KR20110000327A - Angle valve type pressure regulator - Google Patents
Angle valve type pressure regulator Download PDFInfo
- Publication number
- KR20110000327A KR20110000327A KR1020090057770A KR20090057770A KR20110000327A KR 20110000327 A KR20110000327 A KR 20110000327A KR 1020090057770 A KR1020090057770 A KR 1020090057770A KR 20090057770 A KR20090057770 A KR 20090057770A KR 20110000327 A KR20110000327 A KR 20110000327A
- Authority
- KR
- South Korea
- Prior art keywords
- angle valve
- flow rate
- type pressure
- vacuum
- adjust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
- F16K1/32—Details
- F16K1/34—Cutting-off parts, e.g. valve members, seats
- F16K1/36—Valve members
- F16K1/38—Valve members of conical shape
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Sliding Valves (AREA)
Abstract
본 발명은 실리콘 단결정 잉곳 성장장치에 관한 것으로서, 잉곳 성장은 일정한 진공상태에서 진행되어 진다. 일정한 진공상태를 맞추기 위해서는 진공 주 배관에 장착되어진 앵글벨브를 이용해서 진공펌프의 유량을 조절한다. 기존의 앵글밸브는 간격 조절하기가 어렵게 되어 있어 작업시간이 오래 걸리며, 정확한 유량 조절이 어렵다. 본 발명에서는 이러한 문제점들을 해결하기 위해 기존의 앵글밸브에 유량 조절 장치를 새롭게 구성하는 것을 특징으로 한다. The present invention relates to a silicon single crystal ingot growth apparatus, wherein the ingot growth is performed in a constant vacuum state. To maintain a constant vacuum condition, the flow rate of the vacuum pump is controlled by using an angle valve mounted on the vacuum main pipe. Conventional angle valve is difficult to adjust the interval takes a long time, it is difficult to adjust the precise flow. In the present invention, in order to solve these problems, it is characterized in that the flow rate regulating device is newly configured in the existing angle valve.
진공펌프, 앵글밸브, 실리콘 단결정 Vacuum Pump, Angle Valve, Silicon Single Crystal
Description
본 발명은 기존에 유량 조절이 어려운 앵글밸브에 유량 조절이 가능하도록 새로운 장치를 추가 설치하는 것이다.The present invention is to install a new device to enable the flow rate adjustment to the existing angle control difficult flow control.
실리콘 단결정 성장공정에서 성장장치 내부 진공을 일정하게 유지 시켜야 원하는 잉곳을 생산 할 수가 있다. 내부 진공은 진공 주 배관에 창착된 밸브의 간격을 조정하여 일정하게 유지를 시킨다. 밸브의 간격을 조정하는데 상당한 시간이 소요되면서 시간 연장, 전기 사용량 증가 등의 생산 원가상승 문제가 발생된다. In the silicon single crystal growth process, the vacuum inside the growth device must be kept constant to produce the desired ingot. The internal vacuum is maintained constant by adjusting the spacing of valves attached to the vacuum main pipe. It takes considerable time to adjust the valve spacing, which raises production cost issues such as time extension and increased electricity usage.
본 발명의 목적은 진공 주 배관에 설치된 앵글밸브에 유량을 조절할 수 있는 장치를 설치하여 빠른 시간에 정확한 유량을 조절 할 수 있도록 하는 것이다. An object of the present invention is to install a device that can adjust the flow rate in the angle valve installed in the vacuum main pipe to control the exact flow rate in a short time.
기존의 앵글밸브와 동일한 구성으로 제작되며 내부 게이트판 하부에 원뿔모양의 부품을 장착하여 세밀한 유량 조절이 가능하도록 만들 수 있다.It is manufactured in the same configuration as the existing angle valve and can be made to adjust the flow rate by installing a conical part under the inner gate plate.
세밀한 유량 조절이 가능한 앵글밸브를 사용하면 빠른 시간에 정확한 유량을 조절 할 수가 있어, 작업시간 단축과 전기 사용량을 감소시킬 수 있다. The angle valve with fine flow rate control enables accurate flow rate control in a short time, reducing work time and reducing electricity consumption.
