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US20010014266A1 - Dual cassette load lock - Google Patents

Dual cassette load lock Download PDF

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Publication number
US20010014266A1
US20010014266A1 US09/070,854 US7085498A US2001014266A1 US 20010014266 A1 US20010014266 A1 US 20010014266A1 US 7085498 A US7085498 A US 7085498A US 2001014266 A1 US2001014266 A1 US 2001014266A1
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United States
Prior art keywords
chamber
workpiece
cassette
wafers
door
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Granted
Application number
US09/070,854
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US6454508B2 (en
Inventor
Masato M. Toshima
Phil M. Salzman
Steven C. Murdoch
Cheng Wang
Mark A. Stenholm
James Howard
Leonard Hall
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Individual
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Individual
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Application filed by Individual filed Critical Individual
Priority to US09/070,854 priority Critical patent/US6454508B2/en
Publication of US20010014266A1 publication Critical patent/US20010014266A1/en
Priority to US10/223,540 priority patent/US20030002960A1/en
Application granted granted Critical
Publication of US6454508B2 publication Critical patent/US6454508B2/en
Priority to US11/410,797 priority patent/US20060245854A1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67754—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a batch of workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

Definitions

  • the present invention relates to a front end loading interface used in the loading of workpieces in semiconductor processing equipment.
  • a workpiece loading interface is presented for inclusion within a workpiece processing system.
  • the workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down.
  • a first cassette of workpieces, typically wafers, from a first chamber are being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber may then be pumped down. This can significantly increase throughput of wafers through the workpiece processing system.
  • each chamber is designed to minimize intrusion to a clean room.
  • a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge.
  • the cassette of wafers is on a support with no side panels, facilitating the replacement of a cassette of processed wafers with a cassette of unprocessed wafers by an automated device.
  • the cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.
  • FIG. 1 shows a top view of a block diagram of semiconductor processing equipment which includes two cassette load locks in accordance with the preferred embodiment of the present invention.
  • FIG. 2 shows a block diagram of a load lock which is part of the semiconductor processing equipment shown in FIG. 1 in accordance with the preferred embodiment of the present invention.
  • FIG. 3 shows a second block diagram of the load lock shown in FIG. 2 in accordance with the preferred embodiment of the present invention.
  • FIG. 4 shows another block diagram of the load lock shown in FIG. 2 in accordance with the preferred embodiment of the present invention.
  • FIG. 5 is a block diagram of a cassette wafer holder in a position extended out of the load lock shown in FIG. 2 in accordance with the preferred embodiment of the present invention.
  • FIG. 6 is a block diagram of the cassette wafer shown in FIG. 5 in an upright position within the load lock shown in FIG. 2 in accordance with the preferred embodiment of the present invention.
  • FIG. 1 a top view of semiconductor processing equipment 1 is shown.
  • Semiconductor processing equipment 1 may be used, for example, for etching wafers.
  • Semiconductor processing equipment 1 includes, for example, a processing chamber 3 , a processing chamber 4 , a processing chamber 5 and a processing chamber 6 .
  • a central chamber 2 may be used to temporarily store wafers on robotic equipment 7 when wafers are being moved to or from various of the processing chambers.
  • Semiconductor processing equipment 1 also includes dual cassette load locks.
  • a wafer cassette 16 holds wafers 10 .
  • a wafer cassette 17 holds wafers 11 .
  • Wafer tray 17 pivots around a pivot point 15 .
