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WO1996020429A1 - Plaque lithographique - Google Patents

Plaque lithographique Download PDF

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Publication number
WO1996020429A1
WO1996020429A1 PCT/GB1995/002774 GB9502774W WO9620429A1 WO 1996020429 A1 WO1996020429 A1 WO 1996020429A1 GB 9502774 W GB9502774 W GB 9502774W WO 9620429 A1 WO9620429 A1 WO 9620429A1
Authority
WO
WIPO (PCT)
Prior art keywords
plate
photosensitive composition
dye
substance
base
Prior art date
Application number
PCT/GB1995/002774
Other languages
English (en)
Inventor
Peter Andrew Reath Bennett
Richard David Hoare
Alan Stanley Victor Monk
Original Assignee
Horsell P.L.C.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horsell P.L.C. filed Critical Horsell P.L.C.
Priority to AU39334/95A priority Critical patent/AU3933495A/en
Publication of WO1996020429A1 publication Critical patent/WO1996020429A1/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols

Definitions

  • a method of forming a lithographic plate by the heat-mode imaging method which comprises coating on a base which can be used as a lithographic base a positive working photosensitive composition which comprises a naphthoquinone diazide ester of a phenolic resin or a naphthoquinone diazide ester and a phenolic resin and at least one substance which absorbs infra-red radiation, overall exposing the assembly to ultra-violet light to render the photosensitive composition developable, imaging the plate by means of a laser which emits in the infra-red region of the spectrum and then developing the plate to remove those areas of the photosensitive composition not exposed to the laser.
  • This invention is based on the knowledge that when light-exposed naphthoquinone diazide compound is heated it is no longer developable.
  • the naphthoquinone diazide compound is image-wise heated to render such areas non-developable by the action of the laser which emits in the infra-red region of the spectrum and the presence of the infra-red absorbing substance or substances which convert the infra-red laser light to heat.
  • the areas of the initially light sensitive naphthoquinone diazide compound which remain on the plate are oleophilic and form the printing image whilst the areas of the plate from which the photosensitive composition has been removed from the hydrophilic areas of the plate.
  • the binder for the photosensitive composition is the phenolic resin. This may be present covalently bonded to the naphthoquinone moiety or it may be present not bonded to the moiety.
  • the preferred phenolic resins are novolak resins and resole resins.
  • the preferred naphthoquinone diazide esters are a o-naphthoquinone diazide sulphonic acid or a o-napthoquinone diazide carboxylic acid ester.
  • a substance which lowers the temperature at which the exposed naphthoquinone diazide compound is rendered no longer developable are basic compounds for example amine, for instance ethanolamine or methanolamine.
  • Useful basic compounds are imidazoles. Examples of suitable imidazoles compound are:-
  • Imidazoline compounds and in particular 1-hydroxyethyl- 2-alkylimidazoline where the alkyl substituent has 7 to 17 carbon atoms can also be used.
  • a dye may be present which helps to locate the image areas after the development step.
  • An example of a suitable dye is a triarylmethane dye. Particularly suitable are ones that are of basic character. Examples of o-naphthoquinone diazide compounds which may be used in the photosensitive composition are disclosed in a variety of publications such as U.S. Pat. Nos.
  • o-naphthoquinonediazidosulfonates or o-naphthoquinone- diazidocarboxylates of aromatic hydroxyl compounds o-naphthoquinone- diazidosulfonic acid amides or o-naphthoquinonediazidocarboxylic acid amides of aromatic amine compounds, for instance, esters of naphthoquinone- 1, 2-diazidosulfonic acid with polyhydroxyphenyl (hereinafter the term 'ester' also include partial esters); esters of naphthoquinone- 1, 2-diazido-4-sulfonic acid or naphthoquinone- 1, 2-diazido-5-sulfonic acid with pyrogallol/acetone resins; esters of naphthoquinone- 1 , 2-diazidosulfonic acid with novolac type phenol/formaldeh
  • o-naphthoquinone diazide compounds such as o-naphthoquinone diazide sulphonates or o-naphthoquinone diazido-carboxylates they are present covalently bonded to resins. Thus no additional binder is required.
  • the infra-red absorbing compound may be carbon such as carbon black or graphite. It may be a commercially available pigment such as Heliogen Green as supplied by BSAF or Nigrosine Base NG1 as supplied by N H Laboratories Inc. Usefully it may be an organic pigment or dye such as phthalocyanine pigment. Or it may be a dye or pigment of the squarylium, cyanine, merocyanine, indolizine, pyrylium or metal dithioline classes
  • the infra-red absorbing compound is one whose absorption spectrum is significant at the wavelength output of the laser which is to be used in the method of the present invention.
  • gallium arsenide diode lasers emit at 830nm and Nd YAG lasers emit at 1064nm.
  • the preferred photosensitive composition for use in the method of the present invention comprises a 2,4-naphthoquinone diazide sulphonic acid ester of a novolac resin, an infra-red absorbing compound, a basic colourant dye and an imidazole
  • neither the colourant dye nor any other substance in the composition have significant light absorption at the wavelength of the ultra-violet light used for the initial overall exposure.
  • This wavelength is preferably between 350-450nm.
  • the base is an aluminium plate base.
  • a thin layer of aluminium oxide which is often between 2 to 3 microns in thickness.
  • a layer of aluminium oxide is formed which is from 10 to 15 microns in thickness.
  • Such a thickness of aluminium oxide acts very efficiently as a heat insulation layer.
  • the thickness of the aluminium oxide layer is much greater than 15 microns an unstable layer can be formed which tends to flake off.
  • Thermal conduction from the imaging layer may also be reduced by optimisation of anodising conditions to produce an anodic sub-layer of low porosity and low thermal conductivity.
  • Thermal conduction from the imaging layer may also be reduced by use of hydrophilising layers such as those described in E.P. A. 626273.
  • infra-red absorber Preferably as much infra-red absorber is present in the photosensitive composition so as not to interfere with the photochemical UN. exposure step. Dyes with the selective IR absorption can be present in a greater amount than a black body such as carbon.
  • the base which can be used as a lithographic base is preferably an aluminium plate which has undergone the usual anodic, graining and post-anodic treatments well known in the lithographic art for enabling a photosensitive composition to be coated thereon
  • Another base material which may be used in the method of the present invention is a plastics material base or a treated paper base as used in the photographic industry.
  • a particularly useful plastics material base is polyethylene teraphthalate which has been subbed to render its surface hydrophilic.
  • a so-called resin coated paper which has been corona discharge treated may also be used.
  • the lithographic plate after coating and drying down is overall exposed to a conventional UN. radiation source such as a carbon arc lamp, a mercury vapour lamp, a fluorescent lamp, a tungsten filament lamp or a photoflood lamp just prior to thermal imaging.
  • a conventional UN. radiation source such as a carbon arc lamp, a mercury vapour lamp, a fluorescent lamp, a tungsten filament lamp or a photoflood lamp just prior to thermal imaging.
  • An example of a suitable practical developing solution is an aqueous solution of 8% metasilicate, 0.1% of an organic phosphate ester of an ethoxylated alcohol and 0.01% of polyoxylpropylane methyl ethyl ammonium chloride.
  • the coated substrate to be imaged was cut into a circle of 105mm diameter and placed on a disc that could be rotated at a constant speed of 2500 revolutions per minute.
  • Adjacent to the spinning disc a translating table held the source of the laser beam so that the laser beam impinged normal to the coated substrate, while the translating table moved the laser beam radially in a linear fashion with respect to the spinning disk.
  • the exposed image was in the form of a spiral whereby the image in the centre of the spiral represented slow laser scanning speed and long exposure time and the outer edge of the spiral represented fast scanning speed and short exposure time.
  • the laser used was a single mode 830nm wavelength 200mW laser diode which was focused to a 10 micron resolution.
  • the laser power supply was a stabilised constant current source.
  • the exposed disc was developed by immersing in the alkaline developer solution which removed the non-imaged coating leaving the exposed spiral image.
  • the plate precursors prepared in the present invention can also be U V imaged to yield a positive working plate or can be reversal imaged to yield a negative working plate
  • the imaged substrate was developed for 30 seconds
  • the triaryl methane dye used was:- Basonyl Violet 610
  • the 214 NQD resin ester used in the examples was based on novolak resins Shown in the examples as 214-NQD resin ester A
  • the bis 215 NQD ester of dihydroxybenzophenone had the following structure -
  • n, n' 1 - 10
  • the IR dyes used have the following structures:
  • Dowanol PM solvent was prepared and coated onto a substrate consisting of a sheet of aluminium that had been electro-grained and anodised, giving a coating film weight of 1.3 gm per sq. metre after thoroughly drying at 100°C in an oven for 3 minutes.
  • the resulting plate was flood exposed in a light frame using a 3kw mercury halogen lamp for 90 seconds at a distance of 1 metre.
  • the plate was then imaged using a 200m W laser diode at a wavelength of 830nm using the imaging device described previously.
  • the plate was then developed using the alkaline developer B for 30 seconds which removed the parts of the coating on the plate that were not struck by the laser beam, giving an image
  • a mixture containing a solution of 214 NQD resin A, a solution of Disperse black, an infrared absorbing dye 950609-1 A and Dowanol PM was coated onto an aluminium substrate as in Composition 1 with a film weight of 1.46 gm per square metre.
  • the plate performed in the same manner.
  • the plate performed in the same manner.
  • a mixture containing phenol/cresol novolak resin in Dowanol PM, and bis 215 NQD ester of dihydroxybenzophenone, Monazoline C and IR dye ref.950609-lA was coated onto an aluminium substrate as in Composition 1 with a film weight of 1.4 gm per square metre.
  • the plate performed in the same manner.
  • Composition 5 A solution containing a phenol/cresol novolak resinand bis 215 NQD ester of dihydroxybenzophenone, Monazoline C, infrared dye ref. 950609-1 A and Dowanol PM was prepared and coated onto a substrate consisting of a sheet of aluminium that had been electrograined and anodised, giving a coating film weight of 1.35 gm per square metre after thoroughly drying at 100°C in an oven for 3 minutes. When imaged and processed as in Composition 1 the plate performed in the same manner.
  • the plate performed in the same manner.
  • a solution containing 214 NQD resin ester A into which was dispersed carbon black, Monazoline C and Dowanol PM was prepared and coated onto a substrate consisting of a sheet of aluminium that had been electrograined and anodised, giving a coating film weight of 1.22 gm per square metre after thoroughly drying at 100°C in an oven for 3 minutes.
  • the plate performed in the same manner.
  • a mixture containing 214 NQD resin ester A, Monazoline C, IR dye NK1887 and Dowanol PM was prepared and coated onto a substrate consisting of a sheet of aluminium that had been electrograined and anodised, giving a coating film weight of 1.27 gm per square metre after thoroughly drying at 100°C in an oven for 3 minutes.
  • the plate performed in the same manner.
  • the plate performed in the same manner.
  • imaged and rocessed as in Composition 1 the plate performed in the same manner.
  • the plate performed in the same manner.
  • the plate performed in the same manner.
  • a mixture containing 214 NQD resin ester A, Triethanolamine, infra red absorbing dye ref. 950609-1 A and Dowanol PM solvent was coated onto an aluminium substrate as in Composition 1 with a film weight of 1.3gm per square metre. When imaged and processed as in Composition 1 the plate performed in the same manner.
  • a mixture containing 2.81 gm of a 40% solution of 214 NQD resin ester A, aminomethylpropanol, an infra red absorbing dye Ref. 950609-1 A and Dowanol PM solvent was coated onto an aluminium substrate as in Composition 1 with a film weight of 1.32 gm per square metre.
  • the plate performed in the same manner.
  • a mixture containing 214 NQD resinester of Bakelite resins, Monazoline C, Basonyl violet 620, IR dye 950609-1 A and Dowanol PM was prepared and coated onto a substrate consisting of a sheet of aluminium that had been electrograined and anodised, giving a coating film weight of 1.33 gm per square metre after thoroughly drying at 100°C in an oven for 3 minutes.
  • the plate performed in the same manner.
  • any suitable light of sufficient power and is suitably absorbed by components in the system to generate heat in the composition could be used
  • compositions 7 and 12 show the effect of the addition of Monazoline, showing that less energy is required to form a developable image.
  • compositions 2 and 3 to composition 12 show that basic dyes increase the sensitivity Note the use of a colourant dye in composition 15

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

On décrit un procédé pour former une plaque lithographique faisant appel à une méthode thermique de formation d'image qui consiste à appliquer sur une base qui peut être utilisée comme base lithographique, une composition photosensible positive comprenant un ester naphtoquinone diazide d'une résine phénolique ou un ester naphtoquinone diazide et une résine phénolique et au moins une substance qui absorbe les rayonnements infrarouges, à exposer le tout à de la lumière ultraviolette pour conférer à la composition photosensible l'aptitute à être développée, à réaliser une image sur la plaque à l'aide d'un laser qui émet dans la région infrarouge du spectre et ensuite à développer la plaque pour enlever les parties de la composition photosensible non exposées au laser.
PCT/GB1995/002774 1994-12-23 1995-11-28 Plaque lithographique WO1996020429A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU39334/95A AU3933495A (en) 1994-12-23 1995-11-28 Lithographic plate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9426206A GB9426206D0 (en) 1994-12-23 1994-12-23 Lithographic plate
GB9426206.0 1994-12-23

Publications (1)

Publication Number Publication Date
WO1996020429A1 true WO1996020429A1 (fr) 1996-07-04

Family

ID=10766579

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB1995/002774 WO1996020429A1 (fr) 1994-12-23 1995-11-28 Plaque lithographique

Country Status (3)

Country Link
AU (1) AU3933495A (fr)
GB (1) GB9426206D0 (fr)
WO (1) WO1996020429A1 (fr)

Cited By (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0788435A2 (fr) * 1995-06-23 1997-08-13 Sun Chemical Corporation Plaques lithographiques a formation d'image par laser a commande numerique
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
EP0822067A1 (fr) * 1996-07-30 1998-02-04 Agfa-Gevaert N.V. Méthode pour fabriquer des plaques lithos en utilisant un élément sensible aux rayons infrarouges ou à la chaleur
EP0823327A2 (fr) * 1996-08-06 1998-02-11 Mitsubishi Chemical Corporation Composition photosensible positive, plaque d'impression photosensible de type positif et procédé pour la fabrication de plaques lithographiques positives
EP0833204A1 (fr) * 1996-09-30 1998-04-01 Eastman Kodak Company Composition pour l'enregistrement d'images, à base de diazonaphtoquinone, sensible à l'infrarouge et élément
EP0867278A1 (fr) * 1997-03-24 1998-09-30 Agfa-Gevaert AG Composition photosensible et matériel pour l'enregistrement pour plaques lithographiques préparé à partir de cette composition
US5858626A (en) * 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
WO1999001796A2 (fr) * 1997-07-05 1999-01-14 Kodak Polychrome Graphics Llc Procedes de formation de motifs
WO1999002343A1 (fr) * 1997-07-11 1999-01-21 Kodak Polychrome Graphics Company Ltd. Formation de modele
WO1999008157A2 (fr) * 1997-08-08 1999-02-18 Kodak Polychrome Graphics Composition et element de formation d'image a base de diazonapthoquinone sensibles a l'infrarouge qui contiennent une matiere non basique absorbant l'ir, et procedes d'utilisation
EP0900652A2 (fr) * 1997-09-08 1999-03-10 Agfa-Gevaert AG Matériel pour l'enregistrement par la chaleur insensible à la lumière du jour et procédé pour la fabrication de plaques lithographiques
EP0908308A1 (fr) * 1997-10-06 1999-04-14 Bayer Corporation Composition positive sensible aux radiations contenant du noir de carbone pour l'enregistrement au laser
EP0934822A1 (fr) * 1998-02-04 1999-08-11 Mitsubishi Chemical Corporation Composition photosensible positive, plaque lithographique positive et méthode pour la formation d'une image positive
US5948596A (en) * 1997-05-27 1999-09-07 Kodak Polychrome Graphics Llc Digital printing plate comprising a thermal mask
EP0956948A1 (fr) * 1998-05-12 1999-11-17 Lastra S.P.A. Composition sensible aux radiations UV et IR et plaque d'impression lithographique
EP1014200A1 (fr) * 1998-12-22 2000-06-28 Fuji Photo Film Co., Ltd. Procédé pour le développement d'un précurseur de plaque d'impression lithographique photosensible
FR2788060A1 (fr) * 1998-12-31 2000-07-07 Hyundai Electronics Ind Polymere de revetement anti-reflecteur et procede de preparation
US6124425A (en) * 1999-03-18 2000-09-26 American Dye Source, Inc. Thermally reactive near infrared absorption polymer coatings, method of preparing and methods of use
US6232031B1 (en) 1999-11-08 2001-05-15 Ano-Coil Corporation Positive-working, infrared-sensitive lithographic printing plate and method of imaging
US6238838B1 (en) 1998-08-01 2001-05-29 Afga Gevaert Radiation-sensitive mixture comprising IR-absorbing, anionic cyanine dyes and recording material prepared therewith
US6248505B1 (en) 1998-03-13 2001-06-19 Kodak Polychrome Graphics, Llc Method for producing a predetermined resist pattern
US6251559B1 (en) 1999-08-03 2001-06-26 Kodak Polychrome Graphics Llc Heat treatment method for obtaining imagable coatings and imagable coatings
US6261740B1 (en) 1997-09-02 2001-07-17 Kodak Polychrome Graphics, Llc Processless, laser imageable lithographic printing plate
US6352814B1 (en) 1998-03-13 2002-03-05 Kodak Polychrome Graphics Llc Method of forming a desired pattern
WO2002096649A1 (fr) 2001-05-31 2002-12-05 IBF Indústria Brasileira de Filmes Ltda. Composition de revetement et procede de preparation d'une plaque radiosensible utilisee dans l'impression lithographique et autres procedes semblables
US6492093B2 (en) 1998-08-01 2002-12-10 Agfa-Gevaert Ag Radiation-sensitive mixtures comprising IR-absorbing cyanine dyes having a betaine structure or having a betaine structure and containing an anion, and recording materials prepared therewith
US6548215B2 (en) 2001-02-09 2003-04-15 Kodak Polychrome Graphics Llc Method for the production of a printing plate using the dual-feed technology
US6555291B1 (en) 2000-08-14 2003-04-29 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6706466B1 (en) 1999-08-03 2004-03-16 Kodak Polychrome Graphics Llc Articles having imagable coatings
US6706454B2 (en) 2001-07-05 2004-03-16 Kodak Polychrome Graphics Llc Method for the production of a printing plate using particle growing acceleration by an additive polymer
US6800426B2 (en) 2001-12-13 2004-10-05 Kodak Polychrome Graphics Llc Process for making a two layer thermal negative plate
WO2005053966A1 (fr) 2003-12-04 2005-06-16 IBF Indústria Brasileira de Filmes Ltda. Ensemble d'imagerie thermique positive, procede de fabrication de celui-ci et plaques d'impression lithographique
EP1961789A1 (fr) 2000-07-06 2008-08-27 Cabot Corporation Produits pigmentaires modifies, leurs dispersions et compositions les comprenant

