US20130167595A1 - P-element doped laser medium apparatus and method - Google Patents
P-element doped laser medium apparatus and method Download PDFInfo
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- US20130167595A1 US20130167595A1 US13/777,472 US201313777472A US2013167595A1 US 20130167595 A1 US20130167595 A1 US 20130167595A1 US 201313777472 A US201313777472 A US 201313777472A US 2013167595 A1 US2013167595 A1 US 2013167595A1
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- 238000000034 method Methods 0.000 title claims abstract description 12
- 239000011521 glass Substances 0.000 claims abstract description 59
- 239000000203 mixture Substances 0.000 claims abstract description 26
- 239000000146 host glass Substances 0.000 claims abstract description 19
- 239000000843 powder Substances 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 claims abstract description 6
- 238000001816 cooling Methods 0.000 claims abstract description 3
- 238000002156 mixing Methods 0.000 claims abstract description 3
- 239000000835 fiber Substances 0.000 description 56
- 239000006185 dispersion Substances 0.000 description 42
- 239000002019 doping agent Substances 0.000 description 18
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 15
- 238000010586 diagram Methods 0.000 description 15
- 239000000463 material Substances 0.000 description 13
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 12
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 229910052787 antimony Inorganic materials 0.000 description 8
- 238000005086 pumping Methods 0.000 description 7
- 229910052718 tin Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 229910052797 bismuth Inorganic materials 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 6
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 6
- 230000005284 excitation Effects 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 4
- 229910052745 lead Inorganic materials 0.000 description 4
- 239000004038 photonic crystal Substances 0.000 description 4
- 239000011669 selenium Substances 0.000 description 4
- 229910052714 tellurium Inorganic materials 0.000 description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 229910052785 arsenic Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910052593 corundum Inorganic materials 0.000 description 3
- 229910052733 gallium Inorganic materials 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- -1 germinate Substances 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910001845 yogo sapphire Inorganic materials 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 229910003069 TeO2 Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N lead(II) oxide Inorganic materials [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 239000005365 phosphate glass Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000005368 silicate glass Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical compound O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 description 2
- 229910052716 thallium Inorganic materials 0.000 description 2
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000002547 anomalous effect Effects 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- HTUMBQDCCIXGCV-UHFFFAOYSA-N lead oxide Chemical compound [O-2].[Pb+2] HTUMBQDCCIXGCV-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000009022 nonlinear effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052699 polonium Inorganic materials 0.000 description 1
- HZEBHPIOVYHPMT-UHFFFAOYSA-N polonium atom Chemical compound [Po] HZEBHPIOVYHPMT-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000001778 solid-state sintering Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- YEAUATLBSVJFOY-UHFFFAOYSA-N tetraantimony hexaoxide Chemical compound O1[Sb](O2)O[Sb]3O[Sb]1O[Sb]2O3 YEAUATLBSVJFOY-UHFFFAOYSA-N 0.000 description 1
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0071—Compositions for glass with special properties for laserable glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/02—Pretreated ingredients
- C03C1/026—Pelletisation or prereacting of powdered raw materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
- H01S3/06716—Fibre compositions or doping with active elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
- H01S3/06729—Peculiar transverse fibre profile
- H01S3/06741—Photonic crystal fibre, i.e. the fibre having a photonic bandgap
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/17—Solid materials amorphous, e.g. glass
Definitions
- the laser medium 120 may be constructed of various materials, the properties of which affect the operation of the laser apparatus 100 , as well as properties of light emitted from the laser apparatus 100 , such as bandwidth of the emitted light. Variations in properties of light emitted from the laser apparatus 100 , such as a frequency range (i.e., bandwidth), can impact suitability of the use of the emitted light for various specific purposes.
- the present invention has been made to address at least the above problems and/or disadvantages and to provide at least the advantages described below.
- FIG. 2 are contour diagrams illustrating a plot of an example of fluorescence vs. excitation for Bi, Pb, Sb, Sn, Te dopants further doped with an Al co-dopant in silicate or germanate glass hosts according to an embodiment of the present invention
- 3p elements used in laser mediums include Aluminum (Al), Silicon (Si), and Phosphorous (P); 4p elements include Gallium (Ga), Germanium (Ge), Arsenic (As), and Selenium (Se); 5p elements include Indium (In), Tin (Sn), Antimony (Sb), Tellurium (Te), and Iodine (I); and 6p elements include Thallium (Tl), Lead (Pb), Bismuth (Bi), and Polonium (Po).
- the 5p and 6p components may further include a saturable absorber for generating ps and fs pulses.
- the saturable absorber may include any of various saturable absorption materials, including, but not limited to an alloyed semi-conductor for performing absorption at around 1200 nm and/or a YAG saturable absorber.
- these bands are located at (560 nm, 1170 nm) (A-band); (710 nm, 1140 nm) (B-band); (800 nm, 1280 nm) (C-band) and (1000 nm, 1140 nm) (D-band), where the first number denotes an excitation wavelength and the second is an emission wavelength.
- Excitation/emission bands of other p-elements are listed in Table 1, as follows:
- the decays are similar, while at the initial and intermediate stages of the decay there are significant differences, especially for Sb and Sn doped samples.
- Relative intensity of long-lived fluorescence in Sb and Sn-doped samples is significantly lower compared to Bi and Pb-doped samples.
- These lifetimes shows that these p-elements are suitable for lasers and amplifiers in fibers, waveguides and rods.
- the spectral position of p-elements for excitation and emission peaks are listed in Table 1. Various peaks can lase over the NIR suitable for fibers (single, microstructure) and waveguides.
- a doped glass host such as described above, may be arranged in the form of glass fibers.
- such glass fibers are referred to as “doped p fibers.”
- the doped p fibers can be used in series or in parallel in a laser in order to expand a spectral emission of the laser.
- the doped p fibers may also use various emission wavelengths to excite samples.
- the doped p fibers may be arranged in such a manner as to facilitate wavelength division multiplexing.
- a p-laser fiber region including the doped p fibers may occupy a core region of the microstructure PCF in order to compensate for dispersion of tunable NIR emissions.
- the p-dopant fibers can be formed in step index of refraction index or microstructure form.
- the compensation of a waveguide/fiber dispersion Dw ranging from about 1100 nm to about 1400 to 1700 nm, may be minimized by using a dispersion fiber for dispersion compensation of a material dispersion Dm.
- a dispersion fiber may be any fiber used for adding a positive or negative dispersion to the p fibers according to embodiments of the present invention.
- Dispersion fibers may be arranged in series with the p fibers, and may be coupled to the p fibers through optical coupling. By placing the dispersion fiber in series with the p fibers, dispersion compensation occurs over two dispersion parts, for controlling dispersion within a particular bandwidth range, such as from about 1100 nm to about 1700 nm, for example.
- the total dispersion D T is given by Equation (1), as follows:
- FIG. 9 is a diagram illustrating an example of dispersion of a silicate glass host using doped p fibers according to an embodiment of the present invention.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Glass Compositions (AREA)
Abstract
Description
- This application is a Divisional Application of U.S. patent application Ser. No. 13/026,869 filed in the U.S. Patent and Trademark Office on Feb. 14, 2011, and this application claims priority to U.S. Provisional Patent Application Ser. No. 61/282,451, filed Feb. 12, 2010, the entire contents of each of which are incorporated herein by reference.
- 1. Field of the Invention
- The present invention is directed to glass composition for use as a laser medium, a method for producing the glass composition, and a laser apparatus including the glass composition.
- 2. Description of the Related Art
-
FIG. 1 illustrates a conventional laser apparatus. Referring toFIG. 1 , alaser apparatus 100, which is used to emit light for various purposes, typically includes apumping source 110 for providing energy, a laser medium 120 that receives the energy provided by thepumping source 110, and tworeflective elements reflective back mirror 130 and a partially reflectivefront mirror 140, such that thefront mirror 140 transmits a portion of the light through the front mirror as an output of the laser apparatus. - The laser medium 120 may be constructed of various materials, the properties of which affect the operation of the
laser apparatus 100, as well as properties of light emitted from thelaser apparatus 100, such as bandwidth of the emitted light. Variations in properties of light emitted from thelaser apparatus 100, such as a frequency range (i.e., bandwidth), can impact suitability of the use of the emitted light for various specific purposes. - Various fields of science and engineering, in particular, chemistry and telecommunications, require broadband laser sources and optical amplifiers in the form of fibers and waveguides. The Near InfraRed (NIR) spectrum, which ranges from 1100 nm to 1600 nm, is used for wideband operations. Recently, tunable laser action has been achieved using Cr4+ and Cr3+ doped crystals. However, even with these developments, there is still a further need for improved laser medium constructions and compositions in order to produce emitted light even better suited to these and other various purposes.
- The present invention has been made to address at least the above problems and/or disadvantages and to provide at least the advantages described below.
- According to an aspect of the present invention, a glass composition for use as a laser medium is provided. The glass composition includes a host glass; a 3p component having a concentration of about 5 mole percent to about 10 mole percent; and at least one of a 6p component having a concentration of about 1 mole percent to about 5 mole percent and a 5p component having a concentration of about 1 mole percent to about 5 mole percent.
- According to another aspect of the present invention, a laser apparatus is provided. The laser apparatus includes a laser medium comprising a host glass, a 3p component having a concentration of about 5 mole percent to about 10 mole percent, and at least one of a 6p component having a concentration of about 1 mole percent to about 5 mole percent and a 5p component having a concentration of about 1 mole percent to about 5 mole percent; optical means for exciting the laser medium to emit optical radiation; and an optical resonant cavity for supporting coherent radiation emitted by the laser medium.
- According to another aspect of the present invention, a method for manufacturing a glass composition including a host glass, a 3p component having a concentration of about 5 mole percent to about 10 mole percent, and at least one of a 6p component having a concentration of about 1 mole percent to about 5 mole percent and a 5p component having a concentration of about 1 mole percent to about 5 mole percent is provided. The method includes heating the host glass to a first predetermined temperature for a first period of time, mixing a powder including the 3p component and the at least one of the 5p component and the 6p component with the heated host glass into a glass/powder mixture, heating the glass/powder mixture to a second predetermined temperature for a second period of time, and cooling, after heating, the glass/powder mixture.
- The above and other aspects, features and advantages of the present invention will become more apparent from the following detailed description when taken in conjunction with the accompanying drawings in which:
-
FIG. 1 is a diagram illustrating a conventional laser apparatus; -
FIG. 2 are contour diagrams illustrating a plot of an example of fluorescence vs. excitation for Bi, Pb, Sb, Sn, Te dopants further doped with an Al co-dopant in silicate or germanate glass hosts according to an embodiment of the present invention; -
FIG. 3 is a diagram illustrating decays in Pb-, Sb- and Sn-doped germanate samples co-doped with Al according to an embodiment of the present invention; -
FIG. 4 is a diagram illustrating a distribution of air holes within a Photonic Crystal Fiber (PCF) according to an embodiment of the present invention; -
FIGS. 5 and 6 are diagrams illustrating an example of material dispersion Dm and waveguide/fiber dispersion Dw of silicate and germanate glass hosts using doped p fibers according to an embodiment of the present invention; -
FIG. 7 is a diagram illustrating another example of waveguide/fiber dispersion Dw of silicate and germanate glass hosts using doped p fibers according to an embodiment of the present invention; -
FIG. 8 is a diagram illustrating an example of waveguide/fiber dispersion Dw, material dispersion Dm, and overall dispersion DT of silicate and germanate glass hosts using doped p fibers according to an embodiment of the present invention; and -
FIG. 9 is a diagram illustrating an example of dispersion of a silicate glass host using doped p fibers according to an embodiment of the present invention. - Embodiments of the present invention are described in detail with reference to the accompanying drawings. Similar components are designated by similar reference numerals although they are illustrated in different drawings. Detailed descriptions of constructions or processes known in the art may be omitted to avoid obscuring the subject matter of the present invention. Terms used herein are defined based on functions in the present invention and may vary according to users, operators' intention or usual practices. Therefore, the definition of the terms should be made based on contents throughout the specification.
- According to embodiments of the present invention, laser mediums, which may be in the form of glass fibers, waveguides, and laser rods, may contain dopants including one or more 3p elements in combination with 4p, 5p, and/or 6p elements within a glass host. The glass host may be any of a plurality of glass host materials including silicate, germinate, or a phosphate glass host, but embodiments of the present invention are not limited to these specific example.
- The herein, the terms “3p”, “4p”, “Sp”, and “6p” refer to elements/ions included in the third, fourth, fifth, and sixth rows of the periodic table. With regard to embodiments of the present invention, 3p elements used in laser mediums include Aluminum (Al), Silicon (Si), and Phosphorous (P); 4p elements include Gallium (Ga), Germanium (Ge), Arsenic (As), and Selenium (Se); 5p elements include Indium (In), Tin (Sn), Antimony (Sb), Tellurium (Te), and Iodine (I); and 6p elements include Thallium (Tl), Lead (Pb), Bismuth (Bi), and Polonium (Po). Each of these listed elements, when included as dopants in the laser medium, may be present in the form of various compounds, such as compounds including Oxygen (O), for example, Al2O3, SiO2, and P2O5. Al may also be present as a dopant in the form of Aluminum Fluoride AlF3.
- Laser mediums according to embodiments of the present invention, which include 4p, 5p, and/or 6p elements in combination with 3p elements in silicate, germinate, and/or phosphate hosts, may be included in a laser apparatus, such that the laser apparatus is tunable to a Near InfraRed (NIR) spectrum ranging from about 1000 nm to about 1600 nm. Within this bandwidth, such laser emissions may be used for various applications including telecommunication, chemical, and biological applications, for example.
- The 5p and 6p elements with 3p elements within the laser medium may serve as active laser complexes for step index and photonic crystal fiber lasers, waveguide lasers and rod/slab lasers for Continuous Wave (CW), pulsed (nsec, psec, and fsec) operation within the NIR spectrum from about 1100 to 1600 nm.
- The long lifetime of metastable levels of p class elements provide favorable properties for use in laser mediums, including fiberoptics and waveguide lasers and amplifiers. According to embodiments of the present invention host glasses doped with 4p, 5p and/or 6p elements in combination with 3p elements, such as Al as a further dopant, are suitable for various types of lasers in various modes of operations, including CW, pulsed, and mode locked operation, in order to generate tunable CW, nanosecond (ns), picosecond (ps), and femtosecond (fs) modes of operation.
- The 4p, 5p, and 6p elements, when used as dopants with 3p elements, such as Al, for example, are suitable for wideband lasers in the form of fibers, waveguides, slabs and rods, within a laser cavity, in order to produce light within the NIR spectrum.
- As stated above, the doped glass hosts may be any of various types including germanate, silicate and phosphate types. In particular, the phosphate glasses may be used to allow for a relatively large dopant concentration.
- A process for preparing a laser medium including a glass host as described above, according to embodiments of the present invention, is described as follows.
- A glass host, such as a germinate (GeO2) glass host, for example, doped with 1 mole percent PbO, SnO, or Sb2O3 in combination with 12 mole percent AlF3, may be prepared by heating the glass host within a Platinum (Pt)-crucible, or a muffle furnace, for example, at 1450° C. for 1 hour, followed by quenching the glass onto a copper plate. The glass host may be melted within an air and nitrogen atmosphere. In particular, fluorescence is exhibited through doping the host glass with various p elements such as Bi and Pb, for example, when the host glass is synthesized in both air and nitrogen atmospheres, for example. Meanwhile, glass hosts doped with other p elements such as Sb and Sn, for example, exhibit fluorescence, when the melting and doping is performed in a nitrogen-only atmosphere.
- GeO2-glass samples doped with 1 mole percent Bi2O3 (or PbO, In2O3, SnO2, Sb2O3, TeO2) and co-doped with 12 mole percent AlF3 may be synthesized according to various casting techniques. Various particular glass hosts and p-elements (or particular compounds including a particular p-element), such as those described above, may be selected for inclusion in the doped glass according to various properties. For example, a GeO2-based glass composition has a lower melting point compared with traditional silica. Similarly, AlF3 may be chosen as a source of Al in place of other sources of Al having a higher melting point, such as Al2O3, as may be preferable due to various considerations. For example, use of a GeO2-based glass composition with AlF3 provides an opportunity to study optical center formation while using a glass preparation temperature from as low as 1100° C.
- A doped glass host composition according to embodiments of the present invention may be prepared through a glass fabrication procedure that includes a two-step heat treatment. For example, GeO2 (at 99.999% purity) and reagent grade AlF3, Bi2O3, PbO, In2O3, SnO2, Sb2O3, TeO2, may be used to perform synthesis in air and nitrogen atmospheres. A first heat treatment may be performed at 950° C. for 20 hrs to provide initial solid state sintering of a thoroughly mixed initial charge. After sintering, the dopant materials may ground and mixed in an alumina mortar. A resultant powder may be placed in a Pt-crucible and heated again up to 1450° C. for 1 hour, followed by quenching onto a copper plate. After quenching, the doped glass may be polished for further spectroscopic measurements.
- In addition to the example provided above, other materials may be used as a glass host according to embodiments of the present invention. For example, glasses based on SiO2 and/or P2O5 may be used as a glass host with an Al2O3 dopant in order to yield similar broadband emission in the NIR spectrum ranging from about 1100 nm to about 1600 nm.
- According to embodiments of the present invention, p fiber lasers (i.e., laser apparatus using a doped glass host composition according to embodiments of the present invention, as described above, for example) may be used to replace commonly used narrow line lasers, such as Erbium (Er) (6s/4f) lasers used for a 1530 nm to 1600 nm range and Thulium (Tm) (6s/4f) lasers used for a 1450 nm to 1540 nm range, for communications as well as other applications in chemistry and biology.
- Use of different host glasses according to embodiments of the present invention shift an emission spectrum for a given p element dopant with Al. For example for GeO2 and P2O5-based glass hosts enable an emission from about 1100 nm to about 1500 nm. 6p-element (e.g., Bi, Pb); 5p-element (e.g., Sb, Sn, In, Te) doped glasses, further doped with Al, have similar excitation-emission characteristics within 4 major bands, as shown in
FIG. 2 , whose position differ slightly in NIR. - The 5p and 6p components, in addition to the 5p and 6p elements/compositions, respectively, may further include a saturable absorber for generating ps and fs pulses. The saturable absorber may include any of various saturable absorption materials, including, but not limited to an alloyed semi-conductor for performing absorption at around 1200 nm and/or a YAG saturable absorber.
-
FIG. 2 is a contour diagram illustrating a plot of an example of fluorescence vs. excitation for Bi, Pb, Sb, Sn, Te dopants further doped with an Al co-dopant in silicate or germanate glass hosts according to an embodiment of the present invention. - Referring to
FIG. 2 , for Bi-doped glass these bands are located at (560 nm, 1170 nm) (A-band); (710 nm, 1140 nm) (B-band); (800 nm, 1280 nm) (C-band) and (1000 nm, 1140 nm) (D-band), where the first number denotes an excitation wavelength and the second is an emission wavelength. Excitation/emission bands of other p-elements are listed in Table 1, as follows: -
TABLE 1 p-M doped glasses Sample A B C D M AlF3 Ratio Ratio Ratio Ratio oxide mol. % Position to B Position to B Position to B Position to B Bi 0.75 (560, 1170) 0.45 (710, 1140) 1 (800, 1280) 0.18 (1000, 1140) 0.08 3 0.62 1 0.37 0.14 12 0.80 1 0.62 0.17 24 0.53 1 0.37 0.16 Pb 12 (540, 1120) 0.85 (710, 1110) 1 (820, 1260) 0.12 (1000, 1120) 0.16 Sb 12 (550, 1110) 0.62 (700, 1110) 1 (800, 1270) 0.32 (1000, 1110) 0.06 Sn 12 (540, 1120) 0.42 (710, 1105) 1 (800, 1260) 0.25 (1000, 1110) 0.11 - NIR emission may be performed through the use of host glasses doped with 6p elements (e.g., Pb) and 5p elements (e.g., Sb and Sn) and further doped with 3p elements, such Al, as listed in Table 1. Further, although not shown in Table 1, host glasses may also be doped with 4p elements (e.g., Ga, Ge, and As) and further doped with Al, in order to provide lasing.
- Models based on electronic states of dopants do not explain similarity of optical properties for elements with huge differences in spin-orbit constants (e.g., similarity of optical properties) when using 6p and 5p dopants. Further, the 4 major bands shown on excitation-emission plots, such as in
FIG. 2 , do not necessarily belong to the same optical center. Point defects or localized states may be caused by the presence of 6p and 5p ions, resulting in near infrared emission when a glass host is doped with these materials in combination with a 3p element such as Al. -
FIG. 3 is a diagram illustrating decays in Pb-, Sb- and Sn-doped germanate samples co-doped with Al according to an embodiment of the present invention. - In the example illustrated in
FIG. 3 , the decays are normalized to the unity intensity at t=0 for all traces. Referring toFIG. 3 , at the latest stage the decays are similar, while at the initial and intermediate stages of the decay there are significant differences, especially for Sb and Sn doped samples. Relative intensity of long-lived fluorescence in Sb and Sn-doped samples is significantly lower compared to Bi and Pb-doped samples. These lifetimes shows that these p-elements are suitable for lasers and amplifiers in fibers, waveguides and rods. For examples, the spectral position of p-elements for excitation and emission peaks are listed in Table 1. Various peaks can lase over the NIR suitable for fibers (single, microstructure) and waveguides. - In addition to the examples described above with reference to
FIGS. 2-3 , other p elements such as Thallium in the 6p class and Ga, Ge, As and Se in the 4p class may be used as dopants in the laser host glasses along with 3p elements such as Al, Si and P, in accordance with embodiments of the present invention. Table 2 below illustrates the electron configuration of such elements: -
TABLE 2 At M N O P nP element No 3s 3p 3d 4s 4p 4d 4f 5s 5p 5d 5f 6s 6p 6d 6f 5p In 49 2 1 0 0 Sn 50 2 2 0 0 Sb 51 2 3 0 0 Te 52 2 4 0 0 In 53 2 5 0 0 6p Tl 81 2 1 0 0 Pb 82 2 2 0 0 Bi 83 2 3 0 0 Po 84 2 4 0 0 3p Al 13 2 1 0 Si 14 2 2 0 P 15 2 3 0 4p Ga 31 2 1 0 0 Ge 32 2 2 0 0 As 33 2 3 0 0 Se 34 2 4 0 0 - According to embodiments of the present invention, a doped glass host, such as described above, may be arranged in the form of glass fibers. Herein, such glass fibers are referred to as “doped p fibers.” The doped p fibers can be used in series or in parallel in a laser in order to expand a spectral emission of the laser. The doped p fibers may also use various emission wavelengths to excite samples. According to embodiments of the present invention, the doped p fibers may be arranged in such a manner as to facilitate wavelength division multiplexing.
- The doped p fibers can be arranged in the form of single mode, step index, or microstructure Photonic Crystal Fibers (PCF) in order to adjust and compensate for included materials, and further to achieve fiber dispersion for laser emissions in a range from about 1100 nm to 1600 nm, for example.
- The microstructure PCFs are also referred to as microstructure fibers or holey fibers. Microstructure PCFs including doped p fibers according to embodiments of the present invention may be fabricated and assembled in a manner suitable to transport optical energy and generate nonlinear effects such as supercontimuum.
- A p-laser fiber region including the doped p fibers may occupy a core region of the microstructure PCF in order to compensate for dispersion of tunable NIR emissions. The p-dopant fibers can be formed in step index of refraction index or microstructure form. The compensation of a waveguide/fiber dispersion Dw, ranging from about 1100 nm to about 1400 to 1700 nm, may be minimized by using a dispersion fiber for dispersion compensation of a material dispersion Dm. A dispersion fiber may be any fiber used for adding a positive or negative dispersion to the p fibers according to embodiments of the present invention. Dispersion fibers may be arranged in series with the p fibers, and may be coupled to the p fibers through optical coupling. By placing the dispersion fiber in series with the p fibers, dispersion compensation occurs over two dispersion parts, for controlling dispersion within a particular bandwidth range, such as from about 1100 nm to about 1700 nm, for example. The total dispersion DT is given by Equation (1), as follows:
-
D T=Dm+Dw (1) - The zero dispersion region (Dm=0) for silica (SiO2) and germanate (GeO2) fibers operate within a range of about 1300 nm to about 1500 nm. The step index dispersion for wavelengths from about 1100 nm to 1600 nm, is Dw ˜10 ps/km·nm.
-
FIG. 4 is a diagram illustrating a distribution of air holes within a Photonic Crystal Fiber (PCF) according to an embodiment of the present invention. - Referring to
FIG. 4 , the waveguide/fiber dispersion Dw for the PCF can be greatly varied by including air holes having a diameter d, such that adjacent air holes are spaced by a Λ, which represents a distance from a center of one air hole to a center of an adjacent air hole. Variation of d and Λ can increase/decrease Dw for the PCF. Various d and Λ values, such as d=0.8 μm and Λ=2 μm, may be used in accordance with embodiments of the present invention. However, embodiments of the present invention are not limited to these values. - In one example according to an embodiment of the present invention, the core diameter dcore is set according to the d and Λ values. More specifically, in the present example, dcore=2Λ−d is for the p-doped region.
- The air holes can be arranged in square, triangular or circular arrangements. These variations in arrangement can result in changing Dw for the PCF. Further, one or more rods (e.g., about 2 to 10) can be used as a dopant p-core for laser action in the PCF. Adjustments to the air-hole distance (d) and lattice hole-hole spacing (Λ), for the zero dispersion region may be calculated and tuned for emissions within the NIR spectrum.
-
FIGS. 5 and 6 are diagrams illustrating an example of material dispersion Dm and waveguide/fiber dispersion Dw of silicate and germanate glass hosts using doped p fibers according to an embodiment of the present invention. - Referring to
FIG. 5 , the Dm (+) region exhibits anomalous dispersion, while the Dm (−) region exhibits normal dispersion. The dispersion for Dw in 1100 nm to 1600 nm for PCF can be changed using A=0.6 to 2 In the example according toFIGS. 5 and 6 , d=0.9 μm and Λ=1 -
FIG. 7 is a diagram illustrating another example of waveguide/fiber dispersion Dw of silicate and germanate glass hosts using doped p fibers according to an embodiment of the present invention, is shown. - Referring to
FIG. 7 , the waveguide/fiber dispersion Dw for a PCF, where d/Λ=0.7 to 0.9, and where Λ=1 μm. -
FIG. 8 is a diagram illustrating an example of waveguide/fiber dispersion Dw, material dispersion Dm, and overall dispersion DT of silicate and germanate glass hosts using doped p fibers according to an embodiment of the present invention. - Referring to
FIG. 8 , according to an embodiment of the present invention, a combination of both Dm and Dw dispersion is adjusted in order to compensate for the dispersion of the emission wavelength, in order for emitted light to travel across all wavelengths together in the core, with only minimum spreading of the wavelength that is amplified in a laser using the PCF. -
FIG. 9 is a diagram illustrating an example of dispersion of a silicate glass host using doped p fibers according to an embodiment of the present invention. - Referring to
FIG. 9 , a typical PCF dispersion is shown according to an embodiment of the present invention for p-laser operation using PCF with a silica glass host in a range of about 1100 nm to 1700 nm, with a typical dispersion DT of about 25 ps/km·nm. The dispersion properties DT for the PCF vary according to d and Λ. In the present example of a dispersion DT according toFIG. 9 , d/λ=0.4 and Λ=2 μm. - According to embodiments of the present invention, a glass host may include a 3p component (i.e., at least one 3p element) having a concentration of about 5 mole percent to about 10 mole percent, at least one of a 6p component having a concentration of about 1 mole percent to about 5 mole percent and a 5p component having a concentration of about 1 mole percent to about 5 mole percent. The glass host composition may be further doped with at least one 4p component having a concentration of about 1 mode percent to about 5 mole percent. However, these ranges are merely provided as examples, and other concentrations may be utilized according to embodiments of the present invention.
- Further, a glass host composition according to an embodiment of the present invention may be used in a medium 120 of a
laser apparatus 100 such as illustrated inFIG. 1 of the present application. Also, in an alternative embodiment of the present invention, Bragg reflection tips in fibers may be used in place of mirrors in the laser apparatus. The laser apparatus may further include a Fabry-Perot etalon (not shown) for tuning the laser to an emission wavelength band ranging from about 1000 nm to about 1600 nm. According to embodiments of the present invention, thepump 110 may perform collinear end pumping within a range from about 600 nm to about 1000 nm to achieve a laser action. Further, thepump 110 may include at least one of Ti, YAG, and diode lasers for pumping the at least one fiber from an end of the at least one fiber or for transverse pumping the at least one fiber through use of an outside fiber. A fiber used for transverse pumping may be a fiber/coating surrounding a p fiber, such that the fiber to transverse pumping has a low-refractive-index relative to the p fiber. However, the present invention is not limited to only this type of laser apparatus, and other laser apparatuses may be used in accordance with other embodiments of the present invention. - While the preferred embodiment of the present invention has been illustrated and described in detail, various modifications of, for example, components, materials and parameters, will become apparent to those skilled in the art, and all such modifications and changes are intended to fall within the scope of the claims of the present invention.
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US3503763A (en) * | 1966-12-06 | 1970-03-31 | Anchor Hocking Glass Corp | Creptallizable lead borosilicate compositions for use as low thermal expansion,devitrifying solder glasses or coatings |
US5211733A (en) * | 1990-11-16 | 1993-05-18 | Mitsubishi Kasei Corporation | Method for producing a high-purity silica glass powder |
US20030128428A1 (en) * | 2001-10-24 | 2003-07-10 | 3M Innovative Properties Company | Glass beads and uses thereof |
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US4371965A (en) * | 1978-08-07 | 1983-02-01 | Gte Laboratories Incorporated | High neodymium content aluminophosphate glass and laser |
JP2005221755A (en) * | 2004-02-05 | 2005-08-18 | Fujikura Ltd | Structure and method of connecting optical fiber |
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US3503763A (en) * | 1966-12-06 | 1970-03-31 | Anchor Hocking Glass Corp | Creptallizable lead borosilicate compositions for use as low thermal expansion,devitrifying solder glasses or coatings |
US5211733A (en) * | 1990-11-16 | 1993-05-18 | Mitsubishi Kasei Corporation | Method for producing a high-purity silica glass powder |
US20030128428A1 (en) * | 2001-10-24 | 2003-07-10 | 3M Innovative Properties Company | Glass beads and uses thereof |
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