US20060081974A1 - Electronic part mounting apparatus and method - Google Patents
Electronic part mounting apparatus and method Download PDFInfo
- Publication number
- US20060081974A1 US20060081974A1 US11/288,020 US28802005A US2006081974A1 US 20060081974 A1 US20060081974 A1 US 20060081974A1 US 28802005 A US28802005 A US 28802005A US 2006081974 A1 US2006081974 A1 US 2006081974A1
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- electronic part
- substrate
- mounting
- chamber
- stage
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/04—Mounting of components, e.g. of leadless components
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/75—Apparatus for connecting with bump connectors or layer connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3489—Composition of fluxes; Methods of application thereof; Other methods of activating the contact surfaces
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/51—Plural diverse manufacturing apparatus including means for metal shaping or assembling
- Y10T29/5136—Separate tool stations for selective or successive operation on work
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/51—Plural diverse manufacturing apparatus including means for metal shaping or assembling
- Y10T29/5136—Separate tool stations for selective or successive operation on work
- Y10T29/5137—Separate tool stations for selective or successive operation on work including assembling or disassembling station
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
- Y10T29/53174—Means to fasten electrical component to wiring board, base, or substrate
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
- Y10T29/53174—Means to fasten electrical component to wiring board, base, or substrate
- Y10T29/53178—Chip component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
- Y10T29/53174—Means to fasten electrical component to wiring board, base, or substrate
- Y10T29/53183—Multilead component
Definitions
- the present invention relates to an apparatus and a method for mounting an electronic part on a substrate.
- a technique is known in which the surfaces of objects to be bonded, such as an electronic part and a substrate, are cleaned by a plasma cleaning process to remove the absorbed materials from the surfaces of the objects and to activate the surfaces of the same, and then those objects are bonded together.
- the process of cleaning the objects to be bonded is carried out in a chamber in a high vacuum condition.
- the process of bonding of them is also carried out in the chamber to prevent the surfaces of them from being oxidized and contaminated.
- an object of the present invention to provide a technique which simplifies a construction of an electronic part mounting apparatus, and mounts an electronic part on a substrate at less cost by the utilization of the plasma cleaning process.
- an electronic part mounting apparatus for mounting an electronic part on a substrate, comprising: a chamber for cleaning a substrate and an electronic part by plasma; a conveying mechanism for conveying the substrate and the electronic part from the chamber into atmospheric air; a mounting mechanism for receiving the electronic part and the substrate from the conveying mechanism and for mounting the substrate on the electronic part in a state that the electronic part and the substrate are exposed in the atmospheric air.
- the mounting mechanism includes a part holder for holding the electronic part, a substrate holder for holding the substrate, and a moving mechanism for moving the part holder relative to the substrate holder, and one of the part holder and the substrate holder includes a heating portion for heating objects to be held after the electronic part is mounted on the substrate.
- heating operation of the heating portion is stopped in the middle of temperature increasing of the objects to be held
- both the part holder and the substrate holder include the heating portions.
- the electronic part mounting apparatus further comprises an ultrasonic vibration source for applying an ultrasonic vibration to the part holder.
- a method of mounting an electronic part on a substrate comprising the steps of: cleaning the substrate and the electronic part by plasma; and mounting the electronic part on the substrate in a state that the electronic part and the substrate are exposed in an atmospheric air.
- the mounting step is executed within 10 minutes after the cleaning step is executed and the electronic part and the substrate are put in an atmospheric air.
- the mounting step is executed within 5 minutes after the cleaning step is executed and the electronic part and the substrate are put in an atmospheric air.
- the mounting step is executed within 3 minutes after the cleaning step is executed and the electronic part and the substrate are put in an atmospheric air.
- the part mounting method further comprises a step of heating either of the electronic part and the substrate after the cleaning step is executed.
- FIG. 1 is a plan view showing a construction of an electronic part mounting apparatus.
- FIG. 2 is a side view showing a construction of the electronic part mounting apparatus.
- FIG. 3 is another side view showing a construction of the electronic part mounting apparatus.
- FIG. 4 is an enlarged cross sectional view showing a structure including a stage and a mounting head in the electronic part mounting apparatus.
- FIG. 5 is a flow chart showing a flow of operation of the electronic part mounting apparatus.
- FIG. 6 is a plan view showing a stage of operation of the electronic part mounting apparatus.
- FIG. 7 is a plan view showing another stage of the operation of electronic part mounting apparatus.
- FIG. 8 is a plan view showing still another stage of the operation of electronic part mounting apparatus.
- FIG. 9 is a plan view showing yet another stage of the operation of electronic part mounting apparatus.
- FIG. 10 is a graph showing shear load characteristics.
- FIG. 11 is a cross sectional view showing another construction of the combination of the stage and the mounting head.
- FIG. 1 is a plan view showing a construction of an electronic part mounting apparatus 1 which is an embodiment of the present invention.
- FIGS. 2 and 3 are side views showing the electronic part mounting apparatus.
- a chamber 2 in an electronic part mounting apparatus 1 , a chamber 2 , a mounting mechanism 3 and a conveying robot 4 are provided on a base 10 .
- FIG. 2 shows a structure including the chamber 2 and the conveying robot 4 as viewed from side.
- FIG. 3 shows a structure including the mounting mechanism 3 and the conveying robot 4 as viewed from side.
- the chamber 2 includes a stage 21 therein.
- the stage 21 is an electrostatic chuck for electrostatically attracting a substrate 91 and an electronic part 92 (for example, a film substrate and a semiconductor IC pair chip).
- an electrode 211 for generating plasma is provided within the stage 21 , and is connected to a radio-frequency power source 212 .
- a gate 22 which may be opened and closed, is provided on a side surface of the chamber 2 , located closer to the conveying robot 4 .
- a pressure reducing pump 23 and a gas supplying unit 24 are connected to the chamber 2 .
- the mounting mechanism 3 includes a stage 31 for suction-attractively holding the substrate 91 and a mounting head 35 for suction-attractively holding the electronic part 92 .
- the stage 31 is movable in a horizontal plane by an X-Y table 32 .
- the mounting head 35 is vertically movable by a head lifting mechanism 36 , and rotatable about a vertically extending axis by a head turning mechanism 37 .
- the conveying robot 4 is constructed such that, as shown in FIG. 1 , a moving block 42 is moved on and along a guide rail 41 by a ball screw mechanism and a motor. Two arms 431 and 432 are attached to the moving block 42 . The arms 431 and 432 are movable to and from the chamber 2 (and mounting mechanism 3 ) by a related mechanism within the moving block 42 .
- a support plate 441 which attracts and holds the substrate 91 on the lower surface by suction-attraction is fixed to a tip end of the arm 431 .
- a holder plate 442 which attracts and holds the electronic part 92 by suction-attraction is attached to a tip end of the arm 432 in a state that a rotary part 443 is interposed between them.
- the holder plate 442 may be turned upside down about the rotary part 443 and about arm 432 .
- FIG. 4 is an enlarged, cross sectional view showing a structure including the stage 31 and the mounting head 35 in the mounting mechanism 3 .
- the stage includes a multilayered structure consisting of a base plate 311 , a ceramic heater 312 , and an attraction plate 313 for holding the substrate 91 , which are layered in this order from the lower side.
- a plurality of suction ports 314 are formed extending through and across the stage 31 .
- the ceramic heater 312 is connected to a power supply 312 a, which is controlled by an overall control unit 11 for controlling overall operations of the electronic part mounting apparatus 1 .
- the suction ports 314 are connected to an ejector (not shown), and a switching between suction and non-suction operations through the suction ports 314 are also controlled by the overall control unit 11 .
- the mounting head 35 has a multilayered structure consisting of a body block 351 , a ceramic heater 352 , an attracting tool 353 for holding the electronic part 92 by suction-attraction, which are layered one on another in this order from the upper side.
- An attraction port 354 extends through the multilayered structure of the mounting head.
- the ceramic heater 352 is also connected to the power supply 312 a, and is under control of the overall control unit 11 . Switching between suction and non-suction operations through the attraction port 354 are also controlled by the overall control unit 11 .
- FIG. 5 is a flow chart showing a flow of operations of the electronic part mounting apparatus 1 (and operations to the electronic part mounting apparatus).
- the substrate 91 and the electronic part. 92 are conveyed into the chamber 2 and placed on the stage 21 by the conveying device (step S 11 ).
- the stage 21 attractively holds the substrate 91 and the electronic part 92 .
- the gate 22 is closed, and air of the chamber 2 is exhausted by the pressure reducing pump 23 shown in FIG. 2 to be high vacuum condition.
- a predetermined kind of gas such as argon gas
- argon gas is supplied from the gas supplying unit 24 to the chamber 2 , whereby a predetermined atmosphere is set up in an internal space of the chamber 2 .
- High frequency electric power is supplied from the radio-frequency power source 212 to the electrode 211 of the stage 21 , so that a plasma is generated between the inner wall of the chamber 2 and the stage 21 .
- Unwanted materials absorbed on the electrodes (e.g., Au (gold) electrode) of the substrate 91 or the electronic part 92 such as water and organic materials, are removed by the plasma. Further, the surfaces of the electrodes are etched and modified by the plasma exciting, whereby a called plasma cleaning process is performed (step S 12 ).
- the pressure in the chamber 2 is returned to the atmospheric pressure, the gate 22 is opened, and the support plates 441 and 442 are inserted into the chamber 2 by the conveying robot 4 as shown in FIG. 6 .
- the holder plate 442 is turned and its attraction surface is directed downward.
- the support plates 441 and 442 are slightly moved downward by the related mechanism in the moving block 42 and respectively abut on the substrate 91 and the electronic part 92 .
- the suction ports of the support plates 441 and 442 are each shaped like a trapezoidal protrusion protruded from the suction side surface.
- the support plates 441 and 442 having the suction ports so shaped abut on the areas of the substrate 91 and the electronic part 92 except the electrodes thereof.
- the attraction by the stage 21 is removed, and the support plates 441 and 442 start their attracting operations to attractively hold the substrate 91 and the electronic part 92 .
- the support plates 441 and 442 are slightly moved upward and moved from the chamber 2 to outside to thereby convey the substrate 91 and the electronic part 92 from the chamber 2 to outside (step S 13 ).
- the substrate 91 and the electronic part 92 are exposed to the atmospheric air.
- the holder plate 442 is turned upside down, and the electronic part 92 is held on the upper surface of the holder plate as shown in FIG. 7 (step S 14 ).
- the holder plate 442 is moved to a position right under the mounting head 35 of the mounting mechanism 3 , and the mounting head 35 descends and abuts on the electronic part 92 on the holder plate 442 .
- An attracting operation by the mounting head 35 starts, while at the same time the attractive holding by the holder plate 442 is removed.
- the electronic part 92 is held with the mounting head 35 in a state that the electrodes of the electronic part 92 are directed downward.
- the mounting head 35 is slightly moved upward and retracted to the moving block 42 .
- the support plate 441 is moved to right above the stage 31 of the mounting mechanism 3 , and as shown in FIG. 8 , the support plate 441 is slightly moved downward to cause the substrate 91 to abut on the stage 31 .
- An attractive holding by the stage 31 starts, while at the same time the attractive holding by the support plate 441 is removed, and the substrate 91 is held with the stage 31 .
- the support plate 441 is slightly moved upward and retracted to the moving block 42 (step S 15 ).
- a camera (not shown) advances to between the stage 31 and the mounting head 35 , and picks up a mounting region of the substrate 91 and a surface of the electronic part 92 closer to the electrode side thereof.
- an image processor circuit computes an offset between the center of the mounting region on the substrate 91 and the center of the electronic part 92 , and an angular offset of its rotation about the vertically extending axis.
- the X-Y table 32 moves the stage 31 to align the center of the mounting region of the substrate 91 with the center of the electronic part 92 , and the head turning mechanism 37 adjusts the orientation of the electronic part 92 .
- the mounting head 35 is moved downward by the head lifting mechanism 36 , and the electronic part 92 is mounted on the substrate 91 in a state that it is exposed to the air (step S 16 ).
- a force by which the mounting head 35 presses the electronic part 92 is controlled, and current is fed to the ceramic heaters 312 and 352 (see FIG. 4 ) in the stage 31 and mounting head 35 for a short time under control of the overall control unit 11 .
- the heating of the ceramic heaters is stopped in the middle of temperature increasing of the substrate 91 and the electronic part 92 which are objects to be held with the stage 31 and the mounting head 35 .
- the objects to be held are heated in a pulsed variation of temperature (viz., called “pulse heated”)
- pulse heat in the pulse heat, a time duration near the peak is about 0.5 second. Bonding of the electrodes of the substrate 91 and the electronic part 92 , viz., bonding between metal atoms by the atomic force, is reliable, and the electronic part 92 is firmly fixed to the substrate 91 .
- the mounting head 35 Upon completion of the mounting, the mounting head 35 stops its holding operation and ascends, and the stage 31 also stops its holding operation.
- the substrate 91 having the electronic part mounted thereon is conveyed to another place by the arms provided outside the electronic part mounting apparatus 1 (step S 18 ). In a subsequent step, it is sealed with resin (called under fill encapsulation, side fill encapsulation, etc.).
- the substrate 91 the electronic part 92 are subjected to the plasma cleaning process within the chamber 2 . Then, the substrate 91 and the electronic part 92 are conveyed to the atmospheric air.
- the electronic part 92 is mounted on the substrate 91 in a state that those are exposed to the atmospheric air. Description to follow is conditions to ensure a proper mounting of the electronic part 92 on the substrate 91 even if the mounting is carried out in a state that those are exposed to the atmospheric air.
- FIG. 10 is a graph showing a relationship between the time that the substrate 91 and the electronic part 92 are left exposed to the atmospheric air till the electronic part is mounted on the substrate and a force necessary for removing (peeling) the electronic part 92 from the substrate 91 after the mounting of the electronic part.
- a shear load plotted on the ordinate of the graph is obtained by dividing a load which is imparted to the electronic part 92 in a direction parallel to a major surface of the substrate 91 when the mounting of the electronic part 92 is removed, by the number of bumps as the electrodes.
- the load imparted at the time of the mounting of the electronic part is mounted i.e., a pressing force to the electronic part 92
- a solid curve 701 indicates a characteristic of the shear load when the pulse heating is carried out at 150° C. near the peak in the mounting mechanism 3 .
- a solid curve 702 indicates a shear load characteristic when the pulse heating is carried out at 100° C. near the peak in the mounting mechanism.
- Broken curves 711 and 712 are presented for reference. Those curves indicate shear load characteristics when the substrate 91 is continuously heated at 150° C. and 100° C. (i.e., the constant heat) for the mounting (viz., when the substrate 91 is left put on the heat plate placed in the air). Measurement results are indicated by black squares for the solid curve 701 , black diamonds for the solid curve 702 , white squares for a broken curve 711 , and white diamonds for a broken curve 712 .
- a bonding strength when the substrate 91 is constant heated is greatly lower than that when it is pulse heated.
- the reason for this may be estimated in the following. Where the constant heat is used, the substrate 91 is left exposed to the air in a state that it is heated. Accordingly, oxidization of the electrode surface is promoted.
- a load of 25gf or larger is required to peel one bump in a shearing direction.
- a time (referred to as “in-air leaving time”) from as time that the ambient of the substrate 91 and the electronic part 92 is put in an atmospheric air after the plasma cleaning is carried out till the electronic part is mounted on the substrate, is preferably within 5 minutes (even if it is estimated to be longish, based on the solid curve 701 ).
- the in-air leaving time is preferably within 3 minutes on the basis of the solid curve 702 .
- the electronic part mounting apparatus 1 ceaselessly operates during a time from the opening of the chamber 2 to the mounting of the electronic part.
- the pulse heat having the temperature up to about 300° C. will be used, and various shaped of the electrodes are used.
- at least the in-air leaving time is preferably within 10 minutes.
- the substrate 91 and the electronic part 92 are plasma cleaned, and then the electronic part 92 is swiftly mounted on the substrate 91 in a state that those are exposed in the atmospheric air. Accordingly, the necessity of using the complicated mechanism for mounting the electronic part 92 on the substrate in the pressure-reduced condition is eliminated.
- the structure of the electronic part mounting apparatus 1 is simplified. Improvement of the throughput and considerable reduction of cost to manufacture the apparatus are achieved.
- the electronic part 92 is bonded to the substrate 91 at an appropriate bonding strength even at low temperature, for example, 150° to 100° C. or 100° C. or lower.
- the electronic part is bonded to a film substrate which is low in heat resistance and high in thermal expansion coefficient, by fine-pitch bonding.
- bumps are formed at the electrodes on the substrate 91 and the electronic part 92 , in the present invention, those are bonded together without greatly crashing the bumps, unlike the conventional technique. Accordingly, when thermal stress is generated in the bonding part, the stress less concentrates on the bonding part. Further, since a quantity of deformation of the bump is small, wetting property of the under fill is good in a sealing process carried out in a subsequent step. Additionally, the resin sealing time is reduced, the bubble remaining is reduced, and the resin used may be selected from among many kinds of resins.
- FIG. 11 is a diagram showing another mounting head 35 in the electronic part mounting apparatus 1 .
- the ceramic heater 352 is removed from the mounting head 35 shown in FIG. 4 , and a vibration device 358 for vibrating the mounting head 35 at an ultrasonic frequency is additionally provided.
- the ceramic heater 312 shown in FIG. 4 is removed also from the stage 31 .
- the electrodes of the substrate 91 are bonded to those on the electronic part 92 at normal temperature (for example, 25° C.). Also when the ultra sonic vibration is utilized, to suppress the oxidization of the electrodes activated by the plasma cleaning, and the absorption of pollutant materials by the electrodes, it is preferable that the electronic part 92 is swiftly mounted on the substrate 91 after those are put in an atmospheric air. The ultrasonic vibration and the pulse heat may be combined in use.
- the substrate 91 and the electronic part 92 are plasma cleaned in one chamber 2 in the embodiment mentioned above. If required, the substrate 91 and the electronic part 92 , respectively, may be cleaned in different chambers 2 which are used exclusively for them.
- the plasma cleaning process is based not only on the normal plasma process, but also on the plasma process by DC current, pulse current, magnetron or the like. Additionally, a process including the plasma, such as fast atom beam (FAB) or ion beam, may be utilized as a kind of the plasma cleaning. Nitrogen, oxygen, fluorine, hydrogen or the like may be used for the gas for the plasma cleaning, in addition to argon.
- FAB fast atom beam
- Nitrogen, oxygen, fluorine, hydrogen or the like may be used for the gas for the plasma cleaning, in addition to argon.
- the resultant structure is pulse heated in the above-mentioned embodiment.
- the substrate is mounted on the electronic part, and at substantially the same time (i.e., immediately after the mounting) the resultant structure may be pulse heated.
- another heating not the pulse heating, may be used.
- the temperature may be kept. It is preferable to heat both the substrate 91 and the electronic part 92 . Either of them may be heated unless the bending strength is decreased considerably. Further, either of them may be constant heated.
- the stage 31 and the mounting head 35 are provided with cooling mechanisms so as to block the transfer of heat to other locations.
- the heaters for heating the stage 31 and the mounting head 35 may be other heaters than heating wires.
- the electrodes of the substrate 91 and the electronic part 92 may be made not only of gold but also of any of copper, aluminum and tin, or may be electrodes plated with any of those materials.
- the substrate 91 may be not only a film substrate made of polyimide, PET (polyethylene terephthalate) or the like, but also a plate-like substrate made of resin or ceramics.
- the electronic part mounting apparatus 1 is well adaptable for the mounting of an electronic part 92 having discrete electrodes, typically the IC pair chip. If required, it may be applied to the mounting of other electronic parts 92 .
- a mechanical chuck may be used for holding the substrate 91 and the electronic part 92 in the mounting mechanism 3 . Any mounting mechanism if it allows the electronic part 92 to move relative to the substrate 91 may be used for the holding them.
- the present invention succeeds in simplifying the construction of the electronic part mounting apparatus, improving the throughput, and considerably reducing the cost of manufacturing the apparatus. Further, the invention enables the electronic part to be mounted on the substrate at low temperature.
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- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Wire Bonding (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
An electronic part mounting apparatus includes a chamber for cleaning a substrate and an electronic part by plasma, amounting mechanism for mounting the electronic part on the electronic part, and a conveying robot for conveying the substrate and the electronic part from the chamber to the mounting mechanism. After plasma cleaned, the substrate and the electronic part are swiftly conveyed to the mounting mechanism by the conveying robot. After the electronic part is mounted on the substrate by the mounting mechanism, the resultant combination of them is pulse heated. Therefore, the electronic part is appropriately mounted on the substrate in a state that those are exposed to the air. A part mounting mechanism is simplified.
Description
- This application is a division of U.S. patent application Ser. No. 10/627,479 filed Jul. 25, 2003.
- The present invention relates to an apparatus and a method for mounting an electronic part on a substrate.
- A technique is known in which the surfaces of objects to be bonded, such as an electronic part and a substrate, are cleaned by a plasma cleaning process to remove the absorbed materials from the surfaces of the objects and to activate the surfaces of the same, and then those objects are bonded together. The process of cleaning the objects to be bonded is carried out in a chamber in a high vacuum condition. The process of bonding of them is also carried out in the chamber to prevent the surfaces of them from being oxidized and contaminated.
- To handle the objects to be bonded in a high vacuum condition in the chamber, it is necessary to make many improvements of the holders for the objects to be bonded and the drive mechanisms in the chamber. This results in increase of the cost to manufacture the part mounting apparatus. For example, in a high vacuum condition, it is impossible to hold the electronic part and the substrate as the objects to be bonded by using the normal suction attraction. Accordingly, the electrostatic attraction is necessarily used for holding the objects, instead. Further, it is necessary to use the guide mechanism or the like in the chamber which is designed specially for use in the high vacuum condition and expensive. Some sealing measure must be taken for the mechanism for driving a structure in the chamber from the outside.
- It is, therefore, an object of the present invention to provide a technique which simplifies a construction of an electronic part mounting apparatus, and mounts an electronic part on a substrate at less cost by the utilization of the plasma cleaning process.
- According to a broad aspect of the invention, there is provided an electronic part mounting apparatus for mounting an electronic part on a substrate, comprising: a chamber for cleaning a substrate and an electronic part by plasma; a conveying mechanism for conveying the substrate and the electronic part from the chamber into atmospheric air; a mounting mechanism for receiving the electronic part and the substrate from the conveying mechanism and for mounting the substrate on the electronic part in a state that the electronic part and the substrate are exposed in the atmospheric air.
- In a preferred embodiment of the invention, the mounting mechanism includes a part holder for holding the electronic part, a substrate holder for holding the substrate, and a moving mechanism for moving the part holder relative to the substrate holder, and one of the part holder and the substrate holder includes a heating portion for heating objects to be held after the electronic part is mounted on the substrate.
- In another preferred embodiment, heating operation of the heating portion is stopped in the middle of temperature increasing of the objects to be held
- In still another embodiment, both the part holder and the substrate holder include the heating portions.
- In yet another embodiment, the electronic part mounting apparatus further comprises an ultrasonic vibration source for applying an ultrasonic vibration to the part holder.
- According to another broad aspect of the invention, there is provided a method of mounting an electronic part on a substrate comprising the steps of: cleaning the substrate and the electronic part by plasma; and mounting the electronic part on the substrate in a state that the electronic part and the substrate are exposed in an atmospheric air.
- In the part mounting method, the mounting step is executed within 10 minutes after the cleaning step is executed and the electronic part and the substrate are put in an atmospheric air.
- Also in the part mounting method, the mounting step is executed within 5 minutes after the cleaning step is executed and the electronic part and the substrate are put in an atmospheric air.
- In the part mounting method, the mounting step is executed within 3 minutes after the cleaning step is executed and the electronic part and the substrate are put in an atmospheric air.
- Additionally, the part mounting method further comprises a step of heating either of the electronic part and the substrate after the cleaning step is executed.
-
FIG. 1 is a plan view showing a construction of an electronic part mounting apparatus. -
FIG. 2 is a side view showing a construction of the electronic part mounting apparatus. -
FIG. 3 is another side view showing a construction of the electronic part mounting apparatus. -
FIG. 4 is an enlarged cross sectional view showing a structure including a stage and a mounting head in the electronic part mounting apparatus. -
FIG. 5 is a flow chart showing a flow of operation of the electronic part mounting apparatus. -
FIG. 6 is a plan view showing a stage of operation of the electronic part mounting apparatus. -
FIG. 7 is a plan view showing another stage of the operation of electronic part mounting apparatus. -
FIG. 8 is a plan view showing still another stage of the operation of electronic part mounting apparatus. -
FIG. 9 is a plan view showing yet another stage of the operation of electronic part mounting apparatus. -
FIG. 10 is a graph showing shear load characteristics. -
FIG. 11 is a cross sectional view showing another construction of the combination of the stage and the mounting head. - Hereinafter, an embodiment of the invention is explained with reference to the drawings.
