US20190287884A1 - Multi-chip packages with stabilized die pads - Google Patents
Multi-chip packages with stabilized die pads Download PDFInfo
- Publication number
- US20190287884A1 US20190287884A1 US15/919,516 US201815919516A US2019287884A1 US 20190287884 A1 US20190287884 A1 US 20190287884A1 US 201815919516 A US201815919516 A US 201815919516A US 2019287884 A1 US2019287884 A1 US 2019287884A1
- Authority
- US
- United States
- Prior art keywords
- die pad
- die
- blank
- coupled
- device package
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49575—Assemblies of semiconductor devices on lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/568—Temporary substrate used as encapsulation process aid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49503—Lead-frames or other flat leads characterised by the die pad
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
- H01L23/49558—Insulating layers on lead frames, e.g. bridging members
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/16—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits
- H01L25/162—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits the devices being mounted on two or more different substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
- H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16245—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29199—Material of the matrix
- H01L2224/2929—Material of the matrix with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
- H01L2224/49111—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49171—Fan-out arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73257—Bump and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/83001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving a temporary auxiliary member not forming part of the bonding apparatus
- H01L2224/83005—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector involving a temporary auxiliary member not forming part of the bonding apparatus being a temporary or sacrificial substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/83801—Soldering or alloying
- H01L2224/83805—Soldering or alloying involving forming a eutectic alloy at the bonding interface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/85001—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector involving a temporary auxiliary member not forming part of the bonding apparatus, e.g. removable or sacrificial coating, film or substrate
- H01L2224/85005—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector involving a temporary auxiliary member not forming part of the bonding apparatus, e.g. removable or sacrificial coating, film or substrate being a temporary or sacrificial substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
- H01L2224/9222—Sequential connecting processes
- H01L2224/92222—Sequential connecting processes the first connecting process involving a bump connector
- H01L2224/92227—Sequential connecting processes the first connecting process involving a bump connector the second connecting process involving a wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
- H01L2224/9222—Sequential connecting processes
- H01L2224/92242—Sequential connecting processes the first connecting process involving a layer connector
- H01L2224/92247—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/73—Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L24/80 - H01L24/90
- H01L24/92—Specific sequence of method steps
Definitions
- This description relates to semiconductor device package assemblies, and corresponding methods of manufacture. More specifically, this description relates to multi-chip semiconductor device package assemblies with stabilized die pads.
- Such a multi-chip semiconductor device package assembly can include a leadframe that has multiple die pads, to which respective semiconductor die of the assembly can be coupled. Such an assembly can also include one or more signal leads that provide electrical access to the semiconductor die of the assembly.
- the semiconductor die can be electrically coupled with the signal leads using wire bonding (e.g., ball bonding, wedge bonding, etc.), where a wire is attached between a semiconductor die and a signal lead.
- wire bonds in such multi-chip assemblies can have quality and/or reliability issues, such as bonds that do not adhere, or are irregularly formed. Such issues can be caused by lack of stability of the die pads of leadframe during the wire bonding process, e.g., such as due to deflection of the die pad (and the corresponding semiconductor die).
- a multi-chip semiconductor device package assembly can include a leadframe having a first die pad and a second die pad.
- the assembly can further include a first semiconductor die coupled to the first die pad and a second semiconductor die coupled to the second die pad.
- the assembly can also include a blank having a first portion coupled to the first die pad and a second portion coupled to the second die pad, such that the blank forms a bridge between the first die pad and the second die pad.
- a multi-chip semiconductor device package assembly can include a leadframe having a first die pad, a second die pad, a first signal lead, a second signal lead, a third signal lead, and a fourth signal lead.
- the assembly can also include a first semiconductor die coupled to the first die pad. A first side of the first semiconductor die can be electrically coupled with the first signal lead.
- the assembly can further include a second semiconductor die coupled to the second die pad. A first side of the second semiconductor die can be electrically coupled with the second signal lead.
- the assembly can still further include a blank having a first portion coupled to the first die pad and a second portion coupled to the second die pad. The blank can form a bridge between the first die pad and the second die pad.
- the assembly can also include a first wire bond electrically coupling a second side of the first semiconductor die with the third signal lead, and a second wire bond electrically coupling a second side of the second semiconductor die with the fourth signal lead.
- a method can include providing a leadframe including a first die pad and a second die pad.
- the method can also include affixing a first semiconductor die to the first die pad and affixing a second semiconductor die to the second die pad.
- the method can further include affixing a blank to the first die pad and the second die pad. A first portion of the blank can be coupled to the first die pad and a second portion of the blank can be coupled to the second die pad, such that the blank forms a bridge between the first die pad and the second die pad.
- FIG. 1A is a schematic, plan view diagram of an apparatus including a leadframe for a multi-chip semiconductor device package assembly.
- FIG. 1B is a schematic, plan view diagram of a multi-chip semiconductor device package assembly implemented using the leadframe of FIG. 1A .
- FIG. 1C is a schematic, side view diagram of the multi-chip semiconductor device package assembly of FIG. 1B .
- FIG. 1D is a schematic, side view diagram of another implementation of the multi-chip semiconductor device package assembly of FIG. 1B .
- FIG. 2A is a plan view diagram of another apparatus including a leadframe for a multi-chip semiconductor device package assembly.
- FIGS. 2B and 2C are plan view diagrams of respective multi-chip semiconductor device package assemblies implemented using the leadframe of FIG. 1A
- FIG. 3A is a schematic, plan view diagram of another multi-chip semiconductor device package assembly.
- FIG. 3B is a schematic, plan view diagram of another multi-chip semiconductor device package assembly.
- FIG. 4 is a flowchart illustrating a method for producing a multi-chip semiconductor device package assembly.
- This disclosure relates to semiconductor device package assemblies (package assemblies, packages, assemblies, etc.) and associated methods of manufacture. More specifically, this disclosure relates to multi-chip package assemblies, e.g., package assemblies that include multiple semiconductor die, where each semiconductor die of a given assembly is mounted on a respective die pad (e.g., pad, die attach pad, paddle, die paddle, die attach paddle, etc.) of a leadframe.
- the package assemblies described herein can include a blank die, dummy die, a blank disc, etc., that is configured to provide mechanical stability (support) to die pads of an associated leadframe, such as during a wire bonding process.
- a blank can be a semiconductor die.
- a semiconductor die that is used as a blank can exclude circuitry, or can include non-functional, or inactive circuitry.
- the blank can be a slug, chip, etc., that is formed from a conductive or non-conductive material (examples of which are discussed below).
- a blank can be configured to be coupled with (coupled to, etc.), and provide mechanical support to die pads of a leadframe, such as using the approaches described herein.
- a blank can be used to provide mechanical stability (e.g., prevent deflection of) die pads and corresponding semiconductor die coupled to those die pads during wire bonding.
- a blank can be coupled to adjacent pads such that the blank forms (e.g., defines) a bridge (a mechanical structure) between the adjacent die pads and, as a result, provides mechanical support to the die pads.
- This mechanical support can prevent, or at least reduce, deflection (or other deformation) of the die pads during a wire bonding process, which can improve the quality and reliability of wire bonds formed in such multi-chip package assemblies.
- FIG. 1A is a schematic, plan view diagram of an apparatus 100 that can be used to implement a multi-chip semiconductor device package assembly.
- the apparatus includes a carrier 110 and a leadframe 120 that is disposed on the carrier 110 .
- the carrier 110 can be a tape, a substrate, a fixture, etc., where the carrier 110 is used to support and/or secure the leadframe 120 during one or more assembly manufacturing operations, such as wire bonding, for example.
- the leadframe 120 can include a tie-bar 122 ; signal leads 124 a , 124 b , 124 c and 124 d ; a first die pad 126 ; and a second die pad 128 .
- the tie-bar 122 can be configured to secure the signal leads 124 a - 124 d (which can be collectively referred to as signal leads 124 ), the first die pad 126 and the second die pad 128 in fixed positions, relative to one another, during assembly manufacturing operations.
- multiple leadframes 120 can be implemented in a strip or a matrix that is disposed on the carrier 110 , where those multiple leadframes 120 are processed together to produce respective multi-chip assemblies.
- the individual assemblies can be separated (singulated) from one another (e.g., after a molding operation that encapsulates the assemblies.
- singulation can include cutting (e.g., with a saw or laser) to separate the individual assemblies from each other.
- Such a singulation process can also include removing the tie-bar 122 from an associated multi-chip package assembly.
- the carrier 110 can include (be formed from) a material (or materials) with some amount of elasticity, which can help prevent damage to components (such as semiconductor die) of a corresponding multi-chip assembly during the assembly manufacturing process.
- elasticity can, however, due to lack of mechanical support from the tie-bar 122 , allow for deflection and or deformation of the die pads 126 and 128 during a wire bonding process (e.g., when forming bonds on respective semiconductor die coupled to the die pads 126 and 128 ).
- this deflection can be reduced, or eliminated, which can provide for reduced variation in wire bonding conditions and, as a result, improve quality and reliability of corresponding wire bonds.
- FIG. 1B is a schematic, plan view diagram of a multi-chip semiconductor device package assembly implemented using the leadframe 120 of FIG. 1A .
- the multi-chip semiconductor device package assembly includes a first semiconductor die 130 , a second semiconductor die 140 , a blank 150 and wire bonds 160 .
- the first semiconductor die 130 is coupled (e.g., attached, affixed, mounted, etc.) to the first die pad 126 and the second semiconductor die 140 is coupled to the second die pad 128 .
- more than one semiconductor die could be coupled to each of the first die pad 126 and/or the second die pad 128 .
- the semiconductor die 130 and 140 can be referred to as active semiconductor die, which include active and functional circuitry, as compared to a blank or dummy die (e.g., used to implement the blank 150 ) that does not include functional circuit.
- the particular circuitry implemented on the active semiconductor die 130 and 140 will vary depending on the particular implementation.
- the semiconductor die 130 and 140 can be coupled, respectively, to the die pads 126 and 128 using a number of approaches.
- the semiconductor die 130 and 140 can be coupled to the die pads 126 and 128 using a conductive adhesive, using eutectic die attach, can be flip chip mounted (e.g., using solder bumps), and so forth.
- the sides of the die 130 and 140 on which the wire bonds are attached (formed, disposed, etc.) can be referred to as respective first (top, upper, etc.) sides of the die 130 and 140 , and the electrical connections to the signal leads 124 a - 124 d can be referred to as being to the first sides of the die 130 and 140 in this example.
- the sides of the die 130 and 140 that are coupled to the die pads 126 and 128 can be referred to as respective second (bottom, lower, etc.) sides of the die 130 and 140 , to which electrical connections (to other signal leads, such as described below) can be made.
- a signal lead as discussed herein, can be used for providing a power supply voltage, a control signal, a data signal, etc. to one or more of the die 130 and 140 , in this example.
- the blank 150 can be coupled to both the first die pad 126 and the second die pad 128 , such that the blank 150 bridges (e.g., forms a bridge, or mechanical structure) between the die pads 126 and 128 .
- the blank 150 can provide mechanical support (in addition to mechanical support provided by the tie-bar 122 ) to the die pads 126 and 128 that prevents deflection or deformation (e.g., into the page in FIGS. 1B and 1 n a direction along the axis D in FIGS. 1C and 1 d . of the die pads 126 and 128 during formation of wire bonds 160 on the semiconductor die 130 and 140 .
- the blank 150 can provide mechanical support (in addition to mechanical support provided by the tie-bar 122 ) to the die pads 126 and 128 that prevents deflection or deformation (e.g., into the page in FIGS. 1B and 1 n a direction along the axis D in FIGS. 1C and 1 d . of the die pads 126 and 1
- the blank 150 can centered (e.g., vertically and/or horizontally) between the semiconductor die 130 and 140 .
- the blank 150 can be shifted to the left or right relative to the semiconductor die 130 and 140 , and/or the blank 150 can be shifted up or down relative to the semiconductor die 130 and 140 .
- a surface area of the blank 150 can be smaller, equal to, or larger than a surface are of the semiconductor die 130 a 140 .
- Semiconductor die 130 and 140 can have the same surface area, or can have different surface areas.
- respective wire bonds 160 can be formed between the semiconductor die 130 and 140 , and the signal leads 124 a - 124 d to electrically couple the semiconductor die 130 and 140 with the signal leads 124 a - 124 d .
- the arrangement of the wire bonds 160 in FIG. 1B is given by way of example, and other arrangements are possible. For instance, the particular arrangement of the wire bonds 160 of such a multi-chip package assembly will depend on the particular implementation, including the circuitry implemented on the semiconductor die 130 and 140 .
- FIG. 1C is a schematic, side view diagram of the multi-chip semiconductor device package assembly of FIG. 1B along the section line 1 C- 1 C shown in FIG. 1B . Additionally, for purposes of clarity in the side view of FIG. 1C , the carrier 110 and the tie-bar 122 are not shown.
- the semiconductor die 130 is attached to the die pad 126 with a die attach material 135
- the semiconductor die 140 is attached to the die pad 128 with a die attach material 145 .
- the die attach materials 135 and 145 can be a same material, while in some implementations the die attach materials 135 and 145 can be different materials.
- the particular die attach materials (which can be those described herein) can vary depending on the particular implementation.
- a first portion 170 of the blank 150 can be coupled (attached, affixed, etc.) to the first die pad 126 with an adhesive material 155
- a second portion 180 of the blank 150 can be coupled to the second die pad 128 with the adhesive material 155
- different adhesive materials can be used to couple the blank 150 with, respectively, the die pad 126 and the die pad 128 . As illustrated in FIG.
- a thickness (e.g., along the axis D in FIGS. 1C and 1D ) of the adhesive 145 can be the same as, or different than a thickness (e.g., along the axis Din FIGS. 1C and 1D ) of the adhesive 155 .
- a gap between the die pad 126 and the die pad 128 can be a distance B.
- a length of a bridge defined by the blank 150 can be the distance B (or length B).
- a width of the first portion 170 of the blank 150 (that is coupled to the die pad 126 ) can be a distance A
- a width of the second portion 180 of the blank 150 (that is coupled to the die pad 128 ) can be a distance C.
- the distances A, B and C can be a same distance, or can each be different distances.
- two of the distances A, B or C can a same distance, while the third distance is different.
- the distances A and C can be a same distance
- the distance B can be a different distance (smaller or larger) than the distances A and C.
- respective thicknesses of the semiconductor die 130 and 140 can be a same thickness, or can be different thicknesses.
- a thickness of the blank 150 e.g., along the axis D
- the blank 150 can have a thickness that is different than (greater than, or less than) each of the respective thicknesses of the semiconductor die 130 and 140 .
- a plane defined by an upper surface of the blank can be coplanar with respective planes defined by upper surfaces of the semiconductor die 130 and 140 , or the plane defined by the upper surface of the blank can be non-coplanar, but parallel with planes defined the upper surfaces of the semiconductor die 130 and 140 .
- the particular arrangement will depend on the specific implementation. Further the various arrangements of the elements of the apparatus 100 discussed above can also apply to similar (or like) elements of other implementations, such as those implementations described herein.
- the adhesive material 155 has a first portion disposed between the first portion 170 of the blank 150 and the first die pad 126 , and a second portion disposed between the second portion 180 of the blank 150 and the second die pad 128 .
- the first portion of the adhesive material 155 is separate from the second portion of the adhesive material 155 .
- the adhesive material 155 has separate portions.
- the blank 150 can be formed of a non-conductive material (such as ceramic, plastic, resin/epoxy, etc.).
- the blank 150 can be formed of a semiconductor material (e.g., can be a blank or inactive semiconductor die), or can be formed of a conductive material (such as a metal).
- the adhesive material 155 can be a non-conductive adhesive (such as an epoxy), while in some implementations, the adhesive material 145 can be a conductive adhesive (such as a metal filled adhesive).
- the blank 150 can be formed of a conductive material and the adhesive material 155 can be conductive, such that the blank 150 and the adhesive mater 145 electrically couple (electrically connect) the first die pad 126 with the second die pad 128 .
- the blank 150 can be formed of either a conductive or non-conductive material that includes a non-conductive coating on at least the first portion 170 and the second portion 180 of the blank 150 .
- FIG. 1D is a schematic, side view diagram of another example implementation of the multi-chip semiconductor device package assembly of FIG. 1B along the section line 1 C- 1 C,
- the implementation in FIG. 1D is similar to the multi-chip semiconductor device package assembly implementation 0 shown in FIG. 1C . Accordingly, the specifics of the multi-chip semiconductor device package assembly of FIG. 1C are not repeated here.
- the multi-chip semiconductor device package assembly of FIG. 1D differs from the multi-chip semiconductor device package assembly of FIG. 1C in that the adhesive 155 , as shown in FIG. 1D , is disposed over an entirety, or nearly an entirety of a bottom (lower, etc.) surface of the blank 150 , rather than on just the first portion 170 and the second portion 180 of the blank 150 .
- the adhesive 155 is continuous and has a first portion. Accordingly, as shown in FIG. 1D , the adhesive material 155 has a first portion disposed between the first portion 170 of the blank 150 and the first die pad 126 , and a second portion disposed between the second portion 180 of the blank 150 and the second die pad 128 where the first portion of the adhesive material 155 is contiguous with the second portion of the adhesive material 155 . In other words, the adhesive material 155 does not have separate portions.
- FIG. 2A is a schematic, plan view diagram of an apparatus 200 that can be used to implement a multi-chip semiconductor device package assembly.
- the apparatus 200 includes a carrier 210 and a leadframe 220 that is disposed on the carrier 210 .
- the carrier 210 can be a tape, a substrate, a fixture, etc., where the carrier 210 is used to support and/or secure the leadframe 220 during one or more assembly manufacturing operations, such as wire bonding, for example.
- the leadframe 220 can include a tie-bar 222 ; signal leads 224 a , 224 b , 224 c and 224 d ; a first die pad 226 ; and a second die pad 228 .
- the leadframe 220 can also include a third die pad 229 .
- the die pads 226 , 228 and/or 229 can also be used to define additional signal leads of the package assembly 200 , such as with the tab 232 and/or the tab 242 shown in FIG. 2A , for example.
- the tie-bar 222 can be configured to secure the signal leads 224 a - 224 d , the first die pad 226 , the second die pad 228 , and the third die pad 229 in fixed positions, relative to one another, during assembly manufacturing operations.
- multiple leadframes 220 can be implemented in a strip or a matrix that is disposed on the carrier 210 , where those multiple leadframes 220 can be processed together to produce respective multi-chip assemblies.
- the individual assemblies can be separated (singulated) from one another (e.g., after a molding operation that, at least in part, encapsulates the assemblies).
- Such singulation can include cutting (e.g., with a saw or laser) to separate the individual assemblies from each other.
- Such a singulation process can also include removing the tie-bar 222 from an associated multi-chip package assembly, which can expose (allow access to) the signal leads 224 a - 224 d through the molding compound.
- the semiconductor die 230 , 240 and 245 can be referred to as active semiconductor die, which include active and functional circuitry, as compared to a blank or a dummy die (e.g., used to implement the blank 250 ) that does not include functional circuit.
- active semiconductor die which include active and functional circuitry, as compared to a blank or a dummy die (e.g., used to implement the blank 250 ) that does not include functional circuit.
- the particular circuitry implemented on the active semiconductor die 230 , 240 and 245 will vary depending on the particular implementation.
- the semiconductor die 230 , 240 and 245 can be coupled, respectively, to the die pads 226 , 228 and 229 using a number of approaches, such as those described herein.
- the blank 250 can be coupled to both the first die pad 226 and the second die pad 228 , such that the blank 250 bridges (e.g., forms a bridge, or mechanical structure) between the die pads 226 and 228 .
- the blank 250 can provide mechanical support (in addition to mechanical support provided by the tie-bar 222 ) to the die pads 226 and 228 that prevents deflection or deformation of the die pads 226 and 228 during formation of wire bonds 260 on the semiconductor die 230 and 240 .
- the blank 250 and attachment of the blank 250 to the die pads of leadframe 220 can be implemented using the approaches described herein.
- FIG. 2C is a plan view diagram of a multi-chip semiconductor device package assembly implemented using the leadframe 220 of FIG. 2A that is similar to the multi-chip semiconductor device package assembly shown in FIG. 2B . Accordingly, the specifics of the multi-chip semiconductor device package assembly of FIG. 2B are not repeated here.
- the multi-chip semiconductor device package assembly of FIG. 2C differs from the multi-chip semiconductor device package assembly of FIG. 2B in that the blank 250 is coupled to the first die pad 226 , the second die pad 228 and the third die pad 229 . That is, in FIG. 2C the blank 250 bridges (e.g., forms a bridge, or mechanical structure) between the die pads 226 , 228 and 229 .
- the blank 250 can provide mechanical support (in addition to mechanical support provided by the tie-bar 222 ) to the die pads 226 , 228 and 229 that prevents deflection or deformation of the die pads 226 , 228 and 229 during formation of wire bonds 260 on the semiconductor die 230 , 240 and 245 .
- the blank 250 and attachment of the blank 250 to the die pads 226 , 228 and 229 of leadframe 220 can be implemented using the approaches described herein.
- the multi-chip semiconductor device package assembly 300 a includes (active) semiconductor die 330 , 335 , 340 and 345 that are coupled, respectively to die pads 326 , 327 , 328 and 329 .
- the multi-chip semiconductor device package assembly 300 a of FIG. 3A also includes a first blank 350 and a second blank 355 .
- the first blank 350 is coupled to the die pad 326 and the die pad 328 , such that the blank 350 forms a bridge (a mechanical connection, etc.) between the die pad 326 and the die pad 328 .
- the second blank 355 of FIG. 3A is coupled to the die pad 327 and the die pad 327 , such that the blank 355 forms a bridge (a mechanical connection, etc.) between the die pad 327 and the die pad 329 .
- FIG. 4 is a flowchart illustrating an implementation of a method 400 that can be used to produce multi-chip semiconductor device package assemblies.
- the method 400 can be used to produce a packaged assembly, such as illustrated by the apparatus 100 in FIGS. 1A-1C .
- the operations of the method 400 can be used to produce other implementations of multi-chip semiconductor device package assemblies, such as those illustrated in FIGS. 2A-2C and 3A-3B , for example.
- the method 400 will be described with further reference to the apparatus 100 illustrated in FIGS. 1A-1C .
- the leadframe 120 can be provided on a carrier 110 (e.g., a tape, a substrate, etc.)
- the method 400 can include at block 410 , providing the leadframe 120 including the first die pad 126 and the second die pad 128 .
- the leadframe 120 can be provided on the carrier 110 and can also include the tie bar 122 and signal leads (terminals, etc.) 124 a - 124 d.
- the method 400 can include affixing the first (active) semiconductor die 130 to the first die pad 126 of the leadframe 120 .
- Affixing the die 130 to the die pad 126 can be performed using a number of approaches.
- the die 130 can be coupled using a conductive adhesive, a eutectic die attach, flip chip attach, or any number of other die attach approaches appropriate for the particular implementation.
- the method 400 can include affixing the second (active) semiconductor die 140 to the second die pad 128 of the leadframe 120 . As with affixing the die 130 to the die pad 126 , affixing the die 140 to the die pad 128 can be performed using a number of approaches, such as those noted above, as some examples.
- the method 400 can include affixing the blank 150 to the first die pad 126 and the second die pad 128 , where the blank is a dummy (inactive) semiconductor die, or other material, such as those described herein.
- the first portion 170 of the blank 150 can be coupled to the first die pad 126 .
- the second portion 180 of the blank 150 can be coupled to the second die pad 128 .
- the blank 150 after being coupled to the first die pad 126 and the second die pad 128 , can form a bridge between the first die pad 126 and the second die pad 128 , such as shown in FIG. 1C .
- the blank 150 can be coupled to the first die pad 126 and the second die pad 128 using a number of different approaches and/or materials, such as those discussed above.
- affixing the blank 150 to the first die pad 126 and the second die pad 128 can be performed prior to affixing the first semiconductor die 130 to the first die pad 126 at block 420 . In some implementations, affixing the blank 150 to the first die pad 126 and the second die pad 128 can be performed after affixing the first semiconductor die 130 to the first die pad 126 at block 420 , but prior to affixing the second semiconductor die 140 to the second die pad 128 at block 430 .
- the method 400 can include forming a first wire bond 160 that electrically couples the first semiconductor die 130 with a first signal lead (the signal lead 124 a or the signal lead 124 b ) of the leadframe 120 .
- Forming the first wire bond 160 can include forming ball bonds, wedge bonds, etc.
- the method 400 can further include forming a second wire bond 160 that electrically couples the second semiconductor die 140 with a second signal lead (the signal lead 124 c or the signal lead 124 d ) of the leadframe 120 .
- a number of approaches can be used to form the second wire bond 160 between the second semiconductor die 140 and the second signal lead ( 124 c or 124 d ).
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Die Bonding (AREA)
- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
- This description relates to semiconductor device package assemblies, and corresponding methods of manufacture. More specifically, this description relates to multi-chip semiconductor device package assemblies with stabilized die pads.
- Multiple-chip (multi-chip) semiconductor device packages assemblies are used in a number of applications, such as in power converters, telecommunications devices, etc. Such a multi-chip semiconductor device package assembly can include a leadframe that has multiple die pads, to which respective semiconductor die of the assembly can be coupled. Such an assembly can also include one or more signal leads that provide electrical access to the semiconductor die of the assembly. The semiconductor die can be electrically coupled with the signal leads using wire bonding (e.g., ball bonding, wedge bonding, etc.), where a wire is attached between a semiconductor die and a signal lead. In current implementations, wire bonds in such multi-chip assemblies can have quality and/or reliability issues, such as bonds that do not adhere, or are irregularly formed. Such issues can be caused by lack of stability of the die pads of leadframe during the wire bonding process, e.g., such as due to deflection of the die pad (and the corresponding semiconductor die).
- In a general aspect, a multi-chip semiconductor device package assembly can include a leadframe having a first die pad and a second die pad. The assembly can further include a first semiconductor die coupled to the first die pad and a second semiconductor die coupled to the second die pad. The assembly can also include a blank having a first portion coupled to the first die pad and a second portion coupled to the second die pad, such that the blank forms a bridge between the first die pad and the second die pad.
- In another general aspect, a multi-chip semiconductor device package assembly can include a leadframe having a first die pad, a second die pad, a first signal lead, a second signal lead, a third signal lead, and a fourth signal lead. The assembly can also include a first semiconductor die coupled to the first die pad. A first side of the first semiconductor die can be electrically coupled with the first signal lead. The assembly can further include a second semiconductor die coupled to the second die pad. A first side of the second semiconductor die can be electrically coupled with the second signal lead. The assembly can still further include a blank having a first portion coupled to the first die pad and a second portion coupled to the second die pad. The blank can form a bridge between the first die pad and the second die pad. The assembly can also include a first wire bond electrically coupling a second side of the first semiconductor die with the third signal lead, and a second wire bond electrically coupling a second side of the second semiconductor die with the fourth signal lead.
- In another general aspect, a method can include providing a leadframe including a first die pad and a second die pad. The method can also include affixing a first semiconductor die to the first die pad and affixing a second semiconductor die to the second die pad. The method can further include affixing a blank to the first die pad and the second die pad. A first portion of the blank can be coupled to the first die pad and a second portion of the blank can be coupled to the second die pad, such that the blank forms a bridge between the first die pad and the second die pad.
- In the drawings, which are not necessarily drawn to scale, like numerals may reference similar components in different views. The drawings illustrate generally, by way of example, but not by way of limitation, various embodiments discussed in the present document.
-
FIG. 1A is a schematic, plan view diagram of an apparatus including a leadframe for a multi-chip semiconductor device package assembly. -
FIG. 1B is a schematic, plan view diagram of a multi-chip semiconductor device package assembly implemented using the leadframe ofFIG. 1A . -
FIG. 1C is a schematic, side view diagram of the multi-chip semiconductor device package assembly ofFIG. 1B . -
FIG. 1D is a schematic, side view diagram of another implementation of the multi-chip semiconductor device package assembly ofFIG. 1B . -
FIG. 2A is a plan view diagram of another apparatus including a leadframe for a multi-chip semiconductor device package assembly. -
FIGS. 2B and 2C are plan view diagrams of respective multi-chip semiconductor device package assemblies implemented using the leadframe ofFIG. 1A -
FIG. 3A is a schematic, plan view diagram of another multi-chip semiconductor device package assembly. -
FIG. 3B is a schematic, plan view diagram of another multi-chip semiconductor device package assembly. -
FIG. 4 is a flowchart illustrating a method for producing a multi-chip semiconductor device package assembly. - Like reference symbols in the various drawings indicate like and/or similar elements. Reference symbols show in one drawing may not be repeated for the same element in related views. Reference symbols repeated in multiple drawings may not be specifically discussed with respect to each of those drawings, but are provide for context between related views. Also, not all like elements in the drawings are specifically referenced with a reference symbol when multiple instances of that element are illustrated.
- This disclosure relates to semiconductor device package assemblies (package assemblies, packages, assemblies, etc.) and associated methods of manufacture. More specifically, this disclosure relates to multi-chip package assemblies, e.g., package assemblies that include multiple semiconductor die, where each semiconductor die of a given assembly is mounted on a respective die pad (e.g., pad, die attach pad, paddle, die paddle, die attach paddle, etc.) of a leadframe. The package assemblies described herein can include a blank die, dummy die, a blank disc, etc., that is configured to provide mechanical stability (support) to die pads of an associated leadframe, such as during a wire bonding process. For purposes of this disclosure, such materials that are used to provide mechanical stability (support) to die pads of a leadframe are referred to as a blank (or blanks). In some implementations a blank can be a semiconductor die. A semiconductor die that is used as a blank can exclude circuitry, or can include non-functional, or inactive circuitry. In other implementations, the blank can be a slug, chip, etc., that is formed from a conductive or non-conductive material (examples of which are discussed below). A blank can be configured to be coupled with (coupled to, etc.), and provide mechanical support to die pads of a leadframe, such as using the approaches described herein.
- In the implementations described herein, a blank (or blanks) can be used to provide mechanical stability (e.g., prevent deflection of) die pads and corresponding semiconductor die coupled to those die pads during wire bonding. For instance, a blank can be coupled to adjacent pads such that the blank forms (e.g., defines) a bridge (a mechanical structure) between the adjacent die pads and, as a result, provides mechanical support to the die pads. This mechanical support can prevent, or at least reduce, deflection (or other deformation) of the die pads during a wire bonding process, which can improve the quality and reliability of wire bonds formed in such multi-chip package assemblies.
-
FIG. 1A is a schematic, plan view diagram of anapparatus 100 that can be used to implement a multi-chip semiconductor device package assembly. As shown inFIG. 1A , the apparatus includes acarrier 110 and aleadframe 120 that is disposed on thecarrier 110. In theapparatus 100, thecarrier 110 can be a tape, a substrate, a fixture, etc., where thecarrier 110 is used to support and/or secure theleadframe 120 during one or more assembly manufacturing operations, such as wire bonding, for example. - As shown in
FIG. 1 , theleadframe 120 can include a tie-bar 122; signal leads 124 a, 124 b, 124 c and 124 d; afirst die pad 126; and asecond die pad 128. As shown inFIG. 1A , the tie-bar 122 can be configured to secure the signal leads 124 a-124 d (which can be collectively referred to as signal leads 124), thefirst die pad 126 and thesecond die pad 128 in fixed positions, relative to one another, during assembly manufacturing operations. In some implementations,multiple leadframes 120 can be implemented in a strip or a matrix that is disposed on thecarrier 110, where thosemultiple leadframes 120 are processed together to produce respective multi-chip assemblies. In such implementations, the individual assemblies can be separated (singulated) from one another (e.g., after a molding operation that encapsulates the assemblies. Such singulation can include cutting (e.g., with a saw or laser) to separate the individual assemblies from each other. Such a singulation process can also include removing the tie-bar 122 from an associated multi-chip package assembly. - In some implementations, the
carrier 110 can include (be formed from) a material (or materials) with some amount of elasticity, which can help prevent damage to components (such as semiconductor die) of a corresponding multi-chip assembly during the assembly manufacturing process. Such elasticity can, however, due to lack of mechanical support from the tie-bar 122, allow for deflection and or deformation of thedie pads die pads 126 and 128). By adding additional mechanical support to thedie pads -
FIG. 1B is a schematic, plan view diagram of a multi-chip semiconductor device package assembly implemented using theleadframe 120 ofFIG. 1A . As shown inFIG. 1B , the multi-chip semiconductor device package assembly includes a first semiconductor die 130, a second semiconductor die 140, a blank 150 andwire bonds 160. The first semiconductor die 130 is coupled (e.g., attached, affixed, mounted, etc.) to thefirst die pad 126 and the second semiconductor die 140 is coupled to thesecond die pad 128. In some implementations, more than one semiconductor die could be coupled to each of thefirst die pad 126 and/or thesecond die pad 128. In this example, the semiconductor die 130 and 140 can be referred to as active semiconductor die, which include active and functional circuitry, as compared to a blank or dummy die (e.g., used to implement the blank 150) that does not include functional circuit. - The particular circuitry implemented on the active semiconductor die 130 and 140 will vary depending on the particular implementation. The semiconductor die 130 and 140 can be coupled, respectively, to the
die pads die pads die die die die die pads die die - As shown in
FIG. 1B , the blank 150 can be coupled to both thefirst die pad 126 and thesecond die pad 128, such that the blank 150 bridges (e.g., forms a bridge, or mechanical structure) between thedie pads die pads FIGS. 1B and 1 n a direction along the axis D inFIGS. 1C and 1 d. of thedie pads wire bonds 160 on the semiconductor die 130 and 140. In some implementations, such as shown inFIG. 1B , the blank 150 can centered (e.g., vertically and/or horizontally) between the semiconductor die 130 and 140. In other implementations, the blank 150 can be shifted to the left or right relative to the semiconductor die 130 and 140, and/or the blank 150 can be shifted up or down relative to the semiconductor die 130 and 140. A surface area of the blank 150 can be smaller, equal to, or larger than a surface are of the semiconductor die 130 a 140. Semiconductor die 130 and 140 can have the same surface area, or can have different surface areas. - As illustrated in
FIG. 1B ,respective wire bonds 160 can be formed between the semiconductor die 130 and 140, and the signal leads 124 a-124 d to electrically couple the semiconductor die 130 and 140 with the signal leads 124 a-124 d. The arrangement of thewire bonds 160 inFIG. 1B is given by way of example, and other arrangements are possible. For instance, the particular arrangement of thewire bonds 160 of such a multi-chip package assembly will depend on the particular implementation, including the circuitry implemented on the semiconductor die 130 and 140. -
FIG. 1C is a schematic, side view diagram of the multi-chip semiconductor device package assembly ofFIG. 1B along thesection line 1C-1C shown inFIG. 1B . Additionally, for purposes of clarity in the side view ofFIG. 1C , thecarrier 110 and the tie-bar 122 are not shown. InFIG. 1C , the semiconductor die 130 is attached to thedie pad 126 with a die attachmaterial 135, while the semiconductor die 140 is attached to thedie pad 128 with a die attachmaterial 145. In some implementations the die attachmaterials materials - As also shown in
FIG. 1C , afirst portion 170 of the blank 150 can be coupled (attached, affixed, etc.) to thefirst die pad 126 with anadhesive material 155, and asecond portion 180 of the blank 150 can be coupled to thesecond die pad 128 with theadhesive material 155. In some implementations, different adhesive materials can be used to couple the blank 150 with, respectively, thedie pad 126 and thedie pad 128. As illustrated inFIG. 1C , the blank 150, once coupled with thedie pads die pads wire bonds 160 of the package assembly shown, for example, inFIG. 1B . Depending on the particular implementation, a thickness (e.g., along the axis D inFIGS. 1C and 1D ) of the adhesive 145 can be the same as, or different than a thickness (e.g., along the axis DinFIGS. 1C and 1D ) of the adhesive 155. - Also, as illustrated in
FIG. 1C , in some implementations, a gap between thedie pad 126 and thedie pad 128 can be a distance B. In other words, a length of a bridge defined by the blank 150 can be the distance B (or length B). A width of thefirst portion 170 of the blank 150 (that is coupled to the die pad 126) can be a distance A, while a width of thesecond portion 180 of the blank 150 (that is coupled to the die pad 128) can be a distance C. Depending on the particular implementation, the distances A, B and C can be a same distance, or can each be different distances. In some implementations, two of the distances A, B or C can a same distance, while the third distance is different. For instance, in one example, the distances A and C can be a same distance, and the distance B can be a different distance (smaller or larger) than the distances A and C. - Depending on the particular implementation, respective thicknesses of the semiconductor die 130 and 140 (e.g., along the axis D) can be a same thickness, or can be different thicknesses. Also, a thickness of the blank 150 (e.g., along the axis D) can be a same thickness as a thickness of at least one of the semiconductor die 130 and 140, or the blank 150 can have a thickness that is different than (greater than, or less than) each of the respective thicknesses of the semiconductor die 130 and 140. Further, a plane defined by an upper surface of the blank (e.g., a plane that is orthogonal to the axis D) can be coplanar with respective planes defined by upper surfaces of the semiconductor die 130 and 140, or the plane defined by the upper surface of the blank can be non-coplanar, but parallel with planes defined the upper surfaces of the semiconductor die 130 and 140. The particular arrangement will depend on the specific implementation. Further the various arrangements of the elements of the
apparatus 100 discussed above can also apply to similar (or like) elements of other implementations, such as those implementations described herein. - As shown in
FIG. 1C , theadhesive material 155 has a first portion disposed between thefirst portion 170 of the blank 150 and thefirst die pad 126, and a second portion disposed between thesecond portion 180 of the blank 150 and thesecond die pad 128. The first portion of theadhesive material 155 is separate from the second portion of theadhesive material 155. In other words, theadhesive material 155 has separate portions. - In some implementations, the blank 150 can be formed of a non-conductive material (such as ceramic, plastic, resin/epoxy, etc.). In some implementations, the blank 150 can be formed of a semiconductor material (e.g., can be a blank or inactive semiconductor die), or can be formed of a conductive material (such as a metal). In some implementations, the
adhesive material 155 can be a non-conductive adhesive (such as an epoxy), while in some implementations, theadhesive material 145 can be a conductive adhesive (such as a metal filled adhesive). In some implementations, the blank 150 can be formed of a conductive material and theadhesive material 155 can be conductive, such that the blank 150 and theadhesive mater 145 electrically couple (electrically connect) thefirst die pad 126 with thesecond die pad 128. In some implementations, the blank 150 can be formed of either a conductive or non-conductive material that includes a non-conductive coating on at least thefirst portion 170 and thesecond portion 180 of the blank 150. -
FIG. 1D is a schematic, side view diagram of another example implementation of the multi-chip semiconductor device package assembly ofFIG. 1B along thesection line 1C-1C, The implementation inFIG. 1D is similar to the multi-chip semiconductor device package assembly implementation 0 shown inFIG. 1C . Accordingly, the specifics of the multi-chip semiconductor device package assembly ofFIG. 1C are not repeated here. The multi-chip semiconductor device package assembly ofFIG. 1D differs from the multi-chip semiconductor device package assembly ofFIG. 1C in that the adhesive 155, as shown inFIG. 1D , is disposed over an entirety, or nearly an entirety of a bottom (lower, etc.) surface of the blank 150, rather than on just thefirst portion 170 and thesecond portion 180 of the blank 150. In other words, the adhesive 155 is continuous and has a first portion. Accordingly, as shown inFIG. 1D , theadhesive material 155 has a first portion disposed between thefirst portion 170 of the blank 150 and thefirst die pad 126, and a second portion disposed between thesecond portion 180 of the blank 150 and thesecond die pad 128 where the first portion of theadhesive material 155 is contiguous with the second portion of theadhesive material 155. In other words, theadhesive material 155 does not have separate portions. -
FIG. 2A is a schematic, plan view diagram of anapparatus 200 that can be used to implement a multi-chip semiconductor device package assembly. As shown inFIG. 2A , similar to theapparatus 100, theapparatus 200 includes acarrier 210 and aleadframe 220 that is disposed on thecarrier 210. In theapparatus 200, as with thecarrier 110, thecarrier 210 can be a tape, a substrate, a fixture, etc., where thecarrier 210 is used to support and/or secure theleadframe 220 during one or more assembly manufacturing operations, such as wire bonding, for example. - As shown in
FIG. 2A , theleadframe 220, similar to theleadframe 120, can include a tie-bar 222; signal leads 224 a, 224 b, 224 c and 224 d; afirst die pad 226; and asecond die pad 228. Theleadframe 220 can also include athird die pad 229. In some implementations, thedie pads package assembly 200, such as with thetab 232 and/or thetab 242 shown inFIG. 2A , for example. - As with the tie-
bar 122, the tie-bar 222 can be configured to secure the signal leads 224 a-224 d, thefirst die pad 226, thesecond die pad 228, and thethird die pad 229 in fixed positions, relative to one another, during assembly manufacturing operations. In some implementations,multiple leadframes 220 can be implemented in a strip or a matrix that is disposed on thecarrier 210, where thosemultiple leadframes 220 can be processed together to produce respective multi-chip assemblies. In such implementations, the individual assemblies can be separated (singulated) from one another (e.g., after a molding operation that, at least in part, encapsulates the assemblies). Such singulation can include cutting (e.g., with a saw or laser) to separate the individual assemblies from each other. Such a singulation process can also include removing the tie-bar 222 from an associated multi-chip package assembly, which can expose (allow access to) the signal leads 224 a-224 d through the molding compound. -
FIG. 2B is a plan view diagram of a multi-chip semiconductor device package assembly implemented using theleadframe 220 ofFIG. 2A . As shown inFIG. 2B , the multi-chip semiconductor device package assembly includes a first semiconductor die 230, a second semiconductor die 240, a third semiconductor die 245, a blank 250 andwire bonds 260. The first semiconductor die 230 is coupled to thefirst die pad 226, the second semiconductor die 240 is coupled to thesecond die pad 228, and the third semiconductor die 245 is coupled to thethird die pad 229. In some implementations, more than one semiconductor die could be coupled to each of thefirst die pad 226, the second die pad and/or thethird die pad 229. In this example, as with the semiconductor die 130 and 140, the semiconductor die 230, 240 and 245 can be referred to as active semiconductor die, which include active and functional circuitry, as compared to a blank or a dummy die (e.g., used to implement the blank 250) that does not include functional circuit. The particular circuitry implemented on the active semiconductor die 230, 240 and 245 will vary depending on the particular implementation. The semiconductor die 230, 240 and 245 can be coupled, respectively, to thedie pads - As shown in
FIG. 2B , the blank 250 can be coupled to both thefirst die pad 226 and thesecond die pad 228, such that the blank 250 bridges (e.g., forms a bridge, or mechanical structure) between thedie pads die pads die pads wire bonds 260 on the semiconductor die 230 and 240. The blank 250 and attachment of the blank 250 to the die pads ofleadframe 220 can be implemented using the approaches described herein. - As illustrated in
FIG. 2B ,respective wire bonds 260 can be formed between the semiconductor die 230 and 240 and the signal leads 224 a-224 d to electrically couple the semiconductor die 230 and 240 with the signal leads 224 a-224 d. As also shown inFIG. 2B ,wire bonds 260 can also be formed between the semiconductor die 230, 240 and 245. As with thewire bonds 160 inFIG. 1B , the arrangement of thewire bonds 260 inFIG. 2B (and inFIG. 2C ) is given by way of example, and other arrangements are possible. For instance, the particular arrangement of thewire bonds 260 of such a multi-chip package assembly will depend on the particular implementation, including the circuitry implemented on the semiconductor die 230 and 240. -
FIG. 2C is a plan view diagram of a multi-chip semiconductor device package assembly implemented using theleadframe 220 ofFIG. 2A that is similar to the multi-chip semiconductor device package assembly shown inFIG. 2B . Accordingly, the specifics of the multi-chip semiconductor device package assembly ofFIG. 2B are not repeated here. The multi-chip semiconductor device package assembly ofFIG. 2C differs from the multi-chip semiconductor device package assembly ofFIG. 2B in that the blank 250 is coupled to thefirst die pad 226, thesecond die pad 228 and thethird die pad 229. That is, inFIG. 2C the blank 250 bridges (e.g., forms a bridge, or mechanical structure) between thedie pads die pads die pads wire bonds 260 on the semiconductor die 230, 240 and 245. The blank 250 and attachment of the blank 250 to thedie pads leadframe 220 can be implemented using the approaches described herein. -
FIGS. 3A and 3B illustrate multi-chip semiconductordevice package assemblies assemblies FIGS. 3A and 3B . - Referring to
FIG. 3A , the multi-chip semiconductordevice package assembly 300 a includes (active) semiconductor die 330, 335, 340 and 345 that are coupled, respectively to diepads device package assembly 300 a ofFIG. 3A also includes a first blank 350 and a second blank 355. InFIG. 3A , the first blank 350 is coupled to thedie pad 326 and thedie pad 328, such that the blank 350 forms a bridge (a mechanical connection, etc.) between thedie pad 326 and thedie pad 328. The second blank 355 ofFIG. 3A is coupled to thedie pad 327 and thedie pad 327, such that the blank 355 forms a bridge (a mechanical connection, etc.) between thedie pad 327 and thedie pad 329. - The multi-chip semiconductor
device package assembly 300 b ofFIG. 3B differs from the multi-chip semiconductordevice package assembly 300 a ofFIG. 3A in that it excludes the blank 355, and the blank 350 of theassembly 300 b is coupled to all four die pads 326-329. Accordingly, the blank 350 inFIG. 3B forms a bridge (a mechanical connection, etc.) between thedie pads -
FIG. 4 is a flowchart illustrating an implementation of amethod 400 that can be used to produce multi-chip semiconductor device package assemblies. For instance, themethod 400 can be used to produce a packaged assembly, such as illustrated by theapparatus 100 inFIGS. 1A-1C . In some implementations, the operations of the method 400 (or similar operations) can be used to produce other implementations of multi-chip semiconductor device package assemblies, such as those illustrated inFIGS. 2A-2C and 3A-3B , for example. However, for purposes of illustration and by way of example, themethod 400 will be described with further reference to theapparatus 100 illustrated inFIGS. 1A-1C . As show inFIGS. 1A and 1B and discussed above, theleadframe 120 can be provided on a carrier 110 (e.g., a tape, a substrate, etc.) - As shown in
FIG. 4 (and with reference toFIGS. 1A-1C ), themethod 400 can include atblock 410, providing theleadframe 120 including thefirst die pad 126 and thesecond die pad 128. As shown in, e.g.,FIG. 1A , theleadframe 120 can be provided on thecarrier 110 and can also include thetie bar 122 and signal leads (terminals, etc.) 124 a-124 d. - At
block 420, themethod 400 can include affixing the first (active) semiconductor die 130 to thefirst die pad 126 of theleadframe 120. Affixing thedie 130 to thedie pad 126 can be performed using a number of approaches. For instance, thedie 130 can be coupled using a conductive adhesive, a eutectic die attach, flip chip attach, or any number of other die attach approaches appropriate for the particular implementation. Atblock 430, themethod 400 can include affixing the second (active) semiconductor die 140 to thesecond die pad 128 of theleadframe 120. As with affixing thedie 130 to thedie pad 126, affixing thedie 140 to thedie pad 128 can be performed using a number of approaches, such as those noted above, as some examples. - At
block 440, themethod 400 can include affixing the blank 150 to thefirst die pad 126 and thesecond die pad 128, where the blank is a dummy (inactive) semiconductor die, or other material, such as those described herein. At block 440 (and as shown inFIG. 1C ), thefirst portion 170 of the blank 150 can be coupled to thefirst die pad 126. Also atblock 440, thesecond portion 180 of the blank 150 can be coupled to thesecond die pad 128. In this example, the blank 150, after being coupled to thefirst die pad 126 and thesecond die pad 128, can form a bridge between thefirst die pad 126 and thesecond die pad 128, such as shown inFIG. 1C . Atblock 440, the blank 150 can be coupled to thefirst die pad 126 and thesecond die pad 128 using a number of different approaches and/or materials, such as those discussed above. - In some implementations, affixing the blank 150 to the
first die pad 126 and thesecond die pad 128 can be performed prior to affixing the first semiconductor die 130 to thefirst die pad 126 atblock 420. In some implementations, affixing the blank 150 to thefirst die pad 126 and thesecond die pad 128 can be performed after affixing the first semiconductor die 130 to thefirst die pad 126 atblock 420, but prior to affixing the second semiconductor die 140 to thesecond die pad 128 atblock 430. - At
block 450, themethod 400 can include forming afirst wire bond 160 that electrically couples the first semiconductor die 130 with a first signal lead (the signal lead 124 a or thesignal lead 124 b) of theleadframe 120. Forming thefirst wire bond 160 can include forming ball bonds, wedge bonds, etc. Atblock 460, themethod 400 can further include forming asecond wire bond 160 that electrically couples the second semiconductor die 140 with a second signal lead (thesignal lead 124 c or thesignal lead 124 d) of theleadframe 120. Again, a number of approaches can be used to form thesecond wire bond 160 between the second semiconductor die 140 and the second signal lead (124 c or 124 d). - In some implementations, the
method 400 can include performing additional operations for producing a multi-chip semiconductor device package assembly. For example, such operations can include a molding operation, a singulation operation, etc. Molding operations can include, e.g., compression molding, transfer molding, and so forth. Singulation operations can also be used to remove thetie bar 122 from the leadframe, and/or to expose the signal leads 124 a-124 d so they accessible from outside a corresponding multi-chip semiconductor device package assembly. Singulation operations can also be used to separate individual multi-chip semiconductor device package assemblies from each other, e.g., after a molding operation where a strip or matrix of leadframes are processed together. In some implementations, singulation can include, e.g., saw singulation, laser cutting singulation, etc. - Further, in some implementations, operations similar to (or the same as) those described above with respect to the
method 400 can be used to produce other implementations of multi-chip semiconductor device package assemblies. For instance, such operations can be used to produce assemblies having three or more die pads, three or more (active) semiconductor die, two or more blanks, additional signal leads and/or additional wire bonds. - In the foregoing description, when an element, such as a layer, a region, or a substrate, is referred to as being on, connected to, electrically connected to, coupled to, or electrically coupled to another element, it may be directly on, connected or coupled to the other element, or one or more intervening elements may be present. In contrast, when an element is referred to as being directly on, directly connected to or directly coupled to another element or layer, there are no intervening elements or layers present. Although the terms directly on, directly connected to, or directly coupled to may not be used throughout the detailed description, elements that are shown (e.g., in the drawings) as being directly on, directly connected or directly coupled can be referred to as such. The claims of the application may be amended to recite exemplary relationships described in the specification or shown in the figures.
- As used in this specification, a singular form may, unless definitely indicating a particular case in terms of the context, include a plural form. Spatially relative terms (e.g., over, above, upper, under, beneath, below, lower, top, bottom, and so forth) are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. In some implementations, the relative terms above and below can, respectively, include vertically above and vertically below. In some implementations, the term adjacent can include laterally adjacent to or horizontally adjacent to.
- Some implementations may be implemented using various semiconductor processing and/or packaging techniques. Some implementations may be implemented using various types of semiconductor processing techniques associated with semiconductor substrates including, but not limited to, for example, Silicon (Si), Silicon Carbide (SiC), Gallium Arsenide (GaAs), Gallium Nitride (GaN), and/or so forth.
- While certain features of the described implementations have been illustrated as described herein, many modifications, substitutions, changes and equivalents will now occur to those skilled in the art. The appended claims are intended to cover all such modifications and changes as fall within the scope of the implementations. The example implementations described herein and shown in the drawings have been presented by way of example only, not limitation, and various changes in form and details may be made. Any portion of the apparatus and/or methods described herein may be combined in any combination, except mutually exclusive combinations. The implementations described herein can include various combinations and/or sub-combinations of the functions, components and/or features of the different implementations described.
Claims (20)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/919,516 US10438877B1 (en) | 2018-03-13 | 2018-03-13 | Multi-chip packages with stabilized die pads |
CN201920311306.7U CN209729896U (en) | 2018-03-13 | 2019-03-13 | Multi-chip semiconductor device package assembling |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/919,516 US10438877B1 (en) | 2018-03-13 | 2018-03-13 | Multi-chip packages with stabilized die pads |
Publications (2)
Publication Number | Publication Date |
---|---|
US20190287884A1 true US20190287884A1 (en) | 2019-09-19 |
US10438877B1 US10438877B1 (en) | 2019-10-08 |
Family
ID=67904647
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US15/919,516 Active US10438877B1 (en) | 2018-03-13 | 2018-03-13 | Multi-chip packages with stabilized die pads |
Country Status (2)
Country | Link |
---|---|
US (1) | US10438877B1 (en) |
CN (1) | CN209729896U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI816540B (en) * | 2022-09-06 | 2023-09-21 | 立錡科技股份有限公司 | Package structure |
Citations (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3092893A (en) * | 1958-02-13 | 1963-06-11 | Texas Instruments Inc | Fabrication of semiconductor devices |
US4891687A (en) * | 1987-01-12 | 1990-01-02 | Intel Corporation | Multi-layer molded plastic IC package |
JPH05343454A (en) * | 1992-06-08 | 1993-12-24 | Toshiba Corp | Cold slug removing apparatus |
US5828000A (en) * | 1996-11-14 | 1998-10-27 | Fujitsu Limited | Semiconductor device with heat radiating plate and positioning dummy lead and lead frame therefor |
EP1174921A2 (en) * | 2000-07-21 | 2002-01-23 | Hitachi, Ltd. | Semiconductor device |
WO2003063236A1 (en) * | 2002-01-18 | 2003-07-31 | International Rectifier Corporation | Semiconductor device with co-packaged die |
US20050133896A1 (en) * | 2003-12-19 | 2005-06-23 | Advanced Semiconductor Engineering, Inc. | Semiconductor package with a flip chip on a solder-resist leadframe |
US20070262432A1 (en) * | 2006-05-11 | 2007-11-15 | Infineon Technologies Ag | Semiconductor device comprising semiconductor device components embedded in plastic housing composition |
US20080290484A1 (en) * | 2005-07-20 | 2008-11-27 | Infineon Technologies Ag | Leadframe Strip and Mold Apparatus for an Electronic Component and Method of Encapsulating an Electronic Component |
US20090001562A1 (en) * | 2007-06-27 | 2009-01-01 | Infineon Technologies Ag | Semiconductor device |
US20090057929A1 (en) * | 2007-08-31 | 2009-03-05 | Mitsubishi Electric Corporation | Semiconductor device |
US20090093090A1 (en) * | 2007-10-04 | 2009-04-09 | Infineon Technologies Ag | Method for producing a power semiconductor module comprising surface-mountable flat external contacts |
US20090140414A1 (en) * | 2007-12-04 | 2009-06-04 | Fuji Electric Device Technology Co., Ltd. | Semiconductor device |
US20120098110A1 (en) * | 2008-10-28 | 2012-04-26 | Osram Opto Semicondctors Gmbh | Supporting Body for a Semiconductor Component, Semiconductor Element and Method for Production of a Supporting Body |
US20120164794A1 (en) * | 2010-12-28 | 2012-06-28 | Yan Xun Xue | Method of making a copper wire bond package |
DE102011113255A1 (en) * | 2011-09-13 | 2013-03-14 | Infineon Technologies Ag | Chip module and a method for producing a chip module |
US20130105953A1 (en) * | 2011-10-31 | 2013-05-02 | Samsung Electro-Mechanics Co., Ltd. | Power module package |
US20140159248A1 (en) * | 2012-12-10 | 2014-06-12 | Invensas Corporation | High performance package on package |
US8772913B1 (en) * | 2013-04-04 | 2014-07-08 | Freescale Semiconductor, Inc. | Stiffened semiconductor die package |
US20140252574A1 (en) * | 2013-03-05 | 2014-09-11 | Nichia Corporation | Lead frame and semiconductor device |
US20150131232A1 (en) * | 2012-06-29 | 2015-05-14 | Denso Corporation | Semiconductor device and semiconductor device connection structure |
US20150348889A1 (en) * | 2014-05-30 | 2015-12-03 | Delta Electronics, Inc. | Semiconductor device |
US20180040487A1 (en) * | 2015-07-02 | 2018-02-08 | Renesas Electronics Corporation | Manufacturing method of semiconductor device and semiconductor device |
US20180068934A1 (en) * | 2016-09-07 | 2018-03-08 | Infineon Technologies Americas Corp. | Package for die-bridge capacitor |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5543740A (en) | 1995-04-10 | 1996-08-06 | Philips Electronics North America Corporation | Integrated half-bridge driver circuit |
US6323549B1 (en) | 1996-08-29 | 2001-11-27 | L. Pierre deRochemont | Ceramic composite wiring structures for semiconductor devices and method of manufacture |
KR101075169B1 (en) | 2003-08-27 | 2011-10-19 | 페어차일드코리아반도체 주식회사 | Power module flip chip package |
US7068097B2 (en) | 2003-12-18 | 2006-06-27 | The Boeing Company | High frequency high power H-bridge power amplifier |
JP4423462B2 (en) | 2003-12-22 | 2010-03-03 | 富士電機システムズ株式会社 | Semiconductor power module |
US7301235B2 (en) | 2004-06-03 | 2007-11-27 | International Rectifier Corporation | Semiconductor device module with flip chip devices on a common lead frame |
US7227198B2 (en) | 2004-08-11 | 2007-06-05 | International Rectifier Corporation | Half-bridge package |
US8018056B2 (en) | 2005-12-21 | 2011-09-13 | International Rectifier Corporation | Package for high power density devices |
KR100793916B1 (en) | 2006-04-05 | 2008-01-15 | 삼성전기주식회사 | Manufacturing Method of Printed Circuit Board Embedded Capacitor |
US7663211B2 (en) | 2006-05-19 | 2010-02-16 | Fairchild Semiconductor Corporation | Dual side cooling integrated power device package and module with a clip attached to a leadframe in the package and the module and methods of manufacture |
KR101489325B1 (en) | 2007-03-12 | 2015-02-06 | 페어차일드코리아반도체 주식회사 | Flip-chip type stacked power module and method of manufacturing the power module |
KR101524545B1 (en) | 2008-02-28 | 2015-06-01 | 페어차일드코리아반도체 주식회사 | Power device package and the method of fabricating the same |
US8354740B2 (en) | 2008-12-01 | 2013-01-15 | Alpha & Omega Semiconductor, Inc. | Top-side cooled semiconductor package with stacked interconnection plates and method |
US20110260314A1 (en) | 2010-04-27 | 2011-10-27 | Stmicroelectronics S.R.L. | Die package and corresponding method for realizing a double side cooling of a die package |
-
2018
- 2018-03-13 US US15/919,516 patent/US10438877B1/en active Active
-
2019
- 2019-03-13 CN CN201920311306.7U patent/CN209729896U/en active Active
Patent Citations (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3092893A (en) * | 1958-02-13 | 1963-06-11 | Texas Instruments Inc | Fabrication of semiconductor devices |
US4891687A (en) * | 1987-01-12 | 1990-01-02 | Intel Corporation | Multi-layer molded plastic IC package |
JPH05343454A (en) * | 1992-06-08 | 1993-12-24 | Toshiba Corp | Cold slug removing apparatus |
US5828000A (en) * | 1996-11-14 | 1998-10-27 | Fujitsu Limited | Semiconductor device with heat radiating plate and positioning dummy lead and lead frame therefor |
EP1174921A2 (en) * | 2000-07-21 | 2002-01-23 | Hitachi, Ltd. | Semiconductor device |
WO2003063236A1 (en) * | 2002-01-18 | 2003-07-31 | International Rectifier Corporation | Semiconductor device with co-packaged die |
US20050133896A1 (en) * | 2003-12-19 | 2005-06-23 | Advanced Semiconductor Engineering, Inc. | Semiconductor package with a flip chip on a solder-resist leadframe |
US20080290484A1 (en) * | 2005-07-20 | 2008-11-27 | Infineon Technologies Ag | Leadframe Strip and Mold Apparatus for an Electronic Component and Method of Encapsulating an Electronic Component |
US20070262432A1 (en) * | 2006-05-11 | 2007-11-15 | Infineon Technologies Ag | Semiconductor device comprising semiconductor device components embedded in plastic housing composition |
US20090001562A1 (en) * | 2007-06-27 | 2009-01-01 | Infineon Technologies Ag | Semiconductor device |
US20090057929A1 (en) * | 2007-08-31 | 2009-03-05 | Mitsubishi Electric Corporation | Semiconductor device |
US20090093090A1 (en) * | 2007-10-04 | 2009-04-09 | Infineon Technologies Ag | Method for producing a power semiconductor module comprising surface-mountable flat external contacts |
US20090140414A1 (en) * | 2007-12-04 | 2009-06-04 | Fuji Electric Device Technology Co., Ltd. | Semiconductor device |
US20120098110A1 (en) * | 2008-10-28 | 2012-04-26 | Osram Opto Semicondctors Gmbh | Supporting Body for a Semiconductor Component, Semiconductor Element and Method for Production of a Supporting Body |
US20120164794A1 (en) * | 2010-12-28 | 2012-06-28 | Yan Xun Xue | Method of making a copper wire bond package |
DE102011113255A1 (en) * | 2011-09-13 | 2013-03-14 | Infineon Technologies Ag | Chip module and a method for producing a chip module |
US20130062722A1 (en) * | 2011-09-13 | 2013-03-14 | Infineon Technologies Ag | Chip module and a method for manufacturing a chip module |
US20130105953A1 (en) * | 2011-10-31 | 2013-05-02 | Samsung Electro-Mechanics Co., Ltd. | Power module package |
US20150131232A1 (en) * | 2012-06-29 | 2015-05-14 | Denso Corporation | Semiconductor device and semiconductor device connection structure |
US20140159248A1 (en) * | 2012-12-10 | 2014-06-12 | Invensas Corporation | High performance package on package |
US20140252574A1 (en) * | 2013-03-05 | 2014-09-11 | Nichia Corporation | Lead frame and semiconductor device |
US8772913B1 (en) * | 2013-04-04 | 2014-07-08 | Freescale Semiconductor, Inc. | Stiffened semiconductor die package |
US20150348889A1 (en) * | 2014-05-30 | 2015-12-03 | Delta Electronics, Inc. | Semiconductor device |
US20180040487A1 (en) * | 2015-07-02 | 2018-02-08 | Renesas Electronics Corporation | Manufacturing method of semiconductor device and semiconductor device |
US20180068934A1 (en) * | 2016-09-07 | 2018-03-08 | Infineon Technologies Americas Corp. | Package for die-bridge capacitor |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI816540B (en) * | 2022-09-06 | 2023-09-21 | 立錡科技股份有限公司 | Package structure |
Also Published As
Publication number | Publication date |
---|---|
CN209729896U (en) | 2019-12-03 |
US10438877B1 (en) | 2019-10-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102649471B1 (en) | Semiconductor package and method of fabricating the same | |
US7012325B2 (en) | Ultra-thin semiconductor package device and method for manufacturing the same | |
US8058717B2 (en) | Laminated body of semiconductor chips including pads mutually connected to conductive member | |
US9478484B2 (en) | Semiconductor packages and methods of formation thereof | |
US7888179B2 (en) | Semiconductor device including a semiconductor chip which is mounted spaning a plurality of wiring boards and manufacturing method thereof | |
US9368435B2 (en) | Electronic component | |
US20070093000A1 (en) | Pre-molded leadframe and method therefor | |
CN111725080A (en) | Semiconductor device package and method of manufacturing the same | |
US11721654B2 (en) | Ultra-thin multichip power devices | |
US12051635B2 (en) | Semiconductor device package with clip interconnect and dual side cooling | |
US20170186674A1 (en) | Semiconductor packages and methods for forming same | |
US20100102438A1 (en) | Semiconductor device and method of manufacturing the same | |
US8912664B1 (en) | Leadless multi-chip module structure | |
US20220084920A1 (en) | Semiconductor package structures and methods of manufacture | |
US9449902B2 (en) | Semiconductor packages having multiple lead frames and methods of formation thereof | |
US10438877B1 (en) | Multi-chip packages with stabilized die pads | |
US10916485B2 (en) | Molded wafer level packaging | |
US20060231932A1 (en) | Electrical package structure including chip with polymer thereon | |
TWI651827B (en) | Substrate-free package structure | |
US12159792B2 (en) | Flip chip package unit comprising thermal protection film and associated packaging method | |
US8269321B2 (en) | Low cost lead frame package and method for forming same | |
US8618653B2 (en) | Integrated circuit package system with wafer scale heat slug | |
US20050194698A1 (en) | Integrated circuit package with keep-out zone overlapping undercut zone | |
US20140077388A1 (en) | Semiconductor device and method of manufacturing the same | |
US12266583B2 (en) | Flip chip package unit and associated packaging method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC, ARIZONA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:PALAGUD, JOSE FELIXMINIA;WANG, SOON WEI;REEL/FRAME:045187/0033 Effective date: 20180313 |
|
FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
AS | Assignment |
Owner name: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AG Free format text: SECURITY INTEREST;ASSIGNOR:SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC;REEL/FRAME:047734/0068 Effective date: 20180426 Owner name: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT, NEW YORK Free format text: SECURITY INTEREST;ASSIGNOR:SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC;REEL/FRAME:047734/0068 Effective date: 20180426 |
|
STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
MAFP | Maintenance fee payment |
Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY Year of fee payment: 4 |
|
AS | Assignment |
Owner name: FAIRCHILD SEMICONDUCTOR CORPORATION, ARIZONA Free format text: RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 047734, FRAME 0068;ASSIGNOR:DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT;REEL/FRAME:064160/0027 Effective date: 20230622 Owner name: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC, ARIZONA Free format text: RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 047734, FRAME 0068;ASSIGNOR:DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT;REEL/FRAME:064160/0027 Effective date: 20230622 |