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WO1992020652A1 - Process for producing pyrrolidine compound or salt thereof - Google Patents

Process for producing pyrrolidine compound or salt thereof Download PDF

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Publication number
WO1992020652A1
WO1992020652A1 PCT/JP1992/000648 JP9200648W WO9220652A1 WO 1992020652 A1 WO1992020652 A1 WO 1992020652A1 JP 9200648 W JP9200648 W JP 9200648W WO 9220652 A1 WO9220652 A1 WO 9220652A1
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Prior art keywords
group
reaction
acid
compound
salt
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PCT/JP1992/000648
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French (fr)
Japanese (ja)
Inventor
Satoshi Hirabayashi
Kazuo Ike
Atuhiko Zanka
Takeshi Kawakami
Masaharu Ichihara
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Fujisawa Pharmaceutical Co., Ltd.
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Publication of WO1992020652A1 publication Critical patent/WO1992020652A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D207/00Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/04Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
    • C07D207/10Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D207/14Nitrogen atoms not forming part of a nitro radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Definitions

  • the present invention is excellent in the yield and purity of a pyrrolidine compound or a salt thereof, which is useful as an intermediate for producing a clinically excellent synthetic antibacterial agent, and has a simplified operation. It concerns a new industrial manufacturing method.
  • the pyrrolidine compound of the present invention can be represented by the following formula.
  • R 1 represents a lower alkyl group
  • R 2 represents a hydrogen atom or an amino protecting group
  • R 3 represents a hydrogen atom or an amino protecting group.
  • the pyrrolidine compound (A) is produced by a series of steps shown in the production method (1).
  • R 1 is, R 2.
  • R 3 b is a hydrogen atom or an Amino protecting groups, respectively, but at the same time not Amino coercive ⁇
  • R 2 a is amino-protecting radical
  • R 3 a is an amino protecting group
  • R 4 and R 5 Waso respectively carboxy-protecting group
  • X represents a leaving group.
  • the starting material (II) is prepared, for example, by a series of steps shown in the following synthesis method.
  • Suitable salts of compound (A) include both acid addition salts and base addition salts.
  • the acid addition salts include (ii) salts with mineral acids such as hydrochloric acid and sulfuric acid, (mouth) salts with organic carboxylic acids such as formic acid, citric acid, trichloroacetic acid, and trifluoroacetic acid; ) Salts with sulfonic acids such as methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, mesitylenesulfonic acid, and naphthalenesulfonic acid, and base addition salts such as (ii) sodium and potassium Salts with alkaline metals such as calcium, (mouth) Salts with alkaline earth metals such as calcium and magnesium, (c) ammonium salts, (ii) trimethylamine, triethylamine, tributylamine , Pyridine, N, N-dimethylaniline, N-methylbiper
  • “Lower j” means a group having 1 to 6, preferably 1 to 4 carbon atoms when the substituent is a straight-chain or branched group, and 3 carbon atoms when the substituent is a straight-chain or branched group.
  • to mean the group of ⁇ 7
  • a carboxy protecting group J refers to an ester residue of a carboxylic acid ester and means any that is relatively easily cleaved to yield the corresponding free carboxyl group.
  • Alkyl group eg, methyl group, ethyl group, n-propyl group, tertiary butyl group, etc.
  • lower alkenyl group eg, vinyl group, aryl group, etc.
  • aralkyl group eg, benzyl group, etc.
  • a benzhydryl group or the like or an aryl group (eg, a phenyl group) that is eliminated by treatment under mild conditions such as hydrolysis or catalytic reduction; or a lower alkanoyloxy lower alkyl group ( For example, an acetyloxy group, a bivaloyloxymethyl group, etc.), a lower alkoxycarbonyloxy lower alkyl group (E.g., methoxycarbonyloxymethyl group,
  • the “lower alkyl group” includes, for example, a methyl group, an ethyl group, Propyl, tertiary butyl, tertiary pentyl, etc.
  • Examples of the leaving group j include a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • amino protecting group examples include lower alkanoyl groups such as formyl, acetyl, propylion, bivaloyl, hexanoyl, etc .; I) halo (lower) alkanol groups, for example, lower alkoxycarbonyl groups such as methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, tertiary butoxycarbonyl, tertiary pentyloxycarbonyl, hexyloxycarbonyl, etc.
  • lower alkanoyl groups such as formyl, acetyl, propylion, bivaloyl, hexanoyl, etc .
  • halo (lower) alkanol groups for example, lower alkoxycarbonyl groups such as methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, tertiary butoxycarbonyl, tertiary pentyloxycarbonyl, hexyloxycarbon
  • Rubamoyl group for example, benzyl group, toluoyl, naphthoyl, etc., aryl group, for example, phenylacetyl, phenylpropionyl, etc., al (lower) alkanoyl group, for example, phenyloxycarbonyl, naphthyloxycarbonyl, etc.
  • Aryloxy carbonyl groups such as phenyloxycetyl and phenoxypropionyl, etc.
  • Alkyl (lower) alkoxycarbonyl groups which may have a suitable substituent, such as xyloxycarbonyl, phenethyloxycarbonyl, p-ditrobenzyloxycarbonyl, etc., such as benzylidene, phenyl Substituted or unsubstituted alkyl (lower) alkylidene groups such as droxybenzylidene, such as mono (or di or tri) fuynyl (lower) alkyl groups such as benzyl, phenyl, phenethyl, benzohydryl, and trityl. Al (lower) alkyl groups.
  • Process 1 Compound (ffl) can be produced by reacting compound ( ⁇ ) with compound (IV).
  • Suitable bases include, for example, alkali metals such as lithium and potassium, alkaline earth metals such as calcium, alkali metal hydrides such as sodium hydride and potassium hydride, and the like.
  • alkaline earth metal hydrides such as calcium hydride, etc.
  • alkaline earth metal hydroxides such as calcium hydroxide
  • alkali metal hydroxides such as sodium hydroxide and potassium hydroxide
  • alkali metal carbonates such as sodium carbonate, potassium carbonate, etc., for example, sodium bicarbonate, hydrogen carbonate such as sodium bicarbonate, etc., for example, sodium methoxide, sodium methoxide, etc.
  • Alkali metal alkoxides such as potassium tertiary butoxide, for example, alkali metal alkanoates such as sodium acetate, for example, butyl
  • alkali metal alkanoates such as sodium acetate
  • butyl A combination of a lower alkyllithium such as titanium and an amine such as diisoproviramine and hexamethyldisilazane; for example, a trialkylamine such as triethylamine; for example, pyridines such as pyridine, lutidine, and violin; quinoline , 1,8- diazabicyclo [5.4.0] pendecar 7-ene.
  • a bulky base such as a combination of butyl lithium and diisoproviramine or hexamethyldisilazane is used, the stereoselectivity of the compound (II) can be improved.
  • the reaction is usually carried out in a solvent such as water, for example, an alcohol such as methanol or ethanol, ⁇ -hexane, methylene chloride, tetrahydrofuran, ⁇ , ⁇ -dimethylformamide or dimethylsulfoxide, or a mixture thereof.
  • a solvent such as water, for example, an alcohol such as methanol or ethanol, ⁇ -hexane, methylene chloride, tetrahydrofuran, ⁇ , ⁇ -dimethylformamide or dimethylsulfoxide, or a mixture thereof.
  • a solvent such as water
  • an alcohol such as methanol or ethanol, ⁇ -hexane, methylene chloride, tetrahydrofuran, ⁇ , ⁇ -dimethylformamide or dimethylsulfoxide, or a mixture thereof.
  • the reaction can be carried out in any other solvent that does not adversely affect the reaction.
  • the reaction temperature is not particularly limited, but the reaction is usually performed under cooling or heating.
  • Process 2 Compound (i) can be produced by subjecting compound (m) to a reduction reaction.
  • Reduction methods applicable to this reaction include chemical reduction and catalytic reduction.
  • the reducing agent used for the reduction may be a chemical reducing agent such as a metal such as tin, zinc and iron or a metal compound such as chromium chloride and chromium acetate, and a metal compound such as formic acid, acetic acid, propionic acid and trifluoro.
  • a chemical reducing agent such as a metal such as tin, zinc and iron or a metal compound such as chromium chloride and chromium acetate, and a metal compound such as formic acid, acetic acid, propionic acid and trifluoro.
  • Platinum catalysts such as platinum plate, platinum sponge, platinum black, colloid platinum, platinum oxide, platinum wire, etc., such as palladium sponge, Palladium black, palladium oxide, palladium monocarbon, colloid palladium, palladium barium monosulfate, palladium barium carbonate
  • Palladium catalysts such as palladium, for example, nickel catalysts such as reduced nickel, nickel oxide, and Raney nickel; for example, cobalt catalysts such as reduced cobalt and Raney cobalt; for example, iron catalysts such as reduced iron and Raney monoiron, such as reduced copper and Raney Usable ones such as copper catalysts such as copper and Ullman copper are exemplified.
  • the reaction is usually performed in water, for example, alcohols such as methanol, ethanol
  • the reaction is carried out in a solvent such as methylene chloride, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, dimethylsulfoxide or a mixture thereof, but any other solvent which does not adversely affect the reaction is used.
  • a solvent such as methylene chloride, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, dimethylsulfoxide or a mixture thereof, but any other solvent which does not adversely affect the reaction is used.
  • the reaction can be carried out with any solvent.
  • the reaction temperature is not particularly limited, but the reaction is usually performed under cooling or heating.
  • Compound (A ') or a salt thereof is prepared by reacting compound (V) with compound (I) or a reactive derivative thereof at a hydroxy group.
  • the reactive derivative of the hydroxy group include halides such as chloride, bromide and sulfide, and sulfonic acid esters such as methanesulfonic acid ester, benzenesulfonic acid ester and toluenesulfonic acid ester.
  • the reaction is usually performed in water, for example, alcohols such as methanol, ethanol, etc.
  • the reaction is carried out in a solvent such as, ethyl ethyl acetate, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, dimethylsulfoxide or a mixture thereof, provided that the solvent does not adversely affect the reaction.
  • a solvent such as, ethyl ethyl acetate, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, dimethylsulfoxide or a mixture thereof, provided that the solvent does not adversely affect the reaction.
  • the reaction can be performed in any other solvent.
  • the reaction temperature is not particularly limited, but the reaction is usually performed under cooling or heating.
  • This reaction is carried out according to a conventional method such as hydrolysis, reduction and the like.
  • the hydrolysis reaction is preferably performed in the presence of a base or an acid (including a Lewis acid).
  • Suitable bases include, for example, the bases described above.
  • Suitable acids include organic acids such as, for example, formic acid, acetic acid, glacial acetic acid, brobionic acid, trichloroacetic acid, trifluoroacetic acid and the like, for example, hydrochloric acid
  • inorganic acids such as hydrobromic acid and sulfuric acid.
  • a Lewis acid such as trihaloacetic acid such as trichloroacetic acid or trifluoroacetic acid is preferably performed in the presence of a positive ion scavenger such as anisol or phenol.
  • the reduction methods applicable to this reaction include chemical reduction and catalytic reduction.
  • the reducing agents used for reduction are as follows.
  • metals such as tin, zinc and iron or metal compounds such as chromium chloride and chromium acetate, and for example, formic acid, acetic acid, brobionic acid, trifluoroacetic acid, P-toluenesulfonic acid, hydrochloric acid, hydrobromic acid, etc.
  • Platinum catalysts such as platinum plate, platinum sponge, platinum black, colloidal platinum, platinum oxide, platinum wire, etc., such as palladium sponge, palladium black, palladium oxide, palladium oxide, Palladium catalysts such as colloid palladium, barium palladium monosulfate, barium palladium monocarbonate, such as reduced nickel, Nickel catalysts such as nickel oxide and Raney nickel, for example, cobalt catalysts such as reduced cobalt and Raney cobalt, for example, iron catalysts such as reduced iron and Raney monoiron, for example, copper catalysts such as reduced copper, Raney copper, Ullman copper, etc.
  • Reactions usually include water, for example, alcohols such as methanol and ethanol, diisopropyl ether, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, dimethylsulfoxide, and the like.
  • the reaction is carried out in a solvent or a mixture thereof, but the reaction can be carried out in any other solvent that does not adversely influence the reaction.
  • Liquid bases or acids can also be used as solvents.
  • the reaction temperature is not particularly limited, but the reaction is usually performed under cooling or heating.
  • ammonium formate can be used instead of hydrogenation, using a palladium catalyst as a hydrogen generating source.
  • the compounds obtained in Steps 1 to 4 of Production Method 1 are separated or purified by conventional methods such as extraction, precipitation, fractional crystallization, recrystallization, and chromatography.
  • Reagents to be used in the synthesis of the starting material ( ⁇ ) The reaction conditions such as the reaction temperature may be referred to, for example, the production examples described below.
  • N, N-Dimethylformamide (1.46 g) was added to a suspension of (S) -aspartic acid (133.lg) in methanol (100,000 ml), and thionyl chloride was added while stirring under ice-cooling. (262 g) was dripped slowly and stirred at about 50 for 5 hours. Further, thionyl chloride (60 g) was added, and the mixture was stirred at the same temperature for about 1 hour, and concentrated under reduced pressure to obtain crude crystals of (S) -dimethylaspartate hydrochloride. The suspension was washed with methanol to obtain purified crystals (121 g).
  • Example 3 The compound of Example 3 was recrystallized from isopropyl alcohol monohydrate (1: 1) to obtain the same compound with improved optical purity (92% de) in a yield of 81 • 2%.
  • Example 4 The compound of Example 4 was recrystallized three times from acetonitrile to give the compound having improved optical purity (99.3% de) in a yield of 46.8%.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Pyrrole Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

A novel industrial process for producing a compound (A) which is useful as an intermediate for the production of a clinically excellent synthetic antibacterial, which process comprises the following steps and is excellent in the yield, purity, etc., and simplified in operation α, wherein R1 represents lower alkyl; R?2 and R3¿ represent each hydrogen or an amino-protective group; R2a and R3a represent each an amino-protective group; R?4 and R5¿ represent each a carboxyl-protective group; and X represents a leaving group.

Description

明 細 書  Specification
ピロ リ ジン化合物またはその塩の製造法 技術分野  Method for producing pyrrolidine compound or its salt
この発明は、 臨床上優れた合成抗菌剤を製造するための中間体と して有用なピロ リ ジン化合物またはその塩の収率、 純度などの点で 優れ、 また操作的にも簡便化された新規な工業的製造法に関するも のである。  INDUSTRIAL APPLICABILITY The present invention is excellent in the yield and purity of a pyrrolidine compound or a salt thereof, which is useful as an intermediate for producing a clinically excellent synthetic antibacterial agent, and has a simplified operation. It concerns a new industrial manufacturing method.
発明の開示  Disclosure of the invention
この発明の化合物であるピロ リジン化合物は、 下記の式で表すこ とができる。  The pyrrolidine compound of the present invention can be represented by the following formula.
Figure imgf000003_0001
Figure imgf000003_0001
(式中、 R 1 は低級アルキル基、 R 2 は水素原子またはァミ ノ保護 基、 R 3 は水素原子またはァミノ保護基を意味する。 ) (In the formula, R 1 represents a lower alkyl group, R 2 represents a hydrogen atom or an amino protecting group, and R 3 represents a hydrogen atom or an amino protecting group.)
この発明によれば、 ピロ リジン化合物 ( A ) は製造法 ( 1 ) に示 される一連の工程によつて製造される。  According to the present invention, the pyrrolidine compound (A) is produced by a series of steps shown in the production method (1).
製造法 ( 1 ) Manufacturing method (1)
工程 1  Process 1
Figure imgf000003_0002
Figure imgf000003_0002
( II ) ( in ) (II) (in)
新たな用紙 工程 2 還元反応 New paper Step 2 Reduction reaction
Figure imgf000004_0001
Figure imgf000004_0001
( I ) 工程 3 (I) Process 3
Rf-
Figure imgf000004_0002
Rf-
Figure imgf000004_0002
( I ) (Α ' ) またはヒ ドロキシ基における またはその塩 その反応性誘導体 (I) or a salt thereof in (Α ') or a hydroxy group, a reactive derivative thereof.
工程 4 所望によ り保護基の脱離反応 Step 4 Elimination reaction of protecting group as desired
Figure imgf000004_0003
Figure imgf000004_0003
④ RI ④ RI
• (A) またはその塩 • (A) or its salt
(式中 R 1 は前と同じ意味、 R 2 . 、 および R 3 bはそれぞれ水素原 子またはァミノ保護基を意味するが、 同時にァミノ保謹基ではない 、 R 2 a はアミノ保護基、 R 3 a はアミノ保護基、 R4 および R 5 はそ れぞれカルボキシ保護基、 Xは脱離基を意味する。 ) (Meaning given above wherein R 1 is, R 2., And R 3 b is a hydrogen atom or an Amino protecting groups, respectively, but at the same time not Amino coercive謹基, R 2 a is amino-protecting radical, R 3 a is an amino protecting group, R 4 and R 5 Waso respectively carboxy-protecting group, X represents a leaving group.)
出発物質 ( II ) は例えば下記の合成法に示される一連の工程によ  The starting material (II) is prepared, for example, by a series of steps shown in the following synthesis method.
