US20090191031A1 - System and method for cooling semiconductor coated hot glass sheets - Google Patents
System and method for cooling semiconductor coated hot glass sheets Download PDFInfo
- Publication number
- US20090191031A1 US20090191031A1 US12/020,772 US2077208A US2009191031A1 US 20090191031 A1 US20090191031 A1 US 20090191031A1 US 2077208 A US2077208 A US 2077208A US 2009191031 A1 US2009191031 A1 US 2009191031A1
- Authority
- US
- United States
- Prior art keywords
- heat absorbing
- radiant heat
- cooling
- semiconductor coated
- glass sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000011521 glass Substances 0.000 title claims abstract description 153
- 239000004065 semiconductor Substances 0.000 title claims abstract description 99
- 238000001816 cooling Methods 0.000 title claims abstract description 69
- 238000000034 method Methods 0.000 title claims abstract description 20
- 239000006096 absorbing agent Substances 0.000 claims abstract description 28
- 239000000463 material Substances 0.000 claims description 26
- 210000001364 upper extremity Anatomy 0.000 claims description 14
- 238000010276 construction Methods 0.000 claims description 10
- 239000011819 refractory material Substances 0.000 claims description 7
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 6
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910002804 graphite Inorganic materials 0.000 claims description 5
- 239000010439 graphite Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 description 30
- 230000008021 deposition Effects 0.000 description 30
- 238000010438 heat treatment Methods 0.000 description 28
- 238000000576 coating method Methods 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 10
- 230000007246 mechanism Effects 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 9
- 238000012545 processing Methods 0.000 description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 229910001887 tin oxide Inorganic materials 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000007688 edging Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 238000013022 venting Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B29/00—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
- C03B29/04—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a continuous way
- C03B29/06—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a continuous way with horizontal displacement of the products
- C03B29/08—Glass sheets
- C03B29/10—Glass sheets being in a vertical position
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/04—Annealing glass products in a continuous way
- C03B25/06—Annealing glass products in a continuous way with horizontal displacement of the glass products
- C03B25/08—Annealing glass products in a continuous way with horizontal displacement of the glass products of glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/04—Annealing glass products in a continuous way
- C03B25/06—Annealing glass products in a continuous way with horizontal displacement of the glass products
- C03B25/08—Annealing glass products in a continuous way with horizontal displacement of the glass products of glass sheets
- C03B25/087—Annealing glass products in a continuous way with horizontal displacement of the glass products of glass sheets being in a vertical position
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B29/00—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
- C03B29/04—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a continuous way
- C03B29/06—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a continuous way with horizontal displacement of the products
- C03B29/08—Glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B35/00—Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
- C03B35/14—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
- C03B35/20—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands by gripping tongs or supporting frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
Definitions
- This invention relates to a system and a method for cooling semiconductor coated hot glass sheets.
- An object of the present invention is to provide an improved system for cooling semiconductor coated hot glass sheets.
- the system of the invention for cooling semiconductor coated hot glass sheets includes a housing defining a vacuum chamber and also includes a conveyor for conveying hot glass sheets freshly coated with semiconductor material through the vacuum chamber.
- a cooling station includes a radiant heat absorber having radiant heat absorbing members spaced from each other in an opposed relationship between which the semiconductor coated glass sheets are conveyed so the radiant heat absorbing members absorb radiant heat therefrom to provide cooling.
- the conveyor has upper supports that support upper extremities of the semiconductor coated glass sheets which depend downwardly therefrom in a vertical orientation during the conveyance through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber.
- the radiant heat absorbing members of the radiant heat absorber of this embodiment have generally continuous planar heat absorbing surfaces that extend vertically and oppose each other in a spaced and parallel relationship with the vertically oriented semiconductor coated glass sheets being conveyed therebetween for cooling.
- the conveyor includes horizontal rolls spaced along the housing within the vacuum chamber to convey the semiconductor coated glass sheets horizontally through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber.
- the radiant heat absorber of this embodiment includes upper and lower heat absorbing members including planar heat absorbing surfaces, with the upper heat absorbing member having a generally continuous downwardly facing heat absorbing surface spaced above the conveyor rolls, and with the lower heat absorbing member including spaced portions located between the conveyor rolls and having upwardly facing heat absorbing surface portions that are spaced below the conveyed semiconductor coated glass sheets.
- the lower heat absorbing portion as disclosed has a one-piece unitary construction including a lower base from which its spaced portions project upwardly between the conveyor rolls.
- the radiant heat absorbers may be graphite or a refractory that is preferably alpha state silicon carbide.
- the first embodiment is disclosed with its conveyor provided with upper supports that support upper extremities of the semiconductor coated glass sheets which depend downwardly therefrom in a vertical orientation during the conveyance through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber, and the radiant heat absorbing members of the radiant heat absorber are made from a refractory material and have generally continuous planar heat absorbing surfaces that extend vertically and oppose each other in a spaced and parallel relationship with the vertically oriented semiconductor coated glass sheets being conveyed therebetween for cooling.
- the second embodiment as disclosed has its conveyor provided with horizontal rolls spaced along the housing within the vacuum chamber to convey the semiconductor coated glass sheets horizontally through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber, with the radiant heat absorber including upper and lower heat absorbing members made from a refractory material and including planar heat absorbing surfaces, specifically with the upper heat absorbing member having a generally continuous downwardly facing heat absorbing surface spaced above the conveyor rolls, and with the lower heat absorbing member including spaced portions located between the conveyor rolls and having upwardly facing heat absorbing surface portions that are spaced below the conveyed semiconductor coated glass sheets.
- the refractory lower heat absorbing portion is disclosed as having a one-piece unitary construction including a lower refractory base from which its refractory spaced portions project upwardly between the conveyor rolls.
- Another object of the invention is to provide an improved method for cooling a semiconductor coated hot glass sheet.
- the method of the invention for cooling a semiconductor coated hot glass sheet is performed by conveying a hot glass sheet newly coated with semiconductor material within a vacuum chamber to between a pair of spaced radiant heat absorbing members that receive radiant heat from the coated glass sheet to provide cooling.
- the semiconductor coated hot glass sheet is conveyed in a vertically extending orientation supported by the conveyor at an upper extremity of the coated glass sheet and conveyed between vertically extending radiant heat absorbing members for the cooling.
- the semiconductor coated hot glass sheet is conveyed in a horizontally extending orientation on rolls of a roll conveyor to between upper and lower radiant heat absorbing members with the semiconductor material facing upwardly toward the upper heat absorbing member.
- the semiconductor coated hot glass sheet is cooled from above by an upper radiant heat absorbing member that has a continuous downwardly facing surface and is cooled from below by a lower radiant heat absorbing member that has spaced portions projecting upwardly between the conveyor rolls.
- the radiant heat absorbing members may be made of a refractory material, specifically alpha state silicon carbide.
- FIG. 1 is a perspective view of one embodiment of a system that cools semiconductor coated hot glass sheets in accordance with the present invention.
- FIG. 2 is a perspective view illustrating a drive mechanism and shuttle utilized to suspend the glass sheets vertically from upper extremities thereof and provide conveyance thereof through the system.
- FIG. 3 is a partial view illustrating the manner in which magnetic rotary drive members support and rotatively drive the shuttle and the vertical glass sheet suspended from the shuttle.
- FIG. 4 is a top schematic view of the system illustrating its modular construction and the provision of a pair of side-by-side conveyors that convey the glass sheets vertically through a housing vacuum chamber of the system for the semiconductor deposition.
- FIG. 5 is a sectional view through a glass sheet on which semiconductor material has been coated with the semiconductor material thicknesses exaggerated for purposes of illustration.
- FIG. 6 is a schematic plan view illustrating radiant heaters in a heating station of the furnace for providing radiant heating of the vertically conveyed glass sheet in preparation for the semiconductor deposition.
- FIG. 7 is a schematic top plan view illustrating the vertical glass sheet during conveyance within a deposition station where the semiconductor material is deposited.
- FIG. 8 is a schematic top plan view illustrating the semiconductor coated glass sheet as it is conveyed through a cooling station where radiant heat absorbers provide cooling of the glass sheet.
- FIG. 9 is an elevational view illustrating one manner in which an elongated glass sheet is conveyed with its longer axis horizontal.
- FIG. 10 is a view similar to FIG. 9 illustrating another way in which the elongated glass sheet is conveyed with its longer axis vertical.
- FIGS. 10 a and 10 b are side and end views of the resultant glass sheet regardless of whether conveyed as shown in FIG. 9 or shown in FIG. 10 and illustrates the resultant upper extremity 40 as including tong marks 44 ′ on both surfaces of the glass sheet.
