US20070021527A1 - Device for dental applications - Google Patents
Device for dental applications Download PDFInfo
- Publication number
- US20070021527A1 US20070021527A1 US11/364,278 US36427806A US2007021527A1 US 20070021527 A1 US20070021527 A1 US 20070021527A1 US 36427806 A US36427806 A US 36427806A US 2007021527 A1 US2007021527 A1 US 2007021527A1
- Authority
- US
- United States
- Prior art keywords
- weight
- parts
- present
- acid
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000203 mixture Substances 0.000 claims abstract description 92
- 239000000178 monomer Substances 0.000 claims abstract description 79
- 239000002904 solvent Substances 0.000 claims abstract description 47
- 238000004132 cross linking Methods 0.000 claims description 28
- 238000006116 polymerization reaction Methods 0.000 claims description 18
- 239000003999 initiator Substances 0.000 claims description 16
- AMFGWXWBFGVCKG-UHFFFAOYSA-N Panavia opaque Chemical compound C1=CC(OCC(O)COC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCC(O)COC(=O)C(C)=C)C=C1 AMFGWXWBFGVCKG-UHFFFAOYSA-N 0.000 claims description 14
- 229930006711 bornane-2,3-dione Natural products 0.000 claims description 11
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 claims description 9
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 claims description 6
- SFCYMBAPKIRRBR-UHFFFAOYSA-N 4-(dimethylazaniumyl)-2-ethylbenzoate Chemical group CCC1=CC(N(C)C)=CC=C1C(O)=O SFCYMBAPKIRRBR-UHFFFAOYSA-N 0.000 claims description 5
- 125000002362 bornane-2,3-dione group Chemical group 0.000 claims description 5
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims description 3
- IEVADDDOVGMCSI-UHFFFAOYSA-N 2-hydroxybutyl 2-methylprop-2-enoate Chemical compound CCC(O)COC(=O)C(C)=C IEVADDDOVGMCSI-UHFFFAOYSA-N 0.000 claims description 3
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 claims description 3
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 claims description 3
- 239000001294 propane Substances 0.000 claims description 2
- 239000011350 dental composite resin Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 97
- 238000005530 etching Methods 0.000 abstract description 72
- 150000007522 mineralic acids Chemical class 0.000 abstract description 64
- 150000007524 organic acids Chemical class 0.000 abstract description 64
- 239000002131 composite material Substances 0.000 abstract description 62
- 239000000463 material Substances 0.000 abstract description 48
- 210000000988 bone and bone Anatomy 0.000 abstract description 42
- 238000000034 method Methods 0.000 abstract description 35
- 239000004094 surface-active agent Substances 0.000 abstract description 21
- 239000004840 adhesive resin Substances 0.000 abstract description 5
- 229920006223 adhesive resin Polymers 0.000 abstract description 5
- 239000003431 cross linking reagent Substances 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 136
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 63
- 210000004268 dentin Anatomy 0.000 description 28
- -1 meta-phthalic acid Chemical compound 0.000 description 22
- 239000011347 resin Substances 0.000 description 19
- 229920005989 resin Polymers 0.000 description 19
- 239000000853 adhesive Substances 0.000 description 18
- 230000001070 adhesive effect Effects 0.000 description 18
- 239000003795 chemical substances by application Substances 0.000 description 18
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 17
- 238000009472 formulation Methods 0.000 description 14
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 14
- 210000001519 tissue Anatomy 0.000 description 14
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 12
- 239000000047 product Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 210000003298 dental enamel Anatomy 0.000 description 10
- 235000019441 ethanol Nutrition 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 9
- 239000008188 pellet Substances 0.000 description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
- 239000007767 bonding agent Substances 0.000 description 8
- 239000011159 matrix material Substances 0.000 description 8
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 230000001143 conditioned effect Effects 0.000 description 7
- 229910017604 nitric acid Inorganic materials 0.000 description 7
- 230000035515 penetration Effects 0.000 description 7
- 239000011775 sodium fluoride Substances 0.000 description 7
- 235000013024 sodium fluoride Nutrition 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- VNQXSTWCDUXYEZ-UHFFFAOYSA-N 1,7,7-trimethylbicyclo[2.2.1]heptane-2,3-dione Chemical compound C1CC2(C)C(=O)C(=O)C1C2(C)C VNQXSTWCDUXYEZ-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 239000002250 absorbent Substances 0.000 description 6
- 230000002745 absorbent Effects 0.000 description 6
- 150000001298 alcohols Chemical class 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000002736 nonionic surfactant Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000001384 succinic acid Substances 0.000 description 6
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 235000014113 dietary fatty acids Nutrition 0.000 description 5
- 239000000194 fatty acid Substances 0.000 description 5
- 229930195729 fatty acid Natural products 0.000 description 5
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 5
- 235000021317 phosphate Nutrition 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 229920000742 Cotton Polymers 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000004026 adhesive bonding Methods 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
- 235000011187 glycerol Nutrition 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- 229910000497 Amalgam Inorganic materials 0.000 description 3
- 238000012935 Averaging Methods 0.000 description 3
- ZNZYKNKBJPZETN-WELNAUFTSA-N Dialdehyde 11678 Chemical compound N1C2=CC=CC=C2C2=C1[C@H](C[C@H](/C(=C/O)C(=O)OC)[C@@H](C=C)C=O)NCC2 ZNZYKNKBJPZETN-WELNAUFTSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 3
- 150000001299 aldehydes Chemical class 0.000 description 3
- 125000000129 anionic group Chemical group 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 3
- 229910052586 apatite Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 239000003093 cationic surfactant Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000805 composite resin Substances 0.000 description 3
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000006260 foam Substances 0.000 description 3
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 3
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical class [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- RPVVMXMIPQHORV-UHFFFAOYSA-N 2-(dimethylamino)-3-ethylbenzoic acid Chemical compound CCC1=CC=CC(C(O)=O)=C1N(C)C RPVVMXMIPQHORV-UHFFFAOYSA-N 0.000 description 2
- 229920000536 2-Acrylamido-2-methylpropane sulfonic acid Polymers 0.000 description 2
- XHZPRMZZQOIPDS-UHFFFAOYSA-N 2-Methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(C)(C)NC(=O)C=C XHZPRMZZQOIPDS-UHFFFAOYSA-N 0.000 description 2
- 229940095095 2-hydroxyethyl acrylate Drugs 0.000 description 2
- 229940044192 2-hydroxyethyl methacrylate Drugs 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- SEILKFZTLVMHRR-UHFFFAOYSA-N 2-phosphonooxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOP(O)(O)=O SEILKFZTLVMHRR-UHFFFAOYSA-N 0.000 description 2
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910001020 Au alloy Inorganic materials 0.000 description 2
- 102000008186 Collagen Human genes 0.000 description 2
- 108010035532 Collagen Proteins 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- 208000002599 Smear Layer Diseases 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 239000001506 calcium phosphate Substances 0.000 description 2
- 229910000389 calcium phosphate Inorganic materials 0.000 description 2
- 235000011010 calcium phosphates Nutrition 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 239000004568 cement Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 229920001436 collagen Polymers 0.000 description 2
- 230000002860 competitive effect Effects 0.000 description 2
- MLIREBYILWEBDM-UHFFFAOYSA-N cyanoacetic acid Chemical compound OC(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-N 0.000 description 2
- SIEILFNCEFEENQ-UHFFFAOYSA-N dibromoacetic acid Chemical compound OC(=O)C(Br)Br SIEILFNCEFEENQ-UHFFFAOYSA-N 0.000 description 2
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 2
- 229940093476 ethylene glycol Drugs 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 239000003178 glass ionomer cement Substances 0.000 description 2
- 239000003353 gold alloy Substances 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 229910052588 hydroxylapatite Inorganic materials 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 229940098895 maleic acid Drugs 0.000 description 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical class O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- XYJRXVWERLGGKC-UHFFFAOYSA-D pentacalcium;hydroxide;triphosphate Chemical compound [OH-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O XYJRXVWERLGGKC-UHFFFAOYSA-D 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229910052573 porcelain Inorganic materials 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 102000004169 proteins and genes Human genes 0.000 description 2
- 108090000623 proteins and genes Proteins 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 2
- 150000003871 sulfonates Chemical class 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- HFVMEOPYDLEHBR-UHFFFAOYSA-N (2-fluorophenyl)-phenylmethanol Chemical compound C=1C=CC=C(F)C=1C(O)C1=CC=CC=C1 HFVMEOPYDLEHBR-UHFFFAOYSA-N 0.000 description 1
- LGPAKRMZNPYPMG-UHFFFAOYSA-N (3-hydroxy-2-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OC(CO)COC(=O)C=C LGPAKRMZNPYPMG-UHFFFAOYSA-N 0.000 description 1
- VQHWAOZYKVGMQX-UHFFFAOYSA-N (7,7-dimethyl-2,3-dioxo-4-bicyclo[2.2.1]heptanyl)methanesulfonic acid Chemical compound C1CC2(CS(O)(=O)=O)C(=O)C(=O)C1C2(C)C VQHWAOZYKVGMQX-UHFFFAOYSA-N 0.000 description 1
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 1
- ORTVZLZNOYNASJ-UPHRSURJSA-N (z)-but-2-ene-1,4-diol Chemical compound OC\C=C/CO ORTVZLZNOYNASJ-UPHRSURJSA-N 0.000 description 1
- 229940058015 1,3-butylene glycol Drugs 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- BVQVLAIMHVDZEL-UHFFFAOYSA-N 1-phenyl-1,2-propanedione Chemical compound CC(=O)C(=O)C1=CC=CC=C1 BVQVLAIMHVDZEL-UHFFFAOYSA-N 0.000 description 1
- IVFGIXMLURJXBZ-UHFFFAOYSA-N 1-phosphonopropylphosphonic acid Chemical compound CCC(P(O)(O)=O)P(O)(O)=O IVFGIXMLURJXBZ-UHFFFAOYSA-N 0.000 description 1
- BRRSNXCXLSVPFC-UHFFFAOYSA-N 2,3,4-Trihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C(O)=C1O BRRSNXCXLSVPFC-UHFFFAOYSA-N 0.000 description 1
- OWPUOLBODXJOKH-UHFFFAOYSA-N 2,3-dihydroxypropyl prop-2-enoate Chemical compound OCC(O)COC(=O)C=C OWPUOLBODXJOKH-UHFFFAOYSA-N 0.000 description 1
- UFBJCMHMOXMLKC-UHFFFAOYSA-N 2,4-dinitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O UFBJCMHMOXMLKC-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- JDKSTARXLKKYPS-UHFFFAOYSA-N 2-[10-(2-methylprop-2-enoyloxy)decyl]propanedioic acid Chemical compound CC(=C)C(=O)OCCCCCCCCCCC(C(O)=O)C(O)=O JDKSTARXLKKYPS-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- POLZHVHESHDZRD-UHFFFAOYSA-N 2-hydroxyethyl 2-methylprop-2-enoate;phosphoric acid Chemical compound OP(O)(O)=O.CC(=C)C(=O)OCCO POLZHVHESHDZRD-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- JTQXJDWMNNIVRS-UHFFFAOYSA-N 2-methylpent-2-enoyl chloride Chemical compound CCC=C(C)C(Cl)=O JTQXJDWMNNIVRS-UHFFFAOYSA-N 0.000 description 1
- QWGRWMMWNDWRQN-UHFFFAOYSA-N 2-methylpropane-1,3-diol Chemical compound OCC(C)CO QWGRWMMWNDWRQN-UHFFFAOYSA-N 0.000 description 1
- UDXXYUDJOHIIDZ-UHFFFAOYSA-N 2-phosphonooxyethyl prop-2-enoate Chemical compound OP(O)(=O)OCCOC(=O)C=C UDXXYUDJOHIIDZ-UHFFFAOYSA-N 0.000 description 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- AEDQNOLIADXSBB-UHFFFAOYSA-N 3-(dodecylazaniumyl)propanoate Chemical compound CCCCCCCCCCCCNCCC(O)=O AEDQNOLIADXSBB-UHFFFAOYSA-N 0.000 description 1
- HLHNOIAOWQFNGW-UHFFFAOYSA-N 3-bromo-4-hydroxybenzonitrile Chemical compound OC1=CC=C(C#N)C=C1Br HLHNOIAOWQFNGW-UHFFFAOYSA-N 0.000 description 1
- YYPNJNDODFVZLE-UHFFFAOYSA-N 3-methylbut-2-enoic acid Chemical compound CC(C)=CC(O)=O YYPNJNDODFVZLE-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- SBVKVAIECGDBTC-UHFFFAOYSA-N 4-hydroxy-2-methylidenebutanamide Chemical compound NC(=O)C(=C)CCO SBVKVAIECGDBTC-UHFFFAOYSA-N 0.000 description 1
- BTJIUGUIPKRLHP-UHFFFAOYSA-N 4-nitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1 BTJIUGUIPKRLHP-UHFFFAOYSA-N 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- SERIZWCPINYSDI-UHFFFAOYSA-N 5-hydroxy-2-methylidenepentanamide Chemical compound NC(=O)C(=C)CCCO SERIZWCPINYSDI-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229920000858 Cyclodextrin Polymers 0.000 description 1
- FBPFZTCFMRRESA-KVTDHHQDSA-N D-Mannitol Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KVTDHHQDSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000001116 FEMA 4028 Substances 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- DHCLVCXQIBBOPH-UHFFFAOYSA-N Glycerol 2-phosphate Chemical compound OCC(CO)OP(O)(O)=O DHCLVCXQIBBOPH-UHFFFAOYSA-N 0.000 description 1
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- 229930195725 Mannitol Natural products 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- GKNOPCPPOFUNKA-UHFFFAOYSA-N OP(O)(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O Chemical compound OP(O)(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O GKNOPCPPOFUNKA-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 241000183024 Populus tremula Species 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 240000008042 Zea mays Species 0.000 description 1
- 235000005824 Zea mays ssp. parviglumis Nutrition 0.000 description 1
- 235000002017 Zea mays subsp mays Nutrition 0.000 description 1
- CIRQJCCJCRSUAH-UHFFFAOYSA-N [2,2-bis(2-methylprop-2-enoyloxymethyl)-3-phosphonooxypropyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(COC(=O)C(C)=C)(COC(=O)C(C)=C)COP(O)(O)=O CIRQJCCJCRSUAH-UHFFFAOYSA-N 0.000 description 1
- GQPVFBDWIUVLHG-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)COC(=O)C(C)=C GQPVFBDWIUVLHG-UHFFFAOYSA-N 0.000 description 1
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 1
- FJNDADFZGJTPRU-UHFFFAOYSA-N [2-(phosphonooxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COP(O)(=O)O)(COC(=O)C=C)COC(=O)C=C FJNDADFZGJTPRU-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 150000008055 alkyl aryl sulfonates Chemical class 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- GUBGYTABKSRVRQ-ASMJPISFSA-N alpha-maltose Chemical compound O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CO)O[C@@H]1O[C@@H]1[C@@H](CO)O[C@H](O)[C@H](O)[C@H]1O GUBGYTABKSRVRQ-ASMJPISFSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- WHGYBXFWUBPSRW-FOUAGVGXSA-N beta-cyclodextrin Chemical compound OC[C@H]([C@H]([C@@H]([C@H]1O)O)O[C@H]2O[C@@H]([C@@H](O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O[C@H]3O[C@H](CO)[C@H]([C@@H]([C@H]3O)O)O3)[C@H](O)[C@H]2O)CO)O[C@@H]1O[C@H]1[C@H](O)[C@@H](O)[C@@H]3O[C@@H]1CO WHGYBXFWUBPSRW-FOUAGVGXSA-N 0.000 description 1
- 235000011175 beta-cyclodextrine Nutrition 0.000 description 1
- 229960004853 betadex Drugs 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- ZLMKQJQJURXYLC-UHFFFAOYSA-N bis(2-ethylhexoxy)-oxophosphanium Chemical compound CCCCC(CC)CO[P+](=O)OCC(CC)CCCC ZLMKQJQJURXYLC-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
- RZKROFZXCINABH-UHFFFAOYSA-N butane-2,3-dione;1,2-diphenylethane-1,2-dione Chemical compound CC(=O)C(C)=O.C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 RZKROFZXCINABH-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 235000005822 corn Nutrition 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005115 demineralization Methods 0.000 description 1
- 230000002328 demineralizing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000000586 desensitisation Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- BVXOPEOQUQWRHQ-UHFFFAOYSA-N dibutyl phosphite Chemical compound CCCCOP([O-])OCCCC BVXOPEOQUQWRHQ-UHFFFAOYSA-N 0.000 description 1
- 229960005215 dichloroacetic acid Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- XQRLCLUYWUNEEH-UHFFFAOYSA-L diphosphonate(2-) Chemical compound [O-]P(=O)OP([O-])=O XQRLCLUYWUNEEH-UHFFFAOYSA-L 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N ethyl formate Chemical compound CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 230000001815 facial effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- AWUCVROLDVIAJX-UHFFFAOYSA-N glycerol 1-phosphate Chemical compound OCC(O)COP(O)(O)=O AWUCVROLDVIAJX-UHFFFAOYSA-N 0.000 description 1
- 229960004275 glycolic acid Drugs 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- KMXTYZBQPJXGNK-UHFFFAOYSA-N hexadecan-1-amine;hydron;fluoride Chemical class F.CCCCCCCCCCCCCCCCN KMXTYZBQPJXGNK-UHFFFAOYSA-N 0.000 description 1
- TZMQHOJDDMFGQX-UHFFFAOYSA-N hexane-1,1,1-triol Chemical compound CCCCCC(O)(O)O TZMQHOJDDMFGQX-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229960000448 lactic acid Drugs 0.000 description 1
- 150000002632 lipids Chemical class 0.000 description 1
- 239000000594 mannitol Substances 0.000 description 1
- 235000010355 mannitol Nutrition 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 230000001089 mineralizing effect Effects 0.000 description 1
- JDEJGVSZUIJWBM-UHFFFAOYSA-N n,n,2-trimethylaniline Chemical compound CN(C)C1=CC=CC=C1C JDEJGVSZUIJWBM-UHFFFAOYSA-N 0.000 description 1
- XUQIDBSIIKXTTI-UHFFFAOYSA-N n,n-bis(2-hydroxyethyl)prop-2-enamide Chemical compound OCCN(CCO)C(=O)C=C XUQIDBSIIKXTTI-UHFFFAOYSA-N 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- UWJJYHHHVWZFEP-UHFFFAOYSA-N pentane-1,1-diol Chemical compound CCCCC(O)O UWJJYHHHVWZFEP-UHFFFAOYSA-N 0.000 description 1
- ROTJZTYLACIJIG-UHFFFAOYSA-N pentane-1,3,5-tricarboxylic acid Chemical compound OC(=O)CCC(C(O)=O)CCC(O)=O ROTJZTYLACIJIG-UHFFFAOYSA-N 0.000 description 1
- 150000002976 peresters Chemical class 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical class OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 230000002980 postoperative effect Effects 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- 150000004023 quaternary phosphonium compounds Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 235000020357 syrup Nutrition 0.000 description 1
- 239000006188 syrup Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 150000003513 tertiary aromatic amines Chemical class 0.000 description 1
- 150000004026 tertiary sulfonium compounds Chemical class 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000001225 therapeutic effect Effects 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 229960004319 trichloroacetic acid Drugs 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-O triethanolammonium Chemical compound OCC[NH+](CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-O 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- UZNHKBFIBYXPDV-UHFFFAOYSA-N trimethyl-[3-(2-methylprop-2-enoylamino)propyl]azanium;chloride Chemical compound [Cl-].CC(=C)C(=O)NCCC[N+](C)(C)C UZNHKBFIBYXPDV-UHFFFAOYSA-N 0.000 description 1
- 210000005239 tubule Anatomy 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- 239000002888 zwitterionic surfactant Substances 0.000 description 1
Images
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/30—Compositions for temporarily or permanently fixing teeth or palates, e.g. primers for dental adhesives
Definitions
- the present invention relates to dental etching solutions, reactive monomeric based adhesive compositions, packaged pharmaceuticals that contain the etch solution and adhesive composition and methods for their use. More specifically, the present invention relates to a superior two step process, whereby an etch solution is applied to a tooth and subsequently causes the dentin to become receptive to adhesive compositions. After the reaction has occurred, the adhesive composition is applied to the tooth and the tooth is readied for a restorative material.
- an etch solution is utilized to remove the smear layer and demineralize the surface of the dental tissue.
- the etch solution can alter wettability or chemical reactivity of the pretreated dentin, prior to applying a bonding adhesive agent which is generally a polymerizable monomer.
- Polymerization of the bonding agent facilitates the bonding agent to adhere to the dentin.
- the interaction(s) between the bonding agent and the treated substrate is not entirely understood and is believed to be related to chemical, mechanical, interfacial diffusion or a combination of all three physical processes. Polymerization of most bonding adhesives provide an approximately 5 micron thick hybrid layer that is formed of part resin and part dentin.
- the depth and effectiveness of the penetration of the bonding agent is an important and often critical aspect to the adhesion between the bonding agent and substrate.
- This hybrid layer is believed to contain little or no apatite and the adhesion to dentin is believed to occur through collagen with the bonding agent.
- the techniques and/or products currently available for pretreating the dental or bone tissue or adhering a restorative material to the bone or dental tissue have limitations.
- the bonding agents should effectively seal the dentin tubules to prevent post operative sensitivity and protect the pulp. Additionally, the bonds should last the lifetime of the restorative correction and be durable under a variety of conditions.
- the present invention provides a unique unexpectedly simple and easy to use bone, i.e., tooth, etch solution, a curable adhesive bonding composition, packaged products containing either or both of the compositions, and methods to use the compositions of the invention.
- the systems of the present invention can be self-cured or can be treated with light energy to facilitate curing.
- the present invention provides distinct advantages over presently known etching/bonding systems.
- the present etching solution is not required to be rinsed off, removed and/or dried prior to the application of a bonding composition.
- Most commercially available bonding systems require that the etch solution is rinsed off and the substrate dried prior to the application of the bonding resin.
- currently available bonding systems include both an etch solution and the bonding resin as a one component application. Often times, the one component application systems do not bond well to the bone substrate because the etch solution interferes with the ability of the bonding resin to adhere to the substrate.
- the present invention provides an etching solution capable of etching bone.
- the bone is teeth and more specifically, the substrate is dentin, enamel, gum, amalgam, metal, porcelain or plastic.
- the etching solution includes an inorganic acid, an organic acid, a surfactant, with the remainder being water.
- the inorganic acid is present in an amount of from about 1 to about 10 parts by weight.
- the organic acid is present in amount from about 0.01 to about 20 parts by weight.
- the surfactant is present in an amount from about 0.01 to about 10 parts by weight and the water is present in an amount to equal a total of 100 parts by weight of all components.
- the present invention provides etching solutions that include an inorganic acid, an organic acid, a solvent and water.
- the inorganic acid is present in an amount of from about 1 to about 10 parts by weight.
- the organic acid is present in amount from about 0.01 to about 20 parts by weight.
- the solvent is present in an amount from about 1 to about 50 parts by weight, with the water being present in an amount to equal a total of 100 parts by weight of all components.
- the etching solution consists essentially of an inorganic acid, an organic acid, and water.
- the inorganic acid is present in an amount of from about 1 to about 10 parts by weight
- the organic acid is present in an amount from about 0.01 to about 20 parts by weight with the water being present in an amount to equal a total of 100 parts by weight of all components.
- the etching solution consists essentially of an inorganic acid, an organic acid, a solvent and water.
- the inorganic acid is present in an amount of from about 1 to about 10 parts by weight and the organic acid is present in an amount from about 0.01 to about 20 parts by weight.
- the solvent is present in an amount from about 1 to about 50 parts by weight, with the water being present in an amount to equal a total of 100 parts by weight of all components.
- Suitable components in the etching solution include, for example, nitric acid and succinic or citric acid, or combinations thereof, organic solvents such as acetone or lower weight alcohols, and/or various surfactants.
- the present invention also pertains to curable composites that include (a) at least one ethylenically unsaturated functional monomer, (b) at least one polyethylenically unsaturated functional crosslinking monomer, (c) a (optionally) fluoride ion agent and (d) a solvent. More specifically, the ethylenically unsaturated monomer(s) of (a) is present in an amount of from about 0.5 to about 25 parts by weight. The polyethylenically unsaturated crosslinking monomer(s) of (b) is present in an amount from about 5 to about 40 parts by weight. The optional fluoride agent is present in an amount from about 0.5 to about 5 parts by weight, with the solvent being present in an amount to equal a total of 100 parts by weight of all components.
- the functional monomer (a) of the curable composition is present in an amount between about 10 parts by weight and about 20 parts by weight.
- the polyethylenically unsaturated crosslinking monomer (b) is present in an amount between about 18 parts by weight and about 38 parts by weight, and the optional fluoride ion agent is present in an amount between about 0.1 parts by weight and about 10 parts by weight.
- Suitable examples of functional monomer(s) (a) include, for example, hydroxyethylmethacrylate, hydroxypropylmethacrylate, and hydroxybutylmethacrylate.
- Exemplary polyethylenically unsaturated crosslinking monomer(s) (b) include a mixtures of PMGDM and bis-GMA.
- the optional fluoride ion agent is any source that provides a fluoride ion such as sodium fluoride.
- the curable composition the functional monomer (a) is hydroxyethylmethacrylate
- the polyethylenically unsaturated crosslinking monomer (b) is a mixture of PMGDM and bis-GMA
- the fluoride ion agent is sodium fluoride. More particularly, the functional monomer (a) is present in an amount of about 15 parts by weight, the first polyethylenically unsaturated crosslinking monomer, PMGDM, is present in an amount of about 20 parts by weight, the second polyethylenically unsaturated crosslinking monomer, bis-GMA, is present in an amount of about 8 parts by weight and the optional sodium fluoride is present in an amount between about 1 and 2 parts by weight.
- the curable composition generally includes a photoinitiator system.
- the photoinitiator system includes a light-sensitive initiator and a polymerization accelerator.
- a suitable light-sensitive initiator is camphorquinone (CQ) and a suitable polymerization accelerator is ethyl N,N-dimethyl-4-aminobenzoic acid or ethyldimethylaminobenzoic acid (EDMAB).
- the present invention further provides packaged formulations of the etch solutions, the curable compositions, combinations thereof.
- the present invention also provides method to use the etch solutions, alone or in combination with the curable compositions of the invention. It should be understood that the etch solutions of the present invention can be used with those commercially available bonding resins.
- the method of the invention involves applying an effective amount of an etching solution to the substrate.
- the etch solution can be any of the solutions described herein, and for example, can include an inorganic acid, an organic acid, a solvent and water.
- the excess etching solution is removed such that the substrate remains moist. This can be easily accomplished by touching an absorbent material to the surface and blotting the excess from the surface.
- a curable composite is applied to the moist substrate, i.e., a tooth.
- FIG. 1 is a cross sectional photograph of a tooth treated with an etch solution of the present invention followed by subsequent treatment with an adhesive bonding composition of the invention.
- the tooth was placed in 0.5% fushin dye for 24 hours.
- the photograph demonstrates that no dye penetrated along the margins treated with the etch and bonding composite of the invention.
- FIG. 2 is a second cross sectional photograph of the tooth depicted in FIG. 1 with the root of the tooth removed.
- FIG. 3 is a cross sectional photograph of a tooth treated with “One Up Bond”, a commercially available etch/bonding system.
- the arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment.
- FIG. 4 is a cross sectional photograph of a tooth treated with “Prompt-L-Pop, a commercially available etch/bonding system.
- the arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment.
- FIG. 5 is a cross sectional photograph of a tooth treated with “Clearfil SE Bond”, a commercially available etch/bonding system.
- the arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment.
- the present invention provides a unique unexpectedly simple and easy to use bone, i.e., tooth, etch solution, a curable adhesive bonding composition, packaged products containing either or both of the compositions, and methods to use the compositions of the invention.
- the present invention provides distinct advantages over presently known etching/bonding systems as described throughout the specification.
- the present invention provides an etching solution capable of etching bone.
- the bone substrate is a tooth and more specifically, the substrate is dentin, enamel, gum, amalgam, metal, porcelain or plastic.
- the etching solution includes an inorganic acid, an organic acid, a surfactant, with the remainder of the solution being water.
- the inorganic acid is present in the etch solution in an amount of from about 1 to about 10 parts by weight. Suitable ranges of inorganic acid include from about 2 to about 9 parts by weight, about 4 to about 8 parts by weight, and about 5 to about 7 parts by weight, i.e. about 6 to about 8 parts by weight.
- the organic acid is present in the etch solution in amount from about 0.01 to about 20 parts by weight. Additional suitable ranges of the organic acid include from about 1 to about 15 parts by weight, 4 to about 12 parts by weight and from about 6 to about 10 parts by weight.
- the surfactant in the etch solution is present in an amount from about 0.01 to about 10 parts by weight, from about 0.1 to about 5 parts by weight or from about 0.5 to about 2.5 parts by weight.
- the water in the etch solution is present in an amount to equal a total of 100 parts by weight of all components.
- the present invention provides etching solutions that include an inorganic acid, an organic acid, a solvent and water.
- the inorganic acid and the organic acid are present in the parts by weight as described above.
- the solvent is present in an amount from about 1 to about 50 parts by weight, from about 5 to about 40 parts by weight or from about 10 to about 30 parts by weight.
- the water in the etch solution is present in an amount to equal a total of 100 parts by weight of all components.
- the present invention provides etching solutions that include an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water.
- the inorganic acid and the organic acid are present in the parts described above.
- the ethylenically unsaturated monomer is present in an amount from about 0.1 to about 10 parts by weight, from about 1.0 to about 5 parts by weight, or from about 2 to about 4 parts by weight, e.g., from about 2 to about 7 parts by weight, e.g., 2.5 parts by weight.
- the water in the etch solution is present in an amount to equal a total of 100 parts by weight of all components.
- the etching solution consists essentially of an inorganic acid, an organic acid, and water.
- the inorganic acid and organic acid are present in the parts by weight as described above with the water being present in an amount to equal a total of 100 parts by weight of all components.
- the etching solution consists essentially of an inorganic acid, an organic acid, a solvent and water.
- the inorganic acid, the organic acid and the solvent are present in the parts by weight as described above, with the water being present in an amount to equal a total of 100 parts by weight of all components.
- the present invention provides etching solutions that consists essentially of an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water.
- the inorganic acid, the organic acid ethylenically unsaturated monomer are present in an amount as described above, with the water being present in an amount to equal a total of 100 parts by weight of all components.
- the invention pertains to etching solutions that include, or consist essentially of, nitric acid and an organic solvent.
- Bone is a complex mineralizing system composed of an inorganic or mineral phase, an organic matrix phase, and water.
- the inorganic mineral phase is composed mainly of crystalline calcium phosphate salts while the organic matrix phase consists mostly of collagen and other noncollagenous proteins.
- etching solution or “etch solution” are recognized in the art and are intended to include the compositions of the invention that superficially dissolve or modify bone or bone-like substrates.
- the etch solution removes the smear layer and facilitates demineralization of the surface of the dental tissue.
- the etch solutions of the present invention include several components.
- Suitable inorganic acids include nitric acid, sulfuric acid, hydrochloric acid, phosphoric acid and mixtures thereof.
- the inorganic acid is nitric acid.
- Nitric acid is generally available as a 70 percent aqueous solution and is utilized at this concentration throughout this application.
- Sulfuric acid, hydrochloric acid and phosphoric acid are also available as 95-98 percent, 37 percent and 85 percent aqueous solutions, respectively, and are utilized at these concentrations throughout the application. Where noted as parts by weight, this refers to using the concentrated inorganic acid, at the respective commercial concentration, on a weight basis.
- etch solutions that contain phosphoric acid do not work well in dental applications if the solution is not first rinsed from the substrate to which it is applied. This is due to the precipitation of calcium phosphate from the etch solution that is generated by the reaction of phosphoric acid with the calcium of the bone substrate.
- the present invention avoids such precipitation by either utilizing a different inorganic acid or by using an organic solvent, surfactant and/or organic acid which inhibit the deposition of calcium phosphate onto the cleaned bone substrate surface.
- Suitable organic acids include lactic acid, pyruvic acid, glycolic acid, chloroacetic acid, dichloroacetic acid, trichloroacetic acid, cyanoacetic acid, tartaric acid, succinic acid, glutaric acid, maleic acid, fumaric acid, malonic acid, citraconic acid, ortho-phthalic acid, meta-phthalic acid, para-phthalic acid, citric acid, tricarballyic acid, 1,3,5-pentanetricarboxylic acid and trimellitic acid and mixtures thereof.
- organic acids include 2-acrylamido-2-methylpropane sulfonic acid, benzenesulfonic acid, benzoic acid, bromoacetic acid, 10-camphorquinonesulfonic acid, 10-camphorsulfonic acid, dibromoacetic acid, 2,4-dinitrophenol, formic acid, fumaric acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, maleic-acid, 2-naphthalene sulfonic acid, nitric acid, oxalic acid, p-nitrophenol, phenol, phosphorous acid esters (such as 2,2′-bis(a-methacryloxy-b-hydroxypropoxyphenyl)propane diphosphonate (Bis-GMA diphosphonate), dibutyl phosphite, di-2-ethyl-hexyl phosphate, di-2-ethyl-hexyl phosphite, hydroxyethyl methacrylate mono
- surfactant is recognized in the relevant art to include those compounds which modify the nature of surfaces, e.g. reducing the surface tension of water.
- Surfactants are generally classified into four types: cationic (e.g. modified onium salts, where part of the molecule is hydrophilic and the other consists of straight or branches long hydrocarbon chains such as hexadecyltrimethyl bromide), anionic, also known as amphiphatic agents (e.g., alkyl or aryl or alkylarylsulfonates, carboxylates, phosphates), nonionic (e.g., polyethylene oxides, alcohols) and ampholytic or amphoteric (e.g. dodecyl-beta-alanine, such that the surfactant contains a zwitterionic group).
- cationic e.g. modified onium salts, where part of the molecule is hydrophilic and the other consists of straight or branches long hydrocarbon chains such as hexadecyltri
- Cationic surfactants useful as surface tension reducing agents in the present invention include long chain hydrocarbons which contain quaternarized heteroatoms, such as nitrogen.
- Suitable cationic surfactants include quaternary ammonium compounds in which typically one of the groups linked to the nitrogen atom is a C12-C18 alkyl group and the other three groups are short chained alkyl groups.
- Anionic surfactants are characterized by a single lipophilic chain and a polar head group which can include sulfate, sulfonate, phosphate, phosphonate and carboxylate.
- exemplary compounds include linear sodium alkyl benzene sulfonate (LAS), linear alkyl sulfates and phosphates, such as sodium lauryl sulfate (SLS) and linear alkyl ethoxy sulfates.
- anionic surfactants include substituted ammonium (e.g., mono-, di-, and tri-ethanolammonium), alkali metal and alkaline earth metal salts of C6-C20 fatty acids and rosin acids, linear and branched alkyl benzene sulfonates, alkyl ether sulfates, alkane sulfonates, olefin sulfonates, hydroxyalkane sulfonates, fatty acid monoglyceride sulfates, alkyl glyceryl ether sulfates, acyl sarcosinates, acyl N-methyltaurides, and alkylaryl sulfonated surfactants, such as alkylbenezene sulfonates.
- substituted ammonium e.g., mono-, di-, and tri-ethanolammonium
- Nonionic surfactants do not dissociate but commonly derive their hydrophilic portion from polyhydroxy or polyalkyloxy structures.
- Suitable examples of polyhydroxy (polyhydric) compounds include ethylene glycol, butylene glycol, 1,3-butylene glycol, propylene glycol, glycerine, 2-methyl-1,3-propane diol, glycerol, mannitol, corn syrup, beta-cyclodextrin, and amylodextrin.
- Suitable examples of polyalkyloxy compounds include diethylene glycol, dipropylene glycol, polyethylene glycols, polypropylene glycols and glycol derivatives.
- nonionic surfactants include other linear ethoxylated alcohols with an average length of 6 to 16 carbon atoms and averaging about 2 to 20 moles of ethylene oxide per mole of alcohol; linear and branched, primary and secondary ethoxylated, propoxylated alcohols with an average length of about 6 to 16 carbon atoms and averaging 0-10 moles of ethylene oxide and about 1 to 10 moles of propylene oxide per mole of alcohol; linear and branched alkylphenoxy (polyethoxy) alcohols, otherwise known as ethoxylated alkylphenols, with an average chain length of 8 to 16 carbon atoms and averaging 1.5 to 30 moles of ethylene oxide per mole of alcohol; and mixtures thereof.
- suitable nonionic surfactants include polyoxyethylene carboxylic acid esters, fatty acid glycerol esters, fatty acid and ethoxylated fatty acid alkanolamides.
- Block copolymers of propylene oxide and ethylene oxide, and block polymers of propylene oxide and ethylene oxide with propoxylated ethylene diamine are also included as acceptable nonionic surfactants.
- Semi-polar nonionic surfactants like amine oxides, phosphine oxides, sulfoxides, and their ethoxylated derivatives are included within the scope of the invention.
- Suitable amphoteric and zwitterionic surfactants which contain an anionic water-solubilizing group, a cationic group and a hydrophobic organic group include amino carboxylic acids and their salts, amino dicarboxylic acids and their salts, alkylbetaines, alkyl aminopropylbetaines, sulfobetaines, alkyl imidazolinium derivatives, certain quaternary ammonium compounds, certain quaternary phosphonium compounds and certain tertiary sulfonium compounds
- anionic, nonionic, cationic and amphoteric surfactants that are suitable for use in the present invention are described in Kirk-Othmer, Encyclopedia of Chemical Technology, Third Edition, Volume 22, pages 347-387, and McCutcheon's Detergents and Emulsifiers, North American Edition, 1983, both of which are incorporated herein by reference.
- Typical concentration ranges of surfactant that are useful in the present etch solutions are from about 0.01 parts by weight to about 10 parts by weight, from about 0.1 parts by weight to about 5 parts by weight, and from about 0.5 parts by weight to about 2.5 parts by weight.
- the etch solutions of the present invention can further include an aldehyde component and in particular a dialdehyde.
- Suitable aldehydes include formaldehyde, compounds which release formaldehyde, acetaldehyde, propionaldehyde and butyraldehyde and mixtures thereof.
- Glutaraldehyde is a dialdehyde that is suitable for such use. Suitable ranges of aldehyde or dialdehyde vary from about 0.1 to about 5 parts by weight, from about 0.5 to about 2.5 parts by weight, and from about 1 to about 2 parts by weight.
- solvent or “organic solvent” are recognized in the art and are intended to mean those components, other than water, that can be added to the etch solutions of the invention to help solubilize the components and aid in the evaporation of the etch solution from the substrate surface after application.
- Suitable solvents include those which are known to be pharmacologically acceptable for treatment of bone tissue.
- solvents include dimethyl sulfoxide, ethyl acetate, alcohols and ethers such as methanol, ethanol, propanol, butanol, ethylene glycol, propanediol, butanediol, pentanediol, butenediol, glycerin, trimethylolpropane, hexanetriol, allyl alcohol, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, triethylene glycol, triethylene glycol monomethyl ether, tetraethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 2-methoxyethanol, 2-ethoxyethanol, 2-(methoxyethoxy)ethanol, 2-isopropoxyethanol, 2-butoxyethanol, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, dipropylene glycol monomethyl ether, tripropylene glycol, 1-methoxy-2-
- the etch solutions of the present invention can also further include one or more ethylenically unsaturated functional monomers as detailed below. Suitable concentration ranges are from about 5 to about 30 percent, from about 5 to about 20 percent, and from about 7.5 to about 15 percent. In particular, small amounts of such monomers facilitate in the handling and drying aspects of the etch solution. In particular, ethyleneglycol methacrylate phosphate (Aldrich Chemical Company product number 46,333-7) has been found to facilitate both the handling and drying of the etch solution in the above-identified concentration ranges.
- the present invention also pertains to curable composites that include (a) at least one ethylenically unsaturated functional monomer, (b) at least one polyethylenically unsaturated functional crosslinking monomer, (c) (optional) a fluoride ion agent and (d) a solvent, with the solvent being present in an amount to equal a total of 100 parts by weight of all components.
- the ethylenically unsaturated monomer(s) present in the curable composite resins of the invention (a) is present in an amount of from about 0.5 to about 25 parts by weight, from about 10 to about 20 parts by weight, and from about 12 to about 17 parts by weight.
- ethylenically unsaturated monomer includes those reactive agents that include a double bond that can undergo polymerization with other monomers to form a polymeric matrix.
- the polymerization can be between like monomers or mixtures of monomers. Additionally, the monomers that are ethylenically unsaturated can further react with polyethylenically unsaturated functional crosslinking monomers to form crosslinked networks.
- Suitable ethylenically unsaturated monomers include, but are not limited to ethyleneglycol acrylate phosphate (and methacrylate), 2-hydroxyethylacrylate (HEA), 2-hydroxyethylmethacrylate (HEMA), 2- and 3-hydroxypropylacrylate and methacrylate, 1,3 and 2,3-dihydroxypropylacrylate and methacrylate, acrylic acid, methacrylic acid, 2-trimethylammonium ethylmethacrylic chloride, 2-acrylamido-2-methylpropane-sulfonic acid, acrylamide, methacrylamide, 2-hydroxyethylacrylamide and methacrylamide, N,N-bis(2-hydroxyethyl)acrylamide and methacrylamide, N-alkyl-N-hydroxyethyl acrylamides and methacrylamides, 2- and 3-hydroxypropylacrylamide and methacrylamide, methacrylamidopropyltrimethylammonium chloride, gylcerol monometh
- the polyethylenically unsaturated crosslinking monomer(s) of (b) is present in an amount from about 5 to about 40 parts by weight, from about 10 to about 30 parts by weight, and from about 15 to about 25 parts by weight, i.e., about 20 parts by weight.
- polyethylenically unsaturated functional crosslinking monomer is recognized in the art and is intended to include those crosslinking agents that have two or more reactive double bonds present within the monomeric backbone.
- the degree of unsaturation provides the ability to polymerize with other crosslinking agent(s) as well as ethylenically unsaturated monomers to form a network of polymerized material.
- Suitable crosslinking monomers include, for example, 2-hydroxypropyl-1,3-diacrylate and dimethacrylate, 3-hydroxypropyl-1,2-diacrylate and dimethylacrylate, pentaerythritol diacrylate and dimethacrylate, polyethyleneglycol (400) diacrylate and dimethacrylate, glycerol dimethacrylate and diacrylate and pentaerylthritol trimethacrylate and triacrylate, the reaction product of pyromellitic dianhydride with glycerol dimethacrylate (PMGDM), addition product of 2-hydroxyethyl(meth)acrylate and pyromellitic dianhydride (PMDM), 2,2′-bis[4-(3-methacryloxy-2-hydroxy propoxy)-phenyl]-propane (bis-GMA) and mixtures thereof. In certain aspects of the invention, PMGDM and bis-GMA are preferred.
- fluoride agent is recognized in the art and is intended to include those reagents that provide a fluoride ion. Suitable reagents include fluoride salts, such as sodium fluoride, potassium fluoride, ammonium fluoride, cetyl ammonium fluorides, such as cetyl trialkylammonium fluorides, and mixtures thereof.
- fluoride salts such as sodium fluoride, potassium fluoride, ammonium fluoride, cetyl ammonium fluorides, such as cetyl trialkylammonium fluorides, and mixtures thereof.
- the fluoride agent optionally, is present in an amount from about 0.5 to about 5 parts by weight, from about 1 to about 3 parts by weight, and from about 1 to about 2 parts by weight.
- the functional monomer (a) of the curable composition is present in an amount between about 10 parts by weight and about 20 parts by weight.
- the polyethylenically unsaturated crosslinking monomer (b) is present in an amount between about 18 parts by weight and about 38 parts by weight, and the fluoride ion agent is present in an amount between about 0.1 parts by weight and about 10 parts by weight.
- Suitable examples of functional monomer(s) (a) include, for example, hydroxyethylmethacrylate, hydroxypropylmethacrylate, and hydroxybutylmethacrylate.
- Exemplary polyethylenically unsaturated crosslinking monomer(s) (b) include a mixtures of PMGDM and bis-GMA.
- the optional fluoride ion agent is any source that provides a fluoride ion such as sodium fluoride.
- the curable composition the functional monomer (a) is hydroxyethylmethacrylate
- the polyethylenically unsaturated crosslinking monomer (b) is a mixture of PMGDM and bis-GMA
- the optional fluoride ion agent is sodium fluoride. More particularly, the functional monomer (a) is present in an amount of about 15 parts by weight, the first polyethylenically unsaturated crosslinking monomer, PMGDM, is present in an amount of about 20 parts by weight, the second polyethylenically unsaturated crosslinking monomer, bis-GMA, is present in an amount of about 8 parts by weight and the sodium fluoride is present in an amount between about 1 and 2 parts by weight.
- the curable composition generally includes a photoinitiator system.
- the photoinitiator system includes a light-sensitive initiator and a polymerization accelerator.
- a suitable light-sensitive initiator is camphorquinone and a suitable polymerization accelerator is ethyl N,N-dimethyl-4-aminobenzoic acid or N,N-dimethylaminoethyl methacrylate.
- a free radical initiator is generally included in the monomer system. Any free radical initiator which is substantially non-toxic in the amounts employed in the composition; which does not react adversely with either the polymeric matrix, once formed, and cures within a few minutes is acceptable.
- the free radical initiator may be of the chemical type (redox system) in which a peroxide initiator and a polymerization accelerator react at ambient temperatures to initiate the polymerization of the monomer system.
- a photoinitiator system is used in which light, such as ultraviolet light, but preferably the visible portion of the spectrum, is employed as the energy source to stimulate the free radical initiator.
- Examples of such chemical initiators include hydroperoxides, peresters or peroxides such as benzoyl peroxide, or amines, tertiary aromatic amines, such as N,N-dimethyl toluidine can be used.
- Suitable photoinitiators include benzil 2,3-butanedione, phenyl-1,2-propandione, and camphorquinone (CQ).
- Suitable light sources that are effective to cause photoinitiation to occur include halgoen, laser, plasma and LED sources.
- the amount of energy required is that amount which is sufficient to initiate a photochemical reaction such that polymerization of the ethylenically unsaturated components is started or enhanced.
- One skilled in the art can determine the amount of light required to cause such reaction to occur and many light systems are commercially available.
- the present invention further provides packaged formulations of the etch solutions, the curable compositions, combinations thereof.
- the present invention provides a packaged formulation having an etching solution including an inorganic acid, an organic acid, a surfactant and water.
- concentrations of the inorganic acid, the organic acid, the surfactant and the water are as provided throughout the present specification.
- Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a curable composition.
- the instructions provide the length of time to apply the solution, how to remove the excess solution, and how to bond a restorative material, e.g., a fixture, to the treated substrate.
- the present invention further provides packaged formulations that include an etching solution having an inorganic acid, an organic acid, a solvent and water.
- concentrations of the inorganic acid, the organic acid, the solvent and the water are as provided throughout the present specification.
- Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a curable composition.
- the instructions provide the length of time to apply the solution, how to remove the excess solution, and how to bond a restorative material to the treated substrate.
- the present invention also provides packaged formulations that consist essentially of an etching solution with an inorganic acid, an organic acid, and water.
- concentrations of the inorganic acid, the organic acid, and the water are as provided throughout the present specification.
- Instructions are provided for the application of the etching solution to a bone substrate as described previously and throughout the specification.
- the present invention further provides packaged formulations of an etching solution that consist essentially of an inorganic acid, an organic acid, a solvent and water.
- concentrations of the inorganic acid, the organic acid, the solvent and the water are as provided throughout the present specification.
- Instructions are provided for the application of the etching solution to a bone substrate as described previously and throughout the specification.
- the present invention also provides packaged formulations that include an etching solution that has an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water.
- concentrations of the inorganic acid, organic acid and ethylenically unsaturated monomer are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate as described throughout the specification.
- the present invention further provides packaged formulations that consist essentially of an etching solution that has an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water.
- concentrations of the inorganic acid, organic acid and ethylenically unsaturated monomer are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate as described throughout the specification.
- packaged formulations include a first container having an etching solution and a second container having a curable composition.
- the etching solution includes an inorganic acid, an organic acid, a surfactant and water.
- concentrations of the inorganic acid, the organic acid, the surfactant and the water are as provided throughout the present specification.
- Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, as described previously and throughout the specification.
- the second container having the curable composite includes (a) at least one ethylenically unsaturated functional monomer; (b) at least one polyethylenically unsaturated functional crosslinking monomer; (c) (optional) a fluoride ion agent; and (d) a solvent.
- concentrations of (a), (b), (c) and (d) are as provided throughout the present specification. Instructions are also provided for the application of the curable composite to the bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a restorative material.
- packaged formulations include a first container having an etching solution and a second container having a curable composition.
- the etching solution includes an inorganic acid, an organic acid, a solvent and water.
- concentrations of the inorganic acid, the organic acid, the solvent and the water are as provided throughout the present specification.
- Instructions are provided for the application of the etching solution to a bone substrate as described previously and throughout the specification.
- the second container having the curable composite includes (a) at least one ethylenically unsaturated functional monomer; (b) at least one polyethylenically unsaturated functional crosslinking monomer; (c) (optional) a fluoride ion agent; and (d) a solvent.
- concentrations of (a), (b), (c) and (d) are as provided throughout the present specification. Instructions are also provided for the application of the curable composite to the bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a restorative material.
- packaged formulations include a first container having an etching solution and a second container having a curable composition.
- the etching solution consists essentially of an inorganic acid, an organic acid and water.
- concentrations of the inorganic acid, the organic acid and the water are as provided throughout the present specification.
- Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, as described previously and throughout the specification.
- the second container having the curable composite includes (a) at least one ethylenically unsaturated functional monomer; (b) at least one polyethylenically unsaturated functional crosslinking monomer; (c) a (optional) ion agent; and (d) a solvent.
- concentrations of (a), (b), (c) and (d) are as provided throughout the present specification. Instructions are also provided for the application of the curable composite to the bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a restorative material.
- packaged formulations include a first container having an etching solution and a second container having a curable composition.
- the etching solution consists essentially of an inorganic acid, an organic acid, solvent and water.
- concentrations of the inorganic acid, the organic acid, the solvent and the water are as provided throughout the present specification.
- Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, as described previously and throughout the specification.
- the second container having the curable composite includes (a) at least one ethylenically unsaturated functional monomer; (b) at least one polyethylenically unsaturated functional crosslinking monomer; (c) (optional) a fluoride ion agent; and (d) a solvent.
- concentrations of (a), (b), (c) and (d) are as provided throughout the present specification. Instructions are also provided for the application of the curable composite to the bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a restorative material.
- the etch solution of the first container includes an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water and/or a solvent.
- concentrations of the inorganic acid, organic acid, the ethylenically unsaturated monomer, water, and/or solvent are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, as described previously and throughout the specification.
- the etch solution of the first container consists essentially of an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water and/or a solvent.
- concentrations of the inorganic acid, organic acid, the ethylenically unsaturated monomer, water, and/or solvent are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, as described previously and throughout the specification.
- the containers that can be used for the packaged products are those that are generally commercially available. Any container suitable for retaining the liquids can be used that does not react with the solution(s).
- the container can be a reusable bottle, as known in the art, a single use bottle or pouch.
- the container can be collapsible, such as those foil packets known in the art. In certain embodiments, it is advantageous to provide a container that does not permit light to penetrate through the bottle.
- the solutions can be stored at or below room temperature, so that the container should be to withstand temperatures below room temperature. Bottles or packets prepared from polyethylene or polypropylene are suitable as well as those aluminized foil packets prepared from various terephthalates.
- the present invention also provides methods to use the etch solutions, alone or in combination with the curable compositions of the invention. It should be understood that the etch solutions of the present invention can be used with those commercially available bonding resins.
- the method of the invention involves applying an effective amount of an etching solution to the substrate.
- the etch solution can be any of the solutions described herein, and for example, can include an inorganic acid, an organic acid, a solvent and water.
- the excess etching solution is removed from the substrate such that the substrate remains moist. This can be easily accomplished by touching an absorbent material to the surface and blotting the excess from the surface.
- a curable composite is applied to the moist substrate, i.e., a tooth.
- the curable composites of the packaged formulations and methods which follow can further include photoinitiator systems as described throughout the specification.
- the present invention also provides methods for adhering a material to a bone substrate, i.e., a dental substrate.
- the methods generally include applying an effective amount of an etching solution that includes an inorganic acid, an organic acid, a surfactant and water to a substrate, removing excess etching solution from the substrate such that the substrate remains moist and applying a curable composite to the moist substrate.
- the curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite.
- a restorative material can be adhered to the composite thereafter.
- concentrations of the inorganic acid, the organic acid, the surfactant, the water and the components of the curable composition are as provided throughout the present specification.
- the invention provides methods for adhering a material to a bone substrate, i.e., a dental substrate.
- the methods generally include applying an effective amount of an etching solution that includes an inorganic acid, an organic acid, a solvent and water to a substrate, removing excess etching solution such that the substrate remains moist and applying a curable composite to the moist substrate.
- the curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite.
- a restorative material can be adhered to the composite thereafter.
- concentrations of the inorganic acid, the organic acid, the solvent, the water and the components of the curable composition are as provided throughout the present specification.
- the present invention further provides methods for adhering a material to a bone substrate, i.e., a dental substrate.
- the methods generally include applying an effective amount of an etching solution that consists essentially of an inorganic acid, an organic acid, a surfactant and water to a substrate, removing excess etching solution such that the substrate remains moist and applying a curable composite to the moist substrate.
- the curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite.
- a restorative material can be adhered to the composite thereafter.
- concentrations of the inorganic acid, the organic acid, the surfactant, the water and the components of the curable composition are as provided throughout the present specification.
- the invention provides methods for adhering a material to a bone substrate, i.e., a dental substrate.
- the methods generally include applying an effective amount of an etching solution that consists essentially of an inorganic acid, an organic acid, a solvent and water to a substrate, removing excess etching solution such that the substrate remains moist and applying a curable composite to the moist substrate.
- the curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite.
- a restorative material can be adhered to the composite thereafter.
- concentrations of the inorganic acid, the organic acid, the solvent, the water and the components of the curable composition are as provided throughout the present specification.
- the invention provide methods for adhering a material to a bone substrate as described throughout the specification.
- the methods generally include application of an effective amount of an etch solution that includes an inorganic acid, an organic acid, an ethylenically unsaturated monomer, water and/or a solvent to a substrate, removing the excess etch solution such that the substrate remains moist and application of a curable composite to the moist substrate.
- the curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite.
- a restorative material can be adhered to the composite thereafter.
- concentrations of the inorganic acid, the organic acid, the solvent, the water and the components of the curable composition are as provided throughout the present specification.
- the invention provide methods for adhering a material to a bone substrate as described throughout the specification.
- the methods generally include application of an effective amount of an etch solution that consists essentially of an inorganic acid, an organic acid, an ethylenically unsaturated monomer, water and/or a solvent to a substrate, removing the excess etch solution such that the substrate remains moist and application of a curable composite to the moist substrate.
- the curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite.
- a restorative material can be adhered to the composite thereafter.
- concentrations of the inorganic acid, the organic acid, the solvent, the water and the components of the curable composition are as provided throughout the present specification.
- etching solution or “effective amount of a dental etching solution” is that amount required to modify the surface architecture of the bone substrate. Not to be limited by theory, it is believed that the etching solution removes proteins, lipids, and other foreign materials from the surface of the substrate and penetrates into the substrate. The surface and the penetrated substrate area are cleaned and modified such that they are receptive toward further modification, i.e., a curable composite where reactive functionality such as ethylenic bonds can attach to the modified material.
- a skilled artisan can readily determine the amount of etch solution to apply to the substrate, however, only enough of the solution is required so as to wet the surface and keep it moist as the surface is modified during rubbing.
- removing excess etching solution or “removing excess dental etching solution” is intended to mean that a sufficient amount of the etching solution is removed from the substrate so that the surface remains wetted, i.e., moist. This can be accomplished by a variety of ways, including but not limited to, contacting the wet surface with an absorbent material, i.e., a cotton swab or tissue, passing a stream of air over the surface, and other methods known in the art. Ideally, enough etch solution should remain so that the surface of the substrate remains moist and does not become dry.
- the substrate material is cleaned with isopropyl alcohol, rinsed with water and dried for at least 3 seconds. 1-2 drops of the etch solution are placed in an open well receptacle and a cotton or foam pellet is contacted to the solution. The moistened applicator is contacted to the substrate such that the area to be treated is wetted. The applicator is gently agitated with the solution against the surface for at least about 10 to about 30 seconds, i.e., from about 10 to about 30 seconds, from about 10 to about 20 seconds, or from about 10 to about 15 seconds.
- the etch solution is allowed to remain on the substrate surface for approximately 10 to about 30 seconds, i.e., from about 10 to about 20 seconds, or from about 10 to about 15 seconds.
- the applicator is then pressed against an absorbent material, such as a patient napkin or to a facial tissue, to remove most of the liquid from the applicator.
- the wetted surface is contacted to the partially dried applicator to remove the excess etch solution while leaving the surface visibly moist.
- the wetted surface can be partially dried by passing compressed air over the treated surface area.
- the preparation should not be allowed to dry. There is no requirement to rinse the etch solution from the surface before any further applications are done.
- an adhesive resin such as those that are available commercially or those described within the present application
- an adhesive resin can be applied directly over the moist conditioned preparation with a suitable applicator, such as a brush.
- the adhesive resin is dried gently, for about 5-8 seconds to facilitate evaporation of the solvent.
- the surface should appear to be “shiny,” if not, additional resin adhesive should be applied.
- the adhesive resin is then light-cured for about 10 seconds.
- a restorative material can be applied to the adhesively treated surface to continue the procedure. However, depending upon what therapeutic treatment is intended, the adhesive resin can serve as a protectant covering and no further restorative treatment may be necessary.
- the etching/adhesive system can be used to seal enamel/dentin prior to restoration with light-cured or self-cured composite materials.
- Indirect Restorations are also encompassed by the present invention and include those preparations when using a light-cured, self-cured or dual-cured composite cement or glass ionomer or resin-modified glass ionomer cement.
- the methods and compositions of the invention can also be useful for desensitization to treat hypersensitive and/or exposed root surfaces. Additionally, the methods and compositions of the invention can be used to bond in a post and core.
- Restorative materials applicable for use with the present invention include those known in the art.
- Composite materials, synthetic bone materials, bone-like apatite and hydroxyapatite materials are well suited for use with the compositions and methods of the invention.
- Suitable examples of dental restoratives include composite filling materials, inlays, onlays, crown, bridges, ceramics, veneers and Maryland bridges.
- FIG. 1 is a cross sectional photograph of a tooth treated with an etch solution of the present invention followed by subsequent treatment with an adhesive bonding composition of the invention.
- the tooth was placed in 0.5% fushin dye for 24 hours.
- the photograph demonstrates that no dye penetrated along the margins treated with the etch and bonding composite of the invention.
- FIG. 2 is a second cross sectional photograph of the tooth depicted in FIG. 1 .
- FIG. 3 is a cross sectional photograph of a tooth treated with “One Up Bond”, a commercially available etch/bonding system.
- One Up Bond contains a proprietary phosphate ester referred to as MAC-10 and is available from J. Moriat USA, Inc., 9 Mason, Irvine, Calif. 92618.
- the arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment.
- FIG. 4 is a cross sectional photograph of a tooth treated with “Prompt-L-Pop, a commercially available etch/bonding system.
- Prompt-L-Pop contains phosphonic acids and is available from 3M ESPE Dental Products, P.O. Box 33275, St. Paul, Minn. 55133-3275.
- the arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment.
- FIG. 5 is a cross sectional photograph of a tooth treated with “Clearfil SE Bond”, a commercially available etch/bonding system.
- Clearfil SE Bond contains a phosphate ester and is available from Kuraray America, Inc., 200 Park Avenue, New York, N.Y. 10166-3098.
- the arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment.
- FIGS. 1 and 2 demonstrate that the present invention provides superior adhesive properties such that dye does not penetrate the treated area by the method and compositions of the present invention.
- the commercially available etch/resin systems do not provide suitable adhesion such that the bonding of dental components is weak, thus allowing dye to penetrate into the poorly adhered portions of the tooth.
- TABLE 1 Inorganic Acid Organic Acid Dwell time Substrate mPA 7% Nitric none 30 seconds; dentin; resin 12.21 ⁇ 5.4 Acid no blotting added without blotting 7% Nitric none 30 seconds enamel 21.98 ⁇ 3.2 Acid 7% Nitric succinic acid 30 seconds dentin 22.36 ⁇ 1.4 Acid 5% 7% Nitric succinic acid 30 seconds enamel 22.48 ⁇ 1.2 Acid 5%
- the experiments in Table 1 were conducted with an etch solution having the concentration of ingredients listed in Table 1.
- the resin utilized was composed of 20% by weight of PMGDM, 15% by weight HEMA and 8% by weight of bis-GMA with the remainder being solvent.
- the method utilized was to apply the etch solution to the substrate surface with a cotton or foam pellet and gently agitate the solution soaked pellet against the substrate for approximately 10 to about 15 seconds.
- the pellet was then placed against an absorbent material such as a napkin or tissue to remove excess solution.
- the pellet was then contacted to the substrate surface to remove the excess etching solution by blotting (unless indicated otherwise).
- the resin composition was then applied to the substrate surface using 2 to 3 coats of the resin. This was dried thoroughly with dried compressed air for about 5 to about 8 seconds prior to treatment with a restorative material.
- the applied resin was light-activated for ten seconds.
- a teflon mold having a matrix of 4 mm diameter and depth of 2 mm was clamped to the tooth.
- An all-purpose composite (quartz and silica composite material) was inserted into the matrix and light-activated for 40 seconds.
- the mold was then removed and the samples stored in water at 37 degrees C. for 24 hours.
- the samples were then subjected to shear bond strength testing on a Universal testing machine with a crosshead speed of 5 mm/min.
- the force required to break the composite from the surfaces was recorded in kg and converted to mPa on the basis of the surface area of the sample.
- the etchant solution was composed of 5% by weight nitric acid, 2.5% by weight succinic acid and 2.5% by weight methacrylic acid, unless listed otherwise, with the balance being water.
- the resin was 20% by weight PMGDM, 15% by weight HEMA, 8% by weight bis-GMA, 3% by weight ethyldimethylaminobenzoic acid (EDMAB) and 0.3% by weight camphoroquinone (CQ), with the balance being acetone.
- Self cure means that the resin applied to the treated surface is self-cured, i.e., no light treatment. Light-activated systems were preferred as described above. To the resin treated surface was applied a restorative material identified in the chart. Additional light activation was utilized with the systems of the present invention.
- a teflon mold having a matrix of 4 mm diameter and depth of 2 mm was clamped to the sample tooth.
- the all-purpose composite or appropriate material was inserted into the matrix and treated as described above, or by the protocols supplied by the commercial supplier.
- the mold was then removed and the samples stored in water at 37 degrees C. for 24 hours.
- the samples were then subjected to shear bond strength testing on a Universal testing machine with a crosshead speed of 5 mm/min.
- the force required to break the composite from the surfaces was recorded in kg and converted to mPa on the basis of the surface area of the sample.
- the method utilized was to apply the etch solution to the substrate surface with a cotton or foam pellet and gently agitate the solution soaked pellet against the substrate for approximately 10 to about 15 seconds.
- the pellet was then placed against an absorbent material such as a napkin or tissue to remove excess solution.
- the pellet was then contacted to the substrate surface to remove the excess etching solution by blotting.
- the resin composition was then applied to the substrate surface using 2 to 3 coats of the resin. This was dried thoroughly with dried compressed air for between about 5 and about 8 seconds and then light-activated for 10 seconds.
- Light activation was achieved by use of a visible light generating device (Bisco VIP light, Bisco Dental Products, Schaumburg, Ill., that emits wavelengths approximately between about 400 and 500 nanometers (nm) (CQ absorption maximum is about 468 nm).
- Extra “air thinning” denotes that the resin applied was thinned by drying with compressed air for an extended period of time and with additional force. This causes oxygen inhibition to come into effect and provides for a discrimination between those materials which are more susceptible to oxygen inhibition and those which are not.
- the composite materials referred to include Bis-fil All Purpose, a quartz filled composite, B2FB is a self-cure composite available from Bisco Dental Products, Schaumburg, Ill., RelyX ARC is a dual-cure composite cement available from 3M Dental, St. Paul, Minn. and Z-100 is a restorative composite available form 3M.
- B2FB is a self-cure composite available from Bisco Dental Products, Schaumburg, Ill.
- RelyX ARC is a dual-cure composite cement available from 3M Dental, St. Paul, Minn.
- Z-100 is a restorative composite available form 3M.
- composite samples were prepared with an all purpose quartz silica composite material for testing of adhesive/cohesive bond properties.
- DF denotes dental fracture.
- NP is a nonprecious metal, such as nickel chromium.
- Precious metal (ME) is a gold alloy.
Landscapes
- Health & Medical Sciences (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Dental Preparations (AREA)
- Dental Tools And Instruments Or Auxiliary Dental Instruments (AREA)
- Paper (AREA)
Abstract
Etching compositions, curable compositions, packaged products and methods of use for the treatment of bone substrate, i.e., teeth, are described. The etch solutions generally include an inorganic acid, an organic acid and either a solvent, a surfactant or mixtures thereof. The curable composites include reactive monomers and crosslinking agents that are effective to adhere to the surface of the treated substrate. The methods of the invention provide the ability to modify a bone or bone-like surface so that the curable composition, such as an adhesive resin, can be used in combination with a restorative material.
Description
- The present application is a continuation of U.S. patent application Ser. No. 10/323,865, filed Dec. 18, 2002, which claims benefit of U.S. Provisional Application No. 60/358,883, filed Feb. 21, 2002 and to U.S. Provisional Application No. 60/341,619, filed Dec. 18, 2001 which are hereby incorporated by reference.
- The present invention relates to dental etching solutions, reactive monomeric based adhesive compositions, packaged pharmaceuticals that contain the etch solution and adhesive composition and methods for their use. More specifically, the present invention relates to a superior two step process, whereby an etch solution is applied to a tooth and subsequently causes the dentin to become receptive to adhesive compositions. After the reaction has occurred, the adhesive composition is applied to the tooth and the tooth is readied for a restorative material.
- The use of biomaterials as restorative materials, in both the dental and medical fields is growing and the requirements for such materials are often times difficult to achieve. Restorative materials such as amalgam or resin composites, are often used to repair dental tissues and bones.
- For example, there has been considerable research devoted to the improvement of the adhesion of resins to hard tissues such as dentin or enamel. The adhesives are typically applied to the hard tissue after a pretreatment or etch of the tissue with an acidic solution. Various resin composites are available and generally suffer one or more disadvantages in providing a satisfactory bond between the tissue and the restorative material. Some of adhesive materials are designed to achieve higher bond strengths between tissue layers or the treated tissue and a restorative material, to improve physical properties, or the esthetics of the restored target substrate. Other desired properties of such adhesive composites are directed to their use and include ease in preparation and formulation for use under relatively humid conditions.
- Typically an etch solution is utilized to remove the smear layer and demineralize the surface of the dental tissue. The etch solution can alter wettability or chemical reactivity of the pretreated dentin, prior to applying a bonding adhesive agent which is generally a polymerizable monomer. Polymerization of the bonding agent facilitates the bonding agent to adhere to the dentin. The interaction(s) between the bonding agent and the treated substrate is not entirely understood and is believed to be related to chemical, mechanical, interfacial diffusion or a combination of all three physical processes. Polymerization of most bonding adhesives provide an approximately 5 micron thick hybrid layer that is formed of part resin and part dentin. The depth and effectiveness of the penetration of the bonding agent is an important and often critical aspect to the adhesion between the bonding agent and substrate. This hybrid layer is believed to contain little or no apatite and the adhesion to dentin is believed to occur through collagen with the bonding agent.
- Even though there has been continued research in the area of etching solutions and bonding agents, the techniques and/or products currently available for pretreating the dental or bone tissue or adhering a restorative material to the bone or dental tissue have limitations. For example, the bonding agents should effectively seal the dentin tubules to prevent post operative sensitivity and protect the pulp. Additionally, the bonds should last the lifetime of the restorative correction and be durable under a variety of conditions.
- Therefore, a need exists for new compositions, solutions and methods which overcome one or more of the disadvantages of currently available products.
- The present invention provides a unique unexpectedly simple and easy to use bone, i.e., tooth, etch solution, a curable adhesive bonding composition, packaged products containing either or both of the compositions, and methods to use the compositions of the invention. The systems of the present invention can be self-cured or can be treated with light energy to facilitate curing.
- The present invention provides distinct advantages over presently known etching/bonding systems. For example, the present etching solution is not required to be rinsed off, removed and/or dried prior to the application of a bonding composition. Most commercially available bonding systems require that the etch solution is rinsed off and the substrate dried prior to the application of the bonding resin. Alternatively, currently available bonding systems include both an etch solution and the bonding resin as a one component application. Often times, the one component application systems do not bond well to the bone substrate because the etch solution interferes with the ability of the bonding resin to adhere to the substrate.
- In one embodiment, the present invention provides an etching solution capable of etching bone. In one aspect, the bone is teeth and more specifically, the substrate is dentin, enamel, gum, amalgam, metal, porcelain or plastic. The etching solution includes an inorganic acid, an organic acid, a surfactant, with the remainder being water. The inorganic acid is present in an amount of from about 1 to about 10 parts by weight. The organic acid is present in amount from about 0.01 to about 20 parts by weight. The surfactant is present in an amount from about 0.01 to about 10 parts by weight and the water is present in an amount to equal a total of 100 parts by weight of all components.
- In another embodiment, the present invention provides etching solutions that include an inorganic acid, an organic acid, a solvent and water. The inorganic acid is present in an amount of from about 1 to about 10 parts by weight. The organic acid is present in amount from about 0.01 to about 20 parts by weight. The solvent is present in an amount from about 1 to about 50 parts by weight, with the water being present in an amount to equal a total of 100 parts by weight of all components.
- In still another embodiment, the etching solution consists essentially of an inorganic acid, an organic acid, and water. In these compositions, the inorganic acid is present in an amount of from about 1 to about 10 parts by weight, the organic acid is present in an amount from about 0.01 to about 20 parts by weight with the water being present in an amount to equal a total of 100 parts by weight of all components.
- In yet another embodiment of the invention, the etching solution consists essentially of an inorganic acid, an organic acid, a solvent and water. The inorganic acid is present in an amount of from about 1 to about 10 parts by weight and the organic acid is present in an amount from about 0.01 to about 20 parts by weight. The solvent is present in an amount from about 1 to about 50 parts by weight, with the water being present in an amount to equal a total of 100 parts by weight of all components.
- Suitable components in the etching solution include, for example, nitric acid and succinic or citric acid, or combinations thereof, organic solvents such as acetone or lower weight alcohols, and/or various surfactants.
- The present invention also pertains to curable composites that include (a) at least one ethylenically unsaturated functional monomer, (b) at least one polyethylenically unsaturated functional crosslinking monomer, (c) a (optionally) fluoride ion agent and (d) a solvent. More specifically, the ethylenically unsaturated monomer(s) of (a) is present in an amount of from about 0.5 to about 25 parts by weight. The polyethylenically unsaturated crosslinking monomer(s) of (b) is present in an amount from about 5 to about 40 parts by weight. The optional fluoride agent is present in an amount from about 0.5 to about 5 parts by weight, with the solvent being present in an amount to equal a total of 100 parts by weight of all components.
- In certain embodiments, the functional monomer (a) of the curable composition is present in an amount between about 10 parts by weight and about 20 parts by weight. The polyethylenically unsaturated crosslinking monomer (b) is present in an amount between about 18 parts by weight and about 38 parts by weight, and the optional fluoride ion agent is present in an amount between about 0.1 parts by weight and about 10 parts by weight.
- Suitable examples of functional monomer(s) (a) include, for example, hydroxyethylmethacrylate, hydroxypropylmethacrylate, and hydroxybutylmethacrylate. Exemplary polyethylenically unsaturated crosslinking monomer(s) (b) include a mixtures of PMGDM and bis-GMA. The optional fluoride ion agent is any source that provides a fluoride ion such as sodium fluoride.
- In one particular aspect, the curable composition, the functional monomer (a) is hydroxyethylmethacrylate, the polyethylenically unsaturated crosslinking monomer (b) is a mixture of PMGDM and bis-GMA, and the fluoride ion agent is sodium fluoride. More particularly, the functional monomer (a) is present in an amount of about 15 parts by weight, the first polyethylenically unsaturated crosslinking monomer, PMGDM, is present in an amount of about 20 parts by weight, the second polyethylenically unsaturated crosslinking monomer, bis-GMA, is present in an amount of about 8 parts by weight and the optional sodium fluoride is present in an amount between about 1 and 2 parts by weight.
- The curable composition generally includes a photoinitiator system. The photoinitiator system includes a light-sensitive initiator and a polymerization accelerator. A suitable light-sensitive initiator is camphorquinone (CQ) and a suitable polymerization accelerator is ethyl N,N-dimethyl-4-aminobenzoic acid or ethyldimethylaminobenzoic acid (EDMAB).
- The present invention further provides packaged formulations of the etch solutions, the curable compositions, combinations thereof.
- The present invention also provides method to use the etch solutions, alone or in combination with the curable compositions of the invention. It should be understood that the etch solutions of the present invention can be used with those commercially available bonding resins. The method of the invention involves applying an effective amount of an etching solution to the substrate. The etch solution can be any of the solutions described herein, and for example, can include an inorganic acid, an organic acid, a solvent and water. The excess etching solution is removed such that the substrate remains moist. This can be easily accomplished by touching an absorbent material to the surface and blotting the excess from the surface. Thereafter, a curable composite is applied to the moist substrate, i.e., a tooth.
- While multiple embodiments are disclosed, still other embodiments of the present invention will become apparent to those skilled in the art from the following detailed description. As will be apparent, the invention is capable of modifications in various obvious aspects, all without departing from the spirit and scope of the present invention. Accordingly, the drawings and detailed description are to be regarded as illustrative in nature and not restrictive.
-
FIG. 1 is a cross sectional photograph of a tooth treated with an etch solution of the present invention followed by subsequent treatment with an adhesive bonding composition of the invention. The tooth was placed in 0.5% fushin dye for 24 hours. The photograph demonstrates that no dye penetrated along the margins treated with the etch and bonding composite of the invention. -
FIG. 2 is a second cross sectional photograph of the tooth depicted inFIG. 1 with the root of the tooth removed. -
FIG. 3 is a cross sectional photograph of a tooth treated with “One Up Bond”, a commercially available etch/bonding system. The arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment. -
FIG. 4 is a cross sectional photograph of a tooth treated with “Prompt-L-Pop, a commercially available etch/bonding system. The arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment. -
FIG. 5 is a cross sectional photograph of a tooth treated with “Clearfil SE Bond”, a commercially available etch/bonding system. The arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment. - The present invention provides a unique unexpectedly simple and easy to use bone, i.e., tooth, etch solution, a curable adhesive bonding composition, packaged products containing either or both of the compositions, and methods to use the compositions of the invention. The present invention provides distinct advantages over presently known etching/bonding systems as described throughout the specification.
- In one embodiment, the present invention provides an etching solution capable of etching bone. In one aspect, the bone substrate is a tooth and more specifically, the substrate is dentin, enamel, gum, amalgam, metal, porcelain or plastic. The etching solution includes an inorganic acid, an organic acid, a surfactant, with the remainder of the solution being water.
- The inorganic acid is present in the etch solution in an amount of from about 1 to about 10 parts by weight. Suitable ranges of inorganic acid include from about 2 to about 9 parts by weight, about 4 to about 8 parts by weight, and about 5 to about 7 parts by weight, i.e. about 6 to about 8 parts by weight. The organic acid is present in the etch solution in amount from about 0.01 to about 20 parts by weight. Additional suitable ranges of the organic acid include from about 1 to about 15 parts by weight, 4 to about 12 parts by weight and from about 6 to about 10 parts by weight. The surfactant in the etch solution is present in an amount from about 0.01 to about 10 parts by weight, from about 0.1 to about 5 parts by weight or from about 0.5 to about 2.5 parts by weight. The water in the etch solution is present in an amount to equal a total of 100 parts by weight of all components.
- In another embodiment, the present invention provides etching solutions that include an inorganic acid, an organic acid, a solvent and water. The inorganic acid and the organic acid are present in the parts by weight as described above. The solvent is present in an amount from about 1 to about 50 parts by weight, from about 5 to about 40 parts by weight or from about 10 to about 30 parts by weight. The water in the etch solution is present in an amount to equal a total of 100 parts by weight of all components.
- In an embodiment, the present invention provides etching solutions that include an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water. The inorganic acid and the organic acid are present in the parts described above. The ethylenically unsaturated monomer is present in an amount from about 0.1 to about 10 parts by weight, from about 1.0 to about 5 parts by weight, or from about 2 to about 4 parts by weight, e.g., from about 2 to about 7 parts by weight, e.g., 2.5 parts by weight. The water in the etch solution is present in an amount to equal a total of 100 parts by weight of all components.
- In still another embodiment, the etching solution consists essentially of an inorganic acid, an organic acid, and water. In these compositions, the inorganic acid and organic acid are present in the parts by weight as described above with the water being present in an amount to equal a total of 100 parts by weight of all components.
- In yet another embodiment of the invention, the etching solution consists essentially of an inorganic acid, an organic acid, a solvent and water. The inorganic acid, the organic acid and the solvent are present in the parts by weight as described above, with the water being present in an amount to equal a total of 100 parts by weight of all components.
- In an embodiment, the present invention provides etching solutions that consists essentially of an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water. The inorganic acid, the organic acid ethylenically unsaturated monomer are present in an amount as described above, with the water being present in an amount to equal a total of 100 parts by weight of all components.
- In still yet another aspect, the invention pertains to etching solutions that include, or consist essentially of, nitric acid and an organic solvent.
- It should be understood that throughout the specification, the etching solution can be utilized on any bone or bone-like substrate that includes, but is not limited to, apatite and hydroxyapatite. Bone is a complex mineralizing system composed of an inorganic or mineral phase, an organic matrix phase, and water. The inorganic mineral phase is composed mainly of crystalline calcium phosphate salts while the organic matrix phase consists mostly of collagen and other noncollagenous proteins.
- The phrases “etching solution” or “etch solution” are recognized in the art and are intended to include the compositions of the invention that superficially dissolve or modify bone or bone-like substrates. For example, in the case of teeth, the etch solution removes the smear layer and facilitates demineralization of the surface of the dental tissue.
- As described above, the etch solutions of the present invention include several components. Suitable inorganic acids include nitric acid, sulfuric acid, hydrochloric acid, phosphoric acid and mixtures thereof. In one aspect, the inorganic acid is nitric acid. Nitric acid is generally available as a 70 percent aqueous solution and is utilized at this concentration throughout this application. Sulfuric acid, hydrochloric acid and phosphoric acid are also available as 95-98 percent, 37 percent and 85 percent aqueous solutions, respectively, and are utilized at these concentrations throughout the application. Where noted as parts by weight, this refers to using the concentrated inorganic acid, at the respective commercial concentration, on a weight basis.
- It should be noted that commercially available etch solutions that contain phosphoric acid do not work well in dental applications if the solution is not first rinsed from the substrate to which it is applied. This is due to the precipitation of calcium phosphate from the etch solution that is generated by the reaction of phosphoric acid with the calcium of the bone substrate. The present invention avoids such precipitation by either utilizing a different inorganic acid or by using an organic solvent, surfactant and/or organic acid which inhibit the deposition of calcium phosphate onto the cleaned bone substrate surface.
- Suitable organic acids include lactic acid, pyruvic acid, glycolic acid, chloroacetic acid, dichloroacetic acid, trichloroacetic acid, cyanoacetic acid, tartaric acid, succinic acid, glutaric acid, maleic acid, fumaric acid, malonic acid, citraconic acid, ortho-phthalic acid, meta-phthalic acid, para-phthalic acid, citric acid, tricarballyic acid, 1,3,5-pentanetricarboxylic acid and trimellitic acid and mixtures thereof. Other suitable organic acids include 2-acrylamido-2-methylpropane sulfonic acid, benzenesulfonic acid, benzoic acid, bromoacetic acid, 10-camphorquinonesulfonic acid, 10-camphorsulfonic acid, dibromoacetic acid, 2,4-dinitrophenol, formic acid, fumaric acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, maleic-acid, 2-naphthalene sulfonic acid, nitric acid, oxalic acid, p-nitrophenol, phenol, phosphorous acid esters (such as 2,2′-bis(a-methacryloxy-b-hydroxypropoxyphenyl)propane diphosphonate (Bis-GMA diphosphonate), dibutyl phosphite, di-2-ethyl-hexyl phosphate, di-2-ethyl-hexyl phosphite, hydroxyethyl methacrylate monophosphate, glyceryl dimethacrylate phosphate, glyceryl-2-phosphate, glycerylphosphoric acid, methacryloxyethyl phosphate, pentaerythritol triacrylate monophosphate, pentaerythritol trimethacrylate monophosphate, dipentaerythritol pentaacrylate monophosphate, and dipentaerythritol pentamethacrylate monophosphate), toluene sulfonic acid, tribromoacetic acid, trifluoroacetic acid, trifluoromethanesulfonic acid, and trihydroxybenzoic acid. Mixtures of such acids can be used if desired. In one aspect, the organic acid is succinic acid or citric acid. In another aspect, the succinic acid concentration is between about 1.0 and about 3.0 parts by weight.
- The term “surfactant” is recognized in the relevant art to include those compounds which modify the nature of surfaces, e.g. reducing the surface tension of water. Surfactants are generally classified into four types: cationic (e.g. modified onium salts, where part of the molecule is hydrophilic and the other consists of straight or branches long hydrocarbon chains such as hexadecyltrimethyl bromide), anionic, also known as amphiphatic agents (e.g., alkyl or aryl or alkylarylsulfonates, carboxylates, phosphates), nonionic (e.g., polyethylene oxides, alcohols) and ampholytic or amphoteric (e.g. dodecyl-beta-alanine, such that the surfactant contains a zwitterionic group). One or more surfactants can be used in the present invention.
- Cationic surfactants useful as surface tension reducing agents in the present invention include long chain hydrocarbons which contain quaternarized heteroatoms, such as nitrogen. Suitable cationic surfactants include quaternary ammonium compounds in which typically one of the groups linked to the nitrogen atom is a C12-C18 alkyl group and the other three groups are short chained alkyl groups.
- Anionic surfactants (amphiphatic agents) are characterized by a single lipophilic chain and a polar head group which can include sulfate, sulfonate, phosphate, phosphonate and carboxylate. Exemplary compounds include linear sodium alkyl benzene sulfonate (LAS), linear alkyl sulfates and phosphates, such as sodium lauryl sulfate (SLS) and linear alkyl ethoxy sulfates. Additional examples of anionic surfactants include substituted ammonium (e.g., mono-, di-, and tri-ethanolammonium), alkali metal and alkaline earth metal salts of C6-C20 fatty acids and rosin acids, linear and branched alkyl benzene sulfonates, alkyl ether sulfates, alkane sulfonates, olefin sulfonates, hydroxyalkane sulfonates, fatty acid monoglyceride sulfates, alkyl glyceryl ether sulfates, acyl sarcosinates, acyl N-methyltaurides, and alkylaryl sulfonated surfactants, such as alkylbenezene sulfonates.
- Nonionic surfactants do not dissociate but commonly derive their hydrophilic portion from polyhydroxy or polyalkyloxy structures. Suitable examples of polyhydroxy (polyhydric) compounds include ethylene glycol, butylene glycol, 1,3-butylene glycol, propylene glycol, glycerine, 2-methyl-1,3-propane diol, glycerol, mannitol, corn syrup, beta-cyclodextrin, and amylodextrin. Suitable examples of polyalkyloxy compounds include diethylene glycol, dipropylene glycol, polyethylene glycols, polypropylene glycols and glycol derivatives.
- Other suitable nonionic surfactants include other linear ethoxylated alcohols with an average length of 6 to 16 carbon atoms and averaging about 2 to 20 moles of ethylene oxide per mole of alcohol; linear and branched, primary and secondary ethoxylated, propoxylated alcohols with an average length of about 6 to 16 carbon atoms and averaging 0-10 moles of ethylene oxide and about 1 to 10 moles of propylene oxide per mole of alcohol; linear and branched alkylphenoxy (polyethoxy) alcohols, otherwise known as ethoxylated alkylphenols, with an average chain length of 8 to 16 carbon atoms and averaging 1.5 to 30 moles of ethylene oxide per mole of alcohol; and mixtures thereof.
- Additionally, suitable nonionic surfactants include polyoxyethylene carboxylic acid esters, fatty acid glycerol esters, fatty acid and ethoxylated fatty acid alkanolamides. Block copolymers of propylene oxide and ethylene oxide, and block polymers of propylene oxide and ethylene oxide with propoxylated ethylene diamine are also included as acceptable nonionic surfactants. Semi-polar nonionic surfactants like amine oxides, phosphine oxides, sulfoxides, and their ethoxylated derivatives are included within the scope of the invention.
- Suitable amphoteric and zwitterionic surfactants which contain an anionic water-solubilizing group, a cationic group and a hydrophobic organic group include amino carboxylic acids and their salts, amino dicarboxylic acids and their salts, alkylbetaines, alkyl aminopropylbetaines, sulfobetaines, alkyl imidazolinium derivatives, certain quaternary ammonium compounds, certain quaternary phosphonium compounds and certain tertiary sulfonium compounds
- Examples of anionic, nonionic, cationic and amphoteric surfactants that are suitable for use in the present invention are described in Kirk-Othmer, Encyclopedia of Chemical Technology, Third Edition, Volume 22, pages 347-387, and McCutcheon's Detergents and Emulsifiers, North American Edition, 1983, both of which are incorporated herein by reference.
- Typical concentration ranges of surfactant that are useful in the present etch solutions are from about 0.01 parts by weight to about 10 parts by weight, from about 0.1 parts by weight to about 5 parts by weight, and from about 0.5 parts by weight to about 2.5 parts by weight.
- The etch solutions of the present invention can further include an aldehyde component and in particular a dialdehyde. Suitable aldehydes include formaldehyde, compounds which release formaldehyde, acetaldehyde, propionaldehyde and butyraldehyde and mixtures thereof. Glutaraldehyde is a dialdehyde that is suitable for such use. Suitable ranges of aldehyde or dialdehyde vary from about 0.1 to about 5 parts by weight, from about 0.5 to about 2.5 parts by weight, and from about 1 to about 2 parts by weight.
- The terms “solvent” or “organic solvent” are recognized in the art and are intended to mean those components, other than water, that can be added to the etch solutions of the invention to help solubilize the components and aid in the evaporation of the etch solution from the substrate surface after application. Suitable solvents include those which are known to be pharmacologically acceptable for treatment of bone tissue. These solvents include dimethyl sulfoxide, ethyl acetate, alcohols and ethers such as methanol, ethanol, propanol, butanol, ethylene glycol, propanediol, butanediol, pentanediol, butenediol, glycerin, trimethylolpropane, hexanetriol, allyl alcohol, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, triethylene glycol, triethylene glycol monomethyl ether, tetraethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 2-methoxyethanol, 2-ethoxyethanol, 2-(methoxyethoxy)ethanol, 2-isopropoxyethanol, 2-butoxyethanol, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, dipropylene glycol, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, glycerine ether and the like, as well as ketones such as acetone, methyl ethyl ketone and the like and mixtures thereof. The solvent is present in an amount from about 1 to about 50 parts by weight, from about 5 to about 40 parts by weight or from about 10 to about 30 parts by weight.
- It should be understood that all values, including non-whole values (integers), inclusive, within the ranges of all concentrations (parts by weight) provided throughout this specification are considered individually. That is, it is within the discretion of the operator to choose any percentage within the ranges provided for any of the metal salts as described herein. Therefore, the ranges provided are not limiting in terms of more narrow ranges and individual values that are encompassed by the parameters of the ranges identified.
- The etch solutions of the present invention can also further include one or more ethylenically unsaturated functional monomers as detailed below. Suitable concentration ranges are from about 5 to about 30 percent, from about 5 to about 20 percent, and from about 7.5 to about 15 percent. In particular, small amounts of such monomers facilitate in the handling and drying aspects of the etch solution. In particular, ethyleneglycol methacrylate phosphate (Aldrich Chemical Company product number 46,333-7) has been found to facilitate both the handling and drying of the etch solution in the above-identified concentration ranges.
- The present invention also pertains to curable composites that include (a) at least one ethylenically unsaturated functional monomer, (b) at least one polyethylenically unsaturated functional crosslinking monomer, (c) (optional) a fluoride ion agent and (d) a solvent, with the solvent being present in an amount to equal a total of 100 parts by weight of all components.
- The ethylenically unsaturated monomer(s) present in the curable composite resins of the invention (a) is present in an amount of from about 0.5 to about 25 parts by weight, from about 10 to about 20 parts by weight, and from about 12 to about 17 parts by weight.
- The phrase “ethylenically unsaturated monomer” includes those reactive agents that include a double bond that can undergo polymerization with other monomers to form a polymeric matrix. The polymerization can be between like monomers or mixtures of monomers. Additionally, the monomers that are ethylenically unsaturated can further react with polyethylenically unsaturated functional crosslinking monomers to form crosslinked networks.
- Suitable ethylenically unsaturated monomers, include, but are not limited to ethyleneglycol acrylate phosphate (and methacrylate), 2-hydroxyethylacrylate (HEA), 2-hydroxyethylmethacrylate (HEMA), 2- and 3-hydroxypropylacrylate and methacrylate, 1,3 and 2,3-dihydroxypropylacrylate and methacrylate, acrylic acid, methacrylic acid, 2-trimethylammonium ethylmethacrylic chloride, 2-acrylamido-2-methylpropane-sulfonic acid, acrylamide, methacrylamide, 2-hydroxyethylacrylamide and methacrylamide, N,N-bis(2-hydroxyethyl)acrylamide and methacrylamide, N-alkyl-N-hydroxyethyl acrylamides and methacrylamides, 2- and 3-hydroxypropylacrylamide and methacrylamide, methacrylamidopropyltrimethylammonium chloride, gylcerol monomethacrylate and monoacrylate, various reactive ethylenically unsaturated phosphates, and mixtures thereof. It is considered that where an acrylate monomer is suitable the methacrylate analog will likewise be suitable.
- The polyethylenically unsaturated crosslinking monomer(s) of (b) is present in an amount from about 5 to about 40 parts by weight, from about 10 to about 30 parts by weight, and from about 15 to about 25 parts by weight, i.e., about 20 parts by weight.
- The phrase “polyethylenically unsaturated functional crosslinking monomer” is recognized in the art and is intended to include those crosslinking agents that have two or more reactive double bonds present within the monomeric backbone. The degree of unsaturation provides the ability to polymerize with other crosslinking agent(s) as well as ethylenically unsaturated monomers to form a network of polymerized material.
- Suitable crosslinking monomers include, for example, 2-hydroxypropyl-1,3-diacrylate and dimethacrylate, 3-hydroxypropyl-1,2-diacrylate and dimethylacrylate, pentaerythritol diacrylate and dimethacrylate, polyethyleneglycol (400) diacrylate and dimethacrylate, glycerol dimethacrylate and diacrylate and pentaerylthritol trimethacrylate and triacrylate, the reaction product of pyromellitic dianhydride with glycerol dimethacrylate (PMGDM), addition product of 2-hydroxyethyl(meth)acrylate and pyromellitic dianhydride (PMDM), 2,2′-bis[4-(3-methacryloxy-2-hydroxy propoxy)-phenyl]-propane (bis-GMA) and mixtures thereof. In certain aspects of the invention, PMGDM and bis-GMA are preferred.
- The term “fluoride agent” is recognized in the art and is intended to include those reagents that provide a fluoride ion. Suitable reagents include fluoride salts, such as sodium fluoride, potassium fluoride, ammonium fluoride, cetyl ammonium fluorides, such as cetyl trialkylammonium fluorides, and mixtures thereof.
- The fluoride agent, optionally, is present in an amount from about 0.5 to about 5 parts by weight, from about 1 to about 3 parts by weight, and from about 1 to about 2 parts by weight.
- In certain embodiments, the functional monomer (a) of the curable composition is present in an amount between about 10 parts by weight and about 20 parts by weight. The polyethylenically unsaturated crosslinking monomer (b) is present in an amount between about 18 parts by weight and about 38 parts by weight, and the fluoride ion agent is present in an amount between about 0.1 parts by weight and about 10 parts by weight.
- Suitable examples of functional monomer(s) (a) include, for example, hydroxyethylmethacrylate, hydroxypropylmethacrylate, and hydroxybutylmethacrylate. Exemplary polyethylenically unsaturated crosslinking monomer(s) (b) include a mixtures of PMGDM and bis-GMA. The optional fluoride ion agent is any source that provides a fluoride ion such as sodium fluoride.
- In one particular aspect, the curable composition, the functional monomer (a) is hydroxyethylmethacrylate, the polyethylenically unsaturated crosslinking monomer (b) is a mixture of PMGDM and bis-GMA, and the optional fluoride ion agent is sodium fluoride. More particularly, the functional monomer (a) is present in an amount of about 15 parts by weight, the first polyethylenically unsaturated crosslinking monomer, PMGDM, is present in an amount of about 20 parts by weight, the second polyethylenically unsaturated crosslinking monomer, bis-GMA, is present in an amount of about 8 parts by weight and the sodium fluoride is present in an amount between about 1 and 2 parts by weight.
- The curable composition generally includes a photoinitiator system. The photoinitiator system includes a light-sensitive initiator and a polymerization accelerator. A suitable light-sensitive initiator is camphorquinone and a suitable polymerization accelerator is ethyl N,N-dimethyl-4-aminobenzoic acid or N,N-dimethylaminoethyl methacrylate.
- Since most of the polymerization reactions which ethylenically unsaturated compounds undergo, particularly acrylate and methacrylate compounds, proceed by a free radical mechanism, a free radical initiator is generally included in the monomer system. Any free radical initiator which is substantially non-toxic in the amounts employed in the composition; which does not react adversely with either the polymeric matrix, once formed, and cures within a few minutes is acceptable. The free radical initiator may be of the chemical type (redox system) in which a peroxide initiator and a polymerization accelerator react at ambient temperatures to initiate the polymerization of the monomer system. Alternatively, a photoinitiator system is used in which light, such as ultraviolet light, but preferably the visible portion of the spectrum, is employed as the energy source to stimulate the free radical initiator.
- Examples of such chemical initiators include hydroperoxides, peresters or peroxides such as benzoyl peroxide, or amines, tertiary aromatic amines, such as N,N-dimethyl toluidine can be used. Suitable photoinitiators include benzil 2,3-butanedione, phenyl-1,2-propandione, and camphorquinone (CQ).
- Suitable light sources that are effective to cause photoinitiation to occur include halgoen, laser, plasma and LED sources. The amount of energy required, is that amount which is sufficient to initiate a photochemical reaction such that polymerization of the ethylenically unsaturated components is started or enhanced. One skilled in the art can determine the amount of light required to cause such reaction to occur and many light systems are commercially available.
- The present invention further provides packaged formulations of the etch solutions, the curable compositions, combinations thereof.
- For example, the present invention provides a packaged formulation having an etching solution including an inorganic acid, an organic acid, a surfactant and water. The concentrations of the inorganic acid, the organic acid, the surfactant and the water are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a curable composition. The instructions provide the length of time to apply the solution, how to remove the excess solution, and how to bond a restorative material, e.g., a fixture, to the treated substrate.
- The present invention further provides packaged formulations that include an etching solution having an inorganic acid, an organic acid, a solvent and water. The concentrations of the inorganic acid, the organic acid, the solvent and the water are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a curable composition. The instructions provide the length of time to apply the solution, how to remove the excess solution, and how to bond a restorative material to the treated substrate.
- The present invention also provides packaged formulations that consist essentially of an etching solution with an inorganic acid, an organic acid, and water. The concentrations of the inorganic acid, the organic acid, and the water are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate as described previously and throughout the specification.
- The present invention further provides packaged formulations of an etching solution that consist essentially of an inorganic acid, an organic acid, a solvent and water. The concentrations of the inorganic acid, the organic acid, the solvent and the water are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate as described previously and throughout the specification.
- The present invention also provides packaged formulations that include an etching solution that has an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water. The concentrations of the inorganic acid, organic acid and ethylenically unsaturated monomer are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate as described throughout the specification.
- The present invention further provides packaged formulations that consist essentially of an etching solution that has an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water. The concentrations of the inorganic acid, organic acid and ethylenically unsaturated monomer are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate as described throughout the specification.
- In another aspect, packaged formulations are provided that include a first container having an etching solution and a second container having a curable composition. The etching solution includes an inorganic acid, an organic acid, a surfactant and water. The concentrations of the inorganic acid, the organic acid, the surfactant and the water are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, as described previously and throughout the specification.
- The second container having the curable composite includes (a) at least one ethylenically unsaturated functional monomer; (b) at least one polyethylenically unsaturated functional crosslinking monomer; (c) (optional) a fluoride ion agent; and (d) a solvent. The concentrations of (a), (b), (c) and (d) are as provided throughout the present specification. Instructions are also provided for the application of the curable composite to the bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a restorative material.
- In still another aspect, packaged formulations are provided that include a first container having an etching solution and a second container having a curable composition. The etching solution includes an inorganic acid, an organic acid, a solvent and water. The concentrations of the inorganic acid, the organic acid, the solvent and the water are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate as described previously and throughout the specification.
- The second container having the curable composite includes (a) at least one ethylenically unsaturated functional monomer; (b) at least one polyethylenically unsaturated functional crosslinking monomer; (c) (optional) a fluoride ion agent; and (d) a solvent. The concentrations of (a), (b), (c) and (d) are as provided throughout the present specification. Instructions are also provided for the application of the curable composite to the bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a restorative material.
- In another aspect, packaged formulations are provided that include a first container having an etching solution and a second container having a curable composition. The etching solution consists essentially of an inorganic acid, an organic acid and water. The concentrations of the inorganic acid, the organic acid and the water are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, as described previously and throughout the specification.
- The second container having the curable composite includes (a) at least one ethylenically unsaturated functional monomer; (b) at least one polyethylenically unsaturated functional crosslinking monomer; (c) a (optional) ion agent; and (d) a solvent. The concentrations of (a), (b), (c) and (d) are as provided throughout the present specification. Instructions are also provided for the application of the curable composite to the bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a restorative material.
- In still another aspect, packaged formulations are provided that include a first container having an etching solution and a second container having a curable composition. The etching solution consists essentially of an inorganic acid, an organic acid, solvent and water. The concentrations of the inorganic acid, the organic acid, the solvent and the water are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, as described previously and throughout the specification.
- The second container having the curable composite includes (a) at least one ethylenically unsaturated functional monomer; (b) at least one polyethylenically unsaturated functional crosslinking monomer; (c) (optional) a fluoride ion agent; and (d) a solvent. The concentrations of (a), (b), (c) and (d) are as provided throughout the present specification. Instructions are also provided for the application of the curable composite to the bone substrate, i.e., a tooth, such that the substrate is conditioned for further treatment with a restorative material.
- Alternatively, the etch solution of the first container includes an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water and/or a solvent. The concentrations of the inorganic acid, organic acid, the ethylenically unsaturated monomer, water, and/or solvent, are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, as described previously and throughout the specification.
- In another embodiment, the etch solution of the first container consists essentially of an inorganic acid, an organic acid, an ethylenically unsaturated monomer and water and/or a solvent. The concentrations of the inorganic acid, organic acid, the ethylenically unsaturated monomer, water, and/or solvent, are as provided throughout the present specification. Instructions are provided for the application of the etching solution to a bone substrate, i.e., a tooth, as described previously and throughout the specification.
- The containers that can be used for the packaged products are those that are generally commercially available. Any container suitable for retaining the liquids can be used that does not react with the solution(s). The container can be a reusable bottle, as known in the art, a single use bottle or pouch. The container can be collapsible, such as those foil packets known in the art. In certain embodiments, it is advantageous to provide a container that does not permit light to penetrate through the bottle. The solutions can be stored at or below room temperature, so that the container should be to withstand temperatures below room temperature. Bottles or packets prepared from polyethylene or polypropylene are suitable as well as those aluminized foil packets prepared from various terephthalates.
- The present invention also provides methods to use the etch solutions, alone or in combination with the curable compositions of the invention. It should be understood that the etch solutions of the present invention can be used with those commercially available bonding resins. The method of the invention involves applying an effective amount of an etching solution to the substrate. The etch solution can be any of the solutions described herein, and for example, can include an inorganic acid, an organic acid, a solvent and water. The excess etching solution is removed from the substrate such that the substrate remains moist. This can be easily accomplished by touching an absorbent material to the surface and blotting the excess from the surface. Thereafter, a curable composite is applied to the moist substrate, i.e., a tooth. The curable composites of the packaged formulations and methods which follow can further include photoinitiator systems as described throughout the specification.
- The present invention also provides methods for adhering a material to a bone substrate, i.e., a dental substrate. The methods generally include applying an effective amount of an etching solution that includes an inorganic acid, an organic acid, a surfactant and water to a substrate, removing excess etching solution from the substrate such that the substrate remains moist and applying a curable composite to the moist substrate. The curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite. A restorative material can be adhered to the composite thereafter.
- The concentrations of the inorganic acid, the organic acid, the surfactant, the water and the components of the curable composition are as provided throughout the present specification.
- In another aspect, the invention provides methods for adhering a material to a bone substrate, i.e., a dental substrate. The methods generally include applying an effective amount of an etching solution that includes an inorganic acid, an organic acid, a solvent and water to a substrate, removing excess etching solution such that the substrate remains moist and applying a curable composite to the moist substrate. The curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite. A restorative material can be adhered to the composite thereafter.
- The concentrations of the inorganic acid, the organic acid, the solvent, the water and the components of the curable composition are as provided throughout the present specification.
- The present invention further provides methods for adhering a material to a bone substrate, i.e., a dental substrate. The methods generally include applying an effective amount of an etching solution that consists essentially of an inorganic acid, an organic acid, a surfactant and water to a substrate, removing excess etching solution such that the substrate remains moist and applying a curable composite to the moist substrate. The curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite. A restorative material can be adhered to the composite thereafter.
- The concentrations of the inorganic acid, the organic acid, the surfactant, the water and the components of the curable composition are as provided throughout the present specification.
- In still another aspect, the invention provides methods for adhering a material to a bone substrate, i.e., a dental substrate. The methods generally include applying an effective amount of an etching solution that consists essentially of an inorganic acid, an organic acid, a solvent and water to a substrate, removing excess etching solution such that the substrate remains moist and applying a curable composite to the moist substrate. The curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite. A restorative material can be adhered to the composite thereafter.
- The concentrations of the inorganic acid, the organic acid, the solvent, the water and the components of the curable composition are as provided throughout the present specification.
- In an alternative embodiment, the invention provide methods for adhering a material to a bone substrate as described throughout the specification. The methods generally include application of an effective amount of an etch solution that includes an inorganic acid, an organic acid, an ethylenically unsaturated monomer, water and/or a solvent to a substrate, removing the excess etch solution such that the substrate remains moist and application of a curable composite to the moist substrate. The curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite. A restorative material can be adhered to the composite thereafter.
- The concentrations of the inorganic acid, the organic acid, the solvent, the water and the components of the curable composition are as provided throughout the present specification.
- In an alternative embodiment, the invention provide methods for adhering a material to a bone substrate as described throughout the specification. The methods generally include application of an effective amount of an etch solution that consists essentially of an inorganic acid, an organic acid, an ethylenically unsaturated monomer, water and/or a solvent to a substrate, removing the excess etch solution such that the substrate remains moist and application of a curable composite to the moist substrate. The curable composite can be exposed to a light source that emits an effective amount of energy to cure the composite. A restorative material can be adhered to the composite thereafter.
- The concentrations of the inorganic acid, the organic acid, the solvent, the water and the components of the curable composition are as provided throughout the present specification.
- The phrase “effective amount of an etching solution” or “effective amount of a dental etching solution” is that amount required to modify the surface architecture of the bone substrate. Not to be limited by theory, it is believed that the etching solution removes proteins, lipids, and other foreign materials from the surface of the substrate and penetrates into the substrate. The surface and the penetrated substrate area are cleaned and modified such that they are receptive toward further modification, i.e., a curable composite where reactive functionality such as ethylenic bonds can attach to the modified material. A skilled artisan can readily determine the amount of etch solution to apply to the substrate, however, only enough of the solution is required so as to wet the surface and keep it moist as the surface is modified during rubbing.
- The phrases “removing excess etching solution” or “removing excess dental etching solution” is intended to mean that a sufficient amount of the etching solution is removed from the substrate so that the surface remains wetted, i.e., moist. This can be accomplished by a variety of ways, including but not limited to, contacting the wet surface with an absorbent material, i.e., a cotton swab or tissue, passing a stream of air over the surface, and other methods known in the art. Ideally, enough etch solution should remain so that the surface of the substrate remains moist and does not become dry.
- In an exemplary method, the substrate material is cleaned with isopropyl alcohol, rinsed with water and dried for at least 3 seconds. 1-2 drops of the etch solution are placed in an open well receptacle and a cotton or foam pellet is contacted to the solution. The moistened applicator is contacted to the substrate such that the area to be treated is wetted. The applicator is gently agitated with the solution against the surface for at least about 10 to about 30 seconds, i.e., from about 10 to about 30 seconds, from about 10 to about 20 seconds, or from about 10 to about 15 seconds.
- Generally, the etch solution is allowed to remain on the substrate surface for approximately 10 to about 30 seconds, i.e., from about 10 to about 20 seconds, or from about 10 to about 15 seconds. During this time, the applicator is then pressed against an absorbent material, such as a patient napkin or to a facial tissue, to remove most of the liquid from the applicator. The wetted surface is contacted to the partially dried applicator to remove the excess etch solution while leaving the surface visibly moist. Alternatively, the wetted surface can be partially dried by passing compressed air over the treated surface area. Ideally, the preparation should not be allowed to dry. There is no requirement to rinse the etch solution from the surface before any further applications are done.
- After the etching treatment is complete, from about 1 to about 3 coats of an adhesive resin, such as those that are available commercially or those described within the present application, can be applied directly over the moist conditioned preparation with a suitable applicator, such as a brush. The adhesive resin is dried gently, for about 5-8 seconds to facilitate evaporation of the solvent. After the surface is dried, the surface should appear to be “shiny,” if not, additional resin adhesive should be applied. The adhesive resin is then light-cured for about 10 seconds. Optionally, a restorative material can be applied to the adhesively treated surface to continue the procedure. However, depending upon what therapeutic treatment is intended, the adhesive resin can serve as a protectant covering and no further restorative treatment may be necessary.
- For example, the etching/adhesive system can be used to seal enamel/dentin prior to restoration with light-cured or self-cured composite materials. Indirect Restorations are also encompassed by the present invention and include those preparations when using a light-cured, self-cured or dual-cured composite cement or glass ionomer or resin-modified glass ionomer cement. The methods and compositions of the invention can also be useful for desensitization to treat hypersensitive and/or exposed root surfaces. Additionally, the methods and compositions of the invention can be used to bond in a post and core.
- Restorative materials applicable for use with the present invention include those known in the art. Composite materials, synthetic bone materials, bone-like apatite and hydroxyapatite materials are well suited for use with the compositions and methods of the invention. Suitable examples of dental restoratives include composite filling materials, inlays, onlays, crown, bridges, ceramics, veneers and Maryland bridges.
- The invention is further illustrated by the following examples which in no way should be construed as being further limiting. The contents of all references, pending patent applications and published patent applications, cited throughout this application, including those referenced in the background section, are hereby incorporated by reference. It should be understood that the models used throughout the examples are accepted models and that the demonstration of efficacy in these models is predictive of efficacy in humans.
-
FIG. 1 is a cross sectional photograph of a tooth treated with an etch solution of the present invention followed by subsequent treatment with an adhesive bonding composition of the invention. The tooth was placed in 0.5% fushin dye for 24 hours. The photograph demonstrates that no dye penetrated along the margins treated with the etch and bonding composite of the invention. -
FIG. 2 is a second cross sectional photograph of the tooth depicted inFIG. 1 . -
FIG. 3 is a cross sectional photograph of a tooth treated with “One Up Bond”, a commercially available etch/bonding system. One Up Bond contains a proprietary phosphate ester referred to as MAC-10 and is available from J. Moriat USA, Inc., 9 Mason, Irvine, Calif. 92618. The arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment. -
FIG. 4 is a cross sectional photograph of a tooth treated with “Prompt-L-Pop, a commercially available etch/bonding system. Prompt-L-Pop contains phosphonic acids and is available from 3M ESPE Dental Products, P.O. Box 33275, St. Paul, Minn. 55133-3275. The arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment. -
FIG. 5 is a cross sectional photograph of a tooth treated with “Clearfil SE Bond”, a commercially available etch/bonding system. Clearfil SE Bond contains a phosphate ester and is available from Kuraray America, Inc., 200 Park Avenue, New York, N.Y. 10166-3098. The arrow points to the critical area showing dye penetration into the tooth, indicating an adhesive failure at the margins of the treatment. -
FIGS. 1 and 2 demonstrate that the present invention provides superior adhesive properties such that dye does not penetrate the treated area by the method and compositions of the present invention. The commercially available etch/resin systems do not provide suitable adhesion such that the bonding of dental components is weak, thus allowing dye to penetrate into the poorly adhered portions of the tooth.TABLE 1 Inorganic Acid Organic Acid Dwell time Substrate mPA 7% Nitric none 30 seconds; dentin; resin 12.21 ± 5.4 Acid no blotting added without blotting 7% Nitric none 30 seconds enamel 21.98 ± 3.2 Acid 7% Nitric succinic acid 30 seconds dentin 22.36 ± 1.4 Acid 5% 7% Nitric succinic acid 30 seconds enamel 22.48 ± 1.2 Acid 5% - The experiments in Table 1 were conducted with an etch solution having the concentration of ingredients listed in Table 1. The resin utilized was composed of 20% by weight of PMGDM, 15% by weight HEMA and 8% by weight of bis-GMA with the remainder being solvent. The method utilized was to apply the etch solution to the substrate surface with a cotton or foam pellet and gently agitate the solution soaked pellet against the substrate for approximately 10 to about 15 seconds. The pellet was then placed against an absorbent material such as a napkin or tissue to remove excess solution. The pellet was then contacted to the substrate surface to remove the excess etching solution by blotting (unless indicated otherwise). The resin composition was then applied to the substrate surface using 2 to 3 coats of the resin. This was dried thoroughly with dried compressed air for about 5 to about 8 seconds prior to treatment with a restorative material.
- The applied resin was light-activated for ten seconds. A teflon mold having a matrix of 4 mm diameter and depth of 2 mm was clamped to the tooth. An all-purpose composite (quartz and silica composite material) was inserted into the matrix and light-activated for 40 seconds. The mold was then removed and the samples stored in water at 37 degrees C. for 24 hours. The samples were then subjected to shear bond strength testing on a Universal testing machine with a crosshead speed of 5 mm/min. The force required to break the composite from the surfaces was recorded in kg and converted to mPa on the basis of the surface area of the sample.
- All samples throughout the experiments were prepared prior to testing. The test sample was steam sterilized for 24 hours prior to treatment. The preparation included that a tooth was stabilized and embedded into a cylindrical mounting with a polymerizable monomer, such as methyl methacrylate. The tooth surface was ground until an appropriate surface was exposed, i.e., enamel or dentin. The surface was finely polished, rinsed, dried and then treated. All samples were prepared this way; both with the etch and curable composites of the invention as well as those of competitive products. This was done for consistency between samples.
- The following experiments were conducted with a composition of the present invention referred to as SIMPLICITY™. The etchant solution was composed of 5% by weight nitric acid, 2.5% by weight succinic acid and 2.5% by weight methacrylic acid, unless listed otherwise, with the balance being water. The resin was 20% by weight PMGDM, 15% by weight HEMA, 8% by weight bis-GMA, 3% by weight ethyldimethylaminobenzoic acid (EDMAB) and 0.3% by weight camphoroquinone (CQ), with the balance being acetone. Self cure means that the resin applied to the treated surface is self-cured, i.e., no light treatment. Light-activated systems were preferred as described above. To the resin treated surface was applied a restorative material identified in the chart. Additional light activation was utilized with the systems of the present invention.
- In comparison, the protocols supplied by the commercial suppliers were utilized for the competitive products.
- A teflon mold having a matrix of 4 mm diameter and depth of 2 mm was clamped to the sample tooth. The all-purpose composite or appropriate material was inserted into the matrix and treated as described above, or by the protocols supplied by the commercial supplier. The mold was then removed and the samples stored in water at 37 degrees C. for 24 hours. The samples were then subjected to shear bond strength testing on a Universal testing machine with a crosshead speed of 5 mm/min. The force required to break the composite from the surfaces was recorded in kg and converted to mPa on the basis of the surface area of the sample.
- The method utilized was to apply the etch solution to the substrate surface with a cotton or foam pellet and gently agitate the solution soaked pellet against the substrate for approximately 10 to about 15 seconds. The pellet was then placed against an absorbent material such as a napkin or tissue to remove excess solution. The pellet was then contacted to the substrate surface to remove the excess etching solution by blotting. The resin composition was then applied to the substrate surface using 2 to 3 coats of the resin. This was dried thoroughly with dried compressed air for between about 5 and about 8 seconds and then light-activated for 10 seconds.
- Light activation was achieved by use of a visible light generating device (Bisco VIP light, Bisco Dental Products, Schaumburg, Ill., that emits wavelengths approximately between about 400 and 500 nanometers (nm) (CQ absorption maximum is about 468 nm). Extra “air thinning” denotes that the resin applied was thinned by drying with compressed air for an extended period of time and with additional force. This causes oxygen inhibition to come into effect and provides for a discrimination between those materials which are more susceptible to oxygen inhibition and those which are not.
- The composite materials referred to include Bis-fil All Purpose, a quartz filled composite, B2FB is a self-cure composite available from Bisco Dental Products, Schaumburg, Ill., RelyX ARC is a dual-cure composite cement available from 3M Dental, St. Paul, Minn. and Z-100 is a restorative composite available form 3M. In order to compare the commercially available systems to that of the present invention, the method of testing on the final composite was maintained as the same throughout. Unless otherwise noted in the chart, composite samples were prepared with an all purpose quartz silica composite material for testing of adhesive/cohesive bond properties.
- The following chart includes these abbreviations: DF denotes dental fracture. NP is a nonprecious metal, such as nickel chromium. Precious metal (ME) is a gold alloy.
Group 84 Instron PSI MPa 1 35.4 4005.6 27.63 2 39.5 4470.6 30.83 Simplicity 3 24.6 2781.7 19.18 enamel 4 31.1 3513.6 24.23 AVERAGE 32.6 3692.9 25.47 ST. DEV 6.4 722.3 4.98 CO. VAR., % 19.6 19.6 19.6 -
Group 85 Instron PSI MPa 1 20.2 2289.6 15.79 Simplicity Present invention 2 23.0 2599.5 17.93 Precious with 3 25.3 2866.5 19.77 metal precious 4 27.3 3082.6 21.26 (ME) metal AVERAGE 24.0 2709.6 18.69 gold alloy ST. DEV 3.0 342.7 2.36 CO. VAR., % 12.6 12.6 12.6 -
Group 86 Instron PSI MPa 1 28.2 3185.5 21.97 Simplicity 2 14.9 1688.9 11.65 BF2B 3 26.1 2946.8 20.32 dentin 4 20.4 2307.7 15.92 5 28.6 3237.5 22.33 AVERAGE 23.6 2673.3 18.44 ST. DEV 5.9 663.0 4.57 CO. VAR., % 24.8 24.8 24.8 20.13 2.94 14.6 -
Group 86-1 Instron PSI MPa 1 15.8 1788.5 12.33 Touch & Bond Competing 2 4.5 507.1 3.50 BF2B system 3 6.1 695.5 4.80 dentin with AVERAGE 8.8 997.0 6.88 self-cure ST. DEV 6.1 691.8 4.77 composite CO. VAR., % 69.4 69.4 69.4 -
Group 86-2 Instron PSI MPa 1 14.5 1642.5 11.33 One-Up Bond Competing 2 6.3 710.6 4.90 BF2B system with AVERAGE 10.4 1176.6 8.11 dentin self-cure ST. DEV 5.8 659.0 4.54 composite CO. VAR., % 56.0 56.0 56.0 -
Group 86-3 Instron PSI MPa 1 23.9 2702.5 18.64 Simplicity 2 24.0 2714.9 18.72 dentin 3 28.2 3185.5 21.97 4 22.7 2572.4 17.74 5 32.6 3690.0 25.45 AVERAGE 26.3 2973.1 20.50 ST. DEV 4.1 463.6 3.20 CO. VAR., % 15.6 15.6 15.6 -
Group 86-4 unknown metal substrate Instron PSI MPa 1 19.7 2229.6 15.38 Simplicity Present invention 2 20.5 2314.5 15.96 NP metal with non-precious 3 25.7 2906.1 20.04 metal 4 29.4 3325.8 22.94 Nickel/chromium 5 22.4 2529.4 17.44 AVERAGE 23.5 2661.1 18.35 ST. DEV 4.0 454.3 3.13 CO. VAR., % 17.1 17.1 17.1 -
Group 86-5 Instron PSI MPa 1 22.3 2527.1 17.43 SE Bond Competing 2 15.8 1786.2 12.32 BF2B system with 3 18.9 2134.6 14.72 self-cure AVERAGE 19.0 2149.3 14.82 composite ST. DEV 3.3 370.7 2.56 CO. VAR., % 17.2 17.2 17.2 -
Group 86-6 Instron PSI MPa 1 23.0 2602.9 17.95 Simplicity this shows 2 18.7 2119.9 14.62 BF2B the present 3 27.5 3106.3 21.42 dentin invention bonds AVERAGE 23.1 2609.7 18.00 with self-cure ST. DEV 4.4 493.2 3.40 composites CO. VAR., % 18.9 18.9 18.9 -
Group 86-7 Instron PSI MPa 1 23.4 2644.8 18.24 Simplicity This shows 2 19.1 2156.1 14.87 RelyX ARC the present 3 23.0 2602.9 17.95 dark cure system bonds 4 24.5 2776.0 19.14 dentin well with another AVERAGE 22.5 2545.0 17.55 company's ST. DEV 2.4 269.5 1.86 self-cure CO. VAR., 10.6 10.6 10.6 material % -
Group 8 Instron PSI MPa 1 28.7 3248.9 22.41 This is a control 2 37.9 4290.7 29.59 OS material 3 34.5 3905.0 26.93 “OS” is One Step AVERAGE 33.7 3814.8 26.31 ST. DEV 4.7 526.7 3.63 CO. VAR., % 13.8 13.8 13.8 Dentin fracture -
Group 9 Instron PSI MPa 1 25.1 2836.0 19.56 2 34.2 3868.8 26.68 Simplicity 3 31.3 3538.5 24.40 enamel 4 23.3 2630.1 18.14 5 24.0 2709.3 18.68 AVERAGE 27.6 3116.5 21.49 ST. DEV 4.9 553.4 3.82 CO. VAR., % 17.8 17.8 17.8 -
Group 18 Instron PSI MPa 1 17.2 1946.8 13.43 2 25.8 2915.2 20.10 3 35.1 3975.1 27.41 DF 4 28.6 3239.8 22.34 Simplicity 5 25.9 2924.2 20.17 dentin AVERAGE 26.5 3000.2 20.69 ST. DEV 6.5 729.8 5.03 CO. VAR., % 24.3 24.3 24.3 -
Group 19 Instron PSI MPa 1 33.6 3802.0 26.22 Simplicity This shows 2 23.0 2599.5 17.93 Z100 the system 3 28.4 3216.1 22.18 dentin works with AVERAGE 28.3 3205.9 22.11 other composites ST. DEV 5.3 601.3 4.15 CO. VAR., % 18.8 18.8 18.8 -
Group 26 Instron PSI MPa 1 29.3 3316.7 22.87 Simplicity 2 29.1 3295.2 22.73 3 27.5 3115.4 21.49 AVERAGE 28.7 3242.5 22.36 dentin ST. DEV 1.0 110.6 0.76 CO. VAR., % 3.4 3.4 3.4 -
Group 30 Instron PSI MPa 1 24.1 2724.0 18.79 Simplicity 2 45.3 5126.7 35.36 enamel 3 29.1 3291.8 22.70 4 37.9 4288.5 29.58 5 22.5 2547.5 17.57 AVERAGE 31.8 3595.7 24.80 ST. DEV 9.7 1092.6 7.53 CO. VAR., % 30.4 30.4 30.4 -
Group 29 Instron PSI MPa 1 25.3 2860.9 19.73 Simplicity 2 34.4 3893.7 26.85 dentin 3 23.4 2642.5 18.22 4 29.0 3282.8 22.64 DF 5 32.0 3616.5 24.94 AVERAGE 28.8 3259.3 22.48 ST. DEV 4.6 517.1 3.57 CO. VAR., % 15.9 15.9 15.9 -
Group 36 Instron PSI MPa 1 8.4 953.6 6.58 One-Up 36, 37, 40 2 3.0 339.4 2.34 Bond and 34 3 12.6 1420.8 9.80 air-thin show how AVERAGE 8.0 904.6 6.24 5 sec competing systems ST. DEV 4.8 542.4 3.74 dentin suffer when CO. VAR., 60.0 60.0 60.0 thinned % with compressed air. The present system does not suffer this drawback -
Group 37 Instron PSI MPa 1 34.1 3856.3 26.60 simplicity 2 29.4 3322.4 22.91 5 sec 3 22.2 2507.9 17.30 air thin AVERAGE 28.5 3228.9 22.27 dentin ST. DEV 6.0 679.1 4.68 CO. VAR., % 21.0 21.0 21.0 -
Group 40 Instron PSI MPa 1 16.5 1871.0 12.90 Touch & Bond 2 16.1 1822.4 12.57 5 sec 3 12.5 1409.5 9.72 air thin AVERAGE 15.0 1701.0 11.73 dentin ST. DEV 2.2 253.6 1.75 CO. VAR., % 14.9 14.9 14.9 -
Group 34 1 9.2 1044.7 7.20 SE Bond 2 16.0 1810.0 12.48 5 sec 3 10.5 1187.8 8.19 air-thin 4 17.4 1970.6 13.59 resin 5 11.3 1278.3 8.82 dentin AVERAGE 12.9 1458.3 10.06 ST. DEV 3.6 407.1 2.81 CO. VAR., % 27.9 27.9 27.9 - Although the present invention has been described with reference to preferred embodiments, persons skilled in the art will recognize that changes may be made in form and detail without departing from the spirit and scope of the invention. All references cited throughout the specification, including those in the background, are incorporated herein in their entirety. Those skilled in the art will recognize, or be able to ascertain, using no more than routine experimentation, many equivalents to specific embodiments of the invention described specifically herein. Such equivalents are intended to be encompassed in the scope of the following claims.
Claims (14)
1. A curable dental composite comprising:
(a) at least one ethylenically unsaturated functional monomer;
(b) at least one polyethylenically unsaturated functional crosslinking monomer; and
(c) a solvent;
wherein the ethylenically unsaturated monomer of (a) is present in an amount of from about 0.5 to about 25 parts by weight, the polyethylenically unsaturated crosslinking monomer of (b) is present in an amount from about 5.0 to about 40 parts by weight, with (c) the solvent being present in an amount to equal a total of 100 parts by weight of all components.
2. The curable dental composition of claim 1 , wherein the functional monomer (a) is present in an amount between about 10 parts by weight and about 20 parts by weight and the polyethylenically unsaturated crosslinking monomer (b) is present in an amount between about 18 parts by weight and about 38 parts by weight.
3. The curable dental composition of claim 2 , wherein the functional monomer (a) is selected from the group of hydroxyethylmethacrylate, hydroxypropylmethacrylate, and hydroxybutylmethacrylate and the polyethylenically unsaturated crosslinking monomer (b) is a mixture of pyromellitic dianhydride with glycerol dimethacrylate (PMGDM) and 2,2′-bis[4-(3-methacryloxy-2-hydroxy propoxy)-phenyl]-propane (bis-GMA).
4. The curable dental composition of claim 3 , wherein the functional monomer (a) is hydroxyethylmethacrylate and the polyethylenically unsaturated crosslinking monomer (b) is a mixture of PMGDM and bis-GMA.
5. The curable dental composition of claim 4 , wherein the functional monomer (a) is present in an amount of about 10 to about 20 parts by weight, the first polyethylenically unsaturated crosslinking monomer, PMGDM is present in an amount of about 20 to about 30 parts by weight, the second polyethylenically unsaturated crosslinking monomer bis-GMA is present in an amount of about 5 to about 10 parts by weight.
6. The curable dental composition of clam 1, further comprising a photoinitiator system.
7. The curable dental composition of claim 6 , wherein the photoinitiator system comprises a light-sensitive initiator and a polymerization accelerator.
8. The curable dental composition of claim 7 , wherein the light-sensitive initiator is camphorquinone and the polymerization accelerator is ethyl N,N-dimethyl-4-aminobenzoic acid.
9. The curable dental composition of clam 3, further comprising a photoinitiator system.
10. The curable dental composition of claim 9 , wherein the photoinitiator system comprises a light-sensitive initiator and a polymerization accelerator.
11. The curable dental composition of claim 10 , wherein the light-sensitive initiator is camphorquinone and the polymerization accelerator is ethyl N,N-dimethyl-4-aminobenzoic acid.
12. The curable dental composition of clam 4, further comprising a photoinitiator system.
13. The curable dental composition of claim 12 , wherein the photoinitiator system comprises a light-sensitive initiator and a polymerization accelerator.
14. The curable dental composition of claim 13 , wherein the light-sensitive initiator is camphorquinone and the polymerization accelerator is ethyl N,N-dimethyl-4-aminobenzoic acid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/364,278 US20070021527A1 (en) | 2001-12-18 | 2006-02-27 | Device for dental applications |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34161901P | 2001-12-18 | 2001-12-18 | |
US35888302P | 2002-02-21 | 2002-02-21 | |
US10/323,865 US7041164B2 (en) | 2001-12-18 | 2002-12-18 | Dental etch solutions |
US11/364,278 US20070021527A1 (en) | 2001-12-18 | 2006-02-27 | Device for dental applications |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/323,865 Continuation US7041164B2 (en) | 2001-12-18 | 2002-12-18 | Dental etch solutions |
Publications (1)
Publication Number | Publication Date |
---|---|
US20070021527A1 true US20070021527A1 (en) | 2007-01-25 |
Family
ID=27406302
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/323,865 Expired - Lifetime US7041164B2 (en) | 2001-12-18 | 2002-12-18 | Dental etch solutions |
US11/364,278 Abandoned US20070021527A1 (en) | 2001-12-18 | 2006-02-27 | Device for dental applications |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/323,865 Expired - Lifetime US7041164B2 (en) | 2001-12-18 | 2002-12-18 | Dental etch solutions |
Country Status (6)
Country | Link |
---|---|
US (2) | US7041164B2 (en) |
EP (1) | EP1458327B1 (en) |
AT (1) | ATE347346T1 (en) |
AU (1) | AU2002351402A1 (en) |
DE (1) | DE60216633D1 (en) |
WO (1) | WO2003051316A1 (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7241856B2 (en) * | 2003-06-02 | 2007-07-10 | Pentron Clinical Technologies Llc | Dental resins, dental composite materials, and method of manufacture thereof |
AU2002351402A1 (en) | 2001-12-18 | 2003-06-30 | John Kanca Iii | Device for dental applications |
WO2004071470A1 (en) * | 2003-02-07 | 2004-08-26 | Kanca John A | Methods to treat dentin surfaces |
US8686063B2 (en) * | 2005-01-21 | 2014-04-01 | Charité—Universitätsmedizin Berlin | Method of infiltrating enamel lesions |
US7485673B2 (en) * | 2005-01-21 | 2009-02-03 | Charite-Universitatsmedizin Berline | Method of infiltrating enamel lesions |
US7452925B2 (en) * | 2005-02-25 | 2008-11-18 | John A. Kanca, III | Three part dental bonding compositions and methods of use |
US20070009448A1 (en) * | 2005-02-25 | 2007-01-11 | Kanca John A Iii | Silanol based dental treatment |
US7846989B2 (en) * | 2005-02-25 | 2010-12-07 | John A. Kanca | Dental gel etchants |
IL168603A (en) * | 2005-05-16 | 2011-05-31 | Resdevco Res And Dev Co | Pharmaceutical or cosmetic composition for the prevention and treatment of irritation of mucous cells or skin cells |
CA2634560C (en) * | 2005-12-21 | 2015-03-03 | Paul Duineveld | System for use with a droplet cleaning device for clearing an impact area for the droplets |
EP1872767A1 (en) | 2006-06-30 | 2008-01-02 | Ernst Mühlbauer GmbH & Co.KG | Polymérisable dental material |
US7963769B2 (en) | 2007-10-08 | 2011-06-21 | Kerr Corporation | Dental adhesive and method of use |
EP2108357B1 (en) * | 2008-04-11 | 2014-02-12 | Mühlbauer Technology GmbH | Conditioning agent for the etching of enamel lesions |
EP2108356B1 (en) * | 2008-04-11 | 2017-01-25 | Mühlbauer Technology GmbH | Conditioning agent for the etching of enamel lesions |
US20100173267A1 (en) * | 2009-01-06 | 2010-07-08 | Cao Group, Inc. | Method for producing restorative tooth preparation and treatment compositions and product |
US8696759B2 (en) | 2009-04-15 | 2014-04-15 | DePuy Synthes Products, LLC | Methods and devices for implants with calcium phosphate |
Citations (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3955282A (en) * | 1975-03-03 | 1976-05-11 | Mcnall Earl G | Process of mounting orthodontic bracket to tooth |
US4362889A (en) * | 1979-02-09 | 1982-12-07 | The American Dental Association Health Foundation | Use of a polyfunctional surface-active comonomer and other agents to improve adhesion between a resin or composite material and a substrate |
US4376673A (en) * | 1981-02-19 | 1983-03-15 | Pennwalt Corporation | Method for etching dental porcelain |
US4645456A (en) * | 1985-08-26 | 1987-02-24 | Lee Pharmaceuticals, Inc. | Adhesive compositions for tooth enamel |
US4659751A (en) * | 1983-01-10 | 1987-04-21 | American Dental Association Health Foundation | Simplified method for obtained strong adhesive bonding of composites to dentin, enamel and other substrates |
US4719149A (en) * | 1986-02-28 | 1988-01-12 | Minnesota Mining And Manufacturing Company | Method for priming hard tissue |
US4810195A (en) * | 1987-04-24 | 1989-03-07 | Bayer Aktiengesellschaft | Conditioning liquids for tooth or bone matter |
US4964911A (en) * | 1987-10-13 | 1990-10-23 | Den-Mat Corporation | Adhesive bonding of acrylic resins, especially in dentistry |
US5256065A (en) * | 1989-11-13 | 1993-10-26 | Nicholson James A | Acid etch for dental treatments |
US5276068A (en) * | 1985-03-29 | 1994-01-04 | Jeneric/Pentron, Inc. | Dental resin materials |
US5304585A (en) * | 1981-02-13 | 1994-04-19 | Minnesota Mining And Manufacturing | Dentin and enamel adhesive |
US5525648A (en) * | 1991-12-31 | 1996-06-11 | Minnesota Mining And Manufacturing Company | Method for adhering to hard tissue |
US5530038A (en) * | 1993-08-02 | 1996-06-25 | Sun Medical Co., Ltd. | Primer composition and curable composition |
US5595487A (en) * | 1994-06-30 | 1997-01-21 | Minnesota Mining And Manufacturing Company | Method for bonding amalgam to dental surfaces |
US5739177A (en) * | 1993-12-28 | 1998-04-14 | Tokuyama Corporation | Dental composition |
US5749733A (en) * | 1995-02-02 | 1998-05-12 | Bisco, Inc. | One-component primer/bonding-resin system |
US5766012A (en) * | 1997-04-28 | 1998-06-16 | Rosenbaum; Michael | Dental etchant and process of using |
US5789610A (en) * | 1992-06-15 | 1998-08-04 | American Dental Association Health Foundation | Adhesion-promoting agents incorporating polyvalent cations |
US5866629A (en) * | 1995-12-05 | 1999-02-02 | The University Of Toronto Innovations Foundation | Dental and medical primer formulations containing tissue infiltrating agents |
US5954996A (en) * | 1994-07-13 | 1999-09-21 | Centrix, Inc. | Dental etch and package therefor |
US6004390A (en) * | 1997-04-14 | 1999-12-21 | Dentsply Detrey Gmbh | Tooth surface treatment composition and methods |
US6031016A (en) * | 1995-07-05 | 2000-02-29 | Den-Mat Corporation | Dental adhesive |
US6100314A (en) * | 1997-05-12 | 2000-08-08 | Espe Dental Ag | Adhesive system for dental purposes |
US6147137A (en) * | 1998-09-10 | 2000-11-14 | Jeneric/Pentron Incorporated | Dental primer and adhesive |
US6312667B1 (en) * | 1998-11-12 | 2001-11-06 | 3M Innovative Properties Company | Methods of etching hard tissue in the oral environment |
US6326417B1 (en) * | 1999-10-21 | 2001-12-04 | Jeneric/Pentron Incorporated | Anti-microbial dental compositions and method |
US6458869B1 (en) * | 2000-03-30 | 2002-10-01 | National Institute Of Standards Of Technology | Etchant/primer composition, etchant/primer/adhesive monomer composition, kits and methods using the same for improved bonding to dental structures |
US6592372B2 (en) * | 2000-05-11 | 2003-07-15 | Jeneric/Pentron Incorporated | Method of etching and priming a tooth |
US20030207960A1 (en) * | 2001-05-10 | 2003-11-06 | Weitao Jia | Self-etching primer adhesive and method of use therefor |
US20070021525A1 (en) * | 2005-02-25 | 2007-01-25 | Kanca John A Iii | Three part dental bonding compositions and methods of use |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61176507A (en) | 1985-01-30 | 1986-08-08 | Kanebo Ltd | Dental adhesive |
US4814423A (en) | 1987-11-06 | 1989-03-21 | Dentsply Research & Development Corp. | Dual bonding adhesive composition |
JP2002523525A (en) | 1998-08-18 | 2002-07-30 | バイオマット サイエンス,インク. | Adhesive composition for human hard tissue |
AU2002351402A1 (en) | 2001-12-18 | 2003-06-30 | John Kanca Iii | Device for dental applications |
-
2002
- 2002-12-18 AU AU2002351402A patent/AU2002351402A1/en not_active Abandoned
- 2002-12-18 EP EP02787061A patent/EP1458327B1/en not_active Expired - Lifetime
- 2002-12-18 AT AT02787061T patent/ATE347346T1/en not_active IP Right Cessation
- 2002-12-18 WO PCT/US2002/040700 patent/WO2003051316A1/en active IP Right Grant
- 2002-12-18 DE DE60216633T patent/DE60216633D1/en not_active Expired - Fee Related
- 2002-12-18 US US10/323,865 patent/US7041164B2/en not_active Expired - Lifetime
-
2006
- 2006-02-27 US US11/364,278 patent/US20070021527A1/en not_active Abandoned
Patent Citations (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3955282A (en) * | 1975-03-03 | 1976-05-11 | Mcnall Earl G | Process of mounting orthodontic bracket to tooth |
US4362889A (en) * | 1979-02-09 | 1982-12-07 | The American Dental Association Health Foundation | Use of a polyfunctional surface-active comonomer and other agents to improve adhesion between a resin or composite material and a substrate |
US5304585A (en) * | 1981-02-13 | 1994-04-19 | Minnesota Mining And Manufacturing | Dentin and enamel adhesive |
US4376673A (en) * | 1981-02-19 | 1983-03-15 | Pennwalt Corporation | Method for etching dental porcelain |
US4659751A (en) * | 1983-01-10 | 1987-04-21 | American Dental Association Health Foundation | Simplified method for obtained strong adhesive bonding of composites to dentin, enamel and other substrates |
US5276068A (en) * | 1985-03-29 | 1994-01-04 | Jeneric/Pentron, Inc. | Dental resin materials |
US4645456A (en) * | 1985-08-26 | 1987-02-24 | Lee Pharmaceuticals, Inc. | Adhesive compositions for tooth enamel |
US4719149A (en) * | 1986-02-28 | 1988-01-12 | Minnesota Mining And Manufacturing Company | Method for priming hard tissue |
US4810195A (en) * | 1987-04-24 | 1989-03-07 | Bayer Aktiengesellschaft | Conditioning liquids for tooth or bone matter |
US4964911A (en) * | 1987-10-13 | 1990-10-23 | Den-Mat Corporation | Adhesive bonding of acrylic resins, especially in dentistry |
US5256065A (en) * | 1989-11-13 | 1993-10-26 | Nicholson James A | Acid etch for dental treatments |
US5525648A (en) * | 1991-12-31 | 1996-06-11 | Minnesota Mining And Manufacturing Company | Method for adhering to hard tissue |
US5789610A (en) * | 1992-06-15 | 1998-08-04 | American Dental Association Health Foundation | Adhesion-promoting agents incorporating polyvalent cations |
US6071983A (en) * | 1993-08-02 | 2000-06-06 | Sun Medical Co., Ltd. | Primer composition and curable composition |
US5530038A (en) * | 1993-08-02 | 1996-06-25 | Sun Medical Co., Ltd. | Primer composition and curable composition |
US5834532A (en) * | 1993-08-02 | 1998-11-10 | Sun Medical Co., Ltd. | Primer composition and curable composition |
US5739177A (en) * | 1993-12-28 | 1998-04-14 | Tokuyama Corporation | Dental composition |
US5595487A (en) * | 1994-06-30 | 1997-01-21 | Minnesota Mining And Manufacturing Company | Method for bonding amalgam to dental surfaces |
US5954996A (en) * | 1994-07-13 | 1999-09-21 | Centrix, Inc. | Dental etch and package therefor |
US5749733A (en) * | 1995-02-02 | 1998-05-12 | Bisco, Inc. | One-component primer/bonding-resin system |
US6031016A (en) * | 1995-07-05 | 2000-02-29 | Den-Mat Corporation | Dental adhesive |
US5866629A (en) * | 1995-12-05 | 1999-02-02 | The University Of Toronto Innovations Foundation | Dental and medical primer formulations containing tissue infiltrating agents |
US6004390A (en) * | 1997-04-14 | 1999-12-21 | Dentsply Detrey Gmbh | Tooth surface treatment composition and methods |
US5766012A (en) * | 1997-04-28 | 1998-06-16 | Rosenbaum; Michael | Dental etchant and process of using |
US6100314A (en) * | 1997-05-12 | 2000-08-08 | Espe Dental Ag | Adhesive system for dental purposes |
US6147137A (en) * | 1998-09-10 | 2000-11-14 | Jeneric/Pentron Incorporated | Dental primer and adhesive |
US6312667B1 (en) * | 1998-11-12 | 2001-11-06 | 3M Innovative Properties Company | Methods of etching hard tissue in the oral environment |
US6326417B1 (en) * | 1999-10-21 | 2001-12-04 | Jeneric/Pentron Incorporated | Anti-microbial dental compositions and method |
US6458869B1 (en) * | 2000-03-30 | 2002-10-01 | National Institute Of Standards Of Technology | Etchant/primer composition, etchant/primer/adhesive monomer composition, kits and methods using the same for improved bonding to dental structures |
US6592372B2 (en) * | 2000-05-11 | 2003-07-15 | Jeneric/Pentron Incorporated | Method of etching and priming a tooth |
US20030207960A1 (en) * | 2001-05-10 | 2003-11-06 | Weitao Jia | Self-etching primer adhesive and method of use therefor |
US20070021525A1 (en) * | 2005-02-25 | 2007-01-25 | Kanca John A Iii | Three part dental bonding compositions and methods of use |
Also Published As
Publication number | Publication date |
---|---|
EP1458327B1 (en) | 2006-12-06 |
EP1458327A1 (en) | 2004-09-22 |
ATE347346T1 (en) | 2006-12-15 |
WO2003051316A8 (en) | 2003-10-09 |
AU2002351402A8 (en) | 2003-06-30 |
WO2003051316A1 (en) | 2003-06-26 |
AU2002351402A1 (en) | 2003-06-30 |
US7041164B2 (en) | 2006-05-09 |
DE60216633D1 (en) | 2007-01-18 |
US20030175218A1 (en) | 2003-09-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20070021527A1 (en) | Device for dental applications | |
US7846989B2 (en) | Dental gel etchants | |
US7226960B2 (en) | Self-etching primer adhesive and method of use therefor | |
EP1803433B1 (en) | One-component dental adhesive composition and method of use | |
JP4897124B2 (en) | Dental adhesive kit | |
US20060084717A1 (en) | Dental self-etching composition and method of use | |
WO2001038449A1 (en) | Adhesive composition | |
EP1346717B1 (en) | One-bottle dental bonding composition | |
AU6897398A (en) | Tooth surface treatment composition and methods | |
US20100196858A1 (en) | Silanol based dental treatment | |
JPH0782115A (en) | Primer composition | |
WO2004032884A1 (en) | Dental coating kit | |
US7665992B2 (en) | Three part dental bonding compositions and methods of use | |
JP4675456B2 (en) | Adhesive composition | |
WO2004071470A1 (en) | Methods to treat dentin surfaces | |
WO2007041587A2 (en) | Biomedical bond enhancer | |
JP5611644B2 (en) | Dental adhesive composition and kit | |
WO2010033515A1 (en) | Single-container dental adhesive | |
JP4514470B2 (en) | Two-component adhesive for columnless enamel | |
JP4050313B2 (en) | Methods and compositions for priming and adhesion to dental tissue | |
US6100314A (en) | Adhesive system for dental purposes | |
JP4514469B2 (en) | Two-component adhesive for columnless enamel |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |