WO1999051692A1 - Agents de matite a base de silice revetue - Google Patents
Agents de matite a base de silice revetue Download PDFInfo
- Publication number
- WO1999051692A1 WO1999051692A1 PCT/EP1999/002160 EP9902160W WO9951692A1 WO 1999051692 A1 WO1999051692 A1 WO 1999051692A1 EP 9902160 W EP9902160 W EP 9902160W WO 9951692 A1 WO9951692 A1 WO 9951692A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- matting agent
- silicon dioxide
- urea
- moisture content
- agent according
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 75
- 239000006224 matting agent Substances 0.000 title claims abstract description 52
- 235000012239 silicon dioxide Nutrition 0.000 title claims abstract description 40
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 29
- 239000002245 particle Substances 0.000 claims abstract description 47
- OYQYHJRSHHYEIG-UHFFFAOYSA-N ethyl carbamate;urea Chemical class NC(N)=O.CCOC(N)=O OYQYHJRSHHYEIG-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 21
- 230000008569 process Effects 0.000 claims description 21
- 238000000576 coating method Methods 0.000 claims description 17
- 239000000017 hydrogel Substances 0.000 claims description 17
- 239000003973 paint Substances 0.000 claims description 17
- 239000004922 lacquer Substances 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical group CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 3
- 238000003847 radiation curing Methods 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 239000013049 sediment Substances 0.000 description 27
- 239000001993 wax Substances 0.000 description 22
- 229910002027 silica gel Inorganic materials 0.000 description 13
- 239000000741 silica gel Substances 0.000 description 13
- 239000000047 product Substances 0.000 description 12
- 238000000227 grinding Methods 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 238000003980 solgel method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 150000003672 ureas Chemical class 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000013065 commercial product Substances 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 230000009974 thixotropic effect Effects 0.000 description 3
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000006259 organic additive Substances 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229940060046 senosol Drugs 0.000 description 2
- -1 silver halide Chemical class 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 235000012216 bentonite Nutrition 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000001246 colloidal dispersion Methods 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000005189 flocculation Methods 0.000 description 1
- 230000016615 flocculation Effects 0.000 description 1
- 244000144992 flock Species 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000004200 microcrystalline wax Substances 0.000 description 1
- 235000019808 microcrystalline wax Nutrition 0.000 description 1
- 239000012184 mineral wax Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- PWZUZQNZVZKCBI-UHFFFAOYSA-N o-ethyl carbamothioate Chemical group CCOC(N)=S PWZUZQNZVZKCBI-UHFFFAOYSA-N 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000005624 silicic acid group Chemical class 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- SSGGNFYQMRDXFH-UHFFFAOYSA-N sulfanylurea Chemical compound NC(=O)NS SSGGNFYQMRDXFH-UHFFFAOYSA-N 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 239000004924 water-based lacquer Substances 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3063—Treatment with low-molecular organic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/42—Gloss-reducing agents
Definitions
- the present invention relates to coated matting agents, processes for their preparation and their use in paints and lacquers.
- Silicon dioxide particles or silica gel particles are used, inter alia, as matting agents to achieve a micro-rough surface on coatings.
- untreated silica gel particles often form hard sediments during storage. Attempts to redisperse these matting agents are usually difficult, and in many cases unsuccessful. This then often means that the gloss of coatings produced with such paints varies as the paint is used up, since some of the matting agent accumulates on the bottom of the container in which the paint or lacquer is stored.
- additives such as bentonites , which form thixotropic structures and prevent sedimentation of the particles, are added by the paint manufacturer.
- the manufacturer modifies the matting agents themselves, i.e. for example coats them with a wax chosen from the group consisting of polyolefins, mineral waxes, paraffins and the like. 5 to 10 wt.% wax, based on the matting agent, is usually used to form a matting agent which gives, in conventional paints and lacquers, soft sediments which can easily be redispersed. - 2 -
- DE 10 06 100 thus discloses a process for the preparation of silica gel matting agents in which dried and ground silica gel is impregnated with microcrystalline wax which is insoluble in solvents for lacquers and the like. The process is carried out at temperatures above the melting point of the wax.