- FIG. 11 is a top plan view of another embodiment of a system that cools semiconductor coated hot glass sheets in accordance with the present invention.
- FIG. 12 is a sectional view taken along the direction of line 12 - 12 in FIG. 11 through a cooling station of the system to illustrate the manner in which the semiconductor coated glass sheet is conveyed horizontally on a roll conveyor between radiant heat absorbing members of a radiant heat absorber.
- FIG. 1 one embodiment of a system 20 for cooling semiconductor coated hot glass sheets is generally indicated by 20 and is operated to perform the method for cooling hot glass sheets with a semiconductor material in accordance with the invention.
- the system and the method will be described in an integrated manner to facilitate an understanding of all aspects of the invention.
- the system 20 includes an elongated housing collectively indicated by 22 and having a vacuum chamber 24 in which the semiconductor coating takes place.
- An entry load lock station 26 of the system provides provision for glass sheet entry into the vacuum chamber 24 and an exit load lock station 28 provides for exiting of the coated glass sheet out of the vacuum chamber 24 after the coating.
- the housing includes a heating station 30 for heating glass sheets, a pair of deposition stations 32 and 34 for supplying semiconductor material for chemical vapor deposition, and a cooling station 36 all of which are hereinafter described in greater detail.
- the system 20 as shown in FIG. 4 includes a pair of conveyors 38 extending alongside each other in a side-by-side relationship through the elongated housing 22 .
- Each conveyor 38 supports upper extremities 40 of vertical glass sheets G as shown in FIG. 2 and provides suspended conveyance of these vertical glass sheets through the system. This conveyance is initially into and through the entry load lock station 26 into the housing vacuum chamber 24 , through the heating station 30 for heating of the glass sheets, thereafter through the two deposition stations 32 and 34 for deposition of semiconductor material on the glass sheets, then to the cooling station 36 , and finally out of the vacuum chamber 24 through the exit load lock station 28 for delivery of the coated glass sheets.
- each conveyor 38 includes shuttles 42 for supporting the upper extremities 40 of the vertical glass sheets, specifically by tongs 44 shown in FIG. 2 .
- the tongs 44 may be of the type disclosed by U.S. Pat. No. 3,391,958 Furer, the entire disclosure of which is hereby incorporated by reference.
- Each conveyor 38 shown in FIG. 4 also includes a drive collectively indicated by 46 and having drive mechanisms 48 located along the system for conveying the shuttles and the vertical glass sheets suspended therefrom through the system.
- the drive 46 through its drive mechanisms 48 conveys the shuttles first into the entry load lock station 26 and from there into the vacuum chamber 24 of the elongated housing 22 for conveyance through the heating station 30 , deposition stations 32 and 34 , the cooling station 36 , and finally to the exit load lock station 28 for exit from the system and delivery of the coated glass sheets.
- Any type of suitable return conveyors 50 can be utilized to convey the shuttles 42 after egress from the exit load lock station 28 back to the entry load lock station 26 for another cycle.
- each shuttle 42 has an elongated shape and a downwardly depending support portion 52 ( FIG. 2 ) with holes 54 spaced therealong to receive and support the tongs 44 at the appropriate locations for the particular length of glass sheet being conveyed so that the suspended support is generally adjacent the upstream and downstream ends 56 and 58 of the upper extremity 40 of the glass sheet G being conveyed.
- the drive mechanisms 48 of the conveyor drive 46 each have an elongated shape and include rotary drive members 60 spaced along the elongated shape thereof to rotatively drive the shuttles 42 for the conveyance of the vertical glass sheets into, through and out of the system.
- the rotary drive members 60 are supported on an elongated plate 62 by bearings 64 and are magnetic so as to provide the rotary driving of the shuttles 42 for the conveyance.
- the shuttles 42 have upper support and drive surfaces 66 which are supported by the magnetic rotary drive members 60 that project downwardly through holes 68 in the plate 62 as shown in FIG. 3 into supporting and driving contact with the upper shuttle surfaces 60 .
- the conveyor drive mechanisms 48 of the conveyor drive 46 as previously discussed are spaced along the length of the system and each has an associated electric drive motor 70 as shown in FIG. 2 spaced outwardly of the housing 22 from the vacuum chamber 24 as shown schematically.
- the shaft output of each drive motor 70 extends through a hermetically sealed bearing to one end of a drive shaft 72 of the adjacent magnetic rotary drive member 60 , with the other end of the shaft being connected to a drive sprocket 74 for driving a continuous loop drive belt or chain 76 that drives another sprocket 74 on one end of the shaft 72 of the adjacent magnetic rotary drive member 60 , and associated sprockets and continuous drive members on alternating sides of the drive mechanism 48 in turn provide rotary driving of all of the magnetic rotary drive members 60 in coordination with each other.
- the semiconductor material deposition is performed on one surface of the glass sheet G which initially has a coating of tin oxide 78 that provides an electrical contact.
- the first deposition station 32 provides a layer of cadmium sulfide 80 which is a N-type semiconductor and has a thickness on the order of about 0.15 microns.
- a layer of cadmium telluride 82 is deposited over the cadmium sulfide layer 80 with a thickness on the order of about 3 microns to provide an I-type semiconductor.
- the tin oxide layer 78 , cadmium sulfide layer 80 and the cadmium telluride layer 82 can be separated into a plurality of cells and provided with another contact over the cadmium telluride layer 82 to function as a multi-cell photovoltaic panel for generating electricity from sunlight.
- the system housing 22 schematically shown in FIG. 4 has a modular construction including a number of housing modules 84 having opposite ends 85 connected to each other to provide the housing 22 , which includes the heating station 30 , the deposition stations 32 and 34 , and the cooling station 36 .
- the conveyor drive 46 has one of the previously described drive mechanisms 48 extending along the length of each housing module 84 between its upstream and downstream ends to provide the conveyance of the shuttles 42 and the glass sheets suspended therefrom through the vacuum chamber of the system housing for the heating, deposition and cooling.
- the entry and exit load lock stations 26 and 28 also each include an associated housing module 86 through which the conveyors 38 extend to provide the glass sheet conveyance into and out of the vacuum chamber 24 defined by the housing 22 .
- These load lock housings 86 each have entry and exit door structures 88 and 90 whose structure is hereinafter more fully described.
- the entry door structure 88 of the entry load lock station 26 is opened to permit conveyance of a shuttle 42 and glass sheet suspended vertically therefrom into the associated housing 86 whereupon the entry door structure is closed and the entry load lock station is evacuated by a vacuum pump to provide a vacuum of about 20 Torr.
- the exit door structure 98 is opened to permit the shuttle to be conveyed to the initial drive mechanism 48 of the heating station 30 with the shuttle bridging the drive mechanisms as it moves along from the entry load lock station into each housing module to the next through the heating station 30 , depositions stations 32 and 34 , and the cooling station 36 .
- the exit door structure 90 of the entry load lock station 26 is closed whereupon its housing module 86 is brought back to ambient pressure, and its entry door structure 88 is opened to permit conveyance of the next shuttle 42 and glass sheet suspended therefrom into the entry load lock station to initiate processing of the next cycle.
- the shuttle After each shuttle 42 has been processed within the vacuum chamber of housing 22 of the system 20 , the shuttle approaches the exit load lock station 28 whose entry and exit door structures 88 and 90 shown in FIG. 4 are closed as its housing module 86 is evacuated to a vacuum of about 20 Torr.
- the entry door structure 88 of the exit load lock station 28 is then opened to permit the shuttle and suspended glass sheet conveyance into the exit load lock station 28 whereupon its entry door structure 88 is closed and its housing is brought to ambient pressure, and its exit door structure 90 is subsequently opened to permit conveyance of the shuttle and suspended glass sheet out of the system for delivery.
- cooling station 36 as disclosed is located upstream from the exit load lock station 28 to facilitate the operation and common construction of both the entry and exit load lock stations 26 and 28 .
- the cooling station it is also possible for the cooling station to be located within the exit load lock station 28 even though the upstream location shown is preferred.
- Such cooling is important in reducing the temperature of the semiconductor material to below about 400° C. before exposure to oxygen and any consequent reaction of the oxygen with the semiconductor material.
- each shuttle has opposite lateral sides 92 and the drive mechanism plate 62 has angled sides 93 supporting failsafe rollers 94 positioned below the opposite lateral shuttle sides 92 . While the magnetic rotary drive members 60 support the shuttle 42 just slightly above the failsafe rollers 94 , these failsafe rollers 94 ensure that the shuttle 42 does not drop down under the force of gravity or otherwise.
- each housing module 84 of the heating station includes radiant heaters 96 spaced on opposite sides of the vertically conveyed glass sheet, and these radiant heaters 96 are embodied by radiant heating slabs 98 that are oriented vertically in a spaced and parallel relationship to each other such that the vertically conveyed glass sheet moves therebetween.
- Any type of suitable position adjuster 100 may be utilized to adjust the radiant heater spacing to provide uniformity of the glass sheet from both its oppositely facing surfaces.
- Each of the deposition stations 32 and 34 shown in FIG. 4 has a construction like that shown in FIG. 7 with its housing module 84 receiving a deposition module 102 and a vertically extending radiant heater 104 between which the glass sheet G is conveyed for deposition of the associated semiconductor material onto the glass sheet.
- the radiant heater 104 like the radiant heater in the heating station, includes a vertically extending heating slab 106 whose position can be changed as necessary by an adjuster 108 to provide uniformity of the glass temperature during the deposition.
- the deposition module 102 can include a radiant heater incorporated therein in addition to having provision for supplying hot gas that is deposited as the semiconductor material.
- the cooling station 36 whether located upstream from the exit load lock station 28 or within the exit load lock station includes a radiant heat absorber 110 that is shown in FIG. 8 as including radiant heat absorbing members 112 extending vertically in a spaced and parallel relationship to each other and between which the freshly semiconductor coated vertical glass sheet is positioned for cooling.
- the radiant heat absorbing members 112 have opposed generally continuous planar surfaces 113 at which the radiant heat is absorbed from the hot semiconductor coated glass sheet.
- Adjusters 114 control the positioning between the radiant heat absorbing members 112 and the glass sheet G so as to provide uniformity of cooling.
- Different materials may be utilized to provide the radiant heating slabs 98 in the heating station, any radiant heater of the deposition module 102 and the radiant heating slab 106 of each deposition station, and the radiant heat absorbing members 112 of the cooling station.
- graphite is a relatively inexpensive material that can be utilized and has good thermal conductivity so as to provide uniformity and temperature throughout; however graphite oblates even in vacuum and is sensitive to oxygen.
- Alpha state silicon carbide may also be utilized as it is non-porous, shock resistant and impervious to oxygen; however, it is also relatively expensive. It is possible to embed heater elements within the radiant heaters of the heating station and the deposition stations or to provide the radiant heat through the slab from heaters such as quartz tubes with Nichrome heating elements so that the slabs act as heat spreaders. Other radiant heater designs may also be possible.
- each glass sheet can be conveyed within the housing modules in a single direction from the entrance end to the exit end, can be oscillated back and forth at each module in a forward and backward direction or can be moved forwardly a certain extent and then backward a lesser extent successively such as in a two steps forward and one step back manner.
- elongated glass sheets G can be suspended by the tongs from associated shuttles 42 with their longer axes horizontal or vertical.
- the vertical suspension will provide greater coating capability but requires a greater vertical height of the heating, coating and cooling station components.
- the resultant glass sheet will have its upper extremity 40 deformed with tong marks 44 ′ on both of the oppositely facing surfaces of the glass sheet.
- These tong marks 44 ′ result from the deformation provided by the tongs with the glass sheet heated.
- Such tong marks 44 ′ being located at the upper extremity are outside of the operational area of the semiconductor layers 80 and 82 over the tin oxide layer 78 as shown in FIG. 5 and do not adversely affect the operation of the resultant glass sheet such as when used as a photovoltaic panel.
- the vertical suspension at the upper extremity of the conveyed glass sheet while heated maintains planarity of the glass sheet and also facilitates uniform temperature heating without variations such as can result when heating on conveyor rolls whose radiation and conduction varies during the conveyance.
- the glass sheet substrate is washed, to remove particulates and provide preparation for coating, with a suitable detergent that is then rinsed with deionized water to provide a mineral free surface after air drying.
- a suitable laser station will imprint a code on the glass sheet for production control and location during processing.
- the vacuum pump system is matched to the volume of the load lock chamber to provide a pump down time such as on the order of 21 seconds to 20 Torr. Conveyance into and out of each load lock station plus venting and pump down time amount to a 60 second total cycle time with the load lock chamber volume at 56 cubic feet, a pumping speed of 580 cubic feet per minute for the 21 second pump down time, 10 seconds for conveyance into the load lock station, 10 seconds for exiting, and 19 seconds to provide door actuation and atmospheric venting.
- the glass sheet substrate will be heated to approximately 585° C. in preparation for the initial semiconductor coating.
- This heating by the radiant heaters 96 previously described in connection with FIG. 6 will be provided with about 25 kilowatts per side in an initial zone and 16 kilowatts per side in subsequent zones with the radiant heat chamber being at approximately 680° C. so as to provide the desired glass surface substrate temperature of 580° C. in approximately 150 seconds.
- the transport speed can be varied for the particular glass sheet being coated along with the necessary temperatures.
- the hot gas supplied by the deposition module 102 shown in FIG. 7 maintains the substrate at a uniform temperature in association with the backside radiant heater 104 .
- the vertical orientation eliminates the potential for pinholes, nucleated materials and condensed vapor from making contact with the glass sheet substrate. Uniformity of the film thickness is dependent upon the temperature of the glass sheet substrate and the source vapor geometry, and the electrical quality is dependent on the lack of voids or pre nucleated material that sticks to the surface.
- the cadmium sulfide providing the N-layer is applied with the cadmium sulfide gas sublimed and heated to a temperature of 950° C. It is believed that the rate of coating will be about 1,000 angstrom per second to a total thickness of about 900 to 1,500 angstroms, and a suitable detection device within the deposition module will be utilized to scan the coating thickness.
- the second deposition station 34 previously described in connection with FIG. 4 provides the cadmium telluride layer which is a P-layer.
- the glass sheet substrate temperature will be approximately 605° C.
- the cadmium telluride will be sublimed and heated to about 1050° C. and the coating will be supplied through a variable aperture to control the rate of deposition which will be to a thickness of about 3 microns that is believed to be at a rate of 2.5 microns per second.
- the cooling station 36 previously described in connection with FIG. 4 then receives the semiconductor coated glass sheet substrate to provide cooling below about 400° C. so as to prevent exposure to oxygen and consequent reaction therewith of the coated materials While it is also possible to provide the radiant cooling in the exit load lock station as previously discussed, such processing will result in an increased exit time that could increase the cycle time.
- a suitable after cooler will provide cooling to about 50° C. for handling.
- the thickness of the cadmium telluride will then be tested to confirm correctness, a dilute aqueous solution of cadmium chloride is sprayed or rolled onto the semiconductor coatings and the glass sheet is then heated to about 400° C. for about 15 minutes to facilitate the conversion of light to electricity.
- the treated glass sheet is then washed with deionized water, rinsed and dried. Suitable laser scribing and processing then is utilized to then convert a semiconductor coated glass sheet to a photovoltaic panel.
- FIG. 11 another embodiment of a system 20 ′ for cooling semiconductor coated hot glass sheets is similar to the previously described system shown in FIGS. 1-10 except as will be noted and thus has like reference numerals applied to like components thereof and much of the prior description is applicable and thus will not be repeated.
- System 20 ′ shown in FIGS. 11 and 12 has a roll conveyor 116 including horizontal rolls 118 on which the glass sheet G is conveyed through the system for deposition of the semiconductor material on its upwardly facing surface.
- the radiant heat absorber 110 of the cooling station 36 as shown in FIG. 12 has upper and lower radiant heat absorbing members 112 u and 112 l spaced from each other in an opposed relationship between which the roll conveyor 116 conveys the semiconductor coated glass sheet so the radiant heat absorbing members absorb radiant heat therefrom to provide cooling.
- the upper and lower radiant heat absorbing members 112 u and 112 l have planar heat absorbing surfaces 120 and 122 that face the conveyed glass sheet G from above and below respectively to provide the radiant cooling.
- the downwardly facing planar surface 120 of the upper heat absorbing member 112 u is generally continuous.
- the lower heat absorbing 112 l has spaced portions 124 that project upwardly between the conveyor rolls 118 and define upwardly facing heat absorbing surface portions 126 of the surface 122 for providing radiant heat absorption from the lower surface of the glass sheet G.
- the lower heat absorbing member 112 has a one-piece unitary construction including a lower base 128 from which the spaced portions 124 project upwardly to between the conveyor rolls 118 .
- the combined area of the lower spaced surface portions 126 is thus less than the total area of the upper continuous surface 120 and the upper glass surface radiates heat through the coated semiconductor layers while the lower glass surface has no such coating.
- the lower glass sheet surface also radiates and conducts heat to the conveyor rolls 118 .
- Adjusters 114 permit adjustment of the heat absorbing members 112 u and 112 l in order to provide equal cooling from above and below and thereby maintain glass planarity during the cooling.
- the lower conveyor rolls 118 can advantageously be made by sinter bonded fused silica particles so as to have a low coefficient of thermal expansion and thereby prevent thermal warpage.
