US20080019057A1 - Elimination of electric-pop noise in MR/GMR device - Google Patents
Elimination of electric-pop noise in MR/GMR device Download PDFInfo
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- US20080019057A1 US20080019057A1 US11/821,825 US82182507A US2008019057A1 US 20080019057 A1 US20080019057 A1 US 20080019057A1 US 82182507 A US82182507 A US 82182507A US 2008019057 A1 US2008019057 A1 US 2008019057A1
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- 230000008030 elimination Effects 0.000 title 1
- 238000003379 elimination reaction Methods 0.000 title 1
- 238000000034 method Methods 0.000 claims description 5
- 230000005291 magnetic effect Effects 0.000 abstract description 12
- 125000006850 spacer group Chemical group 0.000 description 12
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 230000003068 static effect Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- -1 AlNO Inorganic materials 0.000 description 1
- 229910017109 AlON Inorganic materials 0.000 description 1
- 229910015136 FeMn Inorganic materials 0.000 description 1
- 229910003289 NiMn Inorganic materials 0.000 description 1
- 229910019041 PtMn Inorganic materials 0.000 description 1
- 230000005290 antiferromagnetic effect Effects 0.000 description 1
- 239000002885 antiferromagnetic material Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
- G11B5/3909—Arrangements using a magnetic tunnel junction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B2005/0002—Special dispositions or recording techniques
- G11B2005/0005—Arrangements, methods or circuits
- G11B2005/001—Controlling recording characteristics of record carriers or transducing characteristics of transducers by means not being part of their structure
- G11B2005/0013—Controlling recording characteristics of record carriers or transducing characteristics of transducers by means not being part of their structure of transducers, e.g. linearisation, equalisation
- G11B2005/0016—Controlling recording characteristics of record carriers or transducing characteristics of transducers by means not being part of their structure of transducers, e.g. linearisation, equalisation of magnetoresistive transducers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/012—Recording on, or reproducing or erasing from, magnetic disks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
Definitions
- the present invention generally relates to an active device capable of converting an electrical signal into a voltage, more specifically, to a magnetic recording head consisting of either an anisotropic magneto-resistive (hereinafter referred as AMR) or giant magneto-resistive (hereafter referred as GMR) sensor along with an insulation spacer and magnetic shields.
- AMR anisotropic magneto-resistive
- GMR giant magneto-resistive
- the devices would need a thicker SAL to bias the MR if a thicker insulator spacer (2-400 ⁇ ) were used.
- a thicker insulator spacer (2-400 ⁇ ) were used.
- the SAL can not be easily saturated by a current in the MR and an antiferromagnetic pinning layer must be used to pin the SAL so that the SAL magnetization is perpendicular to the current direction.
- the device process becomes very complicated and it also renders designs less extendible to a narrower shield to shield spacing for higher density recording.
- the SAL has a function as a shunt bias layer in SAL biased AMR devices.
- the SAL and MR devices When the MR and SAL are spaced by electric conducting materials, such as Ta, the SAL and MR devices have the same electric track width.
- one objective of this invention is to provide an AMR design with a thin insulating spacer free of electric-pop noise.
- Another objective is to provide a SAL biased AMR product using an insulated spacer.
- a further objective of this invention is to provide an electric active device free of electric-pop noise over an insulating spacer on the top of an electric conductor.
- Still another objective of this invention is to provide a design to eliminate electric-pop noise in GMR magnetic recording heads with a thin insulating spacer.
- a magnetic reading device comprising:
- MR magnetoresistive
- a soft-adjacent magnetic transverse bias layer (SAL)
- a magnetic reading device comprising:
- a conductive layer contacting electrically said GMR device to either one of said shields.
- a hard disk driver is provided with the magnetoresistive device.
- this invention provides an AMR sensor with much improved signal.
- the signal improvement can be as much as 90% provided that the same MR/SAL device and operating current are used for the device.
- FIG. 1 a is a diagram of a preferred embodiment of the invention
- FIG. 1 b is a cross-section view taken along line AA indicated in FIG. 1 a,
- FIG. 2 is a diagram of an alternative embodiment of the invention
- FIGS. 3 a - 3 d show electric-pop test results before and after MR and SAL are connected by microfabrication
- FIGS. 4 a - 4 b show an extension to prevent a GMR device from electric-pop noise due to discharge between the GMR device and shields.
- FIG. 1 a is a diagram of a first preferred embodiment of the invention.
- MR layer 10 and SAL 30 are separated by a thin insulated spacer layer 20 , and are electrically connected at the ends of the MR element.
- An active region 10 of the MR device could be either a NiFe film or a composite layer, such as TaN/NiFe/TaN. NiFe, thickness ranges from 50 to 400 ⁇ .
- Side regions 12 and 14 of the MR element make electric contact with longitudinal bias layer and lead layer stacks 40 and 42 .
- End regions 16 and 18 of the MR element are connected to the end regions 32 , 34 of SAL by the lead and longitudinal bias layer stacks 40 and 42 .
- the length of MR element and SAL ranges from 2 to 20 ⁇ m.
- Insulating spacing layer 20 is made of insulating materials, such as Al 2 O 3 , AlON and SiO 2 , and the typical thickness of insulating spacing layer 20 varies from 50 to 200 ⁇ .
- Soft-adjacent layer (SAL) 30 can be made of NiFe, NiFeCr, NiFeRh. The moment ratio of SAL 30 to MR layer 10 ranges from 0.6 to 1.0.
- longitudinal bias layer can be made of anti-ferromagnetic materials, such as NiMn, FeMn, PtPdMn, IrMn and PtMn.
- Lead layer can be made of Ta, W or Ta/Au/Ta. Longitudinal bias layer and lead layer extend coverage on top of the MR element 10 and electrically contact with MR element 10 through side regions 12 and 14 , respectively. Therefore, the electric track width of the MR element is defined by active region 10 as longitudinal bias layer and lead layer have much higher electric conductivity than the MR layer.
- the electric track width of the SAL element is the entire element width.
- FIG. 1 b shows cross-section view taken along line AA indicated in FIG. 1 a .
- Function of insulator films 50 is to prevent electric connection from MR 10 to SAL 30 .
- Numeral 60ABS designates an air-bearing surface (ABS).
- FIG. 2 shows an alternative embodiment of the present invention.
- MR layer 10 and SAL 30 are separated by a thin insulating spacer layer 20 .
- MR layer 10 and SAL 30 are electrically connected at only one end region of the MR element. In this embodiment, no electric current passes through the SAL element. However, the whole SAL element is in an equal electric potential to that of one side of the MR element. One side region of the longitudinal bias layer and the leader layer does not electrically contact with a corresponding SAL end region.
- Insulator films 52 are electrically connected between MR layer 10 and SAL 30 at one end of the trilayer device.
- FIGS. 3 a and 3 b show electric-pop noise spectra of the device before edge shorting of the MR and SAL element
- FIGS. 3 c and 3 d show the same of the device after edge shorting of the MR and SAL element.
- FIG. 4 shows an extension to prevent a GMR device from electric-pop noise due to discharge between the GMR device and shields.
- FIG. 4 a is a diagram of a GMR device that is electrically shorted to a bottom shield to prevent electric-pop noise due to static discharge between the GMR device and a bottom shield.
- FIG. 4 b is a diagram of a GMR device that is electrically shorted to a top shield to prevent electric-pop noise due to static discharge between the GMR device and a top shield.
- reference numeral 60 designates a GMR active device, the GMR device including a spin-valve, GMR multilayer, and spin-dependent tunneling device, and numerals 62 and 64 designate stacks having a longitudinal bias layer and a lead layer.
- Electric contact 66 is provided between one side of lead layer and longitudinal bias layer stack 62 and the bottom shield 70 .
- Bottom and top shields 70 and 80 are made of soft magnetic materials, such as NiFe.
- Gaps 72 and 74 are filled with electrically insulating materials, such as Al 2 O 3 , AlNO, AlN, and vary from 250 ⁇ to 2000 ⁇ in thickness.
- Electric contact 68 is provided between one side of lead layer and longitudinal bias layer stack 64 and top shield 80 .
- MrW MR read track width ( ⁇ m)
- J MR current density passing through the MR device film (A/m 2 ),
- R SAL sheet resistance of the SAL
- R MR sheet resistance of the MR layer
- L SAL length of the SAL
- W MR electric trick width of the MR layer.
- An alternative approach taught in FIG. 2 is to electrically connect one end of the SAL to the MR element.
- the SAL layer keeps the same electrical potential as that of one terminal of the AMR device and is no longer electrically floating.
- the advantage of this approach is to eliminate the current shunting through the SAL while preventing the SAL from electrically floating. By doing this, we can effectively eliminate charges building up in the SAL so that the electric-pop noise in the MR device is prevented.
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Abstract
A magnetic reading head comprising: a bottom shield; a top shield; an AMR device with MR and SAL separated by a thin insulating layer; a first insulting gap layer between said bottom shield and said AMR; a second insulating gap layer between said AMR and said top shield; a conductive layer contact at one end region of said MR and SAL. Furthermore, magnetic reading heads with GMR device free of electric-pop noise also are disclosed.
Description
- This application is a divisional application of U.S. patent application Ser. No. 10/317,878, file on Dec. 12, 2002. U.S. patent application Ser. No. 10/317,878 is a divisional application of U.S. patent application Ser. No. 09/265,083, filed on Mar. 9, 1999, now issued as U.S. Pat. No. 6,583,971. U.S. patent application Ser. No. 10/317,878 and U.S. patent application Ser. No. 09/265,083 are incorporated herein by reference.
- 1. Field of the Invention
- The present invention generally relates to an active device capable of converting an electrical signal into a voltage, more specifically, to a magnetic recording head consisting of either an anisotropic magneto-resistive (hereinafter referred as AMR) or giant magneto-resistive (hereafter referred as GMR) sensor along with an insulation spacer and magnetic shields.
- 2. Description of the Related Art
- As is well known in the field, the insulating spacer in AMR/GMR recording heads is becoming thinner and thinner in order to increase a linear recording density. Inevitably, we are facing electric-pop noise resulting from the thinner spacer. For high manufacturing yield and reliability of electric and magnetic performance, such electric-pop noise must be eliminated.
- U.S. Pat. No. 3,864,751 entitled “Induced Bias Magneto-resistive Read Transducer” issued to Beaulier and Napela, on Feb. 4, 1975 proposed that a soft-adjacent magnetic transverse bias layer (hereinafter referred to as “SAL”) is isolated from a magneto-resistive device (referred to as “MR” hereinafter). The patent did not reveal any methods how to make it. Another key point is that the MR and SAL are electrically isolated. In the prior art described by Beaulieu et al., electric-pop noise is present if a thinner insulating spacer (<150 Å), such as A1203, is used. Otherwise, the devices would need a thicker SAL to bias the MR if a thicker insulator spacer (2-400 Å) were used. There are two problems associated with the latter case. Firstly, the SAL can not be easily saturated by a current in the MR and an antiferromagnetic pinning layer must be used to pin the SAL so that the SAL magnetization is perpendicular to the current direction. In this case, the device process becomes very complicated and it also renders designs less extendible to a narrower shield to shield spacing for higher density recording.
- The SAL has a function as a shunt bias layer in SAL biased AMR devices. When the MR and SAL are spaced by electric conducting materials, such as Ta, the SAL and MR devices have the same electric track width. These configurations have been disclosed in U.S. Pat. No. 4,663,685 issued in 1987, to C. Tsang, U.S. Pat. No. 4,639,806 issued in 1987 to T. Kira, T. Miyagachi, and U.S. Pat. No. 5,108,037 issued to M. Yoshikawa, M. T. Krounbi, O. Voegeli and P. Wang.
- Accordingly, one objective of this invention is to provide an AMR design with a thin insulating spacer free of electric-pop noise.
- Another objective is to provide a SAL biased AMR product using an insulated spacer.
- A further objective of this invention is to provide an electric active device free of electric-pop noise over an insulating spacer on the top of an electric conductor.
- Still another objective of this invention is to provide a design to eliminate electric-pop noise in GMR magnetic recording heads with a thin insulating spacer.
- In accordance with one aspect of the present invention, a magnetic reading device comprising:
- an anisotropic magnetoresistive (MR) sensing layer;
- a soft-adjacent magnetic transverse bias layer (SAL);
- an insulating layer arranged between said magnetoresistive layer and said magnetic transverse bias layer;
- conductive layer contacting electrically both said magnetosensitive layer and said magnetic bias layer at least one end region of said SAL element.
- In accordance with another aspect of the present invention, a magnetic reading device comprising:
- a first shield;
- a second shield;
- a GMR device;
- a first insulating gap layer between said GMR and one of said shields;
- a second insulating gap layer between said GMR and another of said two shields;
- a conductive layer contacting electrically said GMR device to either one of said shields.
- In accordance with a further aspect of the present invention, a hard disk driver is provided with the magnetoresistive device.
- Compared to the prior art by Tsang, Kire et al and Kroumbi et al, this invention provides an AMR sensor with much improved signal. The signal improvement can be as much as 90% provided that the same MR/SAL device and operating current are used for the device.
- Other objects, features and advantages of the present invention will become readily apparent from the following description taken in conjunction with the accompanying drawings.
- The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate presently preferred embodiments of the invention, and together with the general description given above and the detailed description of the preferred embodiments given below, serve to explain the principles of the invention.
-
FIG. 1 a is a diagram of a preferred embodiment of the invention, -
FIG. 1 b is a cross-section view taken along line AA indicated inFIG. 1 a, -
FIG. 2 is a diagram of an alternative embodiment of the invention, -
FIGS. 3 a-3 d show electric-pop test results before and after MR and SAL are connected by microfabrication, -
FIGS. 4 a-4 b show an extension to prevent a GMR device from electric-pop noise due to discharge between the GMR device and shields. - Embodiments according to the present invention will be described in the following.
-
FIG. 1 a is a diagram of a first preferred embodiment of the invention. As shown in this figure,MR layer 10 andSAL 30 are separated by a thininsulated spacer layer 20, and are electrically connected at the ends of the MR element. Anactive region 10 of the MR device could be either a NiFe film or a composite layer, such as TaN/NiFe/TaN. NiFe, thickness ranges from 50 to 400 Å.Side regions End regions end regions spacing layer 20 is made of insulating materials, such as Al2O3, AlON and SiO2, and the typical thickness of insulatingspacing layer 20 varies from 50 to 200 Å. Soft-adjacent layer (SAL) 30 can be made of NiFe, NiFeCr, NiFeRh. The moment ratio ofSAL 30 toMR layer 10 ranges from 0.6 to 1.0. - In
FIG. 1 a, longitudinal bias layer can be made of anti-ferromagnetic materials, such as NiMn, FeMn, PtPdMn, IrMn and PtMn. Lead layer can be made of Ta, W or Ta/Au/Ta. Longitudinal bias layer and lead layer extend coverage on top of theMR element 10 and electrically contact withMR element 10 throughside regions active region 10 as longitudinal bias layer and lead layer have much higher electric conductivity than the MR layer. - On the other hand, longitudinal bias layer and lead layer electrically contact with
SAL layer 30 through side surfaces 32 and 34, respectively. Therefore, the electric track width of the SAL element is the entire element width. - Now refer to
FIG. 1 b that shows cross-section view taken along line AA indicated inFIG. 1 a. Function ofinsulator films 50 is to prevent electric connection fromMR 10 toSAL 30. Numeral 60ABS designates an air-bearing surface (ABS). - In the following drawings, similar parts to those in
FIG. 1 are designated by the same numerals as those used inFIG. 1 .FIG. 2 shows an alternative embodiment of the present invention.MR layer 10 andSAL 30 are separated by a thininsulating spacer layer 20.MR layer 10 andSAL 30 are electrically connected at only one end region of the MR element. In this embodiment, no electric current passes through the SAL element. However, the whole SAL element is in an equal electric potential to that of one side of the MR element. One side region of the longitudinal bias layer and the leader layer does not electrically contact with a corresponding SAL end region.Insulator films 52 are electrically connected betweenMR layer 10 andSAL 30 at one end of the trilayer device. -
FIG. 3 shows test results of the electric-pop noise before and after connection ofMR layer 10 andSAL 30 under test conditions: trigger level=75 μV, threshold level=(Noise amplitude of Is=5 mA)+60 μV, and read current=12 mA. -
FIGS. 3 a and 3 b show electric-pop noise spectra of the device before edge shorting of the MR and SAL element, andFIGS. 3 c and 3 d show the same of the device after edge shorting of the MR and SAL element. -
FIG. 4 shows an extension to prevent a GMR device from electric-pop noise due to discharge between the GMR device and shields. -
FIG. 4 a is a diagram of a GMR device that is electrically shorted to a bottom shield to prevent electric-pop noise due to static discharge between the GMR device and a bottom shield. -
FIG. 4 b is a diagram of a GMR device that is electrically shorted to a top shield to prevent electric-pop noise due to static discharge between the GMR device and a top shield. - In
FIGS. 4 a and 4 b,reference numeral 60 designates a GMR active device, the GMR device including a spin-valve, GMR multilayer, and spin-dependent tunneling device, andnumerals bias layer stack 62 and thebottom shield 70. Bottom andtop shields Gaps Electric contact 68 is provided between one side of lead layer and longitudinalbias layer stack 64 andtop shield 80. - Operational principle of the present invention is explained as follows.
- Signal amplitude of the AMR device is given by equation:
- where:
- ΔVpp: peak-to-peak amplitude (V),
- MrW: MR read track width (μm),
- JMR: current density passing through the MR device film (A/m2),
- Δρ: magnetoresistive coefficient of resistivity of the MR layer (Ω.m),
voltage shunting factor, - RMR: sheet resistance of the MR layer (Ω),
- (RMR+RSAL): sheet resistance of the SAL layer (Ω), and
- (sin2θ−sin2θ0): sensitivity function of the MR device.
- For the same operating current I, there is a signal enhancement by a factor of square of (RMR+RSAL)/RSAL comparing an AMR device without a current flowing through SAL to that with a current shunting through the SAL. In a typical AMR device, the shunt factor RSAL/(RMR+RSAL) is as much as 0.7.
- In the case of a SAL electrically isolated from the MR element, the SAL is electrically floating, which could result in electric-pop noise due to static discharge between the MR and SAL. In the invention illustrated in
FIG. 1 , we let a small percentage of current flow through the SAL. The way to achieve it is to provide electric contact to the SAL at the end of the element. With such configuration, the SAL is no longer electrically floating as there is a small amount of current flowing through the SAL. The shunting factor is determined by equation:
where: - RSAL: sheet resistance of the SAL,
- RMR: sheet resistance of the MR layer,
- LSAL: length of the SAL, and
- WMR: electric trick width of the MR layer.
- We can tune the current ratio by simply adjusting element height and length. For reference, current MR/SAL sheet resistance ratio is about 3/7. We can get 2% of current flowing through the SAL by setting width of the MR element at 20 μm assuming that our physical read track width is at 1 μm. This shunt ratio renders such a device have much higher signal than that of conventional SAL-biased AMR heads with a conducting spacer.
- An alternative approach taught in
FIG. 2 is to electrically connect one end of the SAL to the MR element. In this case, the SAL layer keeps the same electrical potential as that of one terminal of the AMR device and is no longer electrically floating. The advantage of this approach is to eliminate the current shunting through the SAL while preventing the SAL from electrically floating. By doing this, we can effectively eliminate charges building up in the SAL so that the electric-pop noise in the MR device is prevented. - Similar concept is used to short an SV (spin valve) GMR device to either a top or bottom shield. By doing this, we can prevent the electric-pop noise due to static discharge between the GMR device and shields. It must be pointed out that such electric-pop noise is a fundamental technology challenge for future higher density recording.
- Additional advantages and modifications will readily occur to those skilled in the art. Therefore, the invention in its broader aspects is not limited to the specific details, and representative devices, shown and described herein. Accordingly, various modifications may be made without departing from the spirit or scope of the general inventive concept as defined by the appended claims and their equivalents.
Claims (3)
1. A method comprising:
connecting a longitudinal bias layer to one end of a GMR device;
connecting a lead layer to the other end of the GMR device;
insulating the GMR device from a first shield with a first insulating gap layer, wherein the GMR device is spaced apart from the first shield;
insulating the GMR device from a second shield with a second insulating gap layer, wherein the GMR device is spaced apart from the second shield; and
shorting the GMR device to the first shield with a conductive layer electrically contacting the GMR device and the first shield.
2. The method of claim 1 , wherein the conductive layer electrically contacts the longitudinal bias layer to the first shield.
3. The method of claim 1 , wherein the conductive layer electrically contacts the lead layer to the first shield.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/821,825 US20080019057A1 (en) | 1999-03-09 | 2007-06-26 | Elimination of electric-pop noise in MR/GMR device |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/265,083 US6583971B1 (en) | 1999-03-09 | 1999-03-09 | Elimination of electric-pop noise in MR/GMR device |
US10/317,878 US7256970B2 (en) | 1999-03-09 | 2002-12-12 | Elimination of electric-pop noise in MR/GMR device |
US11/821,825 US20080019057A1 (en) | 1999-03-09 | 2007-06-26 | Elimination of electric-pop noise in MR/GMR device |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/317,878 Division US7256970B2 (en) | 1999-03-09 | 2002-12-12 | Elimination of electric-pop noise in MR/GMR device |
Publications (1)
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US20080019057A1 true US20080019057A1 (en) | 2008-01-24 |
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Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/265,083 Expired - Fee Related US6583971B1 (en) | 1999-03-09 | 1999-03-09 | Elimination of electric-pop noise in MR/GMR device |
US10/317,878 Expired - Fee Related US7256970B2 (en) | 1999-03-09 | 2002-12-12 | Elimination of electric-pop noise in MR/GMR device |
US10/792,078 Expired - Fee Related US7158356B2 (en) | 1999-03-09 | 2004-03-03 | Elimination of electric-pop noise in a MR device |
US11/821,825 Abandoned US20080019057A1 (en) | 1999-03-09 | 2007-06-26 | Elimination of electric-pop noise in MR/GMR device |
Family Applications Before (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/265,083 Expired - Fee Related US6583971B1 (en) | 1999-03-09 | 1999-03-09 | Elimination of electric-pop noise in MR/GMR device |
US10/317,878 Expired - Fee Related US7256970B2 (en) | 1999-03-09 | 2002-12-12 | Elimination of electric-pop noise in MR/GMR device |
US10/792,078 Expired - Fee Related US7158356B2 (en) | 1999-03-09 | 2004-03-03 | Elimination of electric-pop noise in a MR device |
Country Status (1)
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US (4) | US6583971B1 (en) |
Families Citing this family (10)
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US6583971B1 (en) * | 1999-03-09 | 2003-06-24 | Sae Magnetics (Hk) Ltd. | Elimination of electric-pop noise in MR/GMR device |
US6771473B2 (en) * | 2001-01-22 | 2004-08-03 | Matsushita Electric Industrial Co., Ltd. | Magnetoresistive element and method for producing the same |
JP3835237B2 (en) * | 2001-10-09 | 2006-10-18 | ソニー株式会社 | Head drum device and magnetic recording / reproducing device |
US20030169539A1 (en) * | 2002-03-07 | 2003-09-11 | International Business Machines Corporation | Electrostatic discharge insensilive recording head with a high-resistance gap layer |
US7382585B1 (en) | 2005-09-30 | 2008-06-03 | Storage Technology Corporation | Magnetic head having AMR reader, writer, and GMR reader |
US7375931B2 (en) * | 2005-09-30 | 2008-05-20 | Hitachi Global Storage Technologies Netherlands, B.V. | Magnetic recording head with ESD shunt trace |
US7453671B1 (en) | 2005-10-31 | 2008-11-18 | Stoarge Technology Corporation | Magnetic head having a pair of magneto-resistive (MR) readers of the same type with each reader being tuned differently |
US7773349B2 (en) * | 2006-02-10 | 2010-08-10 | Hitachi Global Storage Technologies Netherlands B.V. | Tunnel MR head with long stripe height sensor stabilized through the shield |
US8223462B2 (en) * | 2008-05-30 | 2012-07-17 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetoresistive sensor design for signal noise pickup reduction for use with deep gap electrostatic discharge shunt |
US8472146B2 (en) * | 2010-08-27 | 2013-06-25 | HGST Netherlands B.V. | Current perpendicular magnetoresistive sensor with a dummy shield for capacitance balancing |
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Also Published As
Publication number | Publication date |
---|---|
US7158356B2 (en) | 2007-01-02 |
US7256970B2 (en) | 2007-08-14 |
US20040169966A1 (en) | 2004-09-02 |
US20030103300A1 (en) | 2003-06-05 |
US6583971B1 (en) | 2003-06-24 |
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