication number | Publication date |
---|---|
CA2298684A1 (fr) | 1999-11-11 |
TW486430B (en) | 2002-05-11 |
EP1004227A1 (fr) | 2000-05-31 |
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