WO1995000594B1 - Compositions pour appret electrodeposable resistant a la degradation photochimique - Google Patents
Compositions pour appret electrodeposable resistant a la degradation photochimiqueInfo
- Publication number
- WO1995000594B1 WO1995000594B1 PCT/US1994/006326 US9406326W WO9500594B1 WO 1995000594 B1 WO1995000594 B1 WO 1995000594B1 US 9406326 W US9406326 W US 9406326W WO 9500594 B1 WO9500594 B1 WO 9500594B1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electrodepositable composition
- isocyanate
- antioxidant
- primer compositions
- photodegradation
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract 14
- 238000001782 photodegradation Methods 0.000 title 1
- 239000003963 antioxidant agent Substances 0.000 claims abstract 5
- 230000003078 antioxidant effect Effects 0.000 claims abstract 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract 2
- 239000002530 phenolic antioxidant Substances 0.000 claims abstract 2
- 229910052717 sulfur Inorganic materials 0.000 claims abstract 2
- 239000011593 sulfur Substances 0.000 claims abstract 2
- 239000012948 isocyanate Substances 0.000 claims 6
- 150000002513 isocyanates Chemical class 0.000 claims 5
- -1 alkyl thioester Chemical class 0.000 claims 3
- 239000004971 Cross linker Substances 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 239000004698 Polyethylene Substances 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000000304 alkynyl group Chemical group 0.000 claims 1
- 125000001589 carboacyl group Chemical group 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 229920000573 polyethylene Polymers 0.000 claims 1
- 229920006389 polyphenyl polymer Polymers 0.000 claims 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical group CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 claims 1
- 229940124543 ultraviolet light absorber Drugs 0.000 claims 1
- 150000001412 amines Chemical class 0.000 abstract 2
- 239000004593 Epoxy Substances 0.000 abstract 1
- 230000032798 delamination Effects 0.000 abstract 1
- 239000006185 dispersion Substances 0.000 abstract 1
- 239000004611 light stabiliser Substances 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Abstract
L'invention concerne des compositions pour apprêt électrodéposable comprenant une dispersion aqueuse d'une résine ionique à base d'époxy, d'un photostabilisant contenant une amine entravée et d'un mélange d'antioxydants comprenant un antioxydant phénolique et un antioxydant contenant du soufre. On utilise tout particulièrement ces compositions pour apprêt sous les couches de finition qui sont perméables aux rayons UV, lesquels, en l'absence de l'amine entravée et du mélange d'antioxydants, provoquent la délamination de la couche de finition.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU70536/94A AU674236B2 (en) | 1993-06-23 | 1994-06-03 | Photodegradation-resistant electrodepositable primer compositions |
| BR9407270A BR9407270A (pt) | 1993-06-23 | 1994-06-03 | Composição eletrodepositável e processo para revestir um substrato |
| EP94919369A EP0705309A1 (fr) | 1993-06-23 | 1994-06-03 | Compositions pour appret electrodeposable resistant a la degradation photochimique |
| KR1019950705847A KR960703157A (ko) | 1993-06-23 | 1994-06-03 | 광분해 내성의 전착성 하도제 조성물(photodegradation-resistant electrodepositable primer compositions) |
| JP7502856A JP2695049B2 (ja) | 1993-06-23 | 1994-06-03 | 耐光分解性の電着プライマーコーティング |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/079,788 | 1993-06-23 | ||