-
FIG. 1 is a plan view showing a construction of an electronicpart mounting apparatus 1 which is an embodiment of the present invention.FIGS. 2 and 3 are side views showing the electronic part mounting apparatus. As shown inFIG. 1 , in an electronicpart mounting apparatus 1, achamber 2, amounting mechanism 3 and aconveying robot 4 are provided on abase 10.FIG. 2 shows a structure including thechamber 2 and theconveying robot 4 as viewed from side.FIG. 3 shows a structure including themounting mechanism 3 and the conveyingrobot 4 as viewed from side. - As shown in
FIGS. 1 and 2 , thechamber 2 includes astage 21 therein. Thestage 21 is an electrostatic chuck for electrostatically attracting asubstrate 91 and an electronic part 92 (for example, a film substrate and a semiconductor IC pair chip). Further, as shown inFIG. 2 , anelectrode 211 for generating plasma is provided within thestage 21, and is connected to a radio-frequency power source 212. Agate 22, which may be opened and closed, is provided on a side surface of thechamber 2, located closer to the conveyingrobot 4. Apressure reducing pump 23 and agas supplying unit 24 are connected to thechamber 2. - The
mounting mechanism 3, as shown inFIGS. 1 and 3 , includes astage 31 for suction-attractively holding thesubstrate 91 and amounting head 35 for suction-attractively holding theelectronic part 92. Thestage 31 is movable in a horizontal plane by an X-Y table 32. Themounting head 35 is vertically movable by ahead lifting mechanism 36, and rotatable about a vertically extending axis by ahead turning mechanism 37. - The conveying
robot 4 is constructed such that, as shown inFIG. 1 , a movingblock 42 is moved on and along aguide rail 41 by a ball screw mechanism and a motor. Twoarms block 42. Thearms block 42. Asupport plate 441 which attracts and holds thesubstrate 91 on the lower surface by suction-attraction is fixed to a tip end of thearm 431. Aholder plate 442 which attracts and holds theelectronic part 92 by suction-attraction is attached to a tip end of thearm 432 in a state that arotary part 443 is interposed between them. Theholder plate 442 may be turned upside down about therotary part 443 and aboutarm 432. -
FIG. 4 is an enlarged, cross sectional view showing a structure including thestage 31 and themounting head 35 in themounting mechanism 3. The stage includes a multilayered structure consisting of abase plate 311, aceramic heater 312, and anattraction plate 313 for holding thesubstrate 91, which are layered in this order from the lower side. A plurality ofsuction ports 314 are formed extending through and across thestage 31. Theceramic heater 312 is connected to apower supply 312 a, which is controlled by anoverall control unit 11 for controlling overall operations of the electronicpart mounting apparatus 1. Thesuction ports 314 are connected to an ejector (not shown), and a switching between suction and non-suction operations through thesuction ports 314 are also controlled by theoverall control unit 11. - The
mounting head 35 has a multilayered structure consisting of abody block 351, aceramic heater 352, an attractingtool 353 for holding theelectronic part 92 by suction-attraction, which are layered one on another in this order from the upper side. Anattraction port 354 extends through the multilayered structure of the mounting head. Theceramic heater 352 is also connected to thepower supply 312 a, and is under control of theoverall control unit 11. Switching between suction and non-suction operations through theattraction port 354 are also controlled by theoverall control unit 11. -
FIG. 5 is a flow chart showing a flow of operations of the electronic part mounting apparatus 1 (and operations to the electronic part mounting apparatus). - Before the electronic
part mounting apparatus 1 is operated, thesubstrate 91 and the electronic part. 92 are conveyed into thechamber 2 and placed on thestage 21 by the conveying device (step S11). In thechamber 2, thestage 21 attractively holds thesubstrate 91 and theelectronic part 92. - Thereafter, the
gate 22 is closed, and air of thechamber 2 is exhausted by thepressure reducing pump 23 shown inFIG. 2 to be high vacuum condition. Further, a predetermined kind of gas, such as argon gas, is supplied from thegas supplying unit 24 to thechamber 2, whereby a predetermined atmosphere is set up in an internal space of thechamber 2. High frequency electric power is supplied from the radio-frequency power source 212 to theelectrode 211 of thestage 21, so that a plasma is generated between the inner wall of thechamber 2 and thestage 21. Unwanted materials absorbed on the electrodes (e.g., Au (gold) electrode) of thesubstrate 91 or theelectronic part 92, such as water and organic materials, are removed by the plasma. Further, the surfaces of the electrodes are etched and modified by the plasma exciting, whereby a called plasma cleaning process is performed (step S12). - Upon completion of the plasma cleaning process, the pressure in the
chamber 2 is returned to the atmospheric pressure, thegate 22 is opened, and thesupport plates chamber 2 by the conveyingrobot 4 as shown inFIG. 6 . At this time, theholder plate 442 is turned and its attraction surface is directed downward. Thesupport plates block 42 and respectively abut on thesubstrate 91 and theelectronic part 92. The suction ports of thesupport plates support plates substrate 91 and theelectronic part 92 except the electrodes thereof. - Then, the attraction by the
stage 21 is removed, and thesupport plates substrate 91 and theelectronic part 92. Thesupport plates chamber 2 to outside to thereby convey thesubstrate 91 and theelectronic part 92 from thechamber 2 to outside (step S13). As a result, thesubstrate 91 and theelectronic part 92 are exposed to the atmospheric air. At this time, theholder plate 442 is turned upside down, and theelectronic part 92 is held on the upper surface of the holder plate as shown inFIG. 7 (step S14). - As indicated by a two-dot chain line in
FIG. 8 , theholder plate 442 is moved to a position right under the mountinghead 35 of the mountingmechanism 3, and the mountinghead 35 descends and abuts on theelectronic part 92 on theholder plate 442. An attracting operation by the mountinghead 35 starts, while at the same time the attractive holding by theholder plate 442 is removed. And, theelectronic part 92 is held with the mountinghead 35 in a state that the electrodes of theelectronic part 92 are directed downward. The mountinghead 35 is slightly moved upward and retracted to the movingblock 42. - Subsequently, the
support plate 441 is moved to right above thestage 31 of the mountingmechanism 3, and as shown inFIG. 8 , thesupport plate 441 is slightly moved downward to cause thesubstrate 91 to abut on thestage 31. An attractive holding by thestage 31 starts, while at the same time the attractive holding by thesupport plate 441 is removed, and thesubstrate 91 is held with thestage 31. Thereafter, thesupport plate 441 is slightly moved upward and retracted to the moving block 42 (step S15). - When the
substrate 91 and theelectronic part 92 are transferred to themounting mechanism 3, a camera (not shown) advances to between thestage 31 and the mountinghead 35, and picks up a mounting region of thesubstrate 91 and a surface of theelectronic part 92 closer to the electrode side thereof. Then, an image processor circuit computes an offset between the center of the mounting region on thesubstrate 91 and the center of theelectronic part 92, and an angular offset of its rotation about the vertically extending axis. By using the thus computed offsets, the X-Y table 32 moves thestage 31 to align the center of the mounting region of thesubstrate 91 with the center of theelectronic part 92, and thehead turning mechanism 37 adjusts the orientation of theelectronic part 92. Thereafter, as shown inFIG. 9 , the mountinghead 35 is moved downward by thehead lifting mechanism 36, and theelectronic part 92 is mounted on thesubstrate 91 in a state that it is exposed to the air (step S16). - In mounting the electronic part on the substrate, a force by which the mounting
head 35 presses theelectronic part 92 is controlled, and current is fed to theceramic heaters 312 and 352 (seeFIG. 4 ) in thestage 31 and mountinghead 35 for a short time under control of theoverall control unit 11. The heating of the ceramic heaters is stopped in the middle of temperature increasing of thesubstrate 91 and theelectronic part 92 which are objects to be held with thestage 31 and the mountinghead 35. As a result, the objects to be held are heated in a pulsed variation of temperature (viz., called “pulse heated”) In the pulse heat, in the pulse heat, a time duration near the peak is about 0.5 second. Bonding of the electrodes of thesubstrate 91 and theelectronic part 92, viz., bonding between metal atoms by the atomic force, is reliable, and theelectronic part 92 is firmly fixed to thesubstrate 91. - Upon completion of the mounting, the mounting
head 35 stops its holding operation and ascends, and thestage 31 also stops its holding operation. Thesubstrate 91 having the electronic part mounted thereon is conveyed to another place by the arms provided outside the electronic part mounting apparatus 1 (step S18). In a subsequent step, it is sealed with resin (called under fill encapsulation, side fill encapsulation, etc.). - As described above, in the electronic
part mounting apparatus 1, thesubstrate 91 theelectronic part 92 are subjected to the plasma cleaning process within thechamber 2. Then, thesubstrate 91 and theelectronic part 92 are conveyed to the atmospheric air. Theelectronic part 92 is mounted on thesubstrate 91 in a state that those are exposed to the atmospheric air. Description to follow is conditions to ensure a proper mounting of theelectronic part 92 on thesubstrate 91 even if the mounting is carried out in a state that those are exposed to the atmospheric air. -
FIG. 10 is a graph showing a relationship between the time that thesubstrate 91 and theelectronic part 92 are left exposed to the atmospheric air till the electronic part is mounted on the substrate and a force necessary for removing (peeling) theelectronic part 92 from thesubstrate 91 after the mounting of the electronic part. A shear load plotted on the ordinate of the graph is obtained by dividing a load which is imparted to theelectronic part 92 in a direction parallel to a major surface of thesubstrate 91 when the mounting of theelectronic part 92 is removed, by the number of bumps as the electrodes. The load imparted at the time of the mounting of the electronic part is mounted (i.e., a pressing force to the electronic part 92) is set at a value which will enable the electronic part to properly be mounted on the substrate. - In
FIG. 10 , asolid curve 701 indicates a characteristic of the shear load when the pulse heating is carried out at 150° C. near the peak in themounting mechanism 3. Asolid curve 702 indicates a shear load characteristic when the pulse heating is carried out at 100° C. near the peak in the mounting mechanism.Broken curves substrate 91 is continuously heated at 150° C. and 100° C. (i.e., the constant heat) for the mounting (viz., when thesubstrate 91 is left put on the heat plate placed in the air). Measurement results are indicated by black squares for thesolid curve 701, black diamonds for thesolid curve 702, white squares for abroken curve 711, and white diamonds for abroken curve 712. - As seen from comparison of the
solid curve 701 and the broken curve or thesolid curve 702 and thebroken curve 712, a bonding strength when thesubstrate 91 is constant heated is greatly lower than that when it is pulse heated. The reason for this may be estimated in the following. Where the constant heat is used, thesubstrate 91 is left exposed to the air in a state that it is heated. Accordingly, oxidization of the electrode surface is promoted. - In the test, it is preferable that a load of 25gf or larger is required to peel one bump in a shearing direction. When the pulse heat of 150° is used, a time (referred to as “in-air leaving time”) from as time that the ambient of the
substrate 91 and theelectronic part 92 is put in an atmospheric air after the plasma cleaning is carried out till the electronic part is mounted on the substrate, is preferably within 5 minutes (even if it is estimated to be longish, based on the solid curve 701). Similarly, when the pulse heat of 100° C. is used, the in-air leaving time is preferably within 3 minutes on the basis of thesolid curve 702. - The shorter the in-air leaving time is, the more preferable it is, as a matter of course. It is preferable that the electronic
part mounting apparatus 1 ceaselessly operates during a time from the opening of thechamber 2 to the mounting of the electronic part. The pulse heat having the temperature up to about 300° C. will be used, and various shaped of the electrodes are used. When considering those facts, at least the in-air leaving time is preferably within 10 minutes. - As described above, where the electronic
part mounting apparatus 1 is used, thesubstrate 91 and theelectronic part 92 are plasma cleaned, and then theelectronic part 92 is swiftly mounted on thesubstrate 91 in a state that those are exposed in the atmospheric air. Accordingly, the necessity of using the complicated mechanism for mounting theelectronic part 92 on the substrate in the pressure-reduced condition is eliminated. The structure of the electronicpart mounting apparatus 1 is simplified. Improvement of the throughput and considerable reduction of cost to manufacture the apparatus are achieved. - If the time is controlled so as to satisfy the conditions derived from the graph of
FIG. 10 , and the electronic part is swiftly mounted on the substrate, theelectronic part 92 is bonded to thesubstrate 91 at an appropriate bonding strength even at low temperature, for example, 150° to 100° C. or 100° C. or lower. As a result, the electronic part is bonded to a film substrate which is low in heat resistance and high in thermal expansion coefficient, by fine-pitch bonding. - If bumps are formed at the electrodes on the
substrate 91 and theelectronic part 92, in the present invention, those are bonded together without greatly crashing the bumps, unlike the conventional technique. Accordingly, when thermal stress is generated in the bonding part, the stress less concentrates on the bonding part. Further, since a quantity of deformation of the bump is small, wetting property of the under fill is good in a sealing process carried out in a subsequent step. Additionally, the resin sealing time is reduced, the bubble remaining is reduced, and the resin used may be selected from among many kinds of resins. -
FIG. 11 is a diagram showing another mountinghead 35 in the electronicpart mounting apparatus 1. In a mountinghead 35 shown inFIG. 1 , theceramic heater 352 is removed from the mountinghead 35 shown inFIG. 4 , and avibration device 358 for vibrating the mountinghead 35 at an ultrasonic frequency is additionally provided. Theceramic heater 312 shown inFIG. 4 is removed also from thestage 31. When theelectronic part 92 is mounted on thesubstrate 91, the vibration is applied from thevibration device 358 to theelectronic part 92 through thebody block 351 and the attractingtool 353. - With this structure, the electrodes of the
substrate 91 are bonded to those on theelectronic part 92 at normal temperature (for example, 25° C.). Also when the ultra sonic vibration is utilized, to suppress the oxidization of the electrodes activated by the plasma cleaning, and the absorption of pollutant materials by the electrodes, it is preferable that theelectronic part 92 is swiftly mounted on thesubstrate 91 after those are put in an atmospheric air. The ultrasonic vibration and the pulse heat may be combined in use. - While specific embodiments of the invention have been described, it should be understood that the invention is not limited to the above-mentioned ones, but may variously be modified, altered and changed within the true spirits of the invention.
- For example, the
substrate 91 and theelectronic part 92 are plasma cleaned in onechamber 2 in the embodiment mentioned above. If required, thesubstrate 91 and theelectronic part 92, respectively, may be cleaned indifferent chambers 2 which are used exclusively for them. The plasma cleaning process is based not only on the normal plasma process, but also on the plasma process by DC current, pulse current, magnetron or the like. Additionally, a process including the plasma, such as fast atom beam (FAB) or ion beam, may be utilized as a kind of the plasma cleaning. Nitrogen, oxygen, fluorine, hydrogen or the like may be used for the gas for the plasma cleaning, in addition to argon. - After the electronic part is mounted on the substrate, the resultant structure is pulse heated in the above-mentioned embodiment. The substrate is mounted on the electronic part, and at substantially the same time (i.e., immediately after the mounting) the resultant structure may be pulse heated. When those are heated after the mounting of them, another heating, not the pulse heating, may be used. For example, after the heating process is stopped, the temperature may be kept. It is preferable to heat both the
substrate 91 and theelectronic part 92. Either of them may be heated unless the bending strength is decreased considerably. Further, either of them may be constant heated. Preferably, thestage 31 and the mountinghead 35 are provided with cooling mechanisms so as to block the transfer of heat to other locations. - The heaters for heating the
stage 31 and the mountinghead 35 may be other heaters than heating wires. - The electrodes of the
substrate 91 and theelectronic part 92 may be made not only of gold but also of any of copper, aluminum and tin, or may be electrodes plated with any of those materials. Thesubstrate 91 may be not only a film substrate made of polyimide, PET (polyethylene terephthalate) or the like, but also a plate-like substrate made of resin or ceramics. - The electronic
part mounting apparatus 1 is well adaptable for the mounting of anelectronic part 92 having discrete electrodes, typically the IC pair chip. If required, it may be applied to the mounting of otherelectronic parts 92. - A mechanical chuck may be used for holding the
substrate 91 and theelectronic part 92 in themounting mechanism 3. Any mounting mechanism if it allows theelectronic part 92 to move relative to thesubstrate 91 may be used for the holding them. - As seen from the foregoing description, the present invention succeeds in simplifying the construction of the electronic part mounting apparatus, improving the throughput, and considerably reducing the cost of manufacturing the apparatus. Further, the invention enables the electronic part to be mounted on the substrate at low temperature.
Claims (5)
1. A method of mounting an electronic part on a substrate comprising the steps of:
cleaning said substrate and said electronic part by plasma; and
mounting said electronic part on said substrate in a state that said electronic part and said substrate are exposed in atmospheric air.
2. A method of mounting an electronic part on a substrate according to claim 1 , wherein said mounting step is executed within 10 minutes after said cleaning step is executed and said electronic part and said substrate are put in the atmospheric air.
3. A method of mounting an electronic part on a substrate according to claim 1 , wherein said mounting step is executed within 5 minutes after said cleaning step is executed and said electronic part and said substrate are put in the atmospheric air.
4. A method of mounting an electronic part on a substrate according to claim 1 , wherein said mounting step is executed within 3 minutes after said cleaning step is executed and said electronic part and said substrate are put in the atmospheric air.
5. A method of mounting an electronic part on a substrate according to claim 1 , further comprising a step of heating either of said electronic part and said substrate after said cleaning step is executed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/288,020 US20060081974A1 (en) | 2002-08-01 | 2005-11-28 | Electronic part mounting apparatus and method |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002224558A JP2004071611A (en) | 2002-08-01 | 2002-08-01 | Device and method of mounting electronic part |
JP2002-224558 | 2002-08-01 | ||
US10/627,479 US6996889B2 (en) | 2002-08-01 | 2003-07-25 | Electronic part mounting apparatus and method |
US11/288,020 US20060081974A1 (en) | 2002-08-01 | 2005-11-28 | Electronic part mounting apparatus and method |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US10/627,479 Division US6996889B2 (en) | 2002-08-01 | 2003-07-25 | Electronic part mounting apparatus and method |
Publications (1)
Publication Number | Publication Date |
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US20060081974A1 true US20060081974A1 (en) | 2006-04-20 |
Family
ID=31185018
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US10/627,479 Expired - Fee Related US6996889B2 (en) | 2002-08-01 | 2003-07-25 | Electronic part mounting apparatus and method |
US11/288,020 Abandoned US20060081974A1 (en) | 2002-08-01 | 2005-11-28 | Electronic part mounting apparatus and method |
Family Applications Before (1)
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US10/627,479 Expired - Fee Related US6996889B2 (en) | 2002-08-01 | 2003-07-25 | Electronic part mounting apparatus and method |
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US (2) | US6996889B2 (en) |
JP (1) | JP2004071611A (en) |
CN (1) | CN100341125C (en) |
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US8240539B2 (en) * | 2004-05-28 | 2012-08-14 | Panasonic Corporation | Joining apparatus with UV cleaning |
KR100634869B1 (en) * | 2005-05-30 | 2006-10-17 | 삼성전자주식회사 | Multi die gluing device |
US20110233175A1 (en) * | 2008-09-01 | 2011-09-29 | Nederlandse Organisatie Voor Toegepast- Natuurwetenschappelijk Onderzoek Tno | Pick-and-place machine |
EP2302670A1 (en) * | 2009-09-28 | 2011-03-30 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Place station for a pick-and-place machine |
US9576928B2 (en) * | 2015-02-27 | 2017-02-21 | Kulicke And Soffa Industries, Inc. | Bond head assemblies, thermocompression bonding systems and methods of assembling and operating the same |
JP6663649B2 (en) * | 2015-04-14 | 2020-03-13 | 東レエンジニアリング株式会社 | Semiconductor chip mounting method and semiconductor device |
KR102429619B1 (en) * | 2015-11-18 | 2022-08-04 | 삼성전자주식회사 | Bonding stage and bonding apparatus comprising the same |
WO2020090048A1 (en) * | 2018-10-31 | 2020-05-07 | 株式会社Fuji | Substrate work machine and movable head |
CN113133305B (en) * | 2021-06-03 | 2023-11-10 | 常州井芯半导体设备有限公司 | Reflow soldering equipment and reflow soldering method with plasma generating device |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5564159A (en) * | 1994-05-26 | 1996-10-15 | The John Treiber Company | Closed-loop multistage system for cleaning printed circuit boards |
US5609290A (en) * | 1995-04-20 | 1997-03-11 | The University Of North Carolina At Charlotte | Fluxless soldering method |
US6227436B1 (en) * | 1990-02-19 | 2001-05-08 | Hitachi, Ltd. | Method of fabricating an electronic circuit device and apparatus for performing the method |
US6245189B1 (en) * | 1994-12-05 | 2001-06-12 | Nordson Corporation | High Throughput plasma treatment system |
US6392286B1 (en) * | 1999-08-02 | 2002-05-21 | Samsung Electronics Co., Ltd. | Semiconductor chip packaging system and a semiconductor chip packaging method using the same |
US6468833B2 (en) * | 2000-03-31 | 2002-10-22 | American Air Liquide, Inc. | Systems and methods for application of substantially dry atmospheric plasma surface treatment to various electronic component packaging and assembly methods |
US6727654B2 (en) * | 2000-01-11 | 2004-04-27 | Hitachi Kokusai Electric Inc. | Plasma processing apparatus |
US20060040502A1 (en) * | 2004-08-18 | 2006-02-23 | Hiroyuki Fukumizu | Method for manufacturing semiconductor device |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2865770B2 (en) | 1990-02-19 | 1999-03-08 | 株式会社日立製作所 | Manufacturing method of electronic circuit device |
JP2644912B2 (en) * | 1990-08-29 | 1997-08-25 | 株式会社日立製作所 | Vacuum processing apparatus and operating method thereof |
JP2924141B2 (en) * | 1990-09-14 | 1999-07-26 | 松下電器産業株式会社 | Plasma cleaning device for substrate in pre-process of wire bonding |
JP3201302B2 (en) * | 1997-02-10 | 2001-08-20 | 松下電器産業株式会社 | Plasma cleaning equipment for substrates |
JPH10303596A (en) * | 1997-04-30 | 1998-11-13 | Taiyo Yuden Co Ltd | Device for mounting chip-shaped circuit component |
JPH1116858A (en) * | 1997-06-21 | 1999-01-22 | Tokyo Electron Ltd | Method of cleaning and processing film forming device |
JP3368809B2 (en) * | 1997-08-25 | 2003-01-20 | 松下電器産業株式会社 | Plasma cleaning method for substrate |
JP3521721B2 (en) * | 1997-12-25 | 2004-04-19 | セイコーエプソン株式会社 | Electronic component mounting method and device |
JP2000196292A (en) * | 1998-12-28 | 2000-07-14 | Popman:Kk | Chip component supply equipment |
-
2002
- 2002-08-01 JP JP2002224558A patent/JP2004071611A/en active Pending
-
2003
- 2003-07-25 US US10/627,479 patent/US6996889B2/en not_active Expired - Fee Related
- 2003-08-01 CN CNB031526160A patent/CN100341125C/en not_active Expired - Fee Related
-
2005
- 2005-11-28 US US11/288,020 patent/US20060081974A1/en not_active Abandoned
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6227436B1 (en) * | 1990-02-19 | 2001-05-08 | Hitachi, Ltd. | Method of fabricating an electronic circuit device and apparatus for performing the method |
US5564159A (en) * | 1994-05-26 | 1996-10-15 | The John Treiber Company | Closed-loop multistage system for cleaning printed circuit boards |
US6245189B1 (en) * | 1994-12-05 | 2001-06-12 | Nordson Corporation | High Throughput plasma treatment system |
US5609290A (en) * | 1995-04-20 | 1997-03-11 | The University Of North Carolina At Charlotte | Fluxless soldering method |
US6392286B1 (en) * | 1999-08-02 | 2002-05-21 | Samsung Electronics Co., Ltd. | Semiconductor chip packaging system and a semiconductor chip packaging method using the same |
US6727654B2 (en) * | 2000-01-11 | 2004-04-27 | Hitachi Kokusai Electric Inc. | Plasma processing apparatus |
US6468833B2 (en) * | 2000-03-31 | 2002-10-22 | American Air Liquide, Inc. | Systems and methods for application of substantially dry atmospheric plasma surface treatment to various electronic component packaging and assembly methods |
US6551860B2 (en) * | 2000-03-31 | 2003-04-22 | L'air Liquide - Societe Anonyme A'directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Systems and methods for application of substantially dry atmospheric plasma surface treatment to various electronic component packaging and assembly methods |
US20060040502A1 (en) * | 2004-08-18 | 2006-02-23 | Hiroyuki Fukumizu | Method for manufacturing semiconductor device |
Also Published As
Publication number | Publication date |
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US6996889B2 (en) | 2006-02-14 |
CN1477689A (en) | 2004-02-25 |
CN100341125C (en) | 2007-10-03 |
JP2004071611A (en) | 2004-03-04 |
US20040022037A1 (en) | 2004-02-05 |
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