JPWO2022099071A5 - - Google Patents
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- JPWO2022099071A5 JPWO2022099071A5 JP2023526986A JP2023526986A JPWO2022099071A5 JP WO2022099071 A5 JPWO2022099071 A5 JP WO2022099071A5 JP 2023526986 A JP2023526986 A JP 2023526986A JP 2023526986 A JP2023526986 A JP 2023526986A JP WO2022099071 A5 JPWO2022099071 A5 JP WO2022099071A5
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- formula
- salt
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- 150000003839 salts Chemical class 0.000 claims description 254
- 150000001875 compounds Chemical class 0.000 claims description 232
- 238000000034 method Methods 0.000 claims description 83
- 239000002585 base Substances 0.000 claims description 45
- 125000000217 alkyl group Chemical group 0.000 claims description 30
- 239000003054 catalyst Substances 0.000 claims description 24
- 238000000634 powder X-ray diffraction Methods 0.000 claims description 24
- MKBCIWOTYZICDR-GDLZYMKVSA-N 1-[[7-cyano-2-[3-[3-[[2-(difluoromethyl)-7-[[(3R)-3-hydroxypyrrolidin-1-yl]methyl]pyrido[3,2-d]pyrimidin-4-yl]amino]-2-methylphenyl]-2-methylphenyl]-1,3-benzoxazol-5-yl]methyl]piperidine-4-carboxylic acid Chemical compound C(#N)C1=CC(=CC=2N=C(OC=21)C=1C(=C(C=CC=1)C1=C(C(=CC=C1)NC=1C2=C(N=C(N=1)C(F)F)C=C(C=N2)CN1C[C@@H](CC1)O)C)C)CN1CCC(CC1)C(=O)O MKBCIWOTYZICDR-GDLZYMKVSA-N 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 12
- 239000003638 chemical reducing agent Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 229910001508 alkali metal halide Inorganic materials 0.000 claims description 7
- 150000008045 alkali metal halides Chemical class 0.000 claims description 7
- 238000001938 differential scanning calorimetry curve Methods 0.000 claims description 7
- 239000002841 Lewis acid Substances 0.000 claims description 6
- 150000007517 lewis acids Chemical class 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 230000002140 halogenating effect Effects 0.000 claims description 5
- DPGSPRJLAZGUBQ-UHFFFAOYSA-N 2-ethenyl-4,4,5,5-tetramethyl-1,3,2-dioxaborolane Chemical compound CC1(C)OB(C=C)OC1(C)C DPGSPRJLAZGUBQ-UHFFFAOYSA-N 0.000 claims description 4
- 239000012458 free base Substances 0.000 claims description 4
- 239000012320 chlorinating reagent Substances 0.000 claims description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 3
- IYXUFOCLMOXQSL-UHFFFAOYSA-N (2,2-difluoroacetyl) 2,2-difluoroacetate Chemical compound FC(F)C(=O)OC(=O)C(F)F IYXUFOCLMOXQSL-UHFFFAOYSA-N 0.000 claims description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 2
- 229930040373 Paraformaldehyde Natural products 0.000 claims description 2
- YKGMKSIHIVVYKY-UHFFFAOYSA-N dabrafenib mesylate Chemical compound CS(O)(=O)=O.S1C(C(C)(C)C)=NC(C=2C(=C(NS(=O)(=O)C=3C(=CC=CC=3F)F)C=CC=2)F)=C1C1=CC=NC(N)=N1 YKGMKSIHIVVYKY-UHFFFAOYSA-N 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 229920002866 paraformaldehyde Polymers 0.000 claims description 2
- 125000001475 halogen functional group Chemical group 0.000 claims 20
- 238000001757 thermogravimetry curve Methods 0.000 claims 5
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 claims 4
- 239000008194 pharmaceutical composition Substances 0.000 claims 3
- 206010028980 Neoplasm Diseases 0.000 claims 2
- 201000011510 cancer Diseases 0.000 claims 2
- 238000000113 differential scanning calorimetry Methods 0.000 claims 2
- 201000010099 disease Diseases 0.000 claims 2
- 208000035475 disorder Diseases 0.000 claims 2
- 238000002411 thermogravimetry Methods 0.000 claims 2
- 102000008096 B7-H1 Antigen Human genes 0.000 claims 1
- 108010074708 B7-H1 Antigen Proteins 0.000 claims 1
- 206010005003 Bladder cancer Diseases 0.000 claims 1
- 208000030808 Clear cell renal carcinoma Diseases 0.000 claims 1
- 208000037845 Cutaneous squamous cell carcinoma Diseases 0.000 claims 1
- 208000008839 Kidney Neoplasms Diseases 0.000 claims 1
