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WO1997015699B1 - Procede et appareil de depot de parylene af4 sur tranches de semi-conducteurs - Google Patents

Procede et appareil de depot de parylene af4 sur tranches de semi-conducteurs

Info

Publication number
WO1997015699B1
WO1997015699B1 PCT/US1996/017003 US9617003W WO9715699B1 WO 1997015699 B1 WO1997015699 B1 WO 1997015699B1 US 9617003 W US9617003 W US 9617003W WO 9715699 B1 WO9715699 B1 WO 9715699B1
Authority
WO
WIPO (PCT)
Prior art keywords
outlet
ofthe
deposition
chamber
pipe
Prior art date
Application number
PCT/US1996/017003
Other languages
English (en)
Other versions
WO1997015699A2 (fr
WO1997015699A3 (fr
Filing date
Publication date
Priority claimed from US08/549,087 external-priority patent/US5538758A/en
Priority claimed from US08/549,635 external-priority patent/US5536322A/en
Priority claimed from US08/549,169 external-priority patent/US5534068A/en
Priority claimed from US08/549,130 external-priority patent/US5556473A/en
Priority claimed from US08/549,131 external-priority patent/US5536321A/en
Priority claimed from US08/549,093 external-priority patent/US5536319A/en
Priority claimed from US08/549,395 external-priority patent/US5709753A/en
Priority claimed from US08/549,133 external-priority patent/US5536317A/en
Priority to AT96936895T priority Critical patent/ATE230445T1/de
Application filed filed Critical
Priority to DE69625615T priority patent/DE69625615T2/de
Priority to EP96936895A priority patent/EP0862664B1/fr
Priority to JP51675197A priority patent/JP3808102B2/ja
Publication of WO1997015699A2 publication Critical patent/WO1997015699A2/fr
Publication of WO1997015699A3 publication Critical patent/WO1997015699A3/fr
Publication of WO1997015699B1 publication Critical patent/WO1997015699B1/fr

Links

Abstract

Cette invention concerne un appareil de dépôt chimique en phase vapeur permettant un dépôt rapide et efficace de parylène AF4 sur des tranches de silicium lors de la fabrication de puces de semi-conducteur. L'invention concerne également un procédé de dépôt de parylène AF4 à la surface d'une tranche de semi-conducteur qui consiste à refroidir la tranche de microplaquette de semi-conducteur et à déposer des monomères de parylène à la surface de la tranche. Ledit procédé peut en outre consister à chauffer la tranche jusqu'à une température préétablie et/ou de recuit, et ultérieurement à la refroidir.
PCT/US1996/017003 1995-10-27 1996-10-25 Procede et appareil de depot de parylene af4 sur tranches de semi-conducteurs WO1997015699A2 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AT96936895T ATE230445T1 (de) 1995-10-27 1996-10-25 Verfahren und vorrichtung zur ablagerung von parylen af4 auf halbleiterwafern
JP51675197A JP3808102B2 (ja) 1995-10-27 1996-10-25 半導体ウエハ上へのパリレンａｆ４の蒸着方法
EP96936895A EP0862664B1 (fr) 1995-10-27 1996-10-25 Procede et appareil de depot de parylene af4 sur tranches de semi-conducteurs
DE69625615T DE69625615T2 (de) 1995-10-27 1996-10-25 Verfahren und vorrichtung zur ablagerung von parylen af4 auf halbleiterwafern

Applications Claiming Priority (28)

Application Number Priority Date Filing Date Title
US08/549,395 US5709753A (en) 1995-10-27 1995-10-27 Parylene deposition apparatus including a heated and cooled dimer crucible
US08/549,133 US5536317A (en) 1995-10-27 1995-10-27 Parylene deposition apparatus including a quartz crystal thickness/rate controller
US08/549,635 US5536322A (en) 1995-10-27 1995-10-27 Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device
US08/549,093 US5536319A (en) 1995-10-27 1995-10-27 Parylene deposition apparatus including an atmospheric shroud and inert gas source
US08/549,087 US5538758A (en) 1995-10-27 1995-10-27 Method and apparatus for the deposition of parylene AF4 onto semiconductor wafers
US08/549,131 US5536321A (en) 1995-10-27 1995-10-27 Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter
US08/549,130 US5556473A (en) 1995-10-27 1995-10-27 Parylene deposition apparatus including dry vacuum pump system and downstream cold trap
US08/549,169 US5534068A (en) 1995-10-27 1995-10-27 Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement
US67982796A 1996-07-15 1996-07-15
US67995896A 1996-07-15 1996-07-15
US68000596A 1996-07-15 1996-07-15
US68016196A 1996-07-15 1996-07-15
US67995696A 1996-07-15 1996-07-15
US68357796A 1996-07-15 1996-07-15
US08/679,958 1996-07-15
US08/680,005 1996-07-15
US08/549,130 1996-07-15
US08/679,956 1996-07-15
US08/549,093 1996-07-15
US08/549,087 1996-07-15
US08/679,827 1996-07-15
US08/683,577 1996-07-15
US08/680,161 1996-07-15
US08/549,133 1996-07-15
US08/549,169 1996-07-15
US08/549,395 1996-07-15
US08/549,131 1996-07-15
US08/549,635 1996-07-15

Publications (3)

Publication Number Publication Date
WO1997015699A2 WO1997015699A2 (fr) 1997-05-01
WO1997015699A3 WO1997015699A3 (fr) 1997-09-12
WO1997015699B1 true WO1997015699B1 (fr) 1997-11-06

Family

ID=27585116

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1996/017003 WO1997015699A2 (fr) 1995-10-27 1996-10-25 Procede et appareil de depot de parylene af4 sur tranches de semi-conducteurs

Country Status (4)

Country Link
EP (1) EP0862664B1 (fr)
JP (1) JP3808102B2 (fr)
AT (1) ATE230445T1 (fr)
WO (1) WO1997015699A2 (fr)

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US7179283B2 (en) 2001-11-02 2007-02-20 Scimed Life Systems, Inc. Vapor deposition process for producing a stent-graft and a stent-graft produced therefrom
US6783598B2 (en) * 2002-08-15 2004-08-31 Fibersense Technology Corp. Moisture barrier sealing of fiber optic coils
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US20090142227A1 (en) * 2005-07-01 2009-06-04 Manfred Fuchs Parylene Coating and Method for the Production Thereof
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