WO1991003420A1 - Borides and boride precursors deposited from solution - Google Patents
Borides and boride precursors deposited from solution Download PDFInfo
- Publication number
- WO1991003420A1 WO1991003420A1 PCT/US1989/003883 US8903883W WO9103420A1 WO 1991003420 A1 WO1991003420 A1 WO 1991003420A1 US 8903883 W US8903883 W US 8903883W WO 9103420 A1 WO9103420 A1 WO 9103420A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- zirconium
- complex
- hafnium
- metal boride
- solution
- Prior art date
Links
- 239000002243 precursor Substances 0.000 title claims abstract description 28
- 229910052751 metal Inorganic materials 0.000 claims abstract description 36
- 239000002184 metal Substances 0.000 claims abstract description 36
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 17
- 238000010438 heat treatment Methods 0.000 claims abstract description 11
- 239000007787 solid Substances 0.000 claims description 32
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical group C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 claims description 24
- 239000002879 Lewis base Substances 0.000 claims description 19
- 150000007527 lewis bases Chemical group 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 17
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 229910052735 hafnium Chemical group 0.000 claims description 13
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical group [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 11
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 8
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 5
- 239000002244 precipitate Substances 0.000 claims description 5
- 238000001149 thermolysis Methods 0.000 claims description 5
- -1 alkyl phosphine Chemical compound 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- 239000004215 Carbon black (E152) Substances 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 150000002430 hydrocarbons Chemical class 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 230000008021 deposition Effects 0.000 abstract description 7
- LRTTZMZPZHBOPO-UHFFFAOYSA-N [B].[B].[Hf] Chemical compound [B].[B].[Hf] LRTTZMZPZHBOPO-UHFFFAOYSA-N 0.000 abstract description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 60
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- 238000002411 thermogravimetry Methods 0.000 description 12
- 229910008117 Zr(BH4)4 Inorganic materials 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000000151 deposition Methods 0.000 description 6
- 238000000921 elemental analysis Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 5
- 229910000085 borane Inorganic materials 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 208000016261 weight loss Diseases 0.000 description 5
- 230000004580 weight loss Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 241000894007 species Species 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 238000005979 thermal decomposition reaction Methods 0.000 description 4
- 238000012565 NMR experiment Methods 0.000 description 3
- 229910007948 ZrB2 Inorganic materials 0.000 description 3
- VWZIXVXBCBBRGP-UHFFFAOYSA-N boron;zirconium Chemical compound B#[Zr]#B VWZIXVXBCBBRGP-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 150000003003 phosphines Chemical class 0.000 description 3
- 238000004679 31P NMR spectroscopy Methods 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RHXMBUGJMREJIM-UHFFFAOYSA-N B.[Zr] Chemical compound B.[Zr] RHXMBUGJMREJIM-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000001182 laser chemical vapour deposition Methods 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 208000020442 loss of weight Diseases 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- BWHDROKFUHTORW-UHFFFAOYSA-N tritert-butylphosphane Chemical compound CC(C)(C)P(C(C)(C)C)C(C)(C)C BWHDROKFUHTORW-UHFFFAOYSA-N 0.000 description 2
- 238000010792 warming Methods 0.000 description 2
- OWJZRKILDKBNMJ-UHFFFAOYSA-N 1-bis(4-methylphenyl)phosphanylethyl-bis(4-methylphenyl)phosphane Chemical compound C=1C=C(C)C=CC=1P(C=1C=CC(C)=CC=1)C(C)P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 OWJZRKILDKBNMJ-UHFFFAOYSA-N 0.000 description 1
- UAXNXOMKCGKNCI-UHFFFAOYSA-N 1-diphenylphosphanylethyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 UAXNXOMKCGKNCI-UHFFFAOYSA-N 0.000 description 1
- 238000004607 11B NMR spectroscopy Methods 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- LRLQQERNMXHASR-UHFFFAOYSA-N 2-diphenylphosphanylpropan-2-yl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)C(C)(C)P(C=1C=CC=CC=1)C1=CC=CC=C1 LRLQQERNMXHASR-UHFFFAOYSA-N 0.000 description 1
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 description 1
- 229910052580 B4C Inorganic materials 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229910033181 TiB2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 238000001897 boron-11 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- UJNZOIKQAUQOCN-UHFFFAOYSA-N methyl(diphenyl)phosphane Chemical compound C=1C=CC=CC=1P(C)C1=CC=CC=C1 UJNZOIKQAUQOCN-UHFFFAOYSA-N 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- IGNTWNVBGLNYDV-UHFFFAOYSA-N triisopropylphosphine Chemical compound CC(C)P(C(C)C)C(C)C IGNTWNVBGLNYDV-UHFFFAOYSA-N 0.000 description 1
- WXAZIUYTQHYBFW-UHFFFAOYSA-N tris(4-methylphenyl)phosphane Chemical compound C1=CC(C)=CC=C1P(C=1C=CC(C)=CC=1)C1=CC=C(C)C=C1 WXAZIUYTQHYBFW-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
- C01B35/02—Boron; Borides
- C01B35/04—Metal borides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
- C01B6/10—Monoborane; Diborane; Addition complexes thereof
Definitions
- Metal borides are hard, refractory, highly conductive and chemically inert materials which have many potential applications in the ceramic, electronic and optical industries. Obstacles to the development of uses for the borides have been that high temperatures or vacuum conditions have been required for their synthesis.
- the present invention relates to novel zirconium and hafnium boride precursor complexes and processes for their preparation by deposition from solution.
- the present invention further relates to the metal borides obtained upon heating the novel precursors at mild temperatures and ambient pressure.
- metal borides Several methods for the preparation of metal borides are known including direct synthesis from the elements, reduction of mixtures of metal oxides and boron oxide by carbon, reduction of metal oxides wit boron carbide and carbon, and reduction of mixtures of metal halide and boron trihalide by hydrogen. Each of these requires high temperatures, in excess of about 1200°C, usually near 2000°C. More recently metal borides have been synthesized by thermal decomposition of gaseous meta borohydrides at lower temperatures.
- Titanium diboride, zirconium diboride and hafnium diboride thin films were obtained by using gaseous chemical vapor deposition at about 200°C of the respective tetrahydroborate precursors; see Jensen, J. A., et al., .T. Am. Ch ⁇ m. Soc.. ___&, 1643-1544 (1988).
- the synthesis of zirconium boride, ZrB 2 / from zirconium borohydride, Zr(BH 4 ) 4 was explored by a variety of methods including gaseous chemical vapor deposition in a hot tube, laser chemical vapor deposition with both continuous-wave and pulsed lasers, and continuous-wave laser synthesis of fine powders.
- FIGURES Figure 1 is a thermogravimetric analysis (TGA) of the product of Example 2.
- FIG. 1 is a thermogravimetric analysis (TGA) of the product of Example 8.
- One aspect of the present invention relates to novel metal boride precursor complexes.
- One such complex obtained by the thermolysis of the appropriate metal borohydride comprises
- M is zirconium or hafnium; x is from about 0.5 to about 2; y is from 0 to about 3, provided that
- the boron to metal ratio in this complex is about 4.
- This complex is generated by a process of the present invention, the liquid phase thermolysis of the corresponding metal borohydride, M(BH 4 ) 4 .
- the borohydride is heated neat, or in a hydrocarbon solvent, such as toluene or heptane, to a temperature of at least about 100°C in an inert atmosphere. Suitable inert atmospheres include argon, nitrogen or helium. At about 100°C, heating for several days (5 to 10) is required. At higher temperatures a shorter heating period is required.
- the complex is obtained as a mixture of a soluble intermediate and a black insoluble solid according to the following reaction:
- the soluble intermediate (BH 4 ) 3 M(B 2 H 6 )M(BH 4 ) 3 has been characterized.
- the conversion of (BH 4 ) ⁇ ligands into (B 2 H 6 ) 2 ⁇ bridges leads to a mixture of oligomers having the empirical formula (I), [M(B 2 Hg) ⁇ (BH 4 ) y ] n . Heating this mixture above about 200°C liberates more hydrogen with formation of the metal borides MB Z wherein z is about 4.
- a further metal boride precursor complex of the present invention comprises a mixture of oligomers of formula (II), obtained by reaction of the appropriate metal borohydride with a Lewis base,
- M zirconium or hafnium; and x is from 0 to 9; and n is at least 4.
- This complex has a boron to metal ratio of about 2.
- Another aspect of the present invention is a process for the generation of the above complex of formula (II) from solution comprising contacting a solution of M(BH 4 ) 4 wherein M is zirconium or hafnium with a Lewis base (LB) to yield the desired precursor complex as a solid precipitate or film.
- This reaction is as follows:
- the metal borane complex of formula (II) precipitates as a black solid. Heating the solid of formula (II) above about 200°C yields the metal boride MB ⁇ wherein x is about 2.
- Suitable Lewis bases for use in this reaction sequence include phosphines, arsines, amines and ethers. Preferred are the phosphines, especially aryl- or alkylphosphines having a cone angle greater than 135°. For further discussion of cone angle, see Rahman et al., Orqanometallics, £, 650-658 (1987). Most preferred are the arylphosphines.
- phosphines useful herein include tri-t-butylphosphine, tricyclohexylphosphine, triphenylphosphine, tri-p-tolylphosphine, methyldiphenylphosphine, triisopropylphosphine, bis(diphenylphosphino)ethane, bis(diphenylphosphino)propane, bis(diphenylphos- phino)butane, or bis(di-p-tolylphosphino)ethane.
- the above reactions using the Lewis base are conducted at a temperature of from about -20°C to about 25°C for a period of from about 1 to about 24 hours.
- the concentration of the Lewis base is determined so as to prevent precipitation of colorless H3B-LB.
- the product of formula (II) precipitates as a black film or solid and is washed extensively with fresh solvent to ensure removal of any H3B-LB.
