US3766030A - Method of electropolishing - Google Patents
Method of electropolishing Download PDFInfo
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- US3766030A US3766030A US00212566A US3766030DA US3766030A US 3766030 A US3766030 A US 3766030A US 00212566 A US00212566 A US 00212566A US 3766030D A US3766030D A US 3766030DA US 3766030 A US3766030 A US 3766030A
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- 238000000034 method Methods 0.000 title claims abstract description 11
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 42
- 150000002500 ions Chemical class 0.000 claims abstract description 36
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000010949 copper Substances 0.000 claims abstract description 27
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 21
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 230000005484 gravity Effects 0.000 claims abstract description 14
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 claims abstract description 7
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims description 32
- 239000002184 metal Substances 0.000 claims description 32
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract description 25
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 19
- 229910052802 copper Inorganic materials 0.000 abstract description 17
- 229910052742 iron Inorganic materials 0.000 abstract description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 11
- 230000001590 oxidative effect Effects 0.000 abstract description 11
- 229910052759 nickel Inorganic materials 0.000 abstract description 9
- 239000003115 supporting electrolyte Substances 0.000 abstract description 8
- 238000011109 contamination Methods 0.000 abstract description 5
- 239000003792 electrolyte Substances 0.000 abstract description 5
- 230000009467 reduction Effects 0.000 abstract description 4
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 3
- 150000004706 metal oxides Chemical class 0.000 abstract description 3
- 239000010935 stainless steel Substances 0.000 description 13
- 229910001220 stainless steel Inorganic materials 0.000 description 13
- -1 halogen ions Chemical class 0.000 description 9
- 150000002739 metals Chemical class 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 238000005266 casting Methods 0.000 description 8
- 238000003801 milling Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 229910001369 Brass Inorganic materials 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000010951 brass Substances 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000011651 chromium Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- DJLCOAPFZCDZQW-UHFFFAOYSA-N chromium phosphoric acid Chemical compound [Cr].OP(O)(O)=O DJLCOAPFZCDZQW-UHFFFAOYSA-N 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000011065 in-situ storage Methods 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 238000005201 scrubbing Methods 0.000 description 3
- 239000010802 sludge Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000005282 brightening Methods 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- GQDHEYWVLBJKBA-UHFFFAOYSA-H copper(ii) phosphate Chemical compound [Cu+2].[Cu+2].[Cu+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GQDHEYWVLBJKBA-UHFFFAOYSA-H 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000011133 lead Substances 0.000 description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910001453 nickel ion Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000013049 sediment Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- GQUJEMVIKWQAEH-UHFFFAOYSA-N titanium(III) oxide Chemical compound O=[Ti]O[Ti]=O GQUJEMVIKWQAEH-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 229910000925 Cd alloy Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- XWROUVVQGRRRMF-UHFFFAOYSA-N F.O[N+]([O-])=O Chemical compound F.O[N+]([O-])=O XWROUVVQGRRRMF-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910000807 Ga alloy Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910000927 Ge alloy Inorganic materials 0.000 description 1
- 229910000846 In alloy Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229910052778 Plutonium Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 229910001007 Tl alloy Inorganic materials 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- DMFGNRRURHSENX-UHFFFAOYSA-N beryllium copper Chemical compound [Be].[Cu] DMFGNRRURHSENX-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000001455 metallic ions Chemical class 0.000 description 1
- 231100000324 minimal toxicity Toxicity 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000010572 single replacement reaction Methods 0.000 description 1
- 210000000952 spleen Anatomy 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- 230000003319 supportive effect Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Definitions
- ABSTRACT 22 Filed; n 27 1971 A method of electropolishing utilizing a solution comprising a major amount of phosphoric acid, a minor
- the electrolyte comprises [58] lFieltil 0r Qfilmlill 204/1299, 129.95, ions of nickel and ions of one or more Of iron and COP- 204/129 75 per.
- the used bath can be reconstituted by the addition of phosphoric acid to adjust its specific gravity 5 References 3mm and may be purged of contamination by the addition UNITED STATES PATENTS of nickelous carbonate or by cathodic reduction.
- Use of the bath provides a monomolecular layer of metal 2,366,714 1/1945 Faust 204/1299 2,429,676 10/1947 Faust 204/1299 Oxlde on the processed amcle' 2,596,307 5/1952 Stuffer 204/1299 13 Claims, 4i Drawing Figures Misrnon or ELIEC'IRDIPULISIIING FIELD OF THE INVENTION
- the fields of art to which the invention pertains includes the fields of electropolishing and chemical milling.
- an electropolishing and chemical milling solution comprising a major amount of phosphoric acid and a minor amount of oxidizing component selected from chromium sesquioxide and a trivalent titanium oxide.
- the bath solution contain sup porting electrolytes such as Ni, Fe and Cu ions which may be added initially to the bath solution or may be obtained in-situ during its operation.
- the solutions have broad spectrum utility for a wide variety of industrial metals, have an indefinitely long process life and minimal toxicity both in-plant and to the outside environment.
- many articles can be electropolished with substantially less processing time than with prior art baths and are often found to have unique surface characteristics as a result of such processing. Such characteristics include a brighter appearance, passivation against corrosion and much greater resistance to smudging than heretobefore obtained.
- FIG. I is a schematic, plan view of an electropolishing bath for utilization of the novel solutions as provided herein;
- FIG. 2 is a cross-sectional view of the bath taken on line 2-2 of FIG. II, in the direction of the arrows;
- FIG. 3 is a cross-sectional view of the bath taken on line 33 of FIG. ii, in the direction of the arrows;
- FIG. A is a schematic, cut-away of the surface region of an article electropolished utilizing a solution of this invention.
- an electropolishing bath II which includes a tank 112 illustrated as having a rectangular parallelepiped configuration, but which can be cubic in its most efficient configuration.
- the walls of the tank I2 can be fabricated from or lined with stainless steel sheet, polyester, glass laminates, polyvinyl chloride, or any other material which is relatively inert to chemical action by the electropolishing solution.
- Lead lined tanks can be used if the polishing solution is provided with additional Cu and Fe ions above that required as electrolyte.
- a pair of cathode bars M and 116 are carried on insulated bearings I8, 18' and 20, 20, respectively, secured atop the edges of two of the opposite walls of the tank 12 so that the cathode rods 14- and I6 are disposed adjacent, but spaced from, the other two opposite walls of the tank 12.
- An anode bar 22 is carried centrally parallel to the cathode bars 14 and I6 by insulated bearings 24 and 24, secured to the top edges of the first mentioned opposite tank walls.
- a pair of cathode plates 26 and 28 are suspended from the cathode bars 14 and 116 by electrically conductive wire rods 3%, 30', 32 and 32 and extend into the tank so as to occupy about -fi5% of the tank cross-sectional area. It is, of course, important that the cathodes be completely out of contact with the tank walls where stainless steel or other conductive metal is used for the walls.
- the cathodes 26 and 2% can be constructed of stainless steel or copper sheet, or other good electrical conductor.
- the articles to be electropolished can be suspended directly from the anode bar 22 by conductive wire or rods hanging from the anode bar 22, or a rack 32, as illustrated, can be used.
- the rack 34, or suspension wire can be formed of bare brass, copper, berylliumcopper alloy, aluminum, titanium, and the like. However, it is preferred that the rack or supporting wire have minimum exposure consistent with conductivity to the article to be polished.
- An appropriate rack can be formed of insulated copper or brass spleens with exposed titanium contacts 36 to hold the articles.
- the articles illustrated are steel cylinders 3%, but the external surface of any article configuration can be electropolished.
- auxiliary cathodes bare or insulated in part, may be required since the internal throw for polishingis only approximately 73%7? the recess diameter.
- selective chemical milling may be accomplished by a selectively bared auxiliary cathode appropriately disposed within the recess, all as known to the prior art.
- a DC power supply 42 is connected so as to place a positive potential on the anode and negative potentials on the cathodes. While the total current drawn depends upon the type of rack and number of work pieces used, appropriate current densities for both polishing and chemical milling can be obtained with the solutions used herein, at about 8-12 volts DC.
- reaction tanks iii) fi approxima tay m gaming" capacity, a 1,000-
- the tank 12 is filled with an electropolishing solution All so as to completely cover the cathode plates 26 and 28 and articles to be processed.
- the electropolishing solution is of a unique formulation for this purpose and imparts the advantages as hereinbefore described.
- the electropolishing solution 41-0 contains 68.5-88.5 weight percent FOX, 0.0010.01 weight percent of an oxidizing component selected from chromium sesquioxide and a trivalent titanium oxide, and a small amount of current supporting electrolyte.
- the oxidizing component is chromium sesquioxide the bath has application to most industrial metals. It will clean and brighten magnesium,
- any metal which is capable of being oxidized by the reduction of trivalent chromium can be cleaned. Accordingly, a broad spectrum bath is provided by the utilization of chromium sesquioxide as the oxidizing component.
- a variety of metals can be processed simultaneously, such as stainless steel, aluminum, copper or brass.
- trivalent titanium oxide When it is desired to clean and brighten titanium and tantalum, one can utilize a trivalent titanium oxide as the oxidizing component.
- the trivalent titanium oxide can also be utilized to clean and brighten cobalt or any metal capable of being oxidized by the reduction of trivalent titanium.
- the term trivalent titanium oxide is meant to include titanium sesquioxide and hydrates thereof.
- the titanium compound component can be added as such or produced in situ, and in this latter case the exact nature of the hydrate cannot be readily definitively ascertained.
- the electropolishing solution 40 can be used initially with only the phosphoric acid and sesquioxide components, but preferably, divalent nickel is added directly or by oxidation from the cathode.
- the Ni acts as supporting electrolyte and, as a result of its favorable redox potential, enhances the electropolishing activity of the bath.
- metallic ions are oxidized from the surface of the articles into the solution and thereafter serve, not as contaminants, but as supporting electrolyte.
- the solution can thus derive its current bearing capabilities from the articles themselves, and it is found that large amounts of such ions can be accommodated in the solution and actually improve its performing characteristics.
- Trivalent iron ions and divalent copper ions are also leached into solution from articles as they are electropolished, as well as from racks and hangars, and serve as additional supporting electrolyte.
- the chromium sesquioxide or trivalent titanium oxide can also be leached from corresponding metal plates immersed in the phosphoric acid as anodes.
- the initial processing bath requires changes in operating parameters to accommodate the varying current capacity and electropolishing characteristic of the bath as it is being brought up to full strength. Accordingly, it is advantageous to initially add the sesquioxide and supporting electrolytes to the bath to immediately establish more uniform operating parameters.
- the components can be added in any form which will result in their dissolution in the phosphoric acid.
- the phosphoric acid is used in sufficient concentration so that the electropolishing solution has a low vapor pressure, greatly minimizing its toxicity. it also serves as a means for suppressing and controlling l-i and OH ions as a precipitation bath for cations which have an insoluble phosphate, oxide or hydrate form or other insoluble form.
- the phosphoric acid is used in amounts ranging from about 68.588.5 weight percent.
- the chromium sesquioxide or trivalent titanium oxide, as above indicated, can be obtained from the pure metal by electrolytic decomposition in the phosphoric acid; or it may be added as such to the bath. At the above concentration levels of phosphoric acid, the electroolishing bath has a specific gravity of about 1.451.70.
- Too low a specific gravity may result in pitting of the processed article. With too high a specific gravity, the temperature required for proper operation is so high as to cause excessive vapor pressure and attendant danger to the workers.
- a preferred specific gravity range is about 1.58-l .62 and at this range, the electropolishing bath can be advantageously operated at a temperature of about 145F.
- Divalent nickel can be added as a water slurry of nickelous carbonate. Generally, a minimum amount of 0.002 weight percent of divalent nickel ions can be used and it can be present to the extent of 0.2 weight percent of the ions, although even higher amounts can be accommodated. Iron ions will likely be an immediate contaminant which, in the absence of initial iron ions, may change the operating parameters of the bath. Accordingly, by adding trivalent iron initially these parameters can be present. The trivalent iron can be added as Fehd 2O dissolved in phosphoric acid. Generally, an amount ranging from about 0.005 to about 0.05 weight percent or higher can be used. Copper can also be added as supportive electrolyte and can be added as cupric phosphate.
- ferric oxide by using a technical grade of ferric oxide, sufficient divalent copper may be present to provide the desired amount. Generally, an amount ranging from about 0.01 to about 1.5 weight percent, or higher, can be used. Any excess iron or copper will be plated onto the cathode as a loose sponge and can subsequently be removed by mechanical scrubbing or spray washing as hereinabove described.
- Solutions formulated in accordance with the foregoing specification provide uniquely effective electropolishing and chemical milling baths.
- FIG. 4 a particularly unique advantage obtained by utilizing such baths is schematically illustrated wherein the surface of a metal object 44 processed through the bath is provided with a surface defined by a monomolecular layer 46 of oxide of the metal.
- monomolecular is meant to include both charged and uncharged molecules; i.e., the term includes monoionic material.
- the positive ion (attracted to the cathode) is capable of oxidizing titanium metal in the presence of FF" and H gas, and at the anode trivalent titanium oxide is formed along with the liberation of oxygen.
- metal articles polished with the electropolishing solution as described herein are brighter in appearance, are passivated against corrosion and have much greater resistance to smudging than articles pro Ded with prior art solutions.
- Prior art processes result in the formation of multiple layers of metal oxide, providing adsorbtion and/or absorption centers for fingerprints and other smudges.
- the monomolecular surface of metal oxide provided by treatment with the present phosphoric acid solution has insufficient depth to accommodate corroding particles or oily materials. This is particularly evident with copper and aluminum and alloys thereof.
- cationic impurities Upon extended use of the solutions herein, cationic impurities will either precipitate out as insuluble sediments, be reduced at the cathodes as cathode sludge (removable by mechanical scrubbing), or contribute to ionic current support. Anionic impurities may precipitate with the cations and it has been observed that the solution recovers overnight when loaded with impurities.
- N0 e.g., 50 ppm
- N0 may be present in excess which, unless removed, may cause pitting of stainless steel articles and should be removed.
- the solution can be cleared of such ions and of halogen and S0,, ions by the addition of a hot water slurry of nickelous carbonate or other metal carbonate to the solution.
- ions In the absence of N0 halogen, or SO, ions the solution has an indefinte lifetime.
- Water can be lost by both evaporation and electrolysis.
- Phosphoric acid is primarily lost by drag-out and oxidization of organic materials introduced into the solution during processing of dirty parts.
- volume and specific gravity are sim ply adjusted by the addition of water and concentrated, e.g., 85 weight percent, phosphoric acid.
- a water solution of the sesquioxide oxidant can be added, decreasing the specific gravity, or phosphoric acid can be added to increase the specific gravity.
- phosphoric acid can be added to increase the specific gravity.
- Example l An electropolishing and chemical milling solution was prepared having the following formulation:
- Ni 0.003870 C130 0.0002% Fe 0.00l0% Cu 0.03% n,o 19.0 H 'O, Ol-l balance Initially by weight of phosphoric acid was placed in the reaction tank and the required amount of Fe was added as ferric oxide. The required amounts of Cu and Ni were added as cupric phosphate and as a water slurry of nickel carbonate, respectively. The required amount of chromium sesquioxide was added as such. The temperature was brought to l35l45F and diluted with dionized water until a specific gravity of 1.58-1.62 was obtained.
