WO1998038195B1 - BASES CONTENANT DE L'AZOTE POUVANT ETRE ACTIVEES, A BASE DE CETONE α-AMMONIUM; DE CETONES D'IMINIUM OU DE CETONES D'AMIDINIUM ET DE BORATES D'ARYLE - Google Patents
BASES CONTENANT DE L'AZOTE POUVANT ETRE ACTIVEES, A BASE DE CETONE α-AMMONIUM; DE CETONES D'IMINIUM OU DE CETONES D'AMIDINIUM ET DE BORATES D'ARYLEInfo
- Publication number
- WO1998038195B1 WO1998038195B1 PCT/EP1998/000846 EP9800846W WO9838195B1 WO 1998038195 B1 WO1998038195 B1 WO 1998038195B1 EP 9800846 W EP9800846 W EP 9800846W WO 9838195 B1 WO9838195 B1 WO 9838195B1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- compound
- component system
- ketones
- component
- polyacrylate
- Prior art date
Links
- 150000002576 ketones Chemical class 0.000 title abstract 4
- 150000001642 boronic acid derivatives Chemical class 0.000 title 1
- 239000000203 mixture Substances 0.000 claims abstract 14
- 238000000034 method Methods 0.000 claims abstract 5
- -1 amidinium ketones Chemical class 0.000 claims abstract 3
- 238000006555 catalytic reaction Methods 0.000 claims abstract 3
- 238000002360 preparation method Methods 0.000 claims abstract 3
- 150000001875 compounds Chemical class 0.000 claims 12
- 229920000058 polyacrylate Polymers 0.000 claims 12
- 150000002367 halogens Chemical class 0.000 claims 8
- 229910052736 halogen Inorganic materials 0.000 claims 6
- 229920001228 polyisocyanate Polymers 0.000 claims 5
- 239000005056 polyisocyanate Substances 0.000 claims 5
- 125000001931 aliphatic group Chemical group 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 4
- 229920000647 polyepoxide Polymers 0.000 claims 4
- 150000008064 anhydrides Chemical group 0.000 claims 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 3
- 150000002894 organic compounds Chemical class 0.000 claims 3
- 229920000728 polyester Polymers 0.000 claims 3
- 239000004925 Acrylic resin Substances 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims 2
- 238000007259 addition reaction Methods 0.000 claims 2
- 150000001728 carbonyl compounds Chemical class 0.000 claims 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 2
- 125000003700 epoxy group Chemical group 0.000 claims 2
- 239000003822 epoxy resin Substances 0.000 claims 2
- 239000012948 isocyanate Substances 0.000 claims 2
- 150000002513 isocyanates Chemical class 0.000 claims 2
- 150000004658 ketimines Chemical class 0.000 claims 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 125000001624 naphthyl group Chemical group 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 238000006467 substitution reaction Methods 0.000 claims 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 claims 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- WYNCHZVNFNFDNH-UHFFFAOYSA-N Oxazolidine Chemical compound C1COCN1 WYNCHZVNFNFDNH-UHFFFAOYSA-N 0.000 claims 1
- WDJHALXBUFZDSR-UHFFFAOYSA-M acetoacetate Chemical compound CC(=O)CC([O-])=O WDJHALXBUFZDSR-UHFFFAOYSA-M 0.000 claims 1
- 150000001251 acridines Chemical class 0.000 claims 1
- 125000005466 alkylenyl group Chemical group 0.000 claims 1
- 235000010290 biphenyl Nutrition 0.000 claims 1
- 239000004305 biphenyl Substances 0.000 claims 1
- 125000001246 bromo group Chemical group Br* 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 125000002346 iodo group Chemical group I* 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 239000011368 organic material Substances 0.000 claims 1
- 150000004893 oxazines Chemical class 0.000 claims 1
- 150000002988 phenazines Chemical class 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 125000001725 pyrenyl group Chemical group 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 231100000489 sensitizer Toxicity 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 150000003839 salts Chemical class 0.000 abstract 2
- 150000001409 amidines Chemical class 0.000 abstract 1
- 150000001412 amines Chemical class 0.000 abstract 1
- 150000002466 imines Chemical class 0.000 abstract 1
Abstract
L'invention concerne des cétones α-ammonium, des cétones d'iminium ou des cétones d'amidinium sous la forme de leurs sels de tétraaryle- ou triarylborates qui peuvent être transformés, par voie photochimique, en amines, imines ou amidines. L'invention a aussi pour objet un procédé pour leur préparation. L'invention concerne également des compositions pouvant subir une réticulation ou une polymérisation basique comprenant ces cétones α-ammonium, cétones d'iminium ou cétones d'amidinium sous la forme de leurs sels tétra- ou triarylalkylborate. L'invention traite aussi d'un procédé pour réaliser des réactions de catalysation basique induites par voie photochimique, ainsi que leur utilisation comme photo-initiateurs pour les réactions de catalysation basique.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019997007769A KR100542419B1 (ko) | 1997-02-26 | 1998-02-14 | α-암모늄 케톤, 이미늄 케톤 또는 아미디늄 케톤 및 아릴 보레이트계의 광활성화 가능한 질소 함유 염기, 이의 제조방법 및 이를 포함하는 조성물 |
| JP53724898A JP4155603B2 (ja) | 1997-02-26 | 1998-02-14 | α−アンモニウムケトン、イミニウムケトンまたはアミジニウムケトンおよびアリールボラートに基づく、光による活性化が可能な窒素含有塩基 |
| DE69839020T DE69839020T2 (de) | 1997-02-26 | 1998-02-14 | Photoaktivierbare stickstoffhaltige Basen auf Basis von ALPHA-Ammonium-, Iminium- oder Amidiniumketonen und Arylboraten |
| BRPI9807790-2A BR9807790B1 (pt) | 1997-02-26 | 1998-02-14 | bases fotoativadas contendo nitrogênio baseadas em alfa-amÈnio cetonas, imìnio cetonas ou amidìnio cetonas e aril boratos, composição que as contém e processo para execução de reações catalisadas por base. |
| CA002281860A CA2281860C (fr) | 1997-02-26 | 1998-02-14 | Bases contenant de l'azote pouvant etre activees, a base de cetone .alpha.-ammonium; de cetones d'iminium ou de cetones d'amidinium et de borates d'aryle |
| AU64972/98A AU726375B2 (en) | 1997-02-26 | 1998-02-14 | Photoactivatable nitrogen-containing bases based on alpha-ammonium ketones, iminium ketones or amidinium ketones and aryl borates |
| EP98910669A EP1032576B1 (fr) | 1997-02-26 | 1998-02-14 | Bases contenant de l'azote pouvant etre activees, a base de cetone alpha-ammonium; de cetones d'iminium ou de cetones d'amidinium et de borates d'aryle |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH44497 | 1997-02-26 | ||
| CH444/97 | 1997-02-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO1998038195A1 WO1998038195A1 (fr) | 1998-09-03 |
| WO1998038195B1 true WO1998038195B1 (fr) | 1998-10-22 |
Family
ID=4187172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP1998/000846 WO1998038195A1 (fr) | 1997-02-26 | 1998-02-14 | BASES CONTENANT DE L'AZOTE POUVANT ETRE ACTIVEES, A BASE DE CETONE α-AMMONIUM; DE CETONES D'IMINIUM OU DE CETONES D'AMIDINIUM ET DE BORATES D'ARYLE |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP1032576B1 (fr) |
| JP (1) | JP4155603B2 (fr) |
| KR (1) | KR100542419B1 (fr) |
| AU (1) | AU726375B2 (fr) |
| BR (1) | BR9807790B1 (fr) |
| CA (1) | CA2281860C (fr) |
| DE (1) | DE69839020T2 (fr) |
| TW (1) | TW425399B (fr) |
| WO (1) | WO1998038195A1 (fr) |
| ZA (1) | ZA981556B (fr) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2332419C2 (ru) | 2001-10-17 | 2008-08-27 | Циба Спешиалти Кемикэлз Холдинг Инк. | Фотоактивируемые азотистые основания, фотополимеризующиеся композиции и применение |
| EP1652870B1 (fr) * | 2003-08-06 | 2009-06-17 | Mitsubishi Gas Chemical Company, Inc. | Composition photoreticulable et composition de revetement |
| WO2006008251A2 (fr) * | 2004-07-21 | 2006-01-26 | Ciba Specialty Chemicals Holding Inc. | Procede de photoactivation et utilisation d'un catalyseur suivant un processus en deux stades inverse |
| JP5606308B2 (ja) * | 2007-04-03 | 2014-10-15 | ビーエーエスエフ ソシエタス・ヨーロピア | 光活性窒素塩基 |
| EP2270114B1 (fr) * | 2008-03-31 | 2014-07-09 | San-Apro Limited | Générateur de photobases |
| TW201106101A (en) | 2009-06-01 | 2011-02-16 | Fujifilm Electronic Materials | Chemically amplified positive photoresist composition |
| US8968868B2 (en) * | 2010-06-30 | 2015-03-03 | 3M Innovative Properties Company | Curable-on-demand composition comprising dual reactive silane functionality |
| WO2013101742A1 (fr) * | 2011-12-29 | 2013-07-04 | 3M Innovative Properties Company | Composition de revêtement polymérisable à la demande à base de polysiloxane |
| JP5912946B2 (ja) * | 2012-01-11 | 2016-04-27 | 株式会社Adeka | 感光性樹脂組成物 |
| KR102026722B1 (ko) | 2012-03-22 | 2019-09-30 | 가부시키가이샤 아데카 | 신규 화합물 및 감광성 수지조성물 |
| JP5997041B2 (ja) * | 2012-12-26 | 2016-09-21 | 東京応化工業株式会社 | 感光性樹脂組成物 |
| JP5978138B2 (ja) * | 2013-01-22 | 2016-08-24 | 株式会社Adeka | 新規化合物及び感光性樹脂組成物 |
| EP3023462A4 (fr) | 2013-07-18 | 2017-04-12 | Cemedine Co., Ltd. | Composition photodurcissable |
| JP6409784B2 (ja) | 2013-12-13 | 2018-10-24 | セメダイン株式会社 | 接着性を有する光硬化性組成物 |
| JP6167089B2 (ja) * | 2014-03-27 | 2017-07-19 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜、硬化膜の製造方法および半導体デバイス |
| WO2016174192A1 (fr) | 2015-04-29 | 2016-11-03 | Bsn Medical Gmbh | Dispositif médical pour bains |
| MX380802B (es) | 2015-04-29 | 2025-03-12 | Bsn Medical Gmbh | Un proceso de etapas múltiples para la producción de no. |
| EP3395800B1 (fr) | 2017-04-26 | 2021-11-03 | Henkel AG & Co. KGaA | Composés azotés quaternaires héterocycliques comprenant un substituant polymérique et leur utilisation en tant que catalyseur photolatent dans des compositions durcissables |
| KR20210003869A (ko) | 2018-04-26 | 2021-01-12 | 헨켈 아게 운트 코. 카게아아 | 경화성 조성물에서 잠재성 촉매로서 사용하기 위한 4급 질소 화합물 |
| WO2020045458A1 (fr) | 2018-08-28 | 2020-03-05 | 学校法人東京理科大学 | Composition durcissable, produit durci et procédé de production de ce produit durci |
| CN115151591B (zh) * | 2020-06-26 | 2024-03-01 | 株式会社艾迪科 | 组合物、固化物及固化物的制造方法 |
| JPWO2021261497A1 (fr) * | 2020-06-26 | 2021-12-30 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2571113B2 (ja) * | 1988-12-29 | 1997-01-16 | 富士写真フイルム株式会社 | 光重合性組成物 |
| JP3412199B2 (ja) * | 1993-09-01 | 2003-06-03 | 東洋インキ製造株式会社 | 重合性組成物およびその硬化物の製造方法 |
| JP3293258B2 (ja) * | 1993-09-01 | 2002-06-17 | 東洋インキ製造株式会社 | ピリジニウム錯体およびその用途 |
| JPH09263063A (ja) * | 1996-01-22 | 1997-10-07 | Toyo Ink Mfg Co Ltd | 感エネルギー線画像形成用組成物、それを用いた画像形成媒体、および画像形成方法 |
| JPH09227854A (ja) * | 1996-02-26 | 1997-09-02 | Toyo Ink Mfg Co Ltd | 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物 |
| JPH09241614A (ja) * | 1996-03-04 | 1997-09-16 | Toyo Ink Mfg Co Ltd | 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物、硬化性組成物およびその硬化物 |
| JPH09316117A (ja) * | 1996-06-03 | 1997-12-09 | Toyo Ink Mfg Co Ltd | 重合性組成物およびその硬化物 |
| JPH09328507A (ja) * | 1996-06-10 | 1997-12-22 | Toyo Ink Mfg Co Ltd | 重合開始剤、重合性組成物およびその硬化物 |
| JPH101508A (ja) * | 1996-06-17 | 1998-01-06 | Toyo Ink Mfg Co Ltd | 感活性線酸発生剤組成物、感応性組成物および画像記録用組成物 |
| JPH107709A (ja) * | 1996-06-24 | 1998-01-13 | Toyo Ink Mfg Co Ltd | 感エネルギー線活性剤組成物、それを用いた感応性組成物ならびに画像形成用組成物 |
-
1998
- 1998-02-14 EP EP98910669A patent/EP1032576B1/fr not_active Expired - Lifetime
- 1998-02-14 CA CA002281860A patent/CA2281860C/fr not_active Expired - Fee Related
- 1998-02-14 DE DE69839020T patent/DE69839020T2/de not_active Expired - Lifetime
- 1998-02-14 JP JP53724898A patent/JP4155603B2/ja not_active Expired - Fee Related
- 1998-02-14 WO PCT/EP1998/000846 patent/WO1998038195A1/fr active IP Right Grant
- 1998-02-14 BR BRPI9807790-2A patent/BR9807790B1/pt not_active IP Right Cessation
- 1998-02-14 KR KR1019997007769A patent/KR100542419B1/ko not_active Expired - Fee Related
- 1998-02-14 AU AU64972/98A patent/AU726375B2/en not_active Ceased
- 1998-02-25 ZA ZA981556A patent/ZA981556B/xx unknown
- 1998-03-10 TW TW087103457A patent/TW425399B/zh not_active IP Right Cessation
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