US20090285987A1 - Perfluoroparacyclophane and related methods therefor - Google Patents
Perfluoroparacyclophane and related methods therefor Download PDFInfo
- Publication number
- US20090285987A1 US20090285987A1 US12/510,038 US51003809A US2009285987A1 US 20090285987 A1 US20090285987 A1 US 20090285987A1 US 51003809 A US51003809 A US 51003809A US 2009285987 A1 US2009285987 A1 US 2009285987A1
- Authority
- US
- United States
- Prior art keywords
- compounds
- paracyclophane
- canceled
- reaction
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims description 26
- 239000000203 mixture Substances 0.000 claims abstract description 18
- 238000000576 coating method Methods 0.000 claims abstract description 5
- 239000011248 coating agent Substances 0.000 claims abstract 4
- 150000001875 compounds Chemical class 0.000 claims description 36
- 239000000178 monomer Substances 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 5
- WWZNHODBHBVRID-UHFFFAOYSA-N 1,2,4,5-tetrafluoro-3,6-bis(trifluoromethyl)benzene Chemical group FC1=C(F)C(C(F)(F)F)=C(F)C(F)=C1C(F)(F)F WWZNHODBHBVRID-UHFFFAOYSA-N 0.000 claims description 4
- 230000000379 polymerizing effect Effects 0.000 claims 4
- OOLUVSIJOMLOCB-UHFFFAOYSA-N 1633-22-3 Chemical class C1CC(C=C2)=CC=C2CCC2=CC=C1C=C2 OOLUVSIJOMLOCB-UHFFFAOYSA-N 0.000 abstract description 27
- 239000002904 solvent Substances 0.000 abstract description 17
- 238000003786 synthesis reaction Methods 0.000 abstract description 8
- 229910052751 metal Inorganic materials 0.000 abstract description 4
- 239000002184 metal Substances 0.000 abstract description 4
- 239000003054 catalyst Substances 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 27
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 21
- 239000000047 product Substances 0.000 description 21
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 13
- 239000006227 byproduct Substances 0.000 description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 11
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 11
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 10
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 239000002243 precursor Substances 0.000 description 9
- 229910052725 zinc Inorganic materials 0.000 description 9
- 239000011701 zinc Substances 0.000 description 9
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 238000004293 19F NMR spectroscopy Methods 0.000 description 7
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 6
- 239000000539 dimer Substances 0.000 description 6
- 238000006722 reduction reaction Methods 0.000 description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 6
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
- 239000003638 chemical reducing agent Substances 0.000 description 5
- 239000012043 crude product Substances 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical group 0.000 description 5
- 229920000052 poly(p-xylylene) Polymers 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 229910003074 TiCl4 Inorganic materials 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- CSJLBAMHHLJAAS-UHFFFAOYSA-N diethylaminosulfur trifluoride Chemical compound CCN(CC)S(F)(F)F CSJLBAMHHLJAAS-UHFFFAOYSA-N 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 4
- 0 *c1c(*)c(C(C)(F)F)c(*)c(*)c1C(C)(F)F Chemical compound *c1c(*)c(C(C)(F)F)c(*)c(*)c1C(C)(F)F 0.000 description 3
- DTVAMBZXZSKQGJ-UHFFFAOYSA-N 1,4-bis[chloro(difluoro)methyl]-2,3,5,6-tetrafluorobenzene Chemical compound FC1=C(F)C(C(F)(F)Cl)=C(F)C(F)=C1C(F)(F)Cl DTVAMBZXZSKQGJ-UHFFFAOYSA-N 0.000 description 3
- PCRSJGWFEMHHEW-UHFFFAOYSA-N 2,3,5,6-tetrafluorobenzene-1,4-dicarbonitrile Chemical compound FC1=C(F)C(C#N)=C(F)C(F)=C1C#N PCRSJGWFEMHHEW-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- WHWJYNPTTQJZKJ-UHFFFAOYSA-N F.F.FC(F)(Cl)C1=CC=C(C(F)(F)Cl)C=C1.FC(F)C1=CC=C(C(F)F)C=C1 Chemical compound F.F.FC(F)(Cl)C1=CC=C(C(F)(F)Cl)C=C1.FC(F)C1=CC=C(C(F)F)C=C1 WHWJYNPTTQJZKJ-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- -1 but not limited to Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000003682 fluorination reaction Methods 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000008707 rearrangement Effects 0.000 description 2
- 238000002390 rotary evaporation Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- IAHFWCOBPZCAEA-UHFFFAOYSA-N succinonitrile Chemical compound N#CCCC#N IAHFWCOBPZCAEA-UHFFFAOYSA-N 0.000 description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- SOZFIIXUNAKEJP-UHFFFAOYSA-N 1,2,3,4-tetrafluorobenzene Chemical compound FC1=CC=C(F)C(F)=C1F SOZFIIXUNAKEJP-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- JEFRGFPUPOXFSC-UHFFFAOYSA-N 1-(dichloromethyl)-2,3,5,6-tetrafluoro-4-methylbenzene Chemical group CC1=C(F)C(F)=C(C(Cl)Cl)C(F)=C1F JEFRGFPUPOXFSC-UHFFFAOYSA-N 0.000 description 1
- GLTGXIGJLCSEAM-UHFFFAOYSA-N 2,3,4,5-tetrafluorobenzonitrile Chemical compound FC1=CC(C#N)=C(F)C(F)=C1F GLTGXIGJLCSEAM-UHFFFAOYSA-N 0.000 description 1
- TXRVDQMSXQKAPG-UHFFFAOYSA-N 2,3,5,6-tetrachlorobenzene-1,4-dicarbonitrile Chemical compound ClC1=C(Cl)C(C#N)=C(Cl)C(Cl)=C1C#N TXRVDQMSXQKAPG-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- GVVURPJCGNRYIX-UHFFFAOYSA-N CC(F)(F)c1c(F)c(F)c(C(C)(F)F)c(F)c1F Chemical compound CC(F)(F)c1c(F)c(F)c(C(C)(F)F)c(F)c1F GVVURPJCGNRYIX-UHFFFAOYSA-N 0.000 description 1
- BXYVWOCCCLQVRB-UHFFFAOYSA-N CC1=C(F)C(=C(F)F)=C(F)C(F)=C1=C(F)F Chemical compound CC1=C(F)C(=C(F)F)=C(F)C(F)=C1=C(F)F BXYVWOCCCLQVRB-UHFFFAOYSA-N 0.000 description 1
- MNZOWXUZVACXIU-UHFFFAOYSA-N CCl(Cl)ClCl.CF.CF.F.FC(F)(Cl)C1=CC=C(C(F)(F)Cl)C=C1.FFF.FFF.N#CC1=CC=C(C#N)C=C1.N#CC1=CC=C(C#N)C=C1.O=CC1=CC=C(C=O)C=C1 Chemical compound CCl(Cl)ClCl.CF.CF.F.FC(F)(Cl)C1=CC=C(C(F)(F)Cl)C=C1.FFF.FFF.N#CC1=CC=C(C#N)C=C1.N#CC1=CC=C(C#N)C=C1.O=CC1=CC=C(C=O)C=C1 MNZOWXUZVACXIU-UHFFFAOYSA-N 0.000 description 1
- HJNPXTMFHGSDCR-UHFFFAOYSA-N CCl(Cl)ClCl.CF.FFF.N#CC1=CC=C(C#N)C=C1.N#CC1=CC=C(C#N)C=C1 Chemical compound CCl(Cl)ClCl.CF.FFF.N#CC1=CC=C(C#N)C=C1.N#CC1=CC=C(C#N)C=C1 HJNPXTMFHGSDCR-UHFFFAOYSA-N 0.000 description 1
- WDGRLJKHQTZSLB-UHFFFAOYSA-N CF.CF.FC(F)C1=CC=C(C(F)F)C=C1.FFF.FFF.O=CC1=CC=C(C=O)C=C1 Chemical compound CF.CF.FC(F)C1=CC=C(C(F)F)C=C1.FFF.FFF.O=CC1=CC=C(C=O)C=C1 WDGRLJKHQTZSLB-UHFFFAOYSA-N 0.000 description 1
- QDIFODZKCFJUGA-UHFFFAOYSA-N CF.CF.FFF.FFF.N#CC1=CC=C(C#N)C=C1.O=CC1=CC=C(C=O)C=C1 Chemical compound CF.CF.FFF.FFF.N#CC1=CC=C(C#N)C=C1.O=CC1=CC=C(C=O)C=C1 QDIFODZKCFJUGA-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- BEQXKVAJLJVXGU-UHFFFAOYSA-N F.F.FC(F)(Cl)C1=CC=C(C(F)(F)Cl)C=C1.FC(F)=C1=CC=C(=C(F)F)C=C1 Chemical compound F.F.FC(F)(Cl)C1=CC=C(C(F)(F)Cl)C=C1.FC(F)=C1=CC=C(=C(F)F)C=C1 BEQXKVAJLJVXGU-UHFFFAOYSA-N 0.000 description 1
- ZQKSOFBTYRTKGR-UHFFFAOYSA-N FC1=C(F)C(C(F)(F)Cl)=C(F)C(F)=C1C(F)(F)Cl.FC1=C(F)C2=C(F)C(F)=C1C(F)(F)CC(F)(F)C1=C(F)C(F)=C(C(F)=C1F)C(F)(F)C2(F)F.[Zn] Chemical compound FC1=C(F)C(C(F)(F)Cl)=C(F)C(F)=C1C(F)(F)Cl.FC1=C(F)C2=C(F)C(F)=C1C(F)(F)CC(F)(F)C1=C(F)C(F)=C(C(F)=C1F)C(F)(F)C2(F)F.[Zn] ZQKSOFBTYRTKGR-UHFFFAOYSA-N 0.000 description 1
- CJVHQXGCMBFLMB-JXGYXAOLSA-N FC1=C(F)C2=C(F)C(F)=C1/C(F)=C(/F)C1=C(F)C(F)=C(C(F)=C1F)C(F)(F)C2(F)F.[H]C1(F)C2=C(F)C(F)=C(C(F)=C2F)C(F)(F)C(F)(F)C2=C(F)C(F)=C(C(F)=C2F)C1(F)F Chemical compound FC1=C(F)C2=C(F)C(F)=C1/C(F)=C(/F)C1=C(F)C(F)=C(C(F)=C1F)C(F)(F)C2(F)F.[H]C1(F)C2=C(F)C(F)=C(C(F)=C2F)C(F)(F)C(F)(F)C2=C(F)C(F)=C(C(F)=C2F)C1(F)F CJVHQXGCMBFLMB-JXGYXAOLSA-N 0.000 description 1
- DCSUBUNRCJSFAX-UHFFFAOYSA-N Fc1c(F)c(C(F)(F)Cl)c(F)c(F)c1C(F)(F)Cl.Fc1c(F)c2c(F)c(F)c1C(F)(F)C(F)(F)c1c(F)c(F)c(c(F)c1F)C(F)(F)C2(F)F Chemical compound Fc1c(F)c(C(F)(F)Cl)c(F)c(F)c1C(F)(F)Cl.Fc1c(F)c2c(F)c(F)c1C(F)(F)C(F)(F)c1c(F)c(F)c(c(F)c1F)C(F)(F)C2(F)F DCSUBUNRCJSFAX-UHFFFAOYSA-N 0.000 description 1
- 230000005526 G1 to G0 transition Effects 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- KUCOHFSKRZZVRO-UHFFFAOYSA-N O=Cc1ccc(C=O)cc1 Chemical compound O=Cc1ccc(C=O)cc1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 description 1
- 229910007565 Zn—Cu Inorganic materials 0.000 description 1
- MSACAYZBWODLBW-UHFFFAOYSA-N [H]C1(F)C2=C(C)C(F)=C(C(F)=C2F)C(F)(F)C(F)(F)C2=C(F)C(F)=C(C(F)=C2F)C1(F)F Chemical compound [H]C1(F)C2=C(C)C(F)=C(C(F)=C2F)C(F)(F)C(F)(F)C2=C(F)C(F)=C(C(F)=C2F)C1(F)F MSACAYZBWODLBW-UHFFFAOYSA-N 0.000 description 1
- KSLVMUFJBXQYJA-UHFFFAOYSA-N [H]C1(F)C2=C(F)C(F)=C(C(F)=C2F)C(F)(F)C(F)(F)C2=C(F)C(F)=C(C(F)=C2F)C1(F)F Chemical compound [H]C1(F)C2=C(F)C(F)=C(C(F)=C2F)C(F)(F)C(F)(F)C2=C(F)C(F)=C(C(F)=C2F)C1(F)F KSLVMUFJBXQYJA-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000370 acceptor Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- CDHICTNQMQYRSM-UHFFFAOYSA-N di(propan-2-yl)alumane Chemical compound CC(C)[AlH]C(C)C CDHICTNQMQYRSM-UHFFFAOYSA-N 0.000 description 1
