US20020001725A1 - Low refractive index sio2 film and process for producing the same - Google Patents
Low refractive index sio2 film and process for producing the same Download PDFInfo
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- US20020001725A1 US20020001725A1 US08/985,904 US98590497A US2002001725A1 US 20020001725 A1 US20020001725 A1 US 20020001725A1 US 98590497 A US98590497 A US 98590497A US 2002001725 A1 US2002001725 A1 US 2002001725A1
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- refractive index
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- low refractive
- alkyl group
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- 238000000034 method Methods 0.000 title claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 146
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 73
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 73
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 73
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 73
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 73
- 239000007789 gas Substances 0.000 claims abstract description 54
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 45
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 45
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 42
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 41
- 239000007858 starting material Substances 0.000 claims abstract description 23
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 20
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 19
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 9
- 239000010408 film Substances 0.000 claims description 99
- 239000000758 substrate Substances 0.000 claims description 19
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 11
- -1 TMDSO Chemical compound 0.000 claims description 8
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 5
- UCXUKTLCVSGCNR-UHFFFAOYSA-N diethylsilane Chemical compound CC[SiH2]CC UCXUKTLCVSGCNR-UHFFFAOYSA-N 0.000 claims description 4
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 claims description 4
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 claims description 4
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims description 4
- 150000002894 organic compounds Chemical class 0.000 claims description 4
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical compound [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 claims description 4
- UIDUKLCLJMXFEO-UHFFFAOYSA-N propylsilane Chemical compound CCC[SiH3] UIDUKLCLJMXFEO-UHFFFAOYSA-N 0.000 claims description 4
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 claims description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 abstract description 11
- 239000010410 layer Substances 0.000 description 26
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- 239000000463 material Substances 0.000 description 16
- 229910052786 argon Inorganic materials 0.000 description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 230000001105 regulatory effect Effects 0.000 description 6
- 238000000572 ellipsometry Methods 0.000 description 5
- 229920002799 BoPET Polymers 0.000 description 4
- 239000012159 carrier gas Substances 0.000 description 4
- 208000037998 chronic venous disease Diseases 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010276 construction Methods 0.000 description 4
- 230000005587 bubbling Effects 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000004566 IR spectroscopy Methods 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000006118 anti-smudge coating Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
Definitions
- the present invention relates to a low refractive index SiO 2 film which is applicable to a light antireflection film on various surfaces of curve mirrors, back mirrors, goggles, window glasses, displays of personal computers and word processors, and other various commercial displays.
- antireflection films have been applied to surfaces of various displays of word processors, computers, and televisions, surfaces of various optical lenses and optical articles, and surfaces of window glasses of automobiles and electric railcars to prevent the reflection of light from the above surfaces.
- n 0 ⁇ square root ⁇ square root over ( n g ) ⁇ (1)
- ⁇ 0 represents a specific wavelength
- n 0 represents the refractive index of the antireflection film at this wavelength
- h represents the thickness of the antireflection film
- n g represents the refractive index of the substrate.
- the refractive index n g of glass is about 1.5
- the refractive index no of MgF 2 film is 1.38
- the wavelength ⁇ 0 of incident light is 5500 ⁇ (reference).
- the results of calculation show that the thickness h of the antireflection film is about 0.1 ⁇ m which is the thickness of an optical thin film.
- an optical thin film having such thickness has been used as the antireflection film.
- Vacuum process such as vacuum deposition, sputtering, ion plating, and plasma CVD, have been known to be suitable for the formation of such an optical thin film.
- An SiO 2 film is generally known as a low refractive index film and hence has been extensively used as antireflection films and the like.
- Antireflection films having various layer constructions, however, have been desired to have lower refractive index.
- an object of the present invention is to provide a low refractive index SiO 2 film which uses a starting material for forming an SiO 2 film and has a lower refractive index than the conventional SiO 2 film.
- a low refractive index SiO 2 film comprising an SiO 2 film with a low refractive index element introduced thereinto, the low refractive index element being at least one member selected from the group consisting of a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom.
- Formation of a film in such a state that at least one low refractive index element selected from the group consisting of a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom is introduced into an SiO 2 -forming material, can provide a film having a lower refractive index than the SiO 2 film per se.
- the SiO 2 film with an low refractive index element introduced thereinto according to the present invention has lower refractive index than the SiO 2 film per se and hence is useful as a film as the upper layer in an antireflection film.
- An SiO 2 film with a fluorine atom introduced thereinto is usually in such a state that a silicon atom is bonded to a fluorine atom.
- the bond is likely to be hydrolyzed by moisture in air, causing the low refractive index effect to be lost. Therefore, according to a preferred embodiment of the present invention, an alkyl group with a part or the whole of hydrogen atoms substituted by a fluorine atom is used as the starting material.
- the fluorine atom introduced into the SiO 2 film is bonded to the carbon atom, causing no hydrolysis, which permits the low refractive index effect to be maintained for a long period of time.
- a process for producing a low refractive index SiO 2 film comprising forming a thin film on a substrate by CVD using a starting material gas comprising a gas containing a fluorine atom, a gas containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom.
- a mixed gas comprising a gas containing a fluorine atom, a volatile gas of an organic compound containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom, into a vacuum chamber maintained in a vacuum of 10 ⁇ 3 to 1 mmHg (Torr) and bringing the mixed gas to a plasma stream by glow discharge; and
- the resultant CVD film comprises a substantially inorganic SiO 2 film formed by oxidation of Si atom and, introduced into the SiO 2 film, a fluorine atom and/or an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, that is, a low refractive index element.
- the SiO 2 film with a low refractive index element introduced thereinto has a lower refractive index than an SiO 2 film not using a gas containing a low refractive index element, that is, an SiO 2 film per se. Further, the low refractive index film has high hardness and bond strength.
- FIG. 1 is a schematic diagram showing an embodiment of the construction of a plasma CVD apparatus for producing the low refractive index SiO 2 film according to the present invention.
- FIG. 1 A schematic diagram showing an embodiment of the construction of a plasma CVD apparatus for producing the low refractive index SiO 2 film according to the present invention is shown in FIG. 1.
- numeral 1 designates a vacuum chamber the interior of which can be regulated to a desired degree of vacuum.
- a winding/unwinding mechanism containing a pair of rolls 3 , 4 which can unwind or rewind a web 2 and function to travel the web 2 in a positive direction or in a reverse direction, is disposed within the vacuum chamber 1 .
- a plasma zone 5 is disposed so as to face the surface of the web 2 travelled between the roll 3 and the roll 4 .
- the plasma zone 5 for plasma CVD treatment comprises a section for projecting a mixed starting material gas, a flat electrode 6 , and a film forming drum 7 which can stably travel the web 2 and is grounded.
- the flat electrode 6 may be a gas projecting electrode which projects an inert gas to create plasma.
- a gas containing a fluorine atom, a gas containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom are used as the starting material for forming a low refractive index SiO 2 film by CVD according to the present invention.
- the gas containing a fluorine atom is added in order to make the refractive index of the resultant film lower than that of the SiO 2 film per se, and examples thereof include CF 4 , C 2 F 6 , C 3 F 6 , and SF 6 .
- the material containing a silicon atom and an alkyl group having 1 to 4 carbon atoms is a main starting material for the low refractive index film.
- the alkyl group having 1 to 4 carbon atoms, particularly a methyl or ethyl group, is introduced in order to make the refractive index of the resultant film lower than that of the SiO 2 film per se.
- the starting material containing a silicon atom and an alkyl group having 1 to 4 carbon atoms is gasified upon introduction into the vacuum chamber.
- the reason why the number of carbon atoms of the alkyl group in the material to be gasified is limited to 1 to 4 is that a starting material containing an alkyl group having 5 or more carbon atoms is less likely to be vaporized in CVD, making it difficult to form a low refractive index film.
- Gasifiable starting materials containing a silicon atom and an alkyl group having 1 to 4 carbon atoms include silicon-containing organic compounds, such as hexamethyldisiloxane (abbreviation: HMDSO), tetramethyldisiloxane (abbreviation: TMDSO), octamethylcyclotetrasiloxane, tetraethoxysilane (abbreviation: TEOS), methyltrimethoxysilane (abbreviation: MTMOS), methylsilane, dimethylsilane, trimethylsilane, diethylsilane, propylsilane, and phenylsilane.
- HMDSO hexamethyldisiloxane
- TMDSO tetramethyldisiloxane
- TEOS tetraethoxysilane
- MTMOS methyltrimethoxysilane
- HMDSO is particularly preferred.
- the molecule contains an alkyl group having 1 to 4 carbon atoms, such as a methyl or ethyl group, a silicon atom, and an oxygen atom.
- the material containing a silicon atom and an alkyl group having 1 to 4 carbon atoms as the main starting material is such that a part or the whole of hydrogen atoms in the alkyl group having 1 to 4 carbon atoms has been substituted by a fluorine atom.
- the fluorine atom is stably bonded to the carbon atom to offer the effect of stably maintaining the low refractive index effect.
- Gasifiable starting materials containing a silicon atom and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom
- gasifiable starting materials include HMDSO, TMDSO, octamethylcyclotetrasiloxane, TEOS, MTMOS, methylsilane, dimethylsilane, trimethylsilane, diethylsilane, propylsilane, and phenylsilane, a part or the whole of hydrogen atoms in each of the above compounds being substituted by a fluorine atom.
- the gas containing an oxygen atom is used in order to oxidize the Si material to give SiO 2 .
