WO1992009543A1 - Procede de preparation de particules creuses en ceramique - Google Patents
Procede de preparation de particules creuses en ceramique Download PDFInfo
- Publication number
- WO1992009543A1 WO1992009543A1 PCT/US1991/008979 US9108979W WO9209543A1 WO 1992009543 A1 WO1992009543 A1 WO 1992009543A1 US 9108979 W US9108979 W US 9108979W WO 9209543 A1 WO9209543 A1 WO 9209543A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- metal oxide
- solution
- particles
- silicon
- forming
- Prior art date
Links
- 239000002245 particle Substances 0.000 title claims abstract description 48
- 238000000034 method Methods 0.000 title claims abstract description 43
- 239000000919 ceramic Substances 0.000 title claims abstract description 20
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 21
- 239000010703 silicon Substances 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 18
- 239000012702 metal oxide precursor Substances 0.000 claims abstract description 11
- 230000002378 acidificating effect Effects 0.000 claims abstract description 9
- 238000005245 sintering Methods 0.000 claims abstract description 9
- 239000012456 homogeneous solution Substances 0.000 claims abstract description 6
- 239000008240 homogeneous mixture Substances 0.000 claims abstract description 5
- 238000001694 spray drying Methods 0.000 claims abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 55
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical group O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 27
- 150000004706 metal oxides Chemical class 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 21
- 239000000377 silicon dioxide Substances 0.000 claims description 19
- 239000008119 colloidal silica Substances 0.000 claims description 14
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims description 14
- 229910052845 zircon Inorganic materials 0.000 claims description 13
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 claims description 7
- 229910052863 mullite Inorganic materials 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 150000002739 metals Chemical class 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 27
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 25
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 14
- 229910052593 corundum Inorganic materials 0.000 description 14
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 14
- 229910001845 yogo sapphire Inorganic materials 0.000 description 14
- 239000007788 liquid Substances 0.000 description 11
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 229910052681 coesite Inorganic materials 0.000 description 9
- 229910052906 cristobalite Inorganic materials 0.000 description 9
- 229910052682 stishovite Inorganic materials 0.000 description 9
- 229910052905 tridymite Inorganic materials 0.000 description 9
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 8
- 239000004005 microsphere Substances 0.000 description 8
- 239000002243 precursor Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- -1 silicon alkoxides Chemical class 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- GOLCXWYRSKYTSP-UHFFFAOYSA-N Arsenious Acid Chemical compound O1[As]2O[As]1O2 GOLCXWYRSKYTSP-UHFFFAOYSA-N 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 4
- DUFCMRCMPHIFTR-UHFFFAOYSA-N 5-(dimethylsulfamoyl)-2-methylfuran-3-carboxylic acid Chemical compound CN(C)S(=O)(=O)C1=CC(C(O)=O)=C(C)O1 DUFCMRCMPHIFTR-UHFFFAOYSA-N 0.000 description 3
- 229910004369 ThO2 Inorganic materials 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- ZCUFMDLYAMJYST-UHFFFAOYSA-N thorium dioxide Chemical compound O=[Th]=O ZCUFMDLYAMJYST-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- LWBPNIJBHRISSS-UHFFFAOYSA-L beryllium dichloride Chemical compound Cl[Be]Cl LWBPNIJBHRISSS-UHFFFAOYSA-L 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000003094 microcapsule Substances 0.000 description 2
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 2
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- DHEQXMRUPNDRPG-UHFFFAOYSA-N strontium nitrate Chemical compound [Sr+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O DHEQXMRUPNDRPG-UHFFFAOYSA-N 0.000 description 2
- 238000009210 therapy by ultrasound Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- RYSXWUYLAWPLES-MTOQALJVSA-N (Z)-4-hydroxypent-3-en-2-one titanium Chemical compound [Ti].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O RYSXWUYLAWPLES-MTOQALJVSA-N 0.000 description 1
- KEDNSMBVYXSBFC-UHFFFAOYSA-N 6-bromo-2-chloroquinoline-4-carbonyl chloride Chemical compound C1=C(Br)C=C2C(C(=O)Cl)=CC(Cl)=NC2=C1 KEDNSMBVYXSBFC-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical class [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 235000015842 Hesperis Nutrition 0.000 description 1
- 235000012633 Iberis amara Nutrition 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 235000019483 Peanut oil Nutrition 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910021550 Vanadium Chloride Inorganic materials 0.000 description 1
- 229910008334 ZrO(NO3)2 Inorganic materials 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 125000005595 acetylacetonate group Chemical group 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 1
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 229910001627 beryllium chloride Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- MKJXYGKVIBWPFZ-UHFFFAOYSA-L calcium lactate Chemical compound [Ca+2].CC(O)C([O-])=O.CC(O)C([O-])=O MKJXYGKVIBWPFZ-UHFFFAOYSA-L 0.000 description 1
- 239000001527 calcium lactate Substances 0.000 description 1
- 235000011086 calcium lactate Nutrition 0.000 description 1
- 229960002401 calcium lactate Drugs 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- FLVFLHZPYDNHJE-UHFFFAOYSA-N chloro hypochlorite;hafnium Chemical compound [Hf].ClOCl FLVFLHZPYDNHJE-UHFFFAOYSA-N 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- 150000001860 citric acid derivatives Chemical class 0.000 description 1
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 1
- 229910001981 cobalt nitrate Inorganic materials 0.000 description 1
- 238000001246 colloidal dispersion Methods 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- 238000002447 crystallographic data Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- RXPAJWPEYBDXOG-UHFFFAOYSA-N hydron;methyl 4-methoxypyridine-2-carboxylate;chloride Chemical compound Cl.COC(=O)C1=CC(OC)=CC=N1 RXPAJWPEYBDXOG-UHFFFAOYSA-N 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(III) nitrate Inorganic materials [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 description 1
- 150000003893 lactate salts Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- UEGPKNKPLBYCNK-UHFFFAOYSA-L magnesium acetate Chemical compound [Mg+2].CC([O-])=O.CC([O-])=O UEGPKNKPLBYCNK-UHFFFAOYSA-L 0.000 description 1
- 239000011654 magnesium acetate Substances 0.000 description 1
- 235000011285 magnesium acetate Nutrition 0.000 description 1
- 229940069446 magnesium acetate Drugs 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000320 mechanical mixture Substances 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- ATINCSYRHURBSP-UHFFFAOYSA-K neodymium(iii) chloride Chemical compound Cl[Nd](Cl)Cl ATINCSYRHURBSP-UHFFFAOYSA-K 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 239000000312 peanut oil Substances 0.000 description 1
- RPESBQCJGHJMTK-UHFFFAOYSA-I pentachlorovanadium Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[V+5] RPESBQCJGHJMTK-UHFFFAOYSA-I 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229940039790 sodium oxalate Drugs 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 229940026236 strontium nitrate Drugs 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- VGBPIHVLVSGJGR-UHFFFAOYSA-N thorium(4+);tetranitrate Chemical compound [Th+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VGBPIHVLVSGJGR-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- FHVAUDREWWXPRW-UHFFFAOYSA-N triethoxy(pentyl)silane Chemical compound CCCCC[Si](OCC)(OCC)OCC FHVAUDREWWXPRW-UHFFFAOYSA-N 0.000 description 1
- RMUKCGUDVKEQPL-UHFFFAOYSA-K triiodoindigane Chemical compound I[In](I)I RMUKCGUDVKEQPL-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- KUKDDTFBSTXDTC-UHFFFAOYSA-N uranium;hexanitrate Chemical compound [U].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O KUKDDTFBSTXDTC-UHFFFAOYSA-N 0.000 description 1
- 229910002007 uranyl nitrate Inorganic materials 0.000 description 1
- 229940105965 yttrium bromide Drugs 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- JINJMFAIGCWUDW-UHFFFAOYSA-L zirconium(2+);diacetate Chemical compound [Zr+2].CC([O-])=O.CC([O-])=O JINJMFAIGCWUDW-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B38/00—Porous mortars, concrete, artificial stone or ceramic ware; Preparation thereof
- C04B38/009—Porous or hollow ceramic granular materials, e.g. microballoons
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/34—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of sprayed or atomised solutions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/20—Silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/20—Silicates
- C01B33/26—Aluminium-containing silicates, i.e. silico-aluminates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/30—Particle morphology extending in three dimensions
- C01P2004/32—Spheres
- C01P2004/34—Spheres hollow
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/32—Thermal properties
Definitions
- the present invention is concerned with the manufacture of particles in the ceramic field utilizing sol-gel technology.
- U.S. Patent No. 3,709,706 describes refractory aggregates and shaped articles such as fibers, films, flakes and microspheres of zirconia and silica mixtures. Fibers were spun from an aqueous colloidal dispersion of silica and aqueous solution of zirconium diacetate.
- U.S. Patent No. 4,349,456 describes shaped and fired porous or impermeable non-vitreous ceramic microcapsules of metal oxide made by a non-melt process comprising the liquid extraction of aqueous metal oxide precursor with a dehydrating liquid having a limited water solubility and drying and firing the resulting gelled microcapsules.
- U.S. Patent No. 4,931,414 describes solid transparent non-vitreous microspheres (zirconia-silica) are formed by a extractive gelation (extracting carboxylic acid away from zirconyl carboxylate) of a sol in liquid medium such as hot peanut oil.
- the invention is concerned with the process of preparing ceramic hollow discrete particles comprising the steps:
- FIGURE 1 is a schematic diagram of the overall process of the present invention to produce the spherical particles;
- FIGURE 2 shows zircon hollow spheres at 1000 magnification;
- FIGURE 3 is an X-ray diffraction pattern of zircon hollow particles calcined at 1100°C.
- the present invention is concerned with obtaining hollow discrete particles of ceramic materials.
- One of the initial steps is to prepare a silicon containing aqueous material.
- the silicon that may be employed can generally be characterized as silicon oxides or alkoxides.
- the silicon oxides can be silicon dioxide or polymers thereof.
- the silicon alkoxides can be those comprised of the silicon containing materials further comprising hydrocarbyl containing lower alkyl radicals from 1 to 6 carbon atoms, preferably ethyl.
- Illustrative materials are tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, ethyltriethoxysilane and amyltriethoxysilane, and the like.
- the silicon material be colloidal silica which has an acidic ph, preferably a ph of 3-5.
- the colloidal silica is preferably in an aqueous state with a particle size less than 50 nanometers, preferably 0.5-25 nanometers.
- the ph is adjusted from the normal ph of colloidal silica which is basic, usually about 8 to 10 by the use of acidic materials. Any acidic material that does not interfere with subsequent processing steps may be employed whether it be organic or inorganic, although preferably organic acids of less than 6 carbon atoms and even more preferably acetic acid is employed.
- the metal oxide precursor solution is added to the aqueous colloidal silica solution.
- the metal oxide can be placed into an aqueous solution and then the two solutions blended to give a homogeneous solution.
- the metal oxide can be a dispersion or solution of one or more ceramic metal oxides which include zirconium oxide, TiO 2 , Cr 2 O 3 , WO 3 , ThO 2 , Fe 2 O 3 , MgO, Y 2 O 3 , ZrO 2 , HfO 2 , V 2 O 5 , Nb 2 O 5 , UO 2 , BeO, CoO, NiO, CuO, ZnO, ln 2 O 3 , Sb 2 O 3 , A1 2 O 3 , Sn ⁇ 2 , and mixtures thereof such as ZnO ⁇ TiO 2 , TiO 2 ⁇ Fe 2 O 3 , SnO 2 ⁇ TiO 2 , Nd 2 O 3 -TiO 2 , A1 2 O 3 ⁇ C
- dispersion or sols of said ceramic metal oxides in combination or admixture with dispersions or sols of one or more metal oxides which are unstable in normal air environment (such as Li 2 O, Na 2 O, K 2 O, CaO, SrO, and BaO) and/or ceramic nonmetal oxides having an atomic number of 14 or greater (such as SiO 2 , As 2 O 3 , and P 2 O 5 ) , representative combinations including A1 2 O 3 ⁇ Li 2 O, TiO 2 --K 2 O, ZrO 2 ⁇ CaO, ZrO 2 ⁇ Al 2 O 3 ⁇ CaO, ZrO 2 ⁇ SrO, TiO 2 ⁇ BaO, TiO 2 ⁇ ZrO 2 ⁇ BaO, Al 2 O 3 ⁇ Na 2 O, MgO ⁇ SiO 2 , Fe 2 O 3 ⁇ BaO, ZrO 2 - -Si
- the metal oxide is selected from Periodic Table Group II or Group III metals.
- a number of the above-described oxides useful in this invention are commercially available in the form of aqueous sols or dry powders which can be readily dispersed in water to form sols, such as Al 2 O 3 , Cr 2 O 3 and Fe 2 O 3 sols sold under the trademark "Nalco”, silica sols sold under the trademarks “Nalco,” “Ludox,” “Syton” and “Nyacol,” and Al 2 O 3 colloidal powder sold under the trademark "Dispal.”
- the precursor material in the form of dispersion or sols of said oxides
- the precursor material in the form of water soluble or dispersible inorganic or organic compounds which are calcinable to the corresponding oxide.
- These compounds representatively include many carboxylates and alcoholates, e.g. acetates, formates, oxalates, lactates, propylates, citrates, and acetylacetonates, and salts of mineral acids, e.g., bromides, chlorides, chlorates, nitrates, sulfates, and phosphates, selection of the particular precursor compound being dictated by availability and ease of handling.
- Representative precursor compounds useful in this invention include ferric chloride or nitrate, chromium chloride, cobalt nitrate, nickel chloride, copper nitrate, zinc chloride or carbonate, lithium propylate, sodium carbonate or oxalate, potassium chloride, beryllium chloride, magnesium acetate, calcium lactate, strontium nitrate, barius acetate, yttrium bromide, zirconium acetate, hafnium oxychloride, vanadium chloride, ammonium tungstate, aluminum chloride, indium iodide, titanium acetylacetonate, stannic sulfate, lead formate, antimony chloride, bismuth nitrate, neodymium chloride, phosphoric acid, cerium nitrate, uranium nitrate, and thorium nitrate.
- the colloidal silica be a very fine particle size.
- the silica concentration should be less than 50% and preferably approximately 10-30%, and even more preferably, about 20% by weight.
- the purpose in adding the acidic material is to produce a negative electrostatic charge on the silica particles.
- Colloidal silica particles exhibit a significant negative electrostatic charge in the ph range of from 3 to 5 and a value within this range is selected for matching with the ph of the aqueous metal oxide solution.
- the ph adjusted colloidal silica solution are added to the slurry containing the metal oxide precursor solution and the mixture is stirred, preferably in the presence of ultrasonic treatment to facilitate the reaction.
- the colloidal silica particles with a negative electrostatic charge are attracted to the positively charged metal ion (for example the zeta potential for zirconia at a ph of 3-5 is approximately 58-64 millivolts).
- the ratio of silicon material to metal oxide is from 0.5 to 1.1 (silicon calculated as silicon dioxide) to 1 (metal oxide calculated as metal dioxide) mole ratio. Most preferably, the mole ratio is 1:1.
- a mullite composition i.e., a metal oxide system that corresponds to three moles of Al 2 O 3 to two moles of SiO 2 .
- the processing parameters are at ambient temperature and pressure and that the number of kilohertz ranges from
- 0.1 to 1 kilohertz preferably less than 0.1 kilohertz, e.g. 0.05 to 0.07 kilohertz.
- the concentration ranges from 10 to 60 wt%.
- the viscosity of the solution ranges from 1 to 40 Centipoise (CPS).
- the particles are subjected to a sintering or calcining treatment to obtain the desired ceramic particles.
- the sintering temperature is at least 250° to 1500°, and even more preferably, about 900° to 1200oCentigrade.
- FIG. 1 shows the schematic diagram of the apparatus useful in the present invention.
- a tank 10 is a reservoir of the aqueous liquid 12.
- the tank is open to the atmosphere at the top as indicated by arrows 14.
- the tank is operated at ambient pressure.
- a second tank 16 is one that likewise contains liquid 12 which passes from the tank 10 to the tank 16 by pipe 17.
- the cavity 20 is one that is exposed to atmospheric pressure, for it is the cavity above the reservoir in the tank 10.
- a similar cavity 22 is atop the reservoir 12 above the level 24 of the fluid in the reservoir 16.
- the lower tank 16 likewise is open to the atmosphere as is indicated by arrow 26.
- Line 18 maintains equal pressure in tanks 10 and 16.
- the liquid transfer tube 28 is attached to nozzle means generally shown as reference numeral 30.
- the inlet 32 for the liquid is placed adjacent to the air inlet 34 which is connected to an air pump generally expressed as 36.
- the nozzle 30 is generally available from Spraying Systems, Inc. of Wheaton, Illinois, and is utilized in this invention as follows. When air from pump 36 passes through conduit 34 and air outlet 38, the liquid composition from reservoirs 12 and 24 pass through conduit 32 and is atomized into heated chamber 40. The spray nozzle 30 is locked in position by lock nut 42 onto an appropriately configured vessel 44. The top portion 46 of the nozzle is appropriately configured to lock in place at position 48 which is at the bottom of container 40.
- the spray 50 from the air pump is schematically shown in Figure 1.
- an atomized spray occurs whereby particulates are formed and subsequently become hollow spheres as the aqueous portion of the mixture is volatilized off in the heated chamber 40.
- the particles are subsequently collected at a trough at the bottom (not shown) and the volatilized portion of the aqueous material is disposed of (apparatus not shown).
- the reservoir level 24 drops.
- the liquid 12 flows through pipe 17 into container 16 thereby increasing the level 24 to the point that it is just at the exit 52 of conduit 18.
- the orifice 38 is preferably 0.016 inches in diameter and the orifice 33 of conduit 32, ranges from 0.05 inches for the inner diameter to 0.064 inches for the outer diameter or .007 inches.
- the air is fed through conduit 34 at a range of 5 to 100 pounds per square inch gauge (psig), and even more preferably, 10 to 70 psig, most preferably, 15 to 30 psig.
- Two of the interior walls of heat chamber 40 have four 500 watt strip heaters attached to black painted aluminum plates attached to the interior of the walls of the reservoir 40.
- the heating of the chamber preferably exceeds 250oF, and even more preferably, 400° - 1000oF.
- the non-spraying temperature would drop a minimum of 100oF during spraying.
- the microspheres or particles that are produced preferably have a size less than 75 microns with a lower limit of approximately 1 micron.
- the size range is preferably 10 to 60 microns, and even more preferably, 15 to 50 microns.
- particles that are not hollow may be produced, although that is not the preferred product. This may be accomplished by modifying the processing conditions such as a lower drying temperature and a higher viscosity homogeneous solution that is spray-dried.
- an alternative particle collection device can be anything commercially available such as a cyclone collection system with a separate system for separating and collating the particulates depending upon the sizes desired for particles.
- the microspheres preferably will have a surface area greater than 75 square meters (m 2 ) per gram, preferably 150 square meters per gram and upwards of 250 square meters per gram.
- Example 1 Colloidal silica (LudoxTM, trademark of E.I.
- DuPont Company having an average particle diameter 7 nanometers with a ph of 9.9 is diluted with water to make a 21% by weight percent silica in the mixture.
- the ph of the solution is adjusted to a ph in range of 3 to 5 by the addition of acetic acid.
- a second slurry was prepared of zirconium acetate (21% by weight) which is stirred.
- the ph adjusted colloidal silica solution is then added to the slurry containing zirconium acetate and stirred in the presence of ultrasonic equipment operating at 60 - hertz.
- the SiO 2 :ZrO 2 is a 1:1 mole ratio.
- the viscosity of the mixture was 4-5 CPS.
- the mixture was then placed in a piece of equipment comparable to that shown in Figure 1. Air was pumped through nozzle 34 with the aqueous liquid being sucked through conduit 32 and likewise through conduit 28 from reservoir 12 and vessels 16 and 18.
- the temperature of the vessel 40 was initially 400°F and during spraying decreased to approximately 275° to 300oF.
- the particles were collected at the bottom and were subjected to sintering or drying. The particles were dried for 2 hours at 250° then at 650° for 2-4 hours until the powder is colorless and then for 2 hours at 1100"Centigrade.
- the X-ray diffractogram of the sample calcined to 1100°C is shown in Figure 3.
- the sample produced was tested at 500 ⁇ F using the guarded hot plate method where the density was 75 pounds per cubic foot having a thermal conductivity of 1.86 (btu-inches per hour - per square foot per degree Fahrenheit). Comparable experiments were conducted according to ASTM-C 177 for different temperatures ranging from 600°F to 1400°F.
- the zircon samples were prepared by pouring the zircon material into Ceraboard (trademark of Manville Sales Corporation) rings with a glass cloth top and bottom. After the samples were tested, physical cracks with depths of 0.25+ inches were observed. The results are tabulated below.
- Colloidal silica having an average particle diameter of 12 nanometers with a ph of 8.9 is diluted with water to solution that is 21% by weight percent silica. After dilution and stirring of the mixture, the ph of the solution is adjusted to a ph in range of 3 to 5.
- a second slurry was prepared of zirconium oxychloride (Magnesium Elektron Co.), 21% by weight, which is stirred.
- the ph adjusted colloidal silica solution is then added to the slurry containing zirconium oxychloride and stirred with a mechanical mixture.
- the Si0 2 :Zr0 2 is a 1:1 mole ratio.
- the viscosity of the mixture was 3-5 CPS.
- the mixture was spray-dried and calcined the precursor hollow microspheres as described in Example 1.
- Hollow microspheres were prepared in the same manner as in Example 1 except that zirconyl oxynitrate [ZrO(NO 3 ) 2 ] is used.
- Example 4 Hollow microspheres were prepared in the same manner as in Example 1 except that 2% w/w of B 2 O 3 by the weight of zircon was added as boric acid to the precursor solution. In a separate beaker, take LudoxTM 18Og and to that add 180g (equal amount) of water. Then add 4-5g of acetic acid. Add this ph adjusted LudoxTM to a solution of 558. Ig aluminum oxychloride (50% by wt) in 500 ml ethanol. Mix thoroughly.
- the solution was combined up to make approximately 5 gallons of precursor solution.
- the spray-dried material was sintered at 250°C for 1 hour; 650°c for l hour and finally at 1000°C for 48 hours.
- the oven was cooled to room temperature.
- the products were tested by spectroscopic and X-ray diffraction tests for composition were determined to be mullite particles.
- Hollow mullite particles were prepared in the same manner as in Example 5 except that % w/w of B 2 O 3 by the weight of mullite was added as boric acid to the precursor solution.
- compositions herein can be used for insulation purposes and refractory purposes such a insulation of heated products or appliances, other end uses are thermal shields in space exploration equipment, missiles, rockets and in commercial and military aircraft for heat and/or fire protection in voice record box, engine parts, fuselage, and the like.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
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- Silicates, Zeolites, And Molecular Sieves (AREA)
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Abstract
Procédé de préparation de particules discrètes creuses en céramique consistant à procéder aux étapes suivantes: former une solution d'une matière contenant du silicium à un pH acide, former une solution précurseur aqueuse d'oxyde de céramique et de métal, former un mélange homogène de la solution de silicium et de la solution précurseur d'oxyde de céramique et de métal, sécher par pulvérisation la solution homogène par pulvérisation de ladite solution dans une chambre chauffée dans laquelle règne une pression au moins ambiante afin de former des particules, fritter lesdites particules et récupérer des particules d'oxyde de métal au silicium.
Applications Claiming Priority (2)
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US62131390A | 1990-12-03 | 1990-12-03 | |
US621,313 | 1990-12-03 |
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WO1992009543A1 true WO1992009543A1 (fr) | 1992-06-11 |
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PCT/US1991/008979 WO1992009543A1 (fr) | 1990-12-03 | 1991-12-02 | Procede de preparation de particules creuses en ceramique |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0601594A1 (fr) * | 1992-12-11 | 1994-06-15 | Asahi Glass Company Ltd. | Procédé pour la production de microballons cristallins |
ES2074399A1 (es) * | 1993-05-13 | 1995-09-01 | Consejo Superior Investigacion | Procedimiento de obtencion de pigmentos ceramicos de silicato de circonio. |
WO2002038338A3 (fr) * | 2000-11-10 | 2002-07-11 | 3M Innovative Properties Co | Particules abrasives composites et procede de fabrication |
US6881483B2 (en) | 2000-10-06 | 2005-04-19 | 3M Innovative Properties Company | Ceramic aggregate particles |
US6913824B2 (en) | 2000-10-16 | 2005-07-05 | 3M Innovative Properties Company | Method of making an agglomerate particle |
JP2015218071A (ja) * | 2014-05-14 | 2015-12-07 | 太平洋セメント株式会社 | 微小ムライト中空粒子 |
JP2015229622A (ja) * | 2014-06-06 | 2015-12-21 | 太平洋セメント株式会社 | 中空粒子の製造装置 |
JP2016017027A (ja) * | 2014-07-11 | 2016-02-01 | 太平洋セメント株式会社 | 中空粒子の製造方法 |
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0601594A1 (fr) * | 1992-12-11 | 1994-06-15 | Asahi Glass Company Ltd. | Procédé pour la production de microballons cristallins |
ES2074399A1 (es) * | 1993-05-13 | 1995-09-01 | Consejo Superior Investigacion | Procedimiento de obtencion de pigmentos ceramicos de silicato de circonio. |
US6881483B2 (en) | 2000-10-06 | 2005-04-19 | 3M Innovative Properties Company | Ceramic aggregate particles |
US6913824B2 (en) | 2000-10-16 | 2005-07-05 | 3M Innovative Properties Company | Method of making an agglomerate particle |
WO2002038338A3 (fr) * | 2000-11-10 | 2002-07-11 | 3M Innovative Properties Co | Particules abrasives composites et procede de fabrication |
US6645624B2 (en) | 2000-11-10 | 2003-11-11 | 3M Innovative Properties Company | Composite abrasive particles and method of manufacture |
JP2008274293A (ja) * | 2000-11-10 | 2008-11-13 | Three M Innovative Properties Co | 複合研磨剤粒子および製造方法 |
JP2015218071A (ja) * | 2014-05-14 | 2015-12-07 | 太平洋セメント株式会社 | 微小ムライト中空粒子 |
JP2015229622A (ja) * | 2014-06-06 | 2015-12-21 | 太平洋セメント株式会社 | 中空粒子の製造装置 |
JP2016017027A (ja) * | 2014-07-11 | 2016-02-01 | 太平洋セメント株式会社 | 中空粒子の製造方法 |
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