US20020101766A1 - Method and apparatus for gating a global column select line with address transition detection - Google Patents
Method and apparatus for gating a global column select line with address transition detection Download PDFInfo
- Publication number
- US20020101766A1 US20020101766A1 US09/773,140 US77314001A US2002101766A1 US 20020101766 A1 US20020101766 A1 US 20020101766A1 US 77314001 A US77314001 A US 77314001A US 2002101766 A1 US2002101766 A1 US 2002101766A1
- Authority
- US
- United States
- Prior art keywords
- transistor
- signal
- address transition
- drain bias
- transition detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007704 transition Effects 0.000 title claims abstract description 24
- 238000001514 detection method Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 15
- 230000004044 response Effects 0.000 claims description 5
- 230000003111 delayed effect Effects 0.000 claims description 2
- 230000008878 coupling Effects 0.000 claims 4
- 238000010168 coupling process Methods 0.000 claims 4
- 238000005859 coupling reaction Methods 0.000 claims 4
- 238000010586 diagram Methods 0.000 description 12
- 230000006870 function Effects 0.000 description 4
- 238000003491 array Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000543 intermediate Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000024977 response to activity Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/24—Bit-line control circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C7/00—Arrangements for writing information into, or reading information out from, a digital store
- G11C7/10—Input/output [I/O] data interface arrangements, e.g. I/O data control circuits, I/O data buffers
- G11C7/1048—Data bus control circuits, e.g. precharging, presetting, equalising
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/26—Sensing or reading circuits; Data output circuits
- G11C16/28—Sensing or reading circuits; Data output circuits using differential sensing or reference cells, e.g. dummy cells
Definitions
- the present invention relates generally to memory read circuits, and more specifically to sensing cell elements in a flash memory device.
- Semiconductor memory devices utilize large numbers of small storage elements, called “cells”, that are organized in regular arrays. Reading data stored in these storage elements is the function of decoding circuits and sense amplifiers.
- the row decoding circuits are labeled “X decoders” and the column decoding circuits are labeled “Y decoders.”
- X decoders When an address is supplied to the semiconductor memory device, the X decoders and Y decoders select the appropriate cell or cells which correspond to that particular address.
- FIG. 1 a schematic diagram of the read sensing circuits in a memory device is shown.
- the FIG. 1 circuit shows an exemplary memory cell, flash cell 118 , in an “flash” electronically programmable read-only memory (EPROM).
- EPROM electronically programmable read-only memory
- a current i C flows in the drain of flash cell 188 .
- the current i C will differ depending upon there being a logical “1” or “0” stored in flash cell 118 .
- a drain bias circuit 110 is employed. Flash cell 118 is selected when X decoders present X enable signal on X enable terminal 144 , and when the Y decoders present global Y (GY) enable signal on GY enable terminal 142 .
- GY transistor 114 When GY transistor 114 is turned on by GY enable signal, current can then flow from the drain bias circuit 110 first through sensing node (SEN node) 112 and thence through flash cell 118 .
- sensing node sensing node
- flash cell 118 In the FIG. 1 example, for the sake of clarity only one flash cell 118 is shown per column. Other similar devices (not shown) will be attached to the source of GY transistor 114 at global bit line (GBL) 116 .
- Drain bias circuitry 110 includes a controlled resistance that converts the current i C into a voltage capable of being sensed by sense amplifier 130 . This voltage is supplied over sense input/read input (SIN/RIN) signal line 140 to one input 132 of sense amplifier 130 .
- Drain bias circuits 110 , 120 and sense amplifier 130 consume a large portion of the supply current of the memory device. Therefore many designs turn off sense amplifier 130 when not actually reading data. Similarly, drain bias circuits 110 , 120 may be disabled by placing cut-off transistors into the supply current path, preventing drain bias circuits 110 , 120 from consuming current when not actually reading data. However, placing such cut-off transistors within drain bias circuits may require making the cut-off transistors relatively large. Other shortcomings of such placement may include complexities of driving SEN node 112 .
- FIG. 1 is a schematic diagram of the read sensing circuits in a memory device.
- FIG. 2 is a diagram of the general physical layout of a memory device, including sense amps.
- FIG. 3 is a detailed schematic diagram of a drain bias circuit.
- FIG. 4 is a detailed schematic diagram of a drain bias circuit, according to one embodiment of the present invention.
- FIGS. 5A, 5B, 5 C and 5 D are timing diagrams of the ATD signal, according to several embodiments of the present invention.
- FIG. 6 is a diagram of the general physical layout of a memory device, including sense amps, according to one embodiment of the present invention.
- GY global Y
- ATD address transition detection
- GY enable is gated by the trailing edge of a address transition detection (ATD) pulse.
- the ATD pulse ensures that the GY enable signal is inactive during periods when the memory device is not attempting to read a memory cell.
- the same ATD pulse may ground the global bit line (GBL) using a column pull-off.
- the sense (SEN) node between the GY transistor and drain bias circuit may be charged up and GBL may be grounded. During this time, the path from Vcc to Vss is cut off by the GY transistor itself, thereby eliminating the need of separate cut-off transistors within the drain bias circuit.
- the SEN node When the drain bias current flows through the GY transistor, the SEN node is pulled down by charge sharing with the GBL. Now the SEN node capacitance is small compared with that of GBL, and therefore the speed of bit line charging is similar to prior art schemes.