- 206010058467 Lung neoplasm malignant Diseases 0.000 claims 1
- 206010038389 Renal cancer Diseases 0.000 claims 1
- 208000006265 Renal cell carcinoma Diseases 0.000 claims 1
- 206010041067 Small cell lung cancer Diseases 0.000 claims 1
- 206010046431 Urethral cancer Diseases 0.000 claims 1
- 206010046458 Urethral neoplasms Diseases 0.000 claims 1
- 208000007097 Urinary Bladder Neoplasms Diseases 0.000 claims 1
- 239000003937 drug carrier Substances 0.000 claims 1
- 206010073071 hepatocellular carcinoma Diseases 0.000 claims 1
- 231100000844 hepatocellular carcinoma Toxicity 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- 230000005764 inhibitory process Effects 0.000 claims 1
- 230000003993 interaction Effects 0.000 claims 1
- 201000010982 kidney cancer Diseases 0.000 claims 1
- 201000007270 liver cancer Diseases 0.000 claims 1
- 208000014018 liver neoplasm Diseases 0.000 claims 1
- 201000005202 lung cancer Diseases 0.000 claims 1
- 208000020816 lung neoplasm Diseases 0.000 claims 1
- 201000001441 melanoma Diseases 0.000 claims 1
- 208000002154 non-small cell lung carcinoma Diseases 0.000 claims 1
- 239000000546 pharmaceutical excipient Substances 0.000 claims 1
- 201000010106 skin squamous cell carcinoma Diseases 0.000 claims 1
- 208000000587 small cell lung carcinoma Diseases 0.000 claims 1
- 208000029729 tumor suppressor gene on chromosome 11 Diseases 0.000 claims 1
- 201000005112 urinary bladder cancer Diseases 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 description 21
- 125000001246 bromo group Chemical group Br* 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical group [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 2
- 150000008041 alkali metal carbonates Chemical class 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical group [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- CSRZQMIRAZTJOY-UHFFFAOYSA-N trimethylsilyl iodide Chemical compound C[Si](C)(C)I CSRZQMIRAZTJOY-UHFFFAOYSA-N 0.000 description 2
- 229910001513 alkali metal bromide Inorganic materials 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical group CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical group COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 description 1
Description
本明細書に記載されるものに加えて、本発明の種々の修正形態が上述の説明から当業者に明らかとなろう。かかる修正形態もまた、添付の特許請求の範囲内に該当することが意図される。本願に引用される全ての特許、特許出願、及び刊行物を含めた各参考文献は、参照によりその全体が本明細書に援用される。
本願は下記の態様も包含する。
[態様1]
式1の化合物またはその薬学的に許容される塩の結晶形態:
前記式1の化合物または前記その薬学的に許容される塩が、前記式1の化合物の遊離塩基である、態様1に記載の結晶形態。
[態様3]
前記式1の化合物の前記遊離塩基が、セスキ水和物である、態様2に記載の結晶形態。
[態様4]
形態Iを有する、態様2または3に記載の結晶形態。
[態様5]
2シータ(±0.2度)で、7.0、8.5、10.0、10.6、14.6、15.2、15.8、17.2、20.1、21.1、23.9、24.8、26.1、28.1、29.6、及び30.2度から選択される少なくとも1つのXRPDピークを有する、態様4に記載の結晶形態。
[態様6]
2シータ(±0.2度)で、7.0、8.5、10.0、10.6、14.6、15.2、15.8、17.2、20.1、21.1、23.9、24.8、26.1、28.1、29.6、及び30.2度から選択される少なくとも4つのXRPDピークを有する、態様4に記載の結晶形態。
[態様7]
DSCサーモグラムにおいて、開始温度(±3℃)が35℃及び最高温度(±3℃)が68℃、ならびに開始温度(±3℃)が161℃及び最高温度(±3℃)が169℃の2つの吸熱ピークを有する、態様4~6のいずれか1つに記載の結晶形態。
[態様8]
形態IIを有する、態様2に記載の結晶形態。
[態様9]
2シータ(±0.2度)で、8.5、15.0、15.7、17.0、18.6、20.2、20.5、21.7、25.5、及び26.7度から選択される少なくとも4つのXRPDピークを有する、態様8に記載の結晶形態。
[態様10]
DSCサーモグラムにおいて、最高温度(±3℃)が76℃、開始温度(±3℃)が165℃及び最高温度(±3℃)が173℃、開始温度(±3℃)が206℃及び最高温度(±3℃)が224℃の3つの吸熱ピークを有する、態様8または9に記載の結晶形態。
[態様11]
前記式1の化合物または前記その薬学的に許容される塩が、メタンスルホン酸塩である、態様1に記載の結晶形態。
[態様12]
形態IIIを有する、態様11に記載の結晶形態。
[態様13]
2シータ(±0.2度)で、5.2、7.5、8.2、8.8、9.4、11.6、12.4、13.0、14.0、14.8、15.8、16.6、16.9、17.3、17.9、19.2、23.6、24.5、25.5、及び26.6度から選択される少なくとも4つのXRPDピークを有する、態様11または12に記載の結晶形態。
[態様14]
DSCサーモグラムにおいて、開始温度(±3℃)が30℃及び最高温度(±3℃)が67℃、開始温度(±3℃)が179℃及び最高温度(±3℃)が202℃の2つの吸熱ピークを有する、態様11~13のいずれか1つに記載の結晶形態。
[態様15]
(R)-1-((7-シアノ-2-(3’-((2-(ジフルオロメチル)-7-((3-ヒドロキシピロリジン-1-イル)メチル)ピリド[3,2-d]ピリミジン-4-イル)アミノ)-2,2’-ジメチル-[1,1’-ビフェニル]-3-イル)ベンゾ[d]オキサゾール-5-イル)メチル)ピペリジン-4-カルボン酸(式1の化合物)、またはその塩を調製するプロセスであって、
式B-2の化合物:
[態様16]
X
1b
が、ブロモである、態様15に記載のプロセス。
[態様17]
前記鈴木触媒が、パラジウム触媒である、態様15または16に記載のプロセス。
[態様18]
前記式B-2の化合物または前記その塩と、前記式B-3の塩との前記反応に存在する前記塩基が、アルカリ金属炭酸塩である、態様15~17のいずれか1つに記載のプロセス。