  • wafer tray 17 is flush against a gate 13 , as shown, and easily accessed by robotic equipment 7 for transportation into central chamber 2 .
  • wafer tray 17 is pivoted back from gate 13 in preparation for the opening of chamber 9 and removal of wafer tray 17 .
  • wafer tray 16 pivots around a pivot point 14 .
  • wafer tray 16 When wafers 10 from tray 16 are accessed by semiconductor processing equipment 1 for processing, wafer tray 16 is flush against a gate 12 and easily accessed by robotic equipment 7 for transportation into central chamber 2 .
  • wafer tray 16 When wafer tray 16 is ready to be removed from chamber 8 , wafer tray 16 may be pivoted back an angle 18 from gate 12 , as shown, in preparation for the opening of chamber 8 and removal of wafer tray 16 . In the preferred embodiment, angle 18 is about twenty-one degrees.
  • Chamber 8 and chamber 9 may be separately and individually pumped down.
  • a vacuum pump 19 is able to provide a vacuum in chamber 8 .
  • a vacuum pump 20 is able to provide a vacuum in chamber 9 .
  • FIG. 1 vacuum pumps 19 and 20 are shown in schematic form. Typically pumps 19 and 20 would reside within semiconductor processing equipment 1 . Further, while FIG. 1 shows two separate pumps, a single pump could be used to separately and individually pump down chamber 8 and chamber 9 .
  • FIG. 2 shows a simplified block diagram front view of wafer chamber 8 .
  • the volume of chamber 8 is 46 liters.
  • a door 21 is shown in a closed position.
  • Door 21 includes an observation window 22 .
  • Door 21 is opened and closed using a pneumatic actuator within a rod 24 .
  • Magnets in the pneumatic actuator interface attract an outer ring 26 .
  • Outer ring 26 is connected to door 21 through an assembly 23 .
  • FIG. 3 shows door 21 lowered into an open position.
  • An opening 25 may be fifteen inches high and ten and one half inches wide. By opening down, the intrusion of door 21 into a clean room may be minimized. In the preferred embodiment the total intrusion is about one inch.
  • wafer tray 16 may then be lowered out of chamber 8 , much like a draw bridge is lowered at a castle entrance. Wafer tray 16 may then be removed and a new wafer tray placed upon support structure 43 .
  • Support structure 43 is designed with a hollow bottom so that when door 21 is opened and wafer tray 16 is lowered, a laminar airflow may sweep downward through wafers 10 .
  • FIG. 4 additional detail of the mechanism which controls the opening and shutting of door 21 is shown.
  • a side panel 31 of door 21 is connected to a carriage 30 by a spring 34 , a link 36 and a link 35 .
  • door 21 travels up and down parallel to a rail 50 .
  • door 21 is stopped by an abutment 32 ; however, carriage 30 continues upward, expanding spring 34 , until a gap 33 is completely closed.
  • carriage 30 continues moving upward, a pivot 39 connected to link 36 , and a pivot 40 connected to link 35 continue moving upward.
  • a pivot 37 connected to link 36 and a pivot 38 connected to link 35 cause door 21 to move towards carriage 30 . Therefore, as gap 33 is closed, links 35 and 36 translate the upward motion of carriage 30 into horizontal motion of door 21 .
  • Door 21 is thus brought snug against, and hence seals chamber 8 .
  • spring 34 compresses causing gap 33 to reappear and links 35 and 36 to straighten, thus moving door 21 horizontally away from chamber 8 .
  • FIGS. 5 and 6 show a block diagram of one possible implementation of an assembly for guiding the lowering and raising of support structure 43 .
  • support structure 43 and cassette 16 are shown lowered out of chamber 8 .
  • a roller 44 connected to support structure 43 is shown resting on an extension of a cam containing slot 46 within chamber 8 .
  • a roller 45 also connected to support structure 43 , is shown at a first end of a slot track 46 .
  • support structure 43 and cassette 16 are shown in the upright position within chamber 8 . In this position, wafers 10 are horizontal and are stacked so that they are ready to be accessed by semiconductor processing equipment 1 .
  • roller 45 is rolled to a second end of slot track 46 and roller 44 rests against a stop 49 . Stop 49 is an extension of the cam which contains slot 46 .

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.

Description

    BACKGROUND
  • The present invention relates to a front end loading interface used in the loading of workpieces in semiconductor processing equipment. [0001]
  • Semiconductor processing equipment often has a plurality of chambers in which processing occurs. Arm assemblies or other robotic devices are generally used to move workpieces, generally wafers from a wafer queuing station to various chambers for processing. When the processing is finished the wafer is returned to the queuing station. For an example of prior art processing equipment, see U.S. Pat. No. 4,715,921 issued to Maher, et al. for a Quad Processor. [0002]
  • Semiconductor processing is typically done in a vacuum. Therefore, a wafer queuing station into which is placed a cassette of wafers to be processed must be pumped down before the wafers may be accessed. This significantly increases the time the semiconductor processing equipment is idle while waiting for a cassette of processed wafers to be exchanged for a cassette of unprocessed wafers and subsequent pumping down of the wafer queuing station. [0003]
    • SUMMARY OF THE INVENTION
  • In accordance with the preferred embodiment of the present invention, a workpiece loading interface is presented for inclusion within a workpiece processing system. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of workpieces, typically wafers, from a first chamber are being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber may then be pumped down. This can significantly increase throughput of wafers through the workpiece processing system. [0004]
  • In the preferred embodiment, each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette of wafers is on a support with no side panels, facilitating the replacement of a cassette of processed wafers with a cassette of unprocessed wafers by an automated device. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber. [0005]
    • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 shows a top view of a block diagram of semiconductor processing equipment which includes two cassette load locks in accordance with the preferred embodiment of the present invention. [0006]
  • FIG. 2 shows a block diagram of a load lock which is part of the semiconductor processing equipment shown in FIG. 1 in accordance with the preferred embodiment of the present invention. [0007]
  • FIG. 3 shows a second block diagram of the load lock shown in FIG. 2 in accordance with the preferred embodiment of the present invention. [0008]
  • FIG. 4 shows another block diagram of the load lock shown in FIG. 2 in accordance with the preferred embodiment of the present invention. [0009]
  • FIG. 5 is a block diagram of a cassette wafer holder in a position extended out of the load lock shown in FIG. 2 in accordance with the preferred embodiment of the present invention. [0010]
  • FIG. 6 is a block diagram of the cassette wafer shown in FIG. 5 in an upright position within the load lock shown in FIG. 2 in accordance with the preferred embodiment of the present invention. [0011]
    • DESCRIPTION OF THE PREFERRED EMBODIMENT
  • In FIG. 1, a top view of semiconductor processing equipment [0012] 1 is shown. Semiconductor processing equipment 1 may be used, for example, for etching wafers.
  • Semiconductor processing equipment [0013] 1, includes, for example, a processing chamber 3, a processing chamber 4, a processing chamber 5 and a processing chamber 6. A central chamber 2 may be used to temporarily store wafers on robotic equipment 7 when wafers are being moved to or from various of the processing chambers.
  • Semiconductor processing equipment [0014] 1 also includes dual cassette load locks. In chamber 8, a wafer cassette 16 holds wafers 10. In chamber 9, a wafer cassette 17 holds wafers 11. Wafer tray 17 pivots around a pivot point 15. When wafers 11 from tray 17 are accessed by semiconductor processing equipment 1 for processing, wafer tray 17 is flush against a gate 13, as shown, and easily accessed by robotic equipment 7 for transportation into central chamber 2. When wafer tray 17 is ready to be removed from chamber 9, wafer tray 17 is pivoted back from gate 13 in preparation for the opening of chamber 9 and removal of wafer tray 17.
  • Similarly, wafer tray [0015] 16 pivots around a pivot point 14. When wafers 10 from tray 16 are accessed by semiconductor processing equipment 1 for processing, wafer tray 16 is flush against a gate 12 and easily accessed by robotic equipment 7 for transportation into central chamber 2. When wafer tray 16 is ready to be removed from chamber 8, wafer tray 16 may be pivoted back an angle 18 from gate 12, as shown, in preparation for the opening of chamber 8 and removal of wafer tray 16. In the preferred embodiment, angle 18 is about twenty-one degrees.
  • [0016] Chamber 8 and chamber 9 may be separately and individually pumped down. A vacuum pump 19 is able to provide a vacuum in chamber 8. A vacuum pump 20 is able to provide a vacuum in chamber 9. In FIG. 1, vacuum pumps 19 and 20 are shown in schematic form. Typically pumps 19 and 20 would reside within semiconductor processing equipment 1. Further, while FIG. 1 shows two separate pumps, a single pump could be used to separately and individually pump down chamber 8 and chamber 9.
  • FIG. 2 shows a simplified block diagram front view of [0017] wafer chamber 8. In the preferred embodiment, the volume of chamber 8 is 46 liters. A door 21 is shown in a closed position. Door 21 includes an observation window 22. Door 21 is opened and closed using a pneumatic actuator within a rod 24. Magnets in the pneumatic actuator interface attract an outer ring 26. Outer ring 26 is connected to door 21 through an assembly 23.
  • FIG. 3 [0018] shows door 21 lowered into an open position. An opening 25, for example, may be fifteen inches high and ten and one half inches wide. By opening down, the intrusion of door 21 into a clean room may be minimized. In the preferred embodiment the total intrusion is about one inch.
  • Once [0019] door 21 is lowered, wafer tray 16, on a support structure 43, may then be lowered out of chamber 8, much like a draw bridge is lowered at a castle entrance. Wafer tray 16 may then be removed and a new wafer tray placed upon support structure 43. Support structure 43 is designed with a hollow bottom so that when door 21 is opened and wafer tray 16 is lowered, a laminar airflow may sweep downward through wafers 10.
  • In FIG. 4, additional detail of the mechanism which controls the opening and shutting of [0020] door 21 is shown. A side panel 31 of door 21 is connected to a carriage 30 by a spring 34, a link 36 and a link 35. As controlled by the pneumatic actuator within rod 24, door 21 travels up and down parallel to a rail 50. When being closed, door 21 is stopped by an abutment 32; however, carriage 30 continues upward, expanding spring 34, until a gap 33 is completely closed. While carriage 30 continues moving upward, a pivot 39 connected to link 36, and a pivot 40 connected to link 35 continue moving upward. However, a pivot 37 connected to link 36 and a pivot 38 connected to link 35 cause door 21 to move towards carriage 30. Therefore, as gap 33 is closed, links 35 and 36 translate the upward motion of carriage 30 into horizontal motion of door 21. Door 21 is thus brought snug against, and hence seals chamber 8.
  • When [0021] door 21 is opened, spring 34 compresses causing gap 33 to reappear and links 35 and 36 to straighten, thus moving door 21 horizontally away from chamber 8.
  • FIGS. 5 and 6 show a block diagram of one possible implementation of an assembly for guiding the lowering and raising of [0022] support structure 43. In FIG. 5, support structure 43 and cassette 16 are shown lowered out of chamber 8. A roller 44 connected to support structure 43 is shown resting on an extension of a cam containing slot 46 within chamber 8. A roller 45, also connected to support structure 43, is shown at a first end of a slot track 46.
  • In FIG. 6, [0023] support structure 43 and cassette 16 are shown in the upright position within chamber 8. In this position, wafers 10 are horizontal and are stacked so that they are ready to be accessed by semiconductor processing equipment 1. When support structure 43 and cassette 16 are in the upright position, roller 45 is rolled to a second end of slot track 46 and roller 44 rests against a stop 49. Stop 49 is an extension of the cam which contains slot 46.

Claims (4)

What is claimed is:
1. A workpiece loading interface for a workpiece processing system including a vacuum chamber, comprising:
a workpiece load chamber coupled to the vacuum chamber via a gate, the workpiece load chamber having an opening; and
a workpiece support pivotally mounted within the workpiece load chamber, the workpiece support pivoting between a first pivot position in which the workpiece support is aligned with the gate and a second pivot position in which the workpiece is aligned with the opening.
2. The workpiece loading interface according to
claim 1
, wherein the workpiece support pivots about a substantially vertical axis.
3. The workpiece loading interface according to
claim 1
, wherein the workpiece support pivots between the second pivot position and a third pivot position, the workpiece support moving through the opening when pivoting between the second and third pivot positions.
4. The workpiece loading interface according to
claim 3
, wherein when the workpiece support pivots between the first and second pivot positions, the workpiece support pivots through a first angle of approximately twenty-one degrees, and when the workpiece support pivots between the second and third pivot positions, the workpiece support pivots through a second angle of approximately ninety degrees.
US09/070,854 1990-04-19 1998-05-01 Dual cassette load lock Expired - Fee Related US6454508B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US09/070,854 US6454508B2 (en) 1990-04-19 1998-05-01 Dual cassette load lock
US10/223,540 US20030002960A1 (en) 1990-04-19 2002-08-19 Dual cassette load lock
US11/410,797 US20060245854A1 (en) 1990-04-19 2006-04-24 Dual cassette load lock

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US07/511,481 US5186594A (en) 1990-04-19 1990-04-19 Dual cassette load lock
US48154695A 1995-06-07 1995-06-07
US08/700,267 US5769588A (en) 1990-04-19 1996-08-20 Dual cassette load lock
US09/070,854 US6454508B2 (en) 1990-04-19 1998-05-01 Dual cassette load lock

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US08/700,267 Continuation US5769588A (en) 1990-04-19 1996-08-20 Dual cassette load lock

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/223,540 Division US20030002960A1 (en) 1990-04-19 2002-08-19 Dual cassette load lock

Publications (2)

Publication Number Publication Date
US20010014266A1 true US20010014266A1 (en) 2001-08-16
US6454508B2 US6454508B2 (en) 2002-09-24

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Family Applications (7)

Application Number Title Priority Date Filing Date
US07/511,481 Expired - Lifetime US5186594A (en) 1990-04-19 1990-04-19 Dual cassette load lock
US08/700,267 Expired - Fee Related US5769588A (en) 1990-04-19 1996-08-20 Dual cassette load lock
US08/813,480 Expired - Fee Related US6454519B1 (en) 1990-04-19 1997-03-07 Dual cassette load lock
US09/070,854 Expired - Fee Related US6454508B2 (en) 1990-04-19 1998-05-01 Dual cassette load lock
US10/223,540 Abandoned US20030002960A1 (en) 1990-04-19 2002-08-19 Dual cassette load lock
US10/223,539 Expired - Fee Related US6599076B2 (en) 1990-04-19 2002-08-19 Dual cassette load lock
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US11/410,797 Abandoned US20060245854A1 (en) 1990-04-19 2006-04-24 Dual cassette load lock

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KR101257951B1 (en) * 2004-04-09 2013-04-30 에드워즈 배큠 인코포레이티드 Combined vacuum pump load-lock assembly
WO2006015505A1 (en) * 2004-08-13 2006-02-16 Oc Oerlikon Balzers Ag Vacuum lock
WO2013040330A1 (en) * 2011-09-14 2013-03-21 Brooks Automation, Inc. Load station
KR20140076576A (en) * 2011-09-14 2014-06-20 브룩스 오토메이션 인코퍼레이티드 Load station
CN103917466A (en) * 2011-09-14 2014-07-09 布鲁克斯自动化公司 Load station
US9812343B2 (en) 2011-09-14 2017-11-07 Brooks Automation, Inc. Load station
KR102058985B1 (en) * 2011-09-14 2020-02-07 브룩스 오토메이션 인코퍼레이티드 Load station
CN108538692A (en) * 2017-03-02 2018-09-14 北京北方华创微电子装备有限公司 Lift door gear and wafer transmission system
CN113474485A (en) * 2019-02-19 2021-10-01 维易科仪器公司 Automatic batch production film deposition system and use method thereof

Also Published As

Publication number Publication date
DE69132457T2 (en) 2001-05-31
US5186594A (en) 1993-02-16
EP0452939B1 (en) 2000-11-02
US20030002959A1 (en) 2003-01-02
US6454519B1 (en) 2002-09-24
US6454508B2 (en) 2002-09-24
US20030002960A1 (en) 2003-01-02
DE69132457D1 (en) 2000-12-07
US5769588A (en) 1998-06-23
JPH04226048A (en) 1992-08-14
US20060245854A1 (en) 2006-11-02
KR100272890B1 (en) 2000-12-01
JP3088123B2 (en) 2000-09-18
EP0452939A1 (en) 1991-10-23
US6599076B2 (en) 2003-07-29
KR910019145A (en) 1991-11-30

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