- gaseous materials may be added to the mixed gas composed of the above gases from the viewpoint of imparting desired properties.
- the flow (SLM) ratio is preferably 1:0.1 to 20.
- the vacuum chamber is preferably kept at a pressure of 10 ⁇ 3 to 1 mmHg (Torr).
- An antireflection film will be described as a preferred example of products with the low refractive index SiO 2 film, according to the present invention, formed thereon.
- a polyethylene terephthalate (PET) substrate (a product of Toray Industries, Inc., tradename: Lumirror T-60, thickness: 100 ⁇ m) is provided as a substrate.
- PET polyethylene terephthalate
- a 125 ⁇ -thick ITO layer, a 250 ⁇ -thick SiO 2 layer, a 1000 ⁇ -thick ITO layer, and a 800 ⁇ -thick SiO 2 layer are laminated in that order on the PET substrate.
- the ITO layer may be formed by any means. In general, however, sputtering is applicable.
- a TiO 2 or other layer formed of a high refractive index material may be used instead of the ITO layer.
- the higher the degree to which the refractive index of the layer underlying the SiO 2 layer is above the refractive index of the SiO 2 layer the better the antireflection effect and consequently the better the performance of the antireflection film.
- electrical conductivity can be imparted to the film, permitting the film to exhibit an electromagnetic shielding property and an antistatic property.
- a fluororesin layer having a thickness of not more than 100 ⁇ may be wet coated thereon from the viewpoint of forming an antismudge coating which functions to enhance the water repellency of the surface, thereby preventing the adhesion of a stain such as a fingerprint.
- the ITO layer and the SiO 2 layer which are first formed on the hard coat layer on the substrate, may be replaced with a wet coat of an organic material.
- Formation of the ITO layer by sputtering takes a lot of time which is causative of increased production cost.
- Such a change in film forming means is advantageous from the viewpoint of the cost.
- the adhesion of the ITO layer formed on the wet coat layer of the organic material is not very good. In this case, a layer having a small thickness (usually not more than 100 ⁇ ) of other material corresponding to an adhesive may be formed between the organic layer and the ITO layer.
- an SiO 2 layer alone may be formed on the hard coat.
- This layer construction is extensively adopted in the antireflection film for LCD from the viewpoint of the cost.
- TAC a product of Fuji Photo Film Co., Ltd., tradename: Fuji Tac, thickness: 100 ⁇ m
- possessing optical properties, that is, not having birefringence may be used as the substrate.
- TMDSO, oxygen, and CF 4 were used as starting material gases, and argon was used as a gas for producing plasma. These gases were introduced, as a mixed gas composed of TMDSO (0.1 SLM), oxygen (20 SLM), CF 4 (0.22 SLM), and argon (0.35 SLM), into a vacuum chamber of a plasma CVD apparatus with a pressure regulated to 40 mTorr (4 ⁇ 10 ⁇ 2 mmHg), and an electric power of 2.1 kW and 40 kHz was applied between the film forming drum and the gas projecting electrode to produce plasma.
- a PET film (a product of Toray Industries, Inc., Japan; tradename: Lumirror T-60, thickness: 100 ⁇ m) as a substrate was fed into and passed through a plasma producing zone at a feed rate of 1.5 m/min to form an SiO 2 film on the substrate.
- the antireflection effect of the SiO 2 film was confirmed as follows. A black vinyl tape was applied to the back surface of the substrate to eliminate the reflection of the back surface. In this state, the reflectance of the front surface in the visible light region was measured at an incident angle of 5°, and the refractive index of the SiO 2 film was evaluated based on the minimum reflectance. As a result, it was found that the minimum reflectance was 1.76% and the refractive index was 1.47.
- the SiO 2 film formed without use of CF 4 had a minimum reflectance of 1.95% and a refractive index of 1.483.
- the SiO 2 film formed using CF 4 in Example 1 had lower reflectance and lower refractive index.
- Oxygen was used as a part of the starting material, and argon was used as a carrier gas for producing plasma. These gases were introduced, as a mixed gas composed of oxygen (30 sccm) and argon (30 sccm), into a vacuum chamber of a plasma CVD apparatus with a pressure regulated to 40 mTorr. HMDSO (hexamethyldisiloxane) as a monomer material was bubbled by this carrier gas to feed the monomer material into the vacuum chamber of the CVD apparatus with a pressure regulated to 40 mTorr. The bubbling temperature was room temperature. Plasma was produced by applying an electric power of 100 W and 13.56 MHz across the upper electrode and the earth electrode.
- HMDSO hexamethyldisiloxane
- a PET film [a product of Toray Industries, Inc., tradename: Lumirror T-60, thickness: 100 ⁇ m] was used as a substrate, and the film formation time was 10 min.
- the refractive index of the film thus formed was measured by ellipsometry and found to be 1.42.
- the film was analyzed by IR spectrometry for the presence of a CH 3 group. As a result, a peak derived from stretching of an Si—CH 3 bond appeared around 1277 cm ⁇ 1, indicating the presence of the CH 3 group.
- Example 2 For comparison, the procedure of Example 2 was repeated, except that the flow rate of oxygen was 100 sccm. Thus, an SiO 2 film of Comparative Example 2 was formed. The SiO 2 film was analyzed by IR spectroscopy. As a result, the presence of a CH 3 group was hardly observed. The refractive index of the SiO 2 film formed in Comparative Example 2 was measured by ellipsometry and found to be 1.44, which was higher than the refractive index of the SiO 2 film, with the CH 3 group introduced thereinto, prepared in Example 2.
- a PET film (a product of Toray Industries, Inc., tradename: Lumirror T-60, thickness: 100 ⁇ m) was provided as a substrate.
- Oxygen, argon, and CF 4 were used as the starting material gases.
- HMDSO hexamethyldisiloxane
- the gas flow rate was 30 sccm for oxygen, 30 sccm for argon, and 30 sccm for CF 4 .
- the monomer material was bubbled using the argon gas as a carrier gas and fed into a vacuum chamber of a plasma CVD apparatus with the pressure being regulated to 40 mTorr. The bubbling temperature was room temperature.
- a PET film (a product of Toray Industries, Inc., tradename: Lumirror T-60, thickness: 100 ⁇ m) was provided as a substrate.
- Oxygen and argon were used as the starting material gases.
- HMDSO hexamethyldisiloxane
- the gas flow rate was 30 sccm for oxygen and 30 sccm for argon.
- the monomer material was bubbled using the argon gas as a carrier gas and fed into a vacuum chamber of a plasma CVD apparatus with the pressure being regulated to 40 mTorr. The bubbling temperature was room temperature.
- the refractive index SiO 2 film with at least one low refractive index element selected from a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms thereof being substituted by a fluorine atom has lower refractive index than the SiO 2 film with no low refractive index element introduced thereinto.
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Abstract
A low refractive index SiO2 film is provided which uses a starting material for forming an SiO2 film and has a lower refractive index than the conventional SiO2 film.
A starting material gas comprising a gas containing a fluorine atom, a gas containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom is subjected to plasma CVD in a vacuum chamber 1 to form an SiO2 film on a web 2 in a plasma zone 5. The SiO2 film thus formed has, introduced thereinto, at least one low refractive index element selected from a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and the SiO2 film with the low refractive index element introduced thereinto has a lower refractive index than an SiO2 film with the low refractive index element not introduced thereinto.
Description
- The present invention relates to a low refractive index SiO2 film which is applicable to a light antireflection film on various surfaces of curve mirrors, back mirrors, goggles, window glasses, displays of personal computers and word processors, and other various commercial displays.
- In recent years, antireflection films have been applied to surfaces of various displays of word processors, computers, and televisions, surfaces of various optical lenses and optical articles, and surfaces of window glasses of automobiles and electric railcars to prevent the reflection of light from the above surfaces.
- An about 0.1 μm-thick thin film of MgF2 formed on glass will be described as an example of the antireflection film. It is already known that, when incident light perpendicularly enters a thin film, in order for the antireflection film to prevent the reflection of light by 100% and to pass light by 100% therethrough, relationships represented by the equations (1) and (2) should be met (see “Science Library” Physics=9 “Optics,” pp.70-72, 1980, Science Sha Ltd., Japan).
- n 0={square root}{square root over (n g)} (1)
- n 0 h=λ0/4 (2)
- wherein λ0 represents a specific wavelength, n0 represents the refractive index of the antireflection film at this wavelength, h represents the thickness of the antireflection film, and ng represents the refractive index of the substrate.
- It is already known that the refractive index ng of glass is about 1.5, the refractive index no of MgF2 film is 1.38, and the wavelength λ0 of incident light is 5500 Å (reference). When these values are substituted in the equation (2), the results of calculation show that the thickness h of the antireflection film is about 0.1 μm which is the thickness of an optical thin film. For this reason, an optical thin film having such thickness has been used as the antireflection film. Vacuum process, such as vacuum deposition, sputtering, ion plating, and plasma CVD, have been known to be suitable for the formation of such an optical thin film.
- From the equation (1), it is apparent that prevention of the reflection of light by 100% can be attained by the selection of such a material that the refractive index of the upper coating is approximately equal to a value of square root of the refractive index of the lower coating. The antireflection of light by utilizing the above principle to make the refractive index of the upper coating lower than the refractive index of the lower coating, that is, by providing a thin film of a high refractive index layer and a thin film of a low refractive index layer in that order on a substrate, has hitherto been performed in the art.
- An SiO2 film is generally known as a low refractive index film and hence has been extensively used as antireflection films and the like. Antireflection films having various layer constructions, however, have been desired to have lower refractive index.
- Accordingly, an object of the present invention is to provide a low refractive index SiO2 film which uses a starting material for forming an SiO2 film and has a lower refractive index than the conventional SiO2 film.
- According to one aspect of the present invention, there is provided a low refractive index SiO2 film comprising an SiO2 film with a low refractive index element introduced thereinto, the low refractive index element being at least one member selected from the group consisting of a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom.
- Formation of a film in such a state that at least one low refractive index element selected from the group consisting of a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom is introduced into an SiO2-forming material, can provide a film having a lower refractive index than the SiO2 film per se. The SiO2 film with an low refractive index element introduced thereinto according to the present invention has lower refractive index than the SiO2 film per se and hence is useful as a film as the upper layer in an antireflection film.
- An SiO2 film with a fluorine atom introduced thereinto is usually in such a state that a silicon atom is bonded to a fluorine atom. Upon exposure of the SiO2 film having this bond to an atmosphere having an excessive water vapor content, the bond is likely to be hydrolyzed by moisture in air, causing the low refractive index effect to be lost. Therefore, according to a preferred embodiment of the present invention, an alkyl group with a part or the whole of hydrogen atoms substituted by a fluorine atom is used as the starting material. In this case, the fluorine atom introduced into the SiO2 film is bonded to the carbon atom, causing no hydrolysis, which permits the low refractive index effect to be maintained for a long period of time.
- According to another aspect of the present invention, there is provided a process for producing a low refractive index SiO2 film, comprising forming a thin film on a substrate by CVD using a starting material gas comprising a gas containing a fluorine atom, a gas containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom.
- According to a further aspect of the present invention, there is provided a process for producing a low refractive index SiO2 film, comprising the steps of:
- (1) introducing a mixed gas, comprising a gas containing a fluorine atom, a volatile gas of an organic compound containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom, into a vacuum chamber maintained in a vacuum of 10−3 to 1 mmHg (Torr) and bringing the mixed gas to a plasma stream by glow discharge; and
- (2) bringing the plasma stream into contact with the surface of a substrate disposed within the vacuum chamber to form a thin film on the substrate.
- According to the present invention, since a mixed gas, comprising a gas containing a fluorine atom, a volatile gas of an organic compound containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom, is used in the formation of a film by CVD, the resultant CVD film comprises a substantially inorganic SiO2 film formed by oxidation of Si atom and, introduced into the SiO2 film, a fluorine atom and/or an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, that is, a low refractive index element. The SiO2 film with a low refractive index element introduced thereinto has a lower refractive index than an SiO2 film not using a gas containing a low refractive index element, that is, an SiO2 film per se. Further, the low refractive index film has high hardness and bond strength.
- FIG. 1 is a schematic diagram showing an embodiment of the construction of a plasma CVD apparatus for producing the low refractive index SiO2 film according to the present invention.
- A schematic diagram showing an embodiment of the construction of a plasma CVD apparatus for producing the low refractive index SiO2 film according to the present invention is shown in FIG. 1. In FIG. 1, numeral 1 designates a vacuum chamber the interior of which can be regulated to a desired degree of vacuum. A winding/unwinding mechanism containing a pair of
rolls web 2 and function to travel theweb 2 in a positive direction or in a reverse direction, is disposed within the vacuum chamber 1. Aplasma zone 5 is disposed so as to face the surface of theweb 2 travelled between theroll 3 and theroll 4. Theplasma zone 5 for plasma CVD treatment comprises a section for projecting a mixed starting material gas, aflat electrode 6, and afilm forming drum 7 which can stably travel theweb 2 and is grounded. Theflat electrode 6 may be a gas projecting electrode which projects an inert gas to create plasma. - A gas containing a fluorine atom, a gas containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom are used as the starting material for forming a low refractive index SiO2 film by CVD according to the present invention.
- The gas containing a fluorine atom is added in order to make the refractive index of the resultant film lower than that of the SiO2 film per se, and examples thereof include CF4, C2F6, C3F6, and SF6.
- The material containing a silicon atom and an alkyl group having 1 to 4 carbon atoms is a main starting material for the low refractive index film. The alkyl group having 1 to 4 carbon atoms, particularly a methyl or ethyl group, is introduced in order to make the refractive index of the resultant film lower than that of the SiO2 film per se. The starting material containing a silicon atom and an alkyl group having 1 to 4 carbon atoms is gasified upon introduction into the vacuum chamber. In the present invention, the reason why the number of carbon atoms of the alkyl group in the material to be gasified is limited to 1 to 4 is that a starting material containing an alkyl group having 5 or more carbon atoms is less likely to be vaporized in CVD, making it difficult to form a low refractive index film.
- Gasifiable starting materials containing a silicon atom and an alkyl group having 1 to 4 carbon atoms include silicon-containing organic compounds, such as hexamethyldisiloxane (abbreviation: HMDSO), tetramethyldisiloxane (abbreviation: TMDSO), octamethylcyclotetrasiloxane, tetraethoxysilane (abbreviation: TEOS), methyltrimethoxysilane (abbreviation: MTMOS), methylsilane, dimethylsilane, trimethylsilane, diethylsilane, propylsilane, and phenylsilane. Preferred are HMDSO, TMDSO, and TEOS. HMDSO is particularly preferred. For each of these preferred and particularly preferred compounds, the molecule contains an alkyl group having 1 to 4 carbon atoms, such as a methyl or ethyl group, a silicon atom, and an oxygen atom.
- According to a further preferred embodiment of the present invention, the material containing a silicon atom and an alkyl group having 1 to 4 carbon atoms as the main starting material is such that a part or the whole of hydrogen atoms in the alkyl group having 1 to 4 carbon atoms has been substituted by a fluorine atom. In this case, the fluorine atom is stably bonded to the carbon atom to offer the effect of stably maintaining the low refractive index effect.
- Gasifiable starting materials, containing a silicon atom and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, usable herein include HMDSO, TMDSO, octamethylcyclotetrasiloxane, TEOS, MTMOS, methylsilane, dimethylsilane, trimethylsilane, diethylsilane, propylsilane, and phenylsilane, a part or the whole of hydrogen atoms in each of the above compounds being substituted by a fluorine atom.
- The gas containing an oxygen atom is used in order to oxidize the Si material to give SiO2.
- Further, other gaseous materials may be added to the mixed gas composed of the above gases from the viewpoint of imparting desired properties.
- In the introduction of the mixed gas comprising the Si material gas and the fluorine gas into the vacuum chamber, the flow (SLM) ratio is preferably 1:0.1 to 20.
- In plasma CVD, the vacuum chamber is preferably kept at a pressure of 10−3 to 1 mmHg (Torr).
- An antireflection film will be described as a preferred example of products with the low refractive index SiO2 film, according to the present invention, formed thereon. A polyethylene terephthalate (PET) substrate (a product of Toray Industries, Inc., tradename: Lumirror T-60, thickness: 100 μm) is provided as a substrate. A 125 Å-thick ITO layer, a 250 Å-thick SiO2 layer, a 1000 Å-thick ITO layer, and a 800 Å-thick SiO2 layer are laminated in that order on the PET substrate. The ITO layer may be formed by any means. In general, however, sputtering is applicable. Instead of the ITO layer, a TiO2 or other layer formed of a high refractive index material may be used. In this case, the higher the degree to which the refractive index of the layer underlying the SiO2 layer is above the refractive index of the SiO2 layer, the better the antireflection effect and consequently the better the performance of the antireflection film. Further, when the ITO layer is used, electrical conductivity can be imparted to the film, permitting the film to exhibit an electromagnetic shielding property and an antistatic property. A fluororesin layer having a thickness of not more than 100 Å may be wet coated thereon from the viewpoint of forming an antismudge coating which functions to enhance the water repellency of the surface, thereby preventing the adhesion of a stain such as a fingerprint.
- In the above antireflection film, the ITO layer and the SiO2 layer, which are first formed on the hard coat layer on the substrate, may be replaced with a wet coat of an organic material. Formation of the ITO layer by sputtering takes a lot of time which is causative of increased production cost. Such a change in film forming means is advantageous from the viewpoint of the cost. The adhesion of the ITO layer formed on the wet coat layer of the organic material is not very good. In this case, a layer having a small thickness (usually not more than 100 Å) of other material corresponding to an adhesive may be formed between the organic layer and the ITO layer.
- If the antireflection property required is not very high (for example, when the formation of a low reflective film is contemplated), an SiO2 layer alone may be formed on the hard coat. This layer construction is extensively adopted in the antireflection film for LCD from the viewpoint of the cost. In this case, TAC (a product of Fuji Photo Film Co., Ltd., tradename: Fuji Tac, thickness: 100 μm) possessing optical properties, that is, not having birefringence, may be used as the substrate.
- The process for producing the low refractive index SiO2 film of the present invention by plasma CVD will be described with reference to the following examples.
- TMDSO, oxygen, and CF4 were used as starting material gases, and argon was used as a gas for producing plasma. These gases were introduced, as a mixed gas composed of TMDSO (0.1 SLM), oxygen (20 SLM), CF4 (0.22 SLM), and argon (0.35 SLM), into a vacuum chamber of a plasma CVD apparatus with a pressure regulated to 40 mTorr (4×10−2 mmHg), and an electric power of 2.1 kW and 40 kHz was applied between the film forming drum and the gas projecting electrode to produce plasma. On the other hand, a PET film (a product of Toray Industries, Inc., Japan; tradename: Lumirror T-60, thickness: 100 μm) as a substrate was fed into and passed through a plasma producing zone at a feed rate of 1.5 m/min to form an SiO2 film on the substrate.
- The antireflection effect of the SiO2 film was confirmed as follows. A black vinyl tape was applied to the back surface of the substrate to eliminate the reflection of the back surface. In this state, the reflectance of the front surface in the visible light region was measured at an incident angle of 5°, and the refractive index of the SiO2 film was evaluated based on the minimum reflectance. As a result, it was found that the minimum reflectance was 1.76% and the refractive index was 1.47.
- For comparison, a film of Comparative Example 1 was formed in the same manner as in Example 1, except that CF4 alone was omitted.
- As a result, the SiO2 film formed without use of CF4 had a minimum reflectance of 1.95% and a refractive index of 1.483. Thus, the SiO2 film formed using CF4 in Example 1 had lower reflectance and lower refractive index.
- Oxygen was used as a part of the starting material, and argon was used as a carrier gas for producing plasma. These gases were introduced, as a mixed gas composed of oxygen (30 sccm) and argon (30 sccm), into a vacuum chamber of a plasma CVD apparatus with a pressure regulated to 40 mTorr. HMDSO (hexamethyldisiloxane) as a monomer material was bubbled by this carrier gas to feed the monomer material into the vacuum chamber of the CVD apparatus with a pressure regulated to 40 mTorr. The bubbling temperature was room temperature. Plasma was produced by applying an electric power of 100 W and 13.56 MHz across the upper electrode and the earth electrode.
- A PET film [a product of Toray Industries, Inc., tradename: Lumirror T-60, thickness: 100 μm] was used as a substrate, and the film formation time was 10 min. The refractive index of the film thus formed was measured by ellipsometry and found to be 1.42. The film was analyzed by IR spectrometry for the presence of a CH3 group. As a result, a peak derived from stretching of an Si—CH3 bond appeared around 1277 cm−1, indicating the presence of the CH3 group.
- For comparison, the procedure of Example 2 was repeated, except that the flow rate of oxygen was 100 sccm. Thus, an SiO2 film of Comparative Example 2 was formed. The SiO2 film was analyzed by IR spectroscopy. As a result, the presence of a CH3 group was hardly observed. The refractive index of the SiO2 film formed in Comparative Example 2 was measured by ellipsometry and found to be 1.44, which was higher than the refractive index of the SiO2 film, with the CH3 group introduced thereinto, prepared in Example 2.
- A PET film (a product of Toray Industries, Inc., tradename: Lumirror T-60, thickness: 100 μm) was provided as a substrate. Oxygen, argon, and CF4 were used as the starting material gases. Further, HMDSO (hexamethyldisiloxane) was used as the monomer material. The gas flow rate was 30 sccm for oxygen, 30 sccm for argon, and 30 sccm for CF4. The monomer material was bubbled using the argon gas as a carrier gas and fed into a vacuum chamber of a plasma CVD apparatus with the pressure being regulated to 40 mTorr. The bubbling temperature was room temperature.
- An electric power of 100 W and 13.56 MHz was applied across the upper electrode and the earth electrode to produce plasma. The film formation time was 10 min. The refractive index of the SiO2 film with fluorine atom introduced thereinto was measured by ellipsometry and found to be 1.40.
- For comparison, in the formation of an SiO2 film, CF4 was not used to form an SiO2 film with a fluorine atom not introduced thereinto, and the refractive index of the SiO2 film with no fluorine atom introduced thereinto was measured by ellipsometry and found to be 1.42, which was higher than the refractive index (1.40) of the SiO2 film, with the fluorine atom introduced thereinto, prepared in Example 3.
- A PET film (a product of Toray Industries, Inc., tradename: Lumirror T-60, thickness: 100 μm) was provided as a substrate. Oxygen and argon were used as the starting material gases. Further, HMDSO (hexamethyldisiloxane) with H in the CH3 thereof being substituted by F was used as the monomer material. The gas flow rate was 30 sccm for oxygen and 30 sccm for argon. The monomer material was bubbled using the argon gas as a carrier gas and fed into a vacuum chamber of a plasma CVD apparatus with the pressure being regulated to 40 mTorr. The bubbling temperature was room temperature.
- An electric power of 100 W and 13.56 MHz was applied across the upper electrode and the earth electrode to produce plasma. The film formation time was 10 min. The refractive index of the SiO2 film was measured by ellipsometry and found to be 1.40.
- For both the SiO2 film formed in this example (Example 4) and the SiO2 film formed in Example 3, the initial refractive index was 1.40. These SiO2 films were allowed to stand for three days under high temperature and high humidity conditions (80° C., 95% RH). As a result, the SiO2 film formed in Example 4 underwent no change in refractive index, whereas the refractive index of the SiO2 film prepared in Example 3 was increased to 1.45. This demonstrates that, in the SiO2 film with a fluorine atom introduced thereinto, use of HMDSO, with H in the CH3 group substituted by F, rather than use of CF4 resulted in better high temperature and high moisture resistance.
- The refractive index SiO2 film with at least one low refractive index element selected from a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms thereof being substituted by a fluorine atom has lower refractive index than the SiO2 film with no low refractive index element introduced thereinto.
Claims (8)
1. A low refractive index SiO2 film comprising an SiO2 film with a low refractive index element introduced thereinto, the low refractive index element being at least one member selected from the group consisting of a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom.
2. The low refractive index SiO2 film according to claim 1 , which is adapted for use as an antireflection film.
3. The low refractive index SiO2 film according to claim 1 , which has been prepared by CVD using at least one starting material selected from the group consisting of a gas containing a fluorine atoms, a starting material containing a silicon atom and an alkyl group having 1 to 4 carbon atoms, and a starting material containing a silicon atom and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom.
4. The low refractive index SiO2 film/according to claim 3 , wherein the gas containing a fluorine atom is selected from the group consisting of CF4, C2F6, C3F6, and SF6.
5. The low refractive index SiO2 film according to claim 3 , wherein the starting material containing a silicon atom and an alkyl group having 1 to 4 carbon atoms comprises at least one compound selected from the group consisting of HMDSO, TMDSO, octamethylcyclotetrasiloxane, TEOS, MTMOS, methylsilane, dimethylsilane, trimethylsilane, diethylsilane, propylsilane, and phenylsilane.
6. The low refractive index SiO2 film according to claim 3 , wherein the starting material containing a silicon atom and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom comprises at least one compound selected from the group consisting of HMDSO, TMDSO, octamethylcyclotetrasiloxane, TEOS, MTMOS, methylsilane, dimethylsilane, trimethylsilane, diethylsilane, propylsilane, and phenylsilane, a part or the whole of hydrogen atoms in each of said compounds being substituted by a fluorine atom.
7. A process for producing a low refractive index SiO2 film, comprising forming a thin film on a substrate by CVD using a starting material gas comprising a gas containing a fluorine atom, a gas containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom.
8. A process for producing a low refractive index SiO2 film, comprising the steps of:
(1) introducing a mixed gas, comprising a gas containing a fluorine atom, a volatile gas of an organic compound containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom, into a vacuum chamber maintained in a vacuum of 10−3 to 1 mmHg (Torr) and bringing the mixed gas to a plasma stream by glow discharge; and
(2) bringing the plasma stream into contact with the surface of a substrate disposed within the vacuum chamber to form a thin film on the substrate.
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US10/470,580 US7348041B2 (en) | 1996-12-18 | 2003-04-09 | Antireflection film made of a CVD SiO2 film containing a fluoro and/or alkyl modifier |
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JP354141/1996 | 1996-12-18 | ||
JP35414196 | 1996-12-18 | ||
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JP31599297A JP3773340B2 (en) | 1996-12-18 | 1997-10-31 | Low refractive index SiO2 film and manufacturing method thereof |
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CN113439222A (en) * | 2019-02-05 | 2021-09-24 | 蒙特利尔综合理工学院公司 | Article coated with a low refractive index layer based on a fluorinated organosilicon compound |
US12117591B2 (en) | 2019-02-05 | 2024-10-15 | Corporation De L'ecole Polytechnique De Montreal | Article coated with a low refractive index layer based on fluorinated organosilicon compounds |
US12210136B2 (en) | 2019-02-05 | 2025-01-28 | Essilor International | Article coated with an antireflective coating having improved optical properties |
US20220235240A1 (en) * | 2019-07-26 | 2022-07-28 | Jiangsu Favored Nanotechnology Co., Ltd. | Water-resistant nanofilm, preparation method and article thereof |
US12173175B2 (en) * | 2019-07-26 | 2024-12-24 | Jiangsu Favored Nanotechnology Co., Ltd. | Water-resistant nanofilm, preparation method and article thereof |
Also Published As
Publication number | Publication date |
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EP0849374A2 (en) | 1998-06-24 |
US7348041B2 (en) | 2008-03-25 |
US20040157061A1 (en) | 2004-08-12 |
JPH10230561A (en) | 1998-09-02 |
EP0849374A3 (en) | 1999-06-30 |
EP0849374B1 (en) | 2004-06-09 |
DE69729429T2 (en) | 2005-06-16 |
JP3773340B2 (en) | 2006-05-10 |
DE69729429D1 (en) | 2004-07-15 |
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