[態様19]
前記プロセスが、
式B-2aの化合物:
[態様20]
前記プロセスが、
式B-2a’の化合物:
[態様21]
(R)-1-((7-シアノ-2-(3’-((2-(ジフルオロメチル)-7-((3-ヒドロキシピロリジン-1-イル)メチル)ピリド[3,2-d]ピリミジン-4-イル)アミノ)-2,2’-ジメチル-[1,1’-ビフェニル]-3-イル)ベンゾ[d]オキサゾール-5-イル)メチル)ピペリジン-4-カルボン酸(式1の化合物)、またはその塩を調製するプロセスであって、
式A-3の化合物:
[態様22]
前記式A-3の化合物または前記その塩と、前記式B-1の化合物または前記その塩との前記反応に存在する前記塩基が、アルカリ金属炭酸塩である、態様21に記載のプロセス。
[態様23]
X
1b
が、ブロモまたはクロロである、態様21または22に記載のプロセス。
[態様24]
前記プロセスが、
式B-2の化合物:
[態様25]
前記プロセスが、
式A-3aの化合物:
[態様26]
前記プロセスが、
式A-3a’の化合物:
[態様27]
(R)-1-((7-シアノ-2-(3’-((2-(ジフルオロメチル)-7-((3-ヒドロキシピロリジン-1-イル)メチル)ピリド[3,2-d]ピリミジン-4-イル)アミノ)-2,2’-ジメチル-[1,1’-ビフェニル]-3-イル)ベンゾ[d]オキサゾール-5-イル)メチル)ピペリジン-4-カルボン酸(式1の化合物)、またはその塩を調製するプロセスであって、
式A-3の化合物:
[態様28]
前記式A-3の化合物または前記その塩と、前記式A-4の化合物または前記その塩との前記反応が、ハロゲン化アルカリ金属及び塩基の存在下で実施される、態様27に記載のプロセス。
[態様29]
前記ハロゲン化アルカリ金属が、臭化アルカリ金属である、態様28に記載のプロセス。
[態様30]
前記ハロゲン化アルカリ金属が、LiBrである、態様28または29に記載のプロセス。
[態様31]
前記塩基が、第三級アミンである、態様28~30のいずれか1つに記載のプロセス。
[態様32]
前記塩基が、N,N-ジイソプロピルアミン、メチルアミン、ジメチルアミン、トリメチルアミン、及びエチルアミンから選択される、態様28~31のいずれか1つに記載のプロセス。
[態様33]
前記プロセスが、
式A-3aの化合物:
[態様34]
前記プロセスが、
a)式A-3aの化合物:
b)前記式A-5aの化合物:
c)前記式A-7aの化合物:
[態様35]
(R)-1-((7-シアノ-2-(3’-((2-(ジフルオロメチル)-7-((3-ヒドロキシピロリジン-1-イル)メチル)ピリド[3,2-d]ピリミジン-4-イル)アミノ)-2,2’-ジメチル-[1,1’-ビフェニル]-3-イル)ベンゾ[d]オキサゾール-5-イル)メチル)ピペリジン-4-カルボン酸(式1の化合物)、またはその塩を調製するプロセスであって、
式A-5の化合物:
[態様36]
前記プロセスが、
式A-5の化合物:
[態様37]
前記還元剤が、水素化ホウ素還元剤である、態様35または36に記載のプロセス。
[態様38]
前記還元剤が、NaBH
4
、NaBH
3
CN、及びNaBH(OAc)
3
から選択される、態様35~37のいずれか1つに記載のプロセス。
[態様39]
前記式A-5の化合物または前記その塩と、前記式A-6の化合物または前記その塩との前記反応が、触媒の存在下で実行される、態様35~38のいずれか1つに記載のプロセス。
[態様40]
前記触媒が、ホウ酸トリメチルである、態様39に記載のプロセス。
[態様41]
前記式A-5の化合物または前記その塩と、前記式A-6の化合物またはその塩との前記反応が、有機ニトリル及び有機ハロゲン化物を含む溶媒成分中で実行される、態様35~40のいずれか1つに記載のプロセス。
[態様42]
前記プロセスが、
式A-5aの化合物:
[態様43]
前記式A-3の化合物または前記その塩が、
式A-1の化合物:
X
3a
が、ハロであり、
R
1
が、C
1-6
アルキルであり、
各R
2
が独立して、H及びC
1-6
アルキルから選択されるか、または
各R
2
が一緒に、任意選択で1、2、3、もしくは4つの独立して選択されるC
1-4
アルキル基により置換される、C
2-3
アルキレンリンカーを形成する、態様21~24及び27~32のいずれか1つに記載のプロセス。
[態様44]
前記プロセスが、
式A-1aの化合物:
[態様45]
前記プロセスが、
式A-1a’の化合物:
[態様46]
前記式1の化合物または前記その塩が、
式A-7の化合物:
[態様47]
前記式A-7の化合物または前記その塩から、前記式1の化合物または前記その塩への前記変換が、前記式A-7の化合物または前記その塩をルイス酸で処理することを含む、態様46に記載のプロセス。
[態様48]
前記式A-7の化合物または前記その塩の前記変換に存在する前記ルイス酸が、ヨードトリメチルシランである、態様47に記載のプロセス。
[態様49]
前記式A-7の化合物または前記その塩から、前記式1の化合物または前記その塩への前記変換が、前記式A-7の化合物または前記その塩を塩基で処理することを含む、態様46に記載のプロセス。
[態様50]
前記式A-7の化合物または前記その塩の前記変換に存在する前記塩基が、水酸化ナトリウムである、態様47に記載のプロセス。
[態様51]
前記式1の化合物または前記その塩が、
式A-7aの化合物:
[態様52]
前記式1の化合物または前記その塩が、
式A-7a’の化合物:
[態様53]
式A-1の化合物:
[態様54]
前記式6の化合物または前記その塩が、
式5の化合物:
[態様55]
前記式5の化合物または前記その塩が、
式4の化合物:
[態様56]
前記式4の化合物が、
式3の化合物:
[態様57]
前記式8Aの化合物が、
式8の化合物:
[態様58]
X
3a
が、ブロモである、態様53~57のいずれか1つに記載のプロセス。
[態様59]
R
1
が、t-ブチルである、態様53~58のいずれか1つに記載のプロセス。
[態様60]
前記式B-1の化合物または前記その塩が、
式12の化合物:
[態様61]
X
1b
が、ブロモである、態様60に記載のプロセス。
[態様62]
前記ハロゲン化剤が、塩素化剤である、態様60または61に記載のプロセス。
[態様63]
前記式A-4の化合物または前記その塩が、
式14の化合物:
[態様64]
X
2a
が、クロロである、態様63に記載のプロセス。
[態様65]
前記式14の化合物または前記その塩が、
式13の化合物:
[態様66]
前記式13の化合物または前記その塩が、
式12の化合物:
[態様67]
前記式12の化合物または前記その塩が、
式11の化合物:
[態様68]
前記式11の化合物または前記その塩が、
式10の化合物:
[態様69]
X
1b
が、ブロモである、態様66~68のいずれか1つに記載のプロセス。
[態様70]
(R)-1-((7-シアノ-2-(3’-((2-(ジフルオロメチル)-7-((3-ヒドロキシピロリジン-1-イル)メチル)ピリド[3,2-d]ピリミジン-4-イル)アミノ)-2,2’-ジメチル-[1,1’-ビフェニル]-3-イル)ベンゾ[d]オキサゾール-5-イル)メチル)ピペリジン-4-カルボン酸、またはその塩を調製するプロセスであって、
(a)式A-1a’の化合物:
(b)前記式A-3a’の化合物または前記その塩を、式B-1aの化合物:
(c)前記式B-2a’の化合物または前記その塩を、式B-3aの塩:
(d)前記式A-7a’の化合物または前記その塩を脱保護して、前記(R)-1-((7-シアノ-2-(3’-((2-(ジフルオロメチル)-7-((3-ヒドロキシピロリジン-1-イル)メチル)ピリド[3,2-d]ピリミジン-4-イル)アミノ)-2,2’-ジメチル-[1,1’-ビフェニル]-3-イル)ベンゾ[d]オキサゾール-5-イル)メチル)ピペリジン-4-カルボン酸、または前記その塩を形成させることと、を含む、前記プロセス。
[態様71]
(a)式A-1の化合物:
(b)式A-1aの化合物:
(c)式A-1a’の化合物:
(d)式A-3の化合物:
(e)式A-3aの化合物:
(f)式A-3a’の化合物:
(g)式A-4の化合物:
(h)式A-4aの化合物:
(i)式A-5の化合物:
(j)式A-5aの化合物:
(k)式A-7の化合物:
(l)式A-7aの化合物:
(m)式A-7a’の化合物:
(n)式B-2の化合物:
(o)式B-2aの化合物:
(p)式B-2a’の化合物:
(q)式4の化合物:
(r)式5の化合物:
(s)式6の化合物:
(t)式4aの化合物:
(u)式5aの化合物:
(v)式6aの化合物:
(w)式11の化合物:
(x)式11aの化合物:
The present application also includes the following aspects.
[Aspect 1]
A crystalline form of the compound of formula 1 or a pharma- ceutically acceptable salt thereof:
The crystalline form of aspect 1, wherein said compound of formula 1 or said pharma- ceutically acceptable salt thereof is a free base of said compound of formula 1.
[Aspect 3]
The crystalline form of aspect 2, wherein the free base of the compound of formula 1 is a sesquihydrate.
[Aspect 4]
The crystalline form according to aspect 2 or 3, having Form I.
[Aspect 5]
5. The crystalline form of embodiment 4 having at least one XRPD peak selected from 7.0, 8.5, 10.0, 10.6, 14.6, 15.2, 15.8, 17.2, 20.1, 21.1, 23.9, 24.8, 26.1, 28.1, 29.6, and 30.2 degrees two theta (±0.2 degrees).
[Aspect 6]
5. The crystalline form of embodiment 4 having at least four XRPD peaks selected from 7.0, 8.5, 10.0, 10.6, 14.6, 15.2, 15.8, 17.2, 20.1, 21.1, 23.9, 24.8, 26.1, 28.1, 29.6, and 30.2 degrees two theta (±0.2 degrees).
[Aspect 7]
A crystalline form according to any one of aspects 4 to 6, having two endothermic peaks in a DSC thermogram with an onset temperature (±3°C) of 35°C and a maximum temperature (±3°C) of 68°C, and an onset temperature (±3°C) of 161°C and a maximum temperature (±3°C) of 169°C.
[Aspect 8]
The crystalline form according to aspect 2, having Form II.
[Aspect 9]
The crystalline form of aspect 8, having at least four XRPD peaks selected from 8.5, 15.0, 15.7, 17.0, 18.6, 20.2, 20.5, 21.7, 25.5, and 26.7 degrees two theta (±0.2 degrees).
[Aspect 10]
10. The crystalline form of embodiment 8 or 9, having three endothermic peaks in a DSC thermogram with a maximum temperature (±3°C) of 76°C, an onset temperature (±3°C) of 165°C and a maximum temperature (±3°C) of 173°C, an onset temperature (±3°C) of 206°C and a maximum temperature (±3°C) of 224°C.
[Aspect 11]
The crystalline form of embodiment 1, wherein said compound of formula 1 or said pharma- ceutically acceptable salt thereof is a methanesulfonate salt.
[Aspect 12]
12. The crystalline form according to aspect 11, having Form III.
[Aspect 13]
13. The crystalline form of embodiment 11 or 12, having at least four XRPD peaks selected from 5.2, 7.5, 8.2, 8.8, 9.4, 11.6, 12.4, 13.0, 14.0, 14.8, 15.8, 16.6, 16.9, 17.3, 17.9, 19.2, 23.6, 24.5, 25.5, and 26.6 degrees two theta (±0.2 degrees).
[Aspect 14]
14. The crystalline form of any one of aspects 11 to 13, having two endothermic peaks in a DSC thermogram with an onset temperature (±3°C) of 30°C and a maximum temperature (±3°C) of 67°C, and an onset temperature (±3°C) of 179°C and a maximum temperature (±3°C) of 202°C.
[Aspect 15]
1. A process for preparing (R)-1-((7-cyano-2-(3'-((2-(difluoromethyl)-7-((3-hydroxypyrrolidin-1-yl)methyl)pyrido[3,2-d]pyrimidin-4-yl)amino)-2,2'-dimethyl-[1,1'-biphenyl]-3-yl)benzo[d]oxazol-5-yl)methyl)piperidine-4-carboxylic acid (compound of formula 1), or a salt thereof, comprising:
Compound of formula B-2:
[Aspect 16]
The process according to aspect 15, wherein X 1b is bromo.
[Aspect 17]
17. The process of claim 15 or 16, wherein the Suzuki catalyst is a palladium catalyst.
[Aspect 18]
Aspect 18. The process of any one of aspects 15 to 17, wherein the base present in the reaction of the compound of formula B-2, or the salt thereof, with the salt of formula B-3 is an alkali metal carbonate.
[Aspect 19]
The process comprising:
Compound of formula B-2a:
[Aspect 20]
The process comprising:
Compound of formula B-2a':
[Aspect 21]
1. A process for preparing (R)-1-((7-cyano-2-(3'-((2-(difluoromethyl)-7-((3-hydroxypyrrolidin-1-yl)methyl)pyrido[3,2-d]pyrimidin-4-yl)amino)-2,2'-dimethyl-[1,1'-biphenyl]-3-yl)benzo[d]oxazol-5-yl)methyl)piperidine-4-carboxylic acid (compound of formula 1), or a salt thereof, comprising:
Compound of formula A-3:
[Aspect 22]
22. The process of aspect 21, wherein the base present in the reaction of the compound of formula A-3, or the salt thereof, with the compound of formula B-1, or the salt thereof, is an alkali metal carbonate.
[Aspect 23]
23. The process according to aspect 21 or 22, wherein X 1b is bromo or chloro.
[Aspect 24]
The process comprising:
Compound of formula B-2:
[Aspect 25]
The process comprising:
Compound of formula A-3a:
[Aspect 26]
The process comprising:
Compound of formula A-3a':
[Aspect 27]
1. A process for preparing (R)-1-((7-cyano-2-(3'-((2-(difluoromethyl)-7-((3-hydroxypyrrolidin-1-yl)methyl)pyrido[3,2-d]pyrimidin-4-yl)amino)-2,2'-dimethyl-[1,1'-biphenyl]-3-yl)benzo[d]oxazol-5-yl)methyl)piperidine-4-carboxylic acid (compound of formula 1), or a salt thereof, comprising:
Compound of formula A-3:
[Aspect 28]
28. The process according to aspect 27, wherein the reacting of the compound of formula A-3, or the salt thereof, with the compound of formula A-4, or the salt thereof, is carried out in the presence of an alkali metal halide and a base.
[Aspect 29]
29. The process of claim 28, wherein the alkali metal halide is an alkali metal bromide.
[Aspect 30]
30. The process of claim 28 or 29, wherein the alkali metal halide is LiBr.
[Aspect 31]
Aspect 31. The process of any one of aspects 28 to 30, wherein the base is a tertiary amine.
[Aspect 32]
Aspect 32. The process of any one of aspects 28 to 31, wherein the base is selected from N,N-diisopropylamine, methylamine, dimethylamine, trimethylamine, and ethylamine.
[Aspect 33]
The process comprising:
Compound of formula A-3a:
[Aspect 34]
The process comprising:
a) Compound of formula A-3a:
b) The compound of formula A-5a:
c) the compound of formula A-7a:
[Aspect 35]
1. A process for preparing (R)-1-((7-cyano-2-(3'-((2-(difluoromethyl)-7-((3-hydroxypyrrolidin-1-yl)methyl)pyrido[3,2-d]pyrimidin-4-yl)amino)-2,2'-dimethyl-[1,1'-biphenyl]-3-yl)benzo[d]oxazol-5-yl)methyl)piperidine-4-carboxylic acid (compound of formula 1), or a salt thereof, comprising:
Compound of formula A-5:
[Aspect 36]
The process comprising:
Compound of formula A-5:
[Aspect 37]
37. The process of claim 35 or 36, wherein the reducing agent is a borohydride reducing agent.
[Aspect 38]
Aspect 38. The process of any one of aspects 35 to 37, wherein the reducing agent is selected from NaBH 4 , NaBH 3 CN, and NaBH(OAc) 3 .
[Aspect 39]
Aspect 39. The process of any one of aspects 35 to 38, wherein the reacting of the compound of formula A-5, or the salt thereof, with the compound of formula A-6, or the salt thereof, is carried out in the presence of a catalyst.
[Aspect 40]
40. The process of claim 39, wherein the catalyst is trimethyl borate.
[Aspect 41]
Aspect 41. The process of any one of aspects 35 to 40, wherein the reacting of the compound of formula A-5, or the salt thereof, with the compound of formula A-6, or the salt thereof, is carried out in a solvent component comprising an organic nitrile and an organic halide.
[Aspect 42]
The process comprising:
Compound of formula A-5a:
[Aspect 43]
The compound of formula A-3 or the salt thereof is
Compound of formula A-1:
X 3a is halo;
R 1 is C 1-6 alkyl;
each R2 is independently selected from H and C1-6 alkyl ;
The process according to any one of aspects 21 to 24 and 27 to 32, wherein each R 2 taken together forms a C 2-3 alkylene linker optionally substituted with 1, 2, 3, or 4 independently selected C 1-4 alkyl groups .
[Aspect 44]
The process comprising:
Compound of formula A-1a:
[Aspect 45]
The process comprising:
Compound of formula A-1a':
[Aspect 46]
The compound of formula 1 or the salt thereof is
Compound of formula A-7:
[Aspect 47]
Aspect 47. The process according to aspect 46, wherein said converting said compound of formula A-7, or said salt thereof, to said compound of formula 1, or said salt thereof, comprises treating said compound of formula A-7, or said salt thereof, with a Lewis acid.
[Aspect 48]
The process according to aspect 47, wherein the Lewis acid present in the conversion of the compound of formula A-7 or the salt thereof is iodotrimethylsilane.
[Aspect 49]
The process according to aspect 46, wherein said converting said compound of formula A-7, or said salt thereof, to said compound of formula 1, or said salt thereof, comprises treating said compound of formula A-7, or said salt thereof, with a base.
[Aspect 50]
Aspect 48. The process according to aspect 47, wherein the base present in the conversion of the compound of formula A-7 or the salt thereof is sodium hydroxide.
[Aspect 51]
The compound of formula 1 or the salt thereof is
Compound of formula A-7a:
[Aspect 52]
The compound of formula 1 or the salt thereof is
Compound of formula A-7a':
[Aspect 53]
Compound of formula A-1:
[Aspect 54]
The compound of formula 6 or the salt thereof is
Compound of Formula 5:
[Aspect 55]
The compound of formula 5 or the salt thereof is
Compound of Formula 4:
[Aspect 56]
The compound of formula 4 is
Compound of Formula 3:
[Aspect 57]
The compound of formula 8A is
Compound of Formula 8:
[Aspect 58]
58. The process according to any one of aspects 53 to 57, wherein X 3a is bromo.
[Aspect 59]
59. The process according to any one of aspects 53 to 58, wherein R 1 is t-butyl.
[Aspect 60]
The compound of formula B-1 or the salt thereof is
Compound of formula 12:
[Aspect 61]
The process according to aspect 60, wherein X 1b is bromo.
[Aspect 62]
62. The process of claim 60 or 61, wherein the halogenating agent is a chlorinating agent.
[Aspect 63]
The compound of formula A-4 or the salt thereof is
Compound of formula 14:
[Aspect 64]
64. The process according to aspect 63, wherein X 2a is chloro.
[Aspect 65]
The compound of formula 14 or the salt thereof is
Compound of formula 13:
[Aspect 66]
The compound of formula 13 or the salt thereof is
Compound of formula 12:
[Aspect 67]
The compound of formula 12 or the salt thereof is
Compound of formula 11:
[Aspect 68]
The compound of formula 11 or the salt thereof is
Compound of formula 10:
[Aspect 69]
The process according to any one of aspects 66 to 68, wherein X 1b is bromo.
[Aspect 70]
1. A process for preparing (R)-1-((7-cyano-2-(3'-((2-(difluoromethyl)-7-((3-hydroxypyrrolidin-1-yl)methyl)pyrido[3,2-d]pyrimidin-4-yl)amino)-2,2'-dimethyl-[1,1'-biphenyl]-3-yl)benzo[d]oxazol-5-yl)methyl)piperidine-4-carboxylic acid, or a salt thereof, comprising the steps of:
(a) Compound of formula A-1a′:
(b) reacting the compound of formula A-3a′ or the salt thereof with a compound of formula B-1a:
(c) reacting the compound of formula B-2a′ or the salt thereof with a salt of formula B-3a:
(d) deprotecting the compound of formula A-7a′ or the salt thereof to form the (R)-1-((7-cyano-2-(3′-((2-(difluoromethyl)-7-((3-hydroxypyrrolidin-1-yl)methyl)pyrido[3,2-d]pyrimidin-4-yl)amino)-2,2′-dimethyl-[1,1′-biphenyl]-3-yl)benzo[d]oxazol-5-yl)methyl)piperidine-4-carboxylic acid, or the salt thereof.
[Aspect 71]
(a) Compound of formula A-1:
(b) Compound of formula A-1a:
(c) Compound of formula A-1a′:
(d) Compound of formula A-3:
(e) Compound of formula A-3a:
(f) Compound of formula A-3a′:
(g) Compound of formula A-4:
(h) Compound of formula A-4a:
(i) Compound of formula A-5:
(j) Compound of formula A-5a:
(k) Compound of formula A-7:
(l) Compound of formula A-7a:
(m) Compound of formula A-7a′:
(n) Compound of formula B-2:
(o) Compound of formula B-2a:
(p) Compound of formula B-2a′:
(q) A compound of formula 4:
(r) a compound of formula 5:
(s) A compound of formula 6:
(t) A compound of formula 4a:
(u) Compound of formula 5a:
(v) Compound of formula 6a:
(w) a compound of formula 11:
(x) Compound of formula 11a:
Claims (45)
(b)形態Iが、2シータ(±0.2度)で、7.0、8.5、10.0、10.6、14.6、15.2、15.8、17.2、20.1、21.1、23.9、24.8、26.1、28.1、29.6、及び30.2度から選択される少なくとも2つのXRPDピークを有するか;
(c)形態Iが、2シータ(±0.2度)で、7.0、8.5、10.0、10.6、14.6、15.2、15.8、17.2、20.1、21.1、23.9、24.8、26.1、28.1、29.6、及び30.2度から選択される少なくとも3つのXRPDピークを有するか;
(d)形態Iが、2シータ(±0.2度)で、7.0、8.5、10.0、10.6、14.6、15.2、15.8、17.2、20.1、21.1、23.9、24.8、26.1、28.1、29.6、及び30.2度から選択される少なくとも4つのXRPDピークを有するか;
(e)形態Iが、2シータ(±0.2度)で、7.0、8.5、10.0、10.6、14.6、15.2、15.8、17.2、20.1、21.1、23.9、24.8、26.1、28.1、29.6、及び30.2度のXRPDピークを有するか;
(f)形態Iが、示差走査熱量測定(DSC)サーモグラムにおいて、開始温度(±3℃)が35℃及び最高温度(±3℃)が68℃、ならびに開始温度(±3℃)が161℃及び最高温度(±3℃)が169℃の2つの吸熱ピークを有するか;
(g)形態Iが、図1:
に示されるX線粉末回折(XRPD)パターンを有するか;
(h)形態Iが、図2:
に図示される示差走査熱量測定(DSC)サーモグラムを有するか;
(i)形態Iが、図2:
に図示される熱重量分析(TGA)サーモグラムを有する、
請求項4に記載の結晶形態。 (a) Form I has at least one X-ray powder diffraction ( XRPD) peak selected from 7.0, 8.5, 10.0, 10.6, 14.6, 15.2, 15.8, 17.2, 20.1, 21.1, 23.9, 24.8, 26.1, 28.1, 29.6, and 30.2 degrees two-theta (±0.2 degrees ) ;
(b) Form I has at least two XRPD peaks selected from 7.0, 8.5, 10.0, 10.6, 14.6, 15.2, 15.8, 17.2, 20.1, 21.1, 23.9, 24.8, 26.1, 28.1, 29.6, and 30.2 degrees two theta (±0.2 degrees);
(c) Form I has at least three XRPD peaks selected from 7.0, 8.5, 10.0, 10.6, 14.6, 15.2, 15.8, 17.2, 20.1, 21.1, 23.9, 24.8, 26.1, 28.1, 29.6, and 30.2 degrees two theta (±0.2 degrees);
(d) Form I has at least four XRPD peaks selected from 7.0, 8.5, 10.0, 10.6, 14.6, 15.2, 15.8, 17.2, 20.1, 21.1, 23.9, 24.8, 26.1, 28.1, 29.6, and 30.2 degrees two theta (±0.2 degrees);
(e) Form I has XRPD peaks at 7.0, 8.5, 10.0, 10.6, 14.6, 15.2, 15.8, 17.2, 20.1, 21.1, 23.9, 24.8, 26.1, 28.1, 29.6, and 30.2 degrees two theta (±0.2 degrees);
(f) Form I has two endothermic peaks in a differential scanning calorimetry (DSC) thermogram with an onset temperature (±3° C.) of 35° C. and a maximum temperature (±3° C.) of 68° C., and an onset temperature (±3° C.) of 161° C. and a maximum temperature (±3° C.) of 169° C.;
(g) Form I is shown in FIG.
has an X-ray powder diffraction (XRPD) pattern as shown in
(h) Form I is shown in FIG.
has a differential scanning calorimetry (DSC) thermogram as shown in
(i) Form I is shown in FIG.
having a thermogravimetric analysis (TGA) thermogram as shown in
The crystalline form of claim 4.
(b)形態IIが、2シータ(±0.2度)で、8.5、15.0、15.7、17.0、18.6、20.2、20.5、21.7、25.5、及び26.7度から選択される少なくとも2つのXRPDピークを有するか;
(c)形態IIが、2シータ(±0.2度)で、8.5、15.0、15.7、17.0、18.6、20.2、20.5、21.7、25.5、及び26.7度から選択される少なくとも3つのXRPDピークを有するか;
(d)形態IIが、2シータ(±0.2度)で、8.5、15.0、15.7、17.0、18.6、20.2、20.5、21.7、25.5、及び26.7度から選択される少なくとも4つのXRPDピークを有するか;
(e)形態IIが、2シータ(±0.2度)で、8.5、15.0、15.7、17.0、18.6、20.2、20.5、21.7、25.5、及び26.7度のXRPDピークを有するか;
(f)形態IIが、DSCサーモグラムにおいて、最高温度(±3℃)が76℃、開始温度(±3℃)が165℃及び最高温度(±3℃)が173℃、開始温度(±3℃)が206℃及び最高温度(±3℃)が224℃の3つの吸熱ピークを有するか;
(g)形態IIが、図3:
に示されるXRPDパターンを有するか;
(h)形態IIが、図4:
に図示されるDSCサーモグラムを有するか;
(i)形態IIが、図4:
に図示されるTGAサーモグラムを有する、
請求項6に記載の結晶形態。 (a) Form II has at least one XRPD peak selected from 8.5, 15.0, 15.7, 17.0, 18.6, 20.2, 20.5, 21.7, 25.5, and 26.7 degrees two theta (±0.2 degrees);
(b) Form II has at least two XRPD peaks selected from 8.5, 15.0, 15.7, 17.0, 18.6, 20.2, 20.5, 21.7, 25.5, and 26.7 degrees two theta (±0.2 degrees);
(c) Form II has at least three XRPD peaks selected from 8.5, 15.0, 15.7, 17.0, 18.6, 20.2, 20.5, 21.7, 25.5, and 26.7 degrees two theta (±0.2 degrees);
(d) Form II has at least four XRPD peaks selected from: 8.5, 15.0, 15.7, 17.0, 18.6, 20.2, 20.5, 21.7, 25.5, and 26.7 degrees two theta (±0.2 degrees);
(e) Form II has XRPD peaks at 8.5, 15.0, 15.7, 17.0, 18.6, 20.2, 20.5, 21.7, 25.5, and 26.7 degrees two theta (±0.2 degrees);
(f) Form II has three endothermic peaks in a DSC thermogram with a maximum temperature (±3° C.) of 76° C., an onset temperature (±3° C.) of 165° C. and a maximum temperature (±3° C.) of 173° C., an onset temperature (±3° C.) of 206° C. and a maximum temperature (±3° C.) of 224° C.;
(g) Form II is shown in FIG.
has an XRPD pattern as shown in
(h) Form II is shown in FIG.
Has a DSC thermogram as shown in
(i) Form II is shown in FIG.
having the TGA thermogram shown in
The crystalline form of claim 6 .
(b)形態IIIが、2シータ(±0.2度)で、5.2、7.5、8.2、8.8、9.4、11.6、12.4、13.0、14.0、14.8、15.8、16.6、16.9、17.3、17.9、19.2、23.6、24.5、25.5、及び26.6度から選択される少なくとも2つのXRPDピークを有するか;
(c)形態IIIが、2シータ(±0.2度)で、5.2、7.5、8.2、8.8、9.4、11.6、12.4、13.0、14.0、14.8、15.8、16.6、16.9、17.3、17.9、19.2、23.6、24.5、25.5、及び26.6度から選択される少なくとも3つのXRPDピークを有するか;
(d)形態IIIが、2シータ(±0.2度)で、5.2、7.5、8.2、8.8、9.4、11.6、12.4、13.0、14.0、14.8、15.8、16.6、16.9、17.3、17.9、19.2、23.6、24.5、25.5、及び26.6度から選択される少なくとも4つのXRPDピークを有するか;
(e)形態IIIが、2シータ(±0.2度)で、5.2、7.5、8.2、8.8、9.4、11.6、12.4、13.0、14.0、14.8、15.8、16.6、16.9、17.3、17.9、19.2、23.6、24.5、25.5、及び26.6度のXRPDピークを有するか;
(f)形態IIIが、DSCサーモグラムにおいて、開始温度(±3℃)が30℃及び最高温度(±3℃)が67℃、開始温度(±3℃)が179℃及び最高温度(±3℃)が202℃の2つの吸熱ピークを有するか;
(g)形態IIIが、図5:
に示されるXRPDパターンを有するか;
(h)形態IIIが、図6:
に図示されるDSCサーモグラムを有するか;
(i)形態IIIが、図6:
に図示されるTGAサーモグラムを有する、
請求項8または9に記載の結晶形態。 (a) Form III has at least one XRPD peak selected from 5.2, 7.5, 8.2, 8.8, 9.4, 11.6, 12.4, 13.0, 14.0, 14.8, 15.8, 16.6, 16.9, 17.3, 17.9, 19.2, 23.6, 24.5, 25.5, and 26.6 degrees two theta (±0.2 degrees);
(b) Form III has at least two XRPD peaks selected from 5.2, 7.5, 8.2, 8.8, 9.4, 11.6, 12.4, 13.0, 14.0, 14.8, 15.8, 16.6, 16.9, 17.3, 17.9, 19.2, 23.6, 24.5, 25.5, and 26.6 degrees two theta (±0.2 degrees);
(c) Form III has at least three XRPD peaks selected from 5.2, 7.5, 8.2, 8.8, 9.4, 11.6, 12.4, 13.0, 14.0, 14.8, 15.8, 16.6, 16.9, 17.3, 17.9, 19.2, 23.6, 24.5, 25.5, and 26.6 degrees two theta (±0.2 degrees);
(d) Form III has at least four XRPD peaks selected from: 5.2, 7.5, 8.2, 8.8, 9.4, 11.6, 12.4, 13.0, 14.0, 14.8, 15.8, 16.6, 16.9, 17.3, 17.9, 19.2, 23.6, 24.5, 25.5, and 26.6 degrees 2-theta (±0.2 degrees) ;
(e) Form III has XRPD peaks at 5.2, 7.5, 8.2, 8.8, 9.4, 11.6, 12.4, 13.0, 14.0, 14.8, 15.8, 16.6, 16.9, 17.3, 17.9, 19.2, 23.6, 24.5, 25.5, and 26.6 degrees two theta (±0.2 degrees);
(f) Form III has two endothermic peaks in a DSC thermogram with an onset temperature (±3° C.) of 30° C. and a maximum temperature (±3° C.) of 67° C., and an onset temperature (±3° C.) of 179° C. and a maximum temperature (±3° C.) of 202° C.;
(g) Form III is shown in FIG.
has an XRPD pattern as shown in
(h) Form III is shown in FIG.
Has the DSC thermogram shown in
(i) Form III is shown in FIG.
having the TGA thermogram shown in
10. The crystalline form of claim 8 or 9 .
式B-2:
で示される塩と、鈴木触媒及び塩基の存在下で反応させて、式A-7:
Formula B- 2:
in the presence of Suzuki catalyst and base to give a compound of formula A- 7:
式B-2a:
Formula B-2a :
式B-2a’:
Formula B-2a ':
式A-3:
Formula A- 3:
式B-2:
で示される塩と、鈴木触媒及び塩基の存在下で反応させて、式A-7:
Formula B- 2:
in the presence of Suzuki catalyst and base to give a compound of formula A- 7:
式A-3a:
Formula A-3a :
式A-3a’:
Formula A-3a ':
式A-3:
Formula A- 3:
式A-3a:
Formula A-3a :
a)式A-3a:
b)前記式A-5a:
c)前記式A-7a:
a) Formula A-3a :
b) The compound represented by formula A- 5a:
c) the compound represented by formula A- 7a:
式A-5:
Formula A- 5:
式A-5:
Formula A- 5:
式A-5a:
Formula A-5a :
式A-1:
X3aが、ハロであり、
R1が、C1-6アルキルであり、
各R2が独立して、H及びC1-6アルキルから選択されるか、または
各R2が一緒に、任意選択で1、2、3、もしくは4つの独立して選択されるC1-4アルキル基により置換される、C2-3アルキレンリンカーを形成する、請求項17、18及び21のいずれか1項に記載のプロセス。 The compound of formula A-3 or the salt thereof is
Formula A- 1:
X 3a is halo;
R 1 is C 1-6 alkyl;
22. The process of any one of claims 17, 18 and 21, wherein each R2 is independently selected from H and C1-6 alkyl, or each R2 together form a C2-3 alkylene linker optionally substituted with 1 , 2, 3 , or 4 independently selected C1-4 alkyl groups.
式A-1a:
Formula A-1a :
式A-1a’:
Formula A- 1a':
式A-7:
Formula A- 7:
式A-7a:
Formula A-7a :
式A-7a’:
Formula A-7a ':
式5:
Formula 5:
式4:
Formula 4:
式3:
Formula 3:
式8:
Equation 8:
式12:
Formula 12:
式14:
Formula 14:
式13:
Formula 13 :
式12:
Formula 12:
式11:
Formula 1 1:
式10:
Formula 10 :
(a)式A-1a’:
(b)前記式A-3a’の化合物または前記その塩を、式B-1a:
(c)前記式B-2a’の化合物または前記その塩を、式B-3a:
(d)前記式A-7a’の化合物または前記その塩を脱保護して、前記(R)-1-((7-シアノ-2-(3’-((2-(ジフルオロメチル)-7-((3-ヒドロキシピロリジン-1-イル)メチル)ピリド[3,2-d]ピリミジン-4-イル)アミノ)-2,2’-ジメチル-[1,1’-ビフェニル]-3-イル)ベンゾ[d]オキサゾール-5-イル)メチル)ピペリジン-4-カルボン酸、または前記その塩を形成させることと、を含む、前記プロセス。 1. A process for preparing (R)-1-((7-cyano-2-(3'-((2-(difluoromethyl)-7-((3-hydroxypyrrolidin-1-yl)methyl)pyrido[3,2-d]pyrimidin-4-yl)amino)-2,2'-dimethyl-[1,1'-biphenyl]-3-yl)benzo[d]oxazol-5-yl)methyl)piperidine-4-carboxylic acid, or a salt thereof, comprising the steps of:
(a) Formula A-1 a':
(b) reacting a compound of formula A-3a′ or a salt thereof with a compound of formula B-1a :
(c) reacting the compound of formula B-2a′ or the salt thereof with a compound of formula B-3a :
(d) deprotecting the compound of formula A-7a′ or the salt thereof to form the (R)-1-((7-cyano-2-(3′-((2-(difluoromethyl)-7-((3-hydroxypyrrolidin-1-yl)methyl)pyrido[3,2-d]pyrimidin-4-yl)amino)-2,2′-dimethyl-[1,1′-biphenyl]-3-yl)benzo[d]oxazol-5-yl)methyl)piperidine-4-carboxylic acid, or the salt thereof.
(b)式A-1a:
(c)式A-1a’:
(d)式A-3:
(e)式A-3a:
(f)式A-3a’:
(g)式A-4:
(h)式A-4a:
(i)式A-5:
(j)式A-5a:
(k)式A-7:
(l)式A-7a:
(m)式A-7a’:
(n)式B-2:
(o)式B-2a:
(p)式B-2a’:
(q)式4:
(r)式5:
(s)式6:
(t)式4a:
(u)式5a:
(v)式6a:
(w)式11:
(x)式11a:
から選択される、化合物。 (a) Formula A- 1:
A compound selected from:
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