- Another process for the preparation of matting agents is known from DE 15 92 865.
- an aqueous emulsion or dispersion of an inert colourless high-melting wax or synthetic substances which is insoluble in lacquer solvents at room temperature is employed for modification of the silicic acids.
- WO 95/31508 discloses a matting agent based on an amorphous silica gel having a certain pore size distribution, which is coated with specific waxes and has good matting properties, and a process for the preparation thereof.
- EP-A-0 348 226 discloses a matting agent based on an inorganic hydrogel having a certain pore volume and content of volatile substances, and a specific average particle size and particle size distribution, so that a certain grinding fineness is obtained when it is dispersed in a coating composition.
- EP-A-0 003 627 discloses a process for the preparation of a hydrophilic composition of urea, formaldehyde and an aqueous colloidal dispersion of silica particles, in which various mixing stages are carried out at certain pH values and the silica particles have an average size of 1 to 8 ⁇ m.
- the compositions obtained by the process disclosed are used in photographic photosensitive silver halide material.
- WO 97/12942 discloses a coating material which can be cured by irradiation or heat and consists of a composition which comprises chemically modified silicon dioxide particles.
- the silicon dioxide particles are modified to the effect that organic compounds which contain polymeric unsaturated groups, (thio)urea - 3 -
- silicon dioxide xerogel particles are usually coated with wax in a jet mill at temperatures above the melting point of the wax. During this operation, the molten wax is distributed homogeneously on the silicon dioxide particles.
- the object of the present invention is thus to provide an efficient matting agent which, during storage in water-based paints and lacquers, forms soft sediments which can readily be redispersed. It is also an object of the present invention to provide a more efficient coating process for silicon dioxide particles, which is superior to the coating with wax known from the prior art.
- a matting agent based on silicon dioxide which is characterized in that it comprises silicon dioxide particles which have a particle size of 2.5 to 20 ⁇ m and a moisture content of 0 to 65 wt.%, based on the matting agent, and are coated with 0.2 to 10 wt . % of a urea-urethane derivative or a mixture of urea-urethane derivatives of the general formula: - 4 -
- the invention furthermore relates to a process for the preparation of a matting agent, which is characterized in that the urea-urethane derivative ( s ) of the formula (I) is/are added to the silicon dioxide during the micronization thereof.
- urea-urethane derivatives according to the invention are also called the organic component or additive in the following.
- the organic additive is thus in general a urea-urethane compound of low molecular weight.
- R and R independently of one another are preferably
- R is preferably
- urea-urethane derivatives which are particularly preferred according to the invention are: . — . o o
- the silicon dioxide component is preferably chosen from silicic acid hydrogels and/or silicic acid xerogels. These can be prepared by the sol-gel process or by the precipitation process.
- the size of the silicon dioxide particles is preferably 5 to 15 ⁇ m, in particular 5 to 10 ⁇ m.
- the silicon dioxide particles have a moisture content of 0 to 10 wt.%, in particular 0 to 5 wt.%, and preferably 1 to 3 wt . % , or 5 a moisture content of 30 to 65 wt.%, in particular 40 to 60 wt.%, and preferably about 50 wt.%, based on the matting agent.
- a moisture content 0 to 10 wt.%, in particular 0 to 5 wt.%, and preferably 1 to 3 wt . % , or 5 a moisture content of 30 to 65 wt.%, in particular 40 to 60 wt.%, and preferably about 50 wt.%, based on the matting agent.
- urea-urethane derivative of the formula (I) are preferably coated with 0.3 to 8 wt.%, in particular 0.5 to 3 wt . % urea-urethane derivative of the formula (I), based on the matting agent.
- the matting agents according to the invention are in general prepared by adding the urea derivatives according to the invention to the silicon dioxide during comminution thereof. This can be carried out, for example, in a jet mill or in high-speed mixers (e.g. in a Henschel mixer).
- the jet mill is preferably operated with a hot air supply.
- the organic component is distributed in the form of very fine particles on the silica gel particles.
- urea derivatives themselves can be prepared as disclosed in EP-A-0 006 252. They can advantageously be added in the form of organic solutions which contain 10 to 75 wt.%, preferably 30 to 60 wt.%, and in particular 45 to 55 wt.% urea-urethane derivative.
- N-Methylpyrrolidone for example, can be used as the solvent.
- BYK-410 from BYK Chemie GmbH, Wesel, which comprises the urea-urethanes of the - 7 -
- the silicon dioxide or silica gel used in the process according to the invention can be prepared by the sol-gel process, as described, for example, in EP-A-0 384 226.
- Hydrogels are employed according to the invention in particular.
- Hydrogel matting agents have the advantage that they do not form dusts, because the pores are filled with water. Small amounts of surface water cause an adhesion of the particles to one another.
- the hydrogel is micronized with hot air in a jet mill, dried to a moisture content of 30 to 65 wt.%, preferably 40 to 60 wt.%, in particular about 50 wt.%, and coated with the urea derivative.
- a xerogel is employed, this is preferably micronized with hot air in a jet mill, adjusted to a moisture content of 0 to 10 wt.%, preferably 0 to 5 wt.%, in particular 1 to 3 wt.%, and coated with the urea derivative.
- the new coating process as a rule requires only about 1 wt.% organic material, based on the matting agent, although less or more organic material can be employed according to the invention for the coating.
- organic material based on the matting agent, although less or more organic material can be employed according to the invention for the coating.
- concentrations of organic additive are therefore needed to allow the formation of soft sediments, which can readily be redissolved, in paints and lacquers.
- 5 to 10 wt.% wax is needed to prevent the formation of hard sediments in water-based systems to a sufficient extent.
- the process according to the invention therefore not only gives a cost advantage due to saving of material and lower process temperatures, but also increases the efficiency of the matting agent.
- the efficiency of the material is higher, because the silicon dioxide content, which causes the matting, is higher. - 8 -
- the urea-urethane derivative must in general be separated into individual molecules so that it has the maximum activity. This is typically achieved by dissolving it in solvents of moderate polarity.
- the addition of the additive to the silica gel particles in the jet mill leads to deaggregation to very fine particles, regardless of the solvent.
- These very fine particles of the organic component are bonded to the silica gel particles. This causes an inhomogeneous polarity of the particle surface and consequently only a loose agglomeration ( flocculation) during sediment formation.
- the flocks are large enough to withstand the gravimetric forces in the sediment, and remain soft and, even after storage, readily dissolvable.
- the matting agents according to the invention can therefore advantageously be used in water-based coatings, paints and lacquers and aqueous radiation-curing lacquer systems .
- the pore volume of the particles was measured by adsorption of nitrogen using an ASAP 2400 nitrogen adsorption measuring instrument from Micro eritics .
- the particle sizes were determined with the aid of the Malvern Mastersizer from Malvern Instruments Ltd.
- the moisture content of the hydrogel was determined via the weight loss at a temperature of 160°C.
- the moisture content of the xerogel was measured using a Karl-Fischer device. The percentages by weight stated relate to the weight of the end product (matting agent).
- the carbon content was measured using a Leco SC 440 apparatus (D ⁇ sseldorf) and stated in per cent by weight, based on the silicon dioxide content in the end product. - 9 -
- a silicic acid hydrogel having a moisture content of 65 wt.% was prepared and micronized in a jet mill operated with hot air.
- the hot air temperature was 220°C and the amount introduced was 720 kg/h.
- 2.6 1/h urea-urethane derivative BYK-410 commercial product from BYK Chemie GmbH Wesel
- the resulting product had a particle size of 8 ⁇ m, a water content of 54.5% and a carbon content of 0.56 wt.% (corresponding to an additive concentration of about 0.7 wt.%).
- a silicic acid hydrogel having a moisture content of 65 wt.% was micronized to a particle size of 8.0 ⁇ m and a water content of 56.3 wt.% in a jet mill with a hot air supply. In contrast to example 1, however, no coating was carried out.
- the non-coated hydrogel matting agents (comparison example 1) formed a hard sediment which could no longer be dispersed by shaking. It was possible to remove the sediment from the bottom of the vessel only by using a spatula.
- the hydrogel coated with BYK-410 (example 1) formed a sediment which could be redispersed very easily. The sediment already became detached from the bottom of the vessel by merely turning the vessel over.
- a silica acid xerogel prepared by the sol-gel process and having a moisture content of about 1 wt . % and a particle size of 0.1 to 3 mm was mixed with BYK-410 in a Henschel mixer of the type FM 10L. 7.5 g of the organic compound were added to 750 g silica gel while stirring at 1,000 rpm for 10 minutes. When the addition had ended, mixing was continued for 10 minutes at 2,500 rpm. The mixture was micronized to a particle size of 5 ⁇ m in a fluidized bed jet mill of the type Alpine AFG 100.
- the grinding conditions used here were:
- a product having a particle size of 5.49 ⁇ m, a carbon content of 0.66 wt.% and a moisture content of 2.7 wt.% was obtained.
- the product thus obtained had a particle size of 5.5 ⁇ m, a carbon content of ⁇ 0.2 wt.% and a moisture content of 1.34 wt.%.
- a wax-coated comparison material was prepared on a production scale by grinding silicic acid xerogel in an air jet mill with simultaneous addition of wax into the jet mill.
- the silica gel was fed in at 350 kg/h and the wax at 30 kg/h.
- the other grinding conditions were:
- a product having a particle size of 5.56 ⁇ m, a carbon content of 7.5 wt.% and a moisture content of 1.3 wt.% was obtained.
- comparison example 2 and comparison example 3 were incorporated into 100 g Senosol Hydro-Glanzlack in the same manner as described under example 1 and comparison example 1.
- the sedimentation of the particles was also investigated as in example 1. After 6 weeks, the consistency of the sediments was evaluated as follows .
- Example 2 The product according to the invention formed a sediment which could be redispersed very easily. The sediment could already be detached from the bottom merely by turning the vessel over. - 12 -
- Comparison example 2 The non-coated product formed a hard sediment which could be detached from the bottom again only using a spatula.
- Comparison example 3 The product coated with wax formed a hard sediment which could be redispersed by vigorously shaking the vessel .
- the comparison shows the clearly improved properties of a coating with 1 wt . % BYK-410 compared with a coating with 10 wt.% wax and non-coated matting agent.
- comparison example 2 and comparison example 3 were incorporated into a conventional nitrocellulose paint (WACOCELL S 689).
- 2 g of the matting agent were incorporated into 100 g nitrocellulose paint using a dissolver at 3,000 rpm for 10 minutes, the mixture was introduced into 100 ml vessels and these were closed and stored in the laboratory at room temperature for 6 weeks. After this time, the consistency of the sediments formed from the matting agent particles was investigated:
- Example 2 The product coated according to the invention formed a hard sediment which was comparable to that of the product from comparison example 2.
- Comparison example 2 The non-coated matting agent formed a hard sediment which could be dispersed only with great difficulty.
- Comparison example 3 The dispersing agent coated with wax formed a sediment which could be redispersed very easily. The sediment could already be detached from the bottom by turning the vessel over. - 13 -
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Silicon Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU34187/99A AU3418799A (en) | 1998-04-03 | 1999-03-30 | Matting agents based on coated silicon dioxide |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19816362.2 | 1998-04-03 | ||
DE19816362A DE19816362A1 (de) | 1998-04-03 | 1998-04-03 | Mattierungsmittel auf Basis von beschichtetem Siliciumdioxid |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1999051692A1 true WO1999051692A1 (fr) | 1999-10-14 |
Family
ID=7864398
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP1999/002160 WO1999051692A1 (fr) | 1998-04-03 | 1999-03-30 | Agents de matite a base de silice revetue |
Country Status (4)
Country | Link |
---|---|
AU (1) | AU3418799A (fr) |
DE (1) | DE19816362A1 (fr) |
TW (1) | TW500779B (fr) |
WO (1) | WO1999051692A1 (fr) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001066515A1 (fr) * | 2000-03-02 | 2001-09-13 | Asahi Kasei Kabushiki Kaisha | Substance chromogene et materiau d'enregistrement |
US6797771B2 (en) * | 2000-02-02 | 2004-09-28 | Basf Coatings Ag | Aqueous composition that can be hardened physically, thermally or thermally and with actinic radiation and the derivatives and production thereof |
RU2245873C2 (ru) * | 2000-03-02 | 2005-02-10 | Асахи Касеи Кабусики Кайся | Новые цветообразующие композиции и записывающий материал |
CN1330714C (zh) * | 2005-01-18 | 2007-08-08 | 武汉理工大学 | 可诱导聚氯乙烯结晶的纳米二氧化硅制备方法 |
US7635662B2 (en) | 1998-09-04 | 2009-12-22 | Chemipro Kasei Kaisha, Ltd. | Compound for color-producing composition, and recording material |
CN101003499B (zh) * | 2000-03-02 | 2011-01-19 | Chemipro化成株式会社 | 生色组合物和记录材料 |
DE102009045109A1 (de) | 2009-09-29 | 2011-03-31 | Evonik Degussa Gmbh | Oberflächenmodifizierte Semi-Gele |
CN101585977B (zh) * | 2009-06-12 | 2012-12-19 | 武汉理工大学 | 一种聚丙烯增强增韧改性剂的制备方法 |
WO2020159916A1 (fr) | 2019-02-01 | 2020-08-06 | W.R. Grace & Co.-Conn. | Agents de matage à base de silice et leurs procédés de production et d'utilisation |
WO2021041101A1 (fr) | 2019-08-30 | 2021-03-04 | W. R. Grace & Co.-Conn. | Formulations matifiantes à base de silice et procédés pour les fabriquer et les utiliser |
US11999857B2 (en) | 2017-06-02 | 2024-06-04 | W.R. Grace & Co.-Conn. | Coated particles and methods of making and using the same |
US12203006B2 (en) | 2017-08-03 | 2025-01-21 | W.R. Grace & Co.-Conn. | Silica-based matting agents and methods of making and using the same |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE502004004410D1 (de) | 2003-05-14 | 2007-09-06 | Degussa | Oberflächenmodifizierte Fällungskieselsäuren |
US7560587B2 (en) * | 2004-12-04 | 2009-07-14 | Xerox Corporation | Bis[urea-urethane] compounds |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4314924A (en) * | 1978-05-26 | 1982-02-09 | Byk-Mallinckrodt Chemische Produkte Gmbh | Thixotropic agent for use in coating compositions |
US4857111A (en) * | 1987-03-04 | 1989-08-15 | Byk-Chemie Gmbh | Thixotropic formulations, use of polycarboxylic acid amides to produce them, and silica coated with polycarboxylic acid amides |
EP0384226A1 (fr) * | 1989-02-15 | 1990-08-29 | W.R. Grace & Co.-Conn. | Agent mattant minéral en hydrogel |
EP0442325A1 (fr) * | 1990-02-14 | 1991-08-21 | Grace GmbH | Agent de matité à base de silice, procÀ©dé de fabrication et d'utilisation |
WO1996034062A1 (fr) * | 1995-04-26 | 1996-10-31 | Grace Gmbh | Agent de matite a base de silice agregee |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4032619C3 (de) * | 1990-10-15 | 1998-01-08 | Grace Gmbh | Si0¶2¶-Mattierungsmittel, Verfahren zu dessen Herstellung und dessen Verwendung |
JP3474330B2 (ja) * | 1995-10-03 | 2003-12-08 | Jsr株式会社 | 反応性シリカ粒子、その製法および用途 |
-
1998
- 1998-04-03 DE DE19816362A patent/DE19816362A1/de not_active Withdrawn
-
1999
- 1999-03-30 AU AU34187/99A patent/AU3418799A/en not_active Abandoned
- 1999-03-30 WO PCT/EP1999/002160 patent/WO1999051692A1/fr active Application Filing
- 1999-04-02 TW TW088105292A patent/TW500779B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4314924A (en) * | 1978-05-26 | 1982-02-09 | Byk-Mallinckrodt Chemische Produkte Gmbh | Thixotropic agent for use in coating compositions |
US4857111A (en) * | 1987-03-04 | 1989-08-15 | Byk-Chemie Gmbh | Thixotropic formulations, use of polycarboxylic acid amides to produce them, and silica coated with polycarboxylic acid amides |
EP0384226A1 (fr) * | 1989-02-15 | 1990-08-29 | W.R. Grace & Co.-Conn. | Agent mattant minéral en hydrogel |
EP0442325A1 (fr) * | 1990-02-14 | 1991-08-21 | Grace GmbH | Agent de matité à base de silice, procÀ©dé de fabrication et d'utilisation |
WO1996034062A1 (fr) * | 1995-04-26 | 1996-10-31 | Grace Gmbh | Agent de matite a base de silice agregee |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7635662B2 (en) | 1998-09-04 | 2009-12-22 | Chemipro Kasei Kaisha, Ltd. | Compound for color-producing composition, and recording material |
US7807738B2 (en) | 1998-09-04 | 2010-10-05 | Chemipro Kasei Kaisha, Ltd. | Compound for color-producing composition, and recording material |
US6797771B2 (en) * | 2000-02-02 | 2004-09-28 | Basf Coatings Ag | Aqueous composition that can be hardened physically, thermally or thermally and with actinic radiation and the derivatives and production thereof |
AU779924B2 (en) * | 2000-03-02 | 2005-02-17 | Chemipro Kasei Kaisha, Limited | Novel color former and recording material |
WO2001066515A1 (fr) * | 2000-03-02 | 2001-09-13 | Asahi Kasei Kabushiki Kaisha | Substance chromogene et materiau d'enregistrement |
RU2245873C2 (ru) * | 2000-03-02 | 2005-02-10 | Асахи Касеи Кабусики Кайся | Новые цветообразующие композиции и записывающий материал |
CN101003499B (zh) * | 2000-03-02 | 2011-01-19 | Chemipro化成株式会社 | 生色组合物和记录材料 |
CN1330714C (zh) * | 2005-01-18 | 2007-08-08 | 武汉理工大学 | 可诱导聚氯乙烯结晶的纳米二氧化硅制备方法 |
CN101585977B (zh) * | 2009-06-12 | 2012-12-19 | 武汉理工大学 | 一种聚丙烯增强增韧改性剂的制备方法 |
DE102009045109A1 (de) | 2009-09-29 | 2011-03-31 | Evonik Degussa Gmbh | Oberflächenmodifizierte Semi-Gele |
WO2011038992A1 (fr) | 2009-09-29 | 2011-04-07 | Evonik Degussa Gmbh | Semi-gels d'acide silicique modifiés en surface |
US11999857B2 (en) | 2017-06-02 | 2024-06-04 | W.R. Grace & Co.-Conn. | Coated particles and methods of making and using the same |
US12203006B2 (en) | 2017-08-03 | 2025-01-21 | W.R. Grace & Co.-Conn. | Silica-based matting agents and methods of making and using the same |
WO2020159916A1 (fr) | 2019-02-01 | 2020-08-06 | W.R. Grace & Co.-Conn. | Agents de matage à base de silice et leurs procédés de production et d'utilisation |
WO2021041101A1 (fr) | 2019-08-30 | 2021-03-04 | W. R. Grace & Co.-Conn. | Formulations matifiantes à base de silice et procédés pour les fabriquer et les utiliser |
Also Published As
Publication number | Publication date |
---|---|
DE19816362A1 (de) | 1999-10-07 |
AU3418799A (en) | 1999-10-25 |
TW500779B (en) | 2002-09-01 |
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