앵글밸브는 몸체, 게이트 플랜지, 핸들로 구분이 된다. 게이트 플랜지가 열리면 유량이 흐르게 되는데 기존의 게이트 플랜지는 평평한 원반모양으로 되어 있다. 본 장치는 평평한 게이트 플랜지 밑 부분에 원뿔형 모양의 기둥을 추가 장착하여 유량 조절이 가능하도록 설계하였다.Angle valves are divided into body, gate flange and handle. When the gate flange is opened, the flow rate flows. The conventional gate flange has a flat disk shape. The device is designed to control the flow rate by adding a conical pillar at the bottom of the flat gate flange.
도 1) 기존 앵글밸브 단면도1) Cross section of the conventional angle valve
도 2) 본 발명 앵글밸브 단면도 Figure 2) angle valve cross section of the present invention
도 3) 유량 조절 단계 3) Flow control step
<도면에서 기호 설명 ><Description of Symbols in Drawings>
(1) 몸체 (2) 게이트 플랜지(1) Body (2) Gate Flange
(3) 핸들 (4) 오링(3) handle (4) o-ring
(5) 가스 (5) gas
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090057770A KR20110000327A (en) | 2009-06-26 | 2009-06-26 | Angle valve type pressure regulator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090057770A KR20110000327A (en) | 2009-06-26 | 2009-06-26 | Angle valve type pressure regulator |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20110000327A true KR20110000327A (en) | 2011-01-03 |
Family
ID=43609196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020090057770A Ceased KR20110000327A (en) | 2009-06-26 | 2009-06-26 | Angle valve type pressure regulator |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20110000327A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103629369A (en) * | 2012-07-26 | 2014-03-12 | 腓特烈斯港齿轮工厂股份公司 | Valve device with a flow guiding device |
CN106195298A (en) * | 2016-08-31 | 2016-12-07 | 施杨 | A kind of anti-sluice of metalling run out that can be automatically switched off and open |
KR20220038408A (en) * | 2019-07-31 | 2022-03-28 | 알레디아 | Laser processing systems and methods |
-
2009
- 2009-06-26 KR KR1020090057770A patent/KR20110000327A/en not_active Ceased
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103629369A (en) * | 2012-07-26 | 2014-03-12 | 腓特烈斯港齿轮工厂股份公司 | Valve device with a flow guiding device |
CN106195298A (en) * | 2016-08-31 | 2016-12-07 | 施杨 | A kind of anti-sluice of metalling run out that can be automatically switched off and open |
KR20220038408A (en) * | 2019-07-31 | 2022-03-28 | 알레디아 | Laser processing systems and methods |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104197056B (en) | Adjustable flow dynamic balance valve | |
WO2009016911A1 (en) | Semiconductor single crystal manufacturing apparatus | |
KR20110000327A (en) | Angle valve type pressure regulator | |
CN103982164A (en) | Concentric eccentric valve regulating water distributor | |
CN102384291B (en) | Self-operated flow control valve | |
CN101344178A (en) | An automatic pressure regulating and stabilizing valve | |
CN202302214U (en) | Full-automatic differential pressure type gate valve | |
CN201957536U (en) | Water pressure regulation and control valve | |
CN111396607A (en) | Automatic water injection flow adjusting device | |
CN201396553Y (en) | Non-diaphragm improved self-operated flow control valve | |
CN202302212U (en) | Opening adjusting device of gate valve | |
CN103292876A (en) | Water meter adjusting device | |
CN201686507U (en) | Adjustable water distribution hole | |
CN202328405U (en) | Air valve regulating device for gas stove | |
CN201547263U (en) | Steam control valve | |
CN204025809U (en) | Adjustable flow dynamic balance valve | |
CN106641302A (en) | Precise and adjustable gas flow spray pipe | |
CN201696698U (en) | Pressure maintaining valve | |
CN204602160U (en) | A kind of chemical producing system | |
TW200722948A (en) | Proportion controlling valve for pressure and flow rate | |
CN205244585U (en) | Improve valve of structure | |
CN203348660U (en) | Valve element of flow adjusting valve | |
CN205323705U (en) | Chemical industry production system | |
CN101929553B (en) | Equal-percent butterfly valve and control method thereof | |
CN219388789U (en) | Flow control valve convenient to adjust |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20090626 |
|
PA0201 | Request for examination | ||
N231 | Notification of change of applicant | ||
PN2301 | Change of applicant |
Patent event date: 20101202 Comment text: Notification of Change of Applicant Patent event code: PN23011R01D |
|
PG1501 | Laying open of application | ||
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20110324 Patent event code: PE09021S01D |
|
E601 | Decision to refuse application | ||
PE0601 | Decision on rejection of patent |
Patent event date: 20110601 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20110324 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |