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FR2340620A1 - MANUFACTURING PROCESS OF A LARGE-SCALE INTEGRATED DEVICE HAVING A FLAT SURFACE - Google Patents

MANUFACTURING PROCESS OF A LARGE-SCALE INTEGRATED DEVICE HAVING A FLAT SURFACE

Info

Publication number
FR2340620A1
FR2340620A1 FR7639828A FR7639828A FR2340620A1 FR 2340620 A1 FR2340620 A1 FR 2340620A1 FR 7639828 A FR7639828 A FR 7639828A FR 7639828 A FR7639828 A FR 7639828A FR 2340620 A1 FR2340620 A1 FR 2340620A1
Authority
FR
France
Prior art keywords
manufacturing process
flat surface
integrated device
scale integrated
scale
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7639828A
Other languages
French (fr)
Other versions
FR2340620B1 (en
Inventor
Ekkehard F Miersch
Hwa N Yu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2340620A1 publication Critical patent/FR2340620A1/en
Application granted granted Critical
Publication of FR2340620B1 publication Critical patent/FR2340620B1/fr
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76877Filling of holes, grooves or trenches, e.g. vias, with conductive material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76877Filling of holes, grooves or trenches, e.g. vias, with conductive material
    • H01L21/7688Filling of holes, grooves or trenches, e.g. vias, with conductive material by deposition over sacrificial masking layer, e.g. lift-off

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
  • Electrodes Of Semiconductors (AREA)
FR7639828A 1976-02-06 1976-12-30 MANUFACTURING PROCESS OF A LARGE-SCALE INTEGRATED DEVICE HAVING A FLAT SURFACE Granted FR2340620A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US65581476A 1976-02-06 1976-02-06

Publications (2)

Publication Number Publication Date
FR2340620A1 true FR2340620A1 (en) 1977-09-02
FR2340620B1 FR2340620B1 (en) 1979-09-28

Family

ID=24630480

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7639828A Granted FR2340620A1 (en) 1976-02-06 1976-12-30 MANUFACTURING PROCESS OF A LARGE-SCALE INTEGRATED DEVICE HAVING A FLAT SURFACE

Country Status (6)

Country Link
JP (1) JPS5827664B2 (en)
CA (1) CA1088382A (en)
DE (1) DE2703473A1 (en)
FR (1) FR2340620A1 (en)
GB (1) GB1521431A (en)
IT (1) IT1079545B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0008359A2 (en) * 1978-08-21 1980-03-05 International Business Machines Corporation Process for making a thin-film structure

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59170692A (en) * 1983-03-16 1984-09-26 Ebara Corp Water-sealed heat exchanger
US11129289B2 (en) 2015-10-27 2021-09-21 Schaeffler Technologies AG & Co. KG Bearing assembly with incorporated electric line for providing multiple operating voltages

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1267738B (en) * 1962-10-29 1968-05-09 Intellux Inc Process for making electrical connections between the circuits of multilayer printed electrical circuits
US3464855A (en) * 1966-09-06 1969-09-02 North American Rockwell Process for forming interconnections in a multilayer circuit board
DE1765013A1 (en) * 1968-03-21 1971-07-01 Telefunken Patent Process for the production of multilevel circuits
DE2059425A1 (en) * 1970-12-02 1972-06-22 Siemens Ag Partial structure of printed multilayer circuits
JPS4960870A (en) * 1972-10-16 1974-06-13
US3873361A (en) * 1973-11-29 1975-03-25 Ibm Method of depositing thin film utilizing a lift-off mask
JPS5120681A (en) * 1974-07-27 1976-02-19 Oki Electric Ind Co Ltd Handotaisochino seizohoho
NL7415841A (en) * 1974-12-05 1976-06-09 Philips Nv PROCESS FOR THE MANUFACTURE OF A SEMI-CONDUCTOR DEVICE AND SEMI-CONDUCTOR DEVICE, MANUFACTURED ACCORDING TO THE PROCESS.
JPS5272571A (en) * 1975-12-15 1977-06-17 Fujitsu Ltd Production of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0008359A2 (en) * 1978-08-21 1980-03-05 International Business Machines Corporation Process for making a thin-film structure
EP0008359A3 (en) * 1978-08-21 1980-03-19 International Business Machines Corporation Process for making a thin-film structure

Also Published As

Publication number Publication date
JPS5295987A (en) 1977-08-12
IT1079545B (en) 1985-05-13
JPS5827664B2 (en) 1983-06-10
DE2703473A1 (en) 1977-08-11
GB1521431A (en) 1978-08-16
DE2703473C2 (en) 1991-01-24
CA1088382A (en) 1980-10-28
FR2340620B1 (en) 1979-09-28

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