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US4544627A (en) * 1978-10-31 1985-10-01 Fuji Photo Film Co., Ltd. Negative image forming process in o-quinone diazide layer utilizing laser beam
EP0293656A1 (fr) * 1987-05-20 1988-12-07 Hoechst Aktiengesellschaft Procédé de production d'images sur un matériau photosensible
US5340699A (en) * 1993-05-19 1994-08-23 Eastman Kodak Company Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
DE4426820A1 (de) * 1993-07-29 1995-02-02 Fuji Photo Film Co Ltd Bilderzeugungsmaterial und Bilderzeugungsverfahren

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4544627A (en) * 1978-10-31 1985-10-01 Fuji Photo Film Co., Ltd. Negative image forming process in o-quinone diazide layer utilizing laser beam
EP0293656A1 (fr) * 1987-05-20 1988-12-07 Hoechst Aktiengesellschaft Procédé de production d'images sur un matériau photosensible
US5340699A (en) * 1993-05-19 1994-08-23 Eastman Kodak Company Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
DE4426820A1 (de) * 1993-07-29 1995-02-02 Fuji Photo Film Co Ltd Bilderzeugungsmaterial und Bilderzeugungsverfahren

Cited By (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0788435A4 (fr) * 1995-06-23 1998-10-07 Sun Chemical Corp Plaques lithographiques a formation d'image par laser a commande numerique
EP0788435A2 (fr) * 1995-06-23 1997-08-13 Sun Chemical Corporation Plaques lithographiques a formation d'image par laser a commande numerique
US6143470A (en) * 1995-06-23 2000-11-07 Nguyen; My T. Digital laser imagable lithographic printing plates
EP0822067A1 (fr) * 1996-07-30 1998-02-04 Agfa-Gevaert N.V. Méthode pour fabriquer des plaques lithos en utilisant un élément sensible aux rayons infrarouges ou à la chaleur
EP1655132A3 (fr) * 1996-08-06 2006-06-28 Mitsubishi Chemical Corporation Plaque d'impression photosensible de type positif
EP1747884A3 (fr) * 1996-08-06 2009-02-18 Agfa Graphics Nv Plaque d'impression photosensible de type positif
US6808861B1 (en) 1996-08-06 2004-10-26 Mitsubishi Chemical Corporation Positive photosensitive composition positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate
EP0823327A2 (fr) * 1996-08-06 1998-02-11 Mitsubishi Chemical Corporation Composition photosensible positive, plaque d'impression photosensible de type positif et procédé pour la fabrication de plaques lithographiques positives
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AU3933495A (en) 1996-07-19

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