AU2001260975A1 - Optical systems for measuring form and geometric dimensions of precision engineered parts - Google Patents
Optical systems for measuring form and geometric dimensions of precision engineered partsInfo
- Publication number
- AU2001260975A1 AU2001260975A1 AU2001260975A AU6097501A AU2001260975A1 AU 2001260975 A1 AU2001260975 A1 AU 2001260975A1 AU 2001260975 A AU2001260975 A AU 2001260975A AU 6097501 A AU6097501 A AU 6097501A AU 2001260975 A1 AU2001260975 A1 AU 2001260975A1
- Authority
- AU
- Australia
- Prior art keywords
- optical systems
- geometric dimensions
- measuring form
- precision engineered
- engineered parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 230000003287 optical effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/245—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using a plurality of fixed, simultaneously operating transducers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
- G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02024—Measuring in transmission, i.e. light traverses the object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02015—Interferometers characterised by the beam path configuration
- G01B9/02027—Two or more interferometric channels or interferometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
- G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
- G01B9/02078—Caused by ambiguity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/0209—Low-coherence interferometers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17791200P | 2000-01-25 | 2000-01-25 | |
| US60177912 | 2000-01-25 | ||
| US20573600P | 2000-05-19 | 2000-05-19 | |
| US60205736 | 2000-05-19 | ||
| PCT/US2001/002411 WO2001059402A2 (en) | 2000-01-25 | 2001-01-25 | Optical systems for measuring form and geometric dimensions of precision engineered parts |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001260975A1 true AU2001260975A1 (en) | 2001-08-20 |
Family
ID=26873770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001260975A Abandoned AU2001260975A1 (en) | 2000-01-25 | 2001-01-25 | Optical systems for measuring form and geometric dimensions of precision engineered parts |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6822745B2 (en) |
| JP (2) | JP5112588B2 (en) |
| AU (1) | AU2001260975A1 (en) |
| DE (1) | DE10195052B3 (en) |
| WO (1) | WO2001059402A2 (en) |
Families Citing this family (93)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1322931A1 (en) * | 2000-10-05 | 2003-07-02 | Agilent Technologies, Inc. (a Delaware corporation) | Reference artifact for optical group delay and chromatic dispersion |
| WO2003076874A1 (en) * | 2002-03-08 | 2003-09-18 | Universite De Liege | Method and system for large dimension profile measurement |
| US7139081B2 (en) | 2002-09-09 | 2006-11-21 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
| US7869057B2 (en) | 2002-09-09 | 2011-01-11 | Zygo Corporation | Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis |
| TWI289708B (en) | 2002-12-25 | 2007-11-11 | Qualcomm Mems Technologies Inc | Optical interference type color display |
| US7324214B2 (en) | 2003-03-06 | 2008-01-29 | Zygo Corporation | Interferometer and method for measuring characteristics of optically unresolved surface features |
| JP2006519993A (en) * | 2003-03-06 | 2006-08-31 | ザイゴ コーポレーション | Profiling complex surface structures using scanning interferometry |
| US7106454B2 (en) | 2003-03-06 | 2006-09-12 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
| US6977730B2 (en) * | 2003-08-18 | 2005-12-20 | Zygo Corporation | Method and apparatus for alignment of a precision optical assembly |
| EP1664853A4 (en) * | 2003-08-18 | 2011-02-23 | Zygo Corp | Method and apparatus for alignment of a precision optical assembly |
| US7298494B2 (en) | 2003-09-15 | 2007-11-20 | Zygo Corporation | Methods and systems for interferometric analysis of surfaces and related applications |
| US20050134865A1 (en) * | 2003-12-17 | 2005-06-23 | Asml Netherlands B.V. | Method for determining a map, device manufacturing method, and lithographic apparatus |
