US7628840B2 - Metal nano-particles and method for preparing the same, dispersion of metal nano-particles and method for preparing the same, and thin metallic wire and metal film and method for preparing these substances - Google Patents
Metal nano-particles and method for preparing the same, dispersion of metal nano-particles and method for preparing the same, and thin metallic wire and metal film and method for preparing these substances Download PDFInfo
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- US7628840B2 US7628840B2 US10/571,315 US57131504A US7628840B2 US 7628840 B2 US7628840 B2 US 7628840B2 US 57131504 A US57131504 A US 57131504A US 7628840 B2 US7628840 B2 US 7628840B2
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- B01J13/0004—Preparation of sols
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- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
- B22F1/0545—Dispersions or suspensions of nanosized particles
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
- B22F1/102—Metallic powder coated with organic material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
- H01L23/49883—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials the conductive materials containing organic materials or pastes, e.g. for thick films
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/097—Inks comprising nanoparticles and specially adapted for being sintered at low temperature
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
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- C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
- C09K23/16—Amines or polyamines
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12181—Composite powder [e.g., coated, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
Definitions
- the present invention relates to metal nano-particles and a method for the preparation of the metal nano-particles; a dispersion of such metal nano-particles and a method for the preparation of the dispersion; and a thin metallic wire and a metal film as well as a method for the preparation of these wire and film.
- Patent Article 1 Japanese Un-Examined Patent Publication Hei 11-319538 (refer to Claims);
- the temperature used has gradually been reduced to a level of as low as possible.
- a variety of substances such as glass and polyimides as a basic substrate material onto which metal nano-particles are applied and the resulting nano-article-containing layer is thereafter dried and then fired.
- metal nano-particles have recently been applied frequently onto a substrate comprising glass on which a TFT (thin film transistor) has been mounted and the further reduction of the film-forming temperature has likewise been required in this case. It has likewise been required that the firing temperature should be reduced to a level as low as 200° C. although it may vary depending on the quality of each particular base material.
- metal nano-particles which are characterized in that an organic metal compound is adhered to the periphery of each metal particle as a dispersant.
- the organic metal compound comprises at least one metal selected from the group consisting of precious metals and transition metals or it comprises an alloy of at least two metals selected from the foregoing group of metals.
- the organic metal compound is an organic metal compound of a fatty acid, a metal complex of an amine or a mixture of an organic metal compound of a fatty acid and a metal complex of an amine.
- the foregoing fatty acid is at least one member selected from the group consisting of C 6 to C 22 saturated fatty acids and unsaturated fatty acids, each having a linear or branched structure and the fatty acid is, for instance, at least one member selected from the group consisting of hexanoic acid, heptanoic acid, octanoic acid, nonanoic acid, decanoic acid, undecanoic acid, dodecanoic acid, tetra-decanoic acid, eicosanoic acid, docosanoic acid, 2-ethyl hexanoic acid, oleic acid, linoleic acid and linolenic acid.
- the foregoing amine is a C 6 to C 13 aliphatic amine having a linear or branched structure and the amine is, for instance, at least one member selected from the group consisting of hexylamine, heptylamine, octylamine, decylamine, dodecylamine, 2-ethyl-hexylamine, 1,3-dimethyl-n-butylamine, 1-amino-undecane and 1-amino-tridecane.
- a method for preparing metal nano-particles of the present invention which comprises the steps of dissolving, in a non-polar solvent, an organic metal compound of the foregoing fatty acid, a metal complex of the foregoing amine or a mixture of the organic metal compound and the metal complex and adding a reducing agent to the resulting liquid to subject the liquid to a reducing treatment and to thus give metal nano-particles.
- the reducing treatment of the liquid is carried out while introducing, into the liquid, hydrogen gas, carbon monoxide gas, a hydrogen-containing gas or a carbon monoxide-containing gas.
- deionized water is added to the liquid, followed by stirring and then allowing the liquid to stand so that impurities present in the liquid are transferred to the polar solvent and that the impurity concentration in the non-polar solvent is thus reduced.
- a metal nano-particle-containing dispersion which is characterized in that the metal nano-particle concentration thereof is controlled to a level of not less than 5% by mass and not more than 90% by mass and obtained by the concentration of the dispersion containing the metal nano-particles prepared according to the foregoing preparation method and the subsequent re-dispersion of the metal nano-particles.