新たな用紙 り製造される New paper Manufactured
合成法  Synthesis method
工程 a  Process a
Figure imgf000005_0001
Figure imgf000005_0001
ァ ミ ノ保護基の導入Introduction of amino protecting groups
Figure imgf000005_0002
またはその塩
Figure imgf000005_0002
Or its salt
(式中、 R 2 a, R 4 および R 5 はそれぞれ前と同じ意味) (Wherein, R 2 a , R 4 and R 5 have the same meanings as before)
化合物 (A ) の適当な塩としては酸付加塩又は塩基付加塩の両方 を挙げることができる。 酸付加塩としては、 例えば (ィ) 塩酸、 硫 酸などの鉱酸との塩、 (口) ギ酸、 クェン酸、 ト リクロ口酢酸、 卜 リ フルォロ酢酸などの有機カルボン酸との塩、 (ハ) メタンスルホ ン酸、 ベンゼンスルホン酸、 p—トルエンスルホン酸、 メシチレン スルホン酸、 ナフタ レンスルホン酸などのスルホン酸との塩を、 ま た塩基付加塩としては、 例えば、 (ィ) ナト リ ウム、 カリ ウムなど のアルカ リ金属との塩、 (口) カルシウム、 マグネシウムなどのァ ルカ リ土類金属との塩、 (ハ) アンモニゥム塩、 (二) ト リメチル ァミ ン、 ト リェチルァミ ン、 ト リブチルァミ ン、 ピリ ジン、 N, N 一ジメチルァニリ ン、 N—メチルビペリ ジン、 N—メチルモルホ リ ン、 ジェチルァミ ン、 シクロへキシルァミ ン、 ブロカイ ン、 ジベン ジルァミ ン、 1一エフェナミ ン、 N— N ' —ジベンジルエチレンジ ァミンなどの含窒素有機塩基との塩を挙げることができる。 Suitable salts of compound (A) include both acid addition salts and base addition salts. Examples of the acid addition salts include (ii) salts with mineral acids such as hydrochloric acid and sulfuric acid, (mouth) salts with organic carboxylic acids such as formic acid, citric acid, trichloroacetic acid, and trifluoroacetic acid; ) Salts with sulfonic acids such as methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, mesitylenesulfonic acid, and naphthalenesulfonic acid, and base addition salts such as (ii) sodium and potassium Salts with alkaline metals such as calcium, (mouth) Salts with alkaline earth metals such as calcium and magnesium, (c) ammonium salts, (ii) trimethylamine, triethylamine, tributylamine , Pyridine, N, N-dimethylaniline, N-methylbiperidine, N-methylmorpholine, getylamine, cyclohexylamine, brokai , Dibenzilamin, 1-ephenamine, N--N'-dibenzylethylenediamine And a salt with a nitrogen-containing organic base such as amine.
この明細書の以上および以下の記載において、 この発明の範囲内 に包含される種々の定義の好適な例および説明を以下詳細に説明す る。  In the foregoing and following description of this specification, preferred examples and explanations of various definitions included within the scope of the present invention are described in detail below.
「低級 j とは、 該置換基が直鎖又は分岐状の基である時には、 炭 素数 i〜6、 好ましくは 1〜4の基を意味し、 瑋状の基であるとき は、 炭素数 3〜7の基を意昧する β "Lower j" means a group having 1 to 6, preferably 1 to 4 carbon atoms when the substituent is a straight-chain or branched group, and 3 carbon atoms when the substituent is a straight-chain or branched group. Β to mean the group of ~ 7
「カルボキシ保護基 J とは、 カルボン酸エステルのエステル残基 を指し、 比較的容易に開裂して、 対応する遊離カルボキシル基を生 じる任意のものを意味する。 その具体例としては、 例えば低級アル キル基 (例えば、 メチル基、 ェチル基、 n—プロピル基、 第三級ブ チル基など) 、 例えば低級アルケニル基 (例えば、 ビニール基、 ァ リル基など) , 例えばァラルキル基 (例えば、 ベンジル基、 ベンズ ヒ ドリル基など) あるいはァリール基 (例えば、 フエニル基など) 等の加水分解や接触還元等の緩和な条件で処理することにより脱離 するもの ; あるいは、 低級アルカノィルォキシ低級アルキル基 (例 えば、 ァセトキシメチル基、 ビバロイルォキシメチル基など) 、 低 級アルコキシカルボニルォキシ低級アルキル基 (例えば、 メ 卜キシ 力ルボニルォキシメチル基、 1一エトキシカルボニルォキシェチル 基など) 、 低級アルコキシメチル基 (例えば、 メ トキシメチル基な ど) 、 ラク トニル基 (例えば、 フタリジル基など) 、 例えば、 ハロ ゲン原子または例えば低級アルカノィルォキシ、 ハロ (低級) アル カノィルォキシ、 [ベンゾィルォキシ、 トルオイルォキシ、 ナフ 卜 ィルォキシ I 等のァロイルォキシ等で置換されたボロン基 (例えば ジフルォロボロン基など) 、 ジ低級アルキルアミノ低級アルキル ( 例えば、 1 ージメチルアミノエチル基など) 、 ( 5—メチルー 2— ォキソ一ルー 4一ィル) メチル基等の容易に脱離するものなどが挙 げられる。  "A carboxy protecting group J refers to an ester residue of a carboxylic acid ester and means any that is relatively easily cleaved to yield the corresponding free carboxyl group. Alkyl group (eg, methyl group, ethyl group, n-propyl group, tertiary butyl group, etc.), for example, lower alkenyl group (eg, vinyl group, aryl group, etc.), eg, aralkyl group (eg, benzyl group, etc.) , A benzhydryl group or the like, or an aryl group (eg, a phenyl group) that is eliminated by treatment under mild conditions such as hydrolysis or catalytic reduction; or a lower alkanoyloxy lower alkyl group ( For example, an acetyloxy group, a bivaloyloxymethyl group, etc.), a lower alkoxycarbonyloxy lower alkyl group (E.g., methoxycarbonyloxymethyl group, 11-ethoxycarbonyloxyshetyl group, etc.), lower alkoxymethyl group (e.g., methoxymethyl group, etc.), lactonyl group (e.g., phthalidyl group, etc.), For example, a boron group (for example, difluoroborone group, etc.) substituted with a halogen atom or a lower alkanoyloxy, halo (lower) alkanoyloxy, [aroyloxy such as benzoyloxy, toluoyloxy, naphthyloxy I, etc.], di-lower alkylamino Examples of such compounds include a lower alkyl (for example, 1-dimethylaminoethyl group) and a (5-methyl-2-oxo-1-yl) methyl group which are easily eliminated.
「低級アルキル基」 としては、 例えばメチル基、 ェチル基、 イソ プロピル基、 第三級ブチル基、 第三級ペンチル基などが挙げられる o The “lower alkyl group” includes, for example, a methyl group, an ethyl group, Propyl, tertiary butyl, tertiary pentyl, etc.
「脱離基 j としては、 例えばフッ素原子、 塩素原子、 臭素原子お よびョゥ素原子のハロゲン原子等が挙げられる。  "Examples of the leaving group j include a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
「ァミノ保護基」 としては、 例えばホルミル、 ァセチル、 ブロピ ォニル、 ビバロイル、 へキサノィル等の低級アルカノィル基、 例え ばクロオアセチル、 プロモアセチル、 ジクロォオアセチル、 ト リフ ルォロアセチル等のモノ (もしくはジもしくはト リ) ハロ (低級) アルカノィル基、 例えばメ 卜キシカルボニル、 エトキシカルボニル 、 プロポキシカルボニル、 第三級ブトキシカルボニル、 第三級ペン チルォキシカルボニル、 へキシルォキシカルボニル等の低級アルコ キシカルボニル基、 力ルバモイル基、 例えばべンゾィル、 トルオイ ル、 ナフ トイル等のァロィル基、 例えばフエ二ルァセチル、 フエ二 ルブロピオニル等のアル (低級) アルカノィル基、 例えばフヱノキ シカルボニル、 ナフチルォキシカルボニル等のァリールォキシカル ボニル基、 例えばフエノキシァセチル、 フエノキシプロピオニル等 のァリールォキシ (低級) アルカノィル基、 例えばフエニルグリオ キシロイル、 ナフチルグリオキシロイル等のァリールグリオキシロ ィル基、 例えばべンジルォキシカルボニル、 フエネチルォキシカル ボニル、 p —二トロべンジルォキシカルボニル等の、 適当な置換基 を有してもよいアル (低級) アルコキシカルボニル基、 等のァシル 基、 例えばべンジリデン、 ヒ ドロキシベンジリデン等の置換された または非置換アル (低級) アルキリデン基、 例えばベン'ジル、 フエ ネチル、 ベンズヒ ド リル、 ト リチル等のモノ (またはジまたは ト リ ) フユニル (低級) アルキル基のようなアル (低級) アルキル基等 が挙げられる。  Examples of the "amino protecting group" include lower alkanoyl groups such as formyl, acetyl, propylion, bivaloyl, hexanoyl, etc .; I) halo (lower) alkanol groups, for example, lower alkoxycarbonyl groups such as methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, tertiary butoxycarbonyl, tertiary pentyloxycarbonyl, hexyloxycarbonyl, etc. Rubamoyl group, for example, benzyl group, toluoyl, naphthoyl, etc., aryl group, for example, phenylacetyl, phenylpropionyl, etc., al (lower) alkanoyl group, for example, phenyloxycarbonyl, naphthyloxycarbonyl, etc. Aryloxy carbonyl groups such as phenyloxycetyl and phenoxypropionyl, etc. Alkyl (lower) alkoxycarbonyl groups which may have a suitable substituent, such as xyloxycarbonyl, phenethyloxycarbonyl, p-ditrobenzyloxycarbonyl, etc., such as benzylidene, phenyl Substituted or unsubstituted alkyl (lower) alkylidene groups such as droxybenzylidene, such as mono (or di or tri) fuynyl (lower) alkyl groups such as benzyl, phenyl, phenethyl, benzohydryl, and trityl. Al (lower) alkyl groups.
この発明の化合物 (A ) の製造法を以下詳細に説明する。  The method for producing the compound (A) of the present invention will be described in detail below.
製造法 1 Manufacturing method 1
工程 1 化合物 (ffl ) は、 化合物 ( π ) を化合物 (IV ) と反応させること により製造することができる。 Process 1 Compound (ffl) can be produced by reacting compound (π) with compound (IV).
反応は通常塩基の存在下に行われる。 好適な塩基としては、 例え ばリチウム、 カ リ ウム等のアルカ リ金属、 例えばカルシウム等のァ ルカ リ土類金属、 例えば水素化ナト リ ウム、 水素化カ リ ウム等のァ ルカリ金属水素化物、 例えば水素化カルシウム等のアル力 リ土類金 属水素化物、 例えば水酸化カルシウム等のアル力リ土類金属水酸化 物、 例えば水酸化ナト リ ウム、 水酸化カ リウム等のアルカ リ金属水 酸化物、 例えば炭酸ナト リウム、 炭酸カ リウム等のアルカ リ金属炭 酸塩、 例えば炭酸水素ナ卜 リゥム、 炭酸水素力 リゥム等のアル力 リ 金属炭酸水素塩、 例えばナトリ ウムメ 卜キシド、 ナト リ ウムェトキ シド、 カ リ ゥム第三級ブトキシド等のアル力リ金属アルコキシド、 例えば酢酸ナト リ ウム等のアルカ リ金属アルカン酸塩、 例えば、 ブ チルリチウム等の低級アルキルリチウムと、 例えばジイソプロビル ァミン、 へキサメチルジシラザン等のァミンとの組み合わせ、 例え ば卜 リエチルアミン等の 卜 リアルキルァミン、 例えばピリジン、 ル チジン、 ビコ リ ン等のピリジン類、 キノ リン、 1, 8—ジァザビシ クロ [ 5 . 4 . 0】 ゥンデカー 7—ェン等が挙げられる。 例えばブ チルリチウムとジイソプロビルァミン、 へキサメチルジシラザン等 の組み合わせのようなバルキーな塩基を用いれば化合物 (ΠΙ ) の立 体選択性をあげることができる。  The reaction is usually performed in the presence of a base. Suitable bases include, for example, alkali metals such as lithium and potassium, alkaline earth metals such as calcium, alkali metal hydrides such as sodium hydride and potassium hydride, and the like. For example, alkaline earth metal hydrides such as calcium hydride, etc., alkaline earth metal hydroxides such as calcium hydroxide, for example, alkali metal hydroxides such as sodium hydroxide and potassium hydroxide Substances, for example, alkali metal carbonates such as sodium carbonate, potassium carbonate, etc., for example, sodium bicarbonate, hydrogen carbonate such as sodium bicarbonate, etc., for example, sodium methoxide, sodium methoxide, etc. Alkali metal alkoxides, such as potassium tertiary butoxide, for example, alkali metal alkanoates such as sodium acetate, for example, butyl A combination of a lower alkyllithium such as titanium and an amine such as diisoproviramine and hexamethyldisilazane; for example, a trialkylamine such as triethylamine; for example, pyridines such as pyridine, lutidine, and violin; quinoline , 1,8- diazabicyclo [5.4.0] pendecar 7-ene. For example, when a bulky base such as a combination of butyl lithium and diisoproviramine or hexamethyldisilazane is used, the stereoselectivity of the compound (II) can be improved.
反応は通常、 水、 例えばメタノール、 エタノール等のアルコール 、 η—へキサン、 塩化メチレン、 テトラヒ ドロフラン、 Ν , Ν—ジ メチルホルムアミ ド、 ジメチルスルホキシドのような溶媒中または これらの混合物中で行われるが、 反応に悪影響を及ぼさない溶媒で あればその他いかなる溶媒でも反応を行うことができる。  The reaction is usually carried out in a solvent such as water, for example, an alcohol such as methanol or ethanol, η-hexane, methylene chloride, tetrahydrofuran, Ν, Ν-dimethylformamide or dimethylsulfoxide, or a mixture thereof. However, the reaction can be carried out in any other solvent that does not adversely affect the reaction.
反応温度は特に限定されないが、 通常は冷却下ないし加温下に反 応が行われる。  The reaction temperature is not particularly limited, but the reaction is usually performed under cooling or heating.
工程 2 化合物 ( i ) は、 化合物 (m ) を還元反応に付することにより製 造することができる。 Process 2 Compound (i) can be produced by subjecting compound (m) to a reduction reaction.
この反応に適用されうる還元法として化学的還元および接触還元 が挙げられる。  Reduction methods applicable to this reaction include chemical reduction and catalytic reduction.
還元に使用される還元剤は、 化学的還元剤としては例えばスズ、 亜鉛、 鉄等の金属または例えば塩化クロム、 酢酸クロム等の金属化 合物と、 例えばギ酸、 酢酸、 ブロピオン酸、 ト リ フルォロ酢酸、 P 一トルエンスルホン酸、 塩酸、 臭化水素酸等の有機酸または無機酸 との組合せ、 水素化リチウムアルミニウム、 水素化ホウ素ナト リ ウ ム、 水素化ホウ素ナ ト リ ウムと ト リフルォロ酢酸またはピリ ジンと の組合わせ、 ボランーメチルスルフィ ド錯体、 接触還元の触媒とし ては例えば白金板、 白金海綿、 白金黒、 コロイ ド白金、 酸化白金、 白金線等の白金触媒、 例えばパラジウム海綿、 パラジウム黒、 酸化 パラジウム、 パラジウム一炭素、 コロイ ドパラジウム、 パラジウム 一硫酸バリ ウム、 パラジウム一炭酸バリ ゥム等のパラジウム触媒、 例えば還元ニッケル、 酸化ニッケル、 ラネーニッケル等のニッケル 触媒、 例えば還元コバルト、 ラネーコバルト等のコバルト触媒、 例 えば還元鉄、 ラネ一鉄等の鉄触媒、 例えば環元銅、 ラネー銅、 ウル マン銅等の銅触媒等のような常用のものが挙げられる。  The reducing agent used for the reduction may be a chemical reducing agent such as a metal such as tin, zinc and iron or a metal compound such as chromium chloride and chromium acetate, and a metal compound such as formic acid, acetic acid, propionic acid and trifluoro. Combination with organic or inorganic acids such as acetic acid, P-toluenesulfonic acid, hydrochloric acid, hydrobromic acid, lithium aluminum hydride, sodium borohydride, sodium borohydride and trifluoroacetic acid or Platinum catalysts such as platinum plate, platinum sponge, platinum black, colloid platinum, platinum oxide, platinum wire, etc., such as palladium sponge, Palladium black, palladium oxide, palladium monocarbon, colloid palladium, palladium barium monosulfate, palladium barium carbonate Palladium catalysts such as palladium, for example, nickel catalysts such as reduced nickel, nickel oxide, and Raney nickel; for example, cobalt catalysts such as reduced cobalt and Raney cobalt; for example, iron catalysts such as reduced iron and Raney monoiron, such as reduced copper and Raney Usable ones such as copper catalysts such as copper and Ullman copper are exemplified.
反応は通常、 水、 例えばメタノール、 エタノール等のアルコール The reaction is usually performed in water, for example, alcohols such as methanol, ethanol
、 塩化メチレン、 テ 卜ラ ヒ ドロフラン、 N, N—ジメチルホルムァ ミ ド、 ジメチルスルホキシドのような溶媒中またはそれらの混合物 中で行われるが、 反応に悪影響を及ぼさない溶媒であればその他い かなる溶媒でも反応を行うことができる。 The reaction is carried out in a solvent such as methylene chloride, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, dimethylsulfoxide or a mixture thereof, but any other solvent which does not adversely affect the reaction is used. The reaction can be carried out with any solvent.
反応温度は特に限定されないが、 通常は冷却下ないし加熱下に反 応が行われる。  The reaction temperature is not particularly limited, but the reaction is usually performed under cooling or heating.
工程 3  Process 3
化合物 ( A ' ) またはその塩は、 化合物 ( I ) またはヒ ドロキシ 基におけるその反応性誘導体に化合物 (V ) を反応させることによ り製造することができる。 ヒ ドロキシ基の反応性誘導体としては 、 例えばクロ リ ド、 ブロミ ド、 ョ一ジド等のハロゲン化物、 例えば メタンスルホン酸エステル、 ベンゼンスルホン酸エステル、 トルェ ンスルホン酸エステル等のスルホン酸エステル等が挙げられる。 反応は通常、 水、 例えばメタノール、 エタノール等のアルコールCompound (A ') or a salt thereof is prepared by reacting compound (V) with compound (I) or a reactive derivative thereof at a hydroxy group. Can be manufactured. Examples of the reactive derivative of the hydroxy group include halides such as chloride, bromide and sulfide, and sulfonic acid esters such as methanesulfonic acid ester, benzenesulfonic acid ester and toluenesulfonic acid ester. . The reaction is usually performed in water, for example, alcohols such as methanol, ethanol, etc.
、 酢酸ェチル、 塩化メチレン、 テトラヒ ドロフラン、 N, N —ジメ チルホルムアミ ド、 ジメチルスルホキシドのような溶媒中またはそ れらの混合物中で行われるが、 反応に悪影響を及ぽさない溶媒であ ればその他いかなる溶媒でも反応を行うことができる。 The reaction is carried out in a solvent such as, ethyl ethyl acetate, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, dimethylsulfoxide or a mixture thereof, provided that the solvent does not adversely affect the reaction. The reaction can be performed in any other solvent.
反応温度は特に限定されないが、 通常は冷却下ないし加熱下に反 応が行われる。  The reaction temperature is not particularly limited, but the reaction is usually performed under cooling or heating.
工程 4  Process 4
工程 3で得られた化合物 (Α ' ) の側鎖の R 2 »および Ζまたは璟 の R 3 aがァミノ保護基の場合には、 化合物 (Α ' ) の環および Ζま たは側鎖のァミノ保護基の脱離反応を行うことにより化合物 (Α ) を製造することができる。 When R 2 »of the side chain of the compound (Α ′) obtained in Step 3 and R 3 a of Ζ or の are amino protecting groups, the ring and the Ζ or the side chain of the compound (Α ′) are The compound (II) can be produced by carrying out an elimination reaction of the amino protecting group.
この反応は例えば、 加水分解、 還元等のような常法に従って行わ れる。  This reaction is carried out according to a conventional method such as hydrolysis, reduction and the like.
加水分解反応は塩基、 または酸 (ルイス酸も含む) の存在下に行 うのが好ましい。 好適な塩基としては、 例えば前記した塩基が挙げ られる。  The hydrolysis reaction is preferably performed in the presence of a base or an acid (including a Lewis acid). Suitable bases include, for example, the bases described above.
好適な酸としては、 例えばギ酸、 酢酸、 氷酢酸、 ブロビオン酸、 ト リクロ口酢酸、 ト リフルォロ酢酸等の有機酸および例えば、 塩酸 Suitable acids include organic acids such as, for example, formic acid, acetic acid, glacial acetic acid, brobionic acid, trichloroacetic acid, trifluoroacetic acid and the like, for example, hydrochloric acid
、 臭化水素酸、 硫酸等の無機酸が挙げられる。 And inorganic acids such as hydrobromic acid and sulfuric acid.
例えばト リクロ口酢酸、 ト リフルォロ酢酸等の卜 リハロ酢酸等の ようなルイス酸を使用する脱離は、 例えばァニソール、 フエノール 等の陽ィォン捕捉剤の存在下に行うのが好ましい。  For example, the elimination using a Lewis acid such as trihaloacetic acid such as trichloroacetic acid or trifluoroacetic acid is preferably performed in the presence of a positive ion scavenger such as anisol or phenol.
この反応に適用されうる還元法として化学的還元および接触還元 が挙げられる 還元に使用される還元剤は、 化学的還元剤としては 例えばスズ、 亜鉛、 鉄等の金属または例えば塩化クロム、 酢酸クロ ム等の金属化合物と、 例えばギ酸、 酢酸、 ブロビオン酸、 ト リフル ォロ酢酸、 P— トルエンスルホン酸、 塩酸、 臭化水素酸等の有機酸 または無機酸との組合せ、 水素化リチウムアルミニウム、 水素化ホ ゥ素ナ ト リ ウム、 水素化ホウ素ナ ト リ ウムと ト リフルォロ酢酸また はピリ ジンとの組合わせ、 ボランーメチルスルフィ ド錯体、 接触還 元の触媒としては例えば白金板、 白金海綿、 白金黒、 コロイ ド白金 、 酸化白金、 白金線等の白金触媒、 例えばパラジウム海綿、 パラジ ゥム黒、 酸化パラジウム、 パラジウム一炭素、 コロイ ドパラジウム 、 パラジウム一硫酸バリ ウム、 パラジウム一炭酸バリ ウム等のパラ ジゥム触媒、 例えば還元ニッケル、 酸化ニッケル、 ラネーニッケル 等のニッケル触媒、 例えば還元コバルト、 ラネーコバルト等のコバ ル卜触媒、 例えば還元鉄、 ラネ一鉄等の鉄触媒、 例えば環元銅、 ラ ネー銅、 ウルマン銅等の銅触媒等のような常用のものが挙げられる 反応は通常、 水、 例えばメタノール、 エタノール等のアルコール 、 ジイ ソプロピルエーテル、 塩化メチレン、 テ 卜ラヒ ドロフラン、 N , N—ジメチルホルムアミ ド、 ジメチルスルホキシドのような溶 媒中またはそれらの混合物中で行われるが、 反応に悪影響を及ぼさ ない溶媒であればその他いかなる溶媒でも反応を行うことができる 。 液状の塩基または酸も溶媒として使用することができる。 The reduction methods applicable to this reaction include chemical reduction and catalytic reduction. The reducing agents used for reduction are as follows. For example, metals such as tin, zinc and iron or metal compounds such as chromium chloride and chromium acetate, and for example, formic acid, acetic acid, brobionic acid, trifluoroacetic acid, P-toluenesulfonic acid, hydrochloric acid, hydrobromic acid, etc. Lithium aluminum hydride, sodium borohydride, sodium borohydride in combination with trifluoracetic acid or pyridine, borane-methyl sulfite Platinum catalysts such as platinum plate, platinum sponge, platinum black, colloidal platinum, platinum oxide, platinum wire, etc., such as palladium sponge, palladium black, palladium oxide, palladium oxide, Palladium catalysts such as colloid palladium, barium palladium monosulfate, barium palladium monocarbonate, such as reduced nickel, Nickel catalysts such as nickel oxide and Raney nickel, for example, cobalt catalysts such as reduced cobalt and Raney cobalt, for example, iron catalysts such as reduced iron and Raney monoiron, for example, copper catalysts such as reduced copper, Raney copper, Ullman copper, etc. Reactions usually include water, for example, alcohols such as methanol and ethanol, diisopropyl ether, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, dimethylsulfoxide, and the like. The reaction is carried out in a solvent or a mixture thereof, but the reaction can be carried out in any other solvent that does not adversely influence the reaction. Liquid bases or acids can also be used as solvents.
反応温度は特に限定されないが、 通常は冷却下ないし加熱下に反 応が行われる この接触還元反応においては水素添加の代わりにギ 酸アンモニゥムを水素発生源としてパラジウム触媒を用いて行うこ ともできる。  The reaction temperature is not particularly limited, but the reaction is usually performed under cooling or heating. In this catalytic reduction reaction, ammonium formate can be used instead of hydrogenation, using a palladium catalyst as a hydrogen generating source.
製造法 1の工程 1〜4によって得られる化合物は、 抽出、 沈殿、 分別結晶、 再結晶、 クロマ トグラフィーといった常法により、 分離 、 または精製される。  The compounds obtained in Steps 1 to 4 of Production Method 1 are separated or purified by conventional methods such as extraction, precipitation, fractional crystallization, recrystallization, and chromatography.
出発物質 ( Π ) の合成法に使用すべき試薬および例えば溶媒、 反 応温度等の反応条件については例えば後記の製造例を参照すればよ い。 Reagents to be used in the synthesis of the starting material (Π) The reaction conditions such as the reaction temperature may be referred to, for example, the production examples described below.
以下、 この発明を製造例および実施例に従って説明する。  Hereinafter, the present invention will be described with reference to Production Examples and Examples.
製造例 1  Production Example 1
( S ) —ァスパラギン酸 ( 1 33. l g ) のメタノール ( 1 00 0 m l ) 懸濁液に N, N—ジメチルホルムアミ ド ( 1. 4 6 g ) を 加え氷冷下攪拌しながら、 塩化チォニル ( 2 6 2 g ) をゆつく り滴 下し約 5 0 で 5時間攪拌した。 さらに、 塩化チォニル ( 60 g ) を加え同温下約 1時間搜拌後、 減圧濃縮し、 (S ) —ァスパラギン 酸ジメチル ·塩酸塩の粗結晶を得た。 メタノールで懸濁洗浄して精 結晶 ( 1 2 1 g ) を得た。  N, N-Dimethylformamide (1.46 g) was added to a suspension of (S) -aspartic acid (133.lg) in methanol (100,000 ml), and thionyl chloride was added while stirring under ice-cooling. (262 g) was dripped slowly and stirred at about 50 for 5 hours. Further, thionyl chloride (60 g) was added, and the mixture was stirred at the same temperature for about 1 hour, and concentrated under reduced pressure to obtain crude crystals of (S) -dimethylaspartate hydrochloride. The suspension was washed with methanol to obtain purified crystals (121 g).
N R(CDC13 ,5 ) : 3.24(lH,dd, J=18,5.4Hz),3.37 (lH.dd, NR (CDC1 3, 5): 3.24 (lH, dd, J = 18,5.4Hz), 3.37 (lH.dd,
J=18, 4.9Hz) ,3.75 (3H, s), 3.85 (3H, s), 4.62 (1H, t, J=5.2Hz), J = 18, 4.9Hz), 3.75 (3H, s), 3.85 (3H, s), 4.62 (1H, t, J = 5.2Hz),
8.83 (3H,br) 8.83 (3H, br)
製造例 2  Production Example 2
CS ) ーァスパラギン酸ジメチル ·塩酸塩 (50 g ) の塩化メチ レン ( 2 00 m l ) 懸濁液と炭酸水素ナ卜 リゥム飽和水溶液 ( 2 0 O m l ) の混合溶液に、 室温で攪拌しながら二炭酸ジ第三級ブチル ( 66. 3 g ) の塩化メチレン溶液を加えさらに一夜攪拌した。 反 応液を瀵縮しジイソプロビルエーテルより再結晶し (S ) — N—第 三級ブトキシカルボ二ルァスパラギン酸ジメチル ( 57 · 0 g ) を 得た。  CS) A mixture of a suspension of dimethylaspartate hydrochloride (50 g) in methylene chloride (200 ml) and a saturated aqueous solution of sodium bicarbonate (200 ml) was stirred at room temperature with stirring at room temperature. A solution of ditertiary butyl (66.3 g) in methylene chloride was added, and the mixture was further stirred overnight. The reaction solution was condensed and recrystallized from diisopropyl ether to obtain dimethyl (S) -N-tert-butoxycarborylaspartate (57.0 g).
NMR(CDC13 , δ ) : 1.45 (9Η, s) , 2.82 (1H, dd, J=17, 4.5Hz), 2.97 (1H, dd, J=17,4.5Hz) ,3.70 (3H, s) ,3. ?6 (3H, s) , 4.50-4.70 (1H, m), 5.40-5.60 (lH, br-d) NMR (CDC1 3, δ): 1.45 (9Η, s), 2.82 (1H, dd, J = 17, 4.5Hz), 2.97 (1H, dd, J = 17,4.5Hz), 3.70 (3H, s), 3.? 6 (3H, s), 4.50-4.70 (1H, m), 5.40-5.60 (lH, br-d)
実施例 1 Example 1
へキサメチルジシラザン (48. 4 g ) のテ トラヒ ドフラン ( 2 6 0 m l ) 溶液に氷冷下損拌しながら 1 . 38M n—プチルリチウ ムのへキサン溶液 ( 1 59 m l ) を滴下し、 一 40 °Cに冷却した。 ( S ) — N—第三級ブトキシカルボ二ルァスパラギン酸ジメチル ( 2 6. 1 g ) のテ ト ラ ヒ ドロフラン ( 1 3 0 m l ) 溶液を一 4 0〜 一 3 0 °Cに保ちながら滴下し、 続いてヨウ化メチル ( 1 7. 0 g ) を滴下した後、 同温下 2時間攪拌した。 反応液にメタノ ール ( 2 6 m l ) を加えた後、 1 N塩酸を 0 eCで滴下し p H 7〜8に調整した 。 濃縮して溶媒を除き塩化メチレンで抽出し、 有機層を飽和食塩水 で洗浄した後、 硫酸マグネシウムで乾燥し濃縮して ( 2 S ) - N - 第三級ブトキシカルボ二ルー 3—メチルァスパラギン酸ジメチルの 卜 レオ : エリ 卜口 ( 1 : 1 ) の混合物 ( 2 8. 0 g ) を得た。 To a solution of hexamethyldisilazane (48.4 g) in tetrahydrofuran (260 ml) was added dropwise a hexane solution (159 ml) of 1.38 M n-butyltyllithium while stirring under ice-cooling. Cooled to 40 ° C. A solution of (S) -N-dimethyl tert-butoxycarbonylaspartate (26.1 g) in tetrahydrofuran (130 ml) was added dropwise while maintaining the temperature at 140 to 130 ° C. Subsequently, methyl iodide (17.0 g) was added dropwise, and the mixture was stirred at the same temperature for 2 hours. After addition of methanol (2 6 ml) to the reaction solution, to adjust the 1 N hydrochloric acid dropwise to p H 7 to 8 at 0 e C. Concentrate, remove the solvent, extract with methylene chloride, wash the organic layer with saturated saline, dry over magnesium sulfate, concentrate and concentrate (2S) -N-tert-butoxycarbonyl 3-methylaspara A mixture (28.0 g) of dimethyl formate in threo: eluate (1: 1) was obtained.
NMR(CDC13 , δ ) : 1.21 (1.5Η, d,
Figure imgf000013_0001
, 1· 25 (1.5Η, d, J = 8.6Ηζ) , 1.43 (4.5H,s), 1.46 (4.5H,s) ,2.82-3.10(0.5H,m) , 3. ίθ- 3.40 (0.5H,ra) , 3.69 (1.5H,s) ,3.71 (1.5H, s) , 3.74 (1.5H,s), 3.76 (1.5H, s) , 4.52 (0.5H,dd, J=9.6, 3.8Hz), 4.58-4.72 (0.5H, m),5.10-5.30(0.5H,br-d), 5.30-5.50 (0.5H,br-d)
NMR (CDC1 3, δ): 1.21 (1.5Η, d,
Figure imgf000013_0001
, 125 (1.5Η, d, J = 8.6Ηζ), 1.43 (4.5H, s), 1.46 (4.5H, s), 2.82-3.10 (0.5H, m), 3.ίθ- 3.40 (0.5H , ra), 3.69 (1.5H, s), 3.71 (1.5H, s), 3.74 (1.5H, s), 3.76 (1.5H, s), 4.52 (0.5H, dd, J = 9.6, 3.8Hz) , 4.58-4.72 (0.5H, m), 5.10-5.30 (0.5H, br-d), 5.30-5.50 (0.5H, br-d)
実施例 2 Example 2
( 2 S ) - N—第三級ブトキシカルボ二ルー 3—メチルァスパラ ギン酸ジメチル ( 2 8. 0 g ) のテ 卜ラヒ ドロフラン ( 2 0 0 mi) 溶液に室温窒素気流下、 攪拌しながら水素化ホウ素ナ ト リ ウム ( 1 5. 3 g ) を懸濁させた。 3 5 °Cに昇温後メタノール ( 5 6. 1 ml ) のテ 卜ラヒ ドロフラ ン ( 1 0 0 ml) 溶液を約 1時間をかけて滴下 し、 3 5〜5 0でで更に 4時間攪拌した後、 反応液を濃縮した。 得 られた残渣に塩化メチレン ( 2 0 0 ml) 続いて 1 0 %塩酸を加え反 応液を酸性にした後、 有機層を分取し、 さらに塩化メチレンで抽出 した。 有機層を水および炭酸水素ナ ト リ ゥム飽和水溶液で洗浄し、 硫酸マグネシウムで乾燥後、 濃縮し、 ( 2 S ) - 2—第三級ブ卜キ シカルボニルアミノ ー 3—メチルー 1, 4一ブタンジオール ( 1 9 - 5 g ) を得た。  Hydrogenation of a solution of (2S) -N-tert-butoxycarbonyl 3-methyl dimethylaspartate (28.0 g) in tetrahydrofuran (200 mi) under a nitrogen stream at room temperature with stirring. Sodium boron (15.3 g) was suspended. 35 After raising the temperature to 55 ° C, a solution of methanol (56.1 ml) in tetrahydrofuran (100 ml) was added dropwise over about 1 hour, and the mixture was stirred at 35-50 for another 4 hours. After that, the reaction solution was concentrated. After adding methylene chloride (200 ml) and then 10% hydrochloric acid to the obtained residue to make the reaction solution acidic, the organic layer was separated and extracted with methylene chloride. The organic layer was washed with water and a saturated aqueous solution of sodium hydrogen carbonate, dried over magnesium sulfate, concentrated, and concentrated to give (2S) -2-tert-butoxycarbonylamino-3-methyl-1,4. One-butanediol (19-5 g) was obtained.
NMRiCDCla , δ ) : 0.83(d,J = 6.9Hz) , 1· 02 (d, J = 6.9Ηζ) ,1·45(9Η, s) , 1.70-2.08 (lH,m) ,3.10-3.90 (7H,m) ,5.04-5.16 (br-d), 48 NMRiCDCla, δ): 0.83 (d, J = 6.9 Hz), 102 (d, J = 6.9Ηζ), 1.45 (9Η, s), 1.70-2.08 (lH, m), 3.10-3.90 (7H , m), 5.04-5.16 (br-d), 48
12 12
5.28-5.40 (br-d) 5.28-5.40 (br-d)
実施例 3  Example 3
( 2 S ) — 2—第三級ブ卜キシカルボニルアミノー 3—メチルー 1, 4一ブタンジオール ( 1 9. 5 g ) の塩化メチレン ( 6 Omi) 溶液を一 2 0でに冷却し、 攪拌しながら 卜 リエチルァミン ( 2 2. 5 g ) を加え、 更に同温下メタンスルホン酸クロ リ ド ( 2 2. 4 g ) の塩化メチレン (40ml) 溶液を滴下した。 約 1時間攪拌した後 、 反応懸濁液を 0でまで昇温し、 あらかじめ 0でに冷却した 1 N塩 酸 ( 50ml) 中に攪拌しながら加えた。 有機層を分取し、 さらに水 層を塩化メチレンで抽出したものを合わせ、 有機層を水および炭酸 水素ナト リゥム飽和水溶液で洗浄し、 硫酸マグネシウムで乾燥後、 溶媒を留去し、 得られたジメタンスルホン酸エステルに攪拌しなが らベンジルァミン (4 7. 7 g) を加え、 30〜3 5^Cで 3日間反 応を行った。 反応懸濁液に水および塩化メチレンを加え有機層を分 取し、 濃縮し、 残渣に水-ァセトニト リル混合溶液を加え、 無職結 晶 (シス : トランス = 3 : l, 50 % d e ) ( 3. 65 g ) を得た 。 n—へブタンから再結晶し無色結晶の ( 3 S, 4 S ) 一 1一ベン ジルー 3—第三級ブ卜キシカルボニルァミノ— 4ーメチルビロリジ ン ( 1. 3 5 g) をジァステレオマー混合物 ( 74 % d e ) として 得た。  A solution of (2S) -2-tert-butoxycarbonylamino-3-methyl-1,4-butanediol (19.5 g) in methylene chloride (6 Omi) was cooled to 120 and stirred. While adding triethylamine (22.5 g), a solution of methanesulfonic acid chloride (22.4 g) in methylene chloride (40 ml) was added dropwise at the same temperature. After stirring for about 1 hour, the reaction suspension was heated to 0 and added to 1N hydrochloric acid (50 ml), which had been cooled to 0 beforehand, with stirring. The organic layer was separated, the aqueous layer extracted with methylene chloride was combined, the organic layer was washed with water and a saturated aqueous solution of sodium hydrogen carbonate, dried over magnesium sulfate, and the solvent was distilled off. Benzylamine (47.7 g) was added to the dimethanesulfonic acid ester with stirring, and the reaction was carried out at 30 to 35 ^ C for 3 days. Water and methylene chloride are added to the reaction suspension, the organic layer is separated, concentrated, and a water-acetonitrile mixed solution is added to the residue to form a non-crystal (cis: trans = 3: l, 50% de) (3 65 g). Recrystallized from n-heptane, colorless crystals of (3S, 4S) -111-benzyl-3-tert-butoxycarbonylamino-4-methylbirolidine (1.35 g) were obtained as a diastereomer mixture (74 % de).
NMR(CDC13 , δ ) : 0.93 (3H,d, J=6.6Hz) ,1-44 (9H, s) ,2.06-2.49 ( NMR (CDC1 3, δ): 0.93 (3H, d, J = 6.6Hz), 1-44 (9H, s), 2.06-2.49 (
3H,m) , 2.57-2.92 (2H,m),3.57 (2H,s) ,4.13(lH,m) ,4.75 (1H, br) ,7.25(5H,s)  3H, m), 2.57-2.92 (2H, m), 3.57 (2H, s), 4.13 (lH, m), 4.75 (1H, br), 7.25 (5H, s)
実施例 4 Example 4
( 3 S , 4 S ) 一 1 一べンジルー 3—第三級ブトキシカルボニル アミノー 4ーメチルビ口 リジン ( 74 % d e ) ( 1 . 0 g ) のメタ ノール ( 1 Otnl) 溶液にギ酸アンモニゥム ( 1 3. 76 g) と水 ( 1 . 0 ml) を加え室温下攪拌し、 さらに同温下 1 0 %パラジウム一 炭素 ( 0. 1 g ) の 1 : 1含水メタノール ( 5. 0 ml) 懸濁液を加 え室温で 2時間、 3 0〜4 CTCでさらに 3時間反応させた。 反応液 を濾過濃縮し、 残渣を塩化メチレン ( 1 . 0ml) に溶解しジイソブ 口ビルエーテル ( 2 0ml) を室温攢拌下加え、 無色結晶の ( 3 S, 4 S ) — 3—第三級ブトキシカルボニルアミノー 4一メチルピロ リ ジンギ酸塩 ( 74 % d e ) を定量的に得た。 (3 S, 4 S) 1-1-benzyl-3-tert-butoxycarbonylamino-4-methylbi-lysine (74% de) (1.0 g) in methanol (1 Otnl) was added to a solution of ammonium formate (13. 76 g) and water (1.0 ml) were added, and the mixture was stirred at room temperature. Further, a suspension of 10% palladium-carbon (0.1 g) in 1: 1 aqueous methanol (5.0 ml) was added at the same temperature. Addition The reaction was carried out at room temperature for 2 hours and at 30 to 4 CTC for another 3 hours. The reaction mixture was concentrated by filtration, the residue was dissolved in methylene chloride (1.0 ml), and diisobutyryl ether (20 ml) was added under stirring at room temperature to give colorless crystals of (3S, 4S) -3-3-tertiary. Butoxycarbonylamino-4-methylpyrrolidinate formate (74% de) was obtained quantitatively.
N R(CDCla , δ ) : 1.07 (3Η, d, J = 6.8Hz) , 1.45 (9H, s) , 2.20-2.70 ( lH,m) ,2.83( IH, t, J = ll.2Hz) , 3.10-3.50 (3H, m) , 4.20-4.50 ( lH,m), 6.20-6.38 (lH,br) ,8.52 (lH,m) h NR (CDCla, δ): 1.07 (3Η, d, J = 6.8Hz), 1.45 (9H, s), 2.20-2.70 (lH, m), 2.83 (IH, t, J = ll.2Hz), 3.10- 3.50 (3H, m), 4.20-4.50 (lH, m), 6.20-6.38 (lH, br), 8.52 (lH, m) h
実施例 5  Example 5
3一第三級ブトキシカルボニルアミノー 4一メチルピロ リジンギ 酸塩 ( 74 % d e ) ( 0. 79 g ) の酢酸ェチル ( 5 0 ml) メ夕ノ ール ( 5. Oral) 混合溶液に室溫下揹拌しながら 3. 9 N塩化水素 酢酸ェチル溶液 ( 1 2. Oml) を加え同温下 2時間反応させ、 さら に 3 5 T)で 2時間反応させた。 析出した粗結晶を濾過乾燥後、 メタ ノールとィソブロ ビルアルコールより再結晶し粗結晶 ( 0. 30 g ) を得る。 この粗結晶 ( 0. 2 0 g ) を再鐽晶し ( 3 S , 4 S ) 一 3—アミノー 4一メチルピロリジン ( 0. 1 0 g ) の精結晶を得た 融点 195-203 °C  3 To a mixed solution of 3-tert-butoxycarbonylamino-4-methylpyrrolidine formate (74% de) (0.79 g) in ethyl acetate (50 ml) and methanol (5. Oral) While stirring, 3.9 N hydrogen chloride / ethyl acetate solution (1 2. Oml) was added, and the mixture was reacted at the same temperature for 2 hours, and further reacted at 35 T) for 2 hours. The precipitated crude crystals are filtered and dried, and then recrystallized from methanol and isopropyl alcohol to obtain crude crystals (0.30 g). The crude crystal (0.20 g) was recrystallized to obtain a purified crystal of (3S, 4S) -1-amino-4-methylpyrrolidine (0.10 g). Melting point: 195-203 ° C
[a 321D =-10.0で (C=0.2,Me0H) (a 3 21 at D = -10.0 (C = 0.2, Me0H)
NMR(DMS0-d6 , δ ) : 1.08 (3Η, d, J=7. OHz) , 2.36-2.66 (IH, m) , 3.12 ( IH, t, J = 10Hz), 3.20-3.44 (2H,m),3.55 (IH, dd, J=14, 8. OHz), 3.76-3.90 (lH,m),8.91(3H,br) NMR (DMS0-d 6 , δ): 1.08 (3Η, d, J = 7.OHz), 2.36-2.66 (IH, m), 3.12 (IH, t, J = 10 Hz), 3.20-3.44 (2H, m ), 3.55 (IH, dd, J = 14, 8. OHz), 3.76-3.90 (lH, m), 8.91 (3H, br)
実施例 6 Example 6
へキサメチルジシラザン ( 1 8, 54 g ) のテトラヒ ドフラン ( 5 5 m l ) 溶液を一 3 0 Cに冷却し攪拌しながら 1 . 6 2 M n—ブ チルリチウムのへキサン溶液 ( 5 2. 3 0 m l ) を滴下した。 ( S ) 一 N—第三級ブトキシカルボ二ルァスパラギン酸ジメチル ( 1 0 . 0 g ) のテ 卜ラヒ ドロフラン ( 1 5 m 1 ) 溶液を一 9〜一 3でに 保ちながら滴下し、 続いてヨウ化メチル ( 6. 52 g ) のテ トラヒ ドロフラン ( 20 m l ) 溶液を滴下した後、 同温下 1時間揹拌した 。 反応液に水酢酸 ( 6. 9 0 g ) を加えた後、 水 ( 2 0 m l ) を 5 〜1 5でで滴下しさらに氷酢酸にて p H 7〜8に調整した。 分液後 、 有機層を澳縮して溶媒を除きさらに酢酸ェチル (50 m l ) にて 溶解後 5 %食塩水 ( 1 0 m l ) および飽和食塩水でで洗浄した後、 瀑縮して ( 2 S ) — N—第三級ブトキシカルボ二ルー 3—メチルァ スパラギン酸ジメチルの卜レオ:エリ トロ ( 1 : 6 ) の 3 ィル状混 合物 ( 1 0. 64 g ) を得た。 A solution of hexamethyldisilazane (18, 54 g) in tetrahydrofuran (55 ml) was cooled to 130 ° C., and stirred while stirring a 1.62 M n-butyllithium hexane solution (52. 30 ml) was added dropwise. A solution of (S) -N-dimethyl tert-butoxycarborylaspartate (10.0 g) in tetrahydrofuran (15 m1) was prepared at 19-13. After dropwise addition, a solution of methyl iodide (6.52 g) in tetrahydrofuran (20 ml) was added dropwise, and the mixture was stirred at the same temperature for 1 hour. After adding water acetic acid (6.90 g) to the reaction solution, water (20 ml) was added dropwise at 5 to 15 and the pH was adjusted to 7 to 8 with glacial acetic acid. After liquid separation, the organic layer was reduced to remove the solvent, dissolved in ethyl acetate (50 ml), washed with 5% saline (10 ml) and saturated saline, and then collapsed (2). S) —N—Tertiary butoxycarbonyl 3-methyl-3-aspartate (10:64 g) in the form of a triethyl: erythro (1: 6) dimethyl trisulfate (10:64 g) was obtained.
N R(CDC13 , δ ) : 1.22 (0.43Η, d, J=8.7Hz) , 1.25 (2.57H, d, NR (CDC1 3, δ): 1.22 (0.43Η, d, J = 8.7Hz), 1.25 (2.57H, d,
J=8.8Hz), 1.44(0.14H,s) ,1.46 (0.86H, s) , 2.80-3.10 (  J = 8.8Hz), 1.44 (0.14H, s), 1.46 (0.86H, s), 2.80-3.10 (
0.14H,ro),3.10-3.40(Q.86H,m), 3.69 (0.43H,s),3.71(  0.14H, ro), 3.10-3.40 (Q.86H, m), 3.69 (0.43H, s), 3.71 (
2.57H,s) , 3.74 (0.43H,s) , 3.76 (2.57H,s),4.52(0.14H, dd, J=9.6,3.8Hz) , 4.58-4.72 (0.86H, in) , 5.10-5.30(0.14H, br-d}, 5.30-5.50 (0.86H,br-d)  2.57H, s), 3.74 (0.43H, s), 3.76 (2.57H, s), 4.52 (0.14H, dd, J = 9.6, 3.8Hz), 4.58-4.72 (0.86H, in), 5.10-5.30 (0.14H, br-d), 5.30-5.50 (0.86H, br-d)
実施例 7 Example 7
実施例 3の化合物をイソプロビルアルコール一水 ( 1 : 1 ) で再 結晶して、 光学純度の向上した ( 92 % d e ) 同化合物を収率 8 1 • 2 %で得た。  The compound of Example 3 was recrystallized from isopropyl alcohol monohydrate (1: 1) to obtain the same compound with improved optical purity (92% de) in a yield of 81 • 2%.
実施例 8 Example 8
実施例 4の化合物をァセ 卜ニト リルで 3回再結晶して、 光学純度 の向上した (9 9. 3 % d e ) 同化合物を収率 46. 8 %で得た。  The compound of Example 4 was recrystallized three times from acetonitrile to give the compound having improved optical purity (99.3% de) in a yield of 46.8%.

Claims

請 求 の 範 囲  The scope of the claims
( a ) 式 :  (a) Expression:
Figure imgf000017_0001
Figure imgf000017_0001
(式中、 R 2 a はァミノ保護基、 R 4 および R 5 はそれぞれカルボ キシ保護基を意味する) で示される化合物に、 式 : (Wherein, R 2 a is Amino protecting group, R 4 and R 5 each means a carboxy protecting group) in the compound represented by the formula:
R 1 - X R 1 -X
(式中、 R 1 は低級アルキル基、 Xは脱離基を意味する) で示され る化合物を反応させて、 (Wherein, R 1 represents a lower alkyl group, and X represents a leaving group).
式 :  Expression:
Figure imgf000017_0002
Figure imgf000017_0002
(式中、 R 1 、 R 2 a 、 R 4 および R s はそれぞれ前と同じ意味) で 示される化合物を生成させ、 (Wherein, R 1, R 2 a, R 4 and R s are each as defined) to produce the indicated compounds,
( b ) 次いで、 その生成する化合物を還元反応に付し'て、 式:  (b) Then, the resulting compound is subjected to a reduction reaction to obtain a compound represented by the formula:
Rf-HN R, Rf-HN R,
H 0 0 H H 0 0 H
(式中、 R 1 および R 2。はそれぞれ前と同じ意味) で示される化合 (Wherein, R 1 and R 2 each have the same meaning as before)
新たな用紙 物を生成させ、 New paper Generate things,
( C ) 次いで、 その生成する化合物またはヒ ドロキシ基における その反応性誘導体に、 式 :  (C) Then the resulting compound or its reactive derivative at the hydroxy group has the formula:
H z N - R 3 a H z N-R 3 a
(式中、 R はァミノ保護基を意味する) で示される化合物または その塩を反応させて、 式:  (Wherein R represents an amino protecting group) or a salt thereof, and reacted with a compound represented by the formula:
Figure imgf000018_0001
Figure imgf000018_0001
(式中、 R 1 , R 2 aおよび R3 aはそれぞれ前と同じ意味) で示され る化合物またはその塩を生成させ、 (Wherein, R 1, R 2 a and R 3 a are each the same meaning as before) compound Ru indicated by or to produce a salt thereof,
(d)次いで所望により、 環および Zまたは側鎖のァミノ保護基 の脱難反応に付すことを特徴とする、 式:  (d) then, if desired, subjecting the ring and Z or a side chain amino-protecting group to elimination reaction.
Figure imgf000018_0002
Figure imgf000018_0002
(式中、 R 1 は前と同じ意味、 R 2 t, および R 3 bはそれぞれ水素原 子またはァミノ保護基を意味するが、 同時にァミノ保護'基ではない ) で示されるピロ リ ジン化合物またはその塩の製造法。 (In the formula, R 1 has the same meaning as before, R 2 t, and R 3 b denotes each hydrogen atom or an Amino protecting group, but at the same time Amino protective 'not a group) pyro lysine compound represented by or How to make that salt.
^たな用紙 ^ Sheet paper
PCT/JP1992/000648 1991-05-21 1992-05-20 Process for producing pyrrolidine compound or salt thereof WO1992020652A1 (en)

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PCT/JP1992/000648 WO1992020652A1 (en) 1991-05-21 1992-05-20 Process for producing pyrrolidine compound or salt thereof

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JP (1) JPH04346971A (en)
WO (1) WO1992020652A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6641994B2 (en) 1999-08-25 2003-11-04 Pharmacia & Upjohn Company Methods of identifying anti-viral agents
WO2004013097A1 (en) * 2002-08-01 2004-02-12 Basilea Pharmaceutica Ag Process for the preparation of amino-pyrrolidine derivatives

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6287565A (en) * 1985-10-11 1987-04-22 Tokyo Kasei Kogyo Kk Production of 3-aminopyrrolidine and salt thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6287565A (en) * 1985-10-11 1987-04-22 Tokyo Kasei Kogyo Kk Production of 3-aminopyrrolidine and salt thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6641994B2 (en) 1999-08-25 2003-11-04 Pharmacia & Upjohn Company Methods of identifying anti-viral agents
WO2004013097A1 (en) * 2002-08-01 2004-02-12 Basilea Pharmaceutica Ag Process for the preparation of amino-pyrrolidine derivatives
US7064199B2 (en) 2002-08-01 2006-06-20 Basilea Pharmaceutica Ag Process for the manufacture of 3-amino-pyrrolidine derivatives
CN1297539C (en) * 2002-08-01 2007-01-31 巴斯利尔药物股份公司 Process for the manufacture of amino-pyrrolidine derivatives
KR100919145B1 (en) * 2002-08-01 2009-09-28 바실리어 파마슈티카 아게 Process for the preparation of amino-pyrrolidine derivatives

Also Published As

Publication number Publication date
JPH04346971A (en) 1992-12-02

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