US20020125556A1 - Stacking structure of semiconductor chips and semiconductor package using it - Google Patents
Stacking structure of semiconductor chips and semiconductor package using it Download PDFInfo
- Publication number
- US20020125556A1 US20020125556A1 US10/015,374 US1537401A US2002125556A1 US 20020125556 A1 US20020125556 A1 US 20020125556A1 US 1537401 A US1537401 A US 1537401A US 2002125556 A1 US2002125556 A1 US 2002125556A1
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- semiconductor chip
- input
- substrate
- conductive wire
- semiconductor
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Definitions
- the present invention relates to semiconductor chips, and more particularly, to a stacking structure of semiconductor chips and a semiconductor package using it in which a conductive wire can be electrically insulated while a conductive wire is contacted with a lower surface of an upper semiconductor chip thereby preventing mechanical damage of the wire, and also diminishing a total thickness of the stacking structure.
- Integrated Circuit (IC) package density is primarily limited by the area available for die mounting and the height of the package.
- One way of increasing the density is to stack multiple die vertically in an IC package. Stacking multiple die will maximize function and efficiency of the semiconductor package.
- a semiconductor package and a method of producing the same has a substrate.
- a first semiconductor chip is coupled to a surface of the substrate.
- the first semiconductor chip has a first and second surfaces which are substantially flat in nature.
- An adhesive layer is coupled to the second surface of the first semiconductor chip.
- a second semiconductor chip having first and second surfaces which are substantially flat in nature is further provided.
- An insulator is coupled to the first surface of the second semiconductor chip for preventing shorting of wirebonds.
- the second semiconductor chip is coupled to the adhesive layer by the insulator coupled to the first surface thereof.
- FIG. 1 illustrates a sectional view of one embodiment of the present invention
- FIGS. 1A and 1B are magnified views of circle I as shown in FIG. 1;
- FIG. 2 illustrates a sectional view of another embodiment of the present invention
- FIGS. 2A and 2B are magnified views of circle II as shown in FIG. 2;
- FIG. 3 illustrates a sectional view of another embodiment of the present invention
- FIGS. 3A and 3B are magnified views of circle III as shown in FIG. 3;
- FIG. 4 illustrates a sectional view of another embodiment of the present invention
- FIG. 4A is a magnified view of circle IV as shown in FIG. 4;
- FIG. 5 illustrates a sectional view of another embodiment of the present invention
- FIG. 6 illustrates a sectional view of another embodiment of the present invention.
- FIG. 7 illustrates a sectional view of another embodiment of the present invention.
- FIG. 1 illustrates a stacking structure 11 of a semiconductor chip wherein a substrate 7 having a substantially plate form, is provided.
- a substrate 7 having a substantially plate form
- a printed circuit board, a circuit tape, a circuit film, a lead frame or the like may be used as the substrate 7 . This is only a matter of selection by a person skilled in the art, and, therefore, this does not adversely influence the present invention.
- a first semiconductor chip 1 is bonded on a top surface of the substrate 7 .
- the semiconductor chip 1 includes a first surface 1 a and a second surface 1 b , which are substantially flat in nature.
- a plurality of input-output pads 1 c are formed on the second surface 1 b of the first semiconductor chip 1 .
- edge pad type semiconductor chip 1 in which a plurality of input-output pads 1 c are formed at the inner circumference of the second surface 1 b .
- a center pad type semiconductor chip will be described with reference to FIG. 4 hereafter.
- An adhesive layer 3 having a predetermined thickness is bonded on the inside of the second surface 1 b of the first semiconductor chip 1 , excluding the input-output pads 1 c .
- the adhesive layer 3 may include such substances as a nonconductive liquid phase adhesive, a nonconductive adhesive tape or other substances that are commonly known in the art for semiconductor chip attachment.
- the adhesive layer 3 serves as an adhesive bonding to the second semiconductor chip 2 on the second surface 1 b of the first semiconductor chip 1 .
- the adhesive layer 3 it is possible for the adhesive layer 3 to be formed in the same thickness as a loop height of a first conductive wires 5 mentioned below or a smaller thickness than the loop height.
- the thickness of the adhesive layer 3 is thinner than the loop height, it is desirable that the thickness of the adhesive layer 3 is to be more than about 80% of the loop height. This will be described in detail hereafter.
- the input-output pads 1 c of the first semiconductor chip 1 and the substrate 7 can be bonded to each other by the first conductive wires 5 , such as gold or copper or aluminum wires or by its equivalent. This is performed by a conventional normal wire bonding manner which will be described hereafter. It should be noted that the listing of the different types of wires is just used as an example and should not be seen as to limit the scope of the present invention.
- a second semiconductor chip 2 having a first surface 2 a and a second surface 2 b , which are substantially flat in nature, is placed on the upper part of the adhesive layer 3 .
- a plurality of input-output pads 2 c are formed on the second surface 2 b of the second semiconductor chip 2 .
- An insulator 4 is formed on the first surface 2 a of the second semiconductor chip 2 . That is, the insulator 4 formed on the first surface 2 a of the second semiconductor chip 2 is bonded on the upper part of the adhesive layer 3 .
- the insulator 4 may include such substances as a liquid phase adhesive, an adhesive tape/film, a polyimide, an oxide layer and a nitride layer or other substances that are commonly known in the art for semiconductor chip or package. It is desirable that all these insulators have a nonconductive, soft, and elastic nature. Also, it is desirable that the thickness of the insulator 4 may be more than about 20% of the loop height of the first conductive wires 5 .
- the insulator 4 is formed in a wafer state before separating into individual semiconductor chips. That is, the insulator 4 can be formed by bonding the nonconductive tape/film on the back surface of the wafer, or by coating the nonconductive liquid phase adhesive or the polyimide on the back surface of the wafer in a spin coating or in a spray manner. Also, the insulator 4 can be formed by evaporating a relatively thicker oxide layer or nitride layer on the back surface of the wafer.
- nonconductive liquid phase adhesive polyimide, oxide layer or nitride layer (insulator) on the back surface of the wafer, a plurality of semiconductor chips are separated from the wafer, respectively.
- insulator 4 may be formed at the individual semiconductor chip which is already separated from the wafer. Namely, after the semiconductor chip is separated from the wafer, the insulator 4 is formed at back surface of the semiconductor chip as described above.
- the second chip 2 is compressed and adhered to the upper part of adhesive layer 4 .
- the first conductive wires 5 may be contacted with the insulator 4 formed at the first surface 2 a of the second semiconductor chip 2 .
- the loop height portion of the first conductive wires 5 exposed outward from adhesive layer 3 is about 20% of total loop height in the first conductive wires 5 .
- thickness of the insulator 4 is more than 20% of the total loop height of the first conductive wires 5 .
- the first conductive wires 5 do not directly contact to the first surface 2 a of the second semiconductor chip 2 .
- the first conductive wires 5 do not directly contact to the first surface 2 a of the second semiconductor chip 2 by the insulator 4 . Also, since the insulator 4 has a nonconductive, soft, and elastic nature, the first conductive wires 5 have no electrical or mechanical damages. Namely, the first conductive wires 5 can be easily overlapped or superimposed with the insulator 4 and the conductive wires 5 can be independent in the insulator 4 . Thus, the first conductive wires 5 do not short each other and aren't heavily damaged by the insulator 4 . The tape/film as the insulator 4 seems to have the most soft and elastic nature among the insulator mentioned above.
- FIG. 1 An edge pad type semiconductor chip 2 , in which a plurality of input-output pads 2 c is formed at the inner circumference of the second surface 2 b , is illustrated in the FIG. 1.
- a center pad type semiconductor chip 2 in which a plurality of input-output pads 2 c is formed at the center of the second surface 2 b , can also be used.
- the input-output pads 2 c of the second semiconductor chip 2 and the substrate 7 can be bonded to each other by the second conductive wires 6 , as described above or its equivalent.
- FIGS. 1A and 1B which is a magnified view of circle I as shown in FIG. 1, the above conventional normal wire bonding is constructed in such a manner that an end of the conductive wire 5 is bonded on the input-output pad 1 c of the semiconductor chip 1 by conductive ball 51 (ball bonding). Then the other end of the conductive wire 5 is bonded on the substrate 7 by stitch bonding.
- the wire bonding can be performed selectively before or after formation of the adhesive layer 3 .
- the first conductive wires 5 are not directly contacted with the first surface 2 a of the semiconductor chip 2 .
- the phenomenon of an electrical short will not occur.
- mechanical damage of the first conductive wires 5 can also be prevented.
- the first conductive wires 5 are contacted with the insulator 4 , electrical or mechanical damage has never occurred. That is, because of a nonconductive, soft and elastic nature of insulator 4 , the first conductive wires 5 can be easily overlapped or superimposed with the insulator 4 and the conductive wires 5 can be independent in the insulator 4 . Thus, the first conductive wires 5 do not short each other and aren't heavily damaged by the insulator 4 .
- the thickness of the adhesive layer 3 can adequately become thinner. Namely, in prior art, the adhesive layer 3 should be formed in substantially twice the thickness of the loop height of the first conductive wires 5 . However, in the present the invention, the adhesive layer 3 can be formed in the same thickness as the loop height of the first conductive wires 5 or a thickness that is less than the loop height. Thus, this invention can diminish a total thickness of the stacking structure of the semiconductor chips.
- FIG. 2 a sectional view of another embodiment of the present invention is illustrated. Referring also to FIGS. 2A and 2B, magnified views of circle II shown in FIG. 2 are also illustrated. Since a stacking structure 12 illustrated in FIG. 2 is constructed in a similar manner to the stacking structure of FIG. 1, only differences existing there between will be described herein below.
- the first and the second conductive wires 5 and 6 are not formed from a conventional normal bonding manner. Instead, a reverse bonding manner is used. Namely, the conventional normal bonding is constructed in such a manner that an end of the conductive wire is bonded on the input-output pad of the semiconductor chip by ball bonding. The other end of the conductive wire is then bonded on the substrate by stitch bonding.
- the reverse bonding is constructed in such a manner that an end of the conductive wire 5 is bonded on the substrate by conductive ball 51 ′ (ball bonding). Then the other end of the conductive wire 5 is bonded on the input-output pad 1 c of the semiconductor chip 1 by stitch bonding.
- a conductive ball 51 is formed on the input-output pads of semiconductor chip 1 by the conductive wire 5 in advance in order to alleviate an impulse created by the stitch bonding.
- the reverse bonding can be applied to all the first and second conductive wires 5 and 6 by which the first semiconductor chip 1 and the second semiconductor chip 2 are connected to the substrate 7 , respectively.
- the thickness of the adhesive layer 3 can be thinner owing to a lower loop height of the first conductive wires 5 . That is, as the loop height of the conductive wire 5 , which is bonded by the stitch bonding, is very low, the thickness of the adhesive layer 3 can be reduced sharply.
- the first conductive wires 5 since the loop height of the conductive wires 5 is low, when the second semiconductor chip 2 is adhered or compressed to the adhesive layer 3 , the first conductive wires 5 have less mechanical stress than the first embodiment. Thus, the first conductive wires 5 can not create an electrical short or mechanical damage.
- the insulator 4 having elevated bonding power can be used as bonding materials without using the adhesive layer 3 . Nevertheless, since the insulator 4 has the nonconductive, soft and elastic nature, the first conductive wires 5 can not create an electrical short or mechanical damage.
- the adhesive layer 3 may cover the input-output pads 1 c of the first semiconductor chip 1 (not shown) and the second conductive wires 6 may connect between the input-output pads 2 c and the substrate 7 by normal bonding.
- a wedge bonding manner can be applied to the first and the second conductive wires 5 and 6 in order to lower the loop height. That is, the wedge bonding is constructed in such a manner that an end of the conductive wire is bonded on the input-output pad of the semiconductor chip by stitch bonding. Then, the other end of the conductive wire is bonded on the substrate by stitch bonding.
- the thickness of the adhesive layer 3 can be thinner owing to a lower loop height of the first conductive wires 5 . That is, as the loop height of the conductive wire, which is bonded by the stitch bonding, is very low, the thickness of the adhesive layer 3 can be reduced sharply.
- the first conductive wires 5 have less mechanical stress than the first embodiment.
- FIG. 3 a sectional view of another embodiment of the present invention is illustrated. Also referring to FIGS. 3A and 3B, magnified views of circle III as shown in FIG. 3 are illustrated. Since a stacking structure 13 is constructed in a similar manner to the stacking structure 12 of FIG. 2, only differences existing there between will be described herein below. As shown in FIGS. 3 and 3A, the first and the second conductive wires 5 and 6 are formed by a reverse bonding manner. The conductive ball 51 is formed on the input-output pads 1 c and 2 c of the semiconductor chip 1 and 2 by the conductive wire in advance in order to alleviate an impulse created by the stitch bonding.
- a supporter 52 is formed on the upper part of the conductive wires 5 connected with input-output pads 1 c of the semiconductor chip 1 .
- the supporter 52 is formed on the upper part of the conductive balls 51 and the first conductive wires 5 together.
- the supporter 52 may be formed on the outside of the input-output pads 1 c .
- a plurality of the supporters 52 can be formed on the inner circumference of the second surface 1 b of the semiconductor chip 1 .
- the supporter 52 may be formed after wire bonding. Namely, first of all, the conductive ball 51 is formed on the input-output pads 1 c , and the first conductive wire 5 is bonded to the conductive ball 51 . At last, the supporter 52 is formed on the first conductive wire 5 superimposed over the conductive ball 51 .
- the supporter 52 may be formed by conventional stud bump forming manner. For example, a ball is formed at end of a conductive wire, and the ball is fused to the top of the first conductive wire 5 . The conductive wire is then cut off except the ball. Furthermore, another ball is formed at the end of the conductive wire, and this ball is bonded to the fused ball above mentioned. As for a repetition of this manner, as shown in FIG. 3A, a raw type conductive ball forms the supporter 52 .
- the supporter 52 may include such substances as gold, silver, copper, and solder or other substances that are commonly known in the art for the semiconductor chip. The above listing of substances should not be seen as to limit the scope of the present invention.
- the supporter 52 is contacted with the bottom of the insulator 4 formed on the second semiconductor chip 2 so as to support the second semiconductor chip 2 .
- the supporter 52 supports many portions of the insulator 4 formed on the semiconductor chip 2 , the semiconductor chip 2 will be supported more stable.
- the adhesive layer 3 may cover the input-output pads 1 c of the first semiconductor chip 1 and the supporter 52 .
- a wedge bonding manner can be applied to the first and the second conductive wires 5 and 6 in order to lower the loop height.
- the supporter 52 is formed on the upper part of the conductive wires 5 connected with input-output pads 1 c of the semiconductor chip 1 .
- the supporter 52 is contacted with the insulator 4 so as to support the second semiconductor chip 2 .
- the semiconductor chip 2 becomes more stable.
- the conductive wires 5 is covered with supporter 52 , when the second semiconductor chip 2 is adhered or compressed to the adhesive layer 3 , the first conductive wires 5 have less mechanical stress than the previous embodiments.
- FIG. 4 a sectional view of another embodiment of the present invention is illustrated. And referring to FIG. 4A, magnified views of circle IV as shown in FIG. 4 is illustrated. Since a stacking structure 14 is constructed in a similar manner to the stacking structure 12 of FIG. 2, only differences existing there between will be described herein below.
- a center pad type semiconductor chip 1 in which a plurality of input-output pads 1 c are formed at the center of the second surface 1 b . Also, the input-output pads 1 c of the first semiconductor chip 1 and the substrate 7 are bonded to each other by the reverse bonding of the first conductive wires 5 .
- the reverse bonding manner has advantages in that the thickness of the adhesive layer 3 can be thinner. Furthermore, the first conductive wires 5 don't make contact with the region except for the input-output pads 1 c of the first semiconductor chip 1 without increasing the loop height.
- a nonconductive liquid phase adhesive is used as the adhesive layer 3 . That is, as a certain portion of the first conductive wires 5 is positioned at the inside of the adhesive layer 3 , it is desirable to use the nonconductive liquid phase adhesive rather than solid phase adhesive tape.
- the input-output pads 1 c of the first semiconductor chip 1 and the substrate 7 is bonded to each other by the reverse bonding of the first conductive wires 5 .
- conductive balls 51 are formed on the input-output pads 1 c of the semiconductor chip 1 by the conductive wire in advance in order to alleviate an impulse created by the stitch bonding.
- the nonconductive liquid phase adhesive is applied to the first surface la of the first semiconductor chip 1 and is hardened. Then, the second semiconductor chip 2 , to which the insulator 4 is stuck, is bonded on the adhesive layer 3 .
- the insulator 4 may include such substances as a nonconductive liquid phase adhesive, a nonconductive adhesive tape/film, a polyimide, an oxide layer and a nitride layer or other substances that are commonly known in the art for semiconductor chips or packages, as described above. Again, the listing of the above substances should not be seen as to limit the scope of the present invention.
- a wedge bonding can be applied to the first and the second conductive wires 5 and 6 in order to lower the loop height. That is, the wedge bonding is constructed in such a manner that an end of the conductive wire is bonded on the substrate by stitch bonding. Then, the other end of the conductive wire is bonded on the input-output pad of the semiconductor chip by stitch bonding.
- the input-output pads 2 c of the second semiconductor chip 2 are bonded to substrate 7 by the reverse bonding of conductive wires 6 .
- the normal bonding manner is also possible.
- the second semiconductor chip 2 of the edge pad type is illustrated in FIG. 4.
- the center pad type is also possible.
- the second conductive wires 6 are generally bonded to substrate 7 by the reverse bonding or wedge bonding.
- the stacking structures according to the present invention are described on the basis of the first and the second semiconductor chips 1 and 2 .
- a plurality of semiconductor chips for example, a third semiconductor chip, a fourth semiconductor chip, etc.
- Such an arrangement is optional.
- the present invention is not limited by a number of the stacked semiconductor chips.
- FIG. 5 a sectional view of another embodiment of the present invention is illustrated.
- the stacking structure of the semiconductor chip is identical with that of FIG. 1 .
- a substrate 70 having a substantially plate form is provided.
- the substrate 70 includes resin layer 71 , a plurality of circuit patterns 72 formed at a top and bottom of the resin layer 71 and a plurality of conductive via 73 connecting the top and bottom circuit patterns 72 .
- the substrate 70 as is generally known, may be a printed circuit board, circuit tape or circuit film. The listing of the substrates 70 should not be seen as to limit the scope of the present invention.
- a first semiconductor chip 1 is bonded on a surface of the substrate 70 .
- the semiconductor chip 1 includes a first surface 1 a and a second surface 1 b , which are substantially in a flat type.
- a plurality of input-output pads 1 c are formed on the second surface 1 b of the first semiconductor chip 1 .
- the input-output pads 1 c of the first semiconductor chip 1 and some top circuit patterns 72 of the substrate 70 are bonded to each other by the first conductive wires 5 .
- An adhesive layer 3 having a predetermined thickness is bonded on the second surface 1 b of the first semiconductor chip 1 .
- a plurality of input-output pads 2 c are formed on the second surface 2 b of the second semiconductor chip 2 .
- an insulator 4 is formed on the first surface 2 a of the second semiconductor chip 2 .
- the input-output pads 2 c of the second semiconductor chip 2 and others top circuit patterns 72 of the substrate 70 are bonded to each other by the second conductive wires 6 .
- first semiconductor chip 1 , the adhesive layer 3 , the second semiconductor chip 2 , insulator 4 , the first and the second conductive wires 5 and 6 are sealed with sealing material, such as an epoxy molding compound.
- sealing material such as an epoxy molding compound.
- the area sealed with the sealing material is defined as a sealing part 8 .
- conductive balls 9 such as solder balls are fused to the bottom circuit patterns of the substrate 70 .
- Such semiconductor package 15 can be mounted to a mother board later.
- FIG. 6 a sectional view of another embodiment of the present invention is illustrated.
- the stacking structure of the semiconductor chip is identical with that of FIG. 1. Since the semiconductor package 16 is constructed in a similar manner to the semiconductor package 15 of FIG. 5, only differences existing there between will be described herein below.
- a perforating hole 74 of which size is larger than that of the semiconductor chip 1 is formed on a center of the substrate 70 .
- a plurality of circuit patterns 72 are formed at the outside of the perforating hole 74 .
- the semiconductor chip 1 is located in the perforating hole 75 so as to form a thinner semiconductor package 15 .
- the input-output pads 1 c of the semiconductor chip 1 are bonded to circuit patterns 72 by the first conductive wires 5 .
- the sealing part 8 is formed inside at the perforating hole 74 , and the first surface 1 a of the semiconductor chip 1 is exposed outward from the sealing part 8 so as to increase the heat dissipation capability of the first semiconductor chip 1 .
- the semiconductor package 15 Since the semiconductor chip and the substrate is overlapped by each other, the total thickness of the semiconductor package 15 becomes thinner. Furthermore, since the first surface 1 a of the semiconductor chip 1 is exposed outward from the sealing part 8 , the semiconductor package 15 increases its heat dissipation capability.
- FIG. 7 a sectional view of another embodiment of the present invention is illustrated.
- a stacking structure of the semiconductor chip is identical with that of FIG. 1.
- a substrate 80 having a substantially plate form is provided.
- the substrate 80 includes chip mounting plate 81 and a plurality of leads 82 formed at an outside of the chip mounting plate 81 .
- Such a substrate 80 may be a conventional lead frame or a micro lead frame (MLF).
- a first semiconductor chip 1 is bonded to the chip mounting plate 81 of the substrate 80 .
- the semiconductor chip 1 includes a first surface 1 a and a second surface 1 b , which are substantially flat in nature.
- a plurality of input-output pads 1 c are formed on the second surface 1 b of the first semiconductor chip 1 .
- the input-output pads 1 c of the first semiconductor chip 1 and some leads 82 of the substrate 80 are bonded to each other by the first conductive wires 5 .
- An adhesive layer 3 having a predetermined thickness is bonded on the second surface 1 b of the first semiconductor chip 1 .
- a plurality of input-output pads 2 c are formed on the second surface 2 b of the second semiconductor chip 2 .
- An insulator 4 is formed on the first surface 2 a of the second semiconductor chip 2 .
- the input-output pads 2 c of the second semiconductor chip 2 and others leads 82 of the substrate 80 are bonded to each other by the second conductive wires 6 .
- the first semiconductor chip 1 , the adhesive layer 3 , the second semiconductor chip 2 , insulator 4 , the first and the second conductive wires 5 and 6 , and the substrate 80 are sealed with sealing material, such as an epoxy molding compound.
- the area sealed with the sealing material is defined as a sealing part 8 .
- a bottom surface of the chip mounting plate 81 and plurality of leads 82 are exposed outward from the sealing part 8 .
- these semiconductor packages 15 , 16 and 17 can include the stacking structures illustrated in FIGS. 2, 3 and 4 . Furthermore, the stacking structure according to the present invention is described on the basis of the first and the second semiconductor chips 1 and 2 . However, a plurality of semiconductor chips (for example, a third semiconductor chip, a fourth semiconductor chip, etc.) may be stacked one up on another. It will be appreciated by those persons skilled in the art that such an arrangement is optional. In other words, the present invention is not limited by the number of the semiconductor chip.
- the insulator is further formed on the first surface of the second semiconductor chip, where it can be electrically insulated while the conductive wire is contacted with the insulator.
- the insulator is made from a soft or elastic material, thereby preventing the mechanical damage of the conductive wire. Furthermore, the thickness of the adhesive layer can become thinner adequately in order to diminish a total thickness of the stacked semiconductor chip or package.
- the conductive wire is stuck to the insulator, thereby having the effect of preventing the leaning phenomenon of the conductive wire during the sealing process and or the like.
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Abstract
Description
- The present invention relates to semiconductor chips, and more particularly, to a stacking structure of semiconductor chips and a semiconductor package using it in which a conductive wire can be electrically insulated while a conductive wire is contacted with a lower surface of an upper semiconductor chip thereby preventing mechanical damage of the wire, and also diminishing a total thickness of the stacking structure.
- As electronic devices get smaller, the components within these devices must get smaller as well. Because of this, there has been an increased demand for the miniaturization of components and greater packaging density. Integrated Circuit (IC) package density is primarily limited by the area available for die mounting and the height of the package. One way of increasing the density is to stack multiple die vertically in an IC package. Stacking multiple die will maximize function and efficiency of the semiconductor package.
- order to stack multiple die vertically in an IC package, an adhesive layer is required between the vertically stacked die. However, presently stacked IC packages require an extraordinarily thick adhesive layer between each die. The thick adhesive layer is necessary in order to prevent the conductive wire of the lower die from contacting the bottom surface of the upper die thereby preventing an electrical short. Unfortunately, the thickness of the adhesive layer limits the number of die that may be vertically stacked in the IC package.
- Therefore, a need existed to provide a device and method to overcome the above problem.
- A semiconductor package and a method of producing the same has a substrate. A first semiconductor chip is coupled to a surface of the substrate. The first semiconductor chip has a first and second surfaces which are substantially flat in nature. An adhesive layer is coupled to the second surface of the first semiconductor chip. A second semiconductor chip having first and second surfaces which are substantially flat in nature is further provided. An insulator is coupled to the first surface of the second semiconductor chip for preventing shorting of wirebonds. The second semiconductor chip is coupled to the adhesive layer by the insulator coupled to the first surface thereof.
- The present invention is best understood by reference to the following detailed description when read in conjunction with the accompanying drawings.
- FIG. 1 illustrates a sectional view of one embodiment of the present invention;
- FIGS. 1A and 1B are magnified views of circle I as shown in FIG. 1;
- FIG. 2 illustrates a sectional view of another embodiment of the present invention;
- FIGS. 2A and 2B are magnified views of circle II as shown in FIG. 2;
- FIG. 3 illustrates a sectional view of another embodiment of the present invention;
- FIGS. 3A and 3B are magnified views of circle III as shown in FIG. 3;
- FIG. 4 illustrates a sectional view of another embodiment of the present invention;
- FIG. 4A is a magnified view of circle IV as shown in FIG. 4;
- FIG. 5 illustrates a sectional view of another embodiment of the present invention;
- FIG. 6 illustrates a sectional view of another embodiment of the present invention; and
- FIG. 7 illustrates a sectional view of another embodiment of the present invention.
- Common reference numerals are used throughout the drawings and detailed description to indicate like elements.
- Referring to FIG. 1, a sectional view of one embodiment of the present invention is shown. FIG.1 illustrates a
stacking structure 11 of a semiconductor chip wherein asubstrate 7 having a substantially plate form, is provided. As is generally known, a printed circuit board, a circuit tape, a circuit film, a lead frame or the like may be used as thesubstrate 7. This is only a matter of selection by a person skilled in the art, and, therefore, this does not adversely influence the present invention. - As shown in FIG. 1, a
first semiconductor chip 1 is bonded on a top surface of thesubstrate 7. Thesemiconductor chip 1 includes afirst surface 1 a and asecond surface 1 b, which are substantially flat in nature. A plurality of input-output pads 1 c are formed on thesecond surface 1 b of thefirst semiconductor chip 1. - There is an edge pad
type semiconductor chip 1 in which a plurality of input-output pads 1 c are formed at the inner circumference of thesecond surface 1 b. A center pad type semiconductor chip will be described with reference to FIG. 4 hereafter. - An
adhesive layer 3 having a predetermined thickness is bonded on the inside of thesecond surface 1 b of thefirst semiconductor chip 1, excluding the input-output pads 1 c. Theadhesive layer 3 may include such substances as a nonconductive liquid phase adhesive, a nonconductive adhesive tape or other substances that are commonly known in the art for semiconductor chip attachment. - The
adhesive layer 3 serves as an adhesive bonding to thesecond semiconductor chip 2 on thesecond surface 1 b of thefirst semiconductor chip 1. Here, it is possible for theadhesive layer 3 to be formed in the same thickness as a loop height of a firstconductive wires 5 mentioned below or a smaller thickness than the loop height. However, when the thickness of theadhesive layer 3 is thinner than the loop height, it is desirable that the thickness of theadhesive layer 3 is to be more than about 80% of the loop height. This will be described in detail hereafter. - Continuously, the input-
output pads 1 c of thefirst semiconductor chip 1 and thesubstrate 7 can be bonded to each other by the firstconductive wires 5, such as gold or copper or aluminum wires or by its equivalent. This is performed by a conventional normal wire bonding manner which will be described hereafter. It should be noted that the listing of the different types of wires is just used as an example and should not be seen as to limit the scope of the present invention. - Continuously, a
second semiconductor chip 2 having afirst surface 2 a and asecond surface 2 b, which are substantially flat in nature, is placed on the upper part of theadhesive layer 3. A plurality of input-output pads 2 c are formed on thesecond surface 2 b of thesecond semiconductor chip 2. - An
insulator 4 is formed on thefirst surface 2 a of thesecond semiconductor chip 2. That is, theinsulator 4 formed on thefirst surface 2 a of thesecond semiconductor chip 2 is bonded on the upper part of theadhesive layer 3. - The
insulator 4 may include such substances as a liquid phase adhesive, an adhesive tape/film, a polyimide, an oxide layer and a nitride layer or other substances that are commonly known in the art for semiconductor chip or package. It is desirable that all these insulators have a nonconductive, soft, and elastic nature. Also, it is desirable that the thickness of theinsulator 4 may be more than about 20% of the loop height of the firstconductive wires 5. - The
insulator 4, but not limited to, is formed in a wafer state before separating into individual semiconductor chips. That is, theinsulator 4 can be formed by bonding the nonconductive tape/film on the back surface of the wafer, or by coating the nonconductive liquid phase adhesive or the polyimide on the back surface of the wafer in a spin coating or in a spray manner. Also, theinsulator 4 can be formed by evaporating a relatively thicker oxide layer or nitride layer on the back surface of the wafer. - After forming the nonconductive tape/film, nonconductive liquid phase adhesive, polyimide, oxide layer or nitride layer (insulator) on the back surface of the wafer, a plurality of semiconductor chips are separated from the wafer, respectively.
- Alternatively,
insulator 4 may be formed at the individual semiconductor chip which is already separated from the wafer. Namely, after the semiconductor chip is separated from the wafer, theinsulator 4 is formed at back surface of the semiconductor chip as described above. - As mentioned above, after forming
insulator 4 on thefirst surface 2 a of thesecond semiconductor chip 2, thesecond chip 2 is compressed and adhered to the upper part ofadhesive layer 4. - At this time, since thickness of the
adhesive layer 3 may be about the same or thinner than the loop height of the firstconductive wires 5, the firstconductive wires 5 may be contacted with theinsulator 4 formed at thefirst surface 2 a of thesecond semiconductor chip 2. However, the loop height portion of the firstconductive wires 5 exposed outward fromadhesive layer 3 is about 20% of total loop height in the firstconductive wires 5. And thickness of theinsulator 4 is more than 20% of the total loop height of the firstconductive wires 5. Thus, the firstconductive wires 5 do not directly contact to thefirst surface 2 a of thesecond semiconductor chip 2. - Even in the case that the loop height portion of the first
conductive wires 5 become exposed outward fromadhesive layer 3, the firstconductive wires 5 do not directly contact to thefirst surface 2 a of thesecond semiconductor chip 2 by theinsulator 4. Also, since theinsulator 4 has a nonconductive, soft, and elastic nature, the firstconductive wires 5 have no electrical or mechanical damages. Namely, the firstconductive wires 5 can be easily overlapped or superimposed with theinsulator 4 and theconductive wires 5 can be independent in theinsulator 4. Thus, the firstconductive wires 5 do not short each other and aren't heavily damaged by theinsulator 4. The tape/film as theinsulator 4 seems to have the most soft and elastic nature among the insulator mentioned above. - An edge pad
type semiconductor chip 2, in which a plurality of input-output pads 2 c is formed at the inner circumference of thesecond surface 2 b, is illustrated in the FIG. 1. However, a center padtype semiconductor chip 2, in which a plurality of input-output pads 2 c is formed at the center of thesecond surface 2 b, can also be used. - Continuously, the input-
output pads 2 c of thesecond semiconductor chip 2 and thesubstrate 7 can be bonded to each other by the secondconductive wires 6, as described above or its equivalent. - As shown in FIGS. 1A and 1B, which is a magnified view of circle I as shown in FIG. 1, the above conventional normal wire bonding is constructed in such a manner that an end of the
conductive wire 5 is bonded on the input-output pad 1 c of thesemiconductor chip 1 by conductive ball 51 (ball bonding). Then the other end of theconductive wire 5 is bonded on thesubstrate 7 by stitch bonding. - As shown in FIG. 1A, if the
adhesive layer 3 does not cover the input-output pads 1 c, the wire bonding can be performed selectively before or after formation of theadhesive layer 3. - However, as shown in FIG. 1B, if
adhesive layer 3 covers the input-output pads 1 c, then the wire bonding must be performed before forming theadhesive layer 3. Here, if theadhesive layer 3 covers the input-output pads 1 c of thesemiconductor chip 1, the nonconductive liquid phase adhesive asadhesive layer 3 is generally used. That is, the adhesive tape asadhesive layer 3 may affect damages in the firstconductive wires 5. - According to the stacking
structure 11 of the present invention, the firstconductive wires 5 are not directly contacted with thefirst surface 2 a of thesemiconductor chip 2. Thus, the phenomenon of an electrical short will not occur. Furthermore, mechanical damage of the firstconductive wires 5 can also be prevented. Though the firstconductive wires 5 are contacted with theinsulator 4, electrical or mechanical damage has never occurred. That is, because of a nonconductive, soft and elastic nature ofinsulator 4, the firstconductive wires 5 can be easily overlapped or superimposed with theinsulator 4 and theconductive wires 5 can be independent in theinsulator 4. Thus, the firstconductive wires 5 do not short each other and aren't heavily damaged by theinsulator 4. - Also, the thickness of the
adhesive layer 3 can adequately become thinner. Namely, in prior art, theadhesive layer 3 should be formed in substantially twice the thickness of the loop height of the firstconductive wires 5. However, in the present the invention, theadhesive layer 3 can be formed in the same thickness as the loop height of the firstconductive wires 5 or a thickness that is less than the loop height. Thus, this invention can diminish a total thickness of the stacking structure of the semiconductor chips. - Referring to FIG. 2, a sectional view of another embodiment of the present invention is illustrated. Referring also to FIGS. 2A and 2B, magnified views of circle II shown in FIG. 2 are also illustrated. Since a stacking
structure 12 illustrated in FIG. 2 is constructed in a similar manner to the stacking structure of FIG. 1, only differences existing there between will be described herein below. - As shown in FIG. 2 or FIG. 2A, the first and the second
conductive wires - Meanwhile, the reverse bonding is constructed in such a manner that an end of the
conductive wire 5 is bonded on the substrate byconductive ball 51′ (ball bonding). Then the other end of theconductive wire 5 is bonded on the input-output pad 1 c of thesemiconductor chip 1 by stitch bonding. Of course, aconductive ball 51 is formed on the input-output pads ofsemiconductor chip 1 by theconductive wire 5 in advance in order to alleviate an impulse created by the stitch bonding. The reverse bonding can be applied to all the first and secondconductive wires first semiconductor chip 1 and thesecond semiconductor chip 2 are connected to thesubstrate 7, respectively. - In the case where the reverse bonding is used, the thickness of the
adhesive layer 3 can be thinner owing to a lower loop height of the firstconductive wires 5. That is, as the loop height of theconductive wire 5, which is bonded by the stitch bonding, is very low, the thickness of theadhesive layer 3 can be reduced sharply. - Also, since the loop height of the
conductive wires 5 is low, when thesecond semiconductor chip 2 is adhered or compressed to theadhesive layer 3, the firstconductive wires 5 have less mechanical stress than the first embodiment. Thus, the firstconductive wires 5 can not create an electrical short or mechanical damage. - In certain cases, the
insulator 4 having elevated bonding power can be used as bonding materials without using theadhesive layer 3. Nevertheless, since theinsulator 4 has the nonconductive, soft and elastic nature, the firstconductive wires 5 can not create an electrical short or mechanical damage. - Of course, the
adhesive layer 3 may cover the input-output pads 1 c of the first semiconductor chip 1 (not shown) and the secondconductive wires 6 may connect between the input-output pads 2 c and thesubstrate 7 by normal bonding. - Further, as shown in FIG. 2B, a wedge bonding manner can be applied to the first and the second
conductive wires - Similarly, in the case where the wedge bonding is used, the thickness of the
adhesive layer 3 can be thinner owing to a lower loop height of the firstconductive wires 5. That is, as the loop height of the conductive wire, which is bonded by the stitch bonding, is very low, the thickness of theadhesive layer 3 can be reduced sharply. - Also, since the loop height of the
conductive wires 5 is low, when thesecond semiconductor chip 2 is adhered or compressed to theadhesive layer 3, the firstconductive wires 5 have less mechanical stress than the first embodiment. - Referring to FIG. 3, a sectional view of another embodiment of the present invention is illustrated. Also referring to FIGS. 3A and 3B, magnified views of circle III as shown in FIG. 3 are illustrated. Since a stacking
structure 13 is constructed in a similar manner to the stackingstructure 12 of FIG. 2, only differences existing there between will be described herein below. As shown in FIGS. 3 and 3A, the first and the secondconductive wires conductive ball 51 is formed on the input-output pads semiconductor chip - Furthermore, a
supporter 52 is formed on the upper part of theconductive wires 5 connected with input-output pads 1 c of thesemiconductor chip 1. Namely, thesupporter 52 is formed on the upper part of theconductive balls 51 and the firstconductive wires 5 together. Also, thesupporter 52 may be formed on the outside of the input-output pads 1 c. For example, a plurality of thesupporters 52 can be formed on the inner circumference of thesecond surface 1 b of thesemiconductor chip 1. - The
supporter 52 may be formed after wire bonding. Namely, first of all, theconductive ball 51 is formed on the input-output pads 1 c, and the firstconductive wire 5 is bonded to theconductive ball 51. At last, thesupporter 52 is formed on the firstconductive wire 5 superimposed over theconductive ball 51. - The
supporter 52 may be formed by conventional stud bump forming manner. For example, a ball is formed at end of a conductive wire, and the ball is fused to the top of the firstconductive wire 5. The conductive wire is then cut off except the ball. Furthermore, another ball is formed at the end of the conductive wire, and this ball is bonded to the fused ball above mentioned. As for a repetition of this manner, as shown in FIG. 3A, a raw type conductive ball forms thesupporter 52. - The
supporter 52 may include such substances as gold, silver, copper, and solder or other substances that are commonly known in the art for the semiconductor chip. The above listing of substances should not be seen as to limit the scope of the present invention. - Meanwhile, the
supporter 52 is contacted with the bottom of theinsulator 4 formed on thesecond semiconductor chip 2 so as to support thesecond semiconductor chip 2. Thus, since thesupporter 52 supports many portions of theinsulator 4 formed on thesemiconductor chip 2, thesemiconductor chip 2 will be supported more stable. Of course, theadhesive layer 3 may cover the input-output pads 1 c of thefirst semiconductor chip 1 and thesupporter 52. - Further, as shown in FIG.3B, a wedge bonding manner can be applied to the first and the second
conductive wires - Similarly, the
supporter 52 is formed on the upper part of theconductive wires 5 connected with input-output pads 1 c of thesemiconductor chip 1. Thesupporter 52 is contacted with theinsulator 4 so as to support thesecond semiconductor chip 2. Thus, since thesupporter 52 supports theinsulator 4 formed on thesemiconductor chip 2, thesemiconductor chip 2 becomes more stable. - Also, since the
conductive wires 5 is covered withsupporter 52, when thesecond semiconductor chip 2 is adhered or compressed to theadhesive layer 3, the firstconductive wires 5 have less mechanical stress than the previous embodiments. - Referring to FIG. 4, a sectional view of another embodiment of the present invention is illustrated. And referring to FIG. 4A, magnified views of circle IV as shown in FIG. 4 is illustrated. Since a stacking
structure 14 is constructed in a similar manner to the stackingstructure 12 of FIG. 2, only differences existing there between will be described herein below. - As shown in the drawings, there is a center pad
type semiconductor chip 1 in which a plurality of input-output pads 1 c are formed at the center of thesecond surface 1 b. Also, the input-output pads 1 c of thefirst semiconductor chip 1 and thesubstrate 7 are bonded to each other by the reverse bonding of the firstconductive wires 5. - The reverse bonding manner, as described above, has advantages in that the thickness of the
adhesive layer 3 can be thinner. Furthermore, the firstconductive wires 5 don't make contact with the region except for the input-output pads 1 c of thefirst semiconductor chip 1 without increasing the loop height. - Here, it is, but not limited to, that a nonconductive liquid phase adhesive is used as the
adhesive layer 3. That is, as a certain portion of the firstconductive wires 5 is positioned at the inside of theadhesive layer 3, it is desirable to use the nonconductive liquid phase adhesive rather than solid phase adhesive tape. In other words, the input-output pads 1 c of thefirst semiconductor chip 1 and thesubstrate 7 is bonded to each other by the reverse bonding of the firstconductive wires 5. Of course,conductive balls 51 are formed on the input-output pads 1 c of thesemiconductor chip 1 by the conductive wire in advance in order to alleviate an impulse created by the stitch bonding. - The nonconductive liquid phase adhesive is applied to the first surface la of the
first semiconductor chip 1 and is hardened. Then, thesecond semiconductor chip 2, to which theinsulator 4 is stuck, is bonded on theadhesive layer 3. Theinsulator 4 may include such substances as a nonconductive liquid phase adhesive, a nonconductive adhesive tape/film, a polyimide, an oxide layer and a nitride layer or other substances that are commonly known in the art for semiconductor chips or packages, as described above. Again, the listing of the above substances should not be seen as to limit the scope of the present invention. - Further, a wedge bonding can be applied to the first and the second
conductive wires - Also, in the FIG. 4, the input-
output pads 2 c of thesecond semiconductor chip 2 are bonded tosubstrate 7 by the reverse bonding ofconductive wires 6. However, the normal bonding manner is also possible. Furthermore, thesecond semiconductor chip 2 of the edge pad type is illustrated in FIG. 4. However, the center pad type is also possible. In this case, the secondconductive wires 6 are generally bonded tosubstrate 7 by the reverse bonding or wedge bonding. - Meanwhile, the stacking structures according to the present invention are described on the basis of the first and the
second semiconductor chips - Referring to FIG. 5, a sectional view of another embodiment of the present invention is illustrated. The stacking structure of the semiconductor chip is identical with that of FIG.1. As shown in the FIG. 5, a
substrate 70 having a substantially plate form is provided. Thesubstrate 70 includesresin layer 71, a plurality ofcircuit patterns 72 formed at a top and bottom of theresin layer 71 and a plurality of conductive via 73 connecting the top andbottom circuit patterns 72. Thesubstrate 70, as is generally known, may be a printed circuit board, circuit tape or circuit film. The listing of thesubstrates 70 should not be seen as to limit the scope of the present invention. - A
first semiconductor chip 1 is bonded on a surface of thesubstrate 70. Thesemiconductor chip 1 includes afirst surface 1 a and asecond surface 1 b, which are substantially in a flat type. A plurality of input-output pads 1 c are formed on thesecond surface 1 b of thefirst semiconductor chip 1. - The input-
output pads 1 c of thefirst semiconductor chip 1 and sometop circuit patterns 72 of thesubstrate 70 are bonded to each other by the firstconductive wires 5. - An
adhesive layer 3 having a predetermined thickness is bonded on thesecond surface 1 bof thefirst semiconductor chip 1. - A
second semiconductor chip 2 having afirst surface 2 a and asecond surface 2 b, which are substantially in a flat type, is positioned on the upper part of theadhesive layer 3. A plurality of input-output pads 2 c are formed on thesecond surface 2 b of thesecond semiconductor chip 2. Further, aninsulator 4 is formed on thefirst surface 2 a of thesecond semiconductor chip 2. The input-output pads 2 c of thesecond semiconductor chip 2 and otherstop circuit patterns 72 of thesubstrate 70 are bonded to each other by the secondconductive wires 6. - Moreover, the
first semiconductor chip 1, theadhesive layer 3, thesecond semiconductor chip 2,insulator 4, the first and the secondconductive wires part 8. - Finally,
conductive balls 9 such as solder balls are fused to the bottom circuit patterns of thesubstrate 70.Such semiconductor package 15 can be mounted to a mother board later. - Referring to FIG. 6, a sectional view of another embodiment of the present invention is illustrated. The stacking structure of the semiconductor chip is identical with that of FIG. 1. Since the
semiconductor package 16 is constructed in a similar manner to thesemiconductor package 15 of FIG. 5, only differences existing there between will be described herein below. - As shown in FIG. 6, a perforating
hole 74 of which size is larger than that of thesemiconductor chip 1 is formed on a center of thesubstrate 70. A plurality ofcircuit patterns 72 are formed at the outside of the perforatinghole 74. Thesemiconductor chip 1 is located in the perforating hole 75 so as to form athinner semiconductor package 15. The input-output pads 1 c of thesemiconductor chip 1 are bonded tocircuit patterns 72 by the firstconductive wires 5. - Furthermore, the sealing
part 8 is formed inside at the perforatinghole 74, and thefirst surface 1 a of thesemiconductor chip 1 is exposed outward from the sealingpart 8 so as to increase the heat dissipation capability of thefirst semiconductor chip 1. - Since the semiconductor chip and the substrate is overlapped by each other, the total thickness of the
semiconductor package 15 becomes thinner. Furthermore, since thefirst surface 1 a of thesemiconductor chip 1 is exposed outward from the sealingpart 8, thesemiconductor package 15 increases its heat dissipation capability. - Referring to FIG. 7, a sectional view of another embodiment of the present invention is illustrated. A stacking structure of the semiconductor chip is identical with that of FIG. 1. As shown in FIG. 7, a
substrate 80 having a substantially plate form is provided. Thesubstrate 80 includeschip mounting plate 81 and a plurality ofleads 82 formed at an outside of thechip mounting plate 81. Such asubstrate 80, as is generally known, may be a conventional lead frame or a micro lead frame (MLF). - A
first semiconductor chip 1 is bonded to thechip mounting plate 81 of thesubstrate 80. Thesemiconductor chip 1 includes afirst surface 1 a and asecond surface 1 b, which are substantially flat in nature. A plurality of input-output pads 1 c are formed on thesecond surface 1 b of thefirst semiconductor chip 1. The input-output pads 1 c of thefirst semiconductor chip 1 and someleads 82 of thesubstrate 80 are bonded to each other by the firstconductive wires 5. - An
adhesive layer 3 having a predetermined thickness is bonded on thesecond surface 1 b of thefirst semiconductor chip 1. - A
second semiconductor chip 2 having afirst surface 2 a and asecond surface 2 b, which are substantially flat in nature, is positioned on the upper part of theadhesive layer 3. A plurality of input-output pads 2 c are formed on thesecond surface 2 b of thesecond semiconductor chip 2. Aninsulator 4 is formed on thefirst surface 2 a of thesecond semiconductor chip 2. - The input-
output pads 2 c of thesecond semiconductor chip 2 and others leads 82 of thesubstrate 80 are bonded to each other by the secondconductive wires 6. - Moreover, the
first semiconductor chip 1, theadhesive layer 3, thesecond semiconductor chip 2,insulator 4, the first and the secondconductive wires substrate 80 are sealed with sealing material, such as an epoxy molding compound. The area sealed with the sealing material is defined as a sealingpart 8. Here, a bottom surface of thechip mounting plate 81 and plurality ofleads 82 are exposed outward from the sealingpart 8. - Also, these
semiconductor packages second semiconductor chips - According to the stacking structure of the semiconductor chip and the semiconductor package using it, the insulator is further formed on the first surface of the second semiconductor chip, where it can be electrically insulated while the conductive wire is contacted with the insulator.
- Also, the insulator is made from a soft or elastic material, thereby preventing the mechanical damage of the conductive wire. Furthermore, the thickness of the adhesive layer can become thinner adequately in order to diminish a total thickness of the stacked semiconductor chip or package.
- Moreover, the conductive wire is stuck to the insulator, thereby having the effect of preventing the leaning phenomenon of the conductive wire during the sealing process and or the like.
- This disclosure provides exemplary embodiments of the present invention. The scope of the present invention is not limited by these exemplary embodiments. Numerous variations, whether explicitly provided for by the specification or implied by the specification, such as variations in structure, dimension, type of material and manufacturing process may be implemented by one of skill in the art in view of this disclosure.
Claims (32)
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US12/317,649 US7863723B2 (en) | 2001-03-09 | 2008-12-23 | Adhesive on wire stacked semiconductor package |
US12/927,533 US8143727B2 (en) | 2001-03-09 | 2010-11-16 | Adhesive on wire stacked semiconductor package |
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US12/317,649 Expired - Fee Related US7863723B2 (en) | 2001-03-09 | 2008-12-23 | Adhesive on wire stacked semiconductor package |
US12/927,533 Expired - Fee Related US8143727B2 (en) | 2001-03-09 | 2010-11-16 | Adhesive on wire stacked semiconductor package |
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US11/286,970 Expired - Fee Related US7485490B2 (en) | 2001-03-09 | 2005-11-22 | Method of forming a stacked semiconductor package |
US12/317,649 Expired - Fee Related US7863723B2 (en) | 2001-03-09 | 2008-12-23 | Adhesive on wire stacked semiconductor package |
US12/927,533 Expired - Fee Related US8143727B2 (en) | 2001-03-09 | 2010-11-16 | Adhesive on wire stacked semiconductor package |
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Cited By (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030178710A1 (en) * | 2002-03-21 | 2003-09-25 | Samsung Electronics Co., Ltd. | Semiconductor chip stack structure and method for forming the same |
US20040009647A1 (en) * | 2002-07-12 | 2004-01-15 | Hidenori Hasegawa | Method of manufacturing semiconductor device |
US20040201088A1 (en) * | 2003-04-08 | 2004-10-14 | Samsung Electronics Co., Ltd. | Semiconductor multi-chip package and fabrication method |
US20040224481A1 (en) * | 2003-02-24 | 2004-11-11 | Seiko Epson Corporation | Semiconductor devices, manufacturing methods therefor, circuit substrates and electronic devices |
US20040227226A1 (en) * | 2003-05-16 | 2004-11-18 | Via Technologies, Inc. | Structure of multi-tier wire bonding for high frequency integrated circuits and method of layout for the same |
EP1617474A1 (en) * | 2004-07-14 | 2006-01-18 | Swissbit Germany GmbH | Memory module and manufacturing method thereof |
US20060038273A1 (en) * | 2004-08-17 | 2006-02-23 | Jicun Lu | Electronic packages with dice landed on wire bonds |
US20060071317A1 (en) * | 2004-10-04 | 2006-04-06 | In-Ku Kang | Multi-chip package and method for manufacturing the same |
US20060125093A1 (en) * | 2003-07-31 | 2006-06-15 | Samsung Electronics Co., Ltd. | Multi-chip module having bonding wires and method of fabricating the same |
US20060186525A1 (en) * | 2005-02-02 | 2006-08-24 | Horst Theuss | Electronic component with stacked semiconductor chips and method for producing the same |
US20070085184A1 (en) * | 2005-10-13 | 2007-04-19 | Stats Chippac Ltd. | Stacked die packaging system |
US20070229107A1 (en) * | 2006-04-01 | 2007-10-04 | Stats Chippac Ltd. | Stacked integrated circuit package system with connection protection |
US20080026506A1 (en) * | 2003-04-08 | 2008-01-31 | Samsung Electronics Co., Ltd. | Semiconductor multi-chip package and fabrication method |
US20080131998A1 (en) * | 2006-12-01 | 2008-06-05 | Hem Takiar | Method of fabricating a film-on-wire bond semiconductor device |
US20080128879A1 (en) * | 2006-12-01 | 2008-06-05 | Hem Takiar | Film-on-wire bond semiconductor device |
US20080173988A1 (en) * | 2007-01-23 | 2008-07-24 | Infineon Technologies Ag | Gas phase precipitated polymers as highly insulating chip backside layer |
US20080173992A1 (en) * | 2007-01-23 | 2008-07-24 | Infineon Technologies Ag | Semiconductor device including isolation layer |
US20080179757A1 (en) * | 2007-01-31 | 2008-07-31 | Kabushiki Kaisha Toshiba | Stacked semiconductor device and method of manufacturing the same |
US20080237824A1 (en) * | 2006-02-17 | 2008-10-02 | Amkor Technology, Inc. | Stacked electronic component package having single-sided film spacer |
CN100447997C (en) * | 2005-09-28 | 2008-12-31 | 王忠诚 | an electronic device |
US7485955B2 (en) | 2004-03-22 | 2009-02-03 | Samsung Electronics Co., Ltd. | Semiconductor package having step type die and method for manufacturing the same |
US7633144B1 (en) | 2006-05-24 | 2009-12-15 | Amkor Technology, Inc. | Semiconductor package |
US7675180B1 (en) | 2006-02-17 | 2010-03-09 | Amkor Technology, Inc. | Stacked electronic component package having film-on-wire spacer |
CN101809737A (en) * | 2007-08-16 | 2010-08-18 | 美光科技公司 | stacked microelectronic devices and methods for manufaturing staked microelectronic devices |
US7863723B2 (en) | 2001-03-09 | 2011-01-04 | Amkor Technology, Inc. | Adhesive on wire stacked semiconductor package |
US20110304044A1 (en) * | 2010-06-15 | 2011-12-15 | Ming-Hong Lin | Stacked chip package structure and its fabrication method |
US20120224332A1 (en) * | 2011-03-02 | 2012-09-06 | Yun Jaeun | Integrated circuit packaging system with bump bonded dies and method of manufacture thereof |
US20130015571A1 (en) * | 2011-07-13 | 2013-01-17 | Chun Jung Hwan | Semiconductor Package And Method Of Manufacturing The Same |
US20130032942A1 (en) * | 2011-08-03 | 2013-02-07 | Fujitsu Semiconductor Limited | Semiconductor device and manufacturing method therefor |
US20140239984A1 (en) * | 2013-02-25 | 2014-08-28 | Motorola Mobility Llc | Capacitive Sensor |
US9177944B2 (en) * | 2010-12-03 | 2015-11-03 | Xilinx, Inc. | Semiconductor device with stacked power converter |
US20160329294A1 (en) * | 2015-05-07 | 2016-11-10 | Invensas Corporation | Ball bonding metal wire bond wires to metal pads |
US9735084B2 (en) | 2014-12-11 | 2017-08-15 | Invensas Corporation | Bond via array for thermal conductivity |
US9812402B2 (en) | 2015-10-12 | 2017-11-07 | Invensas Corporation | Wire bond wires for interference shielding |
US9842745B2 (en) | 2012-02-17 | 2017-12-12 | Invensas Corporation | Heat spreading substrate with embedded interconnects |
US9852969B2 (en) | 2013-11-22 | 2017-12-26 | Invensas Corporation | Die stacks with one or more bond via arrays of wire bond wires and with one or more arrays of bump interconnects |
US9888579B2 (en) | 2015-03-05 | 2018-02-06 | Invensas Corporation | Pressing of wire bond wire tips to provide bent-over tips |
US9911718B2 (en) | 2015-11-17 | 2018-03-06 | Invensas Corporation | ‘RDL-First’ packaged microelectronic device for a package-on-package device |
US9935075B2 (en) | 2016-07-29 | 2018-04-03 | Invensas Corporation | Wire bonding method and apparatus for electromagnetic interference shielding |
US9953914B2 (en) | 2012-05-22 | 2018-04-24 | Invensas Corporation | Substrate-less stackable package with wire-bond interconnect |
US9984992B2 (en) | 2015-12-30 | 2018-05-29 | Invensas Corporation | Embedded wire bond wires for vertical integration with separate surface mount and wire bond mounting surfaces |
US10008469B2 (en) | 2015-04-30 | 2018-06-26 | Invensas Corporation | Wafer-level packaging using wire bond wires in place of a redistribution layer |
US10008477B2 (en) | 2013-09-16 | 2018-06-26 | Invensas Corporation | Microelectronic element with bond elements to encapsulation surface |
US10026717B2 (en) | 2013-11-22 | 2018-07-17 | Invensas Corporation | Multiple bond via arrays of different wire heights on a same substrate |
US10062661B2 (en) | 2011-05-03 | 2018-08-28 | Tessera, Inc. | Package-on-package assembly with wire bonds to encapsulation surface |
US10128216B2 (en) | 2010-07-19 | 2018-11-13 | Tessera, Inc. | Stackable molded microelectronic packages |
US10181457B2 (en) | 2015-10-26 | 2019-01-15 | Invensas Corporation | Microelectronic package for wafer-level chip scale packaging with fan-out |
US10297582B2 (en) | 2012-08-03 | 2019-05-21 | Invensas Corporation | BVA interposer |
US10299368B2 (en) | 2016-12-21 | 2019-05-21 | Invensas Corporation | Surface integrated waveguides and circuit structures therefor |
US10332854B2 (en) | 2015-10-23 | 2019-06-25 | Invensas Corporation | Anchoring structure of fine pitch bva |
US10381326B2 (en) | 2014-05-28 | 2019-08-13 | Invensas Corporation | Structure and method for integrated circuits packaging with increased density |
US10460958B2 (en) | 2013-08-07 | 2019-10-29 | Invensas Corporation | Method of manufacturing embedded packaging with preformed vias |
US10490528B2 (en) | 2015-10-12 | 2019-11-26 | Invensas Corporation | Embedded wire bond wires |
US10529636B2 (en) | 2014-01-17 | 2020-01-07 | Invensas Corporation | Fine pitch BVA using reconstituted wafer with area array accessible for testing |
US10756049B2 (en) | 2011-10-17 | 2020-08-25 | Invensas Corporation | Package-on-package assembly with wire bond vias |
US20230008716A1 (en) * | 2003-08-29 | 2023-01-12 | Micron Technology, Inc. | Stacked microfeature devices and associated methods |
US20240105703A1 (en) * | 2022-09-26 | 2024-03-28 | Samsung Electronics Co., Ltd. | Fingerprint sensor package and smart card having the same |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030095035A (en) * | 2002-06-11 | 2003-12-18 | 주식회사 칩팩코리아 | Chip size stack package using resin-spacer |
SG130055A1 (en) | 2005-08-19 | 2007-03-20 | Micron Technology Inc | Microelectronic devices, stacked microelectronic devices, and methods for manufacturing microelectronic devices |
SG130066A1 (en) * | 2005-08-26 | 2007-03-20 | Micron Technology Inc | Microelectronic device packages, stacked microelectronic device packages, and methods for manufacturing microelectronic devices |
DE102006033222B4 (en) * | 2006-07-18 | 2014-04-30 | Epcos Ag | Module with flat structure and procedure for assembly |
KR100809701B1 (en) * | 2006-09-05 | 2008-03-06 | 삼성전자주식회사 | Multichip Package with Interchip Chip Blocks |
US8148825B2 (en) * | 2007-06-05 | 2012-04-03 | Stats Chippac Ltd. | Integrated circuit package system with leadfinger |
US20100044861A1 (en) * | 2008-08-20 | 2010-02-25 | Chin-Tien Chiu | Semiconductor die support in an offset die stack |
TWM356216U (en) * | 2008-12-12 | 2009-05-01 | Kun Yuan Technology Co Ltd | Memory chip packaging module |
US20110084372A1 (en) * | 2009-10-14 | 2011-04-14 | Advanced Semiconductor Engineering, Inc. | Package carrier, semiconductor package, and process for fabricating same |
TWI497679B (en) * | 2009-11-27 | 2015-08-21 | Advanced Semiconductor Eng | Semiconductor package and manufacturing method thereof |
US8569894B2 (en) | 2010-01-13 | 2013-10-29 | Advanced Semiconductor Engineering, Inc. | Semiconductor package with single sided substrate design and manufacturing methods thereof |
US8372689B2 (en) * | 2010-01-21 | 2013-02-12 | Advanced Semiconductor Engineering, Inc. | Wafer-level semiconductor device packages with three-dimensional fan-out and manufacturing methods thereof |
US7999371B1 (en) | 2010-02-09 | 2011-08-16 | Amkor Technology, Inc. | Heat spreader package and method |
TWI411075B (en) | 2010-03-22 | 2013-10-01 | Advanced Semiconductor Eng | Semiconductor package and manufacturing method thereof |
US20110241194A1 (en) * | 2010-04-02 | 2011-10-06 | Advanced Semiconductor Engineering, Inc. | Stacked Semiconductor Device Package Assemblies with Reduced Wire Sweep and Manufacturing Methods Thereof |
US8624374B2 (en) | 2010-04-02 | 2014-01-07 | Advanced Semiconductor Engineering, Inc. | Semiconductor device packages with fan-out and with connecting elements for stacking and manufacturing methods thereof |
US8941222B2 (en) | 2010-11-11 | 2015-01-27 | Advanced Semiconductor Engineering Inc. | Wafer level semiconductor package and manufacturing methods thereof |
US9406658B2 (en) | 2010-12-17 | 2016-08-02 | Advanced Semiconductor Engineering, Inc. | Embedded component device and manufacturing methods thereof |
US20120241954A1 (en) * | 2011-03-24 | 2012-09-27 | Conexant Systems, Inc. | Unpackaged and packaged IC stacked in a system-in-package module |
US8476111B2 (en) | 2011-06-16 | 2013-07-02 | Stats Chippac Ltd. | Integrated circuit packaging system with intra substrate die and method of manufacture thereof |
JP2014013836A (en) * | 2012-07-04 | 2014-01-23 | Ps4 Luxco S A R L | Semiconductor device |
KR102116987B1 (en) * | 2013-10-15 | 2020-05-29 | 삼성전자 주식회사 | Semiconductor package |
JP6214337B2 (en) * | 2013-10-25 | 2017-10-18 | キヤノン株式会社 | Electronic parts, electronic devices, and methods for manufacturing electronic parts. |
US9111846B1 (en) * | 2014-04-16 | 2015-08-18 | Gloval Unichip Corp. | Assembly structure for connecting multiple dies into a system-in-package chip and the method thereof |
CN110006580B (en) * | 2014-06-12 | 2021-03-09 | 意法半导体(格勒诺布尔2)公司 | Stack of integrated circuit chips and electronic device |
KR101630180B1 (en) * | 2014-09-22 | 2016-06-14 | 주식회사 에스에프에이반도체 | Wire bonding structure and method thereof |
US9865570B1 (en) * | 2017-02-14 | 2018-01-09 | Globalfoundries Inc. | Integrated circuit package with thermally conductive pillar |
US11127716B2 (en) | 2018-04-12 | 2021-09-21 | Analog Devices International Unlimited Company | Mounting structures for integrated device packages |
DE102019133234B4 (en) | 2019-12-05 | 2024-01-25 | Infineon Technologies Ag | SEMICONDUCTOR COMPONENT AND METHOD FOR PRODUCING IT |
KR102257072B1 (en) | 2020-01-31 | 2021-05-27 | 주식회사 포스텔 | Processing method of stack board and stack board for semiconductor package settling |
Citations (61)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4763188A (en) * | 1986-08-08 | 1988-08-09 | Thomas Johnson | Packaging system for multiple semiconductor devices |
US5012323A (en) * | 1989-11-20 | 1991-04-30 | Micron Technology, Inc. | Double-die semiconductor package having a back-bonded die and a face-bonded die interconnected on a single leadframe |
US5025306A (en) * | 1988-08-09 | 1991-06-18 | Texas Instruments Incorporated | Assembly of semiconductor chips |
US5291061A (en) * | 1993-04-06 | 1994-03-01 | Micron Semiconductor, Inc. | Multi-chip stacked devices |
US5323060A (en) * | 1993-06-02 | 1994-06-21 | Micron Semiconductor, Inc. | Multichip module having a stacked chip arrangement |
US5347429A (en) * | 1990-11-14 | 1994-09-13 | Hitachi, Ltd. | Plastic-molded-type semiconductor device |
US5422435A (en) * | 1992-05-22 | 1995-06-06 | National Semiconductor Corporation | Stacked multi-chip modules and method of manufacturing |
US5463253A (en) * | 1990-03-15 | 1995-10-31 | Fujitsu Limited | Semiconductor device having a plurality of chips |
US5689135A (en) * | 1995-12-19 | 1997-11-18 | Micron Technology, Inc. | Multi-chip device and method of fabrication employing leads over and under processes |
US5696031A (en) * | 1996-11-20 | 1997-12-09 | Micron Technology, Inc. | Device and method for stacking wire-bonded integrated circuit dice on flip-chip bonded integrated circuit dice |
US5715147A (en) * | 1990-12-20 | 1998-02-03 | Kabushiki Kaisha Toshiba | Semiconductor device having an interconnecting circuit board |
US5721452A (en) * | 1995-08-16 | 1998-02-24 | Micron Technology, Inc. | Angularly offset stacked die multichip device and method of manufacture |
US5739581A (en) * | 1995-11-17 | 1998-04-14 | National Semiconductor Corporation | High density integrated circuit package assembly with a heatsink between stacked dies |
US5815372A (en) * | 1997-03-25 | 1998-09-29 | Intel Corporation | Packaging multiple dies on a ball grid array substrate |
US5866949A (en) * | 1996-12-02 | 1999-02-02 | Minnesota Mining And Manufacturing Company | Chip scale ball grid array for integrated circuit packaging |
US5886412A (en) * | 1995-08-16 | 1999-03-23 | Micron Technology, Inc. | Angularly offset and recessed stacked die multichip device |
US5952725A (en) * | 1996-02-20 | 1999-09-14 | Micron Technology, Inc. | Stacked semiconductor devices |
US6005778A (en) * | 1995-06-15 | 1999-12-21 | Honeywell Inc. | Chip stacking and capacitor mounting arrangement including spacers |
US6013948A (en) * | 1995-11-27 | 2000-01-11 | Micron Technology, Inc. | Stackable chip scale semiconductor package with mating contacts on opposed surfaces |
US6051886A (en) * | 1995-08-16 | 2000-04-18 | Micron Technology, Inc. | Angularly offset stacked die multichip device and method of manufacture |
US6057598A (en) * | 1997-01-31 | 2000-05-02 | Vlsi Technology, Inc. | Face on face flip chip integration |
US6072243A (en) * | 1996-11-26 | 2000-06-06 | Sharp Kabushiki Kaisha | Semiconductor integrated circuit device capable of surely electrically insulating two semiconductor chips from each other and fabricating method thereof |
US6080264A (en) * | 1996-05-20 | 2000-06-27 | Micron Technology, Inc. | Combination of semiconductor interconnect |
US6118176A (en) * | 1999-04-26 | 2000-09-12 | Advanced Semiconductor Engineering, Inc. | Stacked chip assembly utilizing a lead frame |
US6133637A (en) * | 1997-01-24 | 2000-10-17 | Rohm Co., Ltd. | Semiconductor device having a plurality of semiconductor chips |
US6157080A (en) * | 1997-11-06 | 2000-12-05 | Sharp Kabushiki Kaisha | Semiconductor device using a chip scale package |
US6163076A (en) * | 1999-06-04 | 2000-12-19 | Advanced Semiconductor Engineering, Inc. | Stacked structure of semiconductor package |
US6214641B1 (en) * | 1996-06-25 | 2001-04-10 | Micron Technology, Inc. | Method of fabricating a multi-chip module |
US6215193B1 (en) * | 1999-04-21 | 2001-04-10 | Advanced Semiconductor Engineering, Inc. | Multichip modules and manufacturing method therefor |
US6252305B1 (en) * | 2000-02-29 | 2001-06-26 | Advanced Semiconductor Engineering, Inc. | Multichip module having a stacked chip arrangement |
US6258626B1 (en) * | 2000-07-06 | 2001-07-10 | Advanced Semiconductor Engineering, Inc. | Method of making stacked chip package |
US20010023994A1 (en) * | 2000-03-07 | 2001-09-27 | Takahiro Oka | Semiconductor device and the method for manufacturing the same |
US6316838B1 (en) * | 1999-10-29 | 2001-11-13 | Fujitsu Limited | Semiconductor device |
US6326696B1 (en) * | 1998-02-04 | 2001-12-04 | International Business Machines Corporation | Electronic package with interconnected chips |
US6333562B1 (en) * | 2000-07-13 | 2001-12-25 | Advanced Semiconductor Engineering, Inc. | Multichip module having stacked chip arrangement |
US6340846B1 (en) * | 2000-12-06 | 2002-01-22 | Amkor Technology, Inc. | Making semiconductor packages with stacked dies and reinforced wire bonds |
US20020014689A1 (en) * | 2000-07-17 | 2002-02-07 | Lo Randy H.Y. | Multiple stacked-chip packaging structure |
US20020030263A1 (en) * | 1999-02-08 | 2002-03-14 | Salman Akram | Multiple die stack apparatus employing T-shaped interposer elements |
US6359340B1 (en) * | 2000-07-28 | 2002-03-19 | Advanced Semiconductor Engineering, Inc. | Multichip module having a stacked chip arrangement |
US6365966B1 (en) * | 2000-08-07 | 2002-04-02 | Advanced Semiconductor Engineering, Inc. | Stacked chip scale package |
US6388313B1 (en) * | 2001-01-30 | 2002-05-14 | Siliconware Precision Industries Co., Ltd. | Multi-chip module |
US6387728B1 (en) * | 1999-11-09 | 2002-05-14 | Advanced Semiconductor Engineering, Inc. | Method for fabricating a stacked chip package |
US20020064905A1 (en) * | 1999-12-20 | 2002-05-30 | Park Young Kuk | Wire bonding method and semiconductor package manufactured using the same |
US20020096755A1 (en) * | 2001-01-24 | 2002-07-25 | Yasuki Fukui | Semiconductor device |
US6437449B1 (en) * | 2001-04-06 | 2002-08-20 | Amkor Technology, Inc. | Making semiconductor devices having stacked dies with biased back surfaces |
US6476475B1 (en) * | 2000-06-29 | 2002-11-05 | Advanced Micro Devices, Inc. | Stacked SRAM die package |
US20020171136A1 (en) * | 2001-05-15 | 2002-11-21 | Fujitsu Limited | Semiconductor device with stack of semiconductor chips |
US20020195624A1 (en) * | 2000-07-20 | 2002-12-26 | Glenn Thomas P. | Method of making a semiconductor package including stacked semiconductor dies |
US20030001252A1 (en) * | 2000-03-25 | 2003-01-02 | Ku Jae Hun | Semiconductor package including stacked chips |
US6503776B2 (en) * | 2001-01-05 | 2003-01-07 | Advanced Semiconductor Engineering, Inc. | Method for fabricating stacked chip package |
US20030038355A1 (en) * | 2001-08-24 | 2003-02-27 | Derderian James M. | Semiconductor devices and semiconductor device assemblies including a nonconfluent spacer layer |
US20030038356A1 (en) * | 2001-08-24 | 2003-02-27 | Derderian James M | Semiconductor devices including stacking spacers thereon, assemblies including the semiconductor devices, and methods |
US6531784B1 (en) * | 2000-06-02 | 2003-03-11 | Amkor Technology, Inc. | Semiconductor package with spacer strips |
US6552416B1 (en) * | 2000-09-08 | 2003-04-22 | Amkor Technology, Inc. | Multiple die lead frame package with enhanced die-to-die interconnect routing using internal lead trace wiring |
US20030137042A1 (en) * | 2001-06-21 | 2003-07-24 | Mess Leonard E. | Stacked mass storage flash memory package |
US6603072B1 (en) * | 2001-04-06 | 2003-08-05 | Amkor Technology, Inc. | Making leadframe semiconductor packages with stacked dies and interconnecting interposer |
US20030189259A1 (en) * | 2002-04-05 | 2003-10-09 | Nec Electronics Corporation | Semiconductor device and method for manufacturing the same |
US20040041249A1 (en) * | 2002-09-03 | 2004-03-04 | United Test Center Inc. | Stacked chip package with enhanced thermal conductivity |
US20040126926A1 (en) * | 2002-12-27 | 2004-07-01 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and method for fabricating the same |
US20040169285A1 (en) * | 2002-02-19 | 2004-09-02 | Vani Verma | Memory module having interconnected and stacked integrated circuits |
US20040241907A1 (en) * | 2003-05-30 | 2004-12-02 | Tomoko Higashino | Method of manufacturing a semiconductor device |
Family Cites Families (145)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US676753A (en) * | 1901-02-23 | 1901-06-18 | Ora E Case | Shirt-waist fastener. |
US3281606A (en) | 1963-07-26 | 1966-10-25 | Texas Instruments Inc | Small light sensor package |
US3880528A (en) * | 1973-07-02 | 1975-04-29 | Tektronix Inc | Light probe |
JPS59596Y2 (en) | 1975-03-14 | 1984-01-09 | 株式会社ニコン | rosyutsukeinojiyukoki |
JPS5662351A (en) | 1979-10-26 | 1981-05-28 | Hitachi Ltd | Semiconductor device for memory |
US4491865A (en) * | 1982-09-29 | 1985-01-01 | Welch Allyn, Inc. | Image sensor assembly |
GB2146504A (en) | 1983-09-09 | 1985-04-17 | Electronic Automation Ltd | Image recording device |
US4567643A (en) * | 1983-10-24 | 1986-02-04 | Sintra-Alcatel | Method of replacing an electronic component connected to conducting tracks on a support substrate |
JPS60182731A (en) | 1984-02-29 | 1985-09-18 | Toshiba Corp | Semiconductor device |
JPS61117858A (en) | 1984-11-14 | 1986-06-05 | Hitachi Micro Comput Eng Ltd | Semiconductor device |
JPS628534A (en) | 1985-07-04 | 1987-01-16 | Seiko Epson Corp | Semiconductor mounting structure |
JPS62126661A (en) | 1985-11-27 | 1987-06-08 | Nec Corp | Hybrid integrated circuit device |
JP2566207B2 (en) | 1986-09-23 | 1996-12-25 | シーメンス、アクチエンゲゼルシヤフト | Semiconductor device |
JPS63128736A (en) | 1986-11-19 | 1988-06-01 | Olympus Optical Co Ltd | Semiconductor element |
JPS63244654A (en) | 1987-03-31 | 1988-10-12 | Toshiba Corp | Plastic molded type integrated circuit device |
JPS63308375A (en) * | 1987-06-10 | 1988-12-15 | Hitachi Ltd | solid-state imaging device |
JP2603636B2 (en) | 1987-06-24 | 1997-04-23 | 株式会社日立製作所 | Semiconductor device |
JP2642359B2 (en) | 1987-09-11 | 1997-08-20 | 株式会社日立製作所 | Semiconductor device |
JP2569053B2 (en) | 1987-06-26 | 1997-01-08 | キヤノン株式会社 | Image sensor |
JPS6428856U (en) | 1987-08-13 | 1989-02-21 | ||
JPH0199248A (en) | 1987-10-13 | 1989-04-18 | Mitsubishi Electric Corp | Semiconductor device |
US5274456A (en) | 1987-12-28 | 1993-12-28 | Hitachi, Ltd. | Semiconductor device and video camera unit using it and their manufacturing method |
JPH0745140B2 (en) * | 1988-06-07 | 1995-05-17 | 松下電器産業株式会社 | Lens array manufacturing method |
DK300689A (en) * | 1988-06-21 | 1989-12-22 | Rohm Co Ltd | OPTICAL WRITING INFORMATION DEVICE |
DE68911420T2 (en) | 1988-08-18 | 1994-05-11 | Seiko Epson Corp | Solid state imaging device. |
US5122861A (en) * | 1988-11-25 | 1992-06-16 | Fuji Photo Film Co., Ltd. | Solid state image pickup device having particular package structure |
US5400072A (en) * | 1988-12-23 | 1995-03-21 | Hitachi, Ltd. | Video camera unit having an airtight mounting arrangement for an image sensor chip |
JPH03165550A (en) | 1989-11-24 | 1991-07-17 | Hitachi Cable Ltd | High mounting density type semiconductor device |
JPH03169062A (en) | 1989-11-28 | 1991-07-22 | Nec Kyushu Ltd | Semiconductor device |
JPH0428260A (en) | 1990-05-23 | 1992-01-30 | Matsushita Electric Ind Co Ltd | Method of mounting semiconductor chip |
JPH0456262A (en) | 1990-06-25 | 1992-02-24 | Matsushita Electron Corp | Semiconductor integrated circuit device |
JPH0496358A (en) | 1990-08-13 | 1992-03-27 | Casio Comput Co Ltd | Printed wiring board |
JP3216650B2 (en) * | 1990-08-27 | 2001-10-09 | オリンパス光学工業株式会社 | Solid-state imaging device |
JPH04111479A (en) | 1990-08-31 | 1992-04-13 | Sumitomo Electric Ind Ltd | Light-receiving element |
US5412229A (en) * | 1990-08-31 | 1995-05-02 | Sumitomo Electric Industries, Ltd. | Semiconductor light detecting device making use of a photodiode chip |
JP2871041B2 (en) | 1990-09-06 | 1999-03-17 | 三菱電機株式会社 | Semiconductor device |
US5523289A (en) * | 1991-04-15 | 1996-06-04 | Abbott Laboratories | Pharmaceutical composition |
JPH0513665A (en) | 1991-06-28 | 1993-01-22 | Nec Corp | Method for mounting tab chip |
JPH0575015A (en) | 1991-09-13 | 1993-03-26 | Sharp Corp | Semiconductor device |
JP2954760B2 (en) * | 1991-09-30 | 1999-09-27 | ローム株式会社 | Image sensor |
JP3096171B2 (en) | 1991-09-30 | 2000-10-10 | ローム株式会社 | Image sensor and electronic device incorporating the same |
JPH05109975A (en) | 1991-10-14 | 1993-04-30 | Hitachi Ltd | Resin-sealed type semiconductor device |
JPH05136323A (en) | 1991-11-13 | 1993-06-01 | Nec Corp | Integrated circuit device |
WO1993023982A1 (en) | 1992-05-11 | 1993-11-25 | Nchip, Inc. | Stacked devices for multichip modules |
MY138010A (en) * | 1992-06-11 | 2009-04-30 | Canon Kk | Contact type image sensor, producing method of the same, and information processing apparatus |
TW332348B (en) | 1992-06-23 | 1998-05-21 | Sony Co Ltd | Manufacturing method for solid state motion picture device provides a highly accurate and low cost solid state motion picture device by use of empty package made of resin. |
JP2843464B2 (en) * | 1992-09-01 | 1999-01-06 | シャープ株式会社 | Solid-state imaging device |
US5902993A (en) * | 1992-12-28 | 1999-05-11 | Kyocera Corporation | Image scanner for image inputting in computers, facsimiles word processor, and the like |
US5328079A (en) * | 1993-03-19 | 1994-07-12 | National Semiconductor Corporation | Method of and arrangement for bond wire connecting together certain integrated circuit components |
EP0619608B1 (en) | 1993-04-07 | 1999-11-03 | Mitsui Chemicals, Inc. | Circuit board for optical devices |
US5444520A (en) | 1993-05-17 | 1995-08-22 | Kyocera Corporation | Image devices |
US5617131A (en) * | 1993-10-28 | 1997-04-01 | Kyocera Corporation | Image device having a spacer with image arrays disposed in holes thereof |
JPH07142761A (en) | 1993-11-18 | 1995-06-02 | Mitsubishi Electric Corp | Photoreceptor element and its array, device and method for sensing picture |
JP3202856B2 (en) | 1993-12-28 | 2001-08-27 | 株式会社リコー | Image reading device |
US5655189A (en) | 1994-05-27 | 1997-08-05 | Kyocera Corporation | Image device having thermally stable light emitting/receiving arrays and opposing lenses |
JP3521099B2 (en) * | 1994-11-29 | 2004-04-19 | リンテック株式会社 | Adhesive sheet for preventing adhesion of adhesive to dicing ring frame and wafer processing sheet provided with the adhesive sheet |
US6498624B1 (en) | 1995-02-28 | 2002-12-24 | Canon Kabushiki Kaisha | Optical apparatus and image sensing apparatus mounted on the same surface of a board |
US6392703B1 (en) * | 1995-02-28 | 2002-05-21 | Canon Kabushiki Kaisha | Optical apparatus for forming an object image on a sensing element |
US5825560A (en) | 1995-02-28 | 1998-10-20 | Canon Kabushiki Xaisha | Optical apparatus |
US5604362A (en) * | 1995-04-24 | 1997-02-18 | Xerox Corporation | Filter architecture for a photosensitive chip |
US6060722A (en) * | 1995-05-15 | 2000-05-09 | Havens; William H. | Optical reader having illumination assembly including improved aiming pattern generator |
KR970705294A (en) | 1995-05-31 | 1997-09-06 | 이데이 노부유키 | Image pickup apparatus, image pickup adapter apparatus, signal processing apparatus, signal processing method, information processing apparatus, and information processing method Processing Apparatus, and Information Processing Method) |
EP0753893B1 (en) | 1995-07-13 | 2004-04-21 | Eastman Kodak Company | An image sensor assembly and packaging method |
US5861654A (en) * | 1995-11-28 | 1999-01-19 | Eastman Kodak Company | Image sensor assembly |
JPH09181287A (en) | 1995-10-24 | 1997-07-11 | Sony Corp | Light receiving device and manufacturing method thereof |
US5804827A (en) | 1995-10-27 | 1998-09-08 | Nikon Corporation | Infrared ray detection device and solid-state imaging apparatus |
JPH09167315A (en) * | 1995-12-15 | 1997-06-24 | Hitachi Ltd | Recording / playback type thin film magnetic head |
US6011294A (en) * | 1996-04-08 | 2000-01-04 | Eastman Kodak Company | Low cost CCD packaging |
US6583444B2 (en) | 1997-02-18 | 2003-06-24 | Tessera, Inc. | Semiconductor packages having light-sensitive chips |
JPH10256470A (en) | 1997-03-10 | 1998-09-25 | Sanyo Electric Co Ltd | Semiconductor device |
JPH10321827A (en) | 1997-05-16 | 1998-12-04 | Sony Corp | Imaging device and camera |
US5821532A (en) | 1997-06-16 | 1998-10-13 | Eastman Kodak Company | Imager package substrate |
US5932875A (en) | 1997-07-07 | 1999-08-03 | Rockwell Science Center, Inc. | Single piece integrated package and optical lid |
US5811799A (en) | 1997-07-31 | 1998-09-22 | Wu; Liang-Chung | Image sensor package having a wall with a sealed cover |
US5904497A (en) * | 1997-08-22 | 1999-05-18 | Micron Technology, Inc. | Method and apparatus for semiconductor assembly which includes testing of chips and replacement of bad chips prior to final assembly |
US6037655A (en) * | 1998-01-12 | 2000-03-14 | Eastman Kodak Company | Linear image sensor package assembly |
JP3988239B2 (en) * | 1998-03-19 | 2007-10-10 | ソニー株式会社 | Solid-state imaging device and manufacturing method thereof |
US6020582A (en) * | 1998-03-31 | 2000-02-01 | Intel Corporation | Light selective element for imaging applications |
US6011661A (en) * | 1998-04-07 | 2000-01-04 | Weng; Leo | Optical holder for an optical apparatus |
US6762796B1 (en) | 1998-08-10 | 2004-07-13 | Olympus Optical Co., Ltd. | Image pickup module having integrated lens and semiconductor chip |
US6130448A (en) | 1998-08-21 | 2000-10-10 | Gentex Corporation | Optical sensor package and method of making same |
US6084297A (en) | 1998-09-03 | 2000-07-04 | Micron Technology, Inc. | Cavity ball grid array apparatus |
US6753922B1 (en) * | 1998-10-13 | 2004-06-22 | Intel Corporation | Image sensor mounted by mass reflow |
KR100302593B1 (en) | 1998-10-24 | 2001-09-22 | 김영환 | Semiconductor package and fabricating method thereof |
DE19958229B4 (en) | 1998-12-09 | 2007-05-31 | Fuji Electric Co., Ltd., Kawasaki | Optical semiconductor sensor device |
US6184514B1 (en) * | 1998-12-18 | 2001-02-06 | Eastman Kodak Company | Plastic cover for image sensors |
US6234251B1 (en) * | 1999-02-22 | 2001-05-22 | Halliburton Energy Services, Inc. | Resilient well cement compositions and methods |
KR100319608B1 (en) | 1999-03-09 | 2002-01-05 | 김영환 | A stacked semiconductor package and the fabricating method thereof |
JP3685947B2 (en) | 1999-03-15 | 2005-08-24 | 新光電気工業株式会社 | Semiconductor device and manufacturing method thereof |
US6147389A (en) | 1999-06-04 | 2000-11-14 | Silicon Film Technologies, Inc. | Image sensor package with image plane reference |
KR100384333B1 (en) | 1999-06-07 | 2003-05-16 | 앰코 테크놀로지 코리아 주식회사 | fabrication method of semiconductor chip for semiconductor package from wafer |
US6359334B1 (en) * | 1999-06-08 | 2002-03-19 | Micron Technology, Inc. | Thermally conductive adhesive tape for semiconductor devices and method using the same |
JP3344372B2 (en) * | 1999-06-29 | 2002-11-11 | 日本電気株式会社 | Method for manufacturing semiconductor device |
KR100333388B1 (en) * | 1999-06-29 | 2002-04-18 | 박종섭 | chip size stack package and method of fabricating the same |
JP2001077301A (en) | 1999-08-24 | 2001-03-23 | Amkor Technology Korea Inc | Semiconductor package and its manufacturing method |
US6153927A (en) | 1999-09-30 | 2000-11-28 | Intel Corporation | Packaged integrated processor and spatial light modulator |
JP2001119006A (en) * | 1999-10-19 | 2001-04-27 | Sony Corp | Imaging device and method of manufacturing the same |
US6627864B1 (en) | 1999-11-22 | 2003-09-30 | Amkor Technology, Inc. | Thin image sensor package |
US6437446B1 (en) * | 2000-03-16 | 2002-08-20 | Oki Electric Industry Co., Ltd. | Semiconductor device having first and second chips |
US6384472B1 (en) * | 2000-03-24 | 2002-05-07 | Siliconware Precision Industries Co., Ltd | Leadless image sensor package structure and method for making the same |
JP2001308262A (en) | 2000-04-26 | 2001-11-02 | Mitsubishi Electric Corp | Resin-sealed bga type semiconductor device |
US6384397B1 (en) * | 2000-05-10 | 2002-05-07 | National Semiconductor Corporation | Low cost die sized module for imaging application having a lens housing assembly |
TW445608B (en) | 2000-05-19 | 2001-07-11 | Siliconware Precision Industries Co Ltd | Semiconductor package and manufacturing method thereof of lead frame without flashing |
TW445610B (en) | 2000-06-16 | 2001-07-11 | Siliconware Precision Industries Co Ltd | Stacked-die packaging structure |
KR20020015214A (en) | 2000-08-21 | 2002-02-27 | 마이클 디. 오브라이언 | Semiconductor package |
JP2002093992A (en) | 2000-09-13 | 2002-03-29 | Seiko Epson Corp | Semiconductor device and manufacturing method thereof |
JP3827520B2 (en) | 2000-11-02 | 2006-09-27 | 株式会社ルネサステクノロジ | Semiconductor device |
US6509560B1 (en) * | 2000-11-13 | 2003-01-21 | Amkor Technology, Inc. | Chip size image sensor in wirebond package with step-up ring for electrical contact |
JP2002151531A (en) | 2000-11-15 | 2002-05-24 | Matsushita Electric Ind Co Ltd | Method for manufacturing semiconductor device |
JP4501279B2 (en) | 2000-12-27 | 2010-07-14 | ソニー株式会社 | Integrated electronic component and method for integrating the same |
TW473951B (en) | 2001-01-17 | 2002-01-21 | Siliconware Precision Industries Co Ltd | Non-leaded quad flat image sensor package |
JP2002222889A (en) | 2001-01-24 | 2002-08-09 | Nec Kyushu Ltd | Semiconductor device and method of manufacturing the same |
KR100401020B1 (en) | 2001-03-09 | 2003-10-08 | 앰코 테크놀로지 코리아 주식회사 | Stacking structure of semiconductor chip and semiconductor package using it |
US6559526B2 (en) * | 2001-04-26 | 2003-05-06 | Macronix International Co., Ltd. | Multiple-step inner lead of leadframe |
DE10142120A1 (en) | 2001-08-30 | 2003-03-27 | Infineon Technologies Ag | Electronic component has semiconductor chips whose passive back sides are fastened to top side of carrier substrate and active chip surface, respectively |
TW499743B (en) * | 2001-09-13 | 2002-08-21 | Siliconware Precision Industries Co Ltd | Multi-chip semiconductor package having a die carrier with leads extended downwardly |
US6555917B1 (en) * | 2001-10-09 | 2003-04-29 | Amkor Technology, Inc. | Semiconductor package having stacked semiconductor chips and method of making the same |
US6514795B1 (en) * | 2001-10-10 | 2003-02-04 | Micron Technology, Inc. | Packaged stacked semiconductor die and method of preparing same |
US6620651B2 (en) | 2001-10-23 | 2003-09-16 | National Starch And Chemical Investment Holding Corporation | Adhesive wafers for die attach application |
KR100412272B1 (en) * | 2001-11-21 | 2003-12-31 | 미래산업 주식회사 | A Coplanarity Inspection System and a Method Thereof of Package |
US20030127719A1 (en) | 2002-01-07 | 2003-07-10 | Picta Technology, Inc. | Structure and process for packaging multi-chip |
US6885093B2 (en) * | 2002-02-28 | 2005-04-26 | Freescale Semiconductor, Inc. | Stacked die semiconductor device |
US20030178715A1 (en) | 2002-03-20 | 2003-09-25 | Bae Systems | Method for stacking chips within a multichip module package |
KR20030075860A (en) | 2002-03-21 | 2003-09-26 | 삼성전자주식회사 | Structure for stacking semiconductor chip and stacking method |
JP3679786B2 (en) * | 2002-06-25 | 2005-08-03 | 松下電器産業株式会社 | Manufacturing method of semiconductor device |
JP3912223B2 (en) | 2002-08-09 | 2007-05-09 | 富士通株式会社 | Semiconductor device and manufacturing method thereof |
KR100472286B1 (en) * | 2002-09-13 | 2005-03-10 | 삼성전자주식회사 | Semiconductor chip package that adhesive tape is attached on the bonding wire |
US6838761B2 (en) * | 2002-09-17 | 2005-01-04 | Chippac, Inc. | Semiconductor multi-package module having wire bond interconnect between stacked packages and having electrical shield |
JP3702961B2 (en) | 2002-10-04 | 2005-10-05 | 東洋通信機株式会社 | Manufacturing method of surface mount type SAW device |
US7061088B2 (en) * | 2002-10-08 | 2006-06-13 | Chippac, Inc. | Semiconductor stacked multi-package module having inverted second package |
KR100508682B1 (en) * | 2002-11-20 | 2005-08-17 | 삼성전자주식회사 | Stack chip package of heat emission type using dummy wire |
JP4519398B2 (en) * | 2002-11-26 | 2010-08-04 | Towa株式会社 | Resin sealing method and semiconductor device manufacturing method |
US6713857B1 (en) * | 2002-12-05 | 2004-03-30 | Ultra Tera Corporation | Low profile stacked multi-chip semiconductor package with chip carrier having opening and fabrication method of the semiconductor package |
JP2004193363A (en) | 2002-12-11 | 2004-07-08 | Fujitsu Ltd | Semiconductor device and manufacturing method thereof |
US6833287B1 (en) | 2003-06-16 | 2004-12-21 | St Assembly Test Services Inc. | System for semiconductor package with stacked dies |
KR100594229B1 (en) * | 2003-09-19 | 2006-07-03 | 삼성전자주식회사 | Semiconductor package and manufacturing method |
JP4381779B2 (en) * | 2003-11-17 | 2009-12-09 | 株式会社ルネサステクノロジ | Multi-chip module |
WO2005059967A2 (en) * | 2003-12-17 | 2005-06-30 | Chippac, Inc. | Multiple chip package module having inverted package stacked over die |
US6937477B2 (en) | 2004-01-21 | 2005-08-30 | Global Advanced Packaging Technology H.K. Limited | Structure of gold fingers |
JP4406300B2 (en) | 2004-02-13 | 2010-01-27 | 株式会社東芝 | Semiconductor device and manufacturing method thereof |
JP4434778B2 (en) * | 2004-02-25 | 2010-03-17 | Necエレクトロニクス株式会社 | Semiconductor device |
US7205651B2 (en) * | 2004-04-16 | 2007-04-17 | St Assembly Test Services Ltd. | Thermally enhanced stacked die package and fabrication method |
US7215031B2 (en) * | 2004-11-10 | 2007-05-08 | Oki Electric Industry Co., Ltd. | Multi chip package |
US7675180B1 (en) * | 2006-02-17 | 2010-03-09 | Amkor Technology, Inc. | Stacked electronic component package having film-on-wire spacer |
US7633144B1 (en) | 2006-05-24 | 2009-12-15 | Amkor Technology, Inc. | Semiconductor package |
-
2001
- 2001-03-09 KR KR10-2001-0012326A patent/KR100401020B1/en active IP Right Grant
- 2001-12-12 US US10/015,374 patent/US20020125556A1/en not_active Abandoned
-
2005
- 2005-11-22 US US11/286,970 patent/US7485490B2/en not_active Expired - Fee Related
-
2008
- 2008-12-23 US US12/317,649 patent/US7863723B2/en not_active Expired - Fee Related
-
2010
- 2010-11-16 US US12/927,533 patent/US8143727B2/en not_active Expired - Fee Related
Patent Citations (70)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4763188A (en) * | 1986-08-08 | 1988-08-09 | Thomas Johnson | Packaging system for multiple semiconductor devices |
US5025306A (en) * | 1988-08-09 | 1991-06-18 | Texas Instruments Incorporated | Assembly of semiconductor chips |
US5012323A (en) * | 1989-11-20 | 1991-04-30 | Micron Technology, Inc. | Double-die semiconductor package having a back-bonded die and a face-bonded die interconnected on a single leadframe |
US5463253A (en) * | 1990-03-15 | 1995-10-31 | Fujitsu Limited | Semiconductor device having a plurality of chips |
US5347429A (en) * | 1990-11-14 | 1994-09-13 | Hitachi, Ltd. | Plastic-molded-type semiconductor device |
US5715147A (en) * | 1990-12-20 | 1998-02-03 | Kabushiki Kaisha Toshiba | Semiconductor device having an interconnecting circuit board |
US5495398A (en) * | 1992-05-22 | 1996-02-27 | National Semiconductor Corporation | Stacked multi-chip modules and method of manufacturing |
US5422435A (en) * | 1992-05-22 | 1995-06-06 | National Semiconductor Corporation | Stacked multi-chip modules and method of manufacturing |
US5502289A (en) * | 1992-05-22 | 1996-03-26 | National Semiconductor Corporation | Stacked multi-chip modules and method of manufacturing |
US5291061A (en) * | 1993-04-06 | 1994-03-01 | Micron Semiconductor, Inc. | Multi-chip stacked devices |
USRE36613E (en) * | 1993-04-06 | 2000-03-14 | Micron Technology, Inc. | Multi-chip stacked devices |
US5323060A (en) * | 1993-06-02 | 1994-06-21 | Micron Semiconductor, Inc. | Multichip module having a stacked chip arrangement |
US6005778A (en) * | 1995-06-15 | 1999-12-21 | Honeywell Inc. | Chip stacking and capacitor mounting arrangement including spacers |
US6051886A (en) * | 1995-08-16 | 2000-04-18 | Micron Technology, Inc. | Angularly offset stacked die multichip device and method of manufacture |
US5721452A (en) * | 1995-08-16 | 1998-02-24 | Micron Technology, Inc. | Angularly offset stacked die multichip device and method of manufacture |
US5886412A (en) * | 1995-08-16 | 1999-03-23 | Micron Technology, Inc. | Angularly offset and recessed stacked die multichip device |
US5739581A (en) * | 1995-11-17 | 1998-04-14 | National Semiconductor Corporation | High density integrated circuit package assembly with a heatsink between stacked dies |
US6013948A (en) * | 1995-11-27 | 2000-01-11 | Micron Technology, Inc. | Stackable chip scale semiconductor package with mating contacts on opposed surfaces |
US5689135A (en) * | 1995-12-19 | 1997-11-18 | Micron Technology, Inc. | Multi-chip device and method of fabrication employing leads over and under processes |
US5952725A (en) * | 1996-02-20 | 1999-09-14 | Micron Technology, Inc. | Stacked semiconductor devices |
US6140149A (en) * | 1996-02-20 | 2000-10-31 | Micron Technology, Inc. | Device and method for stacking wire-bonded integrated circuit dice on flip-chip bonded integrated circuit dice |
US6080264A (en) * | 1996-05-20 | 2000-06-27 | Micron Technology, Inc. | Combination of semiconductor interconnect |
US6214641B1 (en) * | 1996-06-25 | 2001-04-10 | Micron Technology, Inc. | Method of fabricating a multi-chip module |
US5696031A (en) * | 1996-11-20 | 1997-12-09 | Micron Technology, Inc. | Device and method for stacking wire-bonded integrated circuit dice on flip-chip bonded integrated circuit dice |
US5973403A (en) * | 1996-11-20 | 1999-10-26 | Micron Technology, Inc. | Device and method for stacking wire-bonded integrated circuit dice on flip-chip bonded integrated circuit dice |
US6072243A (en) * | 1996-11-26 | 2000-06-06 | Sharp Kabushiki Kaisha | Semiconductor integrated circuit device capable of surely electrically insulating two semiconductor chips from each other and fabricating method thereof |
US5866949A (en) * | 1996-12-02 | 1999-02-02 | Minnesota Mining And Manufacturing Company | Chip scale ball grid array for integrated circuit packaging |
US6133637A (en) * | 1997-01-24 | 2000-10-17 | Rohm Co., Ltd. | Semiconductor device having a plurality of semiconductor chips |
US6057598A (en) * | 1997-01-31 | 2000-05-02 | Vlsi Technology, Inc. | Face on face flip chip integration |
US5815372A (en) * | 1997-03-25 | 1998-09-29 | Intel Corporation | Packaging multiple dies on a ball grid array substrate |
US6157080A (en) * | 1997-11-06 | 2000-12-05 | Sharp Kabushiki Kaisha | Semiconductor device using a chip scale package |
US6326696B1 (en) * | 1998-02-04 | 2001-12-04 | International Business Machines Corporation | Electronic package with interconnected chips |
US20020030263A1 (en) * | 1999-02-08 | 2002-03-14 | Salman Akram | Multiple die stack apparatus employing T-shaped interposer elements |
US20020030262A1 (en) * | 1999-02-08 | 2002-03-14 | Salman Akram | Multiple die stack apparatus employing T-shaped interposer elements |
US6215193B1 (en) * | 1999-04-21 | 2001-04-10 | Advanced Semiconductor Engineering, Inc. | Multichip modules and manufacturing method therefor |
US6118176A (en) * | 1999-04-26 | 2000-09-12 | Advanced Semiconductor Engineering, Inc. | Stacked chip assembly utilizing a lead frame |
US6163076A (en) * | 1999-06-04 | 2000-12-19 | Advanced Semiconductor Engineering, Inc. | Stacked structure of semiconductor package |
US6316838B1 (en) * | 1999-10-29 | 2001-11-13 | Fujitsu Limited | Semiconductor device |
US6387728B1 (en) * | 1999-11-09 | 2002-05-14 | Advanced Semiconductor Engineering, Inc. | Method for fabricating a stacked chip package |
US20030199118A1 (en) * | 1999-12-20 | 2003-10-23 | Amkor Technology, Inc. | Wire bonding method for a semiconductor package |
US20020064905A1 (en) * | 1999-12-20 | 2002-05-30 | Park Young Kuk | Wire bonding method and semiconductor package manufactured using the same |
US6252305B1 (en) * | 2000-02-29 | 2001-06-26 | Advanced Semiconductor Engineering, Inc. | Multichip module having a stacked chip arrangement |
US6461897B2 (en) * | 2000-02-29 | 2002-10-08 | Advanced Semiconductor Engineering, Inc. | Multichip module having a stacked chip arrangement |
US20010023994A1 (en) * | 2000-03-07 | 2001-09-27 | Takahiro Oka | Semiconductor device and the method for manufacturing the same |
US20030001252A1 (en) * | 2000-03-25 | 2003-01-02 | Ku Jae Hun | Semiconductor package including stacked chips |
US6531784B1 (en) * | 2000-06-02 | 2003-03-11 | Amkor Technology, Inc. | Semiconductor package with spacer strips |
US6476475B1 (en) * | 2000-06-29 | 2002-11-05 | Advanced Micro Devices, Inc. | Stacked SRAM die package |
US6258626B1 (en) * | 2000-07-06 | 2001-07-10 | Advanced Semiconductor Engineering, Inc. | Method of making stacked chip package |
US6333562B1 (en) * | 2000-07-13 | 2001-12-25 | Advanced Semiconductor Engineering, Inc. | Multichip module having stacked chip arrangement |
US20020014689A1 (en) * | 2000-07-17 | 2002-02-07 | Lo Randy H.Y. | Multiple stacked-chip packaging structure |
US20020195624A1 (en) * | 2000-07-20 | 2002-12-26 | Glenn Thomas P. | Method of making a semiconductor package including stacked semiconductor dies |
US6359340B1 (en) * | 2000-07-28 | 2002-03-19 | Advanced Semiconductor Engineering, Inc. | Multichip module having a stacked chip arrangement |
US6365966B1 (en) * | 2000-08-07 | 2002-04-02 | Advanced Semiconductor Engineering, Inc. | Stacked chip scale package |
US6552416B1 (en) * | 2000-09-08 | 2003-04-22 | Amkor Technology, Inc. | Multiple die lead frame package with enhanced die-to-die interconnect routing using internal lead trace wiring |
US6340846B1 (en) * | 2000-12-06 | 2002-01-22 | Amkor Technology, Inc. | Making semiconductor packages with stacked dies and reinforced wire bonds |
US6503776B2 (en) * | 2001-01-05 | 2003-01-07 | Advanced Semiconductor Engineering, Inc. | Method for fabricating stacked chip package |
US20020096755A1 (en) * | 2001-01-24 | 2002-07-25 | Yasuki Fukui | Semiconductor device |
US6388313B1 (en) * | 2001-01-30 | 2002-05-14 | Siliconware Precision Industries Co., Ltd. | Multi-chip module |
US6437449B1 (en) * | 2001-04-06 | 2002-08-20 | Amkor Technology, Inc. | Making semiconductor devices having stacked dies with biased back surfaces |
US6603072B1 (en) * | 2001-04-06 | 2003-08-05 | Amkor Technology, Inc. | Making leadframe semiconductor packages with stacked dies and interconnecting interposer |
US20020171136A1 (en) * | 2001-05-15 | 2002-11-21 | Fujitsu Limited | Semiconductor device with stack of semiconductor chips |
US20030137042A1 (en) * | 2001-06-21 | 2003-07-24 | Mess Leonard E. | Stacked mass storage flash memory package |
US20030038356A1 (en) * | 2001-08-24 | 2003-02-27 | Derderian James M | Semiconductor devices including stacking spacers thereon, assemblies including the semiconductor devices, and methods |
US20030038355A1 (en) * | 2001-08-24 | 2003-02-27 | Derderian James M. | Semiconductor devices and semiconductor device assemblies including a nonconfluent spacer layer |
US20040200885A1 (en) * | 2001-08-24 | 2004-10-14 | Derderian James M | Methods for assembling semiconductor devices in stacked arrangements by positioning spacers therebetween |
US20040169285A1 (en) * | 2002-02-19 | 2004-09-02 | Vani Verma | Memory module having interconnected and stacked integrated circuits |
US20030189259A1 (en) * | 2002-04-05 | 2003-10-09 | Nec Electronics Corporation | Semiconductor device and method for manufacturing the same |
US20040041249A1 (en) * | 2002-09-03 | 2004-03-04 | United Test Center Inc. | Stacked chip package with enhanced thermal conductivity |
US20040126926A1 (en) * | 2002-12-27 | 2004-07-01 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and method for fabricating the same |
US20040241907A1 (en) * | 2003-05-30 | 2004-12-02 | Tomoko Higashino | Method of manufacturing a semiconductor device |
Cited By (103)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8143727B2 (en) | 2001-03-09 | 2012-03-27 | Amkor Technology, Inc. | Adhesive on wire stacked semiconductor package |
US7863723B2 (en) | 2001-03-09 | 2011-01-04 | Amkor Technology, Inc. | Adhesive on wire stacked semiconductor package |
US6977439B2 (en) * | 2002-03-21 | 2005-12-20 | Samsung Electronics Co., Ltd. | Semiconductor chip stack structure |
US20030178710A1 (en) * | 2002-03-21 | 2003-09-25 | Samsung Electronics Co., Ltd. | Semiconductor chip stack structure and method for forming the same |
US20060049528A1 (en) * | 2002-03-21 | 2006-03-09 | Samsung Electronics Co., Ltd. | Semiconductor chip stack structure and method for forming the same |
US20050121773A1 (en) * | 2002-07-12 | 2005-06-09 | Oki Electric Industry Co. Ltd. | Method of manufacturing semiconductor device |
US7247949B2 (en) | 2002-07-12 | 2007-07-24 | Oki Electric Industry Co., Ltd. | Semiconductor device with stacked chips |
US6852570B2 (en) * | 2002-07-12 | 2005-02-08 | Oki Electric Industry Co., Ltd. | Method of manufacturing a stacked semiconductor device |
US20040009647A1 (en) * | 2002-07-12 | 2004-01-15 | Hidenori Hasegawa | Method of manufacturing semiconductor device |
US20040224481A1 (en) * | 2003-02-24 | 2004-11-11 | Seiko Epson Corporation | Semiconductor devices, manufacturing methods therefor, circuit substrates and electronic devices |
US20040201088A1 (en) * | 2003-04-08 | 2004-10-14 | Samsung Electronics Co., Ltd. | Semiconductor multi-chip package and fabrication method |
US20080026506A1 (en) * | 2003-04-08 | 2008-01-31 | Samsung Electronics Co., Ltd. | Semiconductor multi-chip package and fabrication method |
US7298032B2 (en) * | 2003-04-08 | 2007-11-20 | Samsung Electronics Co., Ltd. | Semiconductor multi-chip package and fabrication method |
US20040227226A1 (en) * | 2003-05-16 | 2004-11-18 | Via Technologies, Inc. | Structure of multi-tier wire bonding for high frequency integrated circuits and method of layout for the same |
US20060125093A1 (en) * | 2003-07-31 | 2006-06-15 | Samsung Electronics Co., Ltd. | Multi-chip module having bonding wires and method of fabricating the same |
US20230008716A1 (en) * | 2003-08-29 | 2023-01-12 | Micron Technology, Inc. | Stacked microfeature devices and associated methods |
US11887970B2 (en) * | 2003-08-29 | 2024-01-30 | Micron Technology, Inc. | Stacked microfeature devices and associated methods |
US7485955B2 (en) | 2004-03-22 | 2009-02-03 | Samsung Electronics Co., Ltd. | Semiconductor package having step type die and method for manufacturing the same |
EP1617474A1 (en) * | 2004-07-14 | 2006-01-18 | Swissbit Germany GmbH | Memory module and manufacturing method thereof |
US20060038273A1 (en) * | 2004-08-17 | 2006-02-23 | Jicun Lu | Electronic packages with dice landed on wire bonds |
US7166924B2 (en) * | 2004-08-17 | 2007-01-23 | Intel Corporation | Electronic packages with dice landed on wire bonds |
US20060071317A1 (en) * | 2004-10-04 | 2006-04-06 | In-Ku Kang | Multi-chip package and method for manufacturing the same |
US7368811B2 (en) * | 2004-10-04 | 2008-05-06 | Samsung Electronics Co., Ltd | Multi-chip package and method for manufacturing the same |
US20060186525A1 (en) * | 2005-02-02 | 2006-08-24 | Horst Theuss | Electronic component with stacked semiconductor chips and method for producing the same |
CN100447997C (en) * | 2005-09-28 | 2008-12-31 | 王忠诚 | an electronic device |
US20070085184A1 (en) * | 2005-10-13 | 2007-04-19 | Stats Chippac Ltd. | Stacked die packaging system |
US8072083B1 (en) | 2006-02-17 | 2011-12-06 | Amkor Technology, Inc. | Stacked electronic component package having film-on-wire spacer |
US7675180B1 (en) | 2006-02-17 | 2010-03-09 | Amkor Technology, Inc. | Stacked electronic component package having film-on-wire spacer |
US20080237824A1 (en) * | 2006-02-17 | 2008-10-02 | Amkor Technology, Inc. | Stacked electronic component package having single-sided film spacer |
US7443037B2 (en) * | 2006-04-01 | 2008-10-28 | Stats Chippac Ltd. | Stacked integrated circuit package system with connection protection |
US20070229107A1 (en) * | 2006-04-01 | 2007-10-04 | Stats Chippac Ltd. | Stacked integrated circuit package system with connection protection |
US7633144B1 (en) | 2006-05-24 | 2009-12-15 | Amkor Technology, Inc. | Semiconductor package |
US8129849B1 (en) | 2006-05-24 | 2012-03-06 | Amkor Technology, Inc. | Method of making semiconductor package with adhering portion |
US20080128880A1 (en) * | 2006-12-01 | 2008-06-05 | Hem Takiar | Die stacking using insulated wire bonds |
US20080131998A1 (en) * | 2006-12-01 | 2008-06-05 | Hem Takiar | Method of fabricating a film-on-wire bond semiconductor device |
US20080131999A1 (en) * | 2006-12-01 | 2008-06-05 | Hem Takiar | Method of die stacking using insulated wire bonds |
US20080128879A1 (en) * | 2006-12-01 | 2008-06-05 | Hem Takiar | Film-on-wire bond semiconductor device |
US7923823B2 (en) | 2007-01-23 | 2011-04-12 | Infineon Technologies Ag | Semiconductor device with parylene coating |
US8110906B2 (en) * | 2007-01-23 | 2012-02-07 | Infineon Technologies Ag | Semiconductor device including isolation layer |
US20080173992A1 (en) * | 2007-01-23 | 2008-07-24 | Infineon Technologies Ag | Semiconductor device including isolation layer |
US20080173988A1 (en) * | 2007-01-23 | 2008-07-24 | Infineon Technologies Ag | Gas phase precipitated polymers as highly insulating chip backside layer |
US8039970B2 (en) * | 2007-01-31 | 2011-10-18 | Kabushiki Kaisha Toshiba | Stacked semiconductor device and method of manufacturing the same |
US20080179757A1 (en) * | 2007-01-31 | 2008-07-31 | Kabushiki Kaisha Toshiba | Stacked semiconductor device and method of manufacturing the same |
CN101809737A (en) * | 2007-08-16 | 2010-08-18 | 美光科技公司 | stacked microelectronic devices and methods for manufaturing staked microelectronic devices |
US9147623B2 (en) | 2007-08-16 | 2015-09-29 | Micron Technology, Inc. | Stacked microelectronic devices and methods for manufacturing stacked microelectronic devices |
US20120108010A1 (en) * | 2007-08-16 | 2012-05-03 | Micron Technology, Inc. | Stacked microelectronic devices and methods for manufacturing stacked microelectronic devices |
US8501546B2 (en) * | 2007-08-16 | 2013-08-06 | Micron Technology, Inc. | Stacked microelectronic devices and methods for manufacturing stacked microelectronic devices |
US8803307B2 (en) | 2007-08-16 | 2014-08-12 | Micron Technology, Inc. | Stacked microelectronic devices and methods for manufacturing stacked microelectronic devices |
US20110304044A1 (en) * | 2010-06-15 | 2011-12-15 | Ming-Hong Lin | Stacked chip package structure and its fabrication method |
US10128216B2 (en) | 2010-07-19 | 2018-11-13 | Tessera, Inc. | Stackable molded microelectronic packages |
US9177944B2 (en) * | 2010-12-03 | 2015-11-03 | Xilinx, Inc. | Semiconductor device with stacked power converter |
US20120224332A1 (en) * | 2011-03-02 | 2012-09-06 | Yun Jaeun | Integrated circuit packaging system with bump bonded dies and method of manufacture thereof |
US10062661B2 (en) | 2011-05-03 | 2018-08-28 | Tessera, Inc. | Package-on-package assembly with wire bonds to encapsulation surface |
US10593643B2 (en) | 2011-05-03 | 2020-03-17 | Tessera, Inc. | Package-on-package assembly with wire bonds to encapsulation surface |
US11424211B2 (en) | 2011-05-03 | 2022-08-23 | Tessera Llc | Package-on-package assembly with wire bonds to encapsulation surface |
US9024452B2 (en) * | 2011-07-13 | 2015-05-05 | Sts Semiconductor & Telecommunications Co., Ltd. | Semiconductor package comprising an interposer and method of manufacturing the same |
US20130015571A1 (en) * | 2011-07-13 | 2013-01-17 | Chun Jung Hwan | Semiconductor Package And Method Of Manufacturing The Same |
US8664775B2 (en) * | 2011-08-03 | 2014-03-04 | Fujitsu Semiconductor Limited | Semiconductor device |
JP2013038106A (en) * | 2011-08-03 | 2013-02-21 | Fujitsu Semiconductor Ltd | Semiconductor device and manufacturing method of semiconductor device |
US20130032942A1 (en) * | 2011-08-03 | 2013-02-07 | Fujitsu Semiconductor Limited | Semiconductor device and manufacturing method therefor |
US8980692B2 (en) | 2011-08-03 | 2015-03-17 | Fujitsu Semiconductor Limited | Semiconductor device manufacturing method |
US11189595B2 (en) | 2011-10-17 | 2021-11-30 | Invensas Corporation | Package-on-package assembly with wire bond vias |
US10756049B2 (en) | 2011-10-17 | 2020-08-25 | Invensas Corporation | Package-on-package assembly with wire bond vias |
US11735563B2 (en) | 2011-10-17 | 2023-08-22 | Invensas Llc | Package-on-package assembly with wire bond vias |
US9842745B2 (en) | 2012-02-17 | 2017-12-12 | Invensas Corporation | Heat spreading substrate with embedded interconnects |
US9953914B2 (en) | 2012-05-22 | 2018-04-24 | Invensas Corporation | Substrate-less stackable package with wire-bond interconnect |
US10510659B2 (en) | 2012-05-22 | 2019-12-17 | Invensas Corporation | Substrate-less stackable package with wire-bond interconnect |
US10170412B2 (en) | 2012-05-22 | 2019-01-01 | Invensas Corporation | Substrate-less stackable package with wire-bond interconnect |
US10297582B2 (en) | 2012-08-03 | 2019-05-21 | Invensas Corporation | BVA interposer |
US20140239984A1 (en) * | 2013-02-25 | 2014-08-28 | Motorola Mobility Llc | Capacitive Sensor |
US9423418B2 (en) * | 2013-02-25 | 2016-08-23 | Google Technology Holdings LLC | Capacitive sensor |
US10460958B2 (en) | 2013-08-07 | 2019-10-29 | Invensas Corporation | Method of manufacturing embedded packaging with preformed vias |
US10008477B2 (en) | 2013-09-16 | 2018-06-26 | Invensas Corporation | Microelectronic element with bond elements to encapsulation surface |
US10629567B2 (en) | 2013-11-22 | 2020-04-21 | Invensas Corporation | Multiple plated via arrays of different wire heights on same substrate |
USRE49987E1 (en) | 2013-11-22 | 2024-05-28 | Invensas Llc | Multiple plated via arrays of different wire heights on a same substrate |
US10290613B2 (en) | 2013-11-22 | 2019-05-14 | Invensas Corporation | Multiple bond via arrays of different wire heights on a same substrate |
US10026717B2 (en) | 2013-11-22 | 2018-07-17 | Invensas Corporation | Multiple bond via arrays of different wire heights on a same substrate |
US9852969B2 (en) | 2013-11-22 | 2017-12-26 | Invensas Corporation | Die stacks with one or more bond via arrays of wire bond wires and with one or more arrays of bump interconnects |
US10529636B2 (en) | 2014-01-17 | 2020-01-07 | Invensas Corporation | Fine pitch BVA using reconstituted wafer with area array accessible for testing |
US11990382B2 (en) | 2014-01-17 | 2024-05-21 | Adeia Semiconductor Technologies Llc | Fine pitch BVA using reconstituted wafer with area array accessible for testing |
US11404338B2 (en) | 2014-01-17 | 2022-08-02 | Invensas Corporation | Fine pitch bva using reconstituted wafer with area array accessible for testing |
US10381326B2 (en) | 2014-05-28 | 2019-08-13 | Invensas Corporation | Structure and method for integrated circuits packaging with increased density |
US9735084B2 (en) | 2014-12-11 | 2017-08-15 | Invensas Corporation | Bond via array for thermal conductivity |
US9888579B2 (en) | 2015-03-05 | 2018-02-06 | Invensas Corporation | Pressing of wire bond wire tips to provide bent-over tips |
US10806036B2 (en) | 2015-03-05 | 2020-10-13 | Invensas Corporation | Pressing of wire bond wire tips to provide bent-over tips |
US10008469B2 (en) | 2015-04-30 | 2018-06-26 | Invensas Corporation | Wafer-level packaging using wire bond wires in place of a redistribution layer |
US9761554B2 (en) * | 2015-05-07 | 2017-09-12 | Invensas Corporation | Ball bonding metal wire bond wires to metal pads |
US20160329294A1 (en) * | 2015-05-07 | 2016-11-10 | Invensas Corporation | Ball bonding metal wire bond wires to metal pads |
US10559537B2 (en) | 2015-10-12 | 2020-02-11 | Invensas Corporation | Wire bond wires for interference shielding |
US9812402B2 (en) | 2015-10-12 | 2017-11-07 | Invensas Corporation | Wire bond wires for interference shielding |
US11462483B2 (en) | 2015-10-12 | 2022-10-04 | Invensas Llc | Wire bond wires for interference shielding |
US10490528B2 (en) | 2015-10-12 | 2019-11-26 | Invensas Corporation | Embedded wire bond wires |
US10115678B2 (en) | 2015-10-12 | 2018-10-30 | Invensas Corporation | Wire bond wires for interference shielding |
US10332854B2 (en) | 2015-10-23 | 2019-06-25 | Invensas Corporation | Anchoring structure of fine pitch bva |
US10181457B2 (en) | 2015-10-26 | 2019-01-15 | Invensas Corporation | Microelectronic package for wafer-level chip scale packaging with fan-out |
US9911718B2 (en) | 2015-11-17 | 2018-03-06 | Invensas Corporation | ‘RDL-First’ packaged microelectronic device for a package-on-package device |
US10043779B2 (en) | 2015-11-17 | 2018-08-07 | Invensas Corporation | Packaged microelectronic device for a package-on-package device |
US10325877B2 (en) | 2015-12-30 | 2019-06-18 | Invensas Corporation | Embedded wire bond wires for vertical integration with separate surface mount and wire bond mounting surfaces |
US9984992B2 (en) | 2015-12-30 | 2018-05-29 | Invensas Corporation | Embedded wire bond wires for vertical integration with separate surface mount and wire bond mounting surfaces |
US9935075B2 (en) | 2016-07-29 | 2018-04-03 | Invensas Corporation | Wire bonding method and apparatus for electromagnetic interference shielding |
US10658302B2 (en) | 2016-07-29 | 2020-05-19 | Invensas Corporation | Wire bonding method and apparatus for electromagnetic interference shielding |
US10299368B2 (en) | 2016-12-21 | 2019-05-21 | Invensas Corporation | Surface integrated waveguides and circuit structures therefor |
US20240105703A1 (en) * | 2022-09-26 | 2024-03-28 | Samsung Electronics Co., Ltd. | Fingerprint sensor package and smart card having the same |
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US7485490B2 (en) | 2009-02-03 |
US7863723B2 (en) | 2011-01-04 |
US20090134507A1 (en) | 2009-05-28 |
US20110089564A1 (en) | 2011-04-21 |
KR100401020B1 (en) | 2003-10-08 |
US8143727B2 (en) | 2012-03-27 |
US20060071315A1 (en) | 2006-04-06 |
KR20020072145A (en) | 2002-09-14 |
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