| US08/079,788 US5389219A (en) | 1991-07-26 | 1993-06-23 | Photodegradation-resistant electrodepositable primer compositions |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| WO1995000594A2 WO1995000594A2 (fr) | 1995-01-05 |
| WO1995000594A3 WO1995000594A3 (fr) | 1995-02-23 |
| WO1995000594B1 true WO1995000594B1 (fr) | 1995-04-13 |
Family
ID=22152813
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US1994/006326 WO1995000594A2 (fr) | 1993-06-23 | 1994-06-03 | Compositions pour appret electrodeposable resistant a la degradation photochimique |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US5389219A (fr) |
| EP (1) | EP0705309A1 (fr) |
| JP (1) | JP2695049B2 (fr) |
| KR (1) | KR960703157A (fr) |
| CN (1) | CN1058510C (fr) |
| AU (1) | AU674236B2 (fr) |
| BR (1) | BR9407270A (fr) |
| CA (1) | CA2163862C (fr) |
| WO (1) | WO1995000594A2 (fr) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5699182A (en) * | 1995-05-25 | 1997-12-16 | Xytronyx, Inc. | Light fatigue resistant photochromic formulations |
| US6017431A (en) * | 1997-07-17 | 2000-01-25 | Ppg Industries Ohio, Inc. | Cationic electrodepositable coating composition and bath thereof and process for retarding the growth of bacteria for such a bath |
| US6423425B1 (en) | 1998-05-26 | 2002-07-23 | Ppg Industries Ohio, Inc. | Article having a chip-resistant electrodeposited coating and a process for forming an electrodeposited coating |
| US6248225B1 (en) * | 1998-05-26 | 2001-06-19 | Ppg Industries Ohio, Inc. | Process for forming a two-coat electrodeposited composite coating the composite coating and chip resistant electrodeposited coating composition |
| JP2000342127A (ja) | 1999-06-08 | 2000-12-12 | Shimano Inc | 塗装部品 |
| US6368719B1 (en) * | 2000-06-12 | 2002-04-09 | E. I. Du Pont De Nemours And Company | Process for preparing multi-layer coatings on automotive bodies or automotive body parts |
| US20030054193A1 (en) * | 2001-02-05 | 2003-03-20 | Mccollum Gregory J. | Photodegradation-resistant electrodepositable coating compositions and processes related thereto |
| KR100708515B1 (ko) * | 2002-02-13 | 2007-04-16 | 피피지 인더스트리즈 오하이오 인코포레이티드 | 기판상에 다층 복합 코팅을 형성하기 위한 코팅 라인 및방법 |
| US6960768B2 (en) * | 2003-02-10 | 2005-11-01 | Ppg Industries Ohio, Inc. | Method for determining the durability of a composite structure |
| US7070683B2 (en) * | 2003-02-13 | 2006-07-04 | Ppg Industries Ohio, Inc. | Electrodepositable coating compositions and processes related thereto |
| US20050116020A1 (en) * | 2003-11-07 | 2005-06-02 | Smolucha Walter E. | Locating individuals and games in a gaming establishment |
| US20050122119A1 (en) * | 2003-12-05 | 2005-06-09 | Touchram Llc | Low noise proximity sensing system |
| US20050137620A1 (en) * | 2003-12-22 | 2005-06-23 | Scimed Life Systems, Inc. | Balloon catheter retrieval device |
| US20060287078A1 (en) * | 2004-04-22 | 2006-12-21 | Smolucha Walter E | Identifying components of a casino game |
| US7330108B2 (en) * | 2005-02-24 | 2008-02-12 | Wms Gaming Inc. | Security zones for casino gaming |
| US20060258442A1 (en) * | 2005-05-13 | 2006-11-16 | Ryan Chad A | Multi-purpose casino chips |
| CA2626709A1 (fr) * | 2005-11-10 | 2007-05-18 | Rudolf Wilhelmus Bernardus Van Wessel | Revetements a base d'epoxy |
| DE102006028442A1 (de) * | 2006-06-21 | 2008-01-03 | Bayerische Motoren Werke Ag | Verfahren zur Bestimmung der Schädigung der Elektrotauchlackschicht eines füllerlosen Automobillacks durch Lichteinwirkung |
| US8524816B2 (en) * | 2007-03-15 | 2013-09-03 | Magni Industries, Inc. | Coating resistant to bio-diesel fuels |
| US20090061081A1 (en) * | 2007-08-28 | 2009-03-05 | Eibon William E | Process for depositing a coating layer system onto a substrate |
| WO2011092278A1 (fr) * | 2010-01-29 | 2011-08-04 | Hempel A/S | Compositions d'apprêt à base d'époxyde |
| TW201204820A (en) * | 2010-07-16 | 2012-02-01 | Sequoia Radcure Co Ltd | Heat dissipation formulation |
| US11001698B2 (en) | 2016-10-14 | 2021-05-11 | Basf Se | Stabilizer composition |
| CN106987078A (zh) * | 2017-04-01 | 2017-07-28 | 华南理工大学 | 一种可水分散性光稳定剂及其制备方法 |
| CN115379942A (zh) * | 2020-04-24 | 2022-11-22 | 惠普发展公司，有限责任合伙企业 | 三维打印 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3799854A (en) * | 1970-06-19 | 1974-03-26 | Ppg Industries Inc | Method of electrodepositing cationic compositions |
| US4294741A (en) * | 1980-06-23 | 1981-10-13 | Ppg Industries, Inc. | Cationic polymers and their use in electrodeposition |
| US4297261A (en) * | 1980-06-23 | 1981-10-27 | Ppg Industries, Inc. | Cationic polymers and their use in electrodeposition |
| US4477519A (en) * | 1981-12-04 | 1984-10-16 | General Electric Company | Dual component coating system |
| WO1985001694A1 (fr) * | 1983-10-13 | 1985-04-25 | Ford Motor Company | Compositions flexibles de revetement |
| US4612098A (en) * | 1984-10-15 | 1986-09-16 | The Dow Chemical Company | Process for electrodeposition using azetidinedione compounds as crosslinkers |
| US4576980A (en) * | 1984-10-15 | 1986-03-18 | The Dow Chemical Company | Azetidinedione compounds as crosslinkers for electrodeposited coatings |
| US4756975A (en) * | 1984-11-12 | 1988-07-12 | Kansai Paint Co., Ltd. | Process for coating automotive outer bodies |
| JPS62236873A (ja) * | 1986-04-08 | 1987-10-16 | Nippon Paint Co Ltd | 電着塗料組成物 |
| US4812337A (en) * | 1986-11-25 | 1989-03-14 | Kansai Paint Company, Limited | Metallic coating method |
| US4981759A (en) * | 1987-05-02 | 1991-01-01 | Kansa Paint Co., Ltd. | Coating method |
| US5112890A (en) * | 1987-09-21 | 1992-05-12 | Ciba-Geigy Corporation | Stabilization of acid catalyzed thermoset resins |
| US5106651A (en) * | 1991-02-21 | 1992-04-21 | Ppg Industries, Inc. | Method for improving resistance to water spotting and acid etching of coatings by exposure to UV radiation |
| US5260135A (en) * | 1991-07-26 | 1993-11-09 | Ppg Industries, Inc. | Photodegradation-resistant electrodepositable primer compositions |
| CA2075651C (fr) * | 1991-08-16 | 1999-01-26 | Victor G. Corrigan | Compositions d'appret anti-photodegradation pour electrodeposition |
| US5205916A (en) * | 1991-12-11 | 1993-04-27 | E. I. Du Pont De Nemours And Company | Cathodic electrodeposition coatings containing an antioxidant additive |
-
1993
- 1993-06-23 US US08/079,788 patent/US5389219A/en not_active Expired - Lifetime
-
1994
- 1994-06-03 CA CA002163862A patent/CA2163862C/fr not_active Expired - Fee Related
- 1994-06-03 CN CN94192571A patent/CN1058510C/zh not_active Expired - Fee Related
- 1994-06-03 WO PCT/US1994/006326 patent/WO1995000594A2/fr not_active Application Discontinuation
- 1994-06-03 AU AU70536/94A patent/AU674236B2/en not_active Ceased
- 1994-06-03 EP EP94919369A patent/EP0705309A1/fr not_active Ceased
- 1994-06-03 KR KR1019950705847A patent/KR960703157A/ko not_active Ceased
- 1994-06-03 BR BR9407270A patent/BR9407270A/pt not_active IP Right Cessation
- 1994-06-03 JP JP7502856A patent/JP2695049B2/ja not_active Expired - Fee Related
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