- the composition of the solid has an empirical formula MB ⁇ .8-2.0 H 3-6• Heating the solid above 200°C yields a metal boride coating of approximate composition MB Z wherein z is about 1.6-1.9.
- the complexes of the present invention are useful as precursors to metal borides.
- the metal borides have many uses in the ceramic, electronic and optical industries. Examples include their use as films for microelectronic applications, ceramic powders, coatings for electrodes or metal cutting tools, or coatings in nozzles, valves and the like, in the aerospace industry.
- EXAMPLE 1 The following Example describes the formation of a Zr boride precursor via thermolysis of neat Zr(BH 4 ) 4 at 100°C.
- EXAMPLE 2 This example describes the isolation of a white, volatile intermediate formed in the thermal decomposition of Hf(BH 4 ) 4 , and a reddish-brown, non-volatile precursor of hafnium boride, and includes a thermogravimetric analysis.
- Hf(BH 4 ) 4 1.0 g was heated in a closed 10 mL stainless steel pressure vessel for 3 hr at 120°C. At ambient temperature, the vessel was opened and gases were allowed to escape. The remaining products were washed out of the vessel with toluene. Under a pressure of ca. 0.1 millitorr, toluene was evaporated from the mixture at ambient temperature to leave a residue of 0.330 g of solids.
- EXAMPLE 6 The following Example describes the reaction of Zr(BH 4 ) 4 and 2 equivalents of P(t-Bu) 3 and shows- that little B is lost upon heating the precursor to 200°C.
- a solution of 2.69 g (13.3 mmol) P(t-Bu) 3 in 10 mL of toluene was added to a solution of 1.00 g (6.65 mmol) Zr(BH ) in 20 mL of toluene at -100°C.
- the solution turned from yellow to amber to dark brown.
- the resulting blac : x solid was filtered off and dried in vacuo for 10 hr to yield 814 mg.
- Example 7 The following Example is a repeat of Example 5 and includes the Thermogravimetric Analysis (TGA) which shows little weight loss at 200-750°C.
- TGA Thermogravimetric Analysis
- EXAMPLE 8 The following Example describes the reaction of Zr(BH 4 ) 4 with 2 equivalents of PPh 3 and includes a thermogravimetric analysis (TGA) which showed only 7% weight loss, which all occurred below 200°C.
- TGA thermogravimetric analysis
- EXAMPLE 9 Using a cold well inside a nitrogen glove box, a solution of 539 mg (2.05 mmol) PPh 3 in 20 mL of toluene was added to a solution of 151 mg (1 mmol) Zr(BH 4 ) 4 in 10 mL of toluene at -100°C. The reaction vessel was then sealed, removed from the glove box and attached to the high vacuum line. After three freeze-pump-thaw cycles the reaction was warmed to 0°C using an ice bath. After 20 hr the non-condensable gases were measured using a Toepler pump and determined to be 0.45 mmol H 2 /Zr.
- Example 10 The following Example taken together with Example 9 shows that the black solid precursor loses H 2 at 25°C (this example at 25°C gives 0.85 mmol H 2 /mmol Zr while the Example 9 kept at 0°C only gave 0.45 mmol H /mmol Zr) .
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
Abstract
Zirconium and hafnium boride precursor complexes are prepared by deposition from solution, and yield metal borides upon heating at mild temperatures and ambient pressure.
Description
TITLE BORIDES AND BORIDE
PRECURSORS DEPOSITED FROM SOLUTION FIELD OF THE INVENTION Metal borides are hard, refractory, highly conductive and chemically inert materials which have many potential applications in the ceramic, electronic and optical industries. Obstacles to the development of uses for the borides have been that high temperatures or vacuum conditions have been required for their synthesis. The present invention relates to novel zirconium and hafnium boride precursor complexes and processes for their preparation by deposition from solution. The present invention further relates to the metal borides obtained upon heating the novel precursors at mild temperatures and ambient pressure.
BACKGROUND OF THE INVENTION Several methods for the preparation of metal borides are known including direct synthesis from the elements, reduction of mixtures of metal oxides and boron oxide by carbon, reduction of metal oxides wit boron carbide and carbon, and reduction of mixtures of metal halide and boron trihalide by hydrogen. Each of these requires high temperatures, in excess of about 1200°C, usually near 2000°C. More recently metal borides have been synthesized by thermal decomposition of gaseous meta borohydrides at lower temperatures. Titanium diboride, zirconium diboride and hafnium diboride thin films were obtained by using gaseous chemical vapor deposition at about 200°C of the respective tetrahydroborate precursors; see Jensen, J. A., et al., .T. Am. Chβm. Soc.. ___&, 1643-1544 (1988).
The synthesis of zirconium boride, ZrB2/ from zirconium borohydride, Zr(BH4)4, was explored by a variety of methods including gaseous chemical vapor deposition in a hot tube, laser chemical vapor deposition with both continuous-wave and pulsed lasers, and continuous-wave laser synthesis of fine powders. Products made at high temperature contained excess boron, while those made at low temperature were boron deficient. The gaseous chemical vapor deposition and laser chemical vapor deposition techinques using zirconium borohydride were deemed more promising than older conventional techniques and were considered predictive of the behavior of hafnium borohydride and titanium borohydride; see Rice, G. ., J. Am. Ceram. Soc.. 71(4), C-181-C-183 (1988). Wayda, A. L., et al., Appl. Phys. Lett.. 53, (5), August 1, 1988, reported deposition on various substrates of films of zirconium and hafnium borides by the low temperature (100-270°C) thermal decomposition of gaseous M(BH4)4 wherein M is zirconium or hafnium. The resultant films were characterized as having favorable mechanical and electronic properties with only surface oxide contamination. Thus the metal borohydrides were considered to be excellent precursor complexes for vapor phase thermal decomposition to yield metal boride films. These prior art techniques for generation of the metal borides involve deposition from the gas phase, such as chemical vapor deposition or laser vapor deposition. The deposition of metal boride precursors from solution at ambient pressure is easier to practice than gas phase routes and could prove to be less expensive.
It is therefore an object of the present invention to provide processes for deposition of metal boride precursors from the solution phase. It is a further object of the present invention to provide novel metal boride precursor complexes. It is a further object of the present invention to provide metal borides from these novel precursor complexes.
BRIEF DESCRIPTION OF THE FIGURES Figure 1 is a thermogravimetric analysis (TGA) of the product of Example 2.
Figure 2 is a thermogravimetric analysis (TGA) of the product of Example 8.
DETAILED DESCRIPTION OF THE INVENTION One aspect of the present invention relates to novel metal boride precursor complexes. One such complex obtained by the thermolysis of the appropriate metal borohydride comprises
[M(B2H6)χ(BH4)y]Jn (I)
wherein M is zirconium or hafnium; x is from about 0.5 to about 2; y is from 0 to about 3, provided that
2x + y is 4; and n is at least 2.
The boron to metal ratio in this complex is about 4. This complex is generated by a process of the present invention, the liquid phase thermolysis of the corresponding metal borohydride, M(BH4)4. The borohydride is heated neat, or in a hydrocarbon solvent, such as toluene or heptane, to a temperature of at least about 100°C in an inert atmosphere.
Suitable inert atmospheres include argon, nitrogen or helium. At about 100°C, heating for several days (5 to 10) is required. At higher temperatures a shorter heating period is required. The complex is obtained as a mixture of a soluble intermediate and a black insoluble solid according to the following reaction:
Δ
M(BH4)4 H2 + (BH4)3M(B2H6)M(BH4)3 + insoluble liquid solids phase
The soluble intermediate (BH4)3M(B2H6)M(BH4)3 has been characterized. The conversion of (BH4)~ ligands into (B2H6)2~ bridges leads to a mixture of oligomers having the empirical formula (I), [M(B2Hg)χ(BH4)y]n. Heating this mixture above about 200°C liberates more hydrogen with formation of the metal borides MBZ wherein z is about 4.
A further metal boride precursor complex of the present invention comprises a mixture of oligomers of formula (II), obtained by reaction of the appropriate metal borohydride with a Lewis base,
[MB2Hχ]n (II)
wherein M is zirconium or hafnium; and x is from 0 to 9; and n is at least 4. This complex has a boron to metal ratio of about 2.
Another aspect of the present invention is a process for the generation of the above complex of formula (II) from solution comprising contacting a solution of M(BH4)4 wherein M is zirconium or hafnium
with a Lewis base (LB) to yield the desired precursor complex as a solid precipitate or film. This reaction is as follows:
2M(BH4)4 + 4LB =» [(LB)(BH4)2MH]2(μ-B2Hg) +
H2 + 2H3B-LB
in favorable cases when the Lewis base is a large bulky group, such as triphenylphosphine, the above intermediate is unstable with respect to dissociation of the Lewis base. Once liberated, the Lewis base extracts another BH and a soluble, base-free intermediate is formed according to the following reaction:
2[(LB)(BH4)2MH]2(μ-B2H6) — M4(B2H6)(BH4)6H6 + 4H3B-LB
As further hydrogen is evolved, the metal borane complex of formula (II) precipitates as a black solid. Heating the solid of formula (II) above about 200°C yields the metal boride MBχ wherein x is about 2. Suitable Lewis bases for use in this reaction sequence include phosphines, arsines, amines and ethers. Preferred are the phosphines, especially aryl- or alkylphosphines having a cone angle greater than 135°. For further discussion of cone angle, see Rahman et al., Orqanometallics, £, 650-658 (1987). Most preferred are the arylphosphines. Use of a bulky tertiary phosphine leads to hydrogen evolution, formation of (B2H6)2~ bridges, and precipitation of a base free solid of formula (II). Other phosphines useful herein include tri-t-butylphosphine, tricyclohexylphosphine, triphenylphosphine,
tri-p-tolylphosphine, methyldiphenylphosphine, triisopropylphosphine, bis(diphenylphosphino)ethane, bis(diphenylphosphino)propane, bis(diphenylphos- phino)butane, or bis(di-p-tolylphosphino)ethane.