- a method for the preparation of a metal nano-particle-containing dispersion which is characterized in that it comprises the steps of concentrating the dispersion containing the metal nano-particles prepared according to the foregoing preparation method and then again dispersing the metal nano-particles to thus give a dispersion having a metal nano-particle concentration of not less than 5% by mass and not more than 90% by mass.
- the size of the foregoing metal nano-particles is not less than 1 nm and not more than 100 nm.
- a method for the preparation of a thin metallic wire or a metal film which comprises the steps of coating, onto the surface of a base material, a dispersion containing the foregoing metal nano-particle, a dispersion containing the metal nano-particle prepared according to the foregoing method, the foregoing dispersion or the foregoing metal nano-particle-containing dispersion prepared according to the foregoing method, followed by drying and then firing the coated layer of the dispersion to thus form a thin metallic wire or a metal film having conductivity.
- a thin metallic wire or a metal film which is prepared according to the foregoing method.
- the temperature of the foregoing firing step ranges from 140 to 300° C. and preferably 140 to 220° C.
- the present invention permits the formation of a stable dispersion containing metal nano-particles in a high concentration, this in turn leads to the considerable reduction of the number of coating operations and/or the number of film-forming steps required for the production of, for instance, a thin metallic wire or a metal film having high conductivity and the present invention further permits the formation of such articles having practically acceptable conductivity even when the coated layer is fired at such a low temperature on the order of about 220° C.
- the metal as a constituent of the metal nano-particles of the present invention is one member or at least two members selected from the group consisting of, for instance, Ag, Au, Cu, Pt, Pd, W, Ni, Ta, In, Sn, Zn, Cr, Fe, Co and Si, or an alloy of at least two metals selected from the foregoing group of metals and the metal may arbitrarily be selected depending on each particular purpose and/or application.
- preferably used herein is at least one member selected from the group consisting of precious metals such as Ag and Au, and Cu, or an alloy containing at least two of these metals.
- Elements, which are originated from reducing agents, such as B, N, P and the like, may be mixed.
- the metal nano-particles of the present invention which are constituted by the foregoing metals have a structure in which an organic metal compound is adhered to the periphery of each metal particle as a dispersant.
- adhered means that an organic metal compound or a metal-amine complex is adsorbed on the surface of each metal particle through metal ions and accordingly, these metal particles are in such a state that the foregoing structure assists the stable dispersion thereof in an organic medium.
- the fatty acid moieties each constituting the organic metal compound of a fatty acid used as the foregoing organic metal compound is at least one member selected from the group consisting of C 6 to C 22 saturated fatty acids and unsaturated fatty acids and it is preferred that the fatty acid is, for instance, at least one fatty acid selected from the group consisting of hexanoic acid, heptanoic acid, octanoic acid, nonanoic acid, decanoic acid, undecanoic acid, dodecanoic acid, tetra-decanoic acid, eicosanoic acid, docosanoic acid, 2-ethyl hexanoic acid, oleic acid, linoleic acid and linolenic acid.
- the amine moieties constituting the metal complex of an amine used herein as the organic metal compound may be, for instance, at least one member selected from the group consisting of alkylamines.
- the alkylamine usable in the present invention is not restricted to any particular one and it may, for instance, be a primary, secondary or tertiary amine, a monoamine, or a polyvalent or higher amine such as a diamine or a triamine.
- preferably used herein include alkylamines having a principal skeleton whose carbon atom number ranges from 4 to 20 and more preferably used herein include alkylamines whose principal skeleton has 8 to 18 carbon atoms because of their stability and handling characteristics.
- All of the alkylamines or primary, secondary and tertiary alkylamines may be effective as the dispersants usable herein, but preferably used herein include primary alkylamines because of their stability and handling characteristics.
- the alkylamine has the number of carbon atoms smaller than 4, a problem arises such that the amine has an extremely high basicity, the amine would be liable to corrode the metal nano-particles and it would finally dissolve the nano-particles.