- JDZLOJYSBBLXQD-UHFFFAOYSA-N difluoromethylbenzene Chemical compound FC(F)C1=CC=CC=C1 JDZLOJYSBBLXQD-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000006471 dimerization reaction Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002451 electron ionisation mass spectrometry Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000012025 fluorinating agent Substances 0.000 description 1
- 230000002140 halogenating effect Effects 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- LWJROJCJINYWOX-UHFFFAOYSA-L mercury dichloride Chemical compound Cl[Hg]Cl LWJROJCJINYWOX-UHFFFAOYSA-L 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 238000007149 pericyclic reaction Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- XQZYPMVTSDWCCE-UHFFFAOYSA-N phthalonitrile Chemical class N#CC1=CC=CC=C1C#N XQZYPMVTSDWCCE-UHFFFAOYSA-N 0.000 description 1
- 239000003880 polar aprotic solvent Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000006462 rearrangement reaction Methods 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- MZUUBYSIDDKUKE-UHFFFAOYSA-N tributyltin;trimethylsilicon Chemical compound C[Si](C)C.CCCC[Sn](CCCC)CCCC MZUUBYSIDDKUKE-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/26—Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton
- C07C17/263—Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by condensation reactions
- C07C17/269—Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by condensation reactions of only halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/38—Separation; Purification; Stabilisation; Use of additives
- C07C17/392—Separation; Purification; Stabilisation; Use of additives by crystallisation; Purification or separation of the crystals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
- C07C25/18—Polycyclic aromatic halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F114/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F114/18—Monomers containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F14/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F14/18—Monomers containing fluorine
Definitions
- This invention relates to paracyclophane compounds, preparation of paracyclophane compounds, and articles comprising polymerized paracyclophane compounds, and more particularly to perfluormated paracyclophane, synthesis of perfluorinated paracyclophane, as well as articles comprising polymerized perfluorinated paracyclophane.
- polymeric fluorinated parylene, poly-para-xylylene, materials have also been disclosed.
- Taylor et al. in U.S. Pat. No. 5,888,905, a two-step formation of fluorinated parylene by deposition of a parylene film followed by direct fluorination of the film.
- one or more embodiments thereof involve a composition comprising perfluoro-[2,2]-paracyclophane.
- one or more embodiments thereof are directed to a method of preparing a paracyclophane comprising exposing a reaction mixture of a difluoromethyl benzene and at least one metal to conditions that promote formation of a reaction product comprising a perfluoroparacyclophane.
- n is at least 2 and R is a halogen.
- the invention relates to paracyclophane compounds. Some aspects of the invention relate to the preparation of polymeric materials formed from one or more paracyclophane compounds. Still further aspects of the invention relate to articles having parylene polymer on a surface thereof formed from one or more paracyclophane compounds as well as techniques of preparation thereof.
- some compounds and/or polymeric materials relevant to some aspects of the invention pertain to halogenated paracyclophane compounds.
- the novel compounds, techniques, and materials, including but not limited to polymeric materials, and/or systems of the invention can have one or more halogen-containing moieties.
- the halogenated paracyclophane compounds of the invention can be perfluorinated paracyclophane compounds. Aspects of the invention can involve systems and techniques pertinent to synthesizing perfluorinated paracyclophane compounds.
- the halogenated paracyclophane compounds of the invention can be fluorinated compounds represented by the formula (I).
- R is a halogen.
- at least one of the moieties that are pendant on the aromatic ring may be fluorine.
- some of the fluorinated paracyclophane compounds of the invention are fluorine saturated.
- the perfluorinated paracyclophane of some aspects of the invention include perfluoro-[2,2]-paracyclophane.
- the one or more halogenated precursor compounds can be any suitable compound that includes an aromatic ring having at least one pendant halogen-containing or halogenated moiety.
- the one or more precursor compounds can comprise at least one pendant chlorodihalo-containing moiety such as but not limited to a chlorodifluoroalkyl moiety.
- the chlorinated precursor compounds of the invention can be an at least partially fluorinated benzene ring having one or more chlorohaloalkyl moieties pendant thereon.
- Non-limiting examples of the fluorinated or chlorinated precursor compounds of the invention include, but are not limited to, chlorodihaloalkyl fluorinated benzenes, which includes 1,4-bis(chlorodifluoromethyl)-2,3,5,6-tetrafluorobenzene, also referred to as PFPX-dichloride and represented by the formula (II):
- aromatic chlorohaloalkyl compounds may be utilized to prepare the various paracyclophanes of the invention.
- the systems and techniques involved in facilitating the synthesis of paracyclophane compounds from halogenated precursor compounds can comprise components, subsystems, or acts that link the ring or aromatic component of the precursor compounds.
- One or more reduction, rearrangement, substitution, and/or condensation reactions may also be utilized in the schemes of the invention.
- other reaction schemes may include, for example, pericyclic and redox reactions.
- One or more of the fluorinated paracyclophane compounds of the invention may be a reaction product of one or more chlorodihaloalkyl compounds.
- the synthesis of a fluorinated compound of the invention can involve a reduction, rearrangement, substitution, or condensation reaction of the compound (II).
- Any of the reactions of the invention may be catalyzed by one or more compounds which can include one or more salts, metals, organometallic compounds or other complexes such as ligates and chelates, acids, bases, or electron donors or acceptors.
- one or more of the reactions of the invention may utilize one or more reducing agents that facilitate reduction of, for example, one or more chlorohalomethylated compound to produce a perfluorinated dimer.
- any of the reactions of the invention may be facilitated in the presence of one or more solvents or carriers.
- the solvent, or mixture is typically an organic solvent, comprising inert compounds that typically do not react with the reactant and the product.
- the one or more solvents utilized in some aspects of the invention can be aprotic, polar, non-polar, or a hybrid thereof.
- Non-limiting examples of non-polar solvents that may facilitate one or more reactions of the invention include hexane, benzene, toluene, and chloroform.
- Non-limiting examples of polar aprotic solvents that may facilitate one or more reactions of the invention include dioxane, tetrahydrofuran, acetone, acetonitrile, dimethyl sulfoxide, and dimethylformamide.
- Synthesis of the fluorinated paracyclophanes of the invention can comprise contacting or exposing chlorohalomethyl compounds to conditions that promote formation of a reaction product represented by, for instance, compound (I).
- perfluoro-[2,2]-paracyclophane can be prepared through a dimerization reaction of 1,4-bis(chlorodifluoromethyl)-2,3,5,6-tetrafluorobenzene according to the following reaction scheme.
- the reaction is typically facilitated by one or more reducing agents at an elevated temperature, typically in a range of about 110° C. to about 130° C., and preferably in a range of about 115° C. to about 120° C.
- the reaction can also be further facilitated by utilizing a solvent.
- Zinc may be used as a suitable reducing agent and acetonitrile may be used as a solvent to effect formation of the perfluorinated paracyclophane.
- the reaction is thus typically represented according to scheme (1) below.
- Chlorodihaloalkyl fluorinated compounds of the invention may be prepared by halogenating fluoroxylene compounds.
- a tetrafluoroxylene may be halogenated to yield chlorohaloalkyl compounds according to scheme (2) below.
- Scheme (2) can be performed under conditions that thermodynamically promote the formation of the dichloride compound (II).
- reaction scheme (2) can be facilitated by actinic radiation.
- Preferred non-limiting embodiments can also utilize one or more solvents such as, but not limited to, carbon tetrachloride, as a medium for one or more reactants.
- Tetrafluoroxylene compounds utilized in the above reaction scheme may be synthesized from any suitable precursor compounds.
- tetrachlorinated cyano compounds may be fluorinated in a substitution reaction to provide a cyano-tetrafluorobenzene intermediate product.
- the tetrafluorobenzene intermediate compound may then be reduced to provide tetrafluoroaldehyde which can then be further fluorinated by nucleophilic fluorination or fluorodeoxygenation.
- the compounds of the invention may thus be obtained through the synthetic methodology illustrated in scheme (3) below. Other synthetic schemes may be utilized to prepare the various compounds above.
- gaseous dicyanobenzene compounds may be converted by activated carbon catalysts at a temperature range of about 280° C. to about 320° C.
- halogen-metal exchange schemes may be appropriate to produce the aldehyde compounds.
- Deposition techniques conventionally utilized with respect to, for example, non-halogenated paracyclophanes, can be utilized to apply one or more layers of the perfluorinated dimer compounds represented by formula (I). Polymerization of the dimer compounds may then provide a perfluorinated polymer.
- vapor deposition techniques may be utilized to deposit and polymerize a paracyclophane comprising a perfluorinated dimer such as perfluoro-[2,2]-paracyclophane to produce at least one perfluorinated paraxylylene layer on at least a portion of a surface.
- Other deposition and polymerization techniques may be utilized with the perfluoro-[2,2]-paracyclophane compounds.
- solvent carrier-based procedures may be utilized to apply a polymerizable layer comprising the perfluorinated dimer compound on the surface. Thereafter, polymerization of the deposited compound comprising perfluorinated paracyclophane may be initiated to produce a perfluorinated paraxylylene layer on the surface. Deposition and polymerization may be performed substantially simultaneously or in substantially the same step. For example, vapor polymerization to produce the perfluorinated paraxylylene may be performed with vaporized perfluoroparacyclophane dimer compound (I).
- the paraxylylene polymeric material can be applied on any desired surface or portion of a surface.
- the precursor perfluorinated paracyclophane compounds of the invention may be utilized to render any desired surface inert.
- the paraxylylene polymeric material may be applied on at least a portion of an electronic component such as a semiconductor.
- Other surfaces include those exposed to or subject chemical and/or biological environments that would damage or otherwise alter the surface properties.
- Non-limiting examples include components or articles having at least a portion thereof exposed to elevated temperatures, solvents, and/or other corrosive environments.
- the applied perfluorinated layer may have any desired thickness that provides a desired characteristic. Indeed, the layer may be applied uniformly or at various thickness, alone or with other coatings. The layer can be applied to form a pattern on the surface.
- the mixture was stirred at a temperature of about 110° C. for about ten hours. Nitrogen gas was used to blanket the mixture.
- the reaction mixture was poured into a beaker containing about 500 mL ice-water.
- the cooled mixture was then to collect the precipitate, which was washed by water and recrystallized with acetone.
- the recrystallized product 1,4-dicyano-2,3,5,6-tetrafluorobenzene, was dried and measured to weigh about 5.4 g (about 90%).
- the aqueous layer was then extracted several times with CH 2 Cl 2 .
- the organic layer was combined and dried by evaporation.
- the mixture was cooled to about 0° C. under a N 2 atmosphere.
- DAST diethyl aminosulfur trifluoride
- the mixture was brought to room temperature for about six hours and then poured into about 100 mL of ice-water.
- the organic layer was washed with an about 5% sodium hydroxide solution.
- the melting point of the product was about 70° C.
- Chlorine gas was bubbled through the mixture for about 56 hours at 60° C.
- a tungsten sunlamp was used to irradiate the mixture.
- the carbon tetrachloride carrier was carefully removed by rotary evaporation.
- the mixture was refluxed at about 115° C.) for about fourteen hours under nitrogen.
- the mixture was refluxed for another four hours to reach about 100% conversion.
- reaction mixture was hot filtered and washed several times with acetonitrile and acetone.
- the combined filtrate was dried by rotary evaporation.
- the crude mixture was flash chromatographed with hexane through silica gel as the stationary phase to yield about 0.4 g of crude product.
- the crude product was recrystallized with dichloromethane twice, and also with acetone to yield about 0.3 g (about 25%) of product with a purity of about 95%.
- the crude product was analyzed and determined to have a melting point in a range of about 195 to 196° C.; a 19 F NMR resonance in CDCl 3 of ⁇ ⁇ 102.81 (s, 4F), ⁇ 132.40 (s, 4F).
- the crude product was further analyzed by mass spectrometry to be 496 of C 16 F 16 , and 248 of C 8 F 8 .
- solvents that may be utilized instead of, or in combination with the solvents listed above include, but are not limited to, acetonitrile, anisole, 2-butanone, 1,4-dioxane, benzonitrile, succinonitrile, and acetic anhydride.
- Alternative reducing agents may be used including, for example, trimethylsilyltributyltin (TMSTBT, Me 3 SiSnBu 3 ).
- Table 1 shows the results utilizing various reducing agents and solvents in scheme (8).
- the monomer peak was observed at ⁇ 101.536 ppm. 4F peak was noted at ⁇ 146.377 ppm.
- NMP N-methylpyrrolidone
- the monomer was observed to be stable at room temperature in the NMR tube even after one week.
- the monomer was preserved or trapped by slow addition of bromine to form ⁇ , ⁇ ′-dibromo- ⁇ , ⁇ , ⁇ ′, ⁇ ′-tetrafluoro-2,3,5,6-tetrafluorooxylene, ⁇ 43.773 ppm, m, 4F; ⁇ 137.852 ppm, m, 4F and M/Z:M-Br, 327, M-2Br, 248.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Abstract
A composition comprising perfluoro-[2,2]-paracyclophane dimer compound is disclosed. The synthesis reaction of the paracyclophane dimer from 1,4-bis(chlorodifluoromethane)-2,3,5,6-tetrafluorobenzene involves heating in the presence of a metal catalyst and a solvent. A perfluorinated paraxylylene coating formed from the perfluorinated paracyclophane dimer is also disclosed.
Description
- 1. Field of the Invention
- This invention relates to paracyclophane compounds, preparation of paracyclophane compounds, and articles comprising polymerized paracyclophane compounds, and more particularly to perfluormated paracyclophane, synthesis of perfluorinated paracyclophane, as well as articles comprising polymerized perfluorinated paracyclophane.
- 2. Description of Related Art
- Synthesis techniques for preparing fluorinated paracyclophane dimers have been disclosed. For example, Dolbier, Jr. et al., in U.S. Pat. No. 5,841,005, described low dilution techniques for preparing octafluoro-[2,2]-paracyclophane.
- Further, polymeric fluorinated parylene, poly-para-xylylene, materials have also been disclosed. For example, Taylor et al., in U.S. Pat. No. 5,888,905, a two-step formation of fluorinated parylene by deposition of a parylene film followed by direct fluorination of the film.
- In accordance with one or more aspects of the invention, one or more embodiments thereof involve a composition comprising perfluoro-[2,2]-paracyclophane.
- In accordance with still further aspects of the invention, one or more embodiments thereof are directed to a method of preparing a paracyclophane comprising exposing a reaction mixture of a difluoromethyl benzene and at least one metal to conditions that promote formation of a reaction product comprising a perfluoroparacyclophane.
- Further embodiments pertinent to other aspects of the invention are directed to a polymer having a formula:
- wherein n is at least 2 and R is a halogen.
- The invention relates to paracyclophane compounds. Some aspects of the invention relate to the preparation of polymeric materials formed from one or more paracyclophane compounds. Still further aspects of the invention relate to articles having parylene polymer on a surface thereof formed from one or more paracyclophane compounds as well as techniques of preparation thereof.
- In accordance with one or more embodiments, some compounds and/or polymeric materials relevant to some aspects of the invention pertain to halogenated paracyclophane compounds. For example, the novel compounds, techniques, and materials, including but not limited to polymeric materials, and/or systems of the invention can have one or more halogen-containing moieties. In accordance with some aspects of the invention, the halogenated paracyclophane compounds of the invention can be perfluorinated paracyclophane compounds. Aspects of the invention can involve systems and techniques pertinent to synthesizing perfluorinated paracyclophane compounds.
- In accordance with still further embodiments of the invention, the halogenated paracyclophane compounds of the invention can be fluorinated compounds represented by the formula (I).
- wherein R is a halogen. In some cases, at least one of the moieties that are pendant on the aromatic ring may be fluorine. Indeed, in some cases, some of the fluorinated paracyclophane compounds of the invention are fluorine saturated. In embodiments where the halogen is fluorine, the perfluorinated paracyclophane of some aspects of the invention include perfluoro-[2,2]-paracyclophane.
- Some of the aspects pertinent to synthesizing the paracyclophane compounds of the invention can involve providing one or more halogenated precursor compounds. The one or more halogenated precursor compounds can be any suitable compound that includes an aromatic ring having at least one pendant halogen-containing or halogenated moiety. In some cases, the one or more precursor compounds can comprise at least one pendant chlorodihalo-containing moiety such as but not limited to a chlorodifluoroalkyl moiety. Further, the chlorinated precursor compounds of the invention can be an at least partially fluorinated benzene ring having one or more chlorohaloalkyl moieties pendant thereon. Non-limiting examples of the fluorinated or chlorinated precursor compounds of the invention include, but are not limited to, chlorodihaloalkyl fluorinated benzenes, which includes 1,4-bis(chlorodifluoromethyl)-2,3,5,6-tetrafluorobenzene, also referred to as PFPX-dichloride and represented by the formula (II):
- However, the invention is not limited to systems and techniques involving PFPX-dichloride. Other suitable aromatic chlorohaloalkyl compounds may be utilized to prepare the various paracyclophanes of the invention. For example, aromatic compounds having other alkyl-based pendant moieties that provide bridges linking the aromatic rings and facilitate the formation of the fluorinated compounds (I).
- The systems and techniques involved in facilitating the synthesis of paracyclophane compounds from halogenated precursor compounds can comprise components, subsystems, or acts that link the ring or aromatic component of the precursor compounds. One or more reduction, rearrangement, substitution, and/or condensation reactions may also be utilized in the schemes of the invention. For example, other reaction schemes may include, for example, pericyclic and redox reactions.
- One or more of the fluorinated paracyclophane compounds of the invention may be a reaction product of one or more chlorodihaloalkyl compounds. For example, the synthesis of a fluorinated compound of the invention can involve a reduction, rearrangement, substitution, or condensation reaction of the compound (II).
- Any of the reactions of the invention may be catalyzed by one or more compounds which can include one or more salts, metals, organometallic compounds or other complexes such as ligates and chelates, acids, bases, or electron donors or acceptors.
- In some cases, one or more of the reactions of the invention may utilize one or more reducing agents that facilitate reduction of, for example, one or more chlorohalomethylated compound to produce a perfluorinated dimer.
- Further, any of the reactions of the invention may be facilitated in the presence of one or more solvents or carriers. The solvent, or mixture, is typically an organic solvent, comprising inert compounds that typically do not react with the reactant and the product. The one or more solvents utilized in some aspects of the invention can be aprotic, polar, non-polar, or a hybrid thereof. Non-limiting examples of non-polar solvents that may facilitate one or more reactions of the invention include hexane, benzene, toluene, and chloroform. Non-limiting examples of polar aprotic solvents that may facilitate one or more reactions of the invention include dioxane, tetrahydrofuran, acetone, acetonitrile, dimethyl sulfoxide, and dimethylformamide.
- Synthesis of the fluorinated paracyclophanes of the invention can comprise contacting or exposing chlorohalomethyl compounds to conditions that promote formation of a reaction product represented by, for instance, compound (I).
- For example, perfluoro-[2,2]-paracyclophane can be prepared through a dimerization reaction of 1,4-bis(chlorodifluoromethyl)-2,3,5,6-tetrafluorobenzene according to the following reaction scheme. The reaction is typically facilitated by one or more reducing agents at an elevated temperature, typically in a range of about 110° C. to about 130° C., and preferably in a range of about 115° C. to about 120° C. The reaction can also be further facilitated by utilizing a solvent. Zinc may be used as a suitable reducing agent and acetonitrile may be used as a solvent to effect formation of the perfluorinated paracyclophane. The reaction is thus typically represented according to scheme (1) below.
- Chlorodihaloalkyl fluorinated compounds of the invention may be prepared by halogenating fluoroxylene compounds. For example, a tetrafluoroxylene may be halogenated to yield chlorohaloalkyl compounds according to scheme (2) below.
- Scheme (2) can be performed under conditions that thermodynamically promote the formation of the dichloride compound (II). For example, reaction scheme (2) can be facilitated by actinic radiation. Preferred non-limiting embodiments can also utilize one or more solvents such as, but not limited to, carbon tetrachloride, as a medium for one or more reactants.
- Tetrafluoroxylene compounds utilized in the above reaction scheme may be synthesized from any suitable precursor compounds. For example, tetrachlorinated cyano compounds may be fluorinated in a substitution reaction to provide a cyano-tetrafluorobenzene intermediate product. The tetrafluorobenzene intermediate compound may then be reduced to provide tetrafluoroaldehyde which can then be further fluorinated by nucleophilic fluorination or fluorodeoxygenation. The compounds of the invention may thus be obtained through the synthetic methodology illustrated in scheme (3) below. Other synthetic schemes may be utilized to prepare the various compounds above. For example, gaseous dicyanobenzene compounds may be converted by activated carbon catalysts at a temperature range of about 280° C. to about 320° C. In some cases, halogen-metal exchange schemes may be appropriate to produce the aldehyde compounds.
- Deposition techniques conventionally utilized with respect to, for example, non-halogenated paracyclophanes, can be utilized to apply one or more layers of the perfluorinated dimer compounds represented by formula (I). Polymerization of the dimer compounds may then provide a perfluorinated polymer. For example, vapor deposition techniques may be utilized to deposit and polymerize a paracyclophane comprising a perfluorinated dimer such as perfluoro-[2,2]-paracyclophane to produce at least one perfluorinated paraxylylene layer on at least a portion of a surface. Other deposition and polymerization techniques may be utilized with the perfluoro-[2,2]-paracyclophane compounds. For example, solvent carrier-based procedures may be utilized to apply a polymerizable layer comprising the perfluorinated dimer compound on the surface. Thereafter, polymerization of the deposited compound comprising perfluorinated paracyclophane may be initiated to produce a perfluorinated paraxylylene layer on the surface. Deposition and polymerization may be performed substantially simultaneously or in substantially the same step. For example, vapor polymerization to produce the perfluorinated paraxylylene may be performed with vaporized perfluoroparacyclophane dimer compound (I).
- The paraxylylene polymeric material can be applied on any desired surface or portion of a surface. Thus, the precursor perfluorinated paracyclophane compounds of the invention may be utilized to render any desired surface inert. For example, the paraxylylene polymeric material may be applied on at least a portion of an electronic component such as a semiconductor. Other surfaces include those exposed to or subject chemical and/or biological environments that would damage or otherwise alter the surface properties. Non-limiting examples include components or articles having at least a portion thereof exposed to elevated temperatures, solvents, and/or other corrosive environments. Further, the applied perfluorinated layer may have any desired thickness that provides a desired characteristic. Indeed, the layer may be applied uniformly or at various thickness, alone or with other coatings. The layer can be applied to form a pattern on the surface.
- Although various embodiments exemplarily shown have been described, it should be appreciated that the invention is not so limited. This invention is thus not limited in its application to the details of construction and the arrangement of components set forth in the description or illustrated in the drawings.
- The function and advantages of these and other embodiments of the invention can be further understood from the examples below, which illustrate the benefits and/or advantages of the one or more systems and techniques of the invention but do not exemplify the full scope of the invention.
- About 8 g (about 0.03 mol) of 1,4-dicyano-2,3,5,6-tetrachlorobenzene and about 8 g (about 0.137 mol) of KF were transferred into a flask containing about 60 mL of dry dimethyl formamide (DMF).
- The mixture was stirred at a temperature of about 110° C. for about ten hours. Nitrogen gas was used to blanket the mixture.
- The reaction mixture was poured into a beaker containing about 500 mL ice-water.
- The cooled mixture was then to collect the precipitate, which was washed by water and recrystallized with acetone.
- The recrystallized product, 1,4-dicyano-2,3,5,6-tetrafluorobenzene, was dried and measured to weigh about 5.4 g (about 90%).
- The 19F NMR resonance of this product in CDCl3 was δ −128.8 (singlet).
- The reaction scheme (4) is illustrated below.
- About 1.25 g (about 6.25 mmol) of the 1,4-dicyano-2,3,5,6-tetrafluorobenzene synthesized according to the procedure described in Example 1 was transferred into about 57.5 mL of N2 bubbled toluene, which was at about 0° C. About 17.5 ml (about 17.5 mmol) of 1 M DIBAL-H (diisopropylaluminumhydride) toluene solution was added. After the reaction mixture was stirred for about 2.5 hours at room temperature, the mixture was cooled to about 0° C.
- About 30 mL of about 2 N HCl was added until the pH of the mixture was less than about 2 units.
- The aqueous layer was then extracted several times with CH2Cl2.
- The organic layer was combined and dried by evaporation.
- The crude product was chromatographed with toluene as a carrier through silica gel and produced about 0.79 g of product (about 62%).
- The 1H NMR resonance of this product in CDCl3 was δ 10.36 and the 19F NMR resonance was δ −144.1 (singlet).
- The reaction scheme (5) is illustrated below.
- About 0.84 g (about 4.08 mmol) of tetrafluorophthalaldehyde prepared as described in Example 2 was added to about 20 mL of dry dichloromethane.
- The mixture was cooled to about 0° C. under a N2 atmosphere.
- About 1.6 mL (about 12.2 mmol) of a fluorinating agent, diethyl aminosulfur trifluoride (DAST), in about 5 mL of the dichloromethane was added drop by drop.
- After the addition, the mixture was brought to room temperature for about six hours and then poured into about 100 mL of ice-water.
- The organic layer was washed with an about 5% sodium hydroxide solution.
- The crude mixture was flash chromatographed with hexane providing an about 60% yield of α,α,α′,α′-tetrafluoro-2,3,5,6-tetrafluoroxylene.
- The 1H NMR resonance of the α,α,α′,α′-tetrafluoro-2,3,5,6-tetrafluoroxylene product in CDCl3 was δ 6.952 (t, 2H), and the 19F NMR resonance was δ −115.19 (4F, d, J=50 Hz), −115.282 (2F, d), −142.17 (s, 4F). The melting point of the product was about 70° C.
- The reaction scheme (6) is illustrated below.
- About 26 g (about 0.104 mol) of α,α,α′,α′-tetrafluoro-2,3,5,6-tetrafluoroxylene was dissolved in about 400 mL of carbon tetrachloride.
- Chlorine gas was bubbled through the mixture for about 56 hours at 60° C.
- A tungsten sunlamp was used to irradiate the mixture.
- The reaction was monitored by checking the 19F NMR resonance.
- The mixture was cooled and white precipitate was filtered.
- The carbon tetrachloride carrier was carefully removed by rotary evaporation.
- The residue was distilled under vacuum, at about 0.2 mm Hg and about 3° C., to yield α,α′-dichloro-α,α,α′,α′-tetrafluoro-2,3,5,6-tetrafluoroxylene product, which was found to have a 19F NMR resonance in CDCl3 of δ −47.61 (m, 4F), −137.88 (m, 4F). The product was further analyzed by GC-EI-MS to be C8F8Cl2, 319; C8F8Cl, 283, and C8F8, 248.
- The reaction scheme (7) is illustrated below.
- About 2 g (about 6.27 mmol) of α,α′-dichloro-α,α,α′,α′-tetrafluoro-2,3,5,6-tetrafluoroxylene was added to about 1.63 g (about 25 mmol) of zinc (about 99.7%) in about 20 mL of acetonitrile.
- The mixture was refluxed at about 115° C.) for about fourteen hours under nitrogen.
- Another about 0.27 g of zinc and about 5 mL of acetonitrile were added.
- The mixture was refluxed for another four hours to reach about 100% conversion.
- The reaction mixture was hot filtered and washed several times with acetonitrile and acetone.
- The combined filtrate was dried by rotary evaporation.
- The crude mixture was flash chromatographed with hexane through silica gel as the stationary phase to yield about 0.4 g of crude product.
- The crude product was recrystallized with dichloromethane twice, and also with acetone to yield about 0.3 g (about 25%) of product with a purity of about 95%.
- The crude product was analyzed and determined to have a melting point in a range of about 195 to 196° C.; a 19F NMR resonance in CDCl3 of δ −102.81 (s, 4F), −132.40 (s, 4F). The crude product was further analyzed by mass spectrometry to be 496 of C16F16, and 248 of C8F8.
- The insoluble residue was then treated with about 4M HCl until bubbling stopped. The AF8 product was then collected and extracted in a Soxhlet extractor with acetone as the solvent. GPC analysis showed that the solution contained some oligomers with a Mn of about 2,000.
- The overall reaction scheme (8) is illustrated below.
- In addition to the reaction product (II), zinc reduction of α,α′-dichloro-α,α,α′,α′-tetrafluoro-2,3,5,6-tetrafluoroxylene (PFPX-dichloride) in scheme (8) can result in the byproducts (III) and (IV).
- Other solvents that may be utilized instead of, or in combination with the solvents listed above include, but are not limited to, acetonitrile, anisole, 2-butanone, 1,4-dioxane, benzonitrile, succinonitrile, and acetic anhydride. Alternative reducing agents may be used including, for example, trimethylsilyltributyltin (TMSTBT, Me3SiSnBu3).
- Table 1 below shows the results utilizing various reducing agents and solvents in scheme (8).
-
TABLE 1 Solvent Reaction Conditions Observations anisole 170° C. about 5% AF8 product 20 hours about 90% SM byproduct 2-butanone 110° C. about 10% AF8 20 hours about 10% SM 80% impurities 1,4-dioxane 130° C. about 8% AF8 5 hours about 82% SM 1,4-dioxane 130° C. all byproduct 13 hours benzonitrile 110° C. AF8 product overnight sulpholane 100° C. no reaction 7 hours sulpholane 150° C. SM byproduct 15 hours TiCl4(5 mol %) 0° C. no reaction 1,4-dioxane 2 hours TiCl4(5 mol %) room temperature no reaction 1,4-dioxane 2 hours TiCl4(5 mol %) 130° C. no reaction 1,4-dioxane 2 hours TiCl4(5 mol %) 130° C. 100% byproduct 1,4-dioxane 20 hours succinonitrile 140° C. black, solidified 18 hours trace amount of SM byproduct TMSTBT, CsF 70° C. CF3 peak observed DMSO/THF (1:4) 48 hours SM byproduct Zn—Cu couple 130° C. trace AF8 product acetonitrile 20 hours DMA (8%)/AN 80° C. no reaction 1 hour DMA (8%)/AN 80° C. decomposed 18 hours NaI room temperature SM byproduct DME 18 hours NaI 80° C. SM byproduct DME 18 hours Diglycol dimethyl 160° C. no product 20 hours HgCl2 (5 mol %) 20 hours trace AF8 product then Ag(OTf)2/AN SM byproduct and impurities Ag(OAc) 140° C. no product toluene Ac2O 80° C. hydrolyzed reactants - In each of the following reduction reactions, about 5 mL of the indicated solvent was used.
- (a) About 1 g of α,α′-dichloro-α,α,α′,α′-tetrafluoro-2,3,5,6-tetrafluoroxylene was reduced 100% to perfluoro-paraxylene product by zinc (4 eq) at a temperature of about 100° C. in dimethylacetamide (DMA) and the product was further brominated overnight according to the reaction scheme (9) below.
- The monomer peak was observed at −101.536 ppm. 4F peak was noted at −146.377 ppm.
- (b) Dichloro-tetrafluoro-paraxlylene was 100% reduced to the monomer product by zinc in 1,3-dimethyl-2-imidazolidinone (DMI), instead of DMA, at a temperature of about 80° C. to about 90° C. for about thirty minutes as in scheme (9).
- A CF3 byproduct peak was noted at −57.5 ppm.
- (c) Dichloro-tetrafluoro-paraxylene was also reduced by zinc in hexamethlyphosphoramide (HMPA), instead of DMA, at a temperature of about 80° C. to about 90° C. for about thirty minutes, to the perfluoro-paraxlylene product as in scheme (9). Byproduct peaks were noted at −82.326 ppm, −85.677 ppm, and −141.781 ppm.
- (d) N-methylpyrrolidone (NMP) was used as a solvent instead of DMA in scheme (9) to facilitate zinc reduction of α,α′-dichloro-α,α,α′,α′-tetrafluoro-2,3,5,6-tetrafluoroxylene into perfluoro-paraxlylene monomer. The reaction was also performed at 80° C. for about thirty minutes.
- (e) α,α′-dichloro-α,α,α′,α′-tetrafluoro-2,3,5,6-tetrafluoroxylene was 100% reduced by zinc overnight at room temperature in dimethyl sulfoxide (DMSO) to a solvent stabilized perfluoro-paraxylene monomer, 19F NMR −101.54 ppm, 4F; −146.38 ppm, 4F, absorption maximum at 290 nm in DMSO solution.
- The monomer was observed to be stable at room temperature in the NMR tube even after one week.
- The monomer was preserved or trapped by slow addition of bromine to form α,α′-dibromo-α,α,α′,α′-tetrafluoro-2,3,5,6-tetrafluorooxylene, −43.773 ppm, m, 4F; −137.852 ppm, m, 4F and M/Z:M-Br, 327, M-2Br, 248.
- Having now described various embodiments of the invention, it should be apparent to those skilled in the art that the foregoing is merely illustrative and not limiting. Numerous modifications and other embodiments are within the scope of one of ordinary skill in the art and are contemplated as falling within the scope of the invention. Although many of the examples presented herein involve specific combinations of method acts or features, it should be understood that those acts and those features may be combined in other ways to accomplish the same objectives. However, acts, elements, and features discussed only in connection with one embodiment are not intended to be excluded from a similar role in other embodiments. Moreover, it should also be appreciated that the invention is directed to each feature, system, subsystem, or technique described herein and any combination of two or more features, systems, subsystems, or techniques described herein and any combination of two or more features, systems, subsystems, and/or methods, if such features, systems, subsystems, and techniques are not mutually inconsistent, is considered to be within the scope of the invention as embodied in the claims.
- Use of ordinal terms such as “first,” “second,” “third,” and the like in the claims to modify a claim element does not by itself connote any priority, precedence, or order of one claim element over another or the temporal order in which acts of a method are performed, but are used merely as labels to distinguish one claim element having a certain name from another element having a same name (but for use of the ordinal term) to distinguish the claim elements. As used herein, the term “plurality” refers to two or more items or components. The terms “comprising,” “including,” “carrying,” “having,” “containing,” and “involving,” whether in the written description or the claims and the like, are open-ended terms, i.e., to mean “including but not limited to.” Thus, the use of such terms is meant to encompass the items listed thereafter, and equivalents thereof, as well as additional items. Only the transitional phrases “consisting of” and “consisting essentially of,” are closed or semi-closed transitional phrases, respectively, with respect to the claims.
- Those skilled in the art should appreciate that the parameters and configurations described herein are exemplary and that actual parameters and/or configurations will depend on the specific application in which the systems and techniques of the invention are used. Those skilled in the art should also recognize or be able to ascertain, using no more than routine experimentation, equivalents to the specific embodiments of the invention. It is therefore to be understood that the embodiments described herein are presented by way of example only and that, within the scope of the appended claims and equivalents thereto; the invention may be practiced otherwise than as specifically described.
Claims (18)
2. (canceled)
3. (canceled)
4. (canceled)
5. (canceled)
6. (canceled)
7. (canceled)
8. (canceled)
9. (canceled)
10. (canceled)
11. (canceled)
12. (canceled)
13. (canceled)
15. The method of claim 14 , wherein the surface is a portion of an electronic component.
16. The method of claim 14 , wherein polymerizing the perfluoroparacylene comprises polymerizing the perfluoroparacyclophane on at least a portion of a surface to be exposed to a biological environment.
17. The method of claim 14 , wherein polymerizing the perfluoroparacyclophane comprises vapor depositing the perfluoroparacyclophane on the at least a portion of the surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/510,038 US20100260934A9 (en) | 2007-02-26 | 2009-07-27 | Perfluoroparacyclophane and related methods therefor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/710,881 US7652178B2 (en) | 2007-02-26 | 2007-02-26 | Perfluoroparacyclophane and methods of synthesis and use thereof |
US12/510,038 US20100260934A9 (en) | 2007-02-26 | 2009-07-27 | Perfluoroparacyclophane and related methods therefor |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/710,881 Division US7652178B2 (en) | 2007-02-26 | 2007-02-26 | Perfluoroparacyclophane and methods of synthesis and use thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
US20090285987A1 true US20090285987A1 (en) | 2009-11-19 |
US20100260934A9 US20100260934A9 (en) | 2010-10-14 |
Family
ID=39709475
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/710,881 Active US7652178B2 (en) | 2007-02-26 | 2007-02-26 | Perfluoroparacyclophane and methods of synthesis and use thereof |
US12/510,038 Abandoned US20100260934A9 (en) | 2007-02-26 | 2009-07-27 | Perfluoroparacyclophane and related methods therefor |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/710,881 Active US7652178B2 (en) | 2007-02-26 | 2007-02-26 | Perfluoroparacyclophane and methods of synthesis and use thereof |
Country Status (5)
Country | Link |
---|---|
US (2) | US7652178B2 (en) |
JP (1) | JP5631593B2 (en) |
DE (1) | DE112008000508T5 (en) |
GB (1) | GB2459413B (en) |
WO (1) | WO2008106286A2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI374128B (en) * | 2007-12-28 | 2012-10-11 | Chung Shan Inst Of Science | Method for producing 1,4-bis(bromodifluoromethyl)tetrafluorobenzene |
JP5411494B2 (en) * | 2008-12-26 | 2014-02-12 | ユアン シン マテリアルズ テクノロジー コーポレイション | Method for producing 1,4-bis (difluoromethyl) tetrafluorobenzene |
USD975534S1 (en) | 2021-10-21 | 2023-01-17 | Tina M. Pagan | Combined earring box with hinged sections |
Citations (79)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3246627A (en) * | 1962-10-05 | 1966-04-19 | Union Carbide Corp | Apparatus for vapor deposition |
US3268599A (en) * | 1963-09-23 | 1966-08-23 | Union Carbide Corp | Process for the preparation of cyclo |
US3274267A (en) * | 1963-09-23 | 1966-09-20 | Union Carbide Corp | Cyclic alpha-perfluoro-di-p-xylylenes |
US3280202A (en) * | 1964-07-09 | 1966-10-18 | Union Carbide Corp | Process for producing p-xylylene-containing compositions |
US3297591A (en) * | 1962-10-22 | 1967-01-10 | Union Carbide Corp | Process for the preparation of alpha-perfluoro-p-xylylene poluymers |
US3301707A (en) * | 1962-12-27 | 1967-01-31 | Union Carbide Corp | Thin film resistors and methods of making thereof |
US3342754A (en) * | 1966-02-18 | 1967-09-19 | Union Carbide Corp | Para-xylylene polymers |
US3405117A (en) * | 1964-12-24 | 1968-10-08 | Union Carbide Corp | alpha-chloro-di-p-xylylenes |
US3749601A (en) * | 1971-04-01 | 1973-07-31 | Hughes Aircraft Co | Encapsulated packaged electronic assembly |
US4176209A (en) * | 1978-01-09 | 1979-11-27 | Raytheon Corporation | Process for forming polymeric paraxylylene coatings and films possessing improved oxidation resistance |
US4429153A (en) * | 1979-12-21 | 1984-01-31 | Imperial Chemical Industries Plc | Halogenated esters |
US4734533A (en) * | 1985-12-19 | 1988-03-29 | Montedison S.P.A. | Process for the preparation of (2,2)-paracyclophane and derivatives thereof |
US4734503A (en) * | 1986-02-07 | 1988-03-29 | E. I. Du Pont De Nemours And Company | Catalytic transhalogenation of haloaromatics |
US4761269A (en) * | 1986-06-12 | 1988-08-02 | Crystal Specialties, Inc. | Apparatus for depositing material on a substrate |
US4783561A (en) * | 1985-10-30 | 1988-11-08 | Montedison S.P.A. | Process for the preparation of halogenated (2,2)-paracyclophanes and mixtures of resultant halogenated (2,2)-paracyclophanes |
US4795838A (en) * | 1986-06-27 | 1989-01-03 | Montedison S.P.A. | Process for the preparation of (2,2)-paracyclophane and derivatives thereof |
US4816608A (en) * | 1986-06-27 | 1989-03-28 | Montedison S.P.A. | Process for the preparation of (2,2)-paracyclophane and derivatives thereof |
US4846998A (en) * | 1985-03-22 | 1989-07-11 | Merck Patent Gesellschaft Mit Beschrankter Haftung | Cyclohexane derivatives |
US4853488A (en) * | 1987-04-10 | 1989-08-01 | Montedison S.P.A. | Process for the preparation of (2,2)-paracyclophane and derivatives thereof |
US4886923A (en) * | 1987-09-18 | 1989-12-12 | Montedison S.P.A. | Process for the preparation of tricyclo 8.2.2.2 hexadeca 4,6,10,12,13,15 hexaene chlorinated in the benzene rings |
US4924014A (en) * | 1988-03-02 | 1990-05-08 | Hoechst Aktiengesellschaft | Process for the preparation of halogen-containing aromatic compounds |
US5069972A (en) * | 1988-09-12 | 1991-12-03 | Versic Ronald J | Moldable microcapsule that contains a high percentage of solid core material, and method of manufacture thereof |
US5094906A (en) * | 1988-08-15 | 1992-03-10 | Exxon Research And Engineering Company | Ceramic microtubular materials and method of making same |
US5210341A (en) * | 1991-12-20 | 1993-05-11 | Union Carbide Chemicals & Plastics Technology Corporation | Processes for the preparation of octafluoro-[2,2]paracyclophane |
US5266349A (en) * | 1991-02-25 | 1993-11-30 | Specialty Coating Systems Inc. | Method of discrete conformal coating |
US5268202A (en) * | 1992-10-09 | 1993-12-07 | Rensselaer Polytechnic Institute | Vapor deposition of parylene-F using 1,4-bis (trifluoromethyl) benzene |
US5288504A (en) * | 1988-09-09 | 1994-02-22 | The Ronald T. Dodge Company | Pharmaceuticals microencapsulated by vapor deposited polymers and method |
US5302767A (en) * | 1993-03-26 | 1994-04-12 | Union Carbide Chemicals & Plastics Technology Corporation | [2.2] paracyclophane and derivatives thereof |
US5368645A (en) * | 1993-09-24 | 1994-11-29 | Specialty Coating Systems Inc. | Vacuum chuck for coating apparatus |
US5424097A (en) * | 1993-09-30 | 1995-06-13 | Specialty Coating Systems, Inc. | Continuous vapor deposition apparatus |
US5534068A (en) * | 1995-10-27 | 1996-07-09 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement |
US5536322A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device |
US5536892A (en) * | 1995-10-18 | 1996-07-16 | Specialty Coating Systems, Inc. | Processes for the preparation of octafluoro-[2,2]paracyclophane |
US5536319A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including an atmospheric shroud and inert gas source |
US5536321A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter |
US5536317A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including a quartz crystal thickness/rate controller |
US5538758A (en) * | 1995-10-27 | 1996-07-23 | Specialty Coating Systems, Inc. | Method and apparatus for the deposition of parylene AF4 onto semiconductor wafers |
US5556473A (en) * | 1995-10-27 | 1996-09-17 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including dry vacuum pump system and downstream cold trap |
US5669971A (en) * | 1994-04-06 | 1997-09-23 | Specialty Coating Systems, Inc. | Selective coating apparatus |
US5689027A (en) * | 1994-11-18 | 1997-11-18 | Mobil Oil Corporation | Selective ethylbenzene conversion |
US5709753A (en) * | 1995-10-27 | 1998-01-20 | Specialty Coating Sysetms, Inc. | Parylene deposition apparatus including a heated and cooled dimer crucible |
US5789068A (en) * | 1995-06-29 | 1998-08-04 | Fry's Metals, Inc. | Preformed solder parts coated with parylene in a thickness effective to exhibit predetermined interference colors |
US5828132A (en) * | 1997-03-21 | 1998-10-27 | Texas Instruments Incorporated | Semiconductor device having perfluorinated and non-fluorinated parylene intermetal dielectric |
US5841005A (en) * | 1997-03-14 | 1998-11-24 | Dolbier, Jr.; William R. | Parylene AF4 synthesis |
US5849962A (en) * | 1995-10-18 | 1998-12-15 | Specialty Coating Systems, Inc. | Process for the preparation of octafluoro-(2,2) paracyclophane |
US5879808A (en) * | 1995-10-27 | 1999-03-09 | Alpha Metals, Inc. | Parylene polymer layers |
US5886026A (en) * | 1993-07-19 | 1999-03-23 | Angiotech Pharmaceuticals Inc. | Anti-angiogenic compositions and methods of use |
US5888905A (en) * | 1997-11-06 | 1999-03-30 | Texas Instruments Incorporated | Integrated circuit insulator and method |
US6030706A (en) * | 1996-11-08 | 2000-02-29 | Texas Instruments Incorporated | Integrated circuit insulator and method |
US6130096A (en) * | 1995-06-06 | 2000-10-10 | British Nuclear Fuels Plc | Chemical complexes |
US6150499A (en) * | 1998-01-06 | 2000-11-21 | Specialty Coating Systems, Inc. | Process for preparation of TFPX-dichloride |
US6184425B1 (en) * | 1996-08-07 | 2001-02-06 | Aventis Research & Technologies Gmbh & Co. | Process for preparing fluorine-containing compounds |
US6245760B1 (en) * | 1997-05-28 | 2001-06-12 | Aventis Pharmaceuticals Products, Inc | Quinoline and quinoxaline compounds which inhibit platelet-derived growth factor and/or p56lck tyrosine kinases |
US6284933B1 (en) * | 1996-10-23 | 2001-09-04 | William R. Dolbier, Jr. | TFPX synthesis |
US6362115B1 (en) * | 1998-12-09 | 2002-03-26 | Applied Materials, Inc. | In-situ generation of p-xylyiene from liquid precursors |
US6380415B2 (en) * | 2000-02-14 | 2002-04-30 | Central Glass Company, Limited | Process for producing octafluoro[2,2]paracyclophane |
US6392097B1 (en) * | 2000-03-20 | 2002-05-21 | Specialty Coating Systems, Inc. | Process for the preparation of derivatives of octafluoro-[2,2] paracylophane |
US6464740B1 (en) * | 1998-06-11 | 2002-10-15 | Honeywell International Inc. | Reactive aqueous metal oxide sols as polishing slurries for low dielectric constant materials |
US6549327B2 (en) * | 2001-05-24 | 2003-04-15 | Xerox Corporation | Photochromic gyricon display |
US6559474B1 (en) * | 2000-09-18 | 2003-05-06 | Cornell Research Foundation, Inc, | Method for topographical patterning of materials |
US6602932B2 (en) * | 1999-12-15 | 2003-08-05 | North Carolina State University | Nanoparticle composites and nanocapsules for guest encapsulation and methods for synthesizing same |
US20030165613A1 (en) * | 2001-12-21 | 2003-09-04 | Chappa Ralph A. | Reagent and method for providing coatings on surfaces |
US6646150B1 (en) * | 1999-12-16 | 2003-11-11 | Dainippon Pharmaceutical Co., Ltd. | Processes for producing (aminomethyl)trifluorocarbinol derivatives |
US20030228411A1 (en) * | 2002-03-19 | 2003-12-11 | Yu-Chong Tai | Method for integrating micro- and nanoparticles into MEMS and apparatus including the same |
US6667099B1 (en) * | 1999-07-29 | 2003-12-23 | Creavis Gesellschaft Fuer Technologie Und Innovation Mbh | Meso-and nanotubes |
US6723143B2 (en) * | 1998-06-11 | 2004-04-20 | Honeywell International Inc. | Reactive aqueous metal oxide sols as polishing slurries for low dielectric constant materials |
US6763576B2 (en) * | 2001-05-10 | 2004-07-20 | Parker-Hannifin Corporation | Manufacture of electronics enclosure having a metallized shielding layer |
US6770789B2 (en) * | 2002-03-13 | 2004-08-03 | University Of Florida Research Foundation | Process for trifluoromethylation of sulfates |
US6780561B2 (en) * | 2001-11-26 | 2004-08-24 | Kansai Paint Co., Ltd. | Polybenzoxazole precursor and coating composition using the same |
US6869698B2 (en) * | 2002-12-04 | 2005-03-22 | Canon Kabushiki Kaisha | Organic light-emitting device using paracyclophane |
US6919484B2 (en) * | 2002-07-25 | 2005-07-19 | University Of Florida | Method for incorporation of pentafluorosulfanyl (SF5) substituents into aliphatic and aromatic compounds |
US6943232B2 (en) * | 2002-02-04 | 2005-09-13 | E. I. Du Pont De Nemours And Company | Halogenated optical polymer composition |
US7012165B2 (en) * | 2003-10-31 | 2006-03-14 | University Of Florida | Oxidative fluorination of aromatic and chloroaromatic derivatives |
US20060083770A1 (en) * | 2004-10-15 | 2006-04-20 | Specialty Coating Systems, Inc. | Medical devices and methods of preparation and use |
US20070009738A1 (en) * | 2005-07-07 | 2007-01-11 | Specialty Coating Systems, Inc. | Nanoscale structures and methods of preparation and use |
US7173159B2 (en) * | 2005-03-21 | 2007-02-06 | Yuan-Shin Materials Technology Corp. | Method for synthesizing TFPX |
US20070099019A1 (en) * | 2005-10-31 | 2007-05-03 | Specialty Coating Systems, Inc. | Parylene variants and methods of synthesis and use |
US20070148390A1 (en) * | 2005-12-27 | 2007-06-28 | Specialty Coating Systems, Inc. | Fluorinated coatings |
US20070228606A1 (en) * | 2005-07-07 | 2007-10-04 | Specialty Coating Systems, Inc. | Nanoscale structures and methods of preparation |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3771302B2 (en) | 1995-07-14 | 2006-04-26 | 第三化成株式会社 | Tetrafluoro- [2,2] -paracyclophane and process for producing the same |
JP2001213819A (en) * | 2000-01-31 | 2001-08-07 | Nippon Shokubai Co Ltd | Method of production for cyclophane derivative |
JP2001213818A (en) * | 2000-01-31 | 2001-08-07 | Nippon Shokubai Co Ltd | Method of production for cyclophane derivative |
JP2002080412A (en) * | 2000-06-30 | 2002-03-19 | Nippon Shokubai Co Ltd | Method for producing paracyclophane derivative |
NL1019781C2 (en) | 2002-01-18 | 2003-07-21 | Tno | Coating as well as methods and devices for the manufacture thereof. |
EP1585703A1 (en) | 2003-01-17 | 2005-10-19 | Ciba SC Holding AG | A process for the production of porous inorganic materials or a matrix material containing nanoparticles |
JP2005183729A (en) | 2003-12-19 | 2005-07-07 | Toshiba Corp | Method of forming organic thin film |
-
2007
- 2007-02-26 US US11/710,881 patent/US7652178B2/en active Active
-
2008
- 2008-02-06 WO PCT/US2008/053150 patent/WO2008106286A2/en active Application Filing
- 2008-02-06 DE DE112008000508T patent/DE112008000508T5/en active Pending
- 2008-02-06 JP JP2009550958A patent/JP5631593B2/en active Active
- 2008-02-06 GB GB0914782.8A patent/GB2459413B/en active Active
-
2009
- 2009-07-27 US US12/510,038 patent/US20100260934A9/en not_active Abandoned
Patent Citations (81)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3246627A (en) * | 1962-10-05 | 1966-04-19 | Union Carbide Corp | Apparatus for vapor deposition |
US3297591A (en) * | 1962-10-22 | 1967-01-10 | Union Carbide Corp | Process for the preparation of alpha-perfluoro-p-xylylene poluymers |
US3301707A (en) * | 1962-12-27 | 1967-01-31 | Union Carbide Corp | Thin film resistors and methods of making thereof |
US3268599A (en) * | 1963-09-23 | 1966-08-23 | Union Carbide Corp | Process for the preparation of cyclo |
US3274267A (en) * | 1963-09-23 | 1966-09-20 | Union Carbide Corp | Cyclic alpha-perfluoro-di-p-xylylenes |
US3332891A (en) * | 1963-09-23 | 1967-07-25 | Union Carbide Corp | Process for the preparation of alpha-per-fluoro-p-xylylene polymers |
US3280202A (en) * | 1964-07-09 | 1966-10-18 | Union Carbide Corp | Process for producing p-xylylene-containing compositions |
US3405117A (en) * | 1964-12-24 | 1968-10-08 | Union Carbide Corp | alpha-chloro-di-p-xylylenes |
US3342754A (en) * | 1966-02-18 | 1967-09-19 | Union Carbide Corp | Para-xylylene polymers |
US3749601A (en) * | 1971-04-01 | 1973-07-31 | Hughes Aircraft Co | Encapsulated packaged electronic assembly |
US4176209A (en) * | 1978-01-09 | 1979-11-27 | Raytheon Corporation | Process for forming polymeric paraxylylene coatings and films possessing improved oxidation resistance |
US4429153A (en) * | 1979-12-21 | 1984-01-31 | Imperial Chemical Industries Plc | Halogenated esters |
US4846998A (en) * | 1985-03-22 | 1989-07-11 | Merck Patent Gesellschaft Mit Beschrankter Haftung | Cyclohexane derivatives |
US4783561A (en) * | 1985-10-30 | 1988-11-08 | Montedison S.P.A. | Process for the preparation of halogenated (2,2)-paracyclophanes and mixtures of resultant halogenated (2,2)-paracyclophanes |
US4734533A (en) * | 1985-12-19 | 1988-03-29 | Montedison S.P.A. | Process for the preparation of (2,2)-paracyclophane and derivatives thereof |
US4734503A (en) * | 1986-02-07 | 1988-03-29 | E. I. Du Pont De Nemours And Company | Catalytic transhalogenation of haloaromatics |
US4761269A (en) * | 1986-06-12 | 1988-08-02 | Crystal Specialties, Inc. | Apparatus for depositing material on a substrate |
US4795838A (en) * | 1986-06-27 | 1989-01-03 | Montedison S.P.A. | Process for the preparation of (2,2)-paracyclophane and derivatives thereof |
US4816608A (en) * | 1986-06-27 | 1989-03-28 | Montedison S.P.A. | Process for the preparation of (2,2)-paracyclophane and derivatives thereof |
US4853488A (en) * | 1987-04-10 | 1989-08-01 | Montedison S.P.A. | Process for the preparation of (2,2)-paracyclophane and derivatives thereof |
US4886923A (en) * | 1987-09-18 | 1989-12-12 | Montedison S.P.A. | Process for the preparation of tricyclo 8.2.2.2 hexadeca 4,6,10,12,13,15 hexaene chlorinated in the benzene rings |
US4924014A (en) * | 1988-03-02 | 1990-05-08 | Hoechst Aktiengesellschaft | Process for the preparation of halogen-containing aromatic compounds |
US5094906A (en) * | 1988-08-15 | 1992-03-10 | Exxon Research And Engineering Company | Ceramic microtubular materials and method of making same |
US5288504A (en) * | 1988-09-09 | 1994-02-22 | The Ronald T. Dodge Company | Pharmaceuticals microencapsulated by vapor deposited polymers and method |
US5069972A (en) * | 1988-09-12 | 1991-12-03 | Versic Ronald J | Moldable microcapsule that contains a high percentage of solid core material, and method of manufacture thereof |
US5266349A (en) * | 1991-02-25 | 1993-11-30 | Specialty Coating Systems Inc. | Method of discrete conformal coating |
US5210341A (en) * | 1991-12-20 | 1993-05-11 | Union Carbide Chemicals & Plastics Technology Corporation | Processes for the preparation of octafluoro-[2,2]paracyclophane |
US5268202A (en) * | 1992-10-09 | 1993-12-07 | Rensselaer Polytechnic Institute | Vapor deposition of parylene-F using 1,4-bis (trifluoromethyl) benzene |
US5302767A (en) * | 1993-03-26 | 1994-04-12 | Union Carbide Chemicals & Plastics Technology Corporation | [2.2] paracyclophane and derivatives thereof |
US5886026A (en) * | 1993-07-19 | 1999-03-23 | Angiotech Pharmaceuticals Inc. | Anti-angiogenic compositions and methods of use |
US5368645A (en) * | 1993-09-24 | 1994-11-29 | Specialty Coating Systems Inc. | Vacuum chuck for coating apparatus |
US5424097A (en) * | 1993-09-30 | 1995-06-13 | Specialty Coating Systems, Inc. | Continuous vapor deposition apparatus |
US5908506A (en) * | 1993-09-30 | 1999-06-01 | Specialty Coating Systems, Inc. | Continuous vapor deposition apparatus |
US5669971A (en) * | 1994-04-06 | 1997-09-23 | Specialty Coating Systems, Inc. | Selective coating apparatus |
US5689027A (en) * | 1994-11-18 | 1997-11-18 | Mobil Oil Corporation | Selective ethylbenzene conversion |
US6130096A (en) * | 1995-06-06 | 2000-10-10 | British Nuclear Fuels Plc | Chemical complexes |
US5789068A (en) * | 1995-06-29 | 1998-08-04 | Fry's Metals, Inc. | Preformed solder parts coated with parylene in a thickness effective to exhibit predetermined interference colors |
US5536892A (en) * | 1995-10-18 | 1996-07-16 | Specialty Coating Systems, Inc. | Processes for the preparation of octafluoro-[2,2]paracyclophane |
US5849962A (en) * | 1995-10-18 | 1998-12-15 | Specialty Coating Systems, Inc. | Process for the preparation of octafluoro-(2,2) paracyclophane |
US5536322A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device |
US5534068A (en) * | 1995-10-27 | 1996-07-09 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement |
US5709753A (en) * | 1995-10-27 | 1998-01-20 | Specialty Coating Sysetms, Inc. | Parylene deposition apparatus including a heated and cooled dimer crucible |
US5556473A (en) * | 1995-10-27 | 1996-09-17 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including dry vacuum pump system and downstream cold trap |
US5536321A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter |
US5536319A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including an atmospheric shroud and inert gas source |
US5538758A (en) * | 1995-10-27 | 1996-07-23 | Specialty Coating Systems, Inc. | Method and apparatus for the deposition of parylene AF4 onto semiconductor wafers |
US5879808A (en) * | 1995-10-27 | 1999-03-09 | Alpha Metals, Inc. | Parylene polymer layers |
US5536317A (en) * | 1995-10-27 | 1996-07-16 | Specialty Coating Systems, Inc. | Parylene deposition apparatus including a quartz crystal thickness/rate controller |
US6184425B1 (en) * | 1996-08-07 | 2001-02-06 | Aventis Research & Technologies Gmbh & Co. | Process for preparing fluorine-containing compounds |
US6284933B1 (en) * | 1996-10-23 | 2001-09-04 | William R. Dolbier, Jr. | TFPX synthesis |
US6030706A (en) * | 1996-11-08 | 2000-02-29 | Texas Instruments Incorporated | Integrated circuit insulator and method |
US5841005A (en) * | 1997-03-14 | 1998-11-24 | Dolbier, Jr.; William R. | Parylene AF4 synthesis |
US5828132A (en) * | 1997-03-21 | 1998-10-27 | Texas Instruments Incorporated | Semiconductor device having perfluorinated and non-fluorinated parylene intermetal dielectric |
US6245760B1 (en) * | 1997-05-28 | 2001-06-12 | Aventis Pharmaceuticals Products, Inc | Quinoline and quinoxaline compounds which inhibit platelet-derived growth factor and/or p56lck tyrosine kinases |
US5888905A (en) * | 1997-11-06 | 1999-03-30 | Texas Instruments Incorporated | Integrated circuit insulator and method |
US6150499A (en) * | 1998-01-06 | 2000-11-21 | Specialty Coating Systems, Inc. | Process for preparation of TFPX-dichloride |
US6723143B2 (en) * | 1998-06-11 | 2004-04-20 | Honeywell International Inc. | Reactive aqueous metal oxide sols as polishing slurries for low dielectric constant materials |
US6464740B1 (en) * | 1998-06-11 | 2002-10-15 | Honeywell International Inc. | Reactive aqueous metal oxide sols as polishing slurries for low dielectric constant materials |
US6362115B1 (en) * | 1998-12-09 | 2002-03-26 | Applied Materials, Inc. | In-situ generation of p-xylyiene from liquid precursors |
US6667099B1 (en) * | 1999-07-29 | 2003-12-23 | Creavis Gesellschaft Fuer Technologie Und Innovation Mbh | Meso-and nanotubes |
US6602932B2 (en) * | 1999-12-15 | 2003-08-05 | North Carolina State University | Nanoparticle composites and nanocapsules for guest encapsulation and methods for synthesizing same |
US6646150B1 (en) * | 1999-12-16 | 2003-11-11 | Dainippon Pharmaceutical Co., Ltd. | Processes for producing (aminomethyl)trifluorocarbinol derivatives |
US6380415B2 (en) * | 2000-02-14 | 2002-04-30 | Central Glass Company, Limited | Process for producing octafluoro[2,2]paracyclophane |
US6392097B1 (en) * | 2000-03-20 | 2002-05-21 | Specialty Coating Systems, Inc. | Process for the preparation of derivatives of octafluoro-[2,2] paracylophane |
US6559474B1 (en) * | 2000-09-18 | 2003-05-06 | Cornell Research Foundation, Inc, | Method for topographical patterning of materials |
US6763576B2 (en) * | 2001-05-10 | 2004-07-20 | Parker-Hannifin Corporation | Manufacture of electronics enclosure having a metallized shielding layer |
US6549327B2 (en) * | 2001-05-24 | 2003-04-15 | Xerox Corporation | Photochromic gyricon display |
US6780561B2 (en) * | 2001-11-26 | 2004-08-24 | Kansai Paint Co., Ltd. | Polybenzoxazole precursor and coating composition using the same |
US20030165613A1 (en) * | 2001-12-21 | 2003-09-04 | Chappa Ralph A. | Reagent and method for providing coatings on surfaces |
US6943232B2 (en) * | 2002-02-04 | 2005-09-13 | E. I. Du Pont De Nemours And Company | Halogenated optical polymer composition |
US6770789B2 (en) * | 2002-03-13 | 2004-08-03 | University Of Florida Research Foundation | Process for trifluoromethylation of sulfates |
US20030228411A1 (en) * | 2002-03-19 | 2003-12-11 | Yu-Chong Tai | Method for integrating micro- and nanoparticles into MEMS and apparatus including the same |
US6919484B2 (en) * | 2002-07-25 | 2005-07-19 | University Of Florida | Method for incorporation of pentafluorosulfanyl (SF5) substituents into aliphatic and aromatic compounds |
US6869698B2 (en) * | 2002-12-04 | 2005-03-22 | Canon Kabushiki Kaisha | Organic light-emitting device using paracyclophane |
US7012165B2 (en) * | 2003-10-31 | 2006-03-14 | University Of Florida | Oxidative fluorination of aromatic and chloroaromatic derivatives |
US20060083770A1 (en) * | 2004-10-15 | 2006-04-20 | Specialty Coating Systems, Inc. | Medical devices and methods of preparation and use |
US7173159B2 (en) * | 2005-03-21 | 2007-02-06 | Yuan-Shin Materials Technology Corp. | Method for synthesizing TFPX |
US20070009738A1 (en) * | 2005-07-07 | 2007-01-11 | Specialty Coating Systems, Inc. | Nanoscale structures and methods of preparation and use |
US20070228606A1 (en) * | 2005-07-07 | 2007-10-04 | Specialty Coating Systems, Inc. | Nanoscale structures and methods of preparation |
US20070099019A1 (en) * | 2005-10-31 | 2007-05-03 | Specialty Coating Systems, Inc. | Parylene variants and methods of synthesis and use |
US20070148390A1 (en) * | 2005-12-27 | 2007-06-28 | Specialty Coating Systems, Inc. | Fluorinated coatings |
Also Published As
Publication number | Publication date |
---|---|
WO2008106286A2 (en) | 2008-09-04 |
GB2459413A (en) | 2009-10-28 |
US20100260934A9 (en) | 2010-10-14 |
WO2008106286A3 (en) | 2008-12-04 |
GB0914782D0 (en) | 2009-09-30 |
DE112008000508T5 (en) | 2010-02-18 |
US20080207961A1 (en) | 2008-08-28 |
GB2459413A8 (en) | 2011-12-21 |
JP2010519307A (en) | 2010-06-03 |
GB2459413B (en) | 2012-02-01 |
JP5631593B2 (en) | 2014-11-26 |
US7652178B2 (en) | 2010-01-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0549980B1 (en) | Processes for the preparation of octafluoro-[2,2] paracyclophane | |
EP0971867B1 (en) | Af4 synthesis | |
Lerman et al. | Acetyl hypofluorite, a new moderating carrier of elemental fluorine and its use in fluorination of 1, 3-dicarbonyl derivatives | |
US6284933B1 (en) | TFPX synthesis | |
KR100474128B1 (en) | Method for preparing octafluoro- [2,2] paracyclophane | |
JPH0291029A (en) | Method for adding fluorine atom to aromatic ring by centripetal exchange | |
US20090285987A1 (en) | Perfluoroparacyclophane and related methods therefor | |
Dolbier Jr et al. | New synthesis of octafluoro [2.2] paracyclophane | |
US6392097B1 (en) | Process for the preparation of derivatives of octafluoro-[2,2] paracylophane | |
JP4314321B2 (en) | Method for producing TFPX dichloride | |
JP3771302B2 (en) | Tetrafluoro- [2,2] -paracyclophane and process for producing the same | |
TW201738201A (en) | Compound containing fluorine atom and its utilization | |
JP4482305B2 (en) | Method for producing trichloroborazine compound and method for producing alkylborazine compound | |
JPS61257937A (en) | Manufacture of pentafluoroethoxy-and pentaeathylthiobenzene derivative | |
WO2001046099A1 (en) | Method of making hydrofluorocarbons | |
JP2002080412A (en) | Method for producing paracyclophane derivative | |
JP2001213819A (en) | Method of production for cyclophane derivative | |
JPH0753681A (en) | Carbazole compound and its oxidative polymerization product | |
KR101034305B1 (en) | Method for improving thermal stability of polyparaxylylene and derivative films thereof and polyparaxylylene derivatives | |
JP7541263B2 (en) | Method for producing halogenated alkene compounds | |
Stilmar et al. | Fluorination of polychloroterphenyl | |
JP2001514645A (en) | Fluorination method | |
JPS62120327A (en) | Fluoroalkylation process | |
JPS62103038A (en) | Production of 4,4'-difluorophthalophenone | |
US5233104A (en) | Process for trifluoromethylation of aromatic compounds |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |