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WO1994024609A3 - Compositions photodurcissables - Google Patents

Compositions photodurcissables Download PDF

Info

Publication number
WO1994024609A3
WO1994024609A3 PCT/US1993/003717 US9303717W WO9424609A3 WO 1994024609 A3 WO1994024609 A3 WO 1994024609A3 US 9303717 W US9303717 W US 9303717W WO 9424609 A3 WO9424609 A3 WO 9424609A3
Authority
WO
WIPO (PCT)
Prior art keywords
compositions
compound bearing
photocurable compositions
groups
photoresists
Prior art date
Application number
PCT/US1993/003717
Other languages
English (en)
Other versions
WO1994024609A2 (fr
Inventor
Donald L Schmidt
Gene D Rose
Edward E Flagg
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US07/814,846 priority Critical patent/US5238747A/en
Priority claimed from US07/814,846 external-priority patent/US5238747A/en
Priority to US07/920,029 priority patent/US5310581A/en
Priority claimed from US07/920,029 external-priority patent/US5310581A/en
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Priority to EP93909603A priority patent/EP0695437A1/fr
Priority to JP6523086A priority patent/JPH08509820A/ja
Priority to AU40331/93A priority patent/AU4033193A/en
Publication of WO1994024609A2 publication Critical patent/WO1994024609A2/fr
Publication of WO1994024609A3 publication Critical patent/WO1994024609A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

Nouvelles compositions de revêtement adhésives et photodurcissables et procédé de préparation de ces compositions. Un substrat peut être recouvert d'un premier composé portant une pluralité de groupes onium, et d'un second composé portant une pluralité de groupes nucléophiles. Le revêtement obtenu durcit aisément lorsqu'il est exposé à un rayonnement actinique. Ces compositions peuvent être utilisées dans la préparation de résines photosensibles et de membranes composites, ainsi que pour modifier des surfaces, soit pour leur permettre de recevoir des matières adhésives, soit pour qu'elles libèrent des salissures grasses.
PCT/US1993/003717 1989-12-29 1993-04-20 Compositions photodurcissables WO1994024609A2 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US07/814,846 US5238747A (en) 1989-12-29 1991-12-30 Photocurable compositions
US07/920,029 US5310581A (en) 1989-12-29 1992-07-27 Photocurable compositions
EP93909603A EP0695437A1 (fr) 1991-12-30 1993-04-20 Compositions photodurcissables
JP6523086A JPH08509820A (ja) 1991-12-30 1993-04-20 光硬化可能な組成物
AU40331/93A AU4033193A (en) 1991-12-30 1993-04-20 Photocurable compositions

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/814,846 US5238747A (en) 1989-12-29 1991-12-30 Photocurable compositions
US07/920,029 US5310581A (en) 1989-12-29 1992-07-27 Photocurable compositions

Publications (2)

Publication Number Publication Date
WO1994024609A2 WO1994024609A2 (fr) 1994-10-27
WO1994024609A3 true WO1994024609A3 (fr) 1995-03-09

Family

ID=27123886

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1993/003717 WO1994024609A2 (fr) 1989-12-29 1993-04-20 Compositions photodurcissables

Country Status (4)

Country Link
EP (1) EP0695437A1 (fr)
JP (1) JPH08509820A (fr)
AU (1) AU4033193A (fr)
WO (1) WO1994024609A2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4285020B2 (ja) * 2003-02-14 2009-06-24 コニカミノルタホールディングス株式会社 活性光線硬化型インクを用いた画像形成方法
US8187991B2 (en) 2008-06-11 2012-05-29 General Electric Company Methods for regeneration of adsorbent material
JP5658932B2 (ja) * 2009-07-14 2015-01-28 住友化学株式会社 新規化合物、レジスト組成物及びパターン形成方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3462274A (en) * 1965-04-08 1969-08-19 Agfa Gevaert Ag Light-sensitive layers for graphic arts purposes using polyvinyl benzyl n-(4-vinylpyridinium) salts
GB2006231A (en) * 1977-10-06 1979-05-02 Eastman Kodak Co Copolymer gelatin hardeners
EP0164100A2 (fr) * 1984-06-06 1985-12-11 Polaroid Corporation Polymères pyridinium ylides et produits préparés à partir de ceux-ci
US4704324A (en) * 1985-04-03 1987-11-03 The Dow Chemical Company Semi-permeable membranes prepared via reaction of cationic groups with nucleophilic groups
US4941972A (en) * 1984-12-06 1990-07-17 The Dow Chemical Company Chlorine-stable membrane compositions
US5006624A (en) * 1987-05-14 1991-04-09 The Dow Chemical Company Fluorocarbon containing, reactive polymeric surfactants and coating compositions therefrom
US5238747A (en) * 1989-12-29 1993-08-24 The Dow Chemical Company Photocurable compositions

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3462274A (en) * 1965-04-08 1969-08-19 Agfa Gevaert Ag Light-sensitive layers for graphic arts purposes using polyvinyl benzyl n-(4-vinylpyridinium) salts
GB2006231A (en) * 1977-10-06 1979-05-02 Eastman Kodak Co Copolymer gelatin hardeners
EP0164100A2 (fr) * 1984-06-06 1985-12-11 Polaroid Corporation Polymères pyridinium ylides et produits préparés à partir de ceux-ci
US4941972A (en) * 1984-12-06 1990-07-17 The Dow Chemical Company Chlorine-stable membrane compositions
US4704324A (en) * 1985-04-03 1987-11-03 The Dow Chemical Company Semi-permeable membranes prepared via reaction of cationic groups with nucleophilic groups
US5006624A (en) * 1987-05-14 1991-04-09 The Dow Chemical Company Fluorocarbon containing, reactive polymeric surfactants and coating compositions therefrom
US5238747A (en) * 1989-12-29 1993-08-24 The Dow Chemical Company Photocurable compositions

Also Published As

Publication number Publication date
WO1994024609A2 (fr) 1994-10-27
JPH08509820A (ja) 1996-10-15
AU4033193A (en) 1994-11-08
EP0695437A1 (fr) 1996-02-07

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