- the GY enable signal By adjusting the timing of ATD, the GY enable signal is forced to be the last signal in the set of decode signals to be turned on. In this manner both the GBL of the actual array and also the bit lines of the reference circuit may be turned ON at the same time. This matching in the decode timing of main and reference side improves sensing speed. Gating GY with trailing edge of ATD increases tolerance of changes in address decode timing (intermediates).
- the GY enable signal is gated by the trailing edge of the adjusted ATD pulse.
- This trailing edge is delayed when there are multiple address transitions in rapid sequence, thereby delaying GY enable. This prevents current flowing from the drain bias circuit during spurious address states, promoting the increased tolerance of changes in address decode timing.
- the trailing edge of the adjusted ATD pulse may be timed to include the address decode delay time from the incoming address to the subsequent GY enable signal. This permits minimal time delay in sensing after the incoming address is stable.
- FIG. 2 a diagram of the general physical layout of a memory device is shown, including sense amps.
- the FIG. 2 example is simplified for the sake of clarity, and shows only one drain bias and sense amplifier 230 with corresponding SEN node 232 .
- the row and column implemented flash cell arrays 210 , 220 may be in close proximity to the respective sets of GY transistors, shown as Y devices 212 , 222 .
- the sets of GBL, shown by exemplary GBLs 214 , 224 are shown as having relatively short lengths and therefore small capacitance values.
- the exemplary drain bias and sense amplifier circuit 230 is relatively far away from the corresponding Y devices 212 , the exemplary SEN node 232 has a relatively long length and therefore larger capacitance value.
- FIG. 3 a detailed schematic diagram of a drain bias circuit is shown.
- the circuit shown in FIG. 3 corresponds generally to the memory device of FIG. 2 and may be considered a portion of the read sensing circuits shown in FIG. 1.
- Cutoff transistors 312 , 314 , 316 , kicker transistor 320 , column load bias transistor 322 , current mirror transistor 324 , and cascode transistor 330 are the active elements of a drain bias circuit 110 of FIG. 1.
- Column load bias transistor 322 and current mirror transistor 324 form the primary current source for sensing the state of flash cell 118 .
- the gate of column load bias transistor 322 receives a column load biasing signal on column load biasing terminal 328 .
- the gate of current mirror transistor 324 receives a current mirror biasing signal on current mirror biasing terminal 338 .
- column load bias transistor 322 act as a resistor for supplying a sensing current for flash cell 118 .
- the current mirror transistor 324 may additionally provide a common-mode current for flash cell 118 and for reference cell 128 .
- An additional kicker transistor 320 allows additional current to flow into the sense input/reference input (SIN/RIN) node 140 and SEN node 112 when the gate of kicker transistor 320 is supplied with a kicker enable signal on kicker enable terminal 326 .
- the kicker transistor 320 permits more rapid initial charging of the SIN/RIN node 140 and SEN node 112 than would be possible using only column load bias transistor 322 and current mirror transistor 324 .
- Cutoff transistors 312 , 314 , 316 provide the ability to lower the current demand of the drain bias circuit.
- the cutoff enable signal on cutoff enable terminal 318 is supplied to the gates of cutoff transistors 312 , 314 , 316 , turning them off.
- the cutoff enable signal is turned off, turning cutoff transistors 312 , 314 , 316 on and thereby allowing current to flow in the drain bias circuit.
- cutoff transistors 312 , 314 , 316 In order that the cutoff transistors 312 , 314 , 316 have a low on-resistance during read operations, the sizes of cutoff transistors 312 , 314 , 316 must be relatively large. In one embodiment, cutoff transistors 312 , 314 are 30 micron devices and cutoff transistor 316 is a 40 to 50 micron device. These large cutoff transistors consume a disproportionate area in the memory device and are a drawback of this embodiment.
- Cascode transistor 330 is driven just into saturation by the drain bias reference signal on drain bias reference terminal 332 . This regulates the bit line voltage at about 1 volt.
- Global Y (GY) transistor 114 is driven by the column decode logic 340 , specifically by the GY enable signal on GY enable signal line 142 .
- GY transistor 114 of this embodiment may turn on in response to spurious signals. Therefore, the SEN node 112 is tied to ground by ground SEN (GSEN) transistor 350 when the memory device is not performing a read sense operation.
- GSEN ground SEN
- FIG. 4 a detailed schematic diagram of a drain bias circuit is shown, according to one embodiment of the present invention.
- individual cutoff transistors 312 , 314 , 316 as shown in FIG. 3 are eliminated.
- the function of cutting off current in the drain bias circuitry for power conservation is now performed by the GY transistor 414 .
- Kicker transistor 420 , column load transistor 432 , and current mirror transistor 434 perform similar functions as the equivalent transistors in the FIG. 3 embodiment, as does cascode transistor 430 .
- the gate of GY transistor 414 is not driven by a signal derived solely by column decode circuit 440 .
- GY enable signal on GY enable signal path 442 is derived by gating a column decode signal on column decode signal path 448 with the ATD signal on ATD signal path 446 .
- the ATD signal is generated by ATD circuit 450 and is gated with column decode signal by logic gating 452 .
- this embodiment may prevent spurious signals on column decode signal from turning on GY transistor 414 . Additionally, gating the column decode signal with the ATD signal prevents current from flowing down from the drain bias circuit, including kicker transistor 420 , column load transistor 432 , and current mirror transistor 434 .
- SEN node 412 will not be connected to GBL 416 when the memory device is not reading data. Therefore in this embodiment a grounding transistor, similar to GSEN transistor 350 of FIG. 3, is not necessary for grounding SEN node 412 . Removing the capacitance of a grounding transistor, along with shortening the physical length of SEN node as discussed below in connection with FIG. 6, may reduce the capacitance of SEN node 412 to approximately 0.1 picofarads. This is significantly less than the 3 picofarads of the SEN node 112 of the FIG. 3 embodiment, allowing for more rapid sensing with smaller currents.
- this embodiment By gating the column decode signal with the ATD signal, this embodiment eliminates the three cutoff transistors 312 , 314 , 316 of the FIG. 3 circuit. This saves the layout area formerly consumed by these three relatively large devices.
- Logic gate 452 is shown in FIG. 4 as a simple logic gate. In alternate embodiments, logic gate 452 may be a pulse generator responsive to the column decode signal and ATD signal. In one embodiment, logic gate 452 may delay the effect of ATD until the trailing edge of an ATD pulse. This timing may be used to ensure that GY enable signal is the last decoding signal to turn on in the memory cell read circuitry. This timing is discussed further in connection with FIGS. 5C and 5D below.
- Kicker transistor 420 , column load transistor 432 , and current mirror transistor 434 are turned on shortly before ATD permits GY transistor 414 to turn on.
- SEN node 412 Prior to GY transistor 414 being turned on, SEN node 412 is biased to approximately 1.4 volts because cascode transistor 430 is always turned on.
- GY transistor 414 is turned on in response to the column decode signal gated by the ATD signal, SEN node 412 is initially pulled down in voltage by GBL 416 through the process of charge sharing.
- SEN node 412 more rapidly charges to approximately 1 volt for sensing than in the FIG. 3 circuit since SEN node 412 is not directly grounded through the action of a grounding GSEN transistor. Even though the charging of SEN node 412 is more rapidly accomplished, the lower capacitance of SEN node 412 mitigates the effect of voltage overshoot in GBL 416 when GBL 416 in turn charges up for sensing. Voltage overshoot may in some cases disturb the setting of flash cell 418 itself. The lower capacitance of SEN node 412 also permits utilizing a smaller cascode transistor 430 than the cascode transistor 330 of the FIG. 3 circuit, since the SEN node 412 and GBL 416 charging is more rapidly accomplished in the FIG. 4 embodiment.
- FIG. 5A shows a typical implementation of ATD.
- activity e.g. change of address line state
- ATD becomes a active level.
- Address line state changes occur at times 502 , 504 , 506 , 508 , and 510 .
- the circuitry generating ATD signal initially keeps ATD signal inactive. Then at time 502 , in response to activity on the address X lines, ATD switches to active.
- ATD generates a pulse.
- ATD generates a pulse.
- ATD will overlap and we will get only one long pulse for ATD as shown in FIG. 5B. Trailing edge is pushed out all the way till valid address toggling. Since GY is turned ON with the trailing edge of ATD as shown in FIG. 5C, GY will remain off for the invalid address transitions. This will prevent unnecessary charging of SEN node and will eliminate impact on fast addressing cycling on sensing. This scheme also reduces power due to intermediate switching.
- FIG. 5D illustrates another embodiment of timing signals which are related to ATD.
- the FIG. 5D ATD signal is timed in accordance with FIG. 5A, in alternate embodiments the FIG. 5D ATD signal is in accordance with FIG. 5C.
- the trailing edge of ATD signal at time 542 , initiates the GY enable signal at the gate of GY transistor 414 of FIG. 4.
- kicker enable signal becomes inactive. Kicker is ON providing low impedance path for bit line charging when GY is enabled.
- the GY transistor 414 turns on enabling the current to flow from the drain bias circuit through the selected column device.
- a sense amp enable signal becomes active, permitting the sense amplifier to sense the read state of the selected flash cell.
- FIG. 6 a diagram of the general physical layout of a memory device is shown, including sense amps, according to one embodiment of the present invention.
- the memory is organized around words of 16 bits wide (called “X16” memory) or 64 bits wide (called “X64” memory).
- X16 16 bits wide
- X64 64 bits wide
- drain bias and sense amplifier circuits 640 , 642 , 644 , 646 are placed immediately between the sets of GY transistors, Y devices 612 , 614 .
- SEN node 650 is much shorter than SEN node 232 of FIG. 2, and therefore SEN node 650 has much reduced capacitance.
- SEN node 650 may have a capacitance as low as 0.1 picofarads. This lower capacitance value permits maximum utility from moving the cutoff function from the drain bias circuit, as shown in FIG. 3, to the GY transistor 414 of FIG. 4.
Landscapes
- Read Only Memory (AREA)
Abstract
A method and apparatus for a memory device is described. In one embodiment, global Y (GY) enable is gated by the trailing edge of a address transition detection (ATD) pulse. The ATD pulse ensures that the GY enable is off during periods when the memory device is not attempting to read a memory cell. The sense (SEN) node between the GY transistor and drain bias circuit may be charged up and global bit line (GBL) may be grounded. During this time, the power supply current is cut off by the GY transistor itself, thereby eliminating the need of separate cut-off transistors within the drain bias circuit. This permits minimal time delay in sensing after the incoming address is stable.
Description
- The present invention relates generally to memory read circuits, and more specifically to sensing cell elements in a flash memory device.
- Semiconductor memory devices utilize large numbers of small storage elements, called “cells”, that are organized in regular arrays. Reading data stored in these storage elements is the function of decoding circuits and sense amplifiers. In a typical semiconductor memory, the row decoding circuits are labeled “X decoders” and the column decoding circuits are labeled “Y decoders.” When an address is supplied to the semiconductor memory device, the X decoders and Y decoders select the appropriate cell or cells which correspond to that particular address.
- Referring now to FIG. 1, a schematic diagram of the read sensing circuits in a memory device is shown. The FIG. 1 circuit shows an exemplary memory cell,
flash cell 118, in an “flash” electronically programmable read-only memory (EPROM). When properly biased, and when a positive voltage is applied to the gate offlash cell 118, a current iC flows in the drain of flash cell 188. The current iC will differ depending upon there being a logical “1” or “0” stored inflash cell 118. Exemplary values are iC=10 microamps for a “1” and iC=30 microamps for a “0”. - In order to properly bias
flash cell 118 for read sensing, adrain bias circuit 110 is employed. Flashcell 118 is selected when X decoders present X enable signal on X enableterminal 144, and when the Y decoders present global Y (GY) enable signal on GY enableterminal 142. WhenGY transistor 114 is turned on by GY enable signal, current can then flow from thedrain bias circuit 110 first through sensing node (SEN node) 112 and thence throughflash cell 118. In the FIG. 1 example, for the sake of clarity only oneflash cell 118 is shown per column. Other similar devices (not shown) will be attached to the source ofGY transistor 114 at global bit line (GBL) 116. -
Drain bias circuitry 110 includes a controlled resistance that converts the current iC into a voltage capable of being sensed bysense amplifier 130. This voltage is supplied over sense input/read input (SIN/RIN)signal line 140 to oneinput 132 ofsense amplifier 130. A duplicate of thedrain bias circuit 110,flash cell 118, andGY transistor 114,drain bias circuit 120,reference cell 128, anddummy GY transistor 124, respectively, provide a means for providing a dummy current, iR. These dummy circuits permit the construction of a standard reference voltage to be presented toalternate input 134 ofsense amplifier 130. In an exemplary case iR=20 microamps, halfway between the extremes of iC values. -
Drain bias circuits sense amplifier 130 consume a large portion of the supply current of the memory device. Therefore many designs turn offsense amplifier 130 when not actually reading data. Similarly,drain bias circuits drain bias circuits SEN node 112. - The present invention is illustrated by way of example, and not by way of limitation, in the figures of the accompanying drawings and in which like reference numerals refer to similar elements and in which:
- FIG. 1 is a schematic diagram of the read sensing circuits in a memory device.
- FIG. 2 is a diagram of the general physical layout of a memory device, including sense amps.
- FIG. 3 is a detailed schematic diagram of a drain bias circuit.
- FIG. 4 is a detailed schematic diagram of a drain bias circuit, according to one embodiment of the present invention.
- FIGS. 5A, 5B,5C and 5D are timing diagrams of the ATD signal, according to several embodiments of the present invention.
- FIG. 6 is a diagram of the general physical layout of a memory device, including sense amps, according to one embodiment of the present invention.
- A method and apparatus for a memory device is described. In one embodiment, global Y (GY) enable is gated by the trailing edge of a address transition detection (ATD) pulse. The ATD pulse ensures that the GY enable signal is inactive during periods when the memory device is not attempting to read a memory cell. The same ATD pulse may ground the global bit line (GBL) using a column pull-off. The sense (SEN) node between the GY transistor and drain bias circuit may be charged up and GBL may be grounded. During this time, the path from Vcc to Vss is cut off by the GY transistor itself, thereby eliminating the need of separate cut-off transistors within the drain bias circuit.
- When the drain bias current flows through the GY transistor, the SEN node is pulled down by charge sharing with the GBL. Now the SEN node capacitance is small compared with that of GBL, and therefore the speed of bit line charging is similar to prior art schemes. By adjusting the timing of ATD, the GY enable signal is forced to be the last signal in the set of decode signals to be turned on. In this manner both the GBL of the actual array and also the bit lines of the reference circuit may be turned ON at the same time. This matching in the decode timing of main and reference side improves sensing speed. Gating GY with trailing edge of ATD increases tolerance of changes in address decode timing (intermediates).
- In one embodiment the GY enable signal is gated by the trailing edge of the adjusted ATD pulse. This trailing edge is delayed when there are multiple address transitions in rapid sequence, thereby delaying GY enable. This prevents current flowing from the drain bias circuit during spurious address states, promoting the increased tolerance of changes in address decode timing. The trailing edge of the adjusted ATD pulse may be timed to include the address decode delay time from the incoming address to the subsequent GY enable signal. This permits minimal time delay in sensing after the incoming address is stable.