- alkylamines which can be used in the present invention are primary amines such as butylamine, hexylamine, octylamine, nonyl-amine, dodecylamine, hexadodecylamine, octadecylamine, cocoamine, tallowamine, hydrogenated tallowamine, oleylamine, laurylamine and stearylamine; secondary amines such as di-cocoamine, di-hydrogenated tallowamine and di-stearylamine; and tertiary amines such as dodecyl dimethyl-amine, di-dodecyl monomethyl-amine, tetradecyl dimethyl-amine, octadecyl dimethyl-amine, coco-dimethyl-amine, dodecyl tetradecyl dimethyl-amine and tri-octylamine; as well as diamines such as naphthalene-diamine,
- amines preferably used herein are hexylamine, heptylamine, octylamine, decylamine, dodecylamine, 2-ethylhexylamine, 1,3-di-methyl-n-butylamine, 1-aminoundecane, and 1-aminotridecane.
- the content of the alkylamine present in the metal nano-particle-containing dispersion is not less than 0.1% by mass and not more than 10% by mass and desirably not less than 1% by mass and not more than 5% by mass. If the content thereof is less than 0.1% by mass, molecules of a metal compound of a fatty acid are mutually linked together to thus show a viscosity-increasing effect, this in turn impairs the dispersibility of the particles after the reduction thereof.
- the foregoing organic metal compound may be a mixture containing an organic metal compound of a fatty acid with an amine-metal complex in any mixing ratio.
- an organic metal compound of a fatty acid and/or an amine-metal complex are dissolved in a polar solvent, followed by the addition of a reducing agent for practicing the reducing treatment of the resulting liquid to thus give metal nano-particles.
- reducing agents for instance, sodium boron hydride, dimethylamine borane and tert-butylamine borane.
- the reducing agent usable herein is not restricted to these particular ones specified above and may be any known one inasmuch as it can show the same reducing effect.
- This reducing reaction is preferably carried out while introducing hydrogen gas, carbon monoxide gas, a hydrogen-containing gas and/or a carbon monoxide-containing gas into the reaction system.
- the foregoing reducing treatment is carried out at room temperature or under such conditions as the refluxing with heating while blowing the foregoing gas or gases through the reaction system during stirring operations.
- the foregoing solution in a non-polar solvent is subjected to a reducing treatment to form a metal colloid, but impurities (such as boron atoms originated from the reducing agent used) are present in the reaction liquid.
- impurities such as boron atoms originated from the reducing agent used
- deionized water is added to the reaction liquid, and the resulting mixture is allowed to stand over a desired period of time after stirring the same and only the resulting supernatant is finally recovered.
- the hydrophilic ones are transferred to the aqueous phase and therefore, the removal thereof would permit the substantial reduction of the content of such impurities.
- the reaction liquid may be concentrated through the filtration thereof according to, for instance, the ultrafiltration for improving the purity of the reaction liquid and for increasing the metal concentration thereof and as a result, there can thus be obtained a dispersion containing metal nano-particles in a concentration of not less than 5% by mass and not more than 90% by mass.
- the dispersion in the case of the metal nano-particle-containing dispersion prepared by the foregoing method, the dispersion never undergoes any agglomeration of these nano-particles even at a high concentration on the order of 90% by mass and it never loses its fluidity.
- a metal nano-particle-containing dispersion having a concentration of 90% by mass is used for the formation of multi-layered metal wires used in, for instance, IC substrates or internal metal wires for IC.
- the dispersion never loses its fluidity and it never undergoes any agglomeration of nano-particles included therein. Accordingly, the dispersion permits the formation of fine wiring patterns having uniform conductivity and free of any defect.
- the non-polar solvents used in the present invention may be, for instance, weakly polar solvents and it is preferred that the solvents are organic solvents whose principal skeleton has the carbon atom number ranging from 6 to 18. If the number of carbon atoms is less than 6, the polarity of the solvent is too high to ensure dispersion of metal particles or the resulting dispersion is quickly dried and accordingly, the dispersion has insufficient handling characteristics. On the other hand, if the carbon atom number of the principal skeleton exceeds 18, various problems arise such that the resulting dispersion has a higher viscosity and that carbon atoms are liable to remain in the product obtained after firing the dispersion.
- solvents usable herein include long chain alkanes such as hexane, heptane, octane, decane, undecane, dodecane, tridecane and trimethyl pentane; cyclic alkanes such as cyclohexane, cycloheptane and cyclooctane; aromatic hydrocarbons such as benzene, toluene, xylene, trimethyl benzene and dodecyl-benzene; and alcohols such as hexanol, heptanol, octanol, decanol, cyclohexanol and terpineol.
- These solvents may be used alone or in the form of a mixed solvent containing at least two of them. For instance, mineral spirit may be used as such a solvent, which is a mixture of long chain alkanes.