- Both the upper and lower radiant heat absorbing members 112 u and 112 l like the earlier described embodiment can be made from graphite or a refractory which preferably is alpha state silicon carbide.
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
A system (20, 20′) and method for cooling semiconductor coated hot glass sheets in a cooling station (36) within a vacuum chamber (24). The semiconductor coated hot glass sheets are conveyed between radiant heat absorbing members (112) of a radiant heat absorber (110) to provide the cooling. In one embodiment the glass sheets are conveyed vertically for the cooling and in another the glass sheets are conveyed horizontally.
Description
- 1. Field of the Invention
- This invention relates to a system and a method for cooling semiconductor coated hot glass sheets.
- 2. Background Art
- Semiconductor devices such as photovoltaic panels have previously been constructed with glass sheet substrates on which semiconductor material is coated. See U.S. Pat. No. 5,016,562 Madan et al.; U.S. Pat. No. 5,248,349 Foote et al.; U.S. Pat. No. 5,372,646 Foote et al; U.S. Pat. No. 5,470,397 Foote et al.; and U.S. Pat. No. 5,536,333 Foote et al., all of which disclose horizontal rollers for conveying glass sheets during such coating.
- Other prior art references noted during an investigation conducted in connection with the present invention include U.S. Pat. No. 4,545,327 Campbell et al; U.S. Pat. No. 4,593,644 Hanak; U.S. Pat. No. 5,288,329 Nakamura et al; 6,013,134 Chu et al.; and U.S. Pat. No. 6,827,788 Takahashi as well as U.S. Published Patent Application U.S. 2007/0137574.
- An object of the present invention is to provide an improved system for cooling semiconductor coated hot glass sheets.
- In carrying out the above object, the system of the invention for cooling semiconductor coated hot glass sheets includes a housing defining a vacuum chamber and also includes a conveyor for conveying hot glass sheets freshly coated with semiconductor material through the vacuum chamber. A cooling station includes a radiant heat absorber having radiant heat absorbing members spaced from each other in an opposed relationship between which the semiconductor coated glass sheets are conveyed so the radiant heat absorbing members absorb radiant heat therefrom to provide cooling.
- In one disclosed embodiment of the system, the conveyor has upper supports that support upper extremities of the semiconductor coated glass sheets which depend downwardly therefrom in a vertical orientation during the conveyance through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber. The radiant heat absorbing members of the radiant heat absorber of this embodiment have generally continuous planar heat absorbing surfaces that extend vertically and oppose each other in a spaced and parallel relationship with the vertically oriented semiconductor coated glass sheets being conveyed therebetween for cooling.
- In another disclosed embodiment of the system, the conveyor includes horizontal rolls spaced along the housing within the vacuum chamber to convey the semiconductor coated glass sheets horizontally through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber. The radiant heat absorber of this embodiment includes upper and lower heat absorbing members including planar heat absorbing surfaces, with the upper heat absorbing member having a generally continuous downwardly facing heat absorbing surface spaced above the conveyor rolls, and with the lower heat absorbing member including spaced portions located between the conveyor rolls and having upwardly facing heat absorbing surface portions that are spaced below the conveyed semiconductor coated glass sheets. Furthermore, the lower heat absorbing portion as disclosed has a one-piece unitary construction including a lower base from which its spaced portions project upwardly between the conveyor rolls.
- In both embodiments, the radiant heat absorbers may be graphite or a refractory that is preferably alpha state silicon carbide.
- More specifically, the first embodiment is disclosed with its conveyor provided with upper supports that support upper extremities of the semiconductor coated glass sheets which depend downwardly therefrom in a vertical orientation during the conveyance through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber, and the radiant heat absorbing members of the radiant heat absorber are made from a refractory material and have generally continuous planar heat absorbing surfaces that extend vertically and oppose each other in a spaced and parallel relationship with the vertically oriented semiconductor coated glass sheets being conveyed therebetween for cooling.
- Also, the second embodiment as disclosed has its conveyor provided with horizontal rolls spaced along the housing within the vacuum chamber to convey the semiconductor coated glass sheets horizontally through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber, with the radiant heat absorber including upper and lower heat absorbing members made from a refractory material and including planar heat absorbing surfaces, specifically with the upper heat absorbing member having a generally continuous downwardly facing heat absorbing surface spaced above the conveyor rolls, and with the lower heat absorbing member including spaced portions located between the conveyor rolls and having upwardly facing heat absorbing surface portions that are spaced below the conveyed semiconductor coated glass sheets. In addition, the refractory lower heat absorbing portion is disclosed as having a one-piece unitary construction including a lower refractory base from which its refractory spaced portions project upwardly between the conveyor rolls.
- Another object of the invention is to provide an improved method for cooling a semiconductor coated hot glass sheet.
- In carrying out the immediately preceding object, the method of the invention for cooling a semiconductor coated hot glass sheet is performed by conveying a hot glass sheet newly coated with semiconductor material within a vacuum chamber to between a pair of spaced radiant heat absorbing members that receive radiant heat from the coated glass sheet to provide cooling.
- In one practice of the method, the semiconductor coated hot glass sheet is conveyed in a vertically extending orientation supported by the conveyor at an upper extremity of the coated glass sheet and conveyed between vertically extending radiant heat absorbing members for the cooling.
- In another practice of the method, the semiconductor coated hot glass sheet is conveyed in a horizontally extending orientation on rolls of a roll conveyor to between upper and lower radiant heat absorbing members with the semiconductor material facing upwardly toward the upper heat absorbing member. In this practice of the method, the semiconductor coated hot glass sheet is cooled from above by an upper radiant heat absorbing member that has a continuous downwardly facing surface and is cooled from below by a lower radiant heat absorbing member that has spaced portions projecting upwardly between the conveyor rolls.
- In both practices of the method, the radiant heat absorbing members may be made of a refractory material, specifically alpha state silicon carbide.
- The objects, features and advantages of the present invention are readily apparent from the detailed description of the preferred embodiment when taken in connection with the accompanying drawings.
-
FIG. 1 is a perspective view of one embodiment of a system that cools semiconductor coated hot glass sheets in accordance with the present invention. -
FIG. 2 is a perspective view illustrating a drive mechanism and shuttle utilized to suspend the glass sheets vertically from upper extremities thereof and provide conveyance thereof through the system. -
FIG. 3 is a partial view illustrating the manner in which magnetic rotary drive members support and rotatively drive the shuttle and the vertical glass sheet suspended from the shuttle. -
FIG. 4 is a top schematic view of the system illustrating its modular construction and the provision of a pair of side-by-side conveyors that convey the glass sheets vertically through a housing vacuum chamber of the system for the semiconductor deposition. -
FIG. 5 is a sectional view through a glass sheet on which semiconductor material has been coated with the semiconductor material thicknesses exaggerated for purposes of illustration. -
FIG. 6 is a schematic plan view illustrating radiant heaters in a heating station of the furnace for providing radiant heating of the vertically conveyed glass sheet in preparation for the semiconductor deposition. -
FIG. 7 is a schematic top plan view illustrating the vertical glass sheet during conveyance within a deposition station where the semiconductor material is deposited. -
FIG. 8 is a schematic top plan view illustrating the semiconductor coated glass sheet as it is conveyed through a cooling station where radiant heat absorbers provide cooling of the glass sheet. -
FIG. 9 is an elevational view illustrating one manner in which an elongated glass sheet is conveyed with its longer axis horizontal. -
FIG. 10 is a view similar toFIG. 9 illustrating another way in which the elongated glass sheet is conveyed with its longer axis vertical. -
FIGS. 10 a and 10 b are side and end views of the resultant glass sheet regardless of whether conveyed as shown inFIG. 9 or shown inFIG. 10 and illustrates the resultantupper extremity 40 as includingtong marks 44′ on both surfaces of the glass sheet. -
FIG. 11 is a top plan view of another embodiment of a system that cools semiconductor coated hot glass sheets in accordance with the present invention. -
FIG. 12 is a sectional view taken along the direction of line 12-12 inFIG. 11 through a cooling station of the system to illustrate the manner in which the semiconductor coated glass sheet is conveyed horizontally on a roll conveyor between radiant heat absorbing members of a radiant heat absorber. - With reference to
FIG. 1 , one embodiment of asystem 20 for cooling semiconductor coated hot glass sheets is generally indicated by 20 and is operated to perform the method for cooling hot glass sheets with a semiconductor material in accordance with the invention. The system and the method will be described in an integrated manner to facilitate an understanding of all aspects of the invention. - With continuing reference to
FIG. 1 , thesystem 20 includes an elongated housing collectively indicated by 22 and having avacuum chamber 24 in which the semiconductor coating takes place. An entryload lock station 26 of the system provides provision for glass sheet entry into thevacuum chamber 24 and an exitload lock station 28 provides for exiting of the coated glass sheet out of thevacuum chamber 24 after the coating. The housing includes aheating station 30 for heating glass sheets, a pair ofdeposition stations cooling station 36 all of which are hereinafter described in greater detail. - The
system 20 as shown inFIG. 4 includes a pair ofconveyors 38 extending alongside each other in a side-by-side relationship through theelongated housing 22. Eachconveyor 38 supportsupper extremities 40 of vertical glass sheets G as shown inFIG. 2 and provides suspended conveyance of these vertical glass sheets through the system. This conveyance is initially into and through the entryload lock station 26 into thehousing vacuum chamber 24, through theheating station 30 for heating of the glass sheets, thereafter through the twodeposition stations cooling station 36, and finally out of thevacuum chamber 24 through the exitload lock station 28 for delivery of the coated glass sheets. - As illustrated in
FIGS. 2 and 4 , eachconveyor 38 includesshuttles 42 for supporting theupper extremities 40 of the vertical glass sheets, specifically bytongs 44 shown inFIG. 2 . Thetongs 44 may be of the type disclosed by U.S. Pat. No. 3,391,958 Furer, the entire disclosure of which is hereby incorporated by reference. Eachconveyor 38 shown inFIG. 4 also includes a drive collectively indicated by 46 and havingdrive mechanisms 48 located along the system for conveying the shuttles and the vertical glass sheets suspended therefrom through the system. Thus, thedrive 46 through itsdrive mechanisms 48 conveys the shuttles first into the entryload lock station 26 and from there into thevacuum chamber 24 of theelongated housing 22 for conveyance through theheating station 30,deposition stations cooling station 36, and finally to the exitload lock station 28 for exit from the system and delivery of the coated glass sheets. Any type ofsuitable return conveyors 50 can be utilized to convey theshuttles 42 after egress from the exitload lock station 28 back to the entryload lock station 26 for another cycle. - As shown in
FIGS. 2 and 4 , eachshuttle 42 has an elongated shape and a downwardly depending support portion 52 (FIG. 2 ) withholes 54 spaced therealong to receive and support thetongs 44 at the appropriate locations for the particular length of glass sheet being conveyed so that the suspended support is generally adjacent the upstream and downstream ends 56 and 58 of theupper extremity 40 of the glass sheet G being conveyed. Thedrive mechanisms 48 of theconveyor drive 46 each have an elongated shape and includerotary drive members 60 spaced along the elongated shape thereof to rotatively drive theshuttles 42 for the conveyance of the vertical glass sheets into, through and out of the system. More specifically, therotary drive members 60 are supported on anelongated plate 62 bybearings 64 and are magnetic so as to provide the rotary driving of theshuttles 42 for the conveyance. Theshuttles 42 have upper support and drivesurfaces 66 which are supported by the magneticrotary drive members 60 that project downwardly throughholes 68 in theplate 62 as shown inFIG. 3 into supporting and driving contact with the upper shuttle surfaces 60. - The
conveyor drive mechanisms 48 of theconveyor drive 46 as previously discussed are spaced along the length of the system and each has an associatedelectric drive motor 70 as shown inFIG. 2 spaced outwardly of thehousing 22 from thevacuum chamber 24 as shown schematically. The shaft output of each drivemotor 70 extends through a hermetically sealed bearing to one end of adrive shaft 72 of the adjacent magneticrotary drive member 60, with the other end of the shaft being connected to adrive sprocket 74 for driving a continuous loop drive belt orchain 76 that drives anothersprocket 74 on one end of theshaft 72 of the adjacent magneticrotary drive member 60, and associated sprockets and continuous drive members on alternating sides of thedrive mechanism 48 in turn provide rotary driving of all of the magneticrotary drive members 60 in coordination with each other. - As shown in
FIG. 5 , the semiconductor material deposition is performed on one surface of the glass sheet G which initially has a coating oftin oxide 78 that provides an electrical contact. After the heating in theheating station 30 shown inFIG. 4 , thefirst deposition station 32 provides a layer ofcadmium sulfide 80 which is a N-type semiconductor and has a thickness on the order of about 0.15 microns. As the glass sheet conveyance proceeds to thesecond deposition station 34, a layer ofcadmium telluride 82 is deposited over thecadmium sulfide layer 80 with a thickness on the order of about 3 microns to provide an I-type semiconductor. After such deposition and exiting from the system, thetin oxide layer 78,cadmium sulfide layer 80 and thecadmium telluride layer 82 can be separated into a plurality of cells and provided with another contact over thecadmium telluride layer 82 to function as a multi-cell photovoltaic panel for generating electricity from sunlight. - The
system housing 22 schematically shown inFIG. 4 has a modular construction including a number ofhousing modules 84 having opposite ends 85 connected to each other to provide thehousing 22, which includes theheating station 30, thedeposition stations cooling station 36. Theconveyor drive 46 has one of the previously describeddrive mechanisms 48 extending along the length of eachhousing module 84 between its upstream and downstream ends to provide the conveyance of theshuttles 42 and the glass sheets suspended therefrom through the vacuum chamber of the system housing for the heating, deposition and cooling. The entry and exitload lock stations housing module 86 through which theconveyors 38 extend to provide the glass sheet conveyance into and out of thevacuum chamber 24 defined by thehousing 22. Theseload lock housings 86 each have entry andexit door structures - As the processing begins with the glass sheet conveyance from the right toward the left as shown in
FIG. 4 , theentry door structure 88 of the entryload lock station 26 is opened to permit conveyance of ashuttle 42 and glass sheet suspended vertically therefrom into the associatedhousing 86 whereupon the entry door structure is closed and the entry load lock station is evacuated by a vacuum pump to provide a vacuum of about 20 Torr. Upon reaching the required vacuum state, theexit door structure 98 is opened to permit the shuttle to be conveyed to theinitial drive mechanism 48 of theheating station 30 with the shuttle bridging the drive mechanisms as it moves along from the entry load lock station into each housing module to the next through theheating station 30,depositions stations cooling station 36. After the initial entry into the vacuum chamber of thehousing 22, theexit door structure 90 of the entryload lock station 26 is closed whereupon itshousing module 86 is brought back to ambient pressure, and itsentry door structure 88 is opened to permit conveyance of thenext shuttle 42 and glass sheet suspended therefrom into the entry load lock station to initiate processing of the next cycle. - After each
shuttle 42 has been processed within the vacuum chamber ofhousing 22 of thesystem 20, the shuttle approaches the exitload lock station 28 whose entry andexit door structures FIG. 4 are closed as itshousing module 86 is evacuated to a vacuum of about 20 Torr. Theentry door structure 88 of the exitload lock station 28 is then opened to permit the shuttle and suspended glass sheet conveyance into the exitload lock station 28 whereupon itsentry door structure 88 is closed and its housing is brought to ambient pressure, and itsexit door structure 90 is subsequently opened to permit conveyance of the shuttle and suspended glass sheet out of the system for delivery. - It should be noted that the
cooling station 36 as disclosed is located upstream from the exitload lock station 28 to facilitate the operation and common construction of both the entry and exitload lock stations load lock station 28 even though the upstream location shown is preferred. Such cooling is important in reducing the temperature of the semiconductor material to below about 400° C. before exposure to oxygen and any consequent reaction of the oxygen with the semiconductor material. - With reference back to
FIG. 2 , it should be noted that each shuttle has oppositelateral sides 92 and thedrive mechanism plate 62 has angledsides 93 supportingfailsafe rollers 94 positioned below the opposite lateral shuttle sides 92. While the magneticrotary drive members 60 support theshuttle 42 just slightly above thefailsafe rollers 94, thesefailsafe rollers 94 ensure that theshuttle 42 does not drop down under the force of gravity or otherwise. - As shown in
FIG. 6 , eachhousing module 84 of the heating station includesradiant heaters 96 spaced on opposite sides of the vertically conveyed glass sheet, and theseradiant heaters 96 are embodied byradiant heating slabs 98 that are oriented vertically in a spaced and parallel relationship to each other such that the vertically conveyed glass sheet moves therebetween. Any type ofsuitable position adjuster 100 may be utilized to adjust the radiant heater spacing to provide uniformity of the glass sheet from both its oppositely facing surfaces. - Each of the
deposition stations FIG. 4 has a construction like that shown inFIG. 7 with itshousing module 84 receiving adeposition module 102 and a vertically extendingradiant heater 104 between which the glass sheet G is conveyed for deposition of the associated semiconductor material onto the glass sheet. Theradiant heater 104, like the radiant heater in the heating station, includes a vertically extendingheating slab 106 whose position can be changed as necessary by anadjuster 108 to provide uniformity of the glass temperature during the deposition. It is also possible for thedeposition module 102 to include a radiant heater incorporated therein in addition to having provision for supplying hot gas that is deposited as the semiconductor material. - The
cooling station 36, whether located upstream from the exitload lock station 28 or within the exit load lock station includes aradiant heat absorber 110 that is shown inFIG. 8 as including radiantheat absorbing members 112 extending vertically in a spaced and parallel relationship to each other and between which the freshly semiconductor coated vertical glass sheet is positioned for cooling. The radiantheat absorbing members 112 have opposed generally continuousplanar surfaces 113 at which the radiant heat is absorbed from the hot semiconductor coated glass sheet.Adjusters 114 control the positioning between the radiantheat absorbing members 112 and the glass sheet G so as to provide uniformity of cooling. - Different materials may be utilized to provide the
radiant heating slabs 98 in the heating station, any radiant heater of thedeposition module 102 and theradiant heating slab 106 of each deposition station, and the radiantheat absorbing members 112 of the cooling station. For example, graphite is a relatively inexpensive material that can be utilized and has good thermal conductivity so as to provide uniformity and temperature throughout; however graphite oblates even in vacuum and is sensitive to oxygen. Alpha state silicon carbide may also be utilized as it is non-porous, shock resistant and impervious to oxygen; however, it is also relatively expensive. It is possible to embed heater elements within the radiant heaters of the heating station and the deposition stations or to provide the radiant heat through the slab from heaters such as quartz tubes with Nichrome heating elements so that the slabs act as heat spreaders. Other radiant heater designs may also be possible. - During the glass sheet processing, each glass sheet can be conveyed within the housing modules in a single direction from the entrance end to the exit end, can be oscillated back and forth at each module in a forward and backward direction or can be moved forwardly a certain extent and then backward a lesser extent successively such as in a two steps forward and one step back manner.
- As illustrated in
FIGS. 9 and 10 , elongated glass sheets G can be suspended by the tongs from associatedshuttles 42 with their longer axes horizontal or vertical. The vertical suspension will provide greater coating capability but requires a greater vertical height of the heating, coating and cooling station components. - Regardless of whether the glass sheet is suspended and conveyed vertically in a horizontally elongated orientation as shown in
FIG. 9 or in a vertically elongated orientation as shown inFIG. 10 , the resultant glass sheet will have itsupper extremity 40 deformed with tong marks 44′ on both of the oppositely facing surfaces of the glass sheet. These tong marks 44′ result from the deformation provided by the tongs with the glass sheet heated. Such tong marks 44′ being located at the upper extremity are outside of the operational area of the semiconductor layers 80 and 82 over thetin oxide layer 78 as shown inFIG. 5 and do not adversely affect the operation of the resultant glass sheet such as when used as a photovoltaic panel. The vertical suspension at the upper extremity of the conveyed glass sheet while heated maintains planarity of the glass sheet and also facilitates uniform temperature heating without variations such as can result when heating on conveyor rolls whose radiation and conduction varies during the conveyance. - A specific way of processing with the
system 20 described above to provide photovoltaic panels will now be described. Such processing starts with tin oxide coated glass sheets approximately 3.2 millimeters thick of a size of 600 millimeters by 1200 millimeters which is approximately 24 inches by 48 inches. Initially the edges of the glass sheet substrate are diamond ground to a number 1 pencil and are polished finish to provide comfort in handling and eliminate fissures that can cause breakage during handling and heat treatment. The edging speed must be approximately 40 millimeters per second, i.e., 90 inches per minute, in order to obtain a two piece per minute cycle rate into the system. After the edging, the glass sheet substrate is washed, to remove particulates and provide preparation for coating, with a suitable detergent that is then rinsed with deionized water to provide a mineral free surface after air drying. Upstream from thesystem 20, a suitable laser station will imprint a code on the glass sheet for production control and location during processing. - To provide cycle timing, the vacuum pump system is matched to the volume of the load lock chamber to provide a pump down time such as on the order of 21 seconds to 20 Torr. Conveyance into and out of each load lock station plus venting and pump down time amount to a 60 second total cycle time with the load lock chamber volume at 56 cubic feet, a pumping speed of 580 cubic feet per minute for the 21 second pump down time, 10 seconds for conveyance into the load lock station, 10 seconds for exiting, and 19 seconds to provide door actuation and atmospheric venting.
- In the
system heating station 30 previously described in connection withFIG. 4 , the glass sheet substrate will be heated to approximately 585° C. in preparation for the initial semiconductor coating. This heating by theradiant heaters 96 previously described in connection withFIG. 6 will be provided with about 25 kilowatts per side in an initial zone and 16 kilowatts per side in subsequent zones with the radiant heat chamber being at approximately 680° C. so as to provide the desired glass surface substrate temperature of 580° C. in approximately 150 seconds. Of course, the transport speed can be varied for the particular glass sheet being coated along with the necessary temperatures. - During the deposition of the semiconductor material at the
deposition modules FIG. 4 , the hot gas supplied by thedeposition module 102 shown inFIG. 7 maintains the substrate at a uniform temperature in association with the backsideradiant heater 104. The vertical orientation eliminates the potential for pinholes, nucleated materials and condensed vapor from making contact with the glass sheet substrate. Uniformity of the film thickness is dependent upon the temperature of the glass sheet substrate and the source vapor geometry, and the electrical quality is dependent on the lack of voids or pre nucleated material that sticks to the surface. - At the
initial deposition station 32 shown inFIG. 4 , the cadmium sulfide providing the N-layer is applied with the cadmium sulfide gas sublimed and heated to a temperature of 950° C. It is believed that the rate of coating will be about 1,000 angstrom per second to a total thickness of about 900 to 1,500 angstroms, and a suitable detection device within the deposition module will be utilized to scan the coating thickness. - The
second deposition station 34 previously described in connection withFIG. 4 provides the cadmium telluride layer which is a P-layer. The glass sheet substrate temperature will be approximately 605° C., the cadmium telluride will be sublimed and heated to about 1050° C. and the coating will be supplied through a variable aperture to control the rate of deposition which will be to a thickness of about 3 microns that is believed to be at a rate of 2.5 microns per second. - The
cooling station 36 previously described in connection withFIG. 4 then receives the semiconductor coated glass sheet substrate to provide cooling below about 400° C. so as to prevent exposure to oxygen and consequent reaction therewith of the coated materials While it is also possible to provide the radiant cooling in the exit load lock station as previously discussed, such processing will result in an increased exit time that could increase the cycle time. - After the coated glass sheet leaves the exit load lock station for delivery, a suitable after cooler will provide cooling to about 50° C. for handling. The thickness of the cadmium telluride will then be tested to confirm correctness, a dilute aqueous solution of cadmium chloride is sprayed or rolled onto the semiconductor coatings and the glass sheet is then heated to about 400° C. for about 15 minutes to facilitate the conversion of light to electricity. The treated glass sheet is then washed with deionized water, rinsed and dried. Suitable laser scribing and processing then is utilized to then convert a semiconductor coated glass sheet to a photovoltaic panel.
- For a more detailed description of the
system 20 described above, reference should be made to the United States Patent application Serial No. (Attorney Docket No. WKSG 0101 PUSP) filed concurrently herewith by James E. Heider et al. under the title SYSTEM AND METHOD FOR GLASS SHEET SEMICONDUCTOR COATING AND RESULTANT PRODUCT, the entire disclosure of which is hereby incorporated by reference. - With reference to
FIG. 11 , another embodiment of asystem 20′ for cooling semiconductor coated hot glass sheets is similar to the previously described system shown inFIGS. 1-10 except as will be noted and thus has like reference numerals applied to like components thereof and much of the prior description is applicable and thus will not be repeated. -
System 20′ shown inFIGS. 11 and 12 has aroll conveyor 116 includinghorizontal rolls 118 on which the glass sheet G is conveyed through the system for deposition of the semiconductor material on its upwardly facing surface. Theradiant heat absorber 110 of thecooling station 36 as shown inFIG. 12 has upper and lower radiantheat absorbing members roll conveyor 116 conveys the semiconductor coated glass sheet so the radiant heat absorbing members absorb radiant heat therefrom to provide cooling. The upper and lower radiantheat absorbing members heat absorbing surfaces planar surface 120 of the upperheat absorbing member 112 u is generally continuous. The lower heat absorbing 112 l has spacedportions 124 that project upwardly between the conveyor rolls 118 and define upwardly facing heat absorbingsurface portions 126 of thesurface 122 for providing radiant heat absorption from the lower surface of the glass sheet G. - As shown in
FIG. 12 , the lowerheat absorbing member 112 has a one-piece unitary construction including alower base 128 from which the spacedportions 124 project upwardly to between the conveyor rolls 118. The combined area of the lower spacedsurface portions 126 is thus less than the total area of the uppercontinuous surface 120 and the upper glass surface radiates heat through the coated semiconductor layers while the lower glass surface has no such coating. Furthermore, the lower glass sheet surface also radiates and conducts heat to the conveyor rolls 118.Adjusters 114 permit adjustment of theheat absorbing members - Both the upper and lower radiant
heat absorbing members - While embodiments of the invention have been illustrated and described, it is not intended that these embodiments illustrate and describe all possible forms of the invention. Rather, the words used in the specification are words of description rather than limitation, and it is understood that various changes may be made without departing from the spirit and scope of the invention.
