US20020053663A1 - High density cobalt-manganese coprecipitated nickel hydroxide and process for its production - Google Patents
High density cobalt-manganese coprecipitated nickel hydroxide and process for its production Download PDFInfo
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- US20020053663A1 US20020053663A1 US10/003,916 US391601A US2002053663A1 US 20020053663 A1 US20020053663 A1 US 20020053663A1 US 391601 A US391601 A US 391601A US 2002053663 A1 US2002053663 A1 US 2002053663A1
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- Prior art keywords
- cobalt
- manganese
- nickel hydroxide
- high density
- salt
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- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 title claims abstract description 41
- MZZUATUOLXMCEY-UHFFFAOYSA-N cobalt manganese Chemical compound [Mn].[Co] MZZUATUOLXMCEY-UHFFFAOYSA-N 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims abstract description 9
- 238000010079 rubber tapping Methods 0.000 claims abstract description 16
- 239000007864 aqueous solution Substances 0.000 claims abstract description 15
- 239000013078 crystal Substances 0.000 claims abstract description 13
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 11
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims abstract description 8
- 239000012298 atmosphere Substances 0.000 claims abstract description 8
- 239000008139 complexing agent Substances 0.000 claims abstract description 8
- 239000011261 inert gas Substances 0.000 claims abstract description 7
- 150000002815 nickel Chemical class 0.000 claims abstract description 7
- 150000001868 cobalt Chemical class 0.000 claims abstract description 6
- 150000002696 manganese Chemical class 0.000 claims abstract description 6
- 239000011572 manganese Substances 0.000 claims description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 15
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine group Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 8
- 239000000243 solution Substances 0.000 description 28
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 239000002245 particle Substances 0.000 description 17
- 238000003756 stirring Methods 0.000 description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 7
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 7
- 235000002639 sodium chloride Nutrition 0.000 description 7
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 6
- 239000010941 cobalt Substances 0.000 description 6
- 229910017052 cobalt Inorganic materials 0.000 description 6
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 6
- 229910052748 manganese Inorganic materials 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 5
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 5
- 229940044175 cobalt sulfate Drugs 0.000 description 5
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 5
- 229940099596 manganese sulfate Drugs 0.000 description 5
- 239000011702 manganese sulphate Substances 0.000 description 5
- 235000007079 manganese sulphate Nutrition 0.000 description 5
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 5
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 4
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 4
- 235000011130 ammonium sulphate Nutrition 0.000 description 4
- 229910021645 metal ion Inorganic materials 0.000 description 4
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910001416 lithium ion Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- URIIGZKXFBNRAU-UHFFFAOYSA-N lithium;oxonickel Chemical compound [Li].[Ni]=O URIIGZKXFBNRAU-UHFFFAOYSA-N 0.000 description 2
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000007774 positive electrode material Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 239000007832 Na2SO4 Substances 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- KHPLPBHMTCTCHA-UHFFFAOYSA-N ammonium chlorate Chemical compound N.OCl(=O)=O KHPLPBHMTCTCHA-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 239000007806 chemical reaction intermediate Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910021508 nickel(II) hydroxide Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000079 presaturation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/48—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
- H01M4/52—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron
- H01M4/525—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G51/00—Compounds of cobalt
- C01G51/80—Compounds containing cobalt, with or without oxygen or hydrogen, and containing one or more other elements
- C01G51/82—Compounds containing cobalt, with or without oxygen or hydrogen, and containing two or more other elements
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G53/00—Compounds of nickel
- C01G53/80—Compounds containing nickel, with or without oxygen or hydrogen, and containing one or more other elements
- C01G53/82—Compounds containing nickel, with or without oxygen or hydrogen, and containing two or more other elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/052—Li-accumulators
- H01M10/0525—Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/48—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
- H01M4/50—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese
- H01M4/505—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
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- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
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- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
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- C01P2006/10—Solid density
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- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
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- C01P2006/11—Powder tap density
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- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
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- C01P2006/12—Surface area
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- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/32—Thermal properties
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Definitions
- the present invention relates to high density cobalt-manganese coprecipitated nickel hydroxide with excellent charge/discharge cycle properties and high temperature stability, which is suitable as a positive electrode active material for a lithium ion secondary battery, and to a process for its production.
- the present inventors have completed the present invention upon finding that it is possible to obtain high density cobalt-manganese coprecipitated nickel hydroxide by continuously supplying a complexing agent and an alkali metal hydroxide to an aqueous solution of a nickel salt containing a cobalt salt and a manganese salt while adequately stirring in an aqueous solution either in an inert gas atmosphere or in the presence of an appropriate reducing agent, and accomplishing continuous crystal growth and continuous removal.
- the present invention relates to high density cobalt-manganese coprecipitated nickel hydroxide with a tapping density of 1.5 g/cc or greater.
- the invention further relates to high density cobalt-manganese coprecipitated nickel hydroxide characterized in that, where the cobalt-manganese coprecipitated nickel hydroxide is represented as (Ni (1-x-y) Co x Mn y )(OH) 2 , 1/10 ⁇ x ⁇ 1/3 and 1/20 ⁇ y ⁇ 1/3.
- the invention still further relates to a process for production of high density cobalt-manganese coprecipitated nickel hydroxide, characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal. It particularly relates to this process wherein the reducing agent is hydrazine.
- the invention also includes Li(Ni (1-x-y) Co x Mn y )O 2 obtained by calcining a cobalt-manganese coprecipitated nickel hydroxide according to the invention with an appropriate lithium salt.
- FIG. 1 is an electron micrograph of high density cobalt-manganese coprecipitated nickel hydroxide according to the invention.
- the cobalt-manganese coprecipitated nickel hydroxide of the invention is characterized by having high density, and specifically, a density of 1.5 g/cc or greater.
- the specific surface area of the cobalt-manganese coprecipitated nickel hydroxide of the invention is in the range of 8-20 m 2 /g, and as shown in FIG. 1 it is spherical with a mean particle size in the range of 5-20 ⁇ m.
- the content of the cobalt and manganese as additional components is not particularly restricted, if represented by (Ni (1-x-y) Co x Mn y )(OH) 2 the ranges are preferably 1/10 ⁇ x ⁇ 1/3 and 1/20 ⁇ y ⁇ 1/3.
- the production process for the cobalt-manganese coprecipitated nickel hydroxide of the invention accomplishes production of nickel hydroxide with high density of coprecipitated cobalt and manganese by continuous supply of an aqueous solution of a nickel salt containing a cobalt salt (cobalt (II) ion) and a manganese salt (manganese (II) ion), of a complexing agent and of an alkali metal hydroxide, to a reactor with adequate stirring either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal of the resulting precipitate.
- a nickel salt containing a cobalt salt (cobalt (II) ion) and a manganese salt (manganese (II) ion) manganese salt
- the salt concentration, complexing agent concentration, pH and temperature in the reactor are kept within a fixed range to satisfactorily control the powder properties, such as the crystallinity, tapping density, specific surface area, particle size, etc.
- the salt concentration in the vessel is preferably kept in the range of 50-200 mS/cm ⁇ 5 mS/cm and the ammonium ion concentration is preferably kept in the range of 1-10 g/L ⁇ 0.5 g/L.
- the reaction pH is preferably kept in the range of 11.0-13.0 ⁇ 0.05, and the reaction temperature is preferably kept in the range of 25-80° C. ⁇ 0.5° C.
- salt concentration adjustors there may be mentioned sodium chloride, potassium chloride, sodium sulfate, potassium sulfate, ammonium chlorate, ammonium sulfate and the like.
- calcium salts there may be used nitrate, acetate or oxalate salts.
- the production process of the invention is based on the high density nickel hydroxide production process described in JP-A 10-97856 but is characterized by further adding an appropriate reducing agent. That is, while adequate stirring is usually necessary, this results in inclusion of air, etc. which causes partial oxidation of the unstable cobalt (II) ion or manganese (II) ion and prevents a product with sufficient density from being obtained.
- the production process is carried out either in an inert gas atmosphere or in the presence of a reducing agent.
- the added reducing agent is not particularly restricted, but hydrazine is preferred.
- the ammonium ion source for the reaction as a complexing agent according to the invention is used as a reaction intermediate, as represented by reaction formulas (1) and (2).
- the nickel salt, ammonium ion source and alkali metal hydroxide are nickel sulfate, ammonia and sodium hydroxide, respectively.
- Cobalt and manganese are omitted in order to simplify the formulas, but they likewise progress through ammonium complex salts.
- 4 equivalents of ammonia are not necessary, as about 0.5 equivalent at most is sufficient.
- Tapping density (B ⁇ A)/D g/ml
- the tapping density was 1.71 g/cc.
- the tapping density was 1.82 g/cc.
- the tapping density was 1.40 g/cc.
- the tapping density was 1.33 g/cc.
- the present invention it is possible to obtain high density cobalt-manganese coprecipitated nickel hydroxide having high density, and particularly a tapping density of 1.5 g/cc or greater, by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.
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- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
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- Manufacturing & Machinery (AREA)
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- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
Description
- The present invention relates to high density cobalt-manganese coprecipitated nickel hydroxide with excellent charge/discharge cycle properties and high temperature stability, which is suitable as a positive electrode active material for a lithium ion secondary battery, and to a process for its production.
- Recently, attempts have been made to add other components to nickel hydroxide used as the starting material for production of lithium nickel oxide, for the purpose of including additional components with lithium nickel oxide for use as the positive electrode active material of lithium ion secondary batteries in order to improve their charge/discharge cycle properties and high temperature stability (JP-A 10-316431).
- However, with the conventional process it has been difficult to obtain nickel hydroxide particles containing cobalt and manganese as the additional components while still maintaining density sufficient for current requirements.
- The above-mentioned conventional production process gives particles that are inadequate for use in the positive electrode of a lithium ion secondary battery, and thus it has become an important goal to develop high density nickel hydroxide with a high cobalt and manganese content that exhibits a stable high utilization rate at high temperatures and low cycle deterioration.
- As a result of diligent research directed toward achieving this goal, the present inventors have completed the present invention upon finding that it is possible to obtain high density cobalt-manganese coprecipitated nickel hydroxide by continuously supplying a complexing agent and an alkali metal hydroxide to an aqueous solution of a nickel salt containing a cobalt salt and a manganese salt while adequately stirring in an aqueous solution either in an inert gas atmosphere or in the presence of an appropriate reducing agent, and accomplishing continuous crystal growth and continuous removal.
- In other words, the present invention relates to high density cobalt-manganese coprecipitated nickel hydroxide with a tapping density of 1.5 g/cc or greater.
- The invention further relates to high density cobalt-manganese coprecipitated nickel hydroxide characterized in that, where the cobalt-manganese coprecipitated nickel hydroxide is represented as (Ni(1-x-y)CoxMny)(OH)2, 1/10≦x≦1/3 and 1/20≦y≦1/3.
- The invention still further relates to a process for production of high density cobalt-manganese coprecipitated nickel hydroxide, characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal. It particularly relates to this process wherein the reducing agent is hydrazine.
- The invention also includes Li(Ni(1-x-y)CoxMny)O2 obtained by calcining a cobalt-manganese coprecipitated nickel hydroxide according to the invention with an appropriate lithium salt.
- FIG. 1 is an electron micrograph of high density cobalt-manganese coprecipitated nickel hydroxide according to the invention.
- The cobalt-manganese coprecipitated nickel hydroxide of the invention is characterized by having high density, and specifically, a density of 1.5 g/cc or greater. The specific surface area of the cobalt-manganese coprecipitated nickel hydroxide of the invention is in the range of 8-20 m2/g, and as shown in FIG. 1 it is spherical with a mean particle size in the range of 5-20 μm.
- Although the content of the cobalt and manganese as additional components is not particularly restricted, if represented by (Ni(1-x-y)CoxMny)(OH)2 the ranges are preferably 1/10≦x≦1/3 and 1/20≦y≦1/3.
- The production process for the cobalt-manganese coprecipitated nickel hydroxide of the invention accomplishes production of nickel hydroxide with high density of coprecipitated cobalt and manganese by continuous supply of an aqueous solution of a nickel salt containing a cobalt salt (cobalt (II) ion) and a manganese salt (manganese (II) ion), of a complexing agent and of an alkali metal hydroxide, to a reactor with adequate stirring either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal of the resulting precipitate.
- Here, the salt concentration, complexing agent concentration, pH and temperature in the reactor are kept within a fixed range to satisfactorily control the powder properties, such as the crystallinity, tapping density, specific surface area, particle size, etc.
- Specifically, there is obtained high density cobalt-manganese coprecipitated nickel hydroxide wherein, as represented by (Ni(1-x-y)CoxMny)(OH)2, 1/10≦x≦1/3 and 1/20≦y≦1/3, the tapping density is 1.5 g/cc or greater, the specific surface area is 8-30 m2/g and the mean particle size is 5-20 μm.
- For the high density cobalt-manganese coprecipitated nickel hydroxide, the salt concentration in the vessel is preferably kept in the range of 50-200 mS/cm ±5 mS/cm and the ammonium ion concentration is preferably kept in the range of 1-10 g/L ±0.5 g/L. The reaction pH is preferably kept in the range of 11.0-13.0 ±0.05, and the reaction temperature is preferably kept in the range of 25-80° C. ±0.5° C.
- As salt concentration adjustors there may be mentioned sodium chloride, potassium chloride, sodium sulfate, potassium sulfate, ammonium chlorate, ammonium sulfate and the like. As calcium salts there may be used nitrate, acetate or oxalate salts.
- The production process of the invention is based on the high density nickel hydroxide production process described in JP-A 10-97856 but is characterized by further adding an appropriate reducing agent. That is, while adequate stirring is usually necessary, this results in inclusion of air, etc. which causes partial oxidation of the unstable cobalt (II) ion or manganese (II) ion and prevents a product with sufficient density from being obtained. In order to control such oxidation, the production process is carried out either in an inert gas atmosphere or in the presence of a reducing agent. The added reducing agent is not particularly restricted, but hydrazine is preferred.
- In most cases when precipitating solid crystals from aqueous solution, a high concentration gradient results in abundant precipitation of fine particles. That is, the mechanism by which solid crystals precipitate from aqueous solution involves the aqueous solution passing from presaturation→saturation→supersaturation→crystal precipitation. Growth of crystals requires this mechanism to be effected as slowly as possible, and a low concentration gradient near saturation is necessary for this purpose. Nevertheless, the solubility curves for hydroxides of nickel, cobalt and manganese vary considerably according to the pH. In other words, the metal ion concentration gradient is very large with respect to the pH. Only production of fine particles therefore can be expected by ordinary methods. According to the invention, however, the metal ions are in a complex salt with ammonium so that the concentration gradient of the metal ions with respect to the pH is reduced in aqueous solution to achieve growth of particles.
- With pH control alone, decomposition and evaporation of ammonia alters the ammonium ion concentration in the solution, such that generation of crystal nuclei produced from the ammonium complex salt becomes unstable. Only by controlling the ammonium ion concentration of the solution does generation of crystal nuclei become constant, so that uniform growth of particles occurs. In order to maintain such a mechanism, the ammonium ion source and alkali metal hydroxide must consistently match the necessary amount of metal ion, and therefore the reaction process is preferably carried out in a continuous manner. By speeding up the stirring rate, an abrading effect also occurs between the particles, and this repeated abrasion and growth result in fluidized, spherical high density particles.
- The ammonium ion source for the reaction as a complexing agent according to the invention is used as a reaction intermediate, as represented by reaction formulas (1) and (2). Here, the nickel salt, ammonium ion source and alkali metal hydroxide are nickel sulfate, ammonia and sodium hydroxide, respectively. (Cobalt and manganese are omitted in order to simplify the formulas, but they likewise progress through ammonium complex salts.) As is apparent from the formulas, 4 equivalents of ammonia are not necessary, as about 0.5 equivalent at most is sufficient.
- NiSO4+4NH3+2NaOH→Ni(NH3)4(OH)2+Na2SO4 (1)
- Ni(NH3)4(OH)2→Ni(OH)2+4NH3 (2)
- After placing 450 L of water in a 500 L cylindrical reactor equipped with an overflow pipe and a stirrer provided with two 250φ propeller type stirring blades, a 30% sodium hydroxide solution was added to a pH of 12.6 and the temperature was kept at 50° C. while stirring at a speed of 320 rpm.
- Next there were simultaneously added to the reactor in a continuous manner a solution containing a mixture of 1.7 mol/L nickel sulfate solution, 1.5 mol/L cobalt sulfate solution and 1.1 mol/L manganese sulfate aqueous solution in a volume ratio of 35:20:9 at a flow rate of 200 cc/min, a 6 mol/L ammonium sulfate solution at 63 cc/min and a 1 wt % hydrazine aqueous solution at 10 cc/min.
- Also, 30% sodium hydroxide was intermittently added until the solution in the reactor reached a pH of 12.6, to form cobalt-manganese coprecipitated nickel hydroxide particles.
- After 120 hours when the reactor reached a steady state, the cobalt-manganese coprecipitated nickel hydroxide particles were continuously removed for 24 hours from the overflow pipe and washed, filtered and dried at 100° C. for 15 hours to obtain cobalt-manganese coprecipitated nickel hydroxide dry powder with a component ratio of Ni:Co:Mn=60:30:10.
- The tapping density of the obtained cobalt-manganese coprecipitated nickel hydroxide powder was measured in the manner described below.
- Sample preparation: The cobalt-manganese coprecipitated nickel hydroxide powder obtained above was used in the manner described below.
- The mass [A] of a 20 mL cell [C] was measured, and the crystals were allowed to naturally fall into the cell through a 48 mesh filter to fill it. The mass [B] and filling volume [D] of the cell were measured after tapping 200 times using a “TAP DENSER KYT-3000” by Seishin Enterprise Co., Ltd. with a mounted 4 cm spacer. The following equations were used for calculation.
- Tapping density=(B−A)/D g/ml
- Bulk density=(B−A)/C g/ml
- Measurement results: Tapping density=1.91 g/cc
- Cobalt-manganese coprecipitated nickel hydroxide with a component ratio of Ni:Co:Mn=50:30:20 was produced and the tapping density thereof measured under the same conditions as Example 1, except that the nickel sulfate solution, cobalt sulfate solution and manganese sulfate solution were mixed in a volume ratio of 30:20:18 and the pH of the reaction solution used to form the cobalt-manganese coprecipitated nickel hydroxide particles was 12.4. The tapping density was 1.71 g/cc.
- After placing 13 L of water in a 15 L cylindrical reactor equipped with an overflow pipe and a stirrer provided with one 70φ paddle type stirring blade, a 30% sodium hydroxide solution was added to a pH of 10.9 and the temperature was kept at 50° C. while stirring at a speed of 1000 rpm. Nitrogen gas was also continuously supplied to the reactor at a flow rate of 0.5 L/min, and the atmosphere in the reactor was replaced with a nitrogen atmosphere. Next there were simultaneously added to the reactor in a continuous manner a solution containing a mixture of 1.7 mol/L nickel sulfate solution, 1.5 mol/L cobalt sulfate solution and 1.1 mol/L manganese sulfate aqueous solution in a volume ratio of Ni:Co:Mn=1:1:1 (molar ratio) at a flow rate of 12 cc/min and a 6 mol/L ammonium sulfate solution at 1.2 cc/min. Also, 30% sodium hydroxide was intermittently added until the solution in the reactor reached a pH of 10.9, to form cobalt-manganese coprecipitated nickel hydroxide particles. After 120 hours when the reactor reached a steady state, the cobalt-manganese coprecipitated nickel hydroxide particles were continuously removed for 24 hours from the overflow pipe and washed, filtered and dried at 100° C. for 15 hours to obtain cobalt-manganese coprecipitated nickel hydroxide dry powder with a component ratio of Ni:Co:Mn=1:1:1. The tapping density was 1.82 g/cc.
- After placing 450 L of water in a 500 L cylindrical reactor equipped with an overflow pipe and a stirrer provided with one 250φ propeller type stirring blade, a 30% sodium hydroxide solution was added to a pH of 12.6 and the temperature was kept at 50° C. while stirring at a speed of 350 rpm. Next there were simultaneously added to the reactor in a continuous manner a solution containing a mixture of 1.7 mol/L nickel sulfate solution, 1.5 mol/L cobalt sulfate solution and 1.1 mol/L manganese sulfate aqueous solution in a volume ratio of 35:20:9 at a flow rate of 200 cc/min and a 6 mol/L ammonium sulfate solution at 63 cc/min. Also, 30% sodium hydroxide was intermittently added until the solution in the reactor reached a pH of 12.6, to form cobalt-manganese coprecipitated nickel hydroxide particles. After 120 hours when the reactor reached a steady state, the cobalt-manganese coprecipitated nickel hydroxide particles were continuously removed for 24 hours from the overflow pipe and washed, filtered and dried at 100° C. for 15 hours to obtain cobalt-manganese coprecipitated nickel hydroxide dry powder with a component ratio of Ni:Co:Mn=60:30:10. The tapping density was 1.40 g/cc.
- Cobalt-manganese coprecipitated nickel hydroxide with a component ratio of Ni:Co:Mn=50:30:20 was produced and the tapping density thereof measured under the same conditions as Comparative Example 1, except that the nickel sulfate solution, cobalt sulfate solution and manganese sulfate solution were mixed in a volume ratio of 30:20:18 and the pH of the reaction solution used to form the cobalt-manganese coprecipitated nickel hydroxide particles was 12.4. The tapping density was 1.33 g/cc.
- According to the present invention it is possible to obtain high density cobalt-manganese coprecipitated nickel hydroxide having high density, and particularly a tapping density of 1.5 g/cc or greater, by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.
Claims (4)
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US11/243,820 US7585435B2 (en) | 2000-11-06 | 2005-10-05 | High density cobalt-manganese coprecipitated nickel hydroxide and process for its production |
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US11/243,820 Continuation-In-Part US7585435B2 (en) | 2000-11-06 | 2005-10-05 | High density cobalt-manganese coprecipitated nickel hydroxide and process for its production |
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US20050089756A1 (en) | 2005-04-28 |
JP2008195608A (en) | 2008-08-28 |
JP4848384B2 (en) | 2011-12-28 |
US7585432B2 (en) | 2009-09-08 |
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