- Referring now to FIG. 2, a diagram of the general physical layout of a memory device is shown, including sense amps. The FIG. 2 example is simplified for the sake of clarity, and shows only one drain bias and
sense amplifier 230 withcorresponding SEN node 232. The row and column implementedflash cell arrays Y devices exemplary GBLs sense amplifier circuit 230 is relatively far away from thecorresponding Y devices 212, theexemplary SEN node 232 has a relatively long length and therefore larger capacitance value. - Referring now to FIG. 3, a detailed schematic diagram of a drain bias circuit is shown. The circuit shown in FIG. 3 corresponds generally to the memory device of FIG. 2 and may be considered a portion of the read sensing circuits shown in FIG. 1.
Cutoff transistors kicker transistor 320, columnload bias transistor 322,current mirror transistor 324, andcascode transistor 330 are the active elements of adrain bias circuit 110 of FIG. 1. - Column
load bias transistor 322 andcurrent mirror transistor 324 form the primary current source for sensing the state offlash cell 118. The gate of columnload bias transistor 322 receives a column load biasing signal on columnload biasing terminal 328. The gate ofcurrent mirror transistor 324 receives a current mirror biasing signal on currentmirror biasing terminal 338. When biased in this manner, columnload bias transistor 322 act as a resistor for supplying a sensing current forflash cell 118. Thecurrent mirror transistor 324 may additionally provide a common-mode current forflash cell 118 and forreference cell 128. - An
additional kicker transistor 320 allows additional current to flow into the sense input/reference input (SIN/RIN)node 140 andSEN node 112 when the gate ofkicker transistor 320 is supplied with a kicker enable signal on kicker enable terminal 326. Thekicker transistor 320 permits more rapid initial charging of the SIN/RIN node 140 andSEN node 112 than would be possible using only columnload bias transistor 322 andcurrent mirror transistor 324. -
Cutoff transistors cutoff transistors cutoff transistors - In order that the
cutoff transistors cutoff transistors cutoff transistors cutoff transistor 316 is a 40 to 50 micron device. These large cutoff transistors consume a disproportionate area in the memory device and are a drawback of this embodiment. -
Cascode transistor 330 is driven just into saturation by the drain bias reference signal on drainbias reference terminal 332. This regulates the bit line voltage at about 1 volt. - Global Y (GY)
transistor 114 is driven by thecolumn decode logic 340, specifically by the GY enable signal on GY enablesignal line 142. When column decode logic receives an address, many intermediate states may occur which may cause spurious signals on GY enable signal. For this reason theGY transistor 114 of this embodiment may turn on in response to spurious signals. Therefore, theSEN node 112 is tied to ground by ground SEN (GSEN)transistor 350 when the memory device is not performing a read sense operation. A GSEN enable signal on GSEN enable terminal 352 turnsGSEN transistor 350 off only during times of read sensing. - The presence of the GSEN transistor, as well as the long path length of SEN node as discussed above in connection with FIG. 2, create a sizable capacitance in
SEN node 112. It is not unusual for SEN node to have 3 picofarads capacitance in this configuration. This adds to the time required after turning on the drain bias circuit viacutoff transistors - Referring now to FIG. 4, a detailed schematic diagram of a drain bias circuit is shown, according to one embodiment of the present invention. In the FIG. 4 embodiment,
individual cutoff transistors GY transistor 414. -
Kicker transistor 420,column load transistor 432, andcurrent mirror transistor 434 perform similar functions as the equivalent transistors in the FIG. 3 embodiment, as doescascode transistor 430. However, in the FIG. 4 embodiment the gate ofGY transistor 414 is not driven by a signal derived solely bycolumn decode circuit 440. Instead GY enable signal on GY enablesignal path 442 is derived by gating a column decode signal on columndecode signal path 448 with the ATD signal onATD signal path 446. In one embodiment, the ATD signal is generated byATD circuit 450 and is gated with column decode signal bylogic gating 452. By gating the column decode signal with the ATD signal, this embodiment may prevent spurious signals on column decode signal from turning onGY transistor 414. Additionally, gating the column decode signal with the ATD signal prevents current from flowing down from the drain bias circuit, includingkicker transistor 420,column load transistor 432, andcurrent mirror transistor 434. - Because gating the column decode signal with the ATD signal may prevent spurious signals from turning on
GY transistor 414,SEN node 412 will not be connected toGBL 416 when the memory device is not reading data. Therefore in this embodiment a grounding transistor, similar toGSEN transistor 350 of FIG. 3, is not necessary for groundingSEN node 412. Removing the capacitance of a grounding transistor, along with shortening the physical length of SEN node as discussed below in connection with FIG. 6, may reduce the capacitance ofSEN node 412 to approximately 0.1 picofarads. This is significantly less than the 3 picofarads of theSEN node 112 of the FIG. 3 embodiment, allowing for more rapid sensing with smaller currents. - By gating the column decode signal with the ATD signal, this embodiment eliminates the three
cutoff transistors -
Logic gate 452 is shown in FIG. 4 as a simple logic gate. In alternate embodiments,logic gate 452 may be a pulse generator responsive to the column decode signal and ATD signal. In one embodiment,logic gate 452 may delay the effect of ATD until the trailing edge of an ATD pulse. This timing may be used to ensure that GY enable signal is the last decoding signal to turn on in the memory cell read circuitry. This timing is discussed further in connection with FIGS. 5C and 5D below. -
Kicker transistor 420,column load transistor 432, andcurrent mirror transistor 434 are turned on shortly before ATD permitsGY transistor 414 to turn on. Prior toGY transistor 414 being turned on,SEN node 412 is biased to approximately 1.4 volts becausecascode transistor 430 is always turned on. WhenGY transistor 414 is turned on in response to the column decode signal gated by the ATD signal,SEN node 412 is initially pulled down in voltage byGBL 416 through the process of charge sharing. - Alternate embodiments using similar scheme of gating decoding signal with trailing edge of ATD may be deployed for other decode paths resulting in power saving.
- In the FIG. 4 embodiment,
SEN node 412 more rapidly charges to approximately 1 volt for sensing than in the FIG. 3 circuit sinceSEN node 412 is not directly grounded through the action of a grounding GSEN transistor. Even though the charging ofSEN node 412 is more rapidly accomplished, the lower capacitance ofSEN node 412 mitigates the effect of voltage overshoot inGBL 416 whenGBL 416 in turn charges up for sensing. Voltage overshoot may in some cases disturb the setting offlash cell 418 itself. The lower capacitance ofSEN node 412 also permits utilizing asmaller cascode transistor 430 than thecascode transistor 330 of the FIG. 3 circuit, since theSEN node 412 andGBL 416 charging is more rapidly accomplished in the FIG. 4 embodiment. - Referring now to FIGS. 5A, 5B,5C and 5D, timing diagrams of the ATD signal are shown, according to several embodiments of the present invention. FIG. 5A shows a typical implementation of ATD. Whenever there is activity (e.g. change of address line state) in the address lines reaching the memory device, ATD becomes a active level. For example, let the address X lines be a combination of all of the address lines. Address line state changes occur at
times time 502, in response to activity on the address X lines, ATD switches to active. During the subsequent address X transitions attimes - FIG. 5D illustrates another embodiment of timing signals which are related to ATD. In one embodiment, the FIG. 5D ATD signal is timed in accordance with FIG. 5A, in alternate embodiments the FIG. 5D ATD signal is in accordance with FIG. 5C. In either case, the trailing edge of ATD signal, at
time 542, initiates the GY enable signal at the gate ofGY transistor 414 of FIG. 4. At subsequent time, 544, kicker enable signal becomes inactive. Kicker is ON providing low impedance path for bit line charging when GY is enabled. TheGY transistor 414 turns on enabling the current to flow from the drain bias circuit through the selected column device. Then at a subsequent time, 546, a sense amp enable signal becomes active, permitting the sense amplifier to sense the read state of the selected flash cell. - Referring now to FIG. 6, a diagram of the general physical layout of a memory device is shown, including sense amps, according to one embodiment of the present invention. In the FIG. 6 embodiment, the memory is organized around words of 16 bits wide (called “X16” memory) or 64 bits wide (called “X64” memory). In the 32 megabyte X64 memory shown in FIG. 6, there need to be 4 sets of drain bias and
sense amplifier circuits 640, 642, 644, 646. Rather than place these drain bias andsense amplifier circuits 640, 642, 644, 646 at the end of the flash cell arrays as was done in the FIG. 2 example, drain bias andsense amplifier circuits 640, 642, 644, 646 are placed immediately between the sets of GY transistors,Y devices 612, 614. For the sake of clarity only oneSEN node 650 of drain bias and sense amplifier 646 is shown.SEN node 650 is much shorter thanSEN node 232 of FIG. 2, and thereforeSEN node 650 has much reduced capacitance. In conjunction with the reduction in capacitance caused by the elimination of a GSEN transistor,SEN node 650 may have a capacitance as low as 0.1 picofarads. This lower capacitance value permits maximum utility from moving the cutoff function from the drain bias circuit, as shown in FIG. 3, to theGY transistor 414 of FIG. 4. - In the foregoing specification, the invention has been described with reference to specific exemplary embodiments thereof. It will, however, be evident that various modifications and changes may be made thereto without departing from the broader spirit and scope of the invention as set forth in the appended claims. The specification and drawings are, accordingly, to be regarded in an illustrative rather than a restrictive sense.
Claims (22)
1. An apparatus, comprising:
a drain bias circuit;
a first transistor to cut off current flow in said drain bias circuit when the apparatus is not performing a read operation in a first column coupled to said first transistor; and
a memory cell coupled to said first column and said first transistor.
2. The apparatus of claim 1 , wherein a gate of said first transistor is coupled to an address transition detection signal.
3. The apparatus of claim 1 , wherein a gate of said first transistor is coupled to a first signal gated by a column decode signal and an address transition detection signal.
4. The apparatus of claim 3 , wherein said first signal is responsive to a trailing edge of said address transition detection signal.
5. The apparatus of claim 4 , wherein said address transition detection signal is delayed after an initial address transition.
6. The apparatus of claim 4 , wherein said first signal is further responsive to a first pulse generated in response to said trailing edge of said address transition detection signal.
7. The apparatus of claim 1 , further comprising a sense node, having a capacitance value less than 1.0 picofarad, coupled to said drain bias circuit and to said first transistor.
8. A method, comprising:
providing a drain bias current;
cutting off said drain bias current in a column decode transistor when not performing a read operation; and
enabling flow of said drain bias current when said column decode transistor is selected for performing a read operation.
9. The method of claim 8 , wherein said cutting off includes coupling said column decode transistor to an address transition detection signal.
10. The method of claim 8 , wherein said cutting off includes coupling a gate of said first transistor to a first signal gated by a column decode signal and an address transition detection signal.
11. The method of claim 10 , further comprising delaying said first signal to occur after a trailing edge of said address transition detection signal.
12. The method of claim 11 , further comprising delaying said address transition detection signal to occur after an initial address transition.
13. The method of claim 11 , further comprising delaying said first signal to occur after a first pulse is generated in response to said trailing edge of said address transition detection signal.
14. The method of claim 8 , further comprising reducing the capacitance of a sense node coupled to a source of said drain bias current and to said column decode transistor.
15. An apparatus, comprising:
means for providing a drain bias current;
means for cutting off said drain bias current in a column decode transistor when not performing a read operation; and
means for enabling flow of said drain bias current when said column decode transistor is selected for performing a read operation.
16. The apparatus of claim 15 , wherein said means for cutting off includes means for coupling said column decode transistor to an address transition detection signal.
17. The apparatus of claim 15 , wherein said means for cutting off includes means for coupling a gate of said first transistor to a first signal gated by a column decode signal and an address transition detection signal.
18. The apparatus of claim 17 , further comprising means for delaying said first signal to occur after a trailing edge of said address transition detection signal.
19. The method of claim 18 , further comprising means for delaying said address transition detection signal to occur after an initial address transition.
20. The method of claim 18 , further comprising means for delaying said first signal to occur after a first pulse is generated in response to said trailing edge of said address transition detection signal.
21. The method of claim 13 , further including means for delaying said first pulse to occur after the leading edge of a kicker enable signal.
22. The method of claim 8 , further comprising means for reducing a capacitance of a sense node coupled to a source of said drain bias current and to said column decode transistor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/773,140 US6456540B1 (en) | 2001-01-30 | 2001-01-30 | Method and apparatus for gating a global column select line with address transition detection |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/773,140 US6456540B1 (en) | 2001-01-30 | 2001-01-30 | Method and apparatus for gating a global column select line with address transition detection |
Publications (2)
Publication Number | Publication Date |
---|---|
US20020101766A1 true US20020101766A1 (en) | 2002-08-01 |
US6456540B1 US6456540B1 (en) | 2002-09-24 |
Family
ID=25097314
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/773,140 Expired - Fee Related US6456540B1 (en) | 2001-01-30 | 2001-01-30 | Method and apparatus for gating a global column select line with address transition detection |
Country Status (1)
Country | Link |
---|---|
US (1) | US6456540B1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20170186485A1 (en) * | 2015-12-23 | 2017-06-29 | SK Hynix Inc. | Electronic device and method for driving the same |
CN112863581A (en) * | 2016-09-09 | 2021-05-28 | 硅存储技术公司 | Sense amplifier with bit line precharge circuit for reading flash memory cells in an array |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7191295B2 (en) * | 2003-06-30 | 2007-03-13 | Intel Corporation | Sensing word groups in a memory |
US7385865B2 (en) * | 2004-12-01 | 2008-06-10 | Intel Corporation | Memory circuit |
JP4912016B2 (en) * | 2005-05-23 | 2012-04-04 | ルネサスエレクトロニクス株式会社 | Semiconductor memory device |
KR101163457B1 (en) * | 2006-02-24 | 2012-07-18 | 삼성전자주식회사 | Low Voltage Regulated Cascade Circuits and CMOS Analog Circuits |
JP2008090885A (en) * | 2006-09-29 | 2008-04-17 | Oki Electric Ind Co Ltd | Semiconductor integrated device |
JP2009181439A (en) * | 2008-01-31 | 2009-08-13 | Toshiba Corp | Memory system |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4742292A (en) | 1987-03-06 | 1988-05-03 | International Business Machines Corp. | CMOS Precision voltage reference generator |
US4763026A (en) | 1987-04-09 | 1988-08-09 | National Semiconductor Corporation | Sense amplifier for single-ended data sensing |
DE69016153T2 (en) | 1989-10-20 | 1995-05-18 | Fujitsu Ltd | Non-volatile semiconductor memory device. |
JPH0574181A (en) * | 1991-09-10 | 1993-03-26 | Nec Corp | Data readout circuit of semiconductor memory device |
RU2190260C2 (en) | 1994-06-02 | 2002-09-27 | Интел Корпорейшн | Reading circuit for flash storage with multilevel cells |
US5608679A (en) | 1994-06-02 | 1997-03-04 | Intel Corporation | Fast internal reference cell trimming for flash EEPROM memory |
US5539690A (en) | 1994-06-02 | 1996-07-23 | Intel Corporation | Write verify schemes for flash memory with multilevel cells |
US5508958A (en) | 1994-09-29 | 1996-04-16 | Intel Corporation | Method and apparatus for sensing the state of floating gate memory cells by applying a variable gate voltage |
US5671179A (en) | 1994-10-19 | 1997-09-23 | Intel Corporation | Low power pulse generator for smart voltage flash eeprom |
US5594360A (en) | 1994-10-19 | 1997-01-14 | Intel Corporation | Low current reduced area programming voltage detector for flash memory |
US5594691A (en) * | 1995-02-15 | 1997-01-14 | Intel Corporation | Address transition detection sensing interface for flash memory having multi-bit cells |
DE69632022D1 (en) | 1996-01-24 | 2004-05-06 | St Microelectronics Srl | Voltage level control |
FR2753829B1 (en) | 1996-09-24 | 1998-11-13 | READING CIRCUIT FOR NON-VOLATILE MEMORY OPERATING WITH LOW SUPPLY VOLTAGE | |
US5790453A (en) | 1996-10-24 | 1998-08-04 | Micron Quantum Devices, Inc. | Apparatus and method for reading state of multistate non-volatile memory cells |
US5793671A (en) | 1997-01-21 | 1998-08-11 | Advanced Micro Devices, Inc. | Static random access memory cell utilizing enhancement mode N-channel transistors as load elements |
FR2762434B1 (en) | 1997-04-16 | 1999-05-28 | Sgs Thomson Microelectronics | MEMORY READING CIRCUIT WITH PRELOAD LIMITATION DEVICE |
IT1295910B1 (en) | 1997-10-31 | 1999-05-28 | Sgs Thomson Microelectronics | READING CIRCUIT FOR NON-VOLATILE MEMORIES |
ITTO980068A1 (en) | 1998-01-27 | 1999-07-27 | Sgs Thomson Microelectronics | READING CIRCUIT FOR ANALOG NON-VOLATILE MEMORIES, IN PARTICULAR FLASH-EEPROM, DIRECTLY READING THE THRESHOLD VOLTAGE AND A CORREN |
US6141252A (en) | 1999-07-13 | 2000-10-31 | Lucent Technologies Inc. | Voltage regulation for integrated circuit memory |
IT1314042B1 (en) | 1999-10-11 | 2002-12-03 | St Microelectronics Srl | MEMORY READING AMPLIFIER CIRCUIT, WITH HIGH CAPACITY OF DISCRIMINATION OF CURRENT LEVELS. |
-
2001
- 2001-01-30 US US09/773,140 patent/US6456540B1/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20170186485A1 (en) * | 2015-12-23 | 2017-06-29 | SK Hynix Inc. | Electronic device and method for driving the same |
US9773548B2 (en) * | 2015-12-23 | 2017-09-26 | SK Hynix Inc. | Electronic device and method for driving the same |
CN112863581A (en) * | 2016-09-09 | 2021-05-28 | 硅存储技术公司 | Sense amplifier with bit line precharge circuit for reading flash memory cells in an array |
Also Published As
Publication number | Publication date |
---|---|
US6456540B1 (en) | 2002-09-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5381374A (en) | Memory cell data output circuit having improved access time | |
US5812456A (en) | Switched ground read for EPROM memory array | |
US7339846B2 (en) | Method and apparatus for reading data from nonvolatile memory | |
WO2004072982A1 (en) | Selection circuit for accurate memory read operations | |
US20060120175A1 (en) | Memory array with fast bit line precharge | |
JPH0750557B2 (en) | Memory device having an array of non-volatile memory cells | |
KR100247575B1 (en) | Semiconductor memory | |
US20040076059A1 (en) | Method and apparatus for leakage compensation with full Vcc pre-charge | |
JP2009252275A (en) | Semiconductor memory apparatus | |
US6456540B1 (en) | Method and apparatus for gating a global column select line with address transition detection | |
US20070103959A1 (en) | Method And Apparatus For Reducing Leakage Current In A Read Only Memory Device Using Shortened Precharge Phase | |
US6914822B2 (en) | Read-biasing and amplifying system | |
US7230866B2 (en) | Integrated circuit devices having precharge and equalization circuits therein and methods of operating same | |
US6054879A (en) | Current sensing amplifier with feedback | |
JPS63271798A (en) | Erasable programmable logic device | |
US7826291B2 (en) | Precharge and evaluation phase circuits for sense amplifiers | |
JPH09115294A (en) | Parallel programming method and parallel programming circuit | |
JP3598008B2 (en) | Semiconductor device | |
US7042779B2 (en) | Method and apparatus for reducing leakage current in a read only memory device using pre-charged sub-arrays | |
WO2005027135A1 (en) | Write driver for a magnetoresistive memory | |
US4939392A (en) | Output circuit for driving a memory device output lead including a three-state inverting buffer and a transfer gate coupled between the buffer input lead and the buffer output lead | |
US6442069B1 (en) | Differential signal path for high speed data transmission in flash memory | |
US7633787B2 (en) | ROM memory component featuring reduced leakage current, and method for writing the same | |
US12277994B2 (en) | Non-volatile memory | |
US7057955B2 (en) | Dynamically unbalanced sense amplifier |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: INTEL CORPORATION, CALIFORNIA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:BALTAR, ROBERT;TRIVEDI, RITESH;REEL/FRAME:011999/0077;SIGNING DATES FROM 20010409 TO 20010411 |
|
FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
FPAY | Fee payment |
Year of fee payment: 4 |
|
REMI | Maintenance fee reminder mailed | ||
LAPS | Lapse for failure to pay maintenance fees | ||
STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
|
FP | Lapsed due to failure to pay maintenance fee |
Effective date: 20100924 |