Claims (18)
1. A system for cooling semiconductor coated hot glass sheets comprising:
a housing defining a vacuum chamber;
a conveyor for conveying hot glass sheets freshly coated with semiconductor material through the vacuum chamber; and
a cooling station including a radiant heat absorber having radiant heat absorbing members spaced from each other in an opposed relationship between which the semiconductor coated glass sheets are conveyed so the radiant heat absorbing members absorb radiant heat therefrom to provide cooling.
2. A system for cooling semiconductor coated hot glass sheets as in claim 1 wherein the conveyor has upper supports that support upper extremities of the semiconductor coated glass sheets which depend downwardly therefrom in a vertical orientation during the conveyance through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber, and the radiant heat absorbing members of the radiant heat absorber having generally continuous planar heat absorbing surfaces that extend vertically and oppose each other in a spaced and parallel relationship with the vertically oriented semiconductor coated glass sheets being conveyed therebetween for cooling.
3. A system for cooling semiconductor coated hot glass sheets as in claim 1 wherein the conveyor includes horizontal rolls spaced along the housing within the vacuum chamber to convey the semiconductor coated glass sheets horizontally through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber, the radiant heat absorber including upper and lower heat absorbing members including planar heat absorbing surfaces, the upper heat absorbing member having a generally continuous downwardly facing heat absorbing surface spaced above the conveyor rolls, and the lower heat absorbing member including spaced portions located between the conveyor rolls and having upwardly facing heat absorbing surface portions that are spaced below the conveyed semiconductor coated glass sheets.
4. A system for cooling semiconductor coated hot glass sheets as in claim 3 wherein the lower heat absorbing portion has a one-piece unitary construction including a lower base from which its spaced portions project upwardly between the conveyor rolls.
5. A system for cooling semiconductor coated hot glass sheets as in claim 1 wherein the radiant heat absorbers are made from a material selected from graphite and a refractory.
6. A system for cooling semiconductor coated hot glass sheets as in claim 1 wherein the radiant heat absorbers are alpha state silicon carbide.
7. A system for cooling semiconductor coated hot glass sheets as in claim 1 wherein the conveyor has upper supports that support upper extremities of the semiconductor coated glass sheets which depend downwardly therefrom in a vertical orientation during the conveyance through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber, and the radiant heat absorbing members of the radiant heat absorber being made from a refractory material and having generally continuous planar heat absorbing surfaces that extend vertically and oppose each other in a spaced and parallel relationship with the vertically oriented semiconductor coated glass sheets being conveyed therebetween for cooling.
8. A system for cooling semiconductor coated hot glass sheets as in claim 1 wherein the conveyor includes horizontal rolls spaced along the housing within the vacuum chamber to convey the semiconductor coated glass sheets horizontally through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber, the radiant heat absorber including upper and lower heat absorbing members made from a refractory material and including planar heat absorbing surfaces, the upper heat absorbing member having a generally continuous downwardly facing heat absorbing surface spaced above the conveyor rolls, and the lower heat absorbing member including spaced portions located between the conveyor rolls and having upwardly facing heat absorbing surface portions that are spaced below the conveyed semiconductor coated glass sheets.
9. A system for cooling semiconductor coated hot glass sheets as in claim 8 wherein the refractory lower heat absorbing portion has a one-piece unitary construction including a lower refractory base from which its refractory spaced portions project upwardly between the conveyor rolls.
10. A system for cooling semiconductor coated hot glass sheets as in claim 1 wherein the conveyor includes horizontal rolls spaced along the housing within the vacuum chamber to convey the semiconductor coated glass sheets horizontally through the vacuum chamber and between the radiant heat absorbing members of the radiant heat absorber, the radiant heat absorber including upper and lower heat absorbing members made from a refractory material and including planar heat absorbing surfaces, the upper heat absorbing member having a generally continuous downwardly facing heat absorbing surface spaced above the conveyor rolls, and the lower heat absorbing member having a unitary one-piece construction including a lower base and spaced portions projecting upwardly from the base between the conveyor rolls and having upwardly facing heat absorbing surface portions that are spaced below the conveyed semiconductor coated glass sheets.
11. A method for cooling a semiconductor coated hot glass sheet comprising: conveying a hot glass sheet newly coated with semiconductor material within a vacuum chamber to between a pair of spaced radiant heat absorbing members that receive radiant heat from the coated glass sheet to provide cooling.
12. A method for cooling a semiconductor coated hot glass sheet as in claim 11 wherein the semiconductor coated hot glass sheet is conveyed in a vertically extending orientation supported by the conveyor at an upper extremity of the coated glass sheet and conveyed between vertically extending radiant heat absorbing members for the cooling.
13. A method for cooling a semiconductor coated hot glass sheet as in claim 11 wherein the semiconductor coated hot glass sheet is conveyed in a horizontally extending orientation on rolls of a roll conveyor to between upper and lower radiant heat absorbing members with the semiconductor material facing upwardly toward the upper heat absorbing member.
14. A method for cooling a semiconductor coated hot glass sheet as in claim 13 wherein the semiconductor coated hot glass sheet is cooled from above by an upper radiant heat absorbing member that has a continuous downwardly facing surface.
15. A method for cooling a semiconductor coated hot glass sheet as in claim 13 wherein the semiconductor coated hot glass sheet is cooled from below by a lower radiant heat absorbing member that has spaced portions projecting upwardly between the conveyor rolls.
16. A method for cooling a semiconductor coated hot glass sheet as in claim 13 wherein the semiconductor coated hot glass sheet is cooled from above by an upper radiant heat absorbing member that has a continuous downwardly facing surface and wherein the semiconductor coated glass sheet is cooled from below by a lower radiant heat absorbing member that has spaced portions projecting upwardly between the conveyor rolls.
17. A method for cooling a semiconductor coated hot glass sheet as in claim 11 wherein the semiconductor coated hot glass sheet is cooled between radiant heat absorbing members made of a refractory material.
18. A method for cooling a semiconductor coated hot glass sheet as in claim 11 wherein the semiconductor coated hot glass sheet is cooled between radiant heat absorbing members made of alpha state silicon carbide.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/020,772 US20090191031A1 (en) | 2008-01-28 | 2008-01-28 | System and method for cooling semiconductor coated hot glass sheets |
EP09705621A EP2247542A4 (en) | 2008-01-28 | 2009-01-05 | System and method for cooling semiconductor coated hot glass sheets |
PCT/US2009/030072 WO2009097164A1 (en) | 2008-01-28 | 2009-01-05 | System and method for cooling semiconductor coated hot glass sheets |
CN2009801072767A CN101959810A (en) | 2008-01-28 | 2009-01-05 | System and method for cooling hot glass sheet coated with semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/020,772 US20090191031A1 (en) | 2008-01-28 | 2008-01-28 | System and method for cooling semiconductor coated hot glass sheets |
Publications (1)
Publication Number | Publication Date |
---|---|
US20090191031A1 true US20090191031A1 (en) | 2009-07-30 |
Family
ID=40899411
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/020,772 Abandoned US20090191031A1 (en) | 2008-01-28 | 2008-01-28 | System and method for cooling semiconductor coated hot glass sheets |
Country Status (4)
Country | Link |
---|---|
US (1) | US20090191031A1 (en) |
EP (1) | EP2247542A4 (en) |
CN (1) | CN101959810A (en) |
WO (1) | WO2009097164A1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2317545A1 (en) * | 2009-10-30 | 2011-05-04 | Applied Materials, Inc. | Substrate transport system and method |
US20130000556A1 (en) * | 2010-03-15 | 2013-01-03 | Marco Ronchi | Apparatus for the deposition of semiconductor material on a glass sheet |
FR3000502A1 (en) * | 2012-12-27 | 2014-07-04 | Commissariat Energie Atomique | Thermally treating a thin part e.g. large-sized aspheric mirrors, comprises vertically placing a thin part during the heat treatment, where the treatment is an annealing process which is carried out to slacken internal stresses in the part |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1951950A (en) * | 1933-05-29 | 1934-03-20 | Corning Glass Works | Method and apparatus for cooling glass articles |
US3174839A (en) * | 1960-07-15 | 1965-03-23 | Glaces De Boussois S A | Method and apparatus for heat treatment of glass |
US3391958A (en) * | 1967-04-27 | 1968-07-09 | Pittsburgh Plate Glass Co | Glass gripping tongs with ballast |
US4361428A (en) * | 1980-08-06 | 1982-11-30 | Saint-Gobain Vitrage | Process and apparatus for regulating the temperature of a glass sheet in a multi-cell furnace |
US4545327A (en) * | 1982-08-27 | 1985-10-08 | Anicon, Inc. | Chemical vapor deposition apparatus |
US4593644A (en) * | 1983-10-26 | 1986-06-10 | Rca Corporation | Continuous in-line deposition system |
US5016562A (en) * | 1988-04-27 | 1991-05-21 | Glasstech Solar, Inc. | Modular continuous vapor deposition system |
US5248349A (en) * | 1992-05-12 | 1993-09-28 | Solar Cells, Inc. | Process for making photovoltaic devices and resultant product |
US5288329A (en) * | 1989-11-24 | 1994-02-22 | Nihon Shinku Gijutsu Kabushiki Kaisha | Chemical vapor deposition apparatus of in-line type |
US5674786A (en) * | 1993-01-28 | 1997-10-07 | Applied Materials, Inc. | Method of heating and cooling large area glass substrates |
US6013134A (en) * | 1998-02-18 | 2000-01-11 | International Business Machines Corporation | Advance integrated chemical vapor deposition (AICVD) for semiconductor devices |
US6827788B2 (en) * | 2000-12-27 | 2004-12-07 | Anelva Corporation | Substrate processing device and through-chamber |
US20070137574A1 (en) * | 2005-12-21 | 2007-06-21 | Porponth Sichanugrist | Low-cost and high performance solar cell manufacturing machine |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE401151A (en) * | 1933-02-27 | |||
GB1256181A (en) * | 1969-02-14 | 1971-12-08 | Triplex Safety Glass Co | Improvements in or relating to tongs for suspending glass sheets |
US4159842A (en) * | 1975-03-10 | 1979-07-03 | Ppg Industries, Inc. | Supporting glass sheets |
US7239804B2 (en) * | 2004-03-23 | 2007-07-03 | Canon Kabushiki Kaisha | Cooling device, and apparatus and method for manufacturing image display panel using cooling device |
WO2005109486A1 (en) * | 2004-05-12 | 2005-11-17 | Viatron Technologies Inc. | System for heat treatment of semiconductor device |
US7572334B2 (en) * | 2006-01-03 | 2009-08-11 | Applied Materials, Inc. | Apparatus for fabricating large-surface area polycrystalline silicon sheets for solar cell application |
-
2008
- 2008-01-28 US US12/020,772 patent/US20090191031A1/en not_active Abandoned
-
2009
- 2009-01-05 CN CN2009801072767A patent/CN101959810A/en active Pending
- 2009-01-05 EP EP09705621A patent/EP2247542A4/en not_active Withdrawn
- 2009-01-05 WO PCT/US2009/030072 patent/WO2009097164A1/en active Search and Examination
Patent Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1951950A (en) * | 1933-05-29 | 1934-03-20 | Corning Glass Works | Method and apparatus for cooling glass articles |
US3174839A (en) * | 1960-07-15 | 1965-03-23 | Glaces De Boussois S A | Method and apparatus for heat treatment of glass |
US3391958A (en) * | 1967-04-27 | 1968-07-09 | Pittsburgh Plate Glass Co | Glass gripping tongs with ballast |
US4361428A (en) * | 1980-08-06 | 1982-11-30 | Saint-Gobain Vitrage | Process and apparatus for regulating the temperature of a glass sheet in a multi-cell furnace |
US4545327A (en) * | 1982-08-27 | 1985-10-08 | Anicon, Inc. | Chemical vapor deposition apparatus |
US4593644A (en) * | 1983-10-26 | 1986-06-10 | Rca Corporation | Continuous in-line deposition system |
US5016562A (en) * | 1988-04-27 | 1991-05-21 | Glasstech Solar, Inc. | Modular continuous vapor deposition system |
US5288329A (en) * | 1989-11-24 | 1994-02-22 | Nihon Shinku Gijutsu Kabushiki Kaisha | Chemical vapor deposition apparatus of in-line type |
US5248349A (en) * | 1992-05-12 | 1993-09-28 | Solar Cells, Inc. | Process for making photovoltaic devices and resultant product |
US5372646A (en) * | 1992-05-12 | 1994-12-13 | Solar Cells, Inc. | Apparatus for making photovoltaic devices |
US5470397A (en) * | 1992-05-12 | 1995-11-28 | Solar Cells, Inc. | Process for making photovoltaic devices and resultant product |
US5536333A (en) * | 1992-05-12 | 1996-07-16 | Solar Cells, Inc. | Process for making photovoltaic devices and resultant product |
US5674786A (en) * | 1993-01-28 | 1997-10-07 | Applied Materials, Inc. | Method of heating and cooling large area glass substrates |
US6013134A (en) * | 1998-02-18 | 2000-01-11 | International Business Machines Corporation | Advance integrated chemical vapor deposition (AICVD) for semiconductor devices |
US6827788B2 (en) * | 2000-12-27 | 2004-12-07 | Anelva Corporation | Substrate processing device and through-chamber |
US20070137574A1 (en) * | 2005-12-21 | 2007-06-21 | Porponth Sichanugrist | Low-cost and high performance solar cell manufacturing machine |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2317545A1 (en) * | 2009-10-30 | 2011-05-04 | Applied Materials, Inc. | Substrate transport system and method |
US20110104627A1 (en) * | 2009-10-30 | 2011-05-05 | Applied Materials, Inc. | Substrate transport system and method |
WO2011051352A1 (en) * | 2009-10-30 | 2011-05-05 | Applied Materials, Inc. | Substrate transport system and method |
US20130000556A1 (en) * | 2010-03-15 | 2013-01-03 | Marco Ronchi | Apparatus for the deposition of semiconductor material on a glass sheet |
FR3000502A1 (en) * | 2012-12-27 | 2014-07-04 | Commissariat Energie Atomique | Thermally treating a thin part e.g. large-sized aspheric mirrors, comprises vertically placing a thin part during the heat treatment, where the treatment is an annealing process which is carried out to slacken internal stresses in the part |
Also Published As
Publication number | Publication date |
---|---|
WO2009097164A1 (en) | 2009-08-06 |
CN101959810A (en) | 2011-01-26 |
EP2247542A4 (en) | 2012-08-29 |
EP2247542A1 (en) | 2010-11-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9818822B2 (en) | System for glass sheet semiconductor coating and resultant product | |
US8481355B2 (en) | Modular system and process for continuous deposition of a thin film layer on a substrate | |
US8597430B2 (en) | Modular system and process for continuous deposition of a thin film layer on a substrate | |
KR101661485B1 (en) | Unit and process for treating the surface of flat glass with thermal conditioning of the glass | |
US20080213477A1 (en) | Inline vacuum processing apparatus and method for processing substrates therein | |
CN103415646B (en) | For the method and apparatus of coated substrate | |
KR950701455A (en) | PROCESS AND APPARATUS FOR MAKING PHOTOVOLTAIC DEVICES AND RESULTNAT PRODUCT | |
WO2013070649A1 (en) | High emissivity distribution plate in vapor deposition apparatus and processes | |
US20130216967A1 (en) | Device and method for heat-treating a plurality of multi-layer bodies | |
CN102754197B (en) | For processing layout, the system and method for polylayer forest | |
US8673777B2 (en) | In-line deposition system and process for deposition of a thin film layer | |
US20090191031A1 (en) | System and method for cooling semiconductor coated hot glass sheets | |
CN104080946B (en) | For the manufacture of device and the method for thin layer | |
KR101044772B1 (en) | Large-area top-down CIS high speed film forming system and method | |
EP2337092B1 (en) | Apparatus for vapor deposition of a sublimated material and corresponding process for continuous deposition of a thin film layer on a substrate | |
US20130098111A1 (en) | Heat strengthening of a glass superstrate for thin film photovoltaic devices | |
CN204144233U (en) | Base plate supports carrier and the system for the treatment of substrate | |
CN110140224A (en) | A kind of method and system for the production photovoltaic module on variable size substrate |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: WILLARD & KELSEY SOLAR GROUP, LLC, OHIO Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:HEIDER, JAMES E.;FAYKOSH, GARY T.;REEL/FRAME:020427/0643 Effective date: 20080118 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |