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WO1998006560A1 - Appareil de fabrication automatique d'objets tridimensionnels, et procedes d'utilisation associes - Google Patents

Appareil de fabrication automatique d'objets tridimensionnels, et procedes d'utilisation associes Download PDF

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Publication number
WO1998006560A1
WO1998006560A1 PCT/US1997/013050 US9713050W WO9806560A1 WO 1998006560 A1 WO1998006560 A1 WO 1998006560A1 US 9713050 W US9713050 W US 9713050W WO 9806560 A1 WO9806560 A1 WO 9806560A1
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WO
WIPO (PCT)
Prior art keywords
layer
computer
composition
projector
selective
Prior art date
Application number
PCT/US1997/013050
Other languages
English (en)
Inventor
Subhash C. Narang
Susanna C. Ventura
Sunity K. Sharma
John S. Stotts
Original Assignee
Sri International
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Publication of WO1998006560A1 publication Critical patent/WO1998006560A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/40—Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
    • B29C41/02—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of definite length, i.e. discrete articles
    • B29C41/12—Spreading-out the material on a substrate, e.g. on the surface of a liquid

Definitions

  • the present invention relates generally to methods and devices for fabricating three-dimensional objects.
  • the invention relates to a method and a device for layer-by-layer fabrication of three-dimensional objects by selective polymerization of photopoiymer compositions using a selective photoexposure means, for example, a desktop digital light processing (“DLP”) or liquid crystal display (“LCD”) projector, an LCD panel, or an optical system for laser scanning, to effect the selective photopolymerization.
  • a selective photoexposure means for example, a desktop digital light processing (“DLP") or liquid crystal display (“LCD”) projector, an LCD panel, or an optical system for laser scanning, to effect the selective photopolymerization.
  • DLP desktop digital light processing
  • LCD liquid crystal display
  • Automated fabrication is a technology for forming three-dimensional, solid objects from raw material by automated processes.
  • One aspect of this technology involves actinic radiation-driven solidification of specialized polymers and powders, guided by three-dimensional designs drawn on desktop computers.
  • Stereolithography was the first commercial "additive" process by which an object could be built by successively adding raw material in particles or layers to create a solid object of the desired shape.
  • radiation is used to selectively solidify regions of a photo-sensitive polymer resin.
  • U.S. Patent Nos. 4,929,402 and 5,236,637 to Hull describe a system for generating a three-dimensional object that combines computer-generated graphics and stereolithography.
  • the system involves "printing" thin layers of a curable material one on top of another.
  • a programmed movable spot-beam of UV light, or other form of “synergistic stimulation” such as electron beams, visible light or invisible light, is moved across the surface of each layer to form a solid cross-section of the object at the surface of the layer.
  • Selective photocuring processes which include the original stereolithographic technique, use a liquid photopoiymer that has the property of solidifying under the influence of light of a particular wavelength.
  • Current photocuring-based fabricators work by laying down a thin layer of photopoiymer and shining the proper wavelength of light on it in a pattern that describes the two-dimensional shape of a cross section of the object to be built.
  • the pattern may be expressed by scanning a laser beam over the layer, turning it on and off as needed to solidify predetermined sections of the layer.
  • the layer may be expressed by shining a lamp through a mask that lets light through where the layer should be solid and blocks light from those areas that should not be solid.
  • a new layer of photopoiymer is applied and the process repeated to form the whole object.
  • Many current systems use a vat of liquid photopoiymer in which to build the object. Rather than penetrating deeply into the photopoiymer, the light induces solidification only near the surface.
  • a platform is placed under the area where the object is to be fabricated and, as each layer is formed at the surface, the platform and the previously formed layer recede into the vat, typically by about 0.1 mm, to allow a fresh layer of liquid polymer to form over the top of the previous layer. This can be also accomplished by starting with an empty vat and feeding in enough photopoiymer for one layer's thickness after each layer is built.
  • Three-dimensional laser-curing fabricators are known in the art. Systems that incorporate this technology are commercially available from, for example, 3D Systems (Valencia, CA), CMET (Tokyo), Sony (Tokyo), EOS GmbH (Munich), and Teijin Seiki (Tokyo).
  • 3D Systems Valencia, CA
  • CMET Tokyo
  • Sony Tokyo
  • EOS GmbH Movich
  • Teijin Seiki Tokyo
  • a fabricator that uses masked-lamp curing is available from Cubital (Raanana, Israel).
  • the masked-lamp photopoiymer fabricator available from Cubital generates a mask by ionographic printing, a process similar to xerography.
  • the mask image is created by attracting particles of toner to the appropriate regions of a glass plate by static electricity.
  • the powder is wiped off and recycled for use in the next mask.
  • the process includes spreading a layer of resin onto a surface, exposing the layer to curing ultraviolet light through the mask, and removing the uncured resin by vacuum suction. Molten wax is then spread over the cured layer to fill the voids left by the removed resin and provide support for the object as fabrication proceeds.
  • CAD/CAM computer-aided design/computer-aided manufacturing
  • U.S. Patent No. 4,906,424 to Hughes et al. describes a composition containing 50 vol.% to 87 vol.% ceramic powder or metal powder dispersed in a polymerizable monomer and, optionally, a plasticizer and a surfactant.
  • U.S. Patent No. 5,496,892 to Quadir et al. describes a composition containing 40 vol.% to 70 vol.% sinterable ceramic and/or metal particles, a photocurable monomer, a photoinitiator, a dispersant, and a coupling agent.
  • U.S. Patent No. 4,961 ,154 to Pomerantz et al. describes a apparatus for preparing a three-dimensional model of an object.
  • the apparatus includes a optical apparatus for irradiating a layer of solidifiable liquid, e.g., a conventional slide projector, a apparatus for accurate positioning and registration of a plurality of pattern masks, a means for generating the pattern masks by a photographic technique, such as photographic film, or by an electrophotographic technique, e.g., by depositing a toner on a glass plate in a desired pattern.
  • U.S. Patent No. 5,263,130 to Pomerantz et al. describes a system for providing a three-dimensional physical model by sequentially irradiating layers of a solidifiable liquid using masks to solidify the appropriate portion of the model and then removing the non-solidified material.
  • the mask may be a graphic mask, e.g, a transparent material on which a mask is formed, an erasable mask written directly onto the surface of the solidifiable liquid, or an electronic line mask, e.g., a linear liquid crystal array, that, along with the light source, is translated across the surface of the liquid.
  • U.S. Patent No. 5,287,435 to Cohen et al. describes an apparatus and a method for producing a three-dimensional object by depositing, layer upon layer, a photopoiymer material, curing each layer by exposing the material through a mask defining a layered cross section of the object.
  • the mask is an ionographic image developed by depositing toner onto ionized portions of a transparent substrate.
  • U.S. Patent No. 5,398,193 to deAngelis describes a Rapid Prototyping System that involves providing a three-dimensional computer model representation of the part to be fabricated and preparing slices of the model that correspond to successive layers of the model from a material that is processable by heating, chemical treatment or energy treatment.
  • the processable material include metals, ceramics, and thermoforming and thermosetting plastics.
  • the system optionally includes the formation and use of a mask-forming subsystem that produces masks cut into a continuous film or a set of individual mask sheets.
  • an apparatus for automated layer- by-layer fabrication of a three-dimensional object from a computer model of the object.
  • the apparatus comprises: a work surface on which the three-dimensional object is fabricated; a means for depositing a predetermined quantity of a photopolymerizable composition onto the work surface; a means for leveling the deposited composition to a layer having a predetermined thickness; selective photoexposure means for selectively exposing the layer to actinic radiation to cure those areas of the layer that correspond to a cross section of the object; a CAD/CAM system comprising a means for producing a three-dimensional computer model representation of the object, a means for slicing the representation into a plurality of successive layers having predetermined thickness, a means for producing cross section data of the layers of the object, and a means for providing the cross section data layerwise to the selective photoexposure means.
  • a method for fabricating a functional three- dimensional object comprises: applying a first layer of a photocurable composition on a work surface, wherein the layer is sufficiently thin to permit photopolymerization substantially the entirety thereof; exposing the first layer to actinic radiation using computer-controlled selective photoexposure means for a period of time sufficient to photopolymerize the area of the layer which is exposed to the radiation; repeating the application and exposure steps; and applying additional layers of the composition to the previously photopolymerized layer, wherein with each additional layer the computer-controlled selective photoexposure means is changed to correspond to a cross section of the object immediately adjacent to the cross section of the previously prepared layer, until the object has been fabricated.
  • FIG. 1 is a block diagram of a method for fabricating a three-dimensional object according to the present invention.
  • FIG. 2 is an illustration of a system by which a three-dimensional object can be fabricated in accordance with one embodiment of the invention.
  • FIG. 3 is an illustration of a system by which a three-dimensional object can be fabricated in accordance with another embodiment of the invention.
  • Fabrication is intended to mean the generation of a solid three- dimensional object, with some specific desired shape and physical properties.
  • Vehicle light is electromagnetic radiation with wavelengths ranging from 4 x 10 3 A to about 7.7 x 10 3 A.
  • Near infrared light or “near IR light” is electromagnetic radiation with wavelengths ranging from 7.5 x 10 3 A to about 30 x 10 3 A.
  • Actinic radiation is radiation capable of initiating photochemical reactions.
  • Optional or “optionally” means that the subsequently described circumstance may or may not occur, and that the description includes instances in which said circumstance occurs and instances in which it does not.
  • the phrase “optionally including a ceramic powder” means that a ceramic powder may or may not be present and that the description includes both the instance when the ceramic powder is present and the instance when the ceramic powder is not present.
  • a flow chart is provided illustrating the steps us in conjunction with the invention.
  • a three-dimensional complex-shape object is formed by selective photoexposure of the layers, one at a time, using a computer- controlled selective photoexposure means to project an image of a layer onto the surface of the photopolymerizable composition.
  • a computer representation of the object to be formed is generated using a CAD/CAM software system; the CAD/CAM software generates STL files.
  • the STL files are then converted into
  • slice data data.
  • the computer representation generated by the CAD/CAM software is "sliced” into layers that correspond to each of the layers that, in aggregate, will form the object upon completion of the fabrication process.
  • Each "slice” of the object is converted into data corresponding to a two-dimensional cross section of the layer.
  • a layer of a photopolymerizable composition is applied to a movable work surface on which the object is to be formed.
  • the composition is applied and leveled to a desired thickness to correspond to the thickness of the "slice" generated by the computer.
  • the data corresponding to the two-dimensional cross section of the layer is fed to a selective photoexposure means for selectively exposing the photopolymerizable composition to actinic radiation.
  • the selective photoexposure means comprises a DLP or LCD desktop projector capable of receiving the slice data generated by the computer and projecting the layer image onto the composition.
  • the selective photoexposure means comprises a source of actinic radiation and a computer-generated mask displayed on an LCD panel that allows actinic radiation to pass therethrough in areas corresponding to areas of the photopolymerizable composition to be solidified.
  • the mask blocks the passage of radiation from areas of the layer not to be solidified.
  • the selective photoexposure means comprises scanning layer optics.
  • FIG. 2 illustrates one embodiment of an apparatus suitable for implementing the method illustrated and described in the flow chart of FIG. 1 , and, is shown generally at 20.
  • Device 20 comprises a work surface 22 having a build table 24 with a superior face 26 that can be displaced vertically by way of elevator means 28, e.g., a stepper motor, or the like.
  • a photopolymerizable composition 30 is dispensed onto work surface 22 from, for example, pressurized tank 32, through valve 33 and then through suitable ports 34 in the work surface. Alternatively, the composition 30 may be routed through valve 33 to conduit 36 and directly to work surface 22.
  • the photopolymerizable composition 30 is applied over the work surface to a predetermined thickness by leveling means 38, e.g., a doctor blade, to form layer 40 on build table 24.
  • leveling means 38 e.g., a doctor blade
  • a typical layer thickness ranges between 1 mil to 25 mil, preferably between 1 mil to 10 mil. Excess material is optionally removed by action of recovery means 42, e.g., a "squeegee," through drain 44 into recovery vat 46.
  • selective photoexposure means 50 comprises a digital micromirror device ("DMD") for DLP projector or an LCD projector.
  • DMD digital micromirror device
  • Such projectors are designed to interface with CAD/CAM and STL slice conversion software. The slice information is converted to a cross section image of the layer and light is projected corresponding to those areas of the layer to be photopolymerized.
  • the image projected by the DLP or LCD projector is controlled by computer system 54.
  • DMD for DLP projectors may be obtained, for example, from Proxima (Desktop Projector Model 4100) or InFocus Systems (Lite Pro 620).
  • LCD projectors may be obtained from Proxima (Desktop Projector Model 240) or InFocus Systems (Lite Pro 210).
  • the selective photoexposure means comprises a source of actinic radiation, an LCD panel that serves as an electronic mask, and optical elements as needed to collimate, focus, filter, or otherwise process the radiation that passes through the mask as required.
  • the optical elements may include various lenses, mirrors, filters, and the like, depending on the source of radiation and the nature of the photopolymerizable composition.
  • the data corresponding to the two-dimensional cross section of the layer is fed to the LCD panel to create an electronic mask, through which actinic radiation passes to solidify selected areas of the photopolymerizable composition as discussed above.
  • the ability of the LCD panel to pass or block the passage of the radiation is controlled by computer system 54.
  • the LCD panel may be one having an active or a passive matrix screen. LCD panels that may be used with the layer-by-layer photofabrication system disclosed herein are commercially available from, e.g., nView Model Z310 (nView, Newport News, VA).
  • selective exposure means 50' comprises an optical system for laser scanning.
  • a description of an exemplary optical system for laser scanning may be found in Fisli (1983) Proc. SPIE Int'l Soc. Optical
  • system 50' is affixed to leveling means 38 in a manner such that as the photopolymerizable composition is applied over the work surface to a predetermined thickness by the leveling means, the optical system is translated over the surface of the layer of photopolymerizable composition.
  • the optical system for laser scanning 50' is loaded with an image of a cross section of the layer to be fabricated from computer 54.
  • the image stored in the laser printer optics system is fed to the laser which serves to selectively expose the composition to radiation, and thereby solidifies those areas of the composition corresponding to the cross section of the object to be formed.
  • the laser is preferably a solid-state diode laser which can be used to generate actinic radiation in the near infrared spectrum or, with the use of a frequency doubler, in the visible spectrum.
  • Optical systems for laser scanning are available from Xerox Corp. (Palo Alto, CA).
  • Solid-state lasers that emit in the visible or near IR spectral ranges are available from SDL®, Inc. (San Jose, CA) or Uniphase (San Jose, CA).
  • a suitable source of actinic radiation is a visible light source or a near infrared light source.
  • the visible light source may be a tungsten-halogen lamp, a xenon arc lamp, e.g., Oriel 1000 Xenon arc lamp, or a visible solid-state laser.
  • Near infrared light sources include solid-state diode lasers, quartz tungsten-halogen lamps, and the like.
  • Computer system 54 is used to generate a three-dimensional model of the object to be fabricated.
  • the computer-generated model may be constructed on the computer itself, using CAD/CAM software.
  • the model may be generated from data scanned into the computer from a prototype or from a drawing.
  • the computer is thus used to provide slice information about the various layers of the object and to provide cross section data for each layer that is fed to selective photoexposure means 50.
  • the computer-generated slice information may be provided to selective photoexposure means 50 at any time prior to exposure of the photopoiymer to the radiation.
  • Guidance for the selection of appropriate CAD/CAM and slice conversion software may be found in Jacobs ( 1992), supra, chapters 5 and 6, and Burns (1993), supra, chapter 6.
  • Computer system 54 may be any system that is capable of modeling the object to be fabricated, slicing the model into layers having predetermined thickness and providing two-dimensional cross section data about the layer to selective exposure means 50 or the optical system for laser scanning. Examples of such systems have been described in U.S. Patent No. 4,961,154, supra, and U.S. Patent No. 5,182,715 to Vorgitch et al.
  • CAD/CAM software is available from a number of vendors including, e.g., EDS-Unigraphics (Troy, MI), Structural Dynamic Research Corporation (Milford, OH), Hewlett-Packard Mechanical Division (Ft. Collins, CO), Autodesk (Sausalito, CA). STL conversion software for rapid prototyping is available from vendors such as Brock Rooney and Associates (Birmingham MI), Imageware (Ann Arbor, MI), Solid Concepts, Inc. (Valencia, CA), POGO International, Inc. (College
  • Computer system 54 may perform a variety of functions in addition to generating the three-dimensional model of the object to be fabricated, the slice information about the layers of the object, and the cross section data for each layer, from which the mask is generated.
  • Computer system 54 may be used to control the operation of elevator means 28, valve 33, vertical positioning means 48, and the like.
  • selective photoexposure means 50 is returned to an elevated position to allow the application of a new layer of photopolymerizable composition to enable communication of data to the selective photoexposure means for generation of the cross section image of the successive layer.
  • a three-dimensional object is accordingly produced by the step-wise buildup of layers, such as 40 ⁇ , 40b, and 40c, on build table 24.
  • the build table 24 is used to support and hold the object during fabrication, and to move the object vertically as needed. Typically, after a layer is formed thereon, the build table is moved down so a fresh layer of photopolymerizable composition may be applied over the just- formed layer. Elevator means 28 should be capable of programmed movement at an appropriate speed with appropriate precision.
  • the elevator means movement mechanism may be mechanical, pneumatic, hydraulic, or electric, and may include optical feedback to control its position relative to the work surface.
  • the photopolymerizable composition may include any uncured liquid, semi- solid or solid that can be cured by actinic radiation, e.g., by visible light, near infrared light, or the like.
  • UV Curing Science and Technology. Pappas, ed., Technology Marketing Corp. (Norwalk, CT), and Roffey, Photopolymerization of Surface Coatings. J. Wiley & Sons (Chichester).
  • Photopolymerizable resins are commercially available from, e.g., Applied Polymer Systems, Inc. (Schaumberg, IL), Ciba Geigy Corp. (Los Angeles, CA), UCB Chemical Corp., Inc. (Smyrna, GA), E.I. Du Pont de Nemours & Co. (Wilmington, DE) and Sartomer (Exton, PA).
  • the polymerizable component of the dispersion is a monomer, mixture of monomers, oligomers, mixtures of oligomers, or mixture of oligomers and monomers, which can be polymerized and solidified by exposure to actinic radiation such as near infrared or visible light.
  • Suitable photoactive monomers include acrylates, including mono-, di- and tri-acrylates, and mixtures thereof, methacrylates (see, Tu, in UV Curing Science and Technology. Pappas, ed., supra, Chapter 5), epoxides, or epoxide- acrylate formulations, and other visible or near infrared light curable monomers.
  • Examples include 2-hydroxyethylacrylate, hexanedioldiacrylate, triethyleneglycol- diacrylate ("TEGDA”), diethyleneglycoldiacrylate, tetraethyleneglycoldiacrylate, tri- methylolacrylate, and the like.
  • TAGDA triethyleneglycol- diacrylate
  • diethyleneglycoldiacrylate diethyleneglycoldiacrylate
  • tetraethyleneglycoldiacrylate tri- methylolacrylate
  • a solid or semi-solid photopolymerizable composition may be formulated from a photopolymerizable monomer, or oligomer, or both, mixed with a polymer that is optionally functionalized to have moieties with which the monomer or oligomer may react.
  • the monomer, oligomer, or both may be mixed with a wax.
  • the monomer is an epoxide, e.g.
  • Uvecure® 1500 (UCB Chemical Corp.), 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexane carboxylate (Aldrich), or 1 ,4-butanedioldiglycidylether (Aldrich), or an epoxyacrylate such as Ebecryl® 3200 (UCB Chemical Corp). More preferably, the monomer is an epoxide-acrylate blend.
  • the oligomer may be a polyesteracrylate oligomer, such as, Ubecryl® 438, Ubecryl® 584, or Ubecryl® 2047.
  • a semi-solid or solid photopoiymer composition is dispensed onto the work table as a hot liquid. As the liquid cools it solidifies. The solidified composition is photopolymerized by exposure to an appropriate wavelength of actinic radiation.
  • additional support components or structures may or may not be designed into the object.
  • the photopolymerizable composition may also include a plasticizing solvent.
  • Solvents having plasticizing properties include dibutylphthalate ("DBP"), benzylbutylphthalate, other phthalates, linear or cyclic carbonates such as propylene carbonate and ethylene carbonate, ketones such as cyclohexanone, methylethylketone, and higher homologs, ethers, and the like. Additional optional components that can be included in the photopolymerizable composition may be found in U.S. Patent No. 4,906,424 to Hughes et al.
  • a light-sensitive additive is incorporated into the photopolymerizable composition to reduce the energy necessary to effect photo- polymerization.
  • Visible light photoinitiators are generally multicomponent systems including, e.g., a xanthene dye, a first coinitiator such as an iodonium salt, and a second coinitiator. Suitable visible-near IR photoinitiators are described in U.S. Patent Nos. 5,451,343 to Neckers et al., 5,395,862 to Neckers et al., 4,952,480 to Yamaguchi et al, and 4,772,530 to Gottschalk et al., De Raaff et al. (1996) RADTECH Conference Proceedings, Chatterjee et al. ( 1988) J. Am. Chem. Soc. ⁇ Q_:2326-2328,
  • a high ceramic- or metallic-loading dispersion comprising a polymerizable monomer or oligomer with low viscosity.
  • the dispersion is a combination of components: a solvent having plasticizing properties, such as phthalates, cyclic or linear carbonates, ketones, ethers, and the like; a surfactant or dispersant, such as Hypermer®, Triton® X-100, Brij®, and the like; polymerizable monomers; and, optionally, a wax, a ceramic material, a metallic material, or a mixture thereof.
  • the composition is prepared by dispersing a ceramic powder, a metallic powder, or both, into a photopolymerizable monomer, mixture of monomers, oligomer, or mixture of monomer and oligomer.
  • the ceramic or metallic powder will comprise at least about 50 wt.% to about 90 wt.% of the composition.
  • the ceramic and metal powders are preferably in a finely divided form, preferably having diameters in the range of from about 0.1 ⁇ m to about 50 ⁇ m, preferably about 0.1 ⁇ m to about 1.0 ⁇ m.
  • the powder should be selected so that close packing of the powder particles may be achieved in the dispersion.
  • any ceramic or metallic powder that can be formed into finely divided particles can be used in the photopolymerizable composition.
  • suitable ceramic powders include silica, silicon nitride, silicon carbide, boron carbide, titanium carbide, titanium nitride, tungsten carbide, molybdenum oxide, alumina, zirconia, silicon, ferrite, and mixtures thereof.
  • suitable metallic powders include free metals such as aluminum, copper, nickel, iron, magnesium, silicon, titanium, tungsten, mixtures thereof, alloys thereof, such as stainless steel, nickel aluminum, titanium aluminum, and the like, mixtures of alloys thereof, and mixtures of metals and metal alloys.
  • Suitable software is used to provide data to the selective photoexposure means for generation of the successive layer cross section images.
  • the selective photoexposure means is linked to a CAD/CAM system and a slice conversion system that are together capable of producing a three-dimensional computer model representation of the object, slicing the representation into a plurality of successive layers having predetermined thickness, producing cross section data of the layers of the object, and providing the cross section data layerwise to the selective exposure means.
  • Example 1 Silicon Nitride Slurrv Preparation The following components were weighed into a beaker: pentaerythritol triacrylate, 32.81 g (6.3 wt.%); 2-hydroxyethyl acrylate, 68.41 g (13.2 wt.%); and dibutylphthalate ("DBP") 50.53 g (9.7 wt.%). To this mix, Hypermer® KD-1 (6.615 g, 1.3 wt.%) and a visible photoinitiator (Spectra Group Limited, In., Maumee, OH) were added.
  • DBP dibutylphthalate
  • the visible light photoinitiator has the following composition: H-Nu 470B (0.525 g); 4-octyloxyphenyl-phenyl iodonium (1.260 g); and N,N-dimethy 1-2,6 diisopropylaniline (2.100 g). The mix was transferred into a ball mill for further mixing. Silicon nitride (NCZ-5102 (4% yttria silicon nitride), Saint-Gobain/Norton
  • Example 3 Multilayer Photopolvmerization of a Silicon Nitride Slurrv Using an LCD Projector
  • the silicon nitride slurry prepared as described in Example 1 is applied as 2 mil-thick layers on a build table, and each layer is photoexposed for about 50 seconds using an LCD projector (InFocus Systems Lite Pro 210).
  • Example 4
  • the silicon nitride slurry prepared as described in Example 1 is applied as 2 mil-thick layers on a build table, and each layer is photoexposed translating an optical system for laser scanning (Xerox Corp.) over the surface of the layers.
  • Example 5 Multilayer Photopolvmerization of a Silicon Nitride Slurrv Using an LCD Panel Mask
  • the silicon nitride slurry prepared as described in Example 1 was applied as 2- mil thick layers on a build table and each layer was photoexposed for about 50 seconds through an LCD panel using a 1000 W xenon lamp.
  • the visible light photoinitiator has the following composition: H-Nu 470B (0.516 g); 4- octyloxyphenyl-phenyl iodonium (4.830 g); and N,N-dimethyl-2,6 diisopropylaniline (2.215 g).
  • the mix was transferred into a ball mill for further mixing.
  • the slurry viscosity was determined using a Brookfield model DV-II+ viscometer to be 1250 cps at a shear rate of 2 sec " '.
  • the silicon nitride slurry was applied on a Kapton® film and photoexposed to a 300 W tungsten lamp. The slurry solidified in sixty seconds to yield a film 5.5 mil thick. The thickness was measured after rinsing the film with acetone to remove an uncured material.
  • pentaerythritol triacrylate 33.08 g (6.3 wt.%); 2-hydroxyethylacrylate, 68.25 g (13.0 wt.%); DBP, 50.4 g (9.6 wt.%); Hypermer® KD-1, 10.50 g (2 wt.%); the visible photoinitiator composition described in Example 6, 3.885 g (0.74 wt.%); and alumina, 358.89 g (68.36 wt.%).
  • the slurry was applied on a Kapton® film and photocured by exposure to a tungsten lamp as described in Example 6. A 6 mil-thick film was formed after a 30-second exposure.
  • the mix is applied in 2 mil-thick layers on a build table and each layer is photoexposed for about 30 seconds using a digital light processing ("DLP") processing projector (InFocus Lite Pro 620).
  • DLP digital light processing

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  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)

Abstract

L'invention a pour objet un appareil pour fabriquer des objets tridimensionnels à l'aide de techniques de fabrication de prototypes rapides, assistées par ordinateur. Cet appareil comprend un système selon lequel l'objet est fabriqué en exposant, de manière sélective, une couche d'une composition photopolymérisable à une radiation actinique à l'aide d'un moyen de photoexposition sélectif. Ce dernier moyen comprend un dispositif de micromiroir numérique ('DMD') pour un projecteur de traitement de lumière numérique ('DLP'), un projecteur à affichage à cristaux liquides ('LCD'), un système optique pour assurer un balayage à laser, ou une source de radiation actinique et un panneau à affichage à cristaux liquides visualisant un masque électronique généré par ordinateur. Cette composition photopolymérisable comprend un photopolymère ou une céramique à chargement élevé ou une dispersion de métaux qui, lors de la solidification, fournit l'objet de structure requis. L'invention concerne également des procédés pour former des objets tridimensionnels à l'aide de cet appareil.
PCT/US1997/013050 1996-08-08 1997-08-06 Appareil de fabrication automatique d'objets tridimensionnels, et procedes d'utilisation associes WO1998006560A1 (fr)

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US69352496A 1996-08-08 1996-08-08
US08/693,524 1996-08-08

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WO1998006560A1 true WO1998006560A1 (fr) 1998-02-19

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EP1233272A1 (fr) * 2001-02-19 2002-08-21 MANIA GmbH & Co. Procédé de fabrication d'un adaptateur de sonde de test utilisant un photopolymère sensible à la lumière
WO2002061809A3 (fr) * 2001-02-01 2003-01-09 Advanced Micro Devices Inc Dispositif de formation de motifs configurable et procede de production de circuits integres au moyen de ce dispositif
EP1449636A1 (fr) * 2003-02-19 2004-08-25 Dainippon Screen Mfg. Co., Ltd. Appareil de photofabrication
US7088432B2 (en) 2000-09-27 2006-08-08 The Regents Of The University Of California Dynamic mask projection stereo micro lithography
EP2233449A1 (fr) * 2009-03-27 2010-09-29 Ivoclar Ag Barbotine pour la fabrication de céramiques dentaires à l'aide du procédé d'impression par injection de matière thermoplastique
WO2010151474A1 (fr) * 2009-06-22 2010-12-29 The Gillette Company Procédé de formation d'une cartouche de rasoir fonctionnelle et cartouche de rasoir fonctionnelle
EP2505341A1 (fr) 2011-03-29 2012-10-03 Ivoclar Vivadent AG Procédé de montage en couche d'un corps de formage en matériau photopolymérisable hautement visqueux
WO2013167448A1 (fr) * 2012-05-11 2013-11-14 Universite De Lorraine Utilisation d'un alliage metallique complexe a base d'aluminium pour la stereolithographie
WO2013170311A1 (fr) * 2012-05-15 2013-11-21 Zydex Pty Ltd Appareil et procédé de fabrication d'un objet
US8623264B2 (en) 2008-10-20 2014-01-07 Ivoclar Vivadent Ag Device and method for processing light-polymerizable material for building up an object in layers
US8741203B2 (en) 2008-10-20 2014-06-03 Ivoclar Vivadent Ag Device and method for processing light-polymerizable material for building up an object in layers
WO2016164390A1 (fr) * 2015-04-07 2016-10-13 Global Filtration Systems, A Dba Of Gulf Filtration Systems Inc. Appareil et procédé de formation d'objets tridimensionnels par solidification linéaire et lame à vide
WO2018119041A1 (fr) * 2016-12-20 2018-06-28 Basf Se Procédé de détermination d'une quantité de sédiment dans une dispersion céramique
US20180370080A1 (en) * 2017-05-17 2018-12-27 Formlabs, Inc. Techniques for casting from additively fabricated molds and related systems and methods
DE102018114059A1 (de) * 2018-06-13 2019-12-19 Volkswagen Aktiengesellschaft Verfahren und Vorrichtung zur Herstellung von Bauteilen mittels Photopolymerisation
WO2020061238A1 (fr) 2018-09-18 2020-03-26 Skyphos Industries, Inc. Système de suspension pour ajuster des images lumineuses projetées
US10821668B2 (en) 2018-01-26 2020-11-03 General Electric Company Method for producing a component layer-by- layer
US10821669B2 (en) 2018-01-26 2020-11-03 General Electric Company Method for producing a component layer-by-layer
WO2020260855A1 (fr) * 2019-06-27 2020-12-30 Johnson Matthey Public Limited Company Structures sorbantes multicouches
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US11241827B2 (en) 2015-04-07 2022-02-08 Trio Labs, Inc. Method and apparatus for solid freeform fabrication of objects with improved resolution
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US11420384B2 (en) 2017-10-03 2022-08-23 General Electric Company Selective curing additive manufacturing method
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US11590691B2 (en) 2017-11-02 2023-02-28 General Electric Company Plate-based additive manufacturing apparatus and method
US20230119050A1 (en) * 2021-10-18 2023-04-20 NEXA3D Inc. Methods and systems for photocuring liquid with reduced heat generation using a digital light processing (dlp) light source
US11650498B2 (en) 2016-06-30 2023-05-16 3M Innovative Properties Company Printable compositions including highly viscous components and methods of creating 3D articles therefrom
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US7088432B2 (en) 2000-09-27 2006-08-08 The Regents Of The University Of California Dynamic mask projection stereo micro lithography
WO2002061809A3 (fr) * 2001-02-01 2003-01-09 Advanced Micro Devices Inc Dispositif de formation de motifs configurable et procede de production de circuits integres au moyen de ce dispositif
EP1233272A1 (fr) * 2001-02-19 2002-08-21 MANIA GmbH & Co. Procédé de fabrication d'un adaptateur de sonde de test utilisant un photopolymère sensible à la lumière
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