The above reactions using the Lewis base are conducted at a temperature of from about -20°C to about 25°C for a period of from about 1 to about 24 hours. The concentration of the Lewis base is determined so as to prevent precipitation of colorless H3B-LB. The product of formula (II) precipitates as a black film or solid and is washed extensively with fresh solvent to ensure removal of any H3B-LB. The composition of the solid has an empirical formula MBι.8-2.0H3-6• Heating the solid above 200°C yields a metal boride coating of approximate composition MBZ wherein z is about 1.6-1.9. The complexes of the present invention are useful as precursors to metal borides. The metal borides have many uses in the ceramic, electronic and optical industries. Examples include their use as films for microelectronic applications, ceramic powders, coatings for electrodes or metal cutting tools, or coatings in nozzles, valves and the like, in the aerospace industry.
The complexes and processes of the present invention are further illustrated by the following examples.
EXAMPLE 1 The following Example describes the formation of a Zr boride precursor via thermolysis of neat Zr(BH4)4 at 100°C. A thick-walled glass vessel was loaded with 3 g (20 mmol) Zr(BH4)4, freeze-pump-thaw degassed and sealed off in vacuo. The tube was then heated at
100°C for 5 days to give a black solid. After any unreacted Zr(BH4)4 was removed by sublimation, the tube was brought into a nitrogen-purged glove box and opened. The black solids were washed with 2X10 mL of hexane, toluene, then THF and dried in vacuo to give 150 mg black solids. Elemental analysis gave the formula ZrB3.8C0.6H9.9 (total = 81%) which corresponds to ZrB3 ^gHg_7(THF)0.15 with some further O contamination.
EXAMPLE 2 This example describes the isolation of a white, volatile intermediate formed in the thermal decomposition of Hf(BH4)4, and a reddish-brown, non-volatile precursor of hafnium boride, and includes a thermogravimetric analysis.
Hf(BH4)4, 1.0 g, was heated in a closed 10 mL stainless steel pressure vessel for 3 hr at 120°C. At ambient temperature, the vessel was opened and gases were allowed to escape. The remaining products were washed out of the vessel with toluene. Under a pressure of ca. 0.1 millitorr, toluene was evaporated from the mixture at ambient temperature to leave a residue of 0.330 g of solids. As the temperature was increased from ambient to 120°C, 0.030 g of white (BH4)3Hf(B2H6)Hf(BH4)3 sublimed from the mixture ( B NMR [1H-decoupled] , toluene-dg, -0.50 (br s, 2B, B2H6), -9.0 pp (s, 6B, BH4). A portion of the reddish-brown non-volatile residue wa-s washed with toluene and pentane, and dried under vacuum for 12 hr at ambient temperature. The TGA of this solid (Figure 1) showed 3% loss of weight near 190°C. No further loss of weight occurred below 1000°C.
EXAMPLE 3 The following Example describes NMR experiments which showed that an initially-formed intermediate with Zr-P bonds was converted to a soluble, Lewis base-free zirconium borane complex prior to deposition of the black solid.
A solution of 139 mg (0.53 mmol) PPh3 in 1 mL of toluene-dg was added to a solution of 40 mg
(0.27 mmol) Zr(BH ) in 0.5 L of toluene-dg at -80°C using a cold well inside a nitrogen-purged glove box. The 3^P, ^H and 11B NMR spectra were then recorded as a function of time at -20°C. An intermediate, proposed to be [Zr(BH4)2(PPh3) ] 2-
(μ-H)2(μ-B2H6) , was observed initially (31P{1H}: 16.5 ppm (broad); H : S 4.87 (Zr-H) ; λ lB : -4.7 (br, 2B, B2H6) and -10.9 ppm (quintet, JBH = 85 Hz, 4B, BH4)) along with Ph3P-BH3 (31P{1H): 22.9 ppm (br) ; λ lB : -38.2 ppm (d, JBp = 44 Hz)). At 25°C the solution turned dark brown and precipitated colorless crystals of Ph3P-BH3. The 31P NMR showed only Ph3P-BH3 while 11B and --H NMR spectra indicated a soluble species proposed to be Zr4(B2H6) (BH4) 6H6 ( λH : S 4.69 (4H), 4.50 (2H); l λB : -11.3 (br, B2H6), -13.9 , -15.0 ppm (quint, BH4)).
EXAMPLE 4 The following Example describes NMR experiments which showed that the same soluble, Lewis Base-free zirconium borane complex is formed with PPh3 and CH2(PPh2)2.
A solution of 154 mg (1.0 mmol) Ph2PCH2PPh2 in 1 mL of THF-dg was added to a solution of 30 mg (0.5 mmol) Zr(BH4)4 in 0.5 mL of THF-dg. 31P, 1H and 11B NMR of this solution showed only Ph2PCH2PPh2-BH3 (31P{__H}: i7.o, -25.2 ppm (d, 2Jpp = 70 Hz); l B : -38.4 ppm (br)) and the same P-free soluble species discussed in Example 3.
SUBSTITUTESHEET
EXAMPLE 5 The following Example describes NMR experiments which showed that an intermediate is formed in which H3B-P(t-Bu)3 acts as a chelating ligand to Zr through bridging H's.
A solution of 107 mg (0.53 mmol) P(t-Bu)3 in 1 L of toluene-dg was added to a solution of 40 mg (0.27 mmol) Zr(BH4)4 in 0.5 mL of toluene-dg at -80°C. 31P, ^-H and lλB NMR spectra of this dark brown solution indicated both free and Zr-complexed H3B-P(t-Bu)3 (31P{1H}: 61.0 (quart, JpB = 56 Hz, H3B-P(t-Bu)3) , 49.6 ppm (quart, JPB = 121 Hz, Zr-H3B-P(t-Bu)3); λlB : -28.4 (d, 121 Hz,
Zr-H3B-P(t-Bu)3), -40.8 ppm (d, 56 Hz, H3B-P(t-Bu)3)) in addition to a P-free soluble species (^H: δ 4.80, 4.66 (br, Zr-H); 1:LB: -8.6, -10.3 (br, B2H6), -11.9, -12.4, -13.6 ppm (quint, BH4)). After several weeks the Zr-complexed H3B-P(t-Bu)3 was gone and only the P-free soluble species remained.
EXAMPLE 6 The following Example describes the reaction of Zr(BH4)4 and 2 equivalents of P(t-Bu)3 and shows- that little B is lost upon heating the precursor to 200°C. A solution of 2.69 g (13.3 mmol) P(t-Bu)3 in 10 mL of toluene was added to a solution of 1.00 g (6.65 mmol) Zr(BH ) in 20 mL of toluene at -100°C. Upon warming slowly to -20°C the solution turned from yellow to amber to dark brown. After 7 days at -20°C the resulting blac:x solid was filtered off and dried in vacuo for 10 hr to yield 814 mg. A portion of the resulting solid (700 mg) was heated in vacuo to about 200°C which gave H2 and 67 mg of white crystals of H3B-P(t-Bu3) . Elemental analysis of the remaining black solid gave the formula ZrB2 1C2 9H8 2Pg 3 w.ith
only 93 % of the mass accounted for. While the incomplete removal of H B-P(t-Bu)3 leads to C, H, and P contamination it is clear that little B was lost upon heating the black solid.
EXAMPLE 7 The following Example is a repeat of Example 5 and includes the Thermogravimetric Analysis (TGA) which shows little weight loss at 200-750°C.
A solution of 2.69 g (13.3 mmol) P(t-Bu)3 in 10 mL of toluene was added to a solution of 1.00 g (6.65 mmol) Zr(BH )4 in 20 mL of toluene at -100°C. Upon warming slowly to -20°C the solution turned from yellow to amber to dark brown. After 7 hr at -20°C the solution was warmed to 25°C. After 14 more hr, the resulting black precipitate was filtered off, washed with 3X100 mL of hexane and dried in vacuo to yield 720 mg. This solid was then washed with 4X10 mL of hot (95°C) toluene, 4X10 mL of hexane and dried in vacuo to give 624 mg black solid. Elemental analysis showed a formula of
corresponding to rB-j^ _K g[H3B-P(t-Bu)3]0 # __- (THF)Q 05 where the THF originated from the glove box atmosphere. The TGA of the black solids indicated two distinct major weight-loss regimes with a total weight loss of 9%.
EXAMPLE 8 The following Example describes the reaction of Zr(BH4)4 with 2 equivalents of PPh3 and includes a thermogravimetric analysis (TGA) which showed only 7% weight loss, which all occurred below 200°C.
A solution of 5.3 g (20.2 mmol) PPh3 in 300 mL of toluene was added to a solution of 1.5 g (10 mmol) Zr(BH4)4 in 100 mL of toluene at 25°C. The solution turned amber, then dark brown. After 14 hr the
resulting black solid was filtered off, washed with 3X20 mL of toluene, then hexane and dried in vacuo to yield 2.42 g. The resulting solids were washed with hot (95°C) toluene (ca 9X20 mL) until the washings left negligible residue upon evaporation. The resulting solid was washed with 3X20 mL of hexane and dried in vacuo to yield 1.23 g black solids. Elemental analysis gave the formula ZrB-^7C2_gH4.7 for a total of 97% not including P, which was not obtained. C contamination occurred either from THF or from H3B-PPh3. The TGA of the black solids, shown in Figure 2, indicated about a 7% weight loss with no further events from 200-750°C.
EXAMPLE 9 Using a cold well inside a nitrogen glove box, a solution of 539 mg (2.05 mmol) PPh3 in 20 mL of toluene was added to a solution of 151 mg (1 mmol) Zr(BH4)4 in 10 mL of toluene at -100°C. The reaction vessel was then sealed, removed from the glove box and attached to the high vacuum line. After three freeze-pump-thaw cycles the reaction was warmed to 0°C using an ice bath. After 20 hr the non-condensable gases were measured using a Toepler pump and determined to be 0.45 mmol H2/Zr. The reaction was then warmed to 25°C and after 66 hr the reaction vessel was returned to the glove box. The resulting black solid was filtered using a fine frit, washed with 3X50 mL of toluene and dried in vacuo to yield 108 mg. Elemental analysis of the black solid indicated the formula rB-^gH3 _5(H3B-PPh3)Q_ -j.(THF)0 2
EXAMPLE 10 The following Example taken together with Example 9 shows that the black solid precursor loses
H2 at 25°C (this example at 25°C gives 0.85 mmol H2/mmol Zr while the Example 9 kept at 0°C only gave 0.45 mmol H /mmol Zr) .
A solution of 526 mg (2.0 mmol) PPh3 in 20 mL of toluene was added to a solution of 151 mg (1.0 mmol) Zr(BH4)4 in 20 mL of toluene at -100°C using a cold well inside the glove box. The vessel was closed, removed from the glove box and attached to the vacuum line. After freeze-pump-thaw degassing, the solution was stirred at 0°C for 12 hr and at 25°C for 14 hr. The evolved H2 was measured using a Toepler pump to give 0.85 mmol H /mmol Zr. The black solid was then filtered off, washed with
3X10 mL of hot (95°C) toluene and dried in vacuo to yield 134 mg. Elemental analysis gave the formula
ZrB1>5C2 4H5 4P0#o9 which corresponds to
ZrB1.4H2.2(H3B-pph3>0.1<THF>0.2'
Claims
1. A metal boride precursor complex comprising the following formula (I)
[M(B2H6)x(BH4)y]n (I)
wherein
M is zirconium or hafnium; x is from about 0.5 to about 2; y is from 0 to about 3, provided that 2x + y is 4; and n is at least about 2.
2. A metal boride precursor complex comprising a mixture of oligomers having the formula (II)
[MB2Hχ]n (II)
wherein M is zirconium or hafnium; x is from 0 to 9; and n is at least 4.
3. A complex comprising
M4(B2H6)(BH4)6H6
wherein
M is zirconium or hafnium.
4. A complex comprising
[(LB)(BH4)2MH]2(B2H6)
wherein
LB is a Lewis base; and M is zirconium or hafnium.
5. The complex of Claim 4 wherein the Lewis base is a phosphine, arsine, amine or ether.
6. The complex of Claim 5 wherein the Lewis base is an aryl or alkyl phosphine having a cone angle of greater than 135°.
7. The complex of Claim 6 wherein the Lewis base is triphenyl phosphine.
8. A process for producing metal boride precursors comprising thermolysis of the corresponding metal borohydride neat or in a hydrocarbon solvent to a temperature of at least about 100°.
9. The process of Claim 8 wherein the thermolysis is conducted in an inert atmosphere.
10. The process of Claim 8 wherein the resulting metal boride precursor comprises a complex having the following formula (I)
[M(B2H6)χ(BH4)y]n wherein
M is zirconium or hafnium; x is from about 0.5 to about 2; y is from 0 to about 3, provided that
2x + y is 4; and n is at least about 2.
11. A process for producing metal boride precursors comprising contacting a solution of M(BH4)4 wherein M is zirconium or hafnium with a Lewis base selected from a phosphine, arsine, amine or ether to yield the desired precursor as a solid precipitate or film.
12. The process of Claim 11 wherein the Lewis base is an aryl or alkyl phosphine having a cone angle of greater than 135°.
13. The process of Claim 12 wherein the Lewis base is triphenyl phosphine.
14. The process of Claim 11 wherein the reaction is conducted at a temperature of from about -20°C to about 25°C for a period of from about 1 to about 24 hours.
15. The process of Claim 11 wherein the resulting precursor comprises an oligomer having the following formula (II):
[MB2Hχ]n wherein
M is zirconium or hafnium; and x is from 0 to 9; and n is at least 4.
16. A metal boride precursor produced by the process of Claim 8.
17. A metal boride precursor produced by the process of Claim 11.
18. A metal boride produced by heating the compound of Claim 1.
19. A metal boride produced by heating the compound of Claim 2.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/836,304 US5364607A (en) | 1989-09-08 | 1989-09-08 | Borides and boride precursors deposited from solution |
EP19890910280 EP0442894A1 (en) | 1989-09-08 | 1989-09-08 | Borides and boride precursors deposited from solution |
PCT/US1989/003883 WO1991003420A1 (en) | 1989-09-08 | 1989-09-08 | Borides and boride precursors deposited from solution |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US1989/003883 WO1991003420A1 (en) | 1989-09-08 | 1989-09-08 | Borides and boride precursors deposited from solution |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1991003420A1 true WO1991003420A1 (en) | 1991-03-21 |
Family
ID=22215217
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1989/003883 WO1991003420A1 (en) | 1989-09-08 | 1989-09-08 | Borides and boride precursors deposited from solution |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0442894A1 (en) |
WO (1) | WO1991003420A1 (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE682545A (en) * | 1965-07-06 | 1966-11-14 | ||
US4282195A (en) * | 1975-02-03 | 1981-08-04 | Ppg Industries, Inc. | Submicron titanium boride powder and method for preparing same |
-
1989
- 1989-09-08 EP EP19890910280 patent/EP0442894A1/en not_active Withdrawn
- 1989-09-08 WO PCT/US1989/003883 patent/WO1991003420A1/en not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE682545A (en) * | 1965-07-06 | 1966-11-14 | ||
US4282195A (en) * | 1975-02-03 | 1981-08-04 | Ppg Industries, Inc. | Submicron titanium boride powder and method for preparing same |
Non-Patent Citations (2)
Title |
---|
CHEMICAL ABSTRACTS, Volume 106, No. 24, 5 June 1987, (Columbus, Ohio, US), M. CAUCHETIER et al.: "Laser Synthesis of Ultrafine Powders", see page 274* Abstract 200597u & Ceram. Int. 1987, 13(1), 13-17 (Eng)* * |
CHEMICAL ABSTRACTS, Volume 108, No. 12, 21 March 1988, (Columbus, Ohio, US), J.A. JENSEN et al.: "Titanium, Zirconium, and Hafnium Tetrahydro Borates as "Tailored" CVD Precursors for Metal Diboride Thin Films", see page 733* Abstract 1052792z & J. AM. Chem. Soc. 1988, 110(5) 1643-4 (Eng)* * |
Also Published As
Publication number | Publication date |
---|---|
EP0442894A1 (en) | 1991-08-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Sen et al. | Synthesis, structure, and reactivity of homoleptic cerium (IV) and cerium (III) alkoxides | |
JPH0284437A (en) | Polyborosilazane and its manufacturing method | |
Su et al. | A polymer precursor route to metal borides | |
JP2024045516A (en) | Metal complexes containing triazenide ligands and their use for depositing metals from the gas phase - Patents.com | |
Stoll et al. | Selenide and selenolate compounds of indium: a comparative study of In–Se bond-forming reactions | |
US5364607A (en) | Borides and boride precursors deposited from solution | |
US5084128A (en) | Low-temperature synthesis of group III-group V semiconductors | |
Atwood et al. | Monomeric base-stabilized phosphino-and arsinoalanes | |
Ivan | Formation of transition-metal nitrides from the reactions of lithium amides and anhydrous transition-metal chlorides | |
WO1991003420A1 (en) | Borides and boride precursors deposited from solution | |
JPH01224213A (en) | Production of granular aluminum nitride and mixture of aluminum and boron nitride | |
Uhl et al. | Formation of the Digallium Compound [(C5C6) 2N3](R) Ga–Ga (R)[N3 (C6H5) 2] with Two Bis (trimethylsilyl) methyl Groups and Two Terminal Chelating Diphenyltriazenido Ligands | |
US4758539A (en) | Process for producing ceramic nitrides and carbonitrides and their precursors | |
Petrie et al. | Syntheses, structures, and spectroscopic studies of several new classes of compounds having boron-arsenic bonds | |
KR20210058870A (en) | Method for producing a dialkylamido elemental compound | |
Trinh et al. | Chelating ionic versus bridged molecular structures of group 13 metal complexes with bidentate ligands | |
US3342551A (en) | Method and apparatus for producing a semiconducting compound of two or more components | |
US2926194A (en) | Phosphine borine compounds and their preparation | |
US3294828A (en) | Aromatic nitric oxide vanadium tetracarbonyls | |
Aldridge | The chemistry of the group 13 metals in the+ 3 oxidation state: simple inorganic compounds | |
Jemine et al. | Absolute uranium–ligand bond-disruption enthalpies of [U (C 5 H 4 R) 3 X] complexes (X= I or H, R= Bu t or SiMe 3) | |
Jung et al. | Heterobimetallic lithium organoaluminum and organogallium complexes: potential single precursors for MOCVD of LiMO2 thin films | |
US3755479A (en) | Beryllium hydride compositions and their use in making cyclopentadienyl beryllium hydride compounds | |
AU2016239911B2 (en) | Method for producing metal organyls | |
Hong et al. | Reactions of Na [Mo (CO) 3 (η5-C5H5)] towards CoCl (PPh3) 3 and CoCl (P (OMe) 3) 5: X-ray crystal structures of [MoCo (CO) 6 (PPh3)(η5-C5H5)] and [Mo (CO) 3 (P (OMe) 3)(η5-C5H5)] 2 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): JP US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE CH DE FR GB IT LU NL SE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1989910280 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 1989910280 Country of ref document: EP |
|
WWW | Wipo information: withdrawn in national office |
Ref document number: 1989910280 Country of ref document: EP |