TWI367396B - - Google Patents

Info

Publication number: TWI367396B
Authority: TW; Taiwan

Application number

TW096134999A

Other languages

Chinese (zh)

Other versions

TW200836014A (en

Inventor

Toshikazu Takayama

Keita Ishiduka

Satoshi Maemori

Shigeru Yokoi

Original Assignee

Tokyo Ohka Kogyo Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2006-09-20

Filing date

2007-09-19

Publication date

2012-07-01

2007-09-19 Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd

2008-09-01 Publication of TW200836014A publication Critical patent/TW200836014A/zh

2012-07-01 Application granted granted Critical

2012-07-01 Publication of TWI367396B publication Critical patent/TWI367396B/zh

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Materials For Photolithography (AREA)

TW96134999A 2006-09-20 2007-09-19 Composition for formation of resist protection film, and method for formation of resist pattern using the same TW200836014A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2006254465		2006-09-20

Publications (2)

Publication Number	Publication Date
TW200836014A TW200836014A (en)	2008-09-01
TWI367396B true TWI367396B (ja)	2012-07-01

Family

ID=39200466

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW96134999A TW200836014A (en)	2006-09-20	2007-09-19	Composition for formation of resist protection film, and method for formation of resist pattern using the same

Country Status (3)

Country	Link
JP (1)	JP4918095B2 (ja)
TW (1)	TW200836014A (ja)
WO (1)	WO2008035640A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP1770442B1 (en) *	2005-10-03	2014-06-04	Rohm and Haas Electronic Materials, L.L.C.	Compositions and processes for photolithography
JP4844756B2 (ja) *	2006-12-19	2011-12-28	信越化学工業株式会社	パターン形成方法
JP4822028B2 (ja) *	2008-12-02	2011-11-24	信越化学工業株式会社	レジスト保護膜材料及びパターン形成方法
KR101813298B1 (ko)	2010-02-24	2017-12-28	바스프 에스이	잠재성 산 및 그의 용도

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4484603B2 (ja) *	2004-03-31	2010-06-16	セントラル硝子株式会社	トップコート組成物
JP4551701B2 (ja) *	2004-06-14	2010-09-29	富士フイルム株式会社	液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
JP4551704B2 (ja) *	2004-07-08	2010-09-29	富士フイルム株式会社	液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
JP2006030477A (ja) *	2004-07-14	2006-02-02	Fuji Photo Film Co Ltd	液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
JP4368267B2 (ja) *	2004-07-30	2009-11-18	東京応化工業株式会社	レジスト保護膜形成用材料、およびこれを用いたレジストパターン形成方法
KR101108754B1 (ko) *	2004-09-30	2012-03-14	제이에스알 가부시끼가이샤	공중합체 및 상층막 형성 조성물
JP2006243309A (ja) *	2005-03-03	2006-09-14	Jsr Corp	液浸上層膜用重合体および液浸上層膜用樹脂組成物
US8076053B2 (en) *	2005-10-27	2011-12-13	Jsr Corporation	Upper layer-forming composition and photoresist patterning method
JP5055743B2 (ja) *	2005-11-04	2012-10-24	セントラル硝子株式会社	含フッ素高分子コーティング用組成物、該コーティング用組成物を用いた含フッ素高分子膜の形成方法、ならびにフォトレジストまたはリソグラフィーパターンの形成方法。
JP4771083B2 (ja) *	2005-11-29	2011-09-14	信越化学工業株式会社	レジスト保護膜材料及びパターン形成方法
JP4553146B2 (ja) *	2006-01-31	2010-09-29	信越化学工業株式会社	レジスト保護膜材料及びパターン形成方法
JP4861237B2 (ja) *	2006-05-26	2012-01-25	信越化学工業株式会社	レジスト保護膜材料及びパターン形成方法
JP4763511B2 (ja) *	2006-05-26	2011-08-31	信越化学工業株式会社	レジスト保護膜材料及びパターン形成方法
JP4848888B2 (ja) *	2006-08-21	2011-12-28	Ｊｓｒ株式会社	上層膜形成組成物、及びフォトレジストパターン形成方法
JP4615497B2 (ja) *	2006-09-20	2011-01-19	東京応化工業株式会社	レジスト保護膜形成用組成物及びこれを用いたレジストパターンの形成方法

2007
- 2007-09-14 WO PCT/JP2007/067986 patent/WO2008035640A1/ja active Application Filing
- 2007-09-14 JP JP2008535340A patent/JP4918095B2/ja active Active
- 2007-09-19 TW TW96134999A patent/TW200836014A/zh unknown

Also Published As

Publication number	Publication date
TW200836014A (en)	2008-09-01
JPWO2008035640A1 (ja)	2010-01-28
WO2008035640A1 (fr)	2008-03-27
JP4918095B2 (ja)	2012-04-18

Publication	Publication Date	Title
CH2121272H1 (ja)	2020-12-15
TWI367396B (ja)	2012-07-01
BY9789C1 (ja)	2007-10-30
CN300727320S (zh)	2008-01-02	摩托车大货架
CN300726824S (zh)	2008-01-02	酒瓶(5)
CN300732474S (zh)	2008-01-16	行李手推车(3)
CN300732386S (zh)	2008-01-16	不锈钢水表壳体(65mm)
CN300732330S (zh)	2008-01-16	话费显示器(jf979lcda)
CN300731220S (zh)	2008-01-16	面料(zj-201b)
CN300731192S (zh)	2008-01-16	牙刷
CN300731009S (zh)	2008-01-16	虾饼
CN300730865S (zh)	2008-01-09	壁灯(十)
CN300730527S (zh)	2008-01-09	油烟机(a708型)
CN300729115S (zh)	2008-01-09	烤箱(ks66b)
CN300727705S (zh)	2008-01-02	用于插秧机的栽植臂注油塞
CN300726869S (zh)	2008-01-02	包装纸箱(ypd)
CN300726807S (zh)	2008-01-02	酒瓶
CN300726458S (zh)	2008-01-02	更衣柜(四门ca-gy-145)
CN300725944S (zh)	2008-01-02	童装(3890)
CN300725943S (zh)	2008-01-02	童装(3876)
CN300725942S (zh)	2008-01-02	童装(3874)
CN300725941S (zh)	2008-01-02	童装(3872)
CN300725940S (zh)	2008-01-02	童装(3870)
CN300725939S (zh)	2008-01-02	童装裤子(3856)
CN300725938S (zh)	2008-01-02	童装(3854)