| US7342705B2 (en) | 2004-02-03 | 2008-03-11 | Idc, Llc | Spatial light modulator with integrated optical compensation structure |
| US7321430B2 (en) * | 2004-04-22 | 2008-01-22 | Zygo Corporation | Vibration resistant interferometry |
| US7161799B2 (en) * | 2004-06-11 | 2007-01-09 | Michael Z. Lim | Thermal insulating board for laptop computers |
| US7433058B2 (en) * | 2004-07-12 | 2008-10-07 | Solvision Inc. | System and method for simultaneous 3D height measurements on multiple sides of an object |
| US20060017936A1 (en) * | 2004-07-22 | 2006-01-26 | Michel Cantin | Transparent object height measurement |
| US7221461B2 (en) | 2004-08-13 | 2007-05-22 | Zygo Corporation | Method and apparatus for interferometric measurement of components with large aspect ratios |
| JP4425747B2 (en) * | 2004-08-30 | 2010-03-03 | フジノン株式会社 | Interferometer device for virtual contact surface measurement |
| DE102004045806A1 (en) * | 2004-09-22 | 2006-04-06 | Robert Bosch Gmbh | Interferometer with a mirror arrangement for measuring a measurement object |
| US7813026B2 (en) | 2004-09-27 | 2010-10-12 | Qualcomm Mems Technologies, Inc. | System and method of reducing color shift in a display |
| US7630123B2 (en) * | 2004-09-27 | 2009-12-08 | Qualcomm Mems Technologies, Inc. | Method and device for compensating for color shift as a function of angle of view |
| US7710636B2 (en) | 2004-09-27 | 2010-05-04 | Qualcomm Mems Technologies, Inc. | Systems and methods using interferometric optical modulators and diffusers |
| US7508571B2 (en) | 2004-09-27 | 2009-03-24 | Idc, Llc | Optical films for controlling angular characteristics of displays |
| US7268887B2 (en) * | 2004-12-23 | 2007-09-11 | Corning Incorporated | Overlapping common-path interferometers for two-sided measurement |
| US7884947B2 (en) | 2005-01-20 | 2011-02-08 | Zygo Corporation | Interferometry for determining characteristics of an object surface, with spatially coherent illumination |
| TWI428582B (en) | 2005-01-20 | 2014-03-01 | Zygo Corp | Interferometry apparatus, and interferometry method for determining characteristics of an object surface |
| US20100157312A1 (en) * | 2005-06-28 | 2010-06-24 | Koninklijke Philips Electronics, N.V. | Method of reconstructing a surface topology of an object |
| US20070148792A1 (en) * | 2005-12-27 | 2007-06-28 | Marx David S | Wafer measurement system and apparatus |
| US7636168B2 (en) | 2005-10-11 | 2009-12-22 | Zygo Corporation | Interferometry method and system including spectral decomposition |
| JP4717639B2 (en) * | 2006-01-06 | 2011-07-06 | 東芝機械株式会社 | Method and apparatus for measuring both sides of substrate shape |
| WO2007087301A2 (en) * | 2006-01-23 | 2007-08-02 | Zygo Corporation | Interferometer system for monitoring an object |
| US7603001B2 (en) | 2006-02-17 | 2009-10-13 | Qualcomm Mems Technologies, Inc. | Method and apparatus for providing back-lighting in an interferometric modulator display device |
| JP4729423B2 (en) * | 2006-03-28 | 2011-07-20 | 株式会社ミツトヨ | Optical interferometer |
| DE102006023828B4 (en) * | 2006-05-20 | 2011-04-28 | Schott Ag | Method and device for checking the faces of optical fibers |
| US7522288B2 (en) | 2006-07-21 | 2009-04-21 | Zygo Corporation | Compensation of systematic effects in low coherence interferometry |
| US7845841B2 (en) | 2006-08-28 | 2010-12-07 | Qualcomm Mems Technologies, Inc. | Angle sweeping holographic illuminator |
| US8872085B2 (en) | 2006-10-06 | 2014-10-28 | Qualcomm Mems Technologies, Inc. | Display device having front illuminator with turning features |
| ATE556272T1 (en) | 2006-10-06 | 2012-05-15 | Qualcomm Mems Technologies Inc | OPTICAL LOSS STRUCTURE IN A LIGHTING DEVICE |
| WO2008045311A2 (en) | 2006-10-06 | 2008-04-17 | Qualcomm Mems Technologies, Inc. | Illumination device with built-in light coupler |
| WO2008045462A2 (en) | 2006-10-10 | 2008-04-17 | Qualcomm Mems Technologies, Inc. | Display device with diffractive optics |
| FI119259B (en) * | 2006-10-18 | 2008-09-15 | Valtion Teknillinen | Determination of surface and thickness |
| US7710580B2 (en) * | 2006-10-27 | 2010-05-04 | Zygo Corporation | Vibration resistant interferometry |
| US7864395B2 (en) | 2006-10-27 | 2011-01-04 | Qualcomm Mems Technologies, Inc. | Light guide including optical scattering elements and a method of manufacture |
| JP4878264B2 (en) * | 2006-11-02 | 2012-02-15 | キヤノン株式会社 | Inspection method, inspection apparatus, and imprint apparatus |
| WO2008070635A2 (en) * | 2006-12-01 | 2008-06-12 | Coherix, Inc. | Method and system for determining a critical dimension of an object |
| US20080174783A1 (en) * | 2006-12-15 | 2008-07-24 | Mater Michael J | System and method of interferometric imaging using a digital micromirror device |
| JP5502491B2 (en) | 2006-12-22 | 2014-05-28 | ザイゴ コーポレーション | Apparatus and method for characterization of surface features |
| US7777954B2 (en) | 2007-01-30 | 2010-08-17 | Qualcomm Mems Technologies, Inc. | Systems and methods of providing a light guiding layer |
| US7889355B2 (en) | 2007-01-31 | 2011-02-15 | Zygo Corporation | Interferometry for lateral metrology |
| US20080193320A1 (en) * | 2007-02-09 | 2008-08-14 | Burgess-Norton, Mfg. Co., Inc. | Manufacture and measuring of automotive components |
| JP5070370B2 (en) * | 2007-05-23 | 2012-11-14 | 株式会社ジェイテック | Ultraprecision shape measuring method and apparatus |
| US7619746B2 (en) | 2007-07-19 | 2009-11-17 | Zygo Corporation | Generating model signals for interferometry |
| US8072611B2 (en) | 2007-10-12 | 2011-12-06 | Zygo Corporation | Interferometric analysis of under-resolved features |
| KR101274517B1 (en) | 2007-11-13 | 2013-06-13 | 지고 코포레이션 | Interferometer utilizing polarization scanning |
| US8068710B2 (en) | 2007-12-07 | 2011-11-29 | Qualcomm Mems Technologies, Inc. | Decoupled holographic film and diffuser |
| KR101254161B1 (en) | 2007-12-14 | 2013-04-18 | 지고 코포레이션 | Analyzing surface structure using scanning interferometry |
| WO2009102733A2 (en) | 2008-02-12 | 2009-08-20 | Qualcomm Mems Technologies, Inc. | Integrated front light diffuser for reflective displays |
| WO2009102731A2 (en) | 2008-02-12 | 2009-08-20 | Qualcomm Mems Technologies, Inc. | Devices and methods for enhancing brightness of displays using angle conversion layers |
| WO2009129264A1 (en) | 2008-04-15 | 2009-10-22 | Qualcomm Mems Technologies, Inc. | Light with bi-directional propagation |
| US8004688B2 (en) | 2008-11-26 | 2011-08-23 | Zygo Corporation | Scan error correction in low coherence scanning interferometry |
| DE102008055158B4 (en) * | 2008-12-24 | 2011-12-22 | Sirona Dental Systems Gmbh | Method for 3D measurement of the surface of an object, in particular for dental purposes |
| DK178405B1 (en) * | 2009-01-09 | 2016-02-08 | Technip France | Method for measuring at least one geometric characteristic of a planar cross-section to be measured on part |
| FR2941042B1 (en) * | 2009-01-09 | 2011-07-08 | Technip France | METHOD FOR MEASURING AT LEAST ONE GEOMETRIC CHARACTERISTIC OF A PLANAR SECTION TO BE MEASURED ON A WORKPIECE |
| US8107084B2 (en) | 2009-01-30 | 2012-01-31 | Zygo Corporation | Interference microscope with scan motion detection using fringe motion in monitor patterns |
| GB0910736D0 (en) * | 2009-06-22 | 2009-08-05 | Pilkington Group Ltd | Improved film thickness measurement |
| US8649016B2 (en) | 2009-06-23 | 2014-02-11 | Rudolph Technologies, Inc. | System for directly measuring the depth of a high aspect ratio etched feature on a wafer |
| TWI411765B (en) * | 2010-05-26 | 2013-10-11 | Univ Nat Formosa | Optical detection parallelism device |
| CN102554709A (en) * | 2010-12-10 | 2012-07-11 | 通用电气公司 | Distance measuring system and distance measuring method |
| US8902484B2 (en) | 2010-12-15 | 2014-12-02 | Qualcomm Mems Technologies, Inc. | Holographic brightness enhancement film |
| US8698891B2 (en) | 2011-03-09 | 2014-04-15 | Zygo Corporation | Object thickness and surface profile measurements |
| US8379219B2 (en) | 2011-05-27 | 2013-02-19 | Corning Incorporated | Compound interferometer with monolithic measurement cavity |
| CN102798345A (en) * | 2012-09-12 | 2012-11-28 | 沈阳飞机工业（集团）有限公司 | Measuring frame used for calibrating laser two-dimensional sample plate measuring instrument |
| KR101622538B1 (en) | 2013-05-20 | 2016-05-19 | 주식회사 고영테크놀러지 | Shape measurement apparatus using frequency scanning interferometer |
| US9651356B1 (en) | 2014-01-29 | 2017-05-16 | The United States Of America As Represented By The Secretary Of The Navy | Measuremental evaluation of dimensional tolerancing compliance of a cylindrical object |
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| CN105066907B (en) * | 2015-07-27 | 2017-09-01 | 南京理工大学 | A carrier frequency and phase removal method for Fourier profilometry |
| US10193612B2 (en) * | 2015-09-29 | 2019-01-29 | The United States Of America, As Represented By The Secretary Of The Army | Time-based radio beamforming waveform transmission |
| FR3045813B1 (en) * | 2015-12-22 | 2020-05-01 | Unity Semiconductor | DEVICE AND METHOD FOR MEASURING HEIGHT IN THE PRESENCE OF THIN FILMS |
| WO2017116787A1 (en) * | 2015-12-31 | 2017-07-06 | Zygo Corporation | Method and apparatus for optimizing the optical performance of interferometers |
| US11163072B2 (en) * | 2017-06-30 | 2021-11-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device for contactlessly determining the straightness of at least one long product and method for calibrating a device of this type |
| JP7057217B2 (en) * | 2018-05-21 | 2022-04-19 | 株式会社ミツトヨ | Calibration method of variable focal length lens and variable focal length lens device |
| US10782120B2 (en) * | 2018-07-03 | 2020-09-22 | Kla Corporation | Dual-interferometry wafer thickness gauge |
| EP3715805A1 (en) * | 2019-03-26 | 2020-09-30 | Universite Paris Descartes | Single shot hyperspectral wavefront sensor |
| CN110360952B (en) * | 2019-07-01 | 2021-11-02 | 西安电子科技大学 | Phase-shift profilometry three-dimensional measurement method, system, device and storage medium thereof |
| CN110243306B (en) * | 2019-07-22 | 2024-06-11 | 中国工程物理研究院激光聚变研究中心 | Plane surface shape sub-aperture splicing interferometry device and method based on robot |
| CN112683192A (en) | 2019-10-18 | 2021-04-20 | 三赢科技（深圳）有限公司 | Non-contact measuring device for overall dimension of piece to be measured |
| US11294040B1 (en) | 2021-05-10 | 2022-04-05 | Optowaves, Inc. | Time-of-interference light detection and ranging apparatus |
| US11520023B2 (en) | 2021-05-10 | 2022-12-06 | Optowaves, Inc. | High-speed time-of-interference light detection and ranging apparatus |
| CN115046469B (en) * | 2022-05-20 | 2023-05-02 | 浙江大学 | An Envelope Extraction Method of Interference Fringes Oriented to Optical Fiber White Light Interference |
| US11892566B1 (en) | 2022-09-22 | 2024-02-06 | Optowaves, Inc. | Multiplexed light detection and ranging apparatus |
| US20250123095A1 (en) * | 2023-10-13 | 2025-04-17 | Zygo Corporation | Dynamic interferometer illuminator |
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-
2001
- 2001-01-25 DE DE10195052.7T patent/DE10195052B3/en not_active Expired - Lifetime
- 2001-01-25 JP JP2001558688A patent/JP5112588B2/en not_active Expired - Lifetime
- 2001-01-25 US US09/769,859 patent/US6822745B2/en not_active Expired - Lifetime
- 2001-01-25 WO PCT/US2001/002411 patent/WO2001059402A2/en active Application Filing
- 2001-01-25 AU AU2001260975A patent/AU2001260975A1/en not_active Abandoned
-
2011
- 2011-03-09 JP JP2011052230A patent/JP5032680B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003522939A (en) | 2003-07-29 |
| US20010043333A1 (en) | 2001-11-22 |
| WO2001059402A2 (en) | 2001-08-16 |
| JP5032680B2 (en) | 2012-09-26 |
| JP5112588B2 (en) | 2013-01-09 |
| DE10195052T1 (en) | 2003-05-08 |
| US6822745B2 (en) | 2004-11-23 |
| WO2001059402A3 (en) | 2002-01-17 |
| DE10195052B3 (en) | 2015-06-18 |
| JP2011107168A (en) | 2011-06-02 |
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