- a new stainless steel casting with a dull finish was placed in a rack, such as illustrated as 3 in FiGS. 1-3, in contact with the anode bar 32. About 8-l0 volts DC were applied for about 12 minutes and the casting was removed and found to have a clean bright finish.
- Example 2 The phosphoric acid-chromium sesquioxide solution formulated in Example l was used to process metal articles formed of chromium, nickel, stainless steel, copper, brass, manganese, aluminum, zirconium, plain steel and cast iron and in each case was found to clean and brighten the article.
- the conditions were as described in Example 1 except that the average processing time was about 6 minutes.
- Example 3 The phosphoric acid-chromium sesquioxide processing solution of Example 1 was used to process tin and zinc articles and was found to clean the articles, but with dull finishes.
- Example 4 A phosphoric acid-sesquioxide bath was formulated in accordance with Example 1 but substituting titanium sesquioxide for the chromium sesquioxide. The bath was used to clean and brighten titanium, tantalum and cobalt articles.
- Example 5 After extensive use of the phosphoric acid-chromium sesquioxide bath of Example 1, a loss of efficiency of process was noted by a lengthening of processing time required for brightening of metal parts. The solution was allowed to remain overnight and upon its reuse was found to be restored to its original efficiency.
- a method for electropolishing a metal article utilizing:
- said electropolishing solution comprising about 68.5-88.5 weight percent POf, about 0.00l-0.01 weight percent oxidizing component selected from chromium sesquioxide and a trivalent titanium oxide, about 0.0002-0.2 weight percent Ni and from about to about 2 weight percent electrolyte selected from Fe and Cu", the balance comprising essentially H O, H O and OH.
- said solution includes about 0.0005-0.05 weight percent Fe ions.
- Trivalent titanium oxide Ee Cu 0-2 H O, H O, OH Balance 9.
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Abstract
A method of electropolishing utilizing a solution comprising a major amount of phosphoric acid, a minor amount of oxidizing component selected from chromium sesquioxide and a trivalent titanium oxide, and a minor amount of current supporting electrolyte. In particular embodiments, the electrolyte comprises ions of nickel and ions of one or more of iron and copper. The used bath can be reconstituted by the addition of phosphoric acid to adjust its specific gravity and may be purged of contamination by the addition of nickelous carbonate or by cathodic reduction. Use of the bath provides a monomolecular layer of metal oxide on the processed article.
Description
atet H 1 [111 19 9 Greene @m M, 119% [5 ME'llllllUD or ELJEQTMUPUMSIHHING 3,213,008 10/1965 Valentin 204/1299 [75] Inventor: figligvfard M. Greene, Canoga Park, Primary Examiner Tl Tufarieno Att0rney--Byard G. Nilsson et a1. [73] Assignee: Mirror: Products Corp Van Nuys,
Calif. [57] ABSTRACT 22 Filed; n 27 1971 A method of electropolishing utilizing a solution comprising a major amount of phosphoric acid, a minor [21] Appl' 2129566 amount of oxidizing component selected from chr0- mium sesquioxide and a trivalent titanium oxide, and a 52 us. on. 204/129.9, 204/129.75 minor amount of current supporting electrolyte In 511 111111. e1. mar 3/00,c23b 1/00 Particular embodiments, the electrolyte comprises [58] lFieltil 0r Qfilmlill 204/1299, 129.95, ions of nickel and ions of one or more Of iron and COP- 204/129 75 per. The used bath can be reconstituted by the addition of phosphoric acid to adjust its specific gravity 5 References 3mm and may be purged of contamination by the addition UNITED STATES PATENTS of nickelous carbonate or by cathodic reduction. Use of the bath provides a monomolecular layer of metal 2,366,714 1/1945 Faust 204/1299 2,429,676 10/1947 Faust 204/1299 Oxlde on the processed amcle' 2,596,307 5/1952 Stuffer 204/1299 13 Claims, 4i Drawing Figures Misrnon or ELIEC'IRDIPULISIIING FIELD OF THE INVENTION The fields of art to which the invention pertains includes the fields of electropolishing and chemical milling.
BACKGROUND AND SUMMARY OF THE INVENTION A large variety of bath solutions are available for electropolishing and/or chemical milling of most industrial metals. Such baths as are presently known are generally limited in their application to the treatment of specific metals or limited groups of metals. There are no effective broad spectrum electropolishing and chemical milling baths which can be used for most industrial metals. Furthermore, prior baths generally require periodic replacement as they become contaminated from the articles being treated. Such contamination can take the form of excess metal ions from the surface of the article, N SO, ions, halogen ions, or the like. As the bath solution evaporates or the active component is removed by drag-out, replenishment results in a concentration of the contaminating ions so that upon each replenishment the useful life of the bath is substantially further reduced. In addition to the foregoing limitations, many prior art baths are formed with solutions of high vapor pressure resulting in in-plant contamination with toxic materials and with contamination of the outside environment when disposing of the bath solutions.
In particular, an electropolishing and chemical milling solution is provided comprising a major amount of phosphoric acid and a minor amount of oxidizing component selected from chromium sesquioxide and a trivalent titanium oxide. The bath solution contain sup porting electrolytes such as Ni, Fe and Cu ions which may be added initially to the bath solution or may be obtained in-situ during its operation. The solutions have broad spectrum utility for a wide variety of industrial metals, have an indefinitely long process life and minimal toxicity both in-plant and to the outside environment. Additionally, many articles can be electropolished with substantially less processing time than with prior art baths and are often found to have unique surface characteristics as a result of such processing. Such characteristics include a brighter appearance, passivation against corrosion and much greater resistance to smudging than heretobefore obtained.
BRIEF DESCRIPTION OF THE DRAWINGS FIG. I is a schematic, plan view of an electropolishing bath for utilization of the novel solutions as provided herein;
FIG. 2 is a cross-sectional view of the bath taken on line 2-2 of FIG. II, in the direction of the arrows;
FIG. 3 is a cross-sectional view of the bath taken on line 33 of FIG. ii, in the direction of the arrows; and
FIG. A is a schematic, cut-away of the surface region of an article electropolished utilizing a solution of this invention.
DETAILED DESCRIPTION Referring to FIGS. 1-3, there is illustrated an electropolishing bath II) which includes a tank 112 illustrated as having a rectangular parallelepiped configuration, but which can be cubic in its most efficient configuration. The walls of the tank I2 can be fabricated from or lined with stainless steel sheet, polyester, glass laminates, polyvinyl chloride, or any other material which is relatively inert to chemical action by the electropolishing solution. Lead lined tanks can be used if the polishing solution is provided with additional Cu and Fe ions above that required as electrolyte.
A pair of cathode bars M and 116 are carried on insulated bearings I8, 18' and 20, 20, respectively, secured atop the edges of two of the opposite walls of the tank 12 so that the cathode rods 14- and I6 are disposed adjacent, but spaced from, the other two opposite walls of the tank 12. An anode bar 22 is carried centrally parallel to the cathode bars 14 and I6 by insulated bearings 24 and 24, secured to the top edges of the first mentioned opposite tank walls. A pair of cathode plates 26 and 28 are suspended from the cathode bars 14 and 116 by electrically conductive wire rods 3%, 30', 32 and 32 and extend into the tank so as to occupy about -fi5% of the tank cross-sectional area. It is, of course, important that the cathodes be completely out of contact with the tank walls where stainless steel or other conductive metal is used for the walls. The cathodes 26 and 2% can be constructed of stainless steel or copper sheet, or other good electrical conductor.
The articles to be electropolished can be suspended directly from the anode bar 22 by conductive wire or rods hanging from the anode bar 22, or a rack 32, as illustrated, can be used. The rack 34, or suspension wire, can be formed of bare brass, copper, berylliumcopper alloy, aluminum, titanium, and the like. However, it is preferred that the rack or supporting wire have minimum exposure consistent with conductivity to the article to be polished. An appropriate rack can be formed of insulated copper or brass spleens with exposed titanium contacts 36 to hold the articles. The articles illustrated are steel cylinders 3%, but the external surface of any article configuration can be electropolished. Where deep recesses in the article are present, auxiliary cathodes, bare or insulated in part, may be required since the internal throw for polishingis only approximately 73%7? the recess diameter. In such case, selective chemical milling may be accomplished by a selectively bared auxiliary cathode appropriately disposed within the recess, all as known to the prior art. A DC power supply 42 is connected so as to place a positive potential on the anode and negative potentials on the cathodes. While the total current drawn depends upon the type of rack and number of work pieces used, appropriate current densities for both polishing and chemical milling can be obtained with the solutions used herein, at about 8-12 volts DC. For reaction tanks iii) fi approxima tay m gaming" capacity, a 1,000-
' ampere supply is generally adequate.
The tank 12 is filled with an electropolishing solution All so as to completely cover the cathode plates 26 and 28 and articles to be processed. The electropolishing solution is of a unique formulation for this purpose and imparts the advantages as hereinbefore described. In its fully operative condition, the electropolishing solution 41-0 contains 68.5-88.5 weight percent FOX, 0.0010.01 weight percent of an oxidizing component selected from chromium sesquioxide and a trivalent titanium oxide, and a small amount of current supporting electrolyte. When the oxidizing component is chromium sesquioxide the bath has application to most industrial metals. It will clean and brighten magnesium,
selenium, plutonium, thorium, beryllium, uranium, halfnium, manganese, vanadium columbium, silicon, chromium, gallium, iron, cadmium, indium, thallium, nickel, molybdenum, germanium, tungsten, zirconium and copper alloys including these metals, and will clean (but without marked brightening) zinc, cobalt, tin and lead. Generally, any metal which is capable of being oxidized by the reduction of trivalent chromium can be cleaned. Accordingly, a broad spectrum bath is provided by the utilization of chromium sesquioxide as the oxidizing component. A variety of metals can be processed simultaneously, such as stainless steel, aluminum, copper or brass. Successive use on other metals can be accomplished without interference or smudging by preventing polarization on the surfaces of the article. On the other hand, the solution does not polarize on the ferrous metals, brass, copper, aluminum or aluminum alloys, and single replacement reaction may be accommodated by submerging and withdrawing the articles under power.
When it is desired to clean and brighten titanium and tantalum, one can utilize a trivalent titanium oxide as the oxidizing component. The trivalent titanium oxide can also be utilized to clean and brighten cobalt or any metal capable of being oxidized by the reduction of trivalent titanium. The term trivalent titanium oxide is meant to include titanium sesquioxide and hydrates thereof. The titanium compound component can be added as such or produced in situ, and in this latter case the exact nature of the hydrate cannot be readily definitively ascertained.
The electropolishing solution 40 can be used initially with only the phosphoric acid and sesquioxide components, but preferably, divalent nickel is added directly or by oxidation from the cathode. The Ni acts as supporting electrolyte and, as a result of its favorable redox potential, enhances the electropolishing activity of the bath. When the solution in such form is used, metallic ions are oxidized from the surface of the articles into the solution and thereafter serve, not as contaminants, but as supporting electrolyte. The solution can thus derive its current bearing capabilities from the articles themselves, and it is found that large amounts of such ions can be accommodated in the solution and actually improve its performing characteristics. When large excesses of metal ions are present they either self leach by precipitating out as insoluble sediments or reduce at the cathode, as cathode sludge and can thereafter be mechanically removed. Anionic impurities precipitate with the cations or, in the case of anions such as N S0,, or halogen, can be cleared by the addition of a metal carbonate. lmportantly, it has been found that solutions loaded with impurities recover overnight and in the absence of the aforementioned anions has an indefinite useful life.
An anode of stainless steel is advantageously utilized to provide the divalent nickel ions. Trivalent iron ions and divalent copper ions are also leached into solution from articles as they are electropolished, as well as from racks and hangars, and serve as additional supporting electrolyte. The chromium sesquioxide or trivalent titanium oxide can also be leached from corresponding metal plates immersed in the phosphoric acid as anodes.
On the other hand, by relying upon the in-situ provision of components, the initial processing bath requires changes in operating parameters to accommodate the varying current capacity and electropolishing characteristic of the bath as it is being brought up to full strength. Accordingly, it is advantageous to initially add the sesquioxide and supporting electrolytes to the bath to immediately establish more uniform operating parameters. The components can be added in any form which will result in their dissolution in the phosphoric acid.
The phosphoric acid is used in sufficient concentration so that the electropolishing solution has a low vapor pressure, greatly minimizing its toxicity. it also serves as a means for suppressing and controlling l-i and OH ions as a precipitation bath for cations which have an insoluble phosphate, oxide or hydrate form or other insoluble form. The phosphoric acid is used in amounts ranging from about 68.588.5 weight percent. The chromium sesquioxide or trivalent titanium oxide, as above indicated, can be obtained from the pure metal by electrolytic decomposition in the phosphoric acid; or it may be added as such to the bath. At the above concentration levels of phosphoric acid, the electroolishing bath has a specific gravity of about 1.451.70. Too low a specific gravity may result in pitting of the processed article. With too high a specific gravity, the temperature required for proper operation is so high as to cause excessive vapor pressure and attendant danger to the workers. A preferred specific gravity range is about 1.58-l .62 and at this range, the electropolishing bath can be advantageously operated at a temperature of about 145F.
Divalent nickel can be added as a water slurry of nickelous carbonate. Generally, a minimum amount of 0.002 weight percent of divalent nickel ions can be used and it can be present to the extent of 0.2 weight percent of the ions, although even higher amounts can be accommodated. Iron ions will likely be an immediate contaminant which, in the absence of initial iron ions, may change the operating parameters of the bath. Accordingly, by adding trivalent iron initially these parameters can be present. The trivalent iron can be added as Fehd 2O dissolved in phosphoric acid. Generally, an amount ranging from about 0.005 to about 0.05 weight percent or higher can be used. Copper can also be added as supportive electrolyte and can be added as cupric phosphate. Alternatively, by using a technical grade of ferric oxide, sufficient divalent copper may be present to provide the desired amount. Generally, an amount ranging from about 0.01 to about 1.5 weight percent, or higher, can be used. Any excess iron or copper will be plated onto the cathode as a loose sponge and can subsequently be removed by mechanical scrubbing or spray washing as hereinabove described.
Solutions formulated in accordance with the foregoing specification provide uniquely effective electropolishing and chemical milling baths. Referring to FIG. 4, a particularly unique advantage obtained by utilizing such baths is schematically illustrated wherein the surface of a metal object 44 processed through the bath is provided with a surface defined by a monomolecular layer 46 of oxide of the metal. The term monomolecular" is meant to include both charged and uncharged molecules; i.e., the term includes monoionic material. While it is not desired nor intended to be limited to any particular theory of operation, it appearsthat oxidation at the anodic surface of the processed article and liberation of oxygen does not occur solely from the conversion of hydroxyl ion to hydrogen ion and oxygen, but also appears to result from an oxo or other negatively charged coordination complex anion associated with the active oxide and such mechanism may account for the monomolecular structure of the surface oxide layer of the article being processed. For example, using a solution of triavlent titanium oxide in the phosphoric acid with stainless steel (300 series) for both anode and cathode, the stainless steel was polished by metal removal at both electrodes, indicating the presence of both positive and negative ions capable of oxidizing the stainless steel (Cr, Ni) at both electrodes. The positive ion (attracted to the cathode) is capable of oxidizing titanium metal in the presence of FF" and H gas, and at the anode trivalent titanium oxide is formed along with the liberation of oxygen. Regardless of the mechanism of operation, metal articles polished with the electropolishing solution as described herein are brighter in appearance, are passivated against corrosion and have much greater resistance to smudging than articles pro cessed with prior art solutions. Prior art processes result in the formation of multiple layers of metal oxide, providing adsorbtion and/or absorption centers for fingerprints and other smudges. However, the monomolecular surface of metal oxide provided by treatment with the present phosphoric acid solution has insufficient depth to accommodate corroding particles or oily materials. This is particularly evident with copper and aluminum and alloys thereof.
Upon extended use of the solutions herein, cationic impurities will either precipitate out as insuluble sediments, be reduced at the cathodes as cathode sludge (removable by mechanical scrubbing), or contribute to ionic current support. Anionic impurities may precipitate with the cations and it has been observed that the solution recovers overnight when loaded with impurities. Following extensive processing of articles which have previously been passivated by treatment with nitric acid, N0 (e.g., 50 ppm) may be present in excess which, unless removed, may cause pitting of stainless steel articles and should be removed. The solution can be cleared of such ions and of halogen and S0,, ions by the addition of a hot water slurry of nickelous carbonate or other metal carbonate to the solution. In the absence of N0 halogen, or SO, ions the solution has an indefinte lifetime. Water can be lost by both evaporation and electrolysis. Phosphoric acid is primarily lost by drag-out and oxidization of organic materials introduced into the solution during processing of dirty parts. Thus, volume and specific gravity are sim ply adjusted by the addition of water and concentrated, e.g., 85 weight percent, phosphoric acid. When reconstituting to replace losses, a water solution of the sesquioxide oxidant can be added, decreasing the specific gravity, or phosphoric acid can be added to increase the specific gravity. As previously noted, if copper ion accumulates in high concentration (evidenced by a decrease in polishingefficiency), the excess ions can be readily removed by running stainless steel at the anodes and cathodes and removing the cathode sludge by mechanical scrubbing or spray washing.
The following examples in which all parts are by weight will. illustrate aspects of the invention.
Example l An electropolishing and chemical milling solution was prepared having the following formulation:
P0,, 78.5% Ni 0.003870 C130 0.0002% Fe 0.00l0% Cu 0.03% n,o 19.0 H 'O, Ol-l balance Initially by weight of phosphoric acid was placed in the reaction tank and the required amount of Fe was added as ferric oxide. The required amounts of Cu and Ni were added as cupric phosphate and as a water slurry of nickel carbonate, respectively. The required amount of chromium sesquioxide was added as such. The temperature was brought to l35l45F and diluted with dionized water until a specific gravity of 1.58-1.62 was obtained.
A new stainless steel casting with a dull finish was placed in a rack, such as illustrated as 3 in FiGS. 1-3, in contact with the anode bar 32. About 8-l0 volts DC were applied for about 12 minutes and the casting was removed and found to have a clean bright finish.
For comparison purposes, a similar stainless steel casting was processed in accordance with military specification MIL S 5,002 wherein it was soaked in a hydrofluoric acid-nitric acid bath for one hour to passivate the surface. Upon removal from the processing bath, the casting had a clean, brightened surface but not as bright as obtained with only 12 minutes processing in the phosphoric acid-sesquioxide solution. The casting surface retained fingerprints to a much greater extent than the first sample. Both castings were exposed under similar conditions to salt spray for a period of 6 months after which they were inspected. It was found that the casting processed in accordance with the military specification was extensively corroded but the casting processed with the phosphoric acid-sesquioxide solution showed only minor evidence of corrosion.
Example 2 The phosphoric acid-chromium sesquioxide solution formulated in Example l was used to process metal articles formed of chromium, nickel, stainless steel, copper, brass, manganese, aluminum, zirconium, plain steel and cast iron and in each case was found to clean and brighten the article. The conditions were as described in Example 1 except that the average processing time was about 6 minutes.
Example 3 The phosphoric acid-chromium sesquioxide processing solution of Example 1 was used to process tin and zinc articles and was found to clean the articles, but with dull finishes.
Example 4 A phosphoric acid-sesquioxide bath was formulated in accordance with Example 1 but substituting titanium sesquioxide for the chromium sesquioxide. The bath was used to clean and brighten titanium, tantalum and cobalt articles.
Example 5 After extensive use of the phosphoric acid-chromium sesquioxide bath of Example 1, a loss of efficiency of process was noted by a lengthening of processing time required for brightening of metal parts. The solution was allowed to remain overnight and upon its reuse was found to be restored to its original efficiency.
As required, detailed illustrative embodiments of the invention have been disclosed. However, it is to be understood that these embodiments merely exemplify the invention which may take forms different from the specific illustrative embodiments disclosed. Therefore, specific structural and functional details are not necessarily to be interpreted as limiting but as a basis for the claims which define the scope of the invention.
I claim:
1. A method for electropolishing a metal article utilizing:
a tank;
an electropolishing solution in said tank;
at least one cathode in said solution;
means for immersing a metal article to be electropolished in said solution;
a power supply; and
means for electrically connecting said cathode and metal article to said power supply;
said electropolishing solution comprising about 68.5-88.5 weight percent POf, about 0.00l-0.01 weight percent oxidizing component selected from chromium sesquioxide and a trivalent titanium oxide, about 0.0002-0.2 weight percent Ni and from about to about 2 weight percent electrolyte selected from Fe and Cu", the balance comprising essentially H O, H O and OH.
2. The invention according to claim 1 in which said solution has a specific gravity of about 1.45-1.70 and a temperature of about ll5-l902 F.
3. The invention according to claim 1 in which said solution has a specific gravity of about 1.58-1.62 and a temperature of about 135-145F.
4. The invention according to claim 1 in which said solution consists essentially of the following components in weight percentages;
Cr- O 0.00l-0.0l
Ni 0.0002-0.2 Fe, Cu 0-2 H O, HfO, OH Balance 5. The invention according to claim 4 in which said solution includes about 0.0005-0.05 weight percent Fe ions.
6. The invention according to claim 4 in which said solution includes about 0.0l-l.5 weight percent Cu 7. The invention according to claim 4 in which said solution includes about 0.0005-0.05 weight percent Fe ions and about 0.01-1 .5 weight percent Cu ions.
8. The invention according to claim 1 in which said solution consists essentially of the following components in weight percentages:
Trivalent titanium oxide Ee, Cu 0-2 H O, H O, OH Balance 9. The invention according to claim 8 in which said solution includes about 0.00050.05 weight percent Fe ions.
10. The invention according to claim 8 in which said solution includes about 0.0l-l.5 weight percent Cu ions.
11. The invention according to claim 8 in which said solution includes about 0.0005-0.05 weight percent Fe ions and about 0.01-1 .5 weight percent Cu ions.
12. A method of reconstituting a used electropolishing solution formed of major amounts of phosphoric acid and minor amounts of chromium sesquioxide, said solution being contamined with excess ions selected from ions of N0 a halogen and SO, or combinations thereof, comprising adding a metal carbonate to said solution.
13. The invention according to claim 12 in which said metal carbonate is nickelous carbonate.
mgg UNITED STATES PATENT OFFICE CERTIFICATE OF CORRECTION Patent No. 3,766, 3 Dated October 16, 1973 Inventor(s) Howard M. Greene It is certified that error appears in the above-identified patent and that said Letters Patent are hereby corrected as shown below:
Column 1, line 36, "contain" should be concains--.
- Column I, line 22, "electroolishing" should be electropolishing 1 Column 4, line il, "Fehd2O should be -Fe O Column 6, line 18, before 3'4""as" should be --'-at.
Column 6, line 2 4, "85,002" should be -S5002-.
Column 7, line 52, "1902F" should be -l90F-'.
Column 8, line 19, "Be" should be -Fe--.
Column 8, line 3 8, contamined" should be -contaminated-.
Signed and sealed this 17th day of September 1974.
(SEAL) Attest:
McCOY M. GIBSON JR. 7 C. MARSRALL DANN Attesti ng Officer Commissloner of Patents
Claims (12)
- 2. The invention according to claim 1 in which said solution has a specific gravity of about 1.45-1.70 and a temperature of about 115*-1902 F.
- 3. The invention according to claim 1 in which said solution has a specific gravity of about 1.58-1.62 and a temperature of about 135*-145*F.
- 4. The invention according to claim 1 in which said solution consists essentially of the following components in weight percentages; PO4 3 68.5-88.5 Cr2O3 0.001-0.01 Ni 2 0.0002-0.2 Fe 3, Cu 2 0-2 H2O, H3 O, OH Balance
- 5. The invention according to claim 4 in which said solution includes about 0.0005-0.05 weight percent Fe 3 ions.
- 6. The invention according to claim 4 in which said solution includes about 0.01-1.5 weight percent Cu 2 ions.
- 7. The invention according to claim 4 in which said solution includes about 0.0005-0.05 weight percent Fe 3 ions and about 0.01-1.5 weight percent Cu 2 ions.
- 8. The invention according to claim 1 in which said solution consists essentially of the following components in weight percentages: PO4 3 68.5-88.5 Trivalent titanium oxide 0.001-0.01 Ni 2 0.002-0.2 Ee 3, Cu 2 0-2 H2O, H3 O, OH Balance
- 9. The invention according to claim 8 in which said solution includes about 0.0005-0.05 weight percent Fe 3 ions.
- 10. The invention according to claim 8 in which said solution includes about 0.01-1.5 weight percent Cu 2 ions.
- 11. The invention according to claim 8 in which said solution includes about 0.0005-0.05 weight percent Fe 3 ions and about 0.01-1.5 weight percent Cu 2 ions.
- 12. A method of reconstituting a used electropolishing solution formed of major amounts of phosphoric acid and minor amounts of chromium sesquioxide, said solution being contamined with excess ions selected from ions of NO3 , a halogen and SO4 2 or combinations thereof, comprising adding a metal carbonate to said solution.
- 13. The invention according to claim 12 in which said metal carbonate is nickelous carbonate.
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US21256671A | 1971-12-27 | 1971-12-27 |
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US20060130936A1 (en) * | 2002-09-09 | 2006-06-22 | Magnesum Technolgy Limited | Surface treatment of magnesium and its alloys |
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US8859432B2 (en) | 2004-06-24 | 2014-10-14 | Lam Research Corporation | Bare aluminum baffles for resist stripping chambers |
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