- the polar solvent may be one having the small number of carbon atoms and specific examples thereof preferably used herein are methanol, ethanol and acetone.
- the metal nano-particles herein provided have a particle size of not more than 100 nm.
- the particle size of the metal nano-particles should be reduced to a level on the order of not more than 1/10 time of the required width of metal wires or not less than 1 nm and not more than 100 nm and preferably not less than 1 nm and not more than 10 nm.
- the metal nano-particles according to the present invention completely satisfy this requirement.
- the particles having a particle size of greater than 100 nm would undergo a sedimentation phenomenon due to their own weight and accordingly, the presence of such particles never ensures the formation of or never provides a dispersion having any excellent dispersibility.
- the method for the formation of a thin metallic wire or a metal film having electric conductivity comprises the steps of applying the foregoing metal nano-particle-containing dispersion onto the surface of a variety of base materials by the use of a coating technique such as the spin-coating method, drying the coated layer of the dispersion and then firing the dried layer.
- the drying temperature may be one which can dry the coated layer to such an extent that the layer is almost free of any fluidity and it is sufficient to use a drying temperature ranging from, for instance, 50 to 100° C.
- the firing temperature ranges from, for instance, 140 to 300° C. and preferably 140 to 220° C.
- Silver oleate was selected as the organic acid salt component and silver complex of octylamine was selected as the amine complex component.
- reaction solution was concentrated according to the ultrafiltration technique for the removal of any excess oleic acid and octylamine possibly affecting the thermal decomposition of the reaction solution and then toluene was used as a non-polar solvent for controlling the concentration of the reaction solution to thus give an Ag-containing dispersion having a concentration of 35% by mass.
- the resulting Ag nano-particles were inspected for the particle size and it was found to be 5 nm.
- the resulting dispersion was applied onto the surface of a substrate (a glass substrate) by the spin-coating technique, followed by drying the coated layer at 100° C. and the subsequent firing of the dried layer at 250° C. to thus form a thin film of Ag.
- the resulting film was inspected for the surface resistance and it (as expressed in terms of the specific resistance thereof) was found to be 3.6 ⁇ 10 ⁇ 6 ⁇ cm at a film thickness of 0.3 ⁇ m.
- Example 2 The same procedures used in Example 1 were repeated except for using silver linoleate as the organic acid salt component and a silver complex of octylamine as the amine complex component to thus form silver nano-particles, to form a film using the silver nano-particles and to evaluate the resulting film.
- the resistance value of the resulting film was found to be 3.6 ⁇ 10 ⁇ 6 ⁇ cm at a film thickness of 0.3 ⁇ m, as expressed in terms of the specific resistance.
- Example 2 The same procedures used in Example 1 were repeated except for using raw materials specified in the following Table 1 to thus form each corresponding metal nano-particles, to form a film using the metal nano-particles and to evaluate the resulting film.
- Example 5 The silver nano-particles prepared in Example 5 using oleic acid-Ag and dodecylamine-Ag complex was analyzed according to the TOF-SIMS analytical technique and the results thus obtained are depicted on the attached FIG. 1 . It was confirmed from these results that oleic acid-Ag (oleic acid+Ag) or dodecylamine-silver (dodecylamine+Ag) was adhered to the surface of the metal particles.
- oleic acid-Ag oleic acid+Ag
- dodecylamine-silver dodecylamine+Ag
- Example 2 The same procedures used in Example 1 were repeated except for using a 10% aqueous silver nitrate solution, SOLSPARS 24000 (the trade name of a product available from ZENEKA Company) as a polymer type dispersant and diethanol-amine as a reducing agent to thus form a dispersion containing silver nano-particles. After the completion of the reaction, the concentration of the dispersion was adjusted to a final concentration of 35%.
- SOLSPARS 24000 the trade name of a product available from ZENEKA Company
- the resulting dispersion was applied onto the surface of a substrate by the spin-coating technique, followed by drying the coated layer at 100° C. and the subsequent firing of the dried layer at 250° C. to thus form a thin film of Ag.
- the resulting thin film was inspected for the surface resistance and it (as expressed in terms of the specific resistance thereof) was found to be 7 ⁇ 10 ⁇ 2 ⁇ cm at a film thickness of 0.3 ⁇ m.
- the foregoing silver colloidal solution had a low concentration and accordingly, the colloidal solution was subjected to a concentration treatment through the ultrafiltration technique, but the colloidal solution underwent agglomeration during the course of the ultrafiltration.
- the film thickness should be increased in order to obtain sufficient conductivity.
- the use of the dispersion having such a low concentration required the coating operations over not less than 10 times.
- FIG. 1 is a graph showing the results of the TOF-SIMS analysis, observed for the silver nano-particles according to the present invention, which were prepared in Example 5.
- the dispersion containing metal nano-particles according to the present invention has a considerably high metal concentration and accordingly, the dispersion of the invention would permit the reduction of the number of film-forming steps when preparing a conductive film and the formation of a film having a conductivity sufficient for putting the same to practical use even through a low temperature firing treatment.
- This metal nano-particle-containing dispersion can be used in the preparation of metal wires and the like in the fields of, for instance, display devices such as a flat panel display in the fields of electric and electronic industries; and in the field of metal wire-printing.
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Abstract
Description
TABLE 1 | ||||||
Conc. | ||||||
of | Film | Res. | ||||
Ex. | Organic acid salt | Amine complex | Metal | Thickness | value | |
No. | component | component | Reducing agent | (%) | (μm) | (×10−6 Ω · cm) |
3 | Decanoic acid Ag | Hexylamine Ag | t-Butylamine borane | 35 | 0.30 | 3.2 |
4 | Decenoic acid Ag | Octylamine Ag | Na boron hydride | 35 | 0.35 | 4.8 |
5 | Oleic acid Ag | Dodecylamine | Dimethylamine | 35 | 0.35 | 4.2 |
Ag | borane | |||||
6 | Heptanoic acid Ag | Heptylamine Ag | Dimethylamine | 35 | 0.35 | 3.5 |
borane | ||||||
7 | Octanoic acid Ag | Hexylamine Ag | t-Butylamine borane | 35 | 0.25 | 4.0 |
8 | Nonanoic acid Ag | Decylamine Ag | Na boron hydride | 35 | 0.30 | 3.3 |
9 | Oleic acid Ag | 2-Ethylhexyl- | CO gas | 35 | 0.25 | 3.6 |
amine Ag | ||||||
10 | Decanoic acid Ag | 1-Amino- | H2 gas | 35 | 0.30 | 4.0 |
undecane Ag | ||||||
11 | Decenoic acid Ag | Hexylamine Ag | CO + N2 gas | 35 | 0.25 | 3.8 |
12 | Linoleic acid Ag | Octylamine Ag | H2 + N2 gas | 35 | 0.25 | 3.5 |
13 | Linolenic acid Ag | Heptylamine Ag | t-Butylamine borane | 35 | 0.30 | 3.2 |
14 | Hexanoic acid Ag | Hexylamine Ag | Na boron hydride | 35 | 0.30 | 3.8 |
15 | Dodecanoic acid | Decylamine Ag | Dimethylamine | 35 | 0.25 | 3.5 |
Ag | borane | |||||
16 | Oleic acid Ag | Heptylamine Ag | t-Butylamine borane | 35 | 0.25 | 3.9 |
17 | Decanoic acid Au | Hexylamine Au | CO + N2 gas | 35 | 0.30 | 4.0 |
18 | Decenoic acid Au | 1-Amino- | H2 gas | 35 | 0.25 | 3.4 |
undecane Au | ||||||
19 | Linoleic acid Au | Heptylamine Au | Dimethylamine | 35 | 0.25 | 3.6 |
borane | ||||||
20 | Linolenic acid Au | Octylamine Au | t-Butylamine borane | 35 | 0.30 | 3.9 |
21 | Hexanoic acid Au | Decylamine Au | t-Butylamine borane | 35 | 0.30 | 3.5 |
22 | Dodecanoic acid | Hexylamine Au | H2 + N2 gas | 35 | 0.25 | 3.8 |
Au | ||||||
23 | Oleic acid Au | Heptylamine Au | Na boron hydride | 35 | 0.25 | 3.2 |
Claims (16)
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JP2003317161A JP2005081501A (en) | 2003-09-09 | 2003-09-09 | Metallic nano particle and its manufacturing method, metallic nano particle dispersion fluid and its manufacturing method, and metallic thin line, metallic membrane and their manufacturing method |
JP2003-317161 | 2003-09-09 | ||
PCT/JP2004/012968 WO2005023702A1 (en) | 2003-09-09 | 2004-09-07 | Metal nanoparticle and method for producing same, liquid dispersion of metal nanoparticle and method for producing same, metal thin line, metal film and method for producing same |
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US20070134491A1 US20070134491A1 (en) | 2007-06-14 |
US7628840B2 true US7628840B2 (en) | 2009-12-08 |
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US10/571,315 Active 2025-07-25 US7628840B2 (en) | 2003-09-09 | 2004-09-07 | Metal nano-particles and method for preparing the same, dispersion of metal nano-particles and method for preparing the same, and thin metallic wire and metal film and method for preparing these substances |
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US (1) | US7628840B2 (en) |
EP (1) | EP1666408A4 (en) |
JP (1) | JP2005081501A (en) |
KR (1) | KR100764535B1 (en) |
CN (1) | CN1849260B (en) |
TW (1) | TW200510060A (en) |
WO (1) | WO2005023702A1 (en) |
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Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5250101A (en) * | 1991-04-08 | 1993-10-05 | Mitsubishi Gas Chemical Company, Inc. | Process for the production of fine powder |
JPH10183207A (en) | 1996-12-19 | 1998-07-14 | Tomoe Seisakusho:Kk | Ultrafine particles and method for producing the same |
JPH11319538A (en) | 1998-05-20 | 1999-11-24 | Nippon Paint Co Ltd | Production for colloid of noble metal or copper |
US6103868A (en) * | 1996-12-27 | 2000-08-15 | The Regents Of The University Of California | Organically-functionalized monodisperse nanocrystals of metals |
WO2000076699A1 (en) | 1999-06-15 | 2000-12-21 | Kimoto, Masaaki | Ultrafine composite metal powder and method for producing the same |
US6346136B1 (en) * | 2000-03-31 | 2002-02-12 | Ping Chen | Process for forming metal nanoparticles and fibers |
JP2002121606A (en) | 2000-10-13 | 2002-04-26 | Ulvac Corporate Center:Kk | Metallic hyperfine grain dispersed solution and its production method |
JP2002245854A (en) | 2001-02-20 | 2002-08-30 | Bando Chem Ind Ltd | Colloidal solution of metal, and manufacturing method of the same |
JP2002317215A (en) | 2001-04-19 | 2002-10-31 | Mitsuboshi Belting Ltd | Method for producing metallic fine particle |
US6974493B2 (en) * | 2002-11-26 | 2005-12-13 | Honda Motor Co., Ltd. | Method for synthesis of metal nanoparticles |
US20060070493A1 (en) * | 2003-06-10 | 2006-04-06 | Asahi Glass Company, Limited | Fine metal hydride particles, their production process, dispersion containing fine metal hydride particles and metallic material |
US7066978B2 (en) * | 2002-02-18 | 2006-06-27 | Fuji Photo Film Co., Ltd. | Nanoparticle, method of producing nanoparticle and magnetic recording medium |
US7081214B2 (en) * | 2000-10-25 | 2006-07-25 | Harima Chemicals, Inc. | Electroconductive metal paste and method for production thereof |
US7160525B1 (en) * | 2003-10-14 | 2007-01-09 | The Board Of Trustees Of The University Of Arkansas | Monodisperse noble metal nanocrystals |
US7335245B2 (en) * | 2004-04-22 | 2008-02-26 | Honda Motor Co., Ltd. | Metal and alloy nanoparticles and synthesis methods thereof |
US7407527B2 (en) * | 2001-10-12 | 2008-08-05 | Seoul National University Industry Foundation | Synthesis of mono-disperse and highly crystalline nano-particles of metals, alloys, metal-oxides, and multi-metallic oxides without a size-selection process |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5389122A (en) * | 1993-07-13 | 1995-02-14 | E. I. Du Pont De Nemours And Company | Process for making finely divided, dense packing, spherical shaped silver particles |
JPH11269656A (en) * | 1998-03-20 | 1999-10-05 | Kojundo Chem Lab Co Ltd | Production of thin film forming composition and thin film using the composition |
US6676729B2 (en) * | 2002-01-02 | 2004-01-13 | International Business Machines Corporation | Metal salt reduction to form alloy nanoparticles |
-
2003
- 2003-09-09 JP JP2003317161A patent/JP2005081501A/en active Pending
-
2004
- 2004-09-07 WO PCT/JP2004/012968 patent/WO2005023702A1/en active Application Filing
- 2004-09-07 US US10/571,315 patent/US7628840B2/en active Active
- 2004-09-07 KR KR1020067004830A patent/KR100764535B1/en not_active Expired - Lifetime
- 2004-09-07 EP EP04787672A patent/EP1666408A4/en not_active Withdrawn
- 2004-09-07 CN CN2004800259542A patent/CN1849260B/en not_active Expired - Lifetime
- 2004-09-07 TW TW093127010A patent/TW200510060A/en not_active IP Right Cessation
Patent Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5250101A (en) * | 1991-04-08 | 1993-10-05 | Mitsubishi Gas Chemical Company, Inc. | Process for the production of fine powder |
JPH10183207A (en) | 1996-12-19 | 1998-07-14 | Tomoe Seisakusho:Kk | Ultrafine particles and method for producing the same |
US6358611B1 (en) * | 1996-12-19 | 2002-03-19 | Tomoe Works Co., Ltd. | Ultrafine particles comprising an organometallic core and process for the production thereof |
US6103868A (en) * | 1996-12-27 | 2000-08-15 | The Regents Of The University Of California | Organically-functionalized monodisperse nanocrystals of metals |
JPH11319538A (en) | 1998-05-20 | 1999-11-24 | Nippon Paint Co Ltd | Production for colloid of noble metal or copper |
US6730400B1 (en) * | 1999-06-15 | 2004-05-04 | Teruo Komatsu | Ultrafine composite metal particles and method for manufacturing same |
WO2000076699A1 (en) | 1999-06-15 | 2000-12-21 | Kimoto, Masaaki | Ultrafine composite metal powder and method for producing the same |
US6346136B1 (en) * | 2000-03-31 | 2002-02-12 | Ping Chen | Process for forming metal nanoparticles and fibers |
JP2002121606A (en) | 2000-10-13 | 2002-04-26 | Ulvac Corporate Center:Kk | Metallic hyperfine grain dispersed solution and its production method |
US7081214B2 (en) * | 2000-10-25 | 2006-07-25 | Harima Chemicals, Inc. | Electroconductive metal paste and method for production thereof |
JP2002245854A (en) | 2001-02-20 | 2002-08-30 | Bando Chem Ind Ltd | Colloidal solution of metal, and manufacturing method of the same |
JP2002317215A (en) | 2001-04-19 | 2002-10-31 | Mitsuboshi Belting Ltd | Method for producing metallic fine particle |
US7407527B2 (en) * | 2001-10-12 | 2008-08-05 | Seoul National University Industry Foundation | Synthesis of mono-disperse and highly crystalline nano-particles of metals, alloys, metal-oxides, and multi-metallic oxides without a size-selection process |
US7066978B2 (en) * | 2002-02-18 | 2006-06-27 | Fuji Photo Film Co., Ltd. | Nanoparticle, method of producing nanoparticle and magnetic recording medium |
US6974493B2 (en) * | 2002-11-26 | 2005-12-13 | Honda Motor Co., Ltd. | Method for synthesis of metal nanoparticles |
US20060070493A1 (en) * | 2003-06-10 | 2006-04-06 | Asahi Glass Company, Limited | Fine metal hydride particles, their production process, dispersion containing fine metal hydride particles and metallic material |
US7160525B1 (en) * | 2003-10-14 | 2007-01-09 | The Board Of Trustees Of The University Of Arkansas | Monodisperse noble metal nanocrystals |
US7335245B2 (en) * | 2004-04-22 | 2008-02-26 | Honda Motor Co., Ltd. | Metal and alloy nanoparticles and synthesis methods thereof |
Non-Patent Citations (1)
Title |
---|
Sylvia Gomez et al., "Gold nanoparticles from self-assembled gold(I) amine precursors," No. 19, 2000, pp. 1945-1946. |
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CN1849260B (en) | 2011-12-14 |
EP1666408A1 (en) | 2006-06-07 |
JP2005081501A (en) | 2005-03-31 |
WO2005023702A1 (en) | 2005-03-17 |
TWI351982B (en) | 2011-11-11 |
TW200510060A (en) | 2005-03-16 |
US20070134491A1 (en) | 2007-06-14 |
KR20060069491A (en) | 2006-06-21 |
CN1849260A (en) | 2006-10-18 |
KR100764535B1 (en) | 2007-10-09 |
EP1666408A4 (en) | 2009-11-25 |
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