US20160135297A1 - Via in a printed circuit board - Google Patents
Via in a printed circuit board Download PDFInfo
- Publication number
- US20160135297A1 US20160135297A1 US15/001,140 US201615001140A US2016135297A1 US 20160135297 A1 US20160135297 A1 US 20160135297A1 US 201615001140 A US201615001140 A US 201615001140A US 2016135297 A1 US2016135297 A1 US 2016135297A1
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- United States
- Prior art keywords
- catalytic
- adhesive
- hole
- dielectric
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000003197 catalytic effect Effects 0.000 claims abstract description 73
- 229910052751 metal Inorganic materials 0.000 claims abstract description 72
- 239000002184 metal Substances 0.000 claims abstract description 72
- 239000000853 adhesive Substances 0.000 claims abstract description 66
- 230000001070 adhesive effect Effects 0.000 claims abstract description 66
- 239000002648 laminated material Substances 0.000 claims abstract description 26
- 238000000576 coating method Methods 0.000 claims description 38
- 239000011248 coating agent Substances 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 33
- 239000010949 copper Substances 0.000 claims description 25
- 239000002245 particle Substances 0.000 claims description 22
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 20
- 229910052802 copper Inorganic materials 0.000 claims description 20
- 238000007747 plating Methods 0.000 claims description 16
- 239000000945 filler Substances 0.000 claims description 11
- 238000005553 drilling Methods 0.000 claims description 10
- 239000011256 inorganic filler Substances 0.000 claims description 10
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 10
- 239000003054 catalyst Substances 0.000 claims 3
- 239000010410 layer Substances 0.000 description 32
- 239000000463 material Substances 0.000 description 13
- 239000012790 adhesive layer Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- KKQWHYGECTYFIA-UHFFFAOYSA-N 2,5-dichlorobiphenyl Chemical compound ClC1=CC=C(Cl)C(C=2C=CC=CC=2)=C1 KKQWHYGECTYFIA-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000004643 cyanate ester Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000007590 electrostatic spraying Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/115—Via connections; Lands around holes or via connections
- H05K1/116—Lands, clearance holes or other lay-out details concerning the surrounding of a via
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
- H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0044—Mechanical working of the substrate, e.g. drilling or punching
- H05K3/0047—Drilling of holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
- H05K3/427—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0221—Insulating particles having an electrically conductive coating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0236—Plating catalyst as filler in insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0709—Catalytic ink or adhesive for electroless plating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
- Y10T29/49167—Manufacturing circuit on or in base by forming conductive walled aperture in base with deforming of conductive path
Definitions
- PCB printed circuit board
- the structure of a multilayer board can be created in many different ways.
- One way is that no-catalytic cores are made by print and etch to create the circuitry on both faces.
- the cores are stuck up and laminated followed by drilling and circuitization of the outer layers and the holes.
- FIG. 1 shows a simplified diagram illustrated vias a printed circuit board in accordance with an implementation.
- FIG. 2 , FIG. 3 , FIG. 4 , FIG. 5 , FIG. 6 and FIG. 7 illustrate steps in a process where vias are formed in a printed circuit board in accordance with an implementation.
- FIG. 8 is a flowchart summarizing a process where vias are formed in a printed circuit board in accordance with an implementation.
- FIG. 9 is a flowchart summarizing a process where vias are formed in a printed circuit board in accordance with an alternative implementation.
- a catalytic adhesive coating can be placed on walls of holes used for vias.
- the coating can be made using the same or similar material used to make the laminate of the PCB core. This allows for good adhesion of metal traces.
- Fabrication of the outer layers of the PCB can be done using lasers to create blind vias and a photoimageable mask to create traces.
- FIG. 1 illustrates vias in a portion of a printed circuit board (PCB) 9 .
- Dielectric laminate material 10 functions as a PCB substrate (two-sided laminate core) and is composed of, for example, glass or non-glass reinforcement and a resin such as, for example, epoxy, polyimide, Teflon or any other type of resin suitable for inclusion in a PCB substrate.
- Dielectric laminate material 10 is, for example, approximately 0.028′′ thick.
- Vias 13 for example, composed of a metal such as copper, silver, gold or some other suitable conductive metal extend through dielectric laminate material 10 allowing electrical connection between circuitry on different faces of PCB 9 .
- Dielectric laminate material 10 is shown in FIG. 2 .
- Dielectric laminate has a metal top coating 11 and a metal bottom coating 12 .
- metal top coating 11 and metal bottom coating 12 are composed of a metal such as copper, silver, gold or some other suitable conductive metal.
- metal top coating 11 and metal bottom coating 12 each has a thickness between 0.1 microns and 5 microns.
- Metal top coating 11 and metal bottom coating 12 can be applied to dielectric laminate material 10 with any known process such as sputtering, lamination, etc.
- a hole 14 is drilled in dielectric laminate material 10 .
- Hole 14 is, for example, approximately 8 mil in diameter. The diameter of via holes will vary depending on application, available manufacturing processes and so on.
- catalytic adhesive material 25 is a dielectric adhesive such as an epoxy, polyimide, cyanate ester or another suitable dielectric adhesive.
- the dielectric adhesive includes, for example, both non-catalytic and catalytic filler particles.
- the catalytic filler particles are composed of, for example, a metal such as palladium (Pd), iron (Fe) and/or other catalytic particles used for copper plating where electroless copper (Cu) is reduced from its Cu ++ to Cu.
- the catalytic particles can be made of inorganic filler with metal coated over the inorganic filler.
- the inorganic filler can be silicon dioxide, kaolin, or some other inorganic filler with suitable properties for the particular application.
- the adhesive material can be topically applied to hole 14 .
- an adhesive layer can be deposited on one or both sides of laminate material. After depositing the adhesive layer, any excess adhesive material residing metal coating 11 or metal coating 12 is removed. This is done before the adhesive layer is cured. The removal can be accomplished, for example, by a squeeze process, a wipe process, or any other process that cleans the adhesive layer from metal coating 11 and metal coating 12 .
- the reology (viscosity) of the adhesive is adjusted and is based on the type of method used to fill the holes.
- the dielectric material contains catalytic particles that, for example, have a particle size in the range of 2 to 12 micrometer (um). Alternatively, other particle sizes can be used. For example, smaller particle sizes are better as bigger particle size may affect uniformity and roughness of copper plating placed on top adhesive layer 11 and bottom adhesive layer 12 .
- the particles are between six and fifteen percent of the total weight of the catalytic adhesive material 25 . This percentage is only an example as for various applications the weight of the particles may be some other percentage of the total weight of the catalytic adhesive material 25 .
- the catalytic adhesive material is deposited using, for example, screen printing, stenciling, or squeegee coating using a coating machine such as those available from the ITC, Intercircuit, N.A., or another coating device able to perform or one or more of the known processes and techniques in the industry used to deposit material on a PCB substrate.
- a coating machine such as those available from the ITC, Intercircuit, N.A., or another coating device able to perform or one or more of the known processes and techniques in the industry used to deposit material on a PCB substrate.
- FIG. 5 illustrates a hole 26 drilled through catalytic adhesive material 25 .
- hole 26 is 6 mil in diameter, leaving a layer 15 of catalytic adhesive material around the diameter of hole 26 .
- the diameter of hole 26 will vary depending on application, available manufacturing processes and so on.
- Catalytic particles in the holes are exposed when the hole is drilled.
- catalytic particles can be additionally exposed by using plasma, or any other PCB board techniques such as chemical desmear, etc., to remove some of the resin of the catalytic adhesive material.
- FIG. 6 shows a full metal plating layer 17 having been deposited over metal coating 11 and a full metal plating layer 18 having been deposited over metal coating 12 .
- Metal regions 20 are also formed within hole 26 .
- the thickness of metal plating layer 17 , metal plating layer 18 and metal regions 20 is between 0.5-1.4 mils.
- full metal plating layer 17 , full metal plating layer 18 and metal regions 20 are composed of electroless or electroplated copper or some other suitable conductive material.
- metal coating 11 remains under metal patterned layer 16 and metal coating 12 remains under metal patterned layer 19 .
- the catalytic adhesive material around the diameter of hole 26 assures good adhesion of metal regions 20 within hole 26 .
- Metal patterned layer 16 and metal patterned layer 19 function as traces for the PCB.
- Using a resist pattern to form copper plating allows for better defined traces (i.e. traces with straighter wall formation) which helps in better trace electrical characteristics such as impedance and line signal loss.
- traces i.e. traces with straighter wall formation
- the cross section of the traces looks like a trapezoid rather than a square or rectangle as they appear when formed using resist.
- multilayer constructions can be made using known techniques such as applying additional catalytic adhesive over the circuitized layers and forming vias by laser or plasma to build additional layer(s).
- both faces of the circuitized laminate core are coated with catalytic adhesive.
- the coating covers holes in the laminate core, such as hole 27 shown in FIG. 6 .
- the catalytic adhesive functions as a dielectric layer separating the layers that are going to be built on top.
- the catalytic adhesive layer is fully cured by heat or UV energy.
- a thin (e.g., 0.1 to 5 microns) coating of copper (Cu) is applied over the catalytic adhesive layer on both sides of the laminate core.
- the subsequent steps of constructing the next outer layers include via formation, for example, using a laser for blind stack vias or mechanical drilling for connection between layers.
- FIG. 8 summarizes the overall implementation of using catalytic adhesive as illustrated in FIGS. 2 through 7 .
- a block 40 both faces of dielectric laminate material are coated with a metal, such as copper.
- a hole is drilled in dielectric laminate material.
- the hole is filled with a catalytic adhesive.
- a second hole is drilled through the catalytic adhesive where the catalytic adhesive fills the first hole.
- the second hole has a smaller diameter than the first hole so that a layer of catalytic adhesive remains at a diameter of the second hole. This process may be repeated for additional layers.
- block 41 , block 42 and block 43 are omitted.
- a patterned metal layer is formed over the metal coatings on both faces of the dielectric laminate material.
- FIG. 9 summarizes an alternative implementation.
- both faces of dielectric laminate material are coated with a metal such as copper.
- a hole is drilled in dielectric laminate material.
- walls of the hole are coated catalytic adhesive.
- electrostatic spraying, spraying or some other coating process is performed, for example, using standard coating equipment in the industry, to coat the dielectric laminate material with the catalytic adhesive so that the walls of the hole is coated at the same time.
- thickness of the catalytic adhesive coat is five to fifty microns.
- the viscosity of the adhesive is adjusted depending on the method of application.
- the catalytic adhesive coating is removed from the metal surfaces before being cured. This is done, for example, by squeezing, wiping, etc.
- the catalytic adhesive remaining on the walls of the hole is then cured.
- a patterned metal layer is formed over the metal coatings on both faces of the dielectric laminate material.
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
Abstract
Description
- The miniaturization of the electronics industry has put pressure in the printed circuit board (PCB) industry to create features of fine circuitry. The print and etch processes often used to create PCB's and PCB cores are not precise enough for fine features down to one mil lines and spaces and below. Instead, additive processes using catalytic laminates allows copper (Cu) plating to be performed selectively in photolithographically defined channels and vias using plating resist.
- The structure of a multilayer board can be created in many different ways. One way is that no-catalytic cores are made by print and etch to create the circuitry on both faces. The cores are stuck up and laminated followed by drilling and circuitization of the outer layers and the holes.
-
FIG. 1 shows a simplified diagram illustrated vias a printed circuit board in accordance with an implementation. -
FIG. 2 ,FIG. 3 ,FIG. 4 ,FIG. 5 ,FIG. 6 andFIG. 7 illustrate steps in a process where vias are formed in a printed circuit board in accordance with an implementation. -
FIG. 8 is a flowchart summarizing a process where vias are formed in a printed circuit board in accordance with an implementation. -
FIG. 9 is a flowchart summarizing a process where vias are formed in a printed circuit board in accordance with an alternative implementation. - In the fabrication of printed circuit boards (PCBs), where routing of metal is difficult because of high density requirements and where outer layers can be formed at the end of the fabrication processes, then a catalytic adhesive coating can be placed on walls of holes used for vias. The coating can be made using the same or similar material used to make the laminate of the PCB core. This allows for good adhesion of metal traces. Fabrication of the outer layers of the PCB can be done using lasers to create blind vias and a photoimageable mask to create traces.
-
FIG. 1 illustrates vias in a portion of a printed circuit board (PCB) 9.Dielectric laminate material 10 functions as a PCB substrate (two-sided laminate core) and is composed of, for example, glass or non-glass reinforcement and a resin such as, for example, epoxy, polyimide, Teflon or any other type of resin suitable for inclusion in a PCB substrate.Dielectric laminate material 10 is, for example, approximately 0.028″ thick.Vias 13, for example, composed of a metal such as copper, silver, gold or some other suitable conductive metal extend throughdielectric laminate material 10 allowing electrical connection between circuitry on different faces ofPCB 9. - A process for forming the vias is illustrated in
FIGS. 2 through 7 .Dielectric laminate material 10 is shown inFIG. 2 . Dielectric laminate has a metaltop coating 11 and ametal bottom coating 12. For example, metaltop coating 11 andmetal bottom coating 12 are composed of a metal such as copper, silver, gold or some other suitable conductive metal. For example, metaltop coating 11 andmetal bottom coating 12 each has a thickness between 0.1 microns and 5 microns. Metaltop coating 11 andmetal bottom coating 12 can be applied todielectric laminate material 10 with any known process such as sputtering, lamination, etc. - As illustrated by
FIG. 3 , for each via, ahole 14 is drilled indielectric laminate material 10.Hole 14 is, for example, approximately 8 mil in diameter. The diameter of via holes will vary depending on application, available manufacturing processes and so on. -
Hole 14 is filled with a catalyticadhesive material 25, as shown inFIG. 4 . For example, catalyticadhesive material 25 is a dielectric adhesive such as an epoxy, polyimide, cyanate ester or another suitable dielectric adhesive. The dielectric adhesive includes, for example, both non-catalytic and catalytic filler particles. The catalytic filler particles are composed of, for example, a metal such as palladium (Pd), iron (Fe) and/or other catalytic particles used for copper plating where electroless copper (Cu) is reduced from its Cu++ to Cu. For example, the catalytic particles can be made of inorganic filler with metal coated over the inorganic filler. For example, the inorganic filler can be silicon dioxide, kaolin, or some other inorganic filler with suitable properties for the particular application. - To create the plug, the adhesive material can be topically applied to
hole 14. Alternatively, an adhesive layer can be deposited on one or both sides of laminate material. After depositing the adhesive layer, any excess adhesive material residingmetal coating 11 ormetal coating 12 is removed. This is done before the adhesive layer is cured. The removal can be accomplished, for example, by a squeeze process, a wipe process, or any other process that cleans the adhesive layer frommetal coating 11 andmetal coating 12. - The reology (viscosity) of the adhesive is adjusted and is based on the type of method used to fill the holes. The dielectric material contains catalytic particles that, for example, have a particle size in the range of 2 to 12 micrometer (um). Alternatively, other particle sizes can be used. For example, smaller particle sizes are better as bigger particle size may affect uniformity and roughness of copper plating placed on top
adhesive layer 11 and bottomadhesive layer 12. For example, by weight the particles are between six and fifteen percent of the total weight of the catalyticadhesive material 25. This percentage is only an example as for various applications the weight of the particles may be some other percentage of the total weight of the catalyticadhesive material 25. The catalytic adhesive material is deposited using, for example, screen printing, stenciling, or squeegee coating using a coating machine such as those available from the ITC, Intercircuit, N.A., or another coating device able to perform or one or more of the known processes and techniques in the industry used to deposit material on a PCB substrate. -
FIG. 5 illustrates ahole 26 drilled through catalyticadhesive material 25. For example,hole 26 is 6 mil in diameter, leaving alayer 15 of catalytic adhesive material around the diameter ofhole 26. The diameter ofhole 26 will vary depending on application, available manufacturing processes and so on. Catalytic particles in the holes are exposed when the hole is drilled. In addition, catalytic particles can be additionally exposed by using plasma, or any other PCB board techniques such as chemical desmear, etc., to remove some of the resin of the catalytic adhesive material. -
FIG. 6 shows a fullmetal plating layer 17 having been deposited overmetal coating 11 and a fullmetal plating layer 18 having been deposited overmetal coating 12.Metal regions 20 are also formed withinhole 26. For example the thickness ofmetal plating layer 17,metal plating layer 18 andmetal regions 20 is between 0.5-1.4 mils. For example, fullmetal plating layer 17, fullmetal plating layer 18 andmetal regions 20 are composed of electroless or electroplated copper or some other suitable conductive material. - To pattern the metal layers, resist is applied and exposed to develop pattern plating. The resist is then removed and the metal is etched. The result, shown in
FIG. 7 , is apatterned metal layer 16 and a patternedmetal layer 19.Metal coating 11 remains under metal patternedlayer 16 andmetal coating 12 remains under metal patternedlayer 19. The catalytic adhesive material around the diameter ofhole 26 assures good adhesion ofmetal regions 20 withinhole 26. - Metal patterned
layer 16 and metal patternedlayer 19 function as traces for the PCB. - Using a resist pattern to form copper plating allows for better defined traces (i.e. traces with straighter wall formation) which helps in better trace electrical characteristics such as impedance and line signal loss. When copper traces are formed, for example, using a subtractive print and etch process, the cross section of the traces looks like a trapezoid rather than a square or rectangle as they appear when formed using resist.
- Once the two-sided laminate core is circuitized, multilayer constructions can be made using known techniques such as applying additional catalytic adhesive over the circuitized layers and forming vias by laser or plasma to build additional layer(s).
- For example, to add an additional layer on a circuitized two-sided laminate core, both faces of the circuitized laminate core are coated with catalytic adhesive. The coating covers holes in the laminate core, such as hole 27 shown in
FIG. 6 . The catalytic adhesive functions as a dielectric layer separating the layers that are going to be built on top. The catalytic adhesive layer is fully cured by heat or UV energy. A thin (e.g., 0.1 to 5 microns) coating of copper (Cu) is applied over the catalytic adhesive layer on both sides of the laminate core. The subsequent steps of constructing the next outer layers include via formation, for example, using a laser for blind stack vias or mechanical drilling for connection between layers. If mechanical drilling is required this is done, for example, by drilling a hole, filling the hole with catalytic adhesives and then drilling a second hole. If the interconnection between layers is performed with laser blind vias, then no drilling is necessary. The vias go through copper metallization followed by dry film and selective copper plating. The resist is then stripped and the thin Cu is etched to create the traces. The same process is repeated for additional layers on both sides. -
FIG. 8 summarizes the overall implementation of using catalytic adhesive as illustrated inFIGS. 2 through 7 . In ablock 40, both faces of dielectric laminate material are coated with a metal, such as copper. In ablock 41, a hole is drilled in dielectric laminate material. In ablock 42, the hole is filled with a catalytic adhesive. In ablock 43, a second hole is drilled through the catalytic adhesive where the catalytic adhesive fills the first hole. The second hole has a smaller diameter than the first hole so that a layer of catalytic adhesive remains at a diameter of the second hole. This process may be repeated for additional layers. As pointed out above, for layers where mechanical drilling is not necessary to form layers to connect vias, block 41, block 42 and block 43 are omitted. - In a
block 44, a patterned metal layer is formed over the metal coatings on both faces of the dielectric laminate material. -
FIG. 9 summarizes an alternative implementation. In ablock 50, both faces of dielectric laminate material are coated with a metal such as copper. In ablock 51, a hole is drilled in dielectric laminate material. In ablock 52, walls of the hole are coated catalytic adhesive. For example, to do this one or both faces of the dielectric laminate material are coated with a catalytic adhesive when the hole walls are coated. For example, electrostatic spraying, spraying or some other coating process is performed, for example, using standard coating equipment in the industry, to coat the dielectric laminate material with the catalytic adhesive so that the walls of the hole is coated at the same time. For example, thickness of the catalytic adhesive coat is five to fifty microns. The viscosity of the adhesive is adjusted depending on the method of application. The catalytic adhesive coating is removed from the metal surfaces before being cured. This is done, for example, by squeezing, wiping, etc. The catalytic adhesive remaining on the walls of the hole is then cured. - In a
block 53, a patterned metal layer is formed over the metal coatings on both faces of the dielectric laminate material. - The foregoing discussion discloses and describes merely exemplary methods and embodiments. As will be understood by those familiar with the art, the disclosed subject matter may be embodied in other specific forms without departing from the spirit or characteristics thereof. Accordingly, the present disclosure is intended to be illustrative, but not limiting, of the scope of the invention, which is set forth in the following claims.
Claims (18)
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US14/281,802 US9398703B2 (en) | 2014-05-19 | 2014-05-19 | Via in a printed circuit board |
US15/001,140 US9706667B2 (en) | 2014-05-19 | 2016-01-19 | Via in a printed circuit board |
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