US5611899A - Device for suppressing flashovers in cathode sputtering installations - Google Patents
Device for suppressing flashovers in cathode sputtering installations Download PDFInfo
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- US5611899A US5611899A US08/560,845 US56084595A US5611899A US 5611899 A US5611899 A US 5611899A US 56084595 A US56084595 A US 56084595A US 5611899 A US5611899 A US 5611899A
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- 238000009434 installation Methods 0.000 title claims description 16
- 238000004544 sputter deposition Methods 0.000 title claims description 15
- 239000000758 substrate Substances 0.000 claims description 13
- 239000000835 fiber Substances 0.000 claims description 2
- 238000001514 detection method Methods 0.000 claims 8
- 230000009849 deactivation Effects 0.000 claims 3
- 230000001360 synchronised effect Effects 0.000 claims 1
- 238000011156 evaluation Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 11
- 230000033228 biological regulation Effects 0.000 description 10
- 239000007789 gas Substances 0.000 description 10
- 230000001629 suppression Effects 0.000 description 7
- 210000002381 plasma Anatomy 0.000 description 5
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 229910018404 Al2 O3 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000035784 germination Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
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- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3444—Associated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
- H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges
Definitions
- the invention relates to a device for suppressing arcing in cathode sputtering installations in which at least one electrode is connected to an AC voltage source.
- Micro-flashovers or microarcs which can be observed with an oscilloscope occur only over a halfwave or over a few halfwaves of the applied AC voltage.
- an AC voltage frequency of 40 kHz this means that the arcs occur only for approximately 12.5 ⁇ s or a multiple thereof.
- these microarcs lead to damage of the layer to be produced, since the energy present in the microarcs is already sufficient to melt droplets having a diameter of a few ⁇ m off the target material and to sputter them onto the substrate.
- the longer the duration of the microarc the more severe the damage.
- Micro-discharges occur also as silent discharges in dielectrics and, specifically, in irregular sequences and with a duration in the range of nanoseconds. Their distribution in terms of space and time is statistical.
- Each micro-discharge comprises a thin nearly cylindrical canal with a pinched electrode spot on the metal electrode (B. Eliasson, M. Hirth and U. Kogelschatz: Ozone synthesis from oxygen in dielectric barrier discharges, J. Phys. D.: Appl. Phys. 20 (1987) 1421-1437).
- the silent discharge is preferably used in plasma chemistry to produce, for example, ozone (B. Eliasson, U. Kogelschatz: Nonequilibrium Volume Plasma Chemical Processing, IEEE Transactions on Plasma Science, Vol. 19, No. 6, 1991, pp. 1063-1077).
- the micro-discharges according to the invention refer to discharges in plasmas.
- Microarcs are typical for medium-frequency sputtering and, as a rule, represent precursor stages of large arcs. But this does not mean that every microarc must by necessity lead to a large arc. Depending on the target state, microarcs occur with greater or lesser frequency and it is not possible to even detect these microarcs with conventional methods.
- a device for detecting micro-flashovers or microarcs which comprises a counter for microarcs (non-published German Patent Application P 44 20 951.7).
- a substrate to be coated is disposed opposing at least one sputtering cathode and one electrode is provided with a target. This electrode is connected to a medium-frequency source.
- a device for recognizing micro-flashovers these micro-flashovers are detected and counted in a counting device. In the presence of a given number of micro-flashovers or in the presence of a given frequency of micro-flashovers, measures are taken to prevent large flashovers.
- the present invention addresses the problem of being able to rapidly switch off the sputtering process after a critical number of microarcs has been detected.
- the advantage achieved with the invention resides especially therein that the medium-frequency (200 Hz-300 kHz) transmitter used in the sputtering installation can be rapidly switched off upon the occurrence of a critical number of microarcs, and, as a function of the configuration of the device, it is defined whether and how long the medium-frequency transmitter remains switched off in order to attain effective suppression of the arc sequences.
- Medium-frequency sputtering installations can be provided with a single sputtering cathode as well as also with a double cathode configuration. Consequently, the invention is suitable for both cathode configurations.
- FIG. 1 a sputtering installation with a device for recognizing and suppressing flashovers
- FIG. 2 a block circuit diagram representing a circuit configuration for suppressing flashovers.
- FIG. 1 a sputtering installation 1 with the capability of recognizing and counting small arc flashovers at cathodes as well as, if necessary, of switching off the installation on the basis of the detected arc flashovers. The switching-off takes place thereby that a medium-frequency generator 20 is stopped.
- the installation 1 depicted in FIG. 1 comprises essentially a vacuum chamber 2 and wiring electronics 3. At the bottom of the vacuum chamber 2 is provided an electrode 4 on which is disposed a substrate 5 which is to be provided with a thin layer 6. In the upper region of the vacuum chamber 2 this substrate 5 is opposedby two targets 7, 8 which are implemented as longitudinal rectangles and which are to be sputtered. Both targets 7, 8 are connected across a target holding plate 9, 10 having a U-shaped cross section, with an electrode 11, 12. These electrodes 11, 12 can be part of a magnetron which, however, is not shown in FIG. 1. Between targets 7, 8 and the target holding plates 9, 10 are provided cooling channels 13 to 16.
- a voltage is present at the electrodes 11, 12 which is supplied from a medium-frequency source or a medium-frequency transmitter 20.
- the polarity of the voltage alternates continuously such that one of the electrodes is the cathode while the other is the anode and conversely.
- a process computer 58 which processes the measured data and outputs control commands.
- this process computer 58 whose regulation section 44 is depicted separately and, are supplied, for example, the values of the partial pressure measured in the process chamber.
- the process computer 58 can, for example, regulate the gas flow through valves 22, 23 disposed in gas feed lines 24, 25 which are connected with gas tanks 26, 27.
- Electrodes 11, 12 are supported on insulators 28, 29 or 30, 31 such that their planar target faces are disposed obliquely with respect to the surface of the substrate 5. These insulators 28, 29 or 30, 31 have the form of rectangular frames.
- An installation with two electrodes, built similarly to the installation shown in FIG. 1, is known from DE-A-40 10 495 to which reference is made with respect to further details.
- Substrate 5 is disposed so as to be insulated at the bottom 38 of a vessel 39.
- This vessel 39 is closed with a cover 40 which has two depressions 41, 42 in its center, in which are disposed the electrodes 11, 12.
- the substrate 5 is connected across the electrode 4 to a voltage source 43 which, in turn, is connected to the regulation 44.
- the voltage source 43 is provided for the necessary electrical bias of substrate 5, i.e. the substrate 5 is intended to be at a defined electric potential.
- a high-frequency voltage source is often used in order to alter the properties of the generated layers.
- it is insignificant that the voltage source 43 is a high-frequency voltage source.
- the regulation 44 controls the gas valves 22, 23 and the voltage sources 20 and 43. It is impressed with the value of the mean cathode voltage, with nominal values from the computer 58 and with signals from an arc suppression electronics 18.
- the two outputs 45, 46 of the medium-frequency transmitter 20, which outputs, for example, an AC voltage with a frequency of 40 kHz, are free of DC voltage potential and symmetrical with respect to one another so that the cathodes are 180° out of phase.
- a voltage addition element 47 which transfers the sum volts, transformed down to a few voltages, of both electrodes 11, 12 to a timing unit or timer 49.
- the sum voltage A+B averaged over time is supplied to the regulation 44 which evaluates it for the purpose of regulation.
- the timer 49 uses the leading edges of the electrode voltage A+B as the criterion for the synchronization of the remaining electronic devices.
- the synchronization lines 120 . . . 128, 55 in FIG. 1 are carried to an arc counter 54 and to the arc suppression electronics 18.
- the different times T 1 , T 2 can be set as is indicated through regulatable resistors 50, 51.
- With times T 1 , T 2 the position and length of a measuring window are set, which is used in the arc detector 53.
- the output of timer 49 is therefore connected with the input of the arc detector 53 across lines 78, 79, 80 which are here only depicted as one line.
- the sensitivity of the arc detector is defined, on the one hand, by the measuring window. It can additionally be set through a voltage trigger indicated by a regulatable resistor 61.
- the arc detector in turn, is connected with an arc counter 54.
- the arc suppression electronics 18 It is impressed with a synchronization signal Sy from timer 49, with a signal EA from arc detector 53, and with a signal Sa from computer 58.
- This transmitter 20 must be a transmitter which can be switched off rapidly such as is distributed with the designation PE 5000 by Advanced Energy Industries, Inc., Fort Collins, Colo. 80525.
- the medium-frequency transmitter 20 is switched off upon the occurrence of an impermissibly large number of microarcs.
- the duration of the transmitter switching is defined by special measures, as will be explained in further detail in connection with FIG. 2.
- the arc suppression electronics 18 is depicted in further detail. It can be seen that it comprises essentially an "internal arc counter" 90, a halfwave counter 17, a first timer 19, a second timer 21 as well as an internal frequency generator 88.
- the arc detector 53 has the capability of detecting discrete microarcs. To this end, in the case of a 40 kHz transmitter 20 in a time raster of 12.5 ⁇ s in a measuring window the voltage course is measured alternatingly at both electrodes 11, 12 of the double cathode configuration. The voltage is supplied from the adder 47 across line 60 to the arc detector 53. If the voltage breaks down within the measuring window, i.e. if the voltage falls below a trigger value, this event is defined as a microarc. A large arc is preceded by voltage drops below a given value. These drops are detected, for example, at a cathode in the form of a series of microarcs.
- a signal EA is sent in this case to the halfwave counter 17 as well as also to the internal arc counter 90 which are thereby initialized.
- the halfwave counter 17 thereupon counts h discrete halfwaves which defines a time ⁇ T in units of 12.5 ⁇ s.
- the signal Z is present at line 61 which leads to the internal arc counter 90.
- the internal arc counter 90 is switched into an active state through the signal Z.
- the occurrence of a threshold number n of microarcs during the time interval ⁇ T represents the beginning of a large arc.
- the values for ⁇ T and n to be set are based on experience.
- the relationship between the number h of the halfwaves and the number n of the microarcs can be established, for example, with the following table.
- the reference numbers 101, 100 in the Table refer to cascades with the aid of which the different halfwave numbers and microarc numbers can be set. Other combinations of h and n, n ⁇ h can be set at the switch cascades 100, 101. For the sake of simplicity, however, in the following reference is made to the above table.
- Both counters 17, 90 are impressed with the same synchronization signal Sy in order to ensure correct counting of the microarcs and the individual times ⁇ T, t a , t i .
- the signal GA is activated by the arc counter 90, which represents a "large arc", and output to timer 19.
- timer 19 outputs for a given length of time a switch-off signal A to line 15 which switches off transmitter 20.
- Line 15 can be a fiber optic line.
- the switch-off time t a is between 25 and 400 ⁇ s.
- the process requires a specific length of time during the subsequent driving-up of the power in order to return to the normal state. Based on experiences, this length of time has been determined to be approximately 150 ⁇ s. The values of the voltage below a given value registered necessarily during this time by the arc detector 53 must be ignored in the arc detector 53.
- This state ⁇ ignore ⁇ is conveyed to the timer 19 with the aid of signal I across line 62. Time t i for the state "ignore" is determined by timer 21.
- the second timer 21 is activated for time t i which, at a transmitting frequency of 40 kHz, can be between 50 and 300 ⁇ s.
- signal I is set which represents "ignore”.
- the timer 19 ignores the potentially arriving signals GA so that these signals do not again lead to a new transmitter switch-off.
- timers 19, 21 are built in the form of digital counters so that times t a and t i are obtained as integer multiples of one half or one whole fundamental period. Timers 19, 21 are therefore also provided with switch cascades 102, 103 with the aid of which times t a and t i can be suitably set.
- the individual switches of the cascades are denoted by a, b, d, d in all cascades. If timers 19, 21 are digital counters, the synchronization signal Sy must also be conducted to the two timers 19, 21.
- Timers 19, 21 can also be constructed as analog packages. In this case, synchronization of 19, 21 is not required.
- Signal GA can also be used simultaneously as counting signal C in order to count, for example, the total number of large arcs which have occurred in a given unit of time.
- Signal OK in FIG. 1 and FIG. 2 is identical with signal EA in FIG. 2.
- the different labels are only intended to make reference to the fact that these are always signals which refer to discrete arcs [Einzel-Arcs], i.e. to microarcs, in order to differentiate them from the large arcs (GA) which, in practice, are observed as a sequence of microarcs, as was explained above in detail.
- Signal H which is conducted to the regulation 44 is activated if discrete arcs occur or if during and after the transmitter switch-off times t a and t i continue. As long as H is active, all regulation circuits in regulation 44 are deactivated so that after the start-up of transmitter 20 the initial state of the process can be reached rapidly again before the switching-off.
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- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Arc Welding Control (AREA)
- Control Of Vending Devices And Auxiliary Devices For Vending Devices (AREA)
Abstract
Description
______________________________________ i = exponent 1 2 3 4 or power h = number of 101 1 3 7 15 halfwaves equal to 2.sup.(i) - 1 n =number 100 1 2 4 8 of microarcs equal to 2.sup.(i-1) ______________________________________
______________________________________ i = 1 this is the simplest case, in which every arc is simultaneously also viewed as a large arc (GA) i = 2 if in three successive halfwaves two microarcs occur, this is seen as a GA and specifically even if these two arcs are only detected at one cathode i = 3 in seven successive halfwaves at least four discrete events must be registered by thearc detector 53. These discrete events can all occur on asingle electrode 11 or 12 i = 4 in fifteen successive halfwaves at least eight discrete events must be registered by thearc detector 53 for the signal GA to be triggered. ______________________________________
Claims (18)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4441206.1 | 1994-11-19 | ||
DE4441206A DE4441206C2 (en) | 1994-11-19 | 1994-11-19 | Device for the suppression of rollovers in cathode sputtering devices |
Publications (1)
Publication Number | Publication Date |
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US5611899A true US5611899A (en) | 1997-03-18 |
Family
ID=6533646
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/560,845 Expired - Lifetime US5611899A (en) | 1994-11-19 | 1995-11-20 | Device for suppressing flashovers in cathode sputtering installations |
Country Status (6)
Country | Link |
---|---|
US (1) | US5611899A (en) |
EP (1) | EP0713242B1 (en) |
JP (1) | JP4231944B2 (en) |
KR (1) | KR100259109B1 (en) |
AT (1) | ATE189338T1 (en) |
DE (2) | DE4441206C2 (en) |
Cited By (59)
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WO1999014394A1 (en) * | 1997-09-17 | 1999-03-25 | Tokyo Electron Limited | Device and method for detecting and preventing arcing in rf plasma systems |
US5910872A (en) * | 1996-12-16 | 1999-06-08 | Gec Alsthom T & D Sa | Method of discriminating between an internal arc and an interruption arc detected inside a metal-clad electrical installation |
US5922134A (en) * | 1996-05-14 | 1999-07-13 | Tokyo Ohka Kogyo Co., Ltd. | Simultaneous discharge device |
US5993615A (en) * | 1997-06-19 | 1999-11-30 | International Business Machines Corporation | Method and apparatus for detecting arcs |
US6063245A (en) * | 1996-12-12 | 2000-05-16 | International Business Machines Corporation | Magnetron sputtering method and apparatus utilizing a pulsed energy pattern |
US6096174A (en) * | 1996-12-13 | 2000-08-01 | Leybold Systems Gmbh | Apparatus for coating a substrate with thin layers |
US6162332A (en) * | 1998-05-07 | 2000-12-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for preventing arcing in sputter chamber |
US6328857B1 (en) * | 1999-08-05 | 2001-12-11 | Nippon Sheet Glass Co., Ltd. | Method for forming coating on substrate and sputtering apparatus used for the method |
US6338777B1 (en) * | 1998-10-23 | 2002-01-15 | International Business Machines Corporation | Method and apparatus for sputtering thin films |
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Also Published As
Publication number | Publication date |
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JP4231944B2 (en) | 2009-03-04 |
EP0713242B1 (en) | 2000-01-26 |
JPH08225935A (en) | 1996-09-03 |
EP0713242A2 (en) | 1996-05-22 |
KR100259109B1 (en) | 2000-06-15 |
EP0713242A3 (en) | 1998-02-04 |
ATE189338T1 (en) | 2000-02-15 |
DE4441206C2 (en) | 1996-09-26 |
DE59507692D1 (en) | 2000-03-02 |
DE4441206A1 (en) | 1996-05-23 |
KR960020625A (